JPS5636566B2 - - Google Patents
Info
- Publication number
- JPS5636566B2 JPS5636566B2 JP6843973A JP6843973A JPS5636566B2 JP S5636566 B2 JPS5636566 B2 JP S5636566B2 JP 6843973 A JP6843973 A JP 6843973A JP 6843973 A JP6843973 A JP 6843973A JP S5636566 B2 JPS5636566 B2 JP S5636566B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Projection-Type Copiers In General (AREA)
- Microscoopes, Condenser (AREA)
- Lenses (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6843973A JPS5636566B2 (ja) | 1973-06-18 | 1973-06-18 | |
| US05/478,892 US3950094A (en) | 1973-06-18 | 1974-06-12 | Both-side printing device |
| DE2428926A DE2428926C2 (de) | 1973-06-18 | 1974-06-15 | Vorrichtung zum beidseitigem Kopieren von Schaltungsmustern auf ein Halbleiterplättchen |
| FR7420949A FR2233650B1 (ja) | 1973-06-18 | 1974-06-17 | |
| GB2713374A GB1462388A (en) | 1973-06-18 | 1974-06-18 | Apparatus for printing on two surfaces of a radiation-sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6843973A JPS5636566B2 (ja) | 1973-06-18 | 1973-06-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5017973A JPS5017973A (ja) | 1975-02-25 |
| JPS5636566B2 true JPS5636566B2 (ja) | 1981-08-25 |
Family
ID=13373726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6843973A Expired JPS5636566B2 (ja) | 1973-06-18 | 1973-06-18 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3950094A (ja) |
| JP (1) | JPS5636566B2 (ja) |
| DE (1) | DE2428926C2 (ja) |
| FR (1) | FR2233650B1 (ja) |
| GB (1) | GB1462388A (ja) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4080065A (en) * | 1975-10-06 | 1978-03-21 | Spence Bate | Microfiche camera editing device |
| SE7611561L (sv) * | 1975-10-20 | 1977-04-21 | Izon | Upptecknings- och betraktningsapparat for filmband |
| JP2994232B2 (ja) * | 1995-07-28 | 1999-12-27 | ウシオ電機株式会社 | マスクとマスクまたはマスクとワークの位置合わせ方法および装置 |
| JP3201233B2 (ja) * | 1995-10-20 | 2001-08-20 | ウシオ電機株式会社 | 裏面にアライメント・マークが設けられたワークの投影露光方法 |
| JP3445100B2 (ja) * | 1997-06-02 | 2003-09-08 | キヤノン株式会社 | 位置検出方法及び位置検出装置 |
| US7615076B2 (en) | 1999-10-20 | 2009-11-10 | Anulex Technologies, Inc. | Method and apparatus for the treatment of the intervertebral disc annulus |
| US7004970B2 (en) | 1999-10-20 | 2006-02-28 | Anulex Technologies, Inc. | Methods and devices for spinal disc annulus reconstruction and repair |
| US8632590B2 (en) | 1999-10-20 | 2014-01-21 | Anulex Technologies, Inc. | Apparatus and methods for the treatment of the intervertebral disc |
| DE102004013886A1 (de) * | 2004-03-16 | 2005-10-06 | Carl Zeiss Smt Ag | Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem |
| US7782442B2 (en) * | 2005-12-06 | 2010-08-24 | Nikon Corporation | Exposure apparatus, exposure method, projection optical system and device producing method |
| JP2015011019A (ja) * | 2013-07-02 | 2015-01-19 | 株式会社東芝 | 直流電圧測定装置 |
| DE102017105697A1 (de) * | 2017-03-16 | 2018-09-20 | Ev Group E. Thallner Gmbh | Verfahren und Vorrichtung zur Ausrichtung zweier optischer Teilsysteme |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5411704B1 (ja) * | 1971-03-22 | 1979-05-17 |
-
1973
- 1973-06-18 JP JP6843973A patent/JPS5636566B2/ja not_active Expired
-
1974
- 1974-06-12 US US05/478,892 patent/US3950094A/en not_active Expired - Lifetime
- 1974-06-15 DE DE2428926A patent/DE2428926C2/de not_active Expired
- 1974-06-17 FR FR7420949A patent/FR2233650B1/fr not_active Expired
- 1974-06-18 GB GB2713374A patent/GB1462388A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1462388A (en) | 1977-01-26 |
| DE2428926C2 (de) | 1985-11-28 |
| DE2428926A1 (de) | 1975-01-16 |
| US3950094A (en) | 1976-04-13 |
| JPS5017973A (ja) | 1975-02-25 |
| FR2233650A1 (ja) | 1975-01-10 |
| FR2233650B1 (ja) | 1976-10-15 |