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JPS52106681A - Etching method - Google Patents

Etching method

Info

Publication number
JPS52106681A
JPS52106681A JP2313376A JP2313376A JPS52106681A JP S52106681 A JPS52106681 A JP S52106681A JP 2313376 A JP2313376 A JP 2313376A JP 2313376 A JP2313376 A JP 2313376A JP S52106681 A JPS52106681 A JP S52106681A
Authority
JP
Japan
Prior art keywords
etching method
wafer
precission
arranging
vicinity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2313376A
Other languages
Japanese (ja)
Inventor
Tsuguo Fukuda
Toshiharu Ito
Hitoshi Hirano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2313376A priority Critical patent/JPS52106681A/en
Publication of JPS52106681A publication Critical patent/JPS52106681A/en
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)

Abstract

PURPOSE: To provide etching method to perform high precission and fine etching work by arranging a dummy wafer in the vicinity of a wafer.
COPYRIGHT: (C)1977,JPO&Japio
JP2313376A 1976-03-05 1976-03-05 Etching method Pending JPS52106681A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2313376A JPS52106681A (en) 1976-03-05 1976-03-05 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2313376A JPS52106681A (en) 1976-03-05 1976-03-05 Etching method

Publications (1)

Publication Number Publication Date
JPS52106681A true JPS52106681A (en) 1977-09-07

Family

ID=12102022

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2313376A Pending JPS52106681A (en) 1976-03-05 1976-03-05 Etching method

Country Status (1)

Country Link
JP (1) JPS52106681A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63115331A (en) * 1986-11-04 1988-05-19 Matsushita Electronics Corp Inspection of semiconductor device
JPH0412628U (en) * 1990-05-22 1992-01-31
JPH05304134A (en) * 1992-04-27 1993-11-16 Sharp Corp Method and system for wet etching

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63115331A (en) * 1986-11-04 1988-05-19 Matsushita Electronics Corp Inspection of semiconductor device
JPH0412628U (en) * 1990-05-22 1992-01-31
JPH05304134A (en) * 1992-04-27 1993-11-16 Sharp Corp Method and system for wet etching

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