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JPS5339274A - Vacuum evaporating method for forming aluminum oxide film by means of laser as heat source - Google Patents

Vacuum evaporating method for forming aluminum oxide film by means of laser as heat source

Info

Publication number
JPS5339274A
JPS5339274A JP11309776A JP11309776A JPS5339274A JP S5339274 A JPS5339274 A JP S5339274A JP 11309776 A JP11309776 A JP 11309776A JP 11309776 A JP11309776 A JP 11309776A JP S5339274 A JPS5339274 A JP S5339274A
Authority
JP
Japan
Prior art keywords
heat source
laser
oxide film
aluminum oxide
vacuum evaporating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11309776A
Other languages
Japanese (ja)
Inventor
Takashi Nishida
Kazuyoshi Ueki
Yukiyoshi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11309776A priority Critical patent/JPS5339274A/en
Publication of JPS5339274A publication Critical patent/JPS5339274A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form high quality film, which is mechanically, optically, and chemically stable, by introducing an oxidizing gas under specific degree of vacuum as an evaporation atmosphere in vacuum evaporation of Al2O3 film by use of high output laser as a heat source.
JP11309776A 1976-09-22 1976-09-22 Vacuum evaporating method for forming aluminum oxide film by means of laser as heat source Pending JPS5339274A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11309776A JPS5339274A (en) 1976-09-22 1976-09-22 Vacuum evaporating method for forming aluminum oxide film by means of laser as heat source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11309776A JPS5339274A (en) 1976-09-22 1976-09-22 Vacuum evaporating method for forming aluminum oxide film by means of laser as heat source

Publications (1)

Publication Number Publication Date
JPS5339274A true JPS5339274A (en) 1978-04-11

Family

ID=14603393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11309776A Pending JPS5339274A (en) 1976-09-22 1976-09-22 Vacuum evaporating method for forming aluminum oxide film by means of laser as heat source

Country Status (1)

Country Link
JP (1) JPS5339274A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0182377A2 (en) * 1984-11-23 1986-05-28 Dieter Prof. Dr. Bäuerle Process for making a thin film capacitor
JPS63227766A (en) * 1986-10-27 1988-09-22 Hitachi Ltd Method of forming ultrafine particle film
US8137638B2 (en) * 2005-03-18 2012-03-20 Tokyo Institute Of Technology Hydrogen generation apparatus, laser reduction apparatus, energy conversion apparatus, hydrogen generation method and electric power generation system
JP2017151200A (en) * 2016-02-23 2017-08-31 コニカミノルタ株式会社 Method for manufacturing antireflection body
WO2022161605A1 (en) * 2021-01-27 2022-08-04 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Thermal laser evaporation system

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0182377A2 (en) * 1984-11-23 1986-05-28 Dieter Prof. Dr. Bäuerle Process for making a thin film capacitor
EP0182377A3 (en) * 1984-11-23 1987-10-21 Dieter Prof. Dr. Bäuerle Process for making a thin film capacitor
JPS63227766A (en) * 1986-10-27 1988-09-22 Hitachi Ltd Method of forming ultrafine particle film
JPH0524988B2 (en) * 1986-10-27 1993-04-09 Hitachi Ltd
US8137638B2 (en) * 2005-03-18 2012-03-20 Tokyo Institute Of Technology Hydrogen generation apparatus, laser reduction apparatus, energy conversion apparatus, hydrogen generation method and electric power generation system
JP2017151200A (en) * 2016-02-23 2017-08-31 コニカミノルタ株式会社 Method for manufacturing antireflection body
WO2022161605A1 (en) * 2021-01-27 2022-08-04 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Thermal laser evaporation system

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