JPH10231355A - Epoxy resin composition for sealing semiconductor - Google Patents
Epoxy resin composition for sealing semiconductorInfo
- Publication number
- JPH10231355A JPH10231355A JP3604997A JP3604997A JPH10231355A JP H10231355 A JPH10231355 A JP H10231355A JP 3604997 A JP3604997 A JP 3604997A JP 3604997 A JP3604997 A JP 3604997A JP H10231355 A JPH10231355 A JP H10231355A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- epoxy resin
- epoxy
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 26
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 26
- 239000000203 mixture Substances 0.000 title claims abstract description 21
- 239000004065 semiconductor Substances 0.000 title claims description 12
- 238000007789 sealing Methods 0.000 title description 2
- 229920002545 silicone oil Polymers 0.000 claims abstract description 24
- 239000011256 inorganic filler Substances 0.000 claims abstract description 20
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 20
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 14
- 239000004721 Polyphenylene oxide Chemical group 0.000 claims abstract description 12
- 229920000570 polyether Chemical group 0.000 claims abstract description 12
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 11
- 239000005011 phenolic resin Substances 0.000 claims abstract description 11
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 10
- 229920001568 phenolic resin Polymers 0.000 claims abstract description 6
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000005538 encapsulation Methods 0.000 claims description 7
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 19
- 239000000843 powder Substances 0.000 abstract description 10
- 239000000377 silicon dioxide Substances 0.000 abstract description 8
- 239000004593 Epoxy Substances 0.000 abstract description 7
- 238000000465 moulding Methods 0.000 abstract description 6
- 229920003986 novolac Polymers 0.000 abstract description 6
- 150000001875 compounds Chemical class 0.000 abstract description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract description 5
- 125000002947 alkylene group Chemical group 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000005476 soldering Methods 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 description 16
- 239000012756 surface treatment agent Substances 0.000 description 13
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229910000679 solder Inorganic materials 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- -1 curing accelerator Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、成形品にボイドが
なく、信頼性、特に耐半田クラック性に優れた半導体封
止用エポキシ樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which has no voids in a molded product and has excellent reliability, particularly excellent solder crack resistance.
【0002】[0002]
【従来の技術】電子製品の軽薄短小化、高密度化、高機
能化及び低価格化のため、半導体パッケージは種々の形
態をとるようになってきている。特に、近年では表面実
装化のため、半導体素子を封止するエポキシ樹脂組成物
(以下、樹脂組成物という)に関しても種々の改良がな
されてきている。エポキシ樹脂、フェノール樹脂硬化
剤、硬化促進剤、無機充填材を主成分とする樹脂組成物
は、特に上記の表面実装対応のために低吸湿化させる必
要があり、無機充填材の配合量は全樹脂組成物中に90
重量%程度までに増加してきている。ところが、無機充
填材が多くなると、樹脂成分と無機充填材とが均一に分
散しにくくなってくる。その結果、このような樹脂組成
物で半導体素子を封止すると、成形品にボイドが多く発
生する欠点が生じる。2. Description of the Related Art Semiconductor packages have come to take various forms in order to make electronic products lighter and thinner, smaller, denser, more functional, and less expensive. In particular, in recent years, various improvements have been made to epoxy resin compositions for encapsulating semiconductor elements (hereinafter referred to as resin compositions) for surface mounting. The resin composition containing epoxy resin, phenolic resin curing agent, curing accelerator, and inorganic filler as main components needs to be made to have low moisture absorption especially for the above surface mounting. 90 in the resin composition
Weight percent. However, when the amount of the inorganic filler increases, it becomes difficult to uniformly disperse the resin component and the inorganic filler. As a result, when a semiconductor element is sealed with such a resin composition, there is a disadvantage that many voids are generated in a molded product.
【0003】樹脂成分と無機充填材とを均一に分散させ
る技術としては、従来、シリコーンオイルを添加する方
法(特公平2−36148号公報)等が有力な手段と考
えられてきた。しかし、これらの手段のみでは分散が不
十分で、その結果として、無機充填材を高充填する樹脂
組成物においては、成形品のボイドの発生を完全に解決
することはできなかった。又、シリコーンオイルの添加
という手段は、接着力の低下や熱時強度の低下を引き起
こすために、耐半田クラック性が低下することも問題で
あった。As a technique for uniformly dispersing a resin component and an inorganic filler, a method of adding a silicone oil (Japanese Patent Publication No. 2-36148) has been considered as an effective means. However, these methods alone are insufficiently dispersed, and as a result, in a resin composition which is highly filled with an inorganic filler, generation of voids in a molded article cannot be completely solved. In addition, the means of adding silicone oil causes a decrease in adhesive strength and a decrease in strength at the time of heating.
【0004】[0004]
【発明が解決しようとする課題】本発明は、成形時に成
形品に発生するボイドを低減し、且つ耐半田クラック性
を向上できる信頼性に優れた半導体封止用エポキシ樹脂
組成物を提供するものである。SUMMARY OF THE INVENTION The present invention provides a highly reliable epoxy resin composition for semiconductor encapsulation capable of reducing voids generated in a molded product during molding and improving solder crack resistance. It is.
【0005】[0005]
【課題を解決するための手段】本発明は、(A)エポキ
シ樹脂、(B)フェノール樹脂硬化剤、(C)硬化促進
剤、(D)無機充填材、及び(E)アルコキシシラン基
又はアルコキシ基、エポキシ基、及びポリエーテル基を
有するシリコーンオイルを必須成分とすることを特徴と
する半導体封止用エポキシ樹脂組成物において、特に、
(E)のシリコーンオイルが、式(1)、式(2)、式
(3)、及び式(4)から選ばれる1種以上のシリコー
ンオイルである半導体封止用エポキシ樹脂組成物であ
る。The present invention comprises (A) an epoxy resin, (B) a phenolic resin curing agent, (C) a curing accelerator, (D) an inorganic filler, and (E) an alkoxysilane group or an alkoxysilane. Group, an epoxy group, and an epoxy resin composition for semiconductor encapsulation characterized by having a silicone oil having a polyether group as an essential component,
The epoxy resin composition for semiconductor encapsulation wherein the silicone oil of (E) is at least one silicone oil selected from the formulas (1), (2), (3) and (4).
【化7】 Embedded image
【0006】[0006]
【化8】 Embedded image
【0007】[0007]
【化9】 Embedded image
【0008】[0008]
【化10】 Embedded image
【0009】[0009]
【発明の実施の形態】以下に本発明を詳細に説明する。
本発明で用いられるエポキシ樹脂としては、エポキシ基
を有するモノマー、オリゴマー及びポリマー全般をい
う。例えば、ビスフェノール型エポキシ化合物、ビフェ
ニル型エポキシ化合物、スチルベン型エポキシ化合物、
オルソクレゾールノボラック型エポキシ樹脂、フェノー
ルノボラック型エポキシ樹脂、トリフェノールメタン型
エポキシ樹脂、アルキル変性トリフェノールメタン型エ
ポキシ樹脂、トリアジン核含有エポキシ樹脂、ジシクロ
ペンタジエン変性エポキシ樹脂等が挙げられる。エポキ
シ樹脂の融点、軟化点、エポキシ当量については特に限
定しない。又、これらは単独でも混合して用いてもよ
い。これらのエポキシ樹脂は、耐湿信頼性のために塩素
イオンやナトリウムイオン等のイオン性不純物が極力少
ないことが望ましい。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
The epoxy resin used in the present invention refers to all monomers, oligomers and polymers having an epoxy group. For example, bisphenol type epoxy compound, biphenyl type epoxy compound, stilbene type epoxy compound,
Orthocresol novolak epoxy resin, phenol novolak epoxy resin, triphenolmethane epoxy resin, alkyl-modified triphenolmethane epoxy resin, triazine nucleus-containing epoxy resin, dicyclopentadiene-modified epoxy resin, and the like. The melting point, softening point, and epoxy equivalent of the epoxy resin are not particularly limited. These may be used alone or as a mixture. It is desirable that these epoxy resins contain as little ionic impurities as chlorine ions and sodium ions for moisture resistance reliability.
【0010】本発明で用いられるフェノール樹脂硬化剤
としては、フェノール性水酸基を有するモノマー、オリ
ゴマー及びポリマー全般をいう。例えば、フェノールノ
ボラック樹脂、クレゾールノボラック樹脂、ジシクロペ
ンタジエン変性フェノール樹脂、キシリレン変性フェノ
ール樹脂、トリフェノールメタン型フェノール樹脂等を
用いることができる。フェノール樹脂の融点、軟化点、
水酸基当量については特に限定しない。又、これらは単
独でも混合して用いてもよい。これらのフェノール樹脂
は、耐湿信頼性のために塩素イオンやナトリウムイオン
等のイオン性不純物が極力少ないことが望ましい。The phenolic resin curing agent used in the present invention refers to all monomers, oligomers and polymers having a phenolic hydroxyl group. For example, a phenol novolak resin, a cresol novolak resin, a dicyclopentadiene-modified phenol resin, a xylylene-modified phenol resin, a triphenolmethane-type phenol resin, or the like can be used. Melting point, softening point,
The hydroxyl group equivalent is not particularly limited. These may be used alone or as a mixture. It is desirable that these phenolic resins contain as little ionic impurities as chlorine ions and sodium ions for moisture resistance reliability.
【0011】本発明で用いられる硬化促進剤としては、
エポキシ基とフェノール性水酸基との反応を促進させる
ものであればよく、一般に封止用材料に使用されている
ものをひろく使用することができる。例えば、1,8−
ジアザビシクロ(5,4,0)ウンデセン−7、トリフ
ェニルホスフィン、テトラフェニルホスホニウム・テト
ラフェニルボレート、ジメチルベンジルアミン、テトラ
フェニルホスホニウム・テトラナフトイックアシッドボ
レート等が挙げられる。これらの硬化促進剤は、単独で
も混合して用いてもよい。又、これらの硬化促進剤は、
フェノール樹脂等に予め溶融混合して用いてもよいし、
樹脂組成物の製造時に単に混合してもよい。The curing accelerator used in the present invention includes:
Any material that promotes the reaction between the epoxy group and the phenolic hydroxyl group may be used, and those generally used as a sealing material can be widely used. For example, 1,8-
Examples thereof include diazabicyclo (5,4,0) undecene-7, triphenylphosphine, tetraphenylphosphonium / tetraphenylborate, dimethylbenzylamine, and tetraphenylphosphonium / tetranaphthoic acid borate. These curing accelerators may be used alone or as a mixture. Also, these curing accelerators
It may be used by being melt-mixed in advance with a phenol resin or the like,
They may be simply mixed during the production of the resin composition.
【0012】本発明で用いられる無機充填材としては、
例えば、溶融シリカ粉末、球状シリカ粉末、結晶シリカ
粉末、2次凝集シリカ粉末、多孔質シリカ粉末、2次凝
集シリカ粉末又は多孔質シリカ粉末を粉砕したシリカ粉
末、アルミナ等が挙げられる。又、無機充填材の形状
は、破砕状でも球状でも問題ない。又、これらの無機充
填材は単独でも混合して用いてもよい。なお、一般的に
は、流動特性、機械強度及び熱的特性のバランスに優れ
た球状溶融シリカ粉末の使用が好ましい。The inorganic filler used in the present invention includes:
For example, fused silica powder, spherical silica powder, crystalline silica powder, secondary aggregated silica powder, porous silica powder, silica powder obtained by pulverizing secondary aggregated silica powder or porous silica powder, alumina and the like can be mentioned. The shape of the inorganic filler may be crushed or spherical. Further, these inorganic fillers may be used alone or in combination. In general, it is preferable to use spherical fused silica powder having an excellent balance of flow characteristics, mechanical strength, and thermal characteristics.
【0013】本発明で用いられるアルコキシシラン基又
はアルコキシ基、エポキシ基、及びポリエーテル基を有
するシリコーンオイルは、本発明における技術上の重要
なポイントであるので詳細に説明する。前述したよう
に、無機充填材の配合量が全樹脂組成物中に90重量%
程度になると、従来の手段だと均一な樹脂組成物を得に
くくなってきている。これらの問題に対して、本発明で
は、アルコキシシラン基又はアルコキシ基、エポキシ
基、及びポリエーテル基を有するシリコーンオイル(以
下、表面処理剤Aという)を用いて、均一な樹脂組成物
を得るものである。本発明で用いる表面処理剤A中のア
ルコキシシラン基又はアルコキシ基は、無機充填材の表
面と化学結合する官能基であり、エポキシ基、及びポリ
エーテル基は、樹脂成分とのなじみ性に優れたものであ
る。通常、シランカップリング剤のみの配合だと、表面
エネルギーが小さいため、無機充填材の表面に効率よく
分散せず、界面でのなじみ向上には十分な効果がない。
これに対し、本発明の表面処理剤Aを用いると、無機充
填材の表面に効率よく分散し、界面でのなじみ向上にも
十分効果が発揮される。The silicone oil having an alkoxysilane or alkoxy group, an epoxy group, and a polyether group used in the present invention will be described in detail because it is an important technical point in the present invention. As described above, the content of the inorganic filler is 90% by weight in the total resin composition.
In such a case, it is becoming difficult to obtain a uniform resin composition by conventional means. In order to solve these problems, in the present invention, a uniform resin composition is obtained by using a silicone oil having an alkoxysilane group or an alkoxy group, an epoxy group, and a polyether group (hereinafter, referred to as a surface treatment agent A). It is. The alkoxysilane group or the alkoxy group in the surface treatment agent A used in the present invention is a functional group chemically bonded to the surface of the inorganic filler, and the epoxy group and the polyether group have excellent compatibility with the resin component. Things. In general, when only a silane coupling agent is used, the surface energy is small, so that it is not efficiently dispersed on the surface of the inorganic filler, and there is no sufficient effect for improving the conformation at the interface.
On the other hand, when the surface treating agent A of the present invention is used, it is efficiently dispersed on the surface of the inorganic filler, and the effect of improving the conformation at the interface is sufficiently exerted.
【0014】表面処理剤Aとしては、特に、式(1)、
式(2)、式(3)、及び式(4)の構造で示されるも
のが好ましい。式(1)、式(2)、式(3)、及び式
(4)中のアルコキシシラン基としては、メトキシシラ
ン、エトキシシランが好ましく、又アルコキシ基として
は、メトキシ、エトキシがより好ましい。式(1)、式
(2)、式(3)、及び式(4)中のエポキシ基として
は、構造式の中のBの構造のものが好ましく、又ポリエ
ーテル基としては、ポリエチレンオキサイド又はポリプ
ロピレンオキサイド、更にはポリエチレンオキサイドと
ポリプロピレンオキサイドのコポリマーが好ましい。更
に、シリコーンオイルの主鎖中の平均重合度N(N=n
+a+b+c+2)は、5≦N≦300で、Nが5未満
だと、アルコキシシラン基又はアルコキシ基、エポキシ
基、及びポリエーテル基を含まないシリコーンオイルが
高い割合で存在することになり、無機充填材への反応性
や樹脂成分とのなじみ性が損なわれ、成形時に成形品の
ボイドが多くなるので好ましくない。一方、300を越
えると、無機充填材表面に均一に分散できないため、樹
脂成分とのなじみ改善効果が不十分で、ボイド低減効果
が小さくなるので好ましくない。As the surface treatment agent A, in particular, the formula (1):
What is shown by the structure of Formula (2), Formula (3), and Formula (4) is preferable. In formulas (1), (2), (3) and (4), the alkoxysilane group is preferably methoxysilane or ethoxysilane, and the alkoxy group is more preferably methoxy or ethoxy. The epoxy group in the formulas (1), (2), (3) and (4) preferably has a structure of B in the structural formula, and the polyether group includes polyethylene oxide or Polypropylene oxide, and more preferably a copolymer of polyethylene oxide and polypropylene oxide, is preferred. Further, the average degree of polymerization N in the main chain of the silicone oil (N = n
+ A + b + c + 2) is 5 ≦ N ≦ 300, and if N is less than 5, a high proportion of silicone oil containing no alkoxysilane group or alkoxy group, epoxy group and polyether group is present, and inorganic filler This is not preferred because the reactivity with the resin and the compatibility with the resin component are impaired, and voids in the molded article increase during molding. On the other hand, if it exceeds 300, it cannot be uniformly dispersed on the surface of the inorganic filler, so that the effect of improving compatibility with the resin component is insufficient, and the effect of reducing voids is undesirably reduced.
【0015】表面処理剤Aの配合量は、無機充填材10
0重量部に対し、0.01〜5重量部が好ましい。0.
01未満だと表面処理剤としての添加効果が少なく、ボ
イドの低減効果も小さい。5重量部を越えると吸湿率が
増加して、耐半田クラック性が著しく低下する。式
(1)中のアルコキシシラン基、エポキシ基、及びポリ
エーテル基を有するシリコーンオイル、又はアルコキシ
基、エポキシ基、及びポリエーテル基を有するシリコー
ンオイルは、単独でも混合して用いてもよい。式
(2)、式(3)、及び式(4)のシリコーンオイルに
ついても同様である。又、式(1)、式(2)、式
(3)、及び式(4)から選ばれる1種以上のシリコー
ンオイルは、混合して用いてもよい。更に、式(1)、
式(2)、式(3)、及び式(4)で示されるシリコー
ンオイルと、式(5)及び式(6)で示されるシランカ
ップリング剤(以下、表面処理剤Bという)とを併用し
てもよい。併用することにより、成形品の強度及び耐半
田クラック性が向上する。併用する場合、表面処理剤A
と表面処理剤Bの割合は特に限定しないが、表面処理剤
A100重量部に対し表面処理剤Bは1000重量部以
下が望ましい。1000重量部を越えると吸湿率が上昇
し、耐半田クラック性が低下する傾向にある。表面処理
剤A、表面処理剤Bの添加方法についても特に限定しな
い。表面処理剤A、又は表面処理剤Aと表面処理剤Bの
混合物と無機充填材の反応率については特に限定しな
い。The amount of the surface treatment agent A is determined by the amount of the inorganic filler 10
0.01 to 5 parts by weight with respect to 0 parts by weight is preferred. 0.
When it is less than 01, the effect of addition as a surface treatment agent is small, and the effect of reducing voids is small. If the amount exceeds 5 parts by weight, the moisture absorption rate increases, and the solder crack resistance remarkably decreases. The silicone oil having an alkoxysilane group, an epoxy group, and a polyether group in the formula (1) or the silicone oil having an alkoxy group, an epoxy group, and a polyether group may be used alone or as a mixture. The same applies to the silicone oils of the formulas (2), (3) and (4). One or more silicone oils selected from the formulas (1), (2), (3), and (4) may be used as a mixture. Further, equation (1),
Using the silicone oils represented by the formulas (2), (3) and (4) in combination with the silane coupling agents represented by the formulas (5) and (6) (hereinafter referred to as surface treatment agent B) May be. The combined use improves the strength and solder crack resistance of the molded product. When used in combination, surface treatment agent A
The ratio between the surface treatment agent B and the surface treatment agent B is not particularly limited, but the surface treatment agent B is desirably 1,000 parts by weight or less based on 100 parts by weight of the surface treatment agent A. If it exceeds 1000 parts by weight, the moisture absorption rate tends to increase, and the solder crack resistance tends to decrease. The method of adding the surface treatment agent A and the surface treatment agent B is not particularly limited. The reaction rate of the surface treating agent A or a mixture of the surface treating agent A and the surface treating agent B with the inorganic filler is not particularly limited.
【化11】 Embedded image
【0016】[0016]
【化12】 Embedded image
【0017】本発明の樹脂組成物は、(A)〜(E)成
分、又は(A)〜(F)成分を必須成分とするが、これ
以外に必要に応じて、ブロム化エポキシ樹脂、三酸化ア
ンチモン、ヘキサブロムベンゼン等の難燃剤、カーボン
ブラック、ベンガラ等の着色剤、離型剤等種々の添加剤
を適宜配合しても差し支えない。又、本発明の樹脂組成
物は、(A)〜(E)成分、又は(A)〜(F)成分、
その他の添加剤をミキサー等を用いて十分に均一に混合
した後、更に熱ロール又はニーダー等で溶融混練し、冷
却後粉砕して製造することができる。これらの樹脂組成
物は、電子部品或いは電気部品の封止、被覆、絶縁等に
適用することができる。The resin composition of the present invention comprises the components (A) to (E) or the components (A) to (F) as essential components. Various additives such as a flame retardant such as antimony oxide and hexabromobenzene, a colorant such as carbon black and red iron, and a release agent may be appropriately blended. Further, the resin composition of the present invention comprises the components (A) to (E), or the components (A) to (F),
After sufficiently mixing the other additives uniformly using a mixer or the like, the mixture can be melt-kneaded with a hot roll or a kneader or the like, cooled, and pulverized, followed by production. These resin compositions can be applied to sealing, coating, insulating and the like of electronic parts or electric parts.
【0018】[0018]
【実施例】以下に本発明を実施例で示す。配合割合の単
位は重量部とする。 実施例1 ビフェニル型エポキシ化合物(油化シェルエポキシ(株)・製 YX4000 H、エポキシ当量195) 9.6重量部 フェノールアラルキル樹脂(三井東圧化学(株)・製 XL−225LL、水 酸基当量175) 7.4重量部 1,8−ジアザビシクロ(5,4,0)ウンデセン−7(以下、DBUという ) 0.2重量部 球状シリカ(平均粒径20μm) 79.5重量部 シリコーンオイルS−1 0.5重量部 臭素化フェノールノボラック型エポキシ樹脂 1.0重量部 三酸化アンチモン 1.0重量部 カーボンブラック 0.3重量部 カルナバワックス 0.5重量部 をミキサーを用いて常温で混合し、50〜130℃で二
軸ロールを用いて混練し、冷却後粉砕し、タブレット化
して樹脂組成物を得た。この樹脂組成物を以下に示す方
法で評価した。結果を表4に示す。シリコーンオイルS
−1の構造は表1に示す。表1中の式(1)〜式(4)
の基本構造は前述した通りである。The present invention will be described below by way of examples. The unit of the compounding ratio is parts by weight. Example 1 Biphenyl epoxy compound (YX4000 H manufactured by Yuka Shell Epoxy Co., Ltd., epoxy equivalent: 195) 9.6 parts by weight Phenol aralkyl resin (XL-225LL manufactured by Mitsui Toatsu Chemicals, Inc., hydroxyl equivalent) 175) 7.4 parts by weight 1,8-diazabicyclo (5,4,0) undecene-7 (hereinafter referred to as DBU) 0.2 part by weight Spherical silica (average particle diameter 20 μm) 79.5 parts by weight Silicone oil S- 1 0.5 part by weight Brominated phenol novolak type epoxy resin 1.0 part by weight Antimony trioxide 1.0 part by weight Carbon black 0.3 part by weight Carnauba wax 0.5 part by weight was mixed at room temperature using a mixer, The mixture was kneaded at 50 to 130 ° C. using a biaxial roll, cooled, pulverized, and tabletted to obtain a resin composition. This resin composition was evaluated by the following method. Table 4 shows the results. Silicone oil S
Table 1 shows the structure of -1. Equations (1) to (4) in Table 1
Is as described above.
【0019】評価方法 ボイド:低圧トランスファー成形金型を用いて160p
QFP成形テストを行った。成形温度175℃、圧力7
0kgf/cm2、硬化時間120秒で成形したパッケ
ージのボイドを超音波探傷機を用いて観察し、○、△、
×の3段階で評価した。 耐半田クラック性:低圧トランスファー成形金型を用い
て成形温度175℃、圧力70kgf/cm2、硬化時
間120秒で80pQFP(1.5mm厚、チップサイ
ズ9×9mm)のパッケージを成形し、175℃、8時
間の後硬化を行ない、8個のパッケージを得た。このパ
ッケージを85℃、相対湿度60%の恒温恒湿槽内に1
68時間放置した後、240℃のIRリフロー処理を行
った。処理後のパッケージ内部の剥離を超音波探傷機を
用いて観察し、8個のパッケージ中のクラックの発生し
ているパッケージの個数で耐半田クラック性を評価し
た。Evaluation method Void: 160p using a low pressure transfer molding die
A QFP molding test was performed. Molding temperature 175 ° C, pressure 7
Observation of voids of the package molded at 0 kgf / cm 2 and curing time of 120 seconds using an ultrasonic flaw detector.
The evaluation was made in three stages of x. Solder cracking resistance: Using a low-pressure transfer molding die, a package of 80 pQFP (1.5 mm thick, chip size 9 × 9 mm) was molded at a molding temperature of 175 ° C., a pressure of 70 kgf / cm 2 , and a curing time of 120 seconds. After curing for 8 hours, 8 packages were obtained. Place this package in a thermo-hygrostat at 85 ° C and 60% relative humidity.
After standing for 68 hours, an IR reflow treatment at 240 ° C. was performed. The peeling inside the package after the treatment was observed using an ultrasonic flaw detector, and the solder crack resistance was evaluated based on the number of cracked packages in the eight packages.
【0020】実施例2〜21、比較例1〜4 表4〜6に示した配合で、実施例1と同様に樹脂組成物
を作製し、実施例1と同様にして評価した。結果を表4
〜6に示す。実施例2〜21、比較例1〜3に用いたシ
リコーンオイルの構造については、表1〜3に示す。表
1〜3中の式(1)〜式(4)の基本構造は前述した通
りである。表1〜3中の(I)〜(V)の構造を下記に
示す。実施例14〜17で用いたシランカップリング剤
を下記の式(7)〜式(10)に示す。比較例4で用い
たシリコーンオイルS−17を下記の式(S−17)に
示す。Examples 2 to 21 and Comparative Examples 1 to 4 Resin compositions were prepared in the same manner as in Example 1 with the formulations shown in Tables 4 to 6, and evaluated in the same manner as in Example 1. Table 4 shows the results
To # 6. Tables 1 to 3 show the structures of the silicone oils used in Examples 2 to 21 and Comparative Examples 1 to 3. The basic structures of Formulas (1) to (4) in Tables 1 to 3 are as described above. The structures of (I) to (V) in Tables 1 to 3 are shown below. The silane coupling agents used in Examples 14 to 17 are shown in the following formulas (7) to (10). The silicone oil S-17 used in Comparative Example 4 is shown in the following formula (S-17).
【表1】 [Table 1]
【0021】[0021]
【表2】 [Table 2]
【0022】[0022]
【表3】 [Table 3]
【0023】[0023]
【表4】 [Table 4]
【0024】[0024]
【表5】 [Table 5]
【0025】[0025]
【表6】 [Table 6]
【0026】[0026]
【化13】 Embedded image
【0027】[0027]
【化14】 Embedded image
【0028】[0028]
【化15】 Embedded image
【0029】[0029]
【発明の効果】本発明の樹脂組成物を用いることによ
り、ボイド性が少なく、耐半田クラック性に優れた信頼
性の高い半導体装置を得ることができる。By using the resin composition of the present invention, it is possible to obtain a highly reliable semiconductor device having little void property and excellent solder crack resistance.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C08L 83/06 C08L 83/06 H01L 23/29 H01L 23/30 R 23/31 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification code FI C08L 83/06 C08L 83/06 H01L 23/29 H01L 23/30 R 23/31
Claims (3)
樹脂硬化剤、(C)硬化促進剤、(D)無機充填材、及
び(E)アルコキシシラン基又はアルコキシ基、エポキ
シ基、及びポリエーテル基を有するシリコーンオイルを
必須成分とすることを特徴とする半導体封止用エポキシ
樹脂組成物。(A) an epoxy resin, (B) a phenolic resin curing agent, (C) a curing accelerator, (D) an inorganic filler, and (E) an alkoxysilane or alkoxy group, an epoxy group, and a polyether. An epoxy resin composition for semiconductor encapsulation, comprising a silicone oil having a group as an essential component.
エポキシ基、及びポリエーテル基を有するシリコーンオ
イルが、式(1)、式(2)、式(3)、及び式(4)
から選ばれる1種以上である請求項1記載の半導体封止
用エポキシ樹脂組成物。 【化1】 【化2】 【化3】 【化4】 2. An alkoxysilane group or an alkoxy group,
The silicone oil having an epoxy group and a polyether group has the formula (1), the formula (2), the formula (3), and the formula (4)
The epoxy resin composition for semiconductor encapsulation according to claim 1, which is at least one member selected from the group consisting of: Embedded image Embedded image Embedded image Embedded image
樹脂硬化剤、(C)硬化促進剤、(D)無機充填材、及
び(E)式(1)、式(2)、式(3)及び式(4)か
ら選ばれる1種以上のアルコキシシラン基又はアルコキ
シ基、エポキシ基、及びポリエーテル基を有するシリコ
ーンオイル、及び(F)式(5)及び式(6)から選ば
れる1種以上のシランカップリング剤を必須成分とする
ことを特徴とする半導体封止用エポキシ樹脂組成物。 【化5】 【化6】 3. An epoxy resin (A), a phenol resin curing agent (B), a curing accelerator (C), an inorganic filler (D), and (E) formulas (1), (2) and (3). ) And a silicone oil having at least one alkoxysilane or alkoxy group selected from formula (4), an epoxy group and a polyether group, and (F) one selected from formulas (5) and (6) An epoxy resin composition for semiconductor encapsulation comprising the above silane coupling agent as an essential component. Embedded image Embedded image
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3604997A JPH10231355A (en) | 1997-02-20 | 1997-02-20 | Epoxy resin composition for sealing semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3604997A JPH10231355A (en) | 1997-02-20 | 1997-02-20 | Epoxy resin composition for sealing semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10231355A true JPH10231355A (en) | 1998-09-02 |
Family
ID=12458867
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3604997A Withdrawn JPH10231355A (en) | 1997-02-20 | 1997-02-20 | Epoxy resin composition for sealing semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH10231355A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100630412B1 (en) * | 1998-12-31 | 2006-12-13 | 주식회사 케이씨씨 | Mold Reset Epoxy Resin Composition_ |
JP2008201906A (en) * | 2007-02-20 | 2008-09-04 | Nitto Denko Corp | Epoxy resin composition for sealing semiconductors and semiconductor using the same |
WO2023120739A1 (en) * | 2021-12-24 | 2023-06-29 | 株式会社レゾナック | Epoxy resin composition and electronic component device |
-
1997
- 1997-02-20 JP JP3604997A patent/JPH10231355A/en not_active Withdrawn
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100630412B1 (en) * | 1998-12-31 | 2006-12-13 | 주식회사 케이씨씨 | Mold Reset Epoxy Resin Composition_ |
JP2008201906A (en) * | 2007-02-20 | 2008-09-04 | Nitto Denko Corp | Epoxy resin composition for sealing semiconductors and semiconductor using the same |
WO2023120739A1 (en) * | 2021-12-24 | 2023-06-29 | 株式会社レゾナック | Epoxy resin composition and electronic component device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0953603B1 (en) | Flame retardant semiconductor encapsulating epoxy resin compositions | |
JP4779270B2 (en) | Method for producing epoxy resin composition for semiconductor encapsulation | |
JP3714399B2 (en) | Epoxy resin composition for semiconductor encapsulation and semiconductor device | |
JPH10316838A (en) | Epoxy resin composition for sealing semiconductor | |
JPH10168282A (en) | Semiconductor sealing epoxy resin composition | |
JPH10231355A (en) | Epoxy resin composition for sealing semiconductor | |
JP3003887B2 (en) | Resin composition for semiconductor encapsulation | |
JPH10287794A (en) | Epoxy resin composition for semiconductor sealing | |
JPH10279667A (en) | Epoxy resin composition for semiconductor sealing | |
JPH10226721A (en) | Epoxy resin composition for semiconductor sealing | |
JP2991849B2 (en) | Epoxy resin composition | |
JPH10251520A (en) | Epoxy resin composition for sealing semiconductor | |
JP2002241581A (en) | Epoxy resin composition and semiconductor device | |
JPH10212394A (en) | Epoxy resin composition for semiconductor sealing | |
JP2925905B2 (en) | Epoxy resin composition | |
JPH11147937A (en) | Epoxy resin composition and semiconductor device | |
JPH10168162A (en) | Epoxy resin composition for semiconductor sealing | |
JP3308381B2 (en) | Epoxy resin composition | |
JPH10237273A (en) | Epoxy resin composition | |
JP4794706B2 (en) | Epoxy resin composition and semiconductor device | |
JP3310447B2 (en) | Epoxy resin composition | |
JP3310446B2 (en) | Epoxy resin composition | |
JP2003064157A (en) | Epoxy resin composition and semiconductor device | |
JP4040370B2 (en) | Epoxy resin composition and semiconductor device | |
JP2001253999A (en) | Epoxy resin molding material and semiconductor device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Effective date: 20050915 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20050922 |
|
A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20051115 |