JPS57135708A - Manufacturing of high purity silicon granule - Google Patents
Manufacturing of high purity silicon granuleInfo
- Publication number
- JPS57135708A JPS57135708A JP1919181A JP1919181A JPS57135708A JP S57135708 A JPS57135708 A JP S57135708A JP 1919181 A JP1919181 A JP 1919181A JP 1919181 A JP1919181 A JP 1919181A JP S57135708 A JPS57135708 A JP S57135708A
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- gas
- tube
- outer tube
- granules
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000008187 granular material Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- 239000005046 Chlorosilane Substances 0.000 abstract 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 abstract 3
- 239000013078 crystal Substances 0.000 abstract 3
- 239000002245 particle Substances 0.000 abstract 3
- 239000011856 silicon-based particle Substances 0.000 abstract 3
- 238000010438 heat treatment Methods 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
PURPOSE: To manufacture the titled granules in a large quantity, at a low cost, without depositing a large amount of Si to the inner wall of the reactor, by providing the center bottom part of a fluidized bed reactor with a double tube nozzle composed of an outer tube and an inner tube extended beyond the end of said outer tube, and supplying chlorosilane gas through the inner tube and H2 gas through the outer tube.
CONSTITUTION: A proper amount of Si seed crystal particles are charged to the reactor 1, and the reactor is supplied with chlorosilane gas through the innr tube 3 of the double tube nozzle and with H2 gas through the outer tube 2 thereof. The chlorosilane gas is made to react with the H2 gas by heating the space in the reactor 1 with a heating device 10 at a specific temperature range, and Si is deposited and grown on the surface of the Si seed crystal particle under fluidized state to obtain high purity Si granules. By adjusting the amount of the Si seed crystal to a proper level, a deposited Si particle layer (stationary particle layer) 5, a layer of Si particles moving downward (a high density layer) 6, and a fluidized Si particle layer 7 in the middle region are formed in the reactor 1. The exhaust gas is exhausted through the port 8, and the grown Si granules are extracted through the outlet 9.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1919181A JPS57135708A (en) | 1981-02-12 | 1981-02-12 | Manufacturing of high purity silicon granule |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1919181A JPS57135708A (en) | 1981-02-12 | 1981-02-12 | Manufacturing of high purity silicon granule |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57135708A true JPS57135708A (en) | 1982-08-21 |
Family
ID=11992444
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1919181A Pending JPS57135708A (en) | 1981-02-12 | 1981-02-12 | Manufacturing of high purity silicon granule |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57135708A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1223145A1 (en) * | 2001-01-03 | 2002-07-17 | Korea Research Institute Of Chemical Technology | Method and apparatus for preparing polysilicon granules |
JP2004071970A (en) * | 2002-08-08 | 2004-03-04 | Shin Etsu Chem Co Ltd | Method for manufacturing silicon substrate for solar cell and system for manufacturing the same |
KR100783667B1 (en) | 2006-08-10 | 2007-12-07 | 한국화학연구원 | Method and apparatus for manufacturing particulate polycrystalline silicon |
KR100813131B1 (en) | 2006-06-15 | 2008-03-17 | 한국화학연구원 | Sustainable Manufacturing Method of Polycrystalline Silicon Using Fluidized Bed Reactor |
CN100406378C (en) * | 2000-05-11 | 2008-07-30 | 德山株式会社 | Production device of polycrystalline silicon |
JP2009502704A (en) * | 2005-07-19 | 2009-01-29 | アールイーシー シリコン インコーポレイテッド | Silicon jet fluidized bed |
US20150218699A1 (en) * | 2012-08-29 | 2015-08-06 | The University Of Tokyo | Heat exchanger type reaction tube |
TWI643683B (en) * | 2017-10-19 | 2018-12-11 | Scientech Corporation | Fluid providing device |
-
1981
- 1981-02-12 JP JP1919181A patent/JPS57135708A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100406378C (en) * | 2000-05-11 | 2008-07-30 | 德山株式会社 | Production device of polycrystalline silicon |
EP1223145A1 (en) * | 2001-01-03 | 2002-07-17 | Korea Research Institute Of Chemical Technology | Method and apparatus for preparing polysilicon granules |
JP2004071970A (en) * | 2002-08-08 | 2004-03-04 | Shin Etsu Chem Co Ltd | Method for manufacturing silicon substrate for solar cell and system for manufacturing the same |
JP2009502704A (en) * | 2005-07-19 | 2009-01-29 | アールイーシー シリコン インコーポレイテッド | Silicon jet fluidized bed |
KR100813131B1 (en) | 2006-06-15 | 2008-03-17 | 한국화학연구원 | Sustainable Manufacturing Method of Polycrystalline Silicon Using Fluidized Bed Reactor |
KR100783667B1 (en) | 2006-08-10 | 2007-12-07 | 한국화학연구원 | Method and apparatus for manufacturing particulate polycrystalline silicon |
US20150218699A1 (en) * | 2012-08-29 | 2015-08-06 | The University Of Tokyo | Heat exchanger type reaction tube |
US10526707B2 (en) * | 2012-08-29 | 2020-01-07 | The University Of Tokyo | Heat exchanger type reaction tube |
TWI643683B (en) * | 2017-10-19 | 2018-12-11 | Scientech Corporation | Fluid providing device |
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