JPH11501909A - フルオロカーボンアニオンを有するエネルギー活性塩 - Google Patents
フルオロカーボンアニオンを有するエネルギー活性塩Info
- Publication number
- JPH11501909A JPH11501909A JP8526859A JP52685996A JPH11501909A JP H11501909 A JPH11501909 A JP H11501909A JP 8526859 A JP8526859 A JP 8526859A JP 52685996 A JP52685996 A JP 52685996A JP H11501909 A JPH11501909 A JP H11501909A
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- salt
- cation
- anions
- anion
- energy
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C317/00—Sulfones; Sulfoxides
- C07C317/02—Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms
- C07C317/04—Sulfones; Sulfoxides having sulfone or sulfoxide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
- C07C25/18—Polycyclic aromatic halogenated hydrocarbons
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F17/00—Metallocenes
- C07F17/02—Metallocenes of metals of Groups 8, 9 or 10 of the Periodic Table
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerization Catalysts (AREA)
- Polymerisation Methods In General (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
- Heterocyclic Compounds Containing Sulfur Atoms (AREA)
- Nitrogen- Or Sulfur-Containing Heterocyclic Ring Compounds With Rings Of Six Or More Members (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.エネルギー活性塩であって、しかも該エネルギー活性塩は、 (1)(a)有機金属カチオン〔但し、該有機金属カチオンは、(i)アレーン またはシクロペンタジエニル配位子を基材とする置換または無置換芳香族化合物 、および(ii)遷移金属原子を含む〕、(b)I-、P-、C-、およびS-中心有機オ ニウムカチオン、または(c)それらの混合物、のうちの少なくとも1つを含むカ チオンと、 (2)該カチオンの電荷を中和するのに十分な数のアニオン〔但し、該アニオ ンは、トリス-(高フッ素化アルキルスルホニル)メチド、トリス-(フッ素化アリ ールスルホニル)メチド、ビス-(高フッ素化アルキルスルホニル)イミド、ビス-( フッ素化アリールスルホニル)イミド、混合アリール-およびアルキルスルホニル イミドならびにメチド、更にそれらの任意の組合せを含む〕とを含み、 かつ、ジアゾニウム塩、アンモニウム塩、または単純金属塩ではない前記エネ ルギー活性塩。 2.前記塩が感光性塩である請求項1に記載の化合物。 3.前記塩が感熱性塩である請求項1に記載の化合物。 4.前記塩が、式: (RfSO2)3C- または (RfSO2)2N- [式中、各Rfは高フッ素化もしくは過フッ素化アルキル基またはフッ素化アリー ル基から成る群より独立に選ばれ、任意の2つのRf基の組合せが連結して橋を形 成する場合は環状であってもよく、Rfアルキル鎖は1〜20個の炭素原子を含有し 、直鎖、分枝鎖、または環状であってもよく、かつ二価酸素、三価窒素、または 六価硫黄がその骨格鎖中に割り込んでいてもよく、更に、Rfが環状構造を含有す る場合、該構造は5個または6個の環構成原子を含むが、このうちの 1つまたは2つはヘテロ原子であってもよい〕 のうちの1つで表されるアニオンを含む請求項1に記載の化合物。 5.前記塩が、(C2F6SO2)2N-、(C4F9SO2)2N-、(C8F17SO2)3C-、(CF3SO2)3C-、 (CF3SO2)2N-、(C4F9SO2)3C-、(CF3SO2)2(C4F9SO2)C-、(CF3SO2)(C4H9SO2)N-、[( CF3)2NC2F4SO2]2N-、(CF3)2NC2F4SO2C-(SO2CF3)2、(3,5-ビス(CF3)C6H3)SO2N-SO2 CF3、 C6F5SO2C-(SO2CF3)2、C6F5SO2N-SO2CF3のうちの少なくとも1つを含む請求項4に 記載の化合物。 6.前記カチオンが有機オニウムカチオンであり、脂肪族または芳香族の第IV A族〜第VIIA族(CAS表記)中心オニウム塩を含み、しかもアリールは、無置換芳 香族部分、または独立に選ばれる4個までの置換基を有する置換芳香族部分であ り、アリール環の置換基は、30個未満の炭素原子と、N、S、過酸化物以外のO、P 、As、Si、Sn、B、Ge、Te、またはSeから選ばれる10個までのヘテロ原子とを含 有する請求項1に記載の化合物。 7.前記カチオンが脂肪族または芳香族のI-、S-、P-、またはC-中心オニウム 塩を含む請求項6に記載の化合物。 8.前記アニオンが(CF3SO2)2N-アニオン、(CF3SO2)3C-アニオン、 および(C4F9SO2)3C-アニオンのうちの少なくとも1つであり、かつ前記カチオン がジフェニルヨードニウム、ジトリルヨードニウム、ジドデシルフェニルヨード ニウム、(4-オクチルオキシフェニル)フェニルヨードニウム、およびビス(メト キシフェニル)ヨードニウムのうちの少なくとも1つである請求項6に記載の化合 物。 9.前記アニオンが(CF3SO2)2N-アニオン、(CF3SO2)3C-アニオン、および(C4F9 SO2)3C-アニオンのうちの少なくとも1つであり、かつ前記カチオンがトリフェ ニルスルホニウム、ジフェニル-4-チオフェノキシフェニルスルホニウム、およ び1,4-フェニレン-ビス(ジフェニルスルホニウム)のうちの少なくとも1つである 請求項6に記載の化合物。 10.前記カチオンが金属水素化物または金属アルキル官能基を実質的に含ま ない有機金属錯体カチオンであり、かつ式: [(L1)(L2)M]+q 〔式中、 Mは、Cr、Mo、W、Mn、Re、Fe、Ru、Os、Co、Rh、Ir、Pd、Pt、およびNiから成 る群より選ばれた金属であり; L1は、置換および無置換のシクロペンタジエニル、シクロヘキサジエニル、お よびシクロヘプタトリエニル、シクロヘプタトリエン、シクロオクタテトラエン 、複素環式化合物および芳香族化合物(置換または無置換アレーン化合物から選 ばれる)および2個〜4個の縮合環を有する化合物、ならびにポリマーの構成単位 から成る群より選ばれる同一または異なる配位子であってもよい1個または2個の 環式多不飽和配位子であり、かつ各配位子はMの原子価殻に3個〜8個の電子を供 与することができ; L2は存在しないか、または一酸化炭素、ケトン、オレフィン、エーテル、ニト ロソニウム、ホスフィン、ホスフィット、ならびに砒 素およびアンチモンの関連誘導体、オルガノニトリル、アミン、アルキン、イソ ニトリル、二窒素から成る群より選ばれる同一または異なる配位子であってもよ い偶数個の電子を供与する1個〜3個の非アニオン配位子であるが、Mに供与され る全電荷は該錯体に対して正味の残留正電荷qを生成することを条件とし; qは1または2の値を有する整数で、該錯体カチオンの残留電荷を表す〕 で表される請求項1に記載の化合物。 11.前記カチオンが、有機金属カチオン〔但し、MはCr、Mo、W、Mn、Fe、Ru 、Co、Pd、およびNiから成る群より選ばれる金属である〕 である請求項10に記載の化合物。 12.前記アニオンが(CF3SO2)2N-アニオン、(CF3SO2)3C-アニオン、および(C4 F9SO2)3C-アニオンのうちの少なくとも1つであり、かつ前記カチオンがビス(η5 -シクロペンタジエニル)鉄(1+)、ビス(η5-メチルシクロペンタジエニル)鉄(1+ )、(η5-シクロペンタジエニル)(η5-メチルシクロペンタジエニル)鉄(1+)、お よびビス(η5-トリメチルシリルシクロペンタジエニル)鉄(1+)のうちの少なくと も1つである請求項10に記載の化合物。 13.前記アニオンが(CF3SO2)2N-アニオン、(CF3SO2)3C-アニオン、および(C4 F9SO2)3C-アニオンのうちの少なくとも1つであり、かつ前記カチオンがビス(η6 -キシレン)鉄(2+)、ビス(η6-メシチレン)鉄(2+)、ビス(η6-ジュレン)鉄(2+) 、ビス(η6-ペンタメチルベンゼン)鉄(2+)、およびビス(η6-ドデシルベンゼン) 鉄(2+)のうちの少なくとも1つである請求項10に記載の化合物。 14.前記アニオンが(CF3SO2)2N-アニオン、(CF3SO2)3C-アニオン、および(C4 F9SO2)3C-アニオンのうちの少なくとも1つであり、かつ前記カチオンが(η5-シ クロペンタジエニル)(η6-キシレン)鉄 (1+)、(η5-シクロペンタジエニル)(η6-トルエン)鉄(1+)、(η5-シクロペンタ ジエニル)(η6-メシチレン)鉄(1+)、(η5-シクロペンタジエニル)(η6-ピレン) 鉄(1+)、(η5-シクロペンタジエニル)(η6-ナフタレン)鉄(1+)、および(η5-シ クロペンタジエニル)(η6-ドデシルフェニル)鉄(1+)のうちの少なくとも1つであ る請求項10に記載の化合物。 15.光増感剤または光促進剤を更に含む請求項1に記載の化合物。 16.有機溶剤中の感光性化合物〔但し、該感光性化合物は請求項1に記載の エネルギー活性塩である〕。 17.前記感光性化合物が、重合性化合物を重合するための光触媒または光開 始剤を含み、しかも該重合性化合物もまた前記有機溶剤中に存在し、かつ前記エ ネルギー活性塩が、(a)高フッ素化アルキルスルホニルメチド、(b)フッ素化 アリールスルホニルメチド、(c)高フッ素化アルキルスルホニルイミド、また は(d)フッ素化アリールスルホニルイミドアニオン、(e)混合アリール-およ びアルキルスルホニルイミドおよびメチド、ならびに(f)それらの任意の組合 せ、のジアゾニウム塩を更に含む請求項16に記載の、有機溶剤中の感光性化合物 。 18.前記感光性化合物が、(a)高フッ素化アルキルスルホニルメチド、(b )フッ素化アリールスルホニルメチド、(c)高フッ素化アルキルスルホニルイ ミド、または(d)フッ素化アリールスルホニルイミド、(e)混合アリール-お よびアルキルスルホニルイミドおよびメチド、ならびに(f)それらの任意の組 合せから成る群より選ばれるアニオンを含有するカチオン色素によって分光増感 される、有機溶剤中の請求項2に記載の感光性化合物。 19.有機溶剤中のエネルギー活性化合物〔但し、該エネルギー 活性化合物は請求項1に記載のエネルギー活性塩である〕。 20.請求項1に記載のエネルギー活性塩と1つ以上の単量体とを含む硬化性組 成物であって、しかも該エネルギー活性塩がエネルギーにより活性化されること に伴って放出される種によって、該硬化性組成物の硬化が開始または触媒され、 かつ該エネルギー活性塩が、(a)高フッ素化アルキルスルホニルメチド、(b) フッ素化アリールスルホニルメチド、(c)高フッ素化アルキルスルホニルイミ ド、または(d)フッ素化アリールスルホニルイミドアニオン、(e)混合アリー ル-およびアルキルスルホニルイミドおよびメチド、ならびに(f)それらの任意 の組合せ、のジアゾニウム塩を更に含む前記硬化性組成物。 21.前記単量体(1つまたは複数)が、(1)カチオン付加重合または(2) 酸触媒段階成長重合により重合可能である請求項20に記載の硬化性組成物。 22.前記単量体がエチレン性不飽和遊離基重合性単量体から成る群より選ば れる請求項20に記載の硬化性組成物。 23.前記単量体がエポキシドおよびビニルエーテル単量体から成る群より選 ばれる請求項20に記載の硬化性組成物。 24.導電性粒子および任意に熱可塑性樹脂を更に含み、かつ前記単量体がエ ポキシ樹脂である請求項20に記載の硬化性組成物。 25.導電性接着剤〔但し、該導電性接着剤は、請求項24に記載の硬化性組成 物をエネルギーで活性化して硬化させることにより調製される〕。 26.前記単量体がエレクトロニクス等級のエポキシ樹脂である請求項24に記 載の硬化性組成物。 27.非腐食性接着剤または塗料〔但し、該非腐食性接着剤または塗料は、請 求項20に記載の硬化性組成物をエネルギーで活性化し て硬化させることにより調製される〕。 28.(1)本質的にHFを含まないCF3SO2Fを使用する工程〔但し、該CF3SO2F は1モル%未満のHFを含有する〕と、 (2)試薬および反応器から本質的にすべての痕跡量の水を除去する工程と、 (3)毎分全容量の5%未満のCF3SO2Fの速度で、化学量論的に過剰のCF3SO2Fを メチルグリニャール溶液に添加する工程と、 (4)工程(3)の生成物を精製する工程と、 を含む、(CF3SO2)3C-アニオンの直接合成方法。 29.工程(1)が、トリブチルアミンまたは他の非求核性塩基を用いたCF3SO2 Fの洗浄を更に含む請求項28に記載の方法。 30.工程(4)が、水溶液からのテトラメチルアンモニウム塩の析出、熱メ タノールへの析出物の再溶解、更なる水の添加による生成物塩の二度目の結晶化 、蒸留によるすべてのメタノールの除去、濾過、生成物塩の所望の純度が得られ るまでのこうした手順の繰り返しによる工程(3)の生成物の再結晶を更に含む 請求項28に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US39860695A | 1995-03-06 | 1995-03-06 | |
US08/558,245 US5554664A (en) | 1995-03-06 | 1995-11-17 | Energy-activatable salts with fluorocarbon anions |
US08/558,245 | 1995-11-17 | ||
US08/398,606 | 1995-11-17 | ||
PCT/US1996/001634 WO1996027584A1 (en) | 1995-03-06 | 1996-02-05 | Energy-activatable salts with fluorocarbon anions |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11501909A true JPH11501909A (ja) | 1999-02-16 |
JP3985020B2 JP3985020B2 (ja) | 2007-10-03 |
Family
ID=27016295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52685996A Expired - Lifetime JP3985020B2 (ja) | 1995-03-06 | 1996-02-05 | フルオロカーボンアニオンを有するエネルギー活性塩 |
Country Status (9)
Country | Link |
---|---|
US (1) | US5554664A (ja) |
EP (1) | EP0813521B1 (ja) |
JP (1) | JP3985020B2 (ja) |
KR (1) | KR100436804B1 (ja) |
CN (1) | CN1177346A (ja) |
AU (1) | AU4776696A (ja) |
CA (1) | CA2213465A1 (ja) |
DE (1) | DE69610294T2 (ja) |
WO (1) | WO1996027584A1 (ja) |
Cited By (29)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH10226707A (ja) * | 1996-10-03 | 1998-08-25 | Alain Vallee | ポリイオン性ポリマー化合物、その製造方法及び光開始剤としての使用 |
JP2002268223A (ja) * | 2001-03-12 | 2002-09-18 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
JP2002341539A (ja) * | 2001-03-12 | 2002-11-27 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
JP2003215791A (ja) * | 2002-01-18 | 2003-07-30 | Central Glass Co Ltd | 超強酸オニウム塩化合物および感放射線性樹脂組成物 |
US6777160B2 (en) | 2001-03-12 | 2004-08-17 | Fuji Photo Film Co., Ltd. | Positive-working resist composition |
EP1635218A2 (en) | 2004-09-14 | 2006-03-15 | Fuji Photo Film Co., Ltd. | Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition |
JP2006509917A (ja) * | 2002-12-16 | 2006-03-23 | スリーエム イノベイティブ プロパティズ カンパニー | 銅配線の電気化学的または化学的沈着のためのメッキ溶液およびその方法 |
EP1684116A2 (en) | 2005-01-24 | 2006-07-26 | Fuji Photo Film Co., Ltd. | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition |
EP1688791A2 (en) | 2005-01-28 | 2006-08-09 | Fuji Photo Film Co., Ltd. | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition |
EP1975712A2 (en) | 2007-03-28 | 2008-10-01 | FUJIFILM Corporation | Positive resist composition and pattern forming method using the same |
EP2034361A2 (en) | 2005-05-23 | 2009-03-11 | Fujifilm Corporation | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition |
WO2009038148A1 (ja) | 2007-09-21 | 2009-03-26 | Fujifilm Corporation | 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物 |
EP2042925A2 (en) | 2007-09-28 | 2009-04-01 | FUJIFILM Corporation | Resist composition and pattern-forming method using the same |
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JP2632069B2 (ja) * | 1990-04-17 | 1997-07-16 | 富士写真フイルム株式会社 | 光重合性組成物 |
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- 1996-02-05 JP JP52685996A patent/JP3985020B2/ja not_active Expired - Lifetime
- 1996-02-05 KR KR1019970706195A patent/KR100436804B1/ko not_active IP Right Cessation
- 1996-02-05 CA CA002213465A patent/CA2213465A1/en not_active Abandoned
- 1996-02-05 AU AU47766/96A patent/AU4776696A/en not_active Abandoned
- 1996-02-05 WO PCT/US1996/001634 patent/WO1996027584A1/en active IP Right Grant
- 1996-02-05 CN CN96192280A patent/CN1177346A/zh active Pending
- 1996-02-05 EP EP96903793A patent/EP0813521B1/en not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
---|---|
CA2213465A1 (en) | 1996-09-12 |
KR100436804B1 (ko) | 2004-09-16 |
EP0813521B1 (en) | 2000-09-13 |
JP3985020B2 (ja) | 2007-10-03 |
US5554664A (en) | 1996-09-10 |
DE69610294D1 (de) | 2000-10-19 |
KR19980702788A (ko) | 1998-08-05 |
EP0813521A1 (en) | 1997-12-29 |
CN1177346A (zh) | 1998-03-25 |
DE69610294T2 (de) | 2001-04-12 |
AU4776696A (en) | 1996-09-23 |
WO1996027584A1 (en) | 1996-09-12 |
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