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JPS5517152A - Photo mask - Google Patents

Photo mask

Info

Publication number
JPS5517152A
JPS5517152A JP8993278A JP8993278A JPS5517152A JP S5517152 A JPS5517152 A JP S5517152A JP 8993278 A JP8993278 A JP 8993278A JP 8993278 A JP8993278 A JP 8993278A JP S5517152 A JPS5517152 A JP S5517152A
Authority
JP
Japan
Prior art keywords
film
photo mask
inert gas
metal
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8993278A
Other languages
Japanese (ja)
Other versions
JPS6132665B2 (en
Inventor
Kenji Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8993278A priority Critical patent/JPS5517152A/en
Publication of JPS5517152A publication Critical patent/JPS5517152A/en
Publication of JPS6132665B2 publication Critical patent/JPS6132665B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To obviate the production of pattern defects by depositing a Cr oxide film of oxygne short type on a metal Cr film in place of Cr2O3 film.
CONSTITUTION: A metal Cr film 2 is formed on a glass substrate 1 in an inert gas atmosphere. Next, a small amount of O2 is introduced into the inert gas under accurate control and the film 3 of oxygen short type non-stoichiometric Cr oxide is formed by reaction sputtering preferably by thicknesses of 500 to 1,000Å. This results in decreased reflectance of the photo mask and less undulations at the edge of the photo mask patterns.
COPYRIGHT: (C)1980,JPO&Japio
JP8993278A 1978-07-25 1978-07-25 Photo mask Granted JPS5517152A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8993278A JPS5517152A (en) 1978-07-25 1978-07-25 Photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8993278A JPS5517152A (en) 1978-07-25 1978-07-25 Photo mask

Publications (2)

Publication Number Publication Date
JPS5517152A true JPS5517152A (en) 1980-02-06
JPS6132665B2 JPS6132665B2 (en) 1986-07-28

Family

ID=13984461

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8993278A Granted JPS5517152A (en) 1978-07-25 1978-07-25 Photo mask

Country Status (1)

Country Link
JP (1) JPS5517152A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56125743A (en) * 1980-03-07 1981-10-02 Konishiroku Photo Ind Co Ltd Base material for photomask
JPS57154459A (en) * 1981-03-20 1982-09-24 Teijin Ltd Production of polyester knitted fabric
JPS58169151A (en) * 1982-03-31 1983-10-05 Fujitsu Ltd Chromium mask and its manufacture
US4497878A (en) * 1981-08-19 1985-02-05 Konishiroku Photo Industry Co., Ltd. Photomask material
JPS62123464A (en) * 1985-11-22 1987-06-04 Sharp Corp Photomask
WO2003071356A1 (en) * 2002-02-22 2003-08-28 Sony Corporation Resist material and microfabrication method
WO2004034391A1 (en) * 2002-10-10 2004-04-22 Sony Corporation Method of producing optical disk-use original and method of producing optical disk
WO2004047096A1 (en) * 2002-11-20 2004-06-03 Sony Corporation Method for producing stamper used for producing optical disc and optical disc producing method
JP2018106143A (en) * 2016-12-26 2018-07-05 信越化学工業株式会社 Photomask blank, and method of producing the same
JP2018106144A (en) * 2016-12-26 2018-07-05 信越化学工業株式会社 Photomask blank, and method of producing the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0229320Y2 (en) * 1986-09-10 1990-08-07

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5325329A (en) * 1976-06-07 1978-03-09 Amdahl Corp Data processor system and information scannout

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5325329A (en) * 1976-06-07 1978-03-09 Amdahl Corp Data processor system and information scannout

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56125743A (en) * 1980-03-07 1981-10-02 Konishiroku Photo Ind Co Ltd Base material for photomask
JPS57154459A (en) * 1981-03-20 1982-09-24 Teijin Ltd Production of polyester knitted fabric
US4497878A (en) * 1981-08-19 1985-02-05 Konishiroku Photo Industry Co., Ltd. Photomask material
JPS6227385B2 (en) * 1982-03-31 1987-06-15 Fujitsu Ltd
JPS58169151A (en) * 1982-03-31 1983-10-05 Fujitsu Ltd Chromium mask and its manufacture
JPH0517542B2 (en) * 1985-11-22 1993-03-09 Sharp Kk
JPS62123464A (en) * 1985-11-22 1987-06-04 Sharp Corp Photomask
US7560220B2 (en) 2002-02-22 2009-07-14 Sony Corporation Resist material and nanofabrication method
WO2003071356A1 (en) * 2002-02-22 2003-08-28 Sony Corporation Resist material and microfabrication method
US7175962B2 (en) 2002-02-22 2007-02-13 Sony Corporation Resist material and nanofabrication method
US7344822B2 (en) 2002-02-22 2008-03-18 Sony Corporation Resist material and nanofabrication method
WO2004034391A1 (en) * 2002-10-10 2004-04-22 Sony Corporation Method of producing optical disk-use original and method of producing optical disk
US8097189B2 (en) 2002-10-10 2012-01-17 Sony Corporation Method for manufacturing optical disc master and method for manufacturing optical disc
US7670514B2 (en) 2002-10-10 2010-03-02 Sony Corporation Method of producing optical disk-use original and method of producing optical disk
EP1564734A1 (en) * 2002-11-20 2005-08-17 Sony Corporation Method for producing stamper used for producing optical disc and optical disc producing method
US7648671B2 (en) 2002-11-20 2010-01-19 Sony Corporation Method of making master for manufacturing optical disc and method of manufacturing optical disc
EP1564734A4 (en) * 2002-11-20 2007-10-31 Sony Corp Method for producing stamper used for producing optical disc and optical disc producing method
WO2004047096A1 (en) * 2002-11-20 2004-06-03 Sony Corporation Method for producing stamper used for producing optical disc and optical disc producing method
JP2018106143A (en) * 2016-12-26 2018-07-05 信越化学工業株式会社 Photomask blank, and method of producing the same
JP2018106144A (en) * 2016-12-26 2018-07-05 信越化学工業株式会社 Photomask blank, and method of producing the same

Also Published As

Publication number Publication date
JPS6132665B2 (en) 1986-07-28

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