[go: up one dir, main page]

JPS54143646A - Photosensitive plate for electrophotography - Google Patents

Photosensitive plate for electrophotography

Info

Publication number
JPS54143646A
JPS54143646A JP5255478A JP5255478A JPS54143646A JP S54143646 A JPS54143646 A JP S54143646A JP 5255478 A JP5255478 A JP 5255478A JP 5255478 A JP5255478 A JP 5255478A JP S54143646 A JPS54143646 A JP S54143646A
Authority
JP
Japan
Prior art keywords
layer
photosensitive plate
silicon dioxide
substrate
soda glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5255478A
Other languages
Japanese (ja)
Other versions
JPS5753951B2 (en
Inventor
Daisuke Manabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP5255478A priority Critical patent/JPS54143646A/en
Publication of JPS54143646A publication Critical patent/JPS54143646A/en
Publication of JPS5753951B2 publication Critical patent/JPS5753951B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE: To produce a good photosensitive plate for elecrrophotography by the use of soda glass comprising subsequently laminating a vacuum vapor deposition layer of silicon dioxide and transparent conductive layer as a substrate and forming a photoconductive layer thereon.
CONSTITUTION: A silicon dioxide layer of about 1000 Å or over in thickness is formed by a vacuum deposition method on a soda glass plate (float glass) and further a transparent electrode layer such as of indium oxide, tin oxide or other is provided thereon and this yields the substrate. Next, a photoconductive layer of inorganic photoconductive material such as cadmium sulfide is provided on the abovementioned substrate to form the photosensitive plate. Since the diffusion of the harmful components of soda glass into the photoconductive layer is prevented by the silicon dioxide layer of the abovementioned photosensitive plate, there is no occurrence of defects such as uneven color, peeling, etc. of the photosensitive plate.
COPYRIGHT: (C)1979,JPO&Japio
JP5255478A 1978-04-28 1978-04-28 Photosensitive plate for electrophotography Granted JPS54143646A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5255478A JPS54143646A (en) 1978-04-28 1978-04-28 Photosensitive plate for electrophotography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5255478A JPS54143646A (en) 1978-04-28 1978-04-28 Photosensitive plate for electrophotography

Publications (2)

Publication Number Publication Date
JPS54143646A true JPS54143646A (en) 1979-11-09
JPS5753951B2 JPS5753951B2 (en) 1982-11-16

Family

ID=12918021

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5255478A Granted JPS54143646A (en) 1978-04-28 1978-04-28 Photosensitive plate for electrophotography

Country Status (1)

Country Link
JP (1) JPS54143646A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58112375A (en) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd Manufacture of photovoltaic device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5932538A (en) * 1982-08-18 1984-02-22 Shiraki Kinzoku Kogyo Kk Molding and its production method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58112375A (en) * 1981-12-25 1983-07-04 Fuji Electric Corp Res & Dev Ltd Manufacture of photovoltaic device
JPS6246075B2 (en) * 1981-12-25 1987-09-30 Fuji Denki Sogo Kenkyusho Kk

Also Published As

Publication number Publication date
JPS5753951B2 (en) 1982-11-16

Similar Documents

Publication Publication Date Title
JPS56135980A (en) Photoelectric conversion element
JPS5451831A (en) Photomask material
JPS54143646A (en) Photosensitive plate for electrophotography
JPS57197876A (en) Photoconductive film
JPS5685876A (en) Photoelectric converter
JPS5451832A (en) Photomask material
JPS56132750A (en) Photoelectric converter and manufacture
JPS5471987A (en) Production of photo mask
JPS57207256A (en) Photomask
JPS57166083A (en) Thin film type photoelectric conversion element
JPS56167240A (en) Photoelectric converter
JPS55120181A (en) Fabricating method of photovoltaic device
JPS5470838A (en) Photosensitive element for zerography
JPS5498631A (en) Substrate orientation method of liquid crystal display cells
JPS5752024A (en) Manufacture of transparent electrode substrate
JPS5453980A (en) Photo conductive target
JPS5550627A (en) Mask for lithography
JPS57143874A (en) Manufacture of solar cell
JPS5526515A (en) Electrophotographic photoreceptor
JPS54134396A (en) Transparent conductive film and its manufacturing process
JPS55106418A (en) Liquid crystal display device
JPS54156488A (en) Manufacture for semiconductor device
JPS5788044A (en) Manufacture of glass mask
JPS5261984A (en) Production of photoelectric converting device
JPS57119434A (en) Manufacture of photoelectric conversion target