JPS5412261A - Semiconductor wafer - Google Patents
Semiconductor waferInfo
- Publication number
- JPS5412261A JPS5412261A JP7742777A JP7742777A JPS5412261A JP S5412261 A JPS5412261 A JP S5412261A JP 7742777 A JP7742777 A JP 7742777A JP 7742777 A JP7742777 A JP 7742777A JP S5412261 A JPS5412261 A JP S5412261A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- band width
- forbidden band
- buffer layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 abstract 1
- 230000001154 acute effect Effects 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
Landscapes
- Junction Field-Effect Transistors (AREA)
- Bipolar Transistors (AREA)
Abstract
PURPOSE: To produce an acute carrier distribution at the interface of a semi-insulating AlGaAs buffer layer and a GaAs operating layer by making the forbidden band width of the buffer layer larger than the forbidden band width of the operating layer at the time of laminating and growing these layers on a GaAs substrate thereby forming the substrate for FETs, etc.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7742777A JPS5412261A (en) | 1977-06-28 | 1977-06-28 | Semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7742777A JPS5412261A (en) | 1977-06-28 | 1977-06-28 | Semiconductor wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5412261A true JPS5412261A (en) | 1979-01-29 |
Family
ID=13633678
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7742777A Pending JPS5412261A (en) | 1977-06-28 | 1977-06-28 | Semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5412261A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55120167A (en) * | 1979-03-08 | 1980-09-16 | Nippon Telegr & Teleph Corp <Ntt> | Field effect type semiconductor device |
US4593304A (en) * | 1981-04-20 | 1986-06-03 | Hughes Aircraft Company | Heterostructure interdigital high speed photoconductive detector |
US4696648A (en) * | 1981-04-20 | 1987-09-29 | Hughes Aircraft Company | Heterostructure interdigital high speed photoconductive detector |
US4799088A (en) * | 1980-07-28 | 1989-01-17 | Fujitsu Limited | High electron mobility single heterojunction semiconductor devices and methods for production thereof |
-
1977
- 1977-06-28 JP JP7742777A patent/JPS5412261A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55120167A (en) * | 1979-03-08 | 1980-09-16 | Nippon Telegr & Teleph Corp <Ntt> | Field effect type semiconductor device |
US4799088A (en) * | 1980-07-28 | 1989-01-17 | Fujitsu Limited | High electron mobility single heterojunction semiconductor devices and methods for production thereof |
US4593304A (en) * | 1981-04-20 | 1986-06-03 | Hughes Aircraft Company | Heterostructure interdigital high speed photoconductive detector |
US4696648A (en) * | 1981-04-20 | 1987-09-29 | Hughes Aircraft Company | Heterostructure interdigital high speed photoconductive detector |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5290280A (en) | Semiconductor laser element | |
JPS5412261A (en) | Semiconductor wafer | |
JPS5421172A (en) | Manufacture for semiconductor device | |
JPS5434756A (en) | Vapor-phase growth method for semiconductor | |
EP0367411A3 (en) | Heterojunction semiconductor devices and methods of making the same | |
JPS53126866A (en) | Production of semiconductor wafers | |
JPS5414174A (en) | Manufacture for semiconductor device | |
JPS53104162A (en) | Forming method for epitaxial layer on semiconductor wafer | |
JPS52152184A (en) | Semiconductor device | |
JPS5247377A (en) | Method of inactivating surface of group iii-v compound semiconductor | |
JPS5329072A (en) | Gallium arsenide semiconductor device | |
JPS5247381A (en) | Gallium arsenide composite semiconductor device | |
JPS5440575A (en) | Semiconductor device | |
JPS5467765A (en) | Production of semiconductor device of gallium arsenide | |
JPS5224480A (en) | Semiconductor laser | |
JPS5437486A (en) | Manufacture of gallium phosphate green-color luminous element | |
JPS5351964A (en) | Selective growth method for semiconductor crystal | |
JPS5311574A (en) | Production of semiconductor device | |
JPS6449275A (en) | Selectively doped heterostructure | |
JPS5419383A (en) | Production of gallium arsenide light emitting devices | |
JPS5232287A (en) | Semiconductor laser and its manufacturing method | |
JPS52113676A (en) | Semiconductor device | |
JPS5244193A (en) | Epitaxial growth method | |
JPS5354993A (en) | Semiconductor device | |
JPS5314585A (en) | Semiconductor device |