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JPS5357758A - High frequency sputtering device - Google Patents

High frequency sputtering device

Info

Publication number
JPS5357758A
JPS5357758A JP13172176A JP13172176A JPS5357758A JP S5357758 A JPS5357758 A JP S5357758A JP 13172176 A JP13172176 A JP 13172176A JP 13172176 A JP13172176 A JP 13172176A JP S5357758 A JPS5357758 A JP S5357758A
Authority
JP
Japan
Prior art keywords
high frequency
sputtering device
frequency sputtering
specified
device capable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13172176A
Other languages
Japanese (ja)
Other versions
JPS5931847B2 (en
Inventor
Shinichi Muramatsu
Hisao Katsuto
Yukiyoshi Harada
Genichi Kamoshita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13172176A priority Critical patent/JPS5931847B2/en
Publication of JPS5357758A publication Critical patent/JPS5357758A/en
Publication of JPS5931847B2 publication Critical patent/JPS5931847B2/en
Expired legal-status Critical Current

Links

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  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE: To obtain a high frequency sputtering device capable of depositing uniform insulation films by selectively disposing bipolar magnets as specified on the back of a target electrode.
COPYRIGHT: (C)1978,JPO&Japio
JP13172176A 1976-11-04 1976-11-04 High frequency sputtering equipment Expired JPS5931847B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13172176A JPS5931847B2 (en) 1976-11-04 1976-11-04 High frequency sputtering equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13172176A JPS5931847B2 (en) 1976-11-04 1976-11-04 High frequency sputtering equipment

Publications (2)

Publication Number Publication Date
JPS5357758A true JPS5357758A (en) 1978-05-25
JPS5931847B2 JPS5931847B2 (en) 1984-08-04

Family

ID=15064640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13172176A Expired JPS5931847B2 (en) 1976-11-04 1976-11-04 High frequency sputtering equipment

Country Status (1)

Country Link
JP (1) JPS5931847B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62273733A (en) * 1986-05-21 1987-11-27 Anelva Corp Bias sputtering device
JPH02254165A (en) * 1989-03-27 1990-10-12 Tokyo Electron Ltd Sputtering device
WO2011105280A1 (en) * 2010-02-24 2011-09-01 株式会社 アルバック Magnetic circuit and magnetron sputtering apparatus

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0214370Y2 (en) * 1985-04-19 1990-04-19
JPH048744Y2 (en) * 1985-10-17 1992-03-05

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62273733A (en) * 1986-05-21 1987-11-27 Anelva Corp Bias sputtering device
JPH02254165A (en) * 1989-03-27 1990-10-12 Tokyo Electron Ltd Sputtering device
WO2011105280A1 (en) * 2010-02-24 2011-09-01 株式会社 アルバック Magnetic circuit and magnetron sputtering apparatus

Also Published As

Publication number Publication date
JPS5931847B2 (en) 1984-08-04

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