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JPS5485793A - Inspecting method of photo masks - Google Patents

Inspecting method of photo masks

Info

Publication number
JPS5485793A
JPS5485793A JP15291877A JP15291877A JPS5485793A JP S5485793 A JPS5485793 A JP S5485793A JP 15291877 A JP15291877 A JP 15291877A JP 15291877 A JP15291877 A JP 15291877A JP S5485793 A JPS5485793 A JP S5485793A
Authority
JP
Japan
Prior art keywords
defects
radiated
light
parallel rays
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15291877A
Other languages
Japanese (ja)
Inventor
Hiroto Nagatomo
Masakuni Akiba
Soichi Tsuuzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15291877A priority Critical patent/JPS5485793A/en
Publication of JPS5485793A publication Critical patent/JPS5485793A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To distinctly detect only the defects of masks and enabling inspecton to be automatically performed by projecting parallel rays toward the inside of the photo mask and detecting the rays irregularly reflecting on the inside surface of a tansparent plate from the angles differing from main optical axis. CONSTITUTION:Laser rays are radiated from the side face toward the inside of the photo mask 20 on a mask stage. If there are no defects, the parallel rays radiated like Fig. (a) pass the inside of the glass plate 21 without any hindrance, go out from the other end face and no light is detected even when observed from above, thus the entire part of the field of view appears black. On the other hand, if there are any defects 23, the parallel rays radiated toward the glass plate 21 like Fig. (b) irregularly reflect at the portions of the defects 23 and part thereof go upward and therefor when viewed from above only the defect portions emit light in the black background. The presence or not of defects may be judged from the presence or not light, thus automatic inspection becomes easy. Only the defect portions may be lighted, whereby automatic inspection is made possible and the saving of manpower and the improvement of inspection efficiency may be achieved.
JP15291877A 1977-12-21 1977-12-21 Inspecting method of photo masks Pending JPS5485793A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15291877A JPS5485793A (en) 1977-12-21 1977-12-21 Inspecting method of photo masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15291877A JPS5485793A (en) 1977-12-21 1977-12-21 Inspecting method of photo masks

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP715384A Division JPS59170751A (en) 1984-01-20 1984-01-20 Inspecting device of plate type body

Publications (1)

Publication Number Publication Date
JPS5485793A true JPS5485793A (en) 1979-07-07

Family

ID=15550985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15291877A Pending JPS5485793A (en) 1977-12-21 1977-12-21 Inspecting method of photo masks

Country Status (1)

Country Link
JP (1) JPS5485793A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS578435A (en) * 1980-05-16 1982-01-16 Gca Corp Automatic detector for fine particle on wide ranging surface left optically unground
JPS5942437A (en) * 1982-09-02 1984-03-09 Konishiroku Photo Ind Co Ltd Screening method of glass substrate for photomask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS578435A (en) * 1980-05-16 1982-01-16 Gca Corp Automatic detector for fine particle on wide ranging surface left optically unground
JPH0143901B2 (en) * 1980-05-16 1989-09-25 Kyuu Shii Oputeikusu Inc
JPS5942437A (en) * 1982-09-02 1984-03-09 Konishiroku Photo Ind Co Ltd Screening method of glass substrate for photomask

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