JPS5485793A - Inspecting method of photo masks - Google Patents
Inspecting method of photo masksInfo
- Publication number
- JPS5485793A JPS5485793A JP15291877A JP15291877A JPS5485793A JP S5485793 A JPS5485793 A JP S5485793A JP 15291877 A JP15291877 A JP 15291877A JP 15291877 A JP15291877 A JP 15291877A JP S5485793 A JPS5485793 A JP S5485793A
- Authority
- JP
- Japan
- Prior art keywords
- defects
- radiated
- light
- parallel rays
- rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To distinctly detect only the defects of masks and enabling inspecton to be automatically performed by projecting parallel rays toward the inside of the photo mask and detecting the rays irregularly reflecting on the inside surface of a tansparent plate from the angles differing from main optical axis. CONSTITUTION:Laser rays are radiated from the side face toward the inside of the photo mask 20 on a mask stage. If there are no defects, the parallel rays radiated like Fig. (a) pass the inside of the glass plate 21 without any hindrance, go out from the other end face and no light is detected even when observed from above, thus the entire part of the field of view appears black. On the other hand, if there are any defects 23, the parallel rays radiated toward the glass plate 21 like Fig. (b) irregularly reflect at the portions of the defects 23 and part thereof go upward and therefor when viewed from above only the defect portions emit light in the black background. The presence or not of defects may be judged from the presence or not light, thus automatic inspection becomes easy. Only the defect portions may be lighted, whereby automatic inspection is made possible and the saving of manpower and the improvement of inspection efficiency may be achieved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15291877A JPS5485793A (en) | 1977-12-21 | 1977-12-21 | Inspecting method of photo masks |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15291877A JPS5485793A (en) | 1977-12-21 | 1977-12-21 | Inspecting method of photo masks |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP715384A Division JPS59170751A (en) | 1984-01-20 | 1984-01-20 | Inspecting device of plate type body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5485793A true JPS5485793A (en) | 1979-07-07 |
Family
ID=15550985
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15291877A Pending JPS5485793A (en) | 1977-12-21 | 1977-12-21 | Inspecting method of photo masks |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5485793A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS578435A (en) * | 1980-05-16 | 1982-01-16 | Gca Corp | Automatic detector for fine particle on wide ranging surface left optically unground |
JPS5942437A (en) * | 1982-09-02 | 1984-03-09 | Konishiroku Photo Ind Co Ltd | Screening method of glass substrate for photomask |
-
1977
- 1977-12-21 JP JP15291877A patent/JPS5485793A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS578435A (en) * | 1980-05-16 | 1982-01-16 | Gca Corp | Automatic detector for fine particle on wide ranging surface left optically unground |
JPH0143901B2 (en) * | 1980-05-16 | 1989-09-25 | Kyuu Shii Oputeikusu Inc | |
JPS5942437A (en) * | 1982-09-02 | 1984-03-09 | Konishiroku Photo Ind Co Ltd | Screening method of glass substrate for photomask |
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