JPS5712559A - Junction type field effect semiconductor device - Google Patents
Junction type field effect semiconductor deviceInfo
- Publication number
- JPS5712559A JPS5712559A JP8661680A JP8661680A JPS5712559A JP S5712559 A JPS5712559 A JP S5712559A JP 8661680 A JP8661680 A JP 8661680A JP 8661680 A JP8661680 A JP 8661680A JP S5712559 A JPS5712559 A JP S5712559A
- Authority
- JP
- Japan
- Prior art keywords
- area
- type
- regions
- source
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005669 field effect Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
- H10D62/126—Top-view geometrical layouts of the regions or the junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/83—FETs having PN junction gate electrodes
Landscapes
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To obtain a J-FET having high efficiency of effective area and a high withstand voltage by a method wherein gate layers are arranged in a mesh type making the area of drain regions (or source regions) larger than the area of the source regions (or the drain regions). CONSTITUTION:The P type gate layers 3 are arranged in the mesh type arranging a narrow interval d1 and a broad interval d2 alternately, and the area d2Xd2 of the drain region D is made as larger than the area d1Xd2 of the source region S. Consequently the withstand voltage of the drain regions can be enlarged, and efficiency of effective area in a chip can be increased without increasing the area of the chip. Moreover to utilize crossing parts A of the narrow gate layers at the interval d1, N<+> type connecting layers 5 are provided to provide source electrodes, or P<+> type layers reaching a P type substrate are provided at the A parts to be connected to the gate of substrate, and reduction of gate resistance is attained. Source wirings 7, drain wirings 8 of Al are provided in the diagonal direction interposing an insulating film between them to be connected to the respective regions.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8661680A JPS5712559A (en) | 1980-06-27 | 1980-06-27 | Junction type field effect semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8661680A JPS5712559A (en) | 1980-06-27 | 1980-06-27 | Junction type field effect semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5712559A true JPS5712559A (en) | 1982-01-22 |
Family
ID=13891948
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8661680A Pending JPS5712559A (en) | 1980-06-27 | 1980-06-27 | Junction type field effect semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5712559A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009038392A (en) * | 2003-05-15 | 2009-02-19 | Panasonic Corp | Semiconductor device |
CN108091575A (en) * | 2017-12-21 | 2018-05-29 | 深圳市晶特智造科技有限公司 | Junction field effect transistor and preparation method thereof |
-
1980
- 1980-06-27 JP JP8661680A patent/JPS5712559A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009038392A (en) * | 2003-05-15 | 2009-02-19 | Panasonic Corp | Semiconductor device |
CN108091575A (en) * | 2017-12-21 | 2018-05-29 | 深圳市晶特智造科技有限公司 | Junction field effect transistor and preparation method thereof |
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