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JPS5666033A - Minute processing method - Google Patents

Minute processing method

Info

Publication number
JPS5666033A
JPS5666033A JP14117779A JP14117779A JPS5666033A JP S5666033 A JPS5666033 A JP S5666033A JP 14117779 A JP14117779 A JP 14117779A JP 14117779 A JP14117779 A JP 14117779A JP S5666033 A JPS5666033 A JP S5666033A
Authority
JP
Japan
Prior art keywords
film
processed
mask
substance
uneven
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14117779A
Other languages
Japanese (ja)
Other versions
JPS6262045B2 (en
Inventor
Eiji Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tohoku Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tohoku Metal Industries Ltd filed Critical Tohoku Metal Industries Ltd
Priority to JP14117779A priority Critical patent/JPS5666033A/en
Publication of JPS5666033A publication Critical patent/JPS5666033A/en
Publication of JPS6262045B2 publication Critical patent/JPS6262045B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To make unnecessary a mask for selectively exposing to light the surface of a substance to be processed and the adjustment of the mask position by a method wherein the surface, which is uneven and has a step in the surface level, is coated with organic matter in such a way that opening is made in the portion desired. CONSTITUTION:An SiO2 film 2 is formed on the whole surface of an Si substrate 1 which is uneven and has a step in the surface level. Next, a negative type photoresist film 3 is applied onto the film 2, using a spinner, for instance. The film 3 is immediately heat-hardened, and then an opening 4 is made in the side part near the top of the projection. Then, the film 3 is totally removed after selectively removing the film 2 exposed to the opening 4 through etching. Thus, it is made unnecessary to employ a mask for selectively exposing to light the surface and adjust the mask position to a substance to be processed, while the side only of the substance to be processed with an uneven surface can readily be processed inexpensively.
JP14117779A 1979-11-02 1979-11-02 Minute processing method Granted JPS5666033A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14117779A JPS5666033A (en) 1979-11-02 1979-11-02 Minute processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14117779A JPS5666033A (en) 1979-11-02 1979-11-02 Minute processing method

Publications (2)

Publication Number Publication Date
JPS5666033A true JPS5666033A (en) 1981-06-04
JPS6262045B2 JPS6262045B2 (en) 1987-12-24

Family

ID=15285929

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14117779A Granted JPS5666033A (en) 1979-11-02 1979-11-02 Minute processing method

Country Status (1)

Country Link
JP (1) JPS5666033A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4842682A (en) * 1971-09-29 1973-06-21

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4842682A (en) * 1971-09-29 1973-06-21

Also Published As

Publication number Publication date
JPS6262045B2 (en) 1987-12-24

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