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JPS5435180A - Preparation of boron film - Google Patents

Preparation of boron film

Info

Publication number
JPS5435180A
JPS5435180A JP10131377A JP10131377A JPS5435180A JP S5435180 A JPS5435180 A JP S5435180A JP 10131377 A JP10131377 A JP 10131377A JP 10131377 A JP10131377 A JP 10131377A JP S5435180 A JPS5435180 A JP S5435180A
Authority
JP
Japan
Prior art keywords
preparation
boron film
boron
film
elastic modulus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10131377A
Other languages
Japanese (ja)
Other versions
JPS5841350B2 (en
Inventor
Masaki Aoki
Hiroshi Yamazoe
Masahiro Nagasawa
Koichi Azuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP10131377A priority Critical patent/JPS5841350B2/en
Publication of JPS5435180A publication Critical patent/JPS5435180A/en
Publication of JPS5841350B2 publication Critical patent/JPS5841350B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/28—Deposition of only one other non-metal element
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)

Abstract

PURPOSE:To form dense boron film of high elastic modulus, by depositing boron on a substrate under specific conditions by use of a vacuum chemical deposition apparatus.
JP10131377A 1977-08-23 1977-08-23 Method for manufacturing boron coating Expired JPS5841350B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10131377A JPS5841350B2 (en) 1977-08-23 1977-08-23 Method for manufacturing boron coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10131377A JPS5841350B2 (en) 1977-08-23 1977-08-23 Method for manufacturing boron coating

Publications (2)

Publication Number Publication Date
JPS5435180A true JPS5435180A (en) 1979-03-15
JPS5841350B2 JPS5841350B2 (en) 1983-09-12

Family

ID=14297313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10131377A Expired JPS5841350B2 (en) 1977-08-23 1977-08-23 Method for manufacturing boron coating

Country Status (1)

Country Link
JP (1) JPS5841350B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55129994A (en) * 1979-03-26 1980-10-08 Nec Corp Semiconductor memory device
JPS56154390A (en) * 1980-04-30 1981-11-28 Hitachi Zosen Corp Assembly process for ring-shaped construction
JPS5794564A (en) * 1980-12-03 1982-06-12 Matsushita Electric Ind Co Ltd Manufacture of pipe with high specific elastic modulus
JPS60121487U (en) * 1984-01-26 1985-08-16 川崎重工業株式会社 Welding equipment for closed section box type columns
JPH03161170A (en) * 1989-11-14 1991-07-11 Kobe Steel Ltd Posture controller for materials to be welded
JPH091326A (en) * 1995-06-12 1997-01-07 Kawasaki Heavy Ind Ltd Work welding method and welding device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02109422U (en) * 1989-02-17 1990-08-31

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55129994A (en) * 1979-03-26 1980-10-08 Nec Corp Semiconductor memory device
JPS56154390A (en) * 1980-04-30 1981-11-28 Hitachi Zosen Corp Assembly process for ring-shaped construction
JPS5794564A (en) * 1980-12-03 1982-06-12 Matsushita Electric Ind Co Ltd Manufacture of pipe with high specific elastic modulus
JPS60121487U (en) * 1984-01-26 1985-08-16 川崎重工業株式会社 Welding equipment for closed section box type columns
JPH03161170A (en) * 1989-11-14 1991-07-11 Kobe Steel Ltd Posture controller for materials to be welded
JPH091326A (en) * 1995-06-12 1997-01-07 Kawasaki Heavy Ind Ltd Work welding method and welding device

Also Published As

Publication number Publication date
JPS5841350B2 (en) 1983-09-12

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