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JPS51118968A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS51118968A
JPS51118968A JP50043332A JP4333275A JPS51118968A JP S51118968 A JPS51118968 A JP S51118968A JP 50043332 A JP50043332 A JP 50043332A JP 4333275 A JP4333275 A JP 4333275A JP S51118968 A JPS51118968 A JP S51118968A
Authority
JP
Japan
Prior art keywords
electron beam
exposure device
beam exposure
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shorten
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50043332A
Other languages
Japanese (ja)
Other versions
JPS5419142B2 (en
Inventor
Masahiko Washimi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP50043332A priority Critical patent/JPS51118968A/en
Priority to US05/675,170 priority patent/US4063103A/en
Publication of JPS51118968A publication Critical patent/JPS51118968A/en
Publication of JPS5419142B2 publication Critical patent/JPS5419142B2/ja
Granted legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To shorten the time for the XY table transfer by narrowing the base scanning area to the extent that the electrical accuracy is guaranteed sufficiently.
COPYRIGHT: (C)1976,JPO&Japio
JP50043332A 1975-04-11 1975-04-11 Electron beam exposure device Granted JPS51118968A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP50043332A JPS51118968A (en) 1975-04-11 1975-04-11 Electron beam exposure device
US05/675,170 US4063103A (en) 1975-04-11 1976-04-08 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50043332A JPS51118968A (en) 1975-04-11 1975-04-11 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS51118968A true JPS51118968A (en) 1976-10-19
JPS5419142B2 JPS5419142B2 (en) 1979-07-12

Family

ID=12660866

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50043332A Granted JPS51118968A (en) 1975-04-11 1975-04-11 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS51118968A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54148483A (en) * 1978-05-15 1979-11-20 Nippon Telegr & Teleph Corp <Ntt> Automatic detecting method for reference mark of exposure
JPS553603A (en) * 1978-06-21 1980-01-11 Toshiba Corp Electron beam exposure device
JPS5683032A (en) * 1979-12-12 1981-07-07 Fujitsu Ltd Exposing device of electronic beam
JPS56153739A (en) * 1981-04-09 1981-11-27 Fujitsu Ltd Exposing method for electron beam

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921445A (en) * 1972-06-20 1974-02-25
JPS509127A (en) * 1973-05-30 1975-01-30
JPS50145865A (en) * 1974-04-18 1975-11-22

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921445A (en) * 1972-06-20 1974-02-25
JPS509127A (en) * 1973-05-30 1975-01-30
JPS50145865A (en) * 1974-04-18 1975-11-22

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54148483A (en) * 1978-05-15 1979-11-20 Nippon Telegr & Teleph Corp <Ntt> Automatic detecting method for reference mark of exposure
JPS5637694B2 (en) * 1978-05-15 1981-09-02
JPS553603A (en) * 1978-06-21 1980-01-11 Toshiba Corp Electron beam exposure device
JPS6226172B2 (en) * 1978-06-21 1987-06-08 Tokyo Shibaura Electric Co
JPS5683032A (en) * 1979-12-12 1981-07-07 Fujitsu Ltd Exposing device of electronic beam
JPS56153739A (en) * 1981-04-09 1981-11-27 Fujitsu Ltd Exposing method for electron beam
JPS6227534B2 (en) * 1981-04-09 1987-06-15 Fujitsu Ltd

Also Published As

Publication number Publication date
JPS5419142B2 (en) 1979-07-12

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