JPH086027A - Transfer device of rugged pattern to oriented film - Google Patents
Transfer device of rugged pattern to oriented filmInfo
- Publication number
- JPH086027A JPH086027A JP6143659A JP14365994A JPH086027A JP H086027 A JPH086027 A JP H086027A JP 6143659 A JP6143659 A JP 6143659A JP 14365994 A JP14365994 A JP 14365994A JP H086027 A JPH086027 A JP H086027A
- Authority
- JP
- Japan
- Prior art keywords
- alignment film
- mold member
- transfer device
- uneven pattern
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、液晶用基板などの配向
膜を形成する際に好適に使用できる凹凸模様の転写装置
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transfer device for an uneven pattern which can be suitably used when forming an alignment film such as a liquid crystal substrate.
【0002】液晶素子を構成する基板の内面には、液晶
を所定の方向に配向させるために配向膜が形成されてい
る。この配向膜としては、従来、ラビング布を配向膜準
備層(樹脂膜)の表面に擦り付けて特定の配向処理を行
うラビング処理を施したものなどが広く用いられてい
た。しかしながらこのラビング処理は、発塵を伴う処理
であり、処理時に配向膜の表面が塵埃で汚染され易く、
この汚染により配向膜の配向性が損なわれる問題があっ
た。An alignment film is formed on the inner surface of a substrate that constitutes a liquid crystal element in order to align the liquid crystal in a predetermined direction. As the alignment film, conventionally, a rubbing cloth which has been rubbed with a surface of an alignment film preparation layer (resin film) to perform a specific alignment treatment has been widely used. However, this rubbing process is a process involving dust generation, and the surface of the alignment film is easily contaminated with dust during the process.
There is a problem that the alignment property of the alignment film is impaired by this contamination.
【0003】そこで本発明者らはこのような問題に対処
するために、スタンプ法によって配向膜を形成すること
を検討し、種々の開発と研究を行っている。液晶用基板
の配向膜は、ガラス等からなる剛性の高い基板本体の表
面に設けられており、しかも液晶素子の駆動電圧を小と
するために通常は厚さ1μm以下というように極めて薄
く形成されているので、柔軟で厚いプラスチックフィル
ムに凹凸模様を形成する場合などように、単に型を押し
付けるだけの操作では良好な凹凸模様を形成することは
できない問題がある。即ち、薄い配向膜の表面に凹凸模
様を形成するためには、配向膜となる樹脂製の配向膜準
備層に均一な圧力で正確に型を押し付けることが必要で
ある。そのためには、プレス装置で押し付けを行う場合
に、プレス装置のダイプレートやダイセットの面平坦性
や平行度を高め、型を配向膜準備層に圧接する際の面内
圧力分布を均一にすることが必要である。In order to address such a problem, the present inventors have studied the formation of an alignment film by the stamping method, and have made various developments and studies. The alignment film of the liquid crystal substrate is provided on the surface of the highly rigid substrate body made of glass or the like, and is usually formed to be extremely thin such as 1 μm or less in order to reduce the driving voltage of the liquid crystal element. Therefore, there is a problem in that a good uneven pattern cannot be formed by simply pressing the mold, as in the case of forming an uneven pattern on a flexible and thick plastic film. That is, in order to form the uneven pattern on the surface of the thin alignment film, it is necessary to accurately press the mold with a uniform pressure on the resin-made alignment film preparation layer to be the alignment film. To this end, when pressing with a press machine, the surface flatness and parallelism of the die plate and die set of the press machine are increased, and the in-plane pressure distribution when pressing the die to the alignment film preparation layer is made uniform. It is necessary.
【0004】[0004]
【発明が解決しようとする課題】ところが、本発明者ら
が検討したところ、型の面平坦性を充分に高めてプレス
を行った場合であっても、配向膜準備層に型の転写が完
全になされないことがあることが判明した。これは図9
(a)に示す配向膜準備層1が形成されるガラスなどの
透明の基板2にあっては、通常、微細なうねりや凹凸あ
るいは傾斜を有し、肉厚にムラを生じていることがある
ので、研磨などの前処理を施して表面仕上げを充分に行
った場合であっても、基板2の上面に多少のうねりや凹
凸あるいは傾斜が残っていることに起因している。即
ち、平坦性の高いプレス基板3とこのプレス基板3に貼
り付けられたシート状の弾性部材4と板状の型部材5を
具備してなる転写装置を用いてプレスを行うと、図9
(b)に示すように配向膜準備層1上に型部材5が押し
付けられない領域が生じてしまい、この領域が配向不良
につながり、液晶表示装置の表示不良を引き起こすとい
う問題があった。However, as a result of investigations by the present inventors, even if the surface flatness of the mold is sufficiently enhanced and the pressing is performed, the transfer of the mold to the alignment film preparation layer is completed. It turns out that there are things that cannot be done. This is Figure 9
The transparent substrate 2 such as glass on which the alignment film preparation layer 1 shown in (a) is formed usually has fine undulations, unevenness or inclination, and may have uneven thickness. Therefore, it is caused by some undulations, unevenness or inclination remaining on the upper surface of the substrate 2 even when the surface finishing is sufficiently performed by performing a pretreatment such as polishing. That is, when pressing is performed using a transfer device including a press substrate 3 having high flatness, a sheet-shaped elastic member 4 and a plate-shaped mold member 5 attached to the press substrate 3, FIG.
As shown in (b), there is a problem in that a region where the mold member 5 cannot be pressed is generated on the alignment film preparation layer 1, and this region leads to alignment failure, causing display failure of the liquid crystal display device.
【0005】また、型部材5によって配向膜準備層1に
凹凸模様を形成した後に型部材5を配向膜準備層1から
離型する場合に、型部材5と配向膜準備層1が密着し易
い材料からなる場合は、配向膜準備層1の一部分が引き
剥がされて型部材5の表面に付着してしまい、配向膜の
一部が損傷し、表示ムラの原因となってしまうという問
題があった。なお、通常、配向膜は、芳香族ポリアミド
からなるが、例えば、型部材5をニッケルから形成した
場合に、このような配向膜剥離の問題が顕著に生じてい
た。Further, when the mold member 5 is released from the alignment film preparation layer 1 after the uneven pattern is formed on the alignment film preparation layer 1 by the mold member 5, the mold member 5 and the alignment film preparation layer 1 are easily adhered to each other. In the case of using a material, there is a problem that a part of the alignment film preparation layer 1 is peeled off and adheres to the surface of the mold member 5, causing a part of the alignment film to be damaged and causing display unevenness. It was Although the alignment film is usually made of aromatic polyamide, when the mold member 5 is made of nickel, for example, such a problem of peeling of the alignment film has been remarkable.
【0006】本発明は前記事情に鑑みてなされたもので
あり、多少の傾斜や凹凸あるいはうねりを有している基
板上に配向膜を形成する場合であっても、ムラの少ない
状態で凹凸模様の転写ができるとともに、離型の際に配
向膜準備層の一部を剥離させることがなく、剥離欠陥を
生じさせることのない転写装置の提供を目的とする。The present invention has been made in view of the above circumstances, and even when an alignment film is formed on a substrate having some inclination, unevenness, or waviness, the unevenness pattern has a small unevenness. It is an object of the present invention to provide a transfer device capable of performing the above transfer and not causing a part of the alignment film preparation layer to be peeled off at the time of releasing the mold and causing no peeling defect.
【0007】[0007]
【課題を解決するための手段】請求項1記載の発明は前
記課題を解決するために、凹凸模様が形成された型部材
を基板上の配向膜準備層に押圧して配向膜準備層上面に
凹凸模様を転写することにより配向膜を形成する凹凸模
様の転写装置において、剛体からなるプレス基体と、こ
のプレス基体に対向配置された弾性部材と、この弾性部
材の前記プレス基体と対向していない側にシート状の型
部材を具備してなるものである。In order to solve the above-mentioned problems, according to the first aspect of the present invention, a mold member having a concavo-convex pattern is pressed against an alignment film preparation layer on a substrate to form an upper surface of the alignment film preparation layer. In an uneven pattern transfer device for forming an alignment film by transferring an uneven pattern, a press base made of a rigid body, an elastic member arranged to face the press base, and the elastic member not facing the press base. A sheet-shaped mold member is provided on the side.
【0008】請求項2記載の発明は前記課題を解決する
ために、請求項1記載の前記弾性部材をプレス基体の表
面に取り付けており、前記弾性部材の表面に前記型部材
を取り付けているものである。According to a second aspect of the present invention, in order to solve the above problems, the elastic member according to the first aspect is attached to the surface of a press base, and the mold member is attached to the surface of the elastic member. Is.
【0009】請求項3記載の発明は前記課題を解決する
ために、請求項1または2記載のプレス基体を平板状と
したものである。According to a third aspect of the present invention, in order to solve the above problems, the press substrate according to the first or second aspect is formed into a flat plate shape.
【0010】請求項4記載の発明は前記課題を解決する
ために、請求項1または2記載のプレス基体をローラー
状としたものである。According to a fourth aspect of the present invention, in order to solve the above problems, the press substrate according to the first or second aspect is formed into a roller shape.
【0011】請求項5記載の発明は前記課題を解決する
ために、請求項1、2、3または4記載の型部材を、
0.001mm以上、0.2mm以下の範囲の厚さに形成
してなるものである。In order to solve the above-mentioned problems, the invention according to claim 5 provides the mold member according to claim 1, 2, 3 or 4.
It is formed with a thickness in the range of 0.001 mm or more and 0.2 mm or less.
【0012】請求項6記載の発明は前記課題を解決する
ために、請求項1、2、3、4または5記載の型部材の
表面に、金または金合金あるいは銅または銅合金からな
る被覆層を形成してなるものである。In order to solve the above-mentioned problems, the invention according to claim 6 covers the surface of the mold member according to claim 1, 2, 3, 4 or 5 with a coating layer made of gold or a gold alloy, or copper or a copper alloy. Is formed.
【0013】[0013]
【作用】プレス基体に弾性部材を介して薄い型部材を取
り付けているので、配向膜準備層に型部材を押し付けて
凹凸模様の転写を行う場合に、配向膜準備層がプレス基
体に対して多少傾斜している場合であっても、この傾斜
に合わせて弾性部材が変形できるので、型部材の凹凸模
様が配向膜準備層の全面に、確実に押し付けられる。更
に、型部材として、厚さ0.001〜0.2mmのものを
用いると、基配向膜準備層に基板の微細なうねりや凹凸
あるいは傾斜に起因する多少のうねりや凹凸あるいは傾
斜を有していても、このうねりや凹凸あるいは傾斜に合
わせて弾性部材と型部材が確実に変形し、追従するの
で、型部材の凹凸模様が配向膜準備層の全面に確実に押
し付けられる。即ち、型部材として0.2mm以下のも
のを用いると、基板や配向膜準備層の微細なうねりや凹
凸あるいは傾斜に合わせて弾性部材と型部材が充分に追
従する。また、0.001mm以上の厚さがあれば、取
り扱う上でも破れるといった問題が生じない。Since the thin die member is attached to the press base through the elastic member, when the die member is pressed against the alignment film preparation layer to transfer the concave-convex pattern, the alignment film preparation layer slightly moves to the press base. Even if it is inclined, the elastic member can be deformed in accordance with this inclination, so that the uneven pattern of the mold member is surely pressed against the entire surface of the alignment film preparation layer. Furthermore, when a die member having a thickness of 0.001 to 0.2 mm is used, the basic alignment film preparation layer has some undulations, irregularities or inclinations due to the fine undulations or irregularities or inclinations of the substrate. However, since the elastic member and the mold member are surely deformed and follow the waviness, the unevenness, or the inclination, the uneven pattern of the mold member is reliably pressed against the entire surface of the alignment film preparation layer. That is, when a die member having a thickness of 0.2 mm or less is used, the elastic member and the die member sufficiently follow each other according to the fine waviness, unevenness or inclination of the substrate or the alignment film preparation layer. Further, if the thickness is 0.001 mm or more, there is no problem of breakage in handling.
【0014】また、型部材の表面に金や銅の被覆層を形
成しておくと、配向膜準備層に凹凸模様を転写して型部
材を配向膜準備層から離型する場合に配向膜準備層の型
部材に対する付着の問題が全く起こらない。プレス基体
としては、平板状のものでも良く、ローラー状のもので
も良い。平板状のプレス基体に弾性部材と型部材を取り
付けたものでは、1回の押し付け操作で凹凸形状の転写
が可能であり、ローラー状の基体を用いたものでは基体
を基板上の配向膜準備層に沿って回転させながら押し付
けることで凹凸模様の転写ができる。Further, when a coating layer of gold or copper is formed on the surface of the mold member, the alignment film preparation is performed when the mold member is released from the alignment film preparation layer by transferring the uneven pattern to the alignment film preparation layer. No problem of adhesion of the layers to the mold parts occurs. The press base may be a flat plate or a roller. A flat press substrate with an elastic member and a mold member attached can transfer the uneven shape by a single pressing operation. With a roller substrate, the substrate is an alignment film preparation layer. The uneven pattern can be transferred by pressing while rotating along.
【0015】[0015]
【実施例】以下、図面を参照して本発明の実施例につい
て説明する。図1は本発明に係る転写装置の第1実施例
を示すもので、この例の転写装置10は、プレス基板1
1とその下面に取り付けられたシート状の弾性部材12
とその下面に取り付けられたシート状の型部材13を具
備して構成されている。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows a first embodiment of a transfer device according to the present invention. A transfer device 10 of this example is a press substrate 1
1 and a sheet-like elastic member 12 attached to the lower surface thereof
And a sheet-shaped mold member 13 attached to the lower surface thereof.
【0016】前記プレス基板11は、剛性の高い金属材
料からなり、その下面の平坦性は研磨加工などの手段に
より充分に高められている。このプレス基板11の表面
荒さは例えば±10μm程度に調整しておくことが好ま
しい。弾性部材12は、厚さ0.8〜数mm程度の樹脂
層からなるものであって、その構成材料としてシリコン
ゴムなどを用いることが好ましい。型部材13は、ニッ
ケル、金、銅などの材料からなり、好ましくは厚さ0.
001mm以上かつ0.2mm以下に形成され、平板状
の基体の表面に凹凸模様が形成されたものである。ま
た、この型部材13の表面の凹凸模様表面部分には、金
または金合金、あるいは、銅または銅合金からなる皮膜
層が被覆されている。この皮膜層は、蒸着やスパッタな
どの成膜手段で凹凸模様上に被覆されたものであり、そ
の厚さは0.1〜0.5μmとされている。The press substrate 11 is made of a metal material having high rigidity, and the flatness of its lower surface is sufficiently enhanced by means such as polishing. The surface roughness of the press substrate 11 is preferably adjusted to, for example, about ± 10 μm. The elastic member 12 is made of a resin layer having a thickness of about 0.8 to several mm, and it is preferable to use silicon rubber or the like as its constituent material. The mold member 13 is made of a material such as nickel, gold and copper, and preferably has a thickness of 0.1.
It is formed to have a thickness of 001 mm or more and 0.2 mm or less, and has a concavo-convex pattern formed on the surface of a flat plate-shaped substrate. The surface of the mold member 13 is covered with a coating layer made of gold or gold alloy, or copper or copper alloy. This coating layer is formed by coating the concavo-convex pattern with a film forming means such as vapor deposition or sputtering and has a thickness of 0.1 to 0.5 μm.
【0017】また、図1において符号15はガラスなど
からなる透明の基板、16は基板15の上面に被覆され
た芳香族ポリアミドからなる配向膜準備層を示してい
る。なお、図面では基板15のうねりを強調して描いて
いるが、実際には基板15の反りや凹凸はミクロンオー
ダーあるいはそれ以下にされている。In FIG. 1, reference numeral 15 is a transparent substrate made of glass or the like, and 16 is an alignment film preparation layer made of aromatic polyamide and coated on the upper surface of the substrate 15. Although the undulations of the substrate 15 are emphasized in the drawings, the warpage and unevenness of the substrate 15 are actually on the order of microns or less.
【0018】前記の構成の転写装置10を用いて配向膜
準備層16に凹凸模様を転写するには、まず、転写装置
10の型部材13を配向膜準備層16に向けて図2に示
すように配向膜準備層16に押し付ける。ここで基板1
5にうねりや多少の凹凸を生じていても、型部材13が
薄く撓曲性に優れ、弾性部材12も弾性を有し弾性変形
することができ、図2に示すように型部材13の変形と
弾性部材12の変形によってうねりや多少の凹凸を吸収
できるので、型部材13を配向膜準備層16に確実に押
し付けることができる。また、この際の処理温度は10
0〜200℃の範囲、押圧力は、50〜100kg/c
m2程度の範囲が好ましい。In order to transfer the concavo-convex pattern to the alignment film preparation layer 16 using the transfer device 10 having the above structure, first, the mold member 13 of the transfer device 10 is directed toward the alignment film preparation layer 16 as shown in FIG. Then, the alignment film preparation layer 16 is pressed. Board 1
Even if there are undulations and some unevenness in the mold 5, the mold member 13 is thin and excellent in flexibility, and the elastic member 12 also has elasticity and can be elastically deformed. As shown in FIG. Since the undulation and some unevenness can be absorbed by the deformation of the elastic member 12, the mold member 13 can be reliably pressed against the alignment film preparation layer 16. Further, the processing temperature at this time is 10
Range of 0 to 200 ° C, pressing force is 50 to 100 kg / c
A range of about m 2 is preferable.
【0019】これにより、配向膜準備層16上には、型
部材13の凹凸模様に対応した凹凸模様が転写され、こ
れにより配向膜準備層16が配向膜とされる。凹凸模様
の転写が終了したならば、型部材13を配向膜から引き
剥がすことになるが、この際に型部材13の表面に、金
または金合金あるいは銅または銅合金製の被覆層がある
ので、配向膜の一部が型部材13に付着しずらくなり、
型部材13側に引き剥がされることがなくなるので、凹
凸模様の転写を確実になすことができる。これは、配向
膜準備層16を構成する芳香族ポリアミドと金あるいは
銅の表面エネルギーの関係から、配向膜準備層16と型
部材13表面の被覆層が付着しずらいことに起因してい
る。これにより配向膜準備層16の一部を損傷させるこ
となく凹凸模様を転写することができ、凹凸模様を有す
る配向膜を製造できる。As a result, an uneven pattern corresponding to the uneven pattern of the mold member 13 is transferred onto the alignment film preparation layer 16, whereby the alignment film preparation layer 16 becomes an alignment film. When the transfer of the uneven pattern is completed, the mold member 13 is peeled off from the alignment film. At this time, since the mold member 13 has a coating layer made of gold, a gold alloy, copper, or a copper alloy on the surface of the mold member 13. , A part of the alignment film does not easily adhere to the mold member 13,
Since it is not peeled off to the mold member 13 side, it is possible to reliably transfer the uneven pattern. This is because the alignment film preparation layer 16 and the coating layer on the surface of the mold member 13 are difficult to adhere due to the relationship between the surface energy of the aromatic polyamide forming the alignment film preparation layer 16 and gold or copper. Thereby, the uneven pattern can be transferred without damaging a part of the alignment film preparation layer 16, and the alignment film having the uneven pattern can be manufactured.
【0020】配向膜準備層16に対する金あるいは銅の
表面エネルギーの関係からこれらが基本的に相互に付着
しずらいことがわかるが、金に他の元素、例えば、ニッ
ケル)を添加した金基合金あるいは銅に他の元素、例え
ば、ニッケルを添加した銅合金であっても同等の効果を
得ることができる。From the relationship of the surface energy of gold or copper with respect to the alignment film preparation layer 16, it can be understood that they are basically hard to adhere to each other. However, a gold-based alloy in which other elements such as nickel are added to gold. Alternatively, the same effect can be obtained even with a copper alloy in which other element such as nickel is added to copper.
【0021】第3図と第4図は本発明の第2実施例を説
明するためのもので、この実施例の転写装置20は、ロ
ーラー(プレス基体)21とこのローラー21とは別個
に設けられる平板状の弾性部材22と、この弾性部材2
2の下面に一体化された型部材23とを具備して構成さ
れている。前記弾性部材22は先の実施例の弾性部材1
2と同等の構造のものであり、型部材23は先の実施例
の型部材13と同等の構造のものである。FIGS. 3 and 4 are for explaining the second embodiment of the present invention. In the transfer device 20 of this embodiment, a roller (press base) 21 and this roller 21 are provided separately. Flat elastic member 22 and the elastic member 2
2 and a mold member 23 integrated on the lower surface of the mold 2. The elastic member 22 is the elastic member 1 of the previous embodiment.
2 has the same structure as that of the mold member 23, and the mold member 23 has the same structure as the mold member 13 of the previous embodiment.
【0022】この例の装置では、図3に示すように基板
15の配向膜準備層16上に型部材13を載せ、この状
態から所定の圧力でローラー21を弾性部材22に押し
付けながらローラー21を基板15の一側から他側に回
転移動させる。この操作により弾性部材22と型部材2
3はそれぞれ基板15のうねりや凹凸に応じて変形しな
がら、型部材23の凹凸模様を配向膜準備層16に転写
する。従ってこの例の転写装置20を用いることでも先
の第1実施例の場合と同等の効果を得ることができる。In the apparatus of this example, the mold member 13 is placed on the alignment film preparation layer 16 of the substrate 15 as shown in FIG. 3, and from this state, the roller 21 is pressed against the elastic member 22 with a predetermined pressure and the roller 21 is pressed. The substrate 15 is rotationally moved from one side to the other side. By this operation, the elastic member 22 and the mold member 2
Reference numeral 3 transfers the uneven pattern of the mold member 23 to the alignment film preparation layer 16 while deforming in accordance with the undulations and unevenness of the substrate 15. Therefore, by using the transfer device 20 of this example, the same effect as in the case of the first embodiment can be obtained.
【0023】第5図と第6図は本発明の第3実施例を説
明するためのもので、この実施例の転写装置30は、ロ
ーラー(プレス基体)31とこのローラー31の表面に
貼り付けられたシート状の弾性部材22と、この弾性部
材32の表面に張り付けられた型部材33とを具備して
構成されている。前記弾性部材32は先の実施例の弾性
部材12と同等の構成のものであり、型部材33は先の
実施例の型部材13と同等の構成のものである。FIGS. 5 and 6 are for explaining the third embodiment of the present invention. The transfer device 30 of this embodiment is a roller (press base) 31 and a roller 31 attached to the surface thereof. The sheet-shaped elastic member 22 and the mold member 33 attached to the surface of the elastic member 32 are provided. The elastic member 32 has the same structure as the elastic member 12 of the previous embodiment, and the mold member 33 has the same structure as the mold member 13 of the previous embodiment.
【0024】この例の装置では、図6に示すように基板
15の配向膜準備層16上にローラー31を載せ、この
状態から所定の圧力でローラー表面の弾性部材32を配
向膜準備層16に押し付けながらローラー31を基板1
5の一側から他側に回転移動させる。この操作により弾
性部材32と型部材33はそれぞれ基板15の反りや凹
凸に応じて変形しながら、型部材33の凹凸模様を配向
膜準備層16に転写する。従ってこの例の転写装置30
を用いることでも先の第1実施例の場合と同等の効果を
得ることができる。In the apparatus of this example, as shown in FIG. 6, the roller 31 is placed on the alignment film preparation layer 16 of the substrate 15, and from this state, the elastic member 32 on the roller surface is applied to the alignment film preparation layer 16 with a predetermined pressure. While pressing the roller 31 to the substrate 1
5 is rotated from one side to the other side. By this operation, the elastic member 32 and the mold member 33 are deformed according to the warp and the unevenness of the substrate 15, respectively, and the uneven pattern of the mold member 33 is transferred to the alignment film preparation layer 16. Therefore, the transfer device 30 of this example
By using, it is possible to obtain the same effect as in the case of the first embodiment.
【0025】図7は、先の第1〜第3実施例の転写装置
を用いて形成した凹凸模様を有する配向膜の一例を示す
ものである。この例の配向膜40の凹凸模様は、液晶の
プレチルト角を規定するために好ましい形状とされたも
のである。この例の凹凸模様は、図中矢印の第1の方向
および第2の方向に沿って形成された多数の三角型の凸
部41の集合体形状であって、第1の方向に沿う凹凸の
ピッチP1は第2の方向に沿うピッチP2よりも短くされ
ている。前記ピッチP1の値は、例えば3.0μm以下、
ピッチP2の値は例えば50μm以下とすることができ
る。また、凸部41の高さ(深さ)d1は例えば0.5μ
m以下とすることができる。FIG. 7 shows an example of an alignment film having a concavo-convex pattern formed by using the transfer device of the first to third embodiments. The concavo-convex pattern of the alignment film 40 in this example has a preferable shape for defining the pretilt angle of the liquid crystal. The concavo-convex pattern of this example is an aggregate shape of a large number of triangular convex portions 41 formed along the first direction and the second direction of the arrow in the figure, and the concavo-convex pattern along the first direction is formed. The pitch P 1 is made shorter than the pitch P 2 along the second direction. The value of the pitch P 1 is, for example, 3.0 μm or less,
The value of the pitch P 2 can be, for example, 50 μm or less. Further, the height (depth) d 1 of the convex portion 41 is 0.5 μ, for example.
It can be m or less.
【0026】「試験例1」図1に示すような構造であっ
て、炭素工具鋼鋼材(JIS規定SK4)からなる平板
型の基板と、厚さ0.8mmのシリコンゴムからなるシ
ート状の弾性部材と、ニッケルからなる型部材を一体化
してなる転写装置を用い、厚さ1.1mmのガラス基板
上に厚さ0.2μmの芳香族ポリアミドからなる配向膜
準備層を形成したものに凹凸模様を転写する試験を行っ
た。転写時の圧力は100kg/cm2とした。凹凸模
様は図7に示すような形状の凹凸模様であり、第1の方
向のピッチを0.3μm、第2の方向のピッチを2μ
m、凸部の高さを0.2μmとした。[Test Example 1] The structure as shown in FIG. 1 has a flat plate type substrate made of carbon tool steel (JIS standard SK4) and a sheet-like elasticity made of silicon rubber having a thickness of 0.8 mm. Member and a mold member made of nickel are integrated, and an alignment film preparation layer made of an aromatic polyamide having a thickness of 0.2 μm is formed on a glass substrate having a thickness of 1.1 mm, and an uneven pattern is formed on the glass substrate. Was tested. The pressure during transfer was 100 kg / cm 2 . The concavo-convex pattern is a concavo-convex pattern having a shape as shown in FIG. 7, in which the pitch in the first direction is 0.3 μm and the pitch in the second direction is 2 μm.
m, and the height of the convex portion was 0.2 μm.
【0027】なお、前記の条件で転写を行う場合に、厚
さを3mm、1mm、0.5mm、0.2mm、0.05
mm、0.015mm、0.005mm、0.001mm
にそれぞれに設定した8種類の型部材を用いて8種類の
転写装置を試作し、それぞれについて凹凸模様の転写試
験を行った。また、凹凸模様の表面には厚さ0.1μm
の金蒸着膜を形成してある。なお、厚さが0.001m
m未満の型部材の製作も試みたが、強度不足のために製
作できなかった。そして、得られた配向膜について干渉
光測定試験と転写率測定試験を行った結果を表1に示
す。干渉光測定試験においては、配向膜に光を照射した
場合に生じる干渉光の有無を目視により観察した結果を
面積で示した。その状態の一例を模式的に図8(a)に
示す。図8(a)において、転写がなされた領域Aは干
渉光を認めることができ、転写がなされていない領域B
は干渉光が認められないことになる。When the transfer is performed under the above conditions, the thickness is 3 mm, 1 mm, 0.5 mm, 0.2 mm, 0.05.
mm, 0.015 mm, 0.005 mm, 0.001 mm
Eight types of transfer devices were prototyped using the eight types of mold members set for each, and the transfer test of the uneven pattern was performed for each. In addition, the thickness of the uneven surface is 0.1 μm
The gold vapor deposition film is formed. The thickness is 0.001m
Attempts were made to produce mold members of less than m, but they could not be made because of insufficient strength. Table 1 shows the results of the interference light measurement test and the transfer rate measurement test performed on the obtained alignment film. In the interference light measurement test, the result of visually observing the presence or absence of interference light generated when the alignment film is irradiated with light is shown by the area. An example of this state is schematically shown in FIG. In FIG. 8A, the interfering light can be recognized in the transferred area A, and the transferred area B is not transferred.
No interfering light will be observed.
【0028】転写率測定試験においては、型部材の凹凸
模様における凹部の溝深さに対し、得られた配向膜の凹
凸模様の溝深さの割合を転写率として計測した。溝深さ
は、AFM(原子間力顕微鏡)により面内の平均値を求
め、それをもって溝深さとした。In the transfer rate measurement test, the ratio of the groove depth of the concave-convex pattern of the obtained alignment film to the groove depth of the concave portion of the concave-convex pattern of the mold member was measured as the transfer rate. The groove depth was determined as an average in-plane value by an AFM (atomic force microscope) and used as the groove depth.
【0029】[0029]
【表1】 [Table 1]
【0030】表1から明らかなように、型部材として厚
さ0.2mmのものを用いた場合は、干渉光の発生領域
がほぼ100%であり、転写が完全になされたことが明
らかであり、その場合の転写率も90%程度の充分高い
値にできることが明らかになった。さらに、型部材の厚
さが0.015mm以下であると、転写率が95%であ
ることがわかった。As is clear from Table 1, when a die member having a thickness of 0.2 mm was used, the generation area of the interference light was almost 100%, and it was clear that the transfer was completed. However, it was revealed that the transfer rate in that case can be set to a sufficiently high value of about 90%. Further, it was found that the transfer rate was 95% when the thickness of the mold member was 0.015 mm or less.
【0031】「試験例2」次に前記の型部材として厚さ
0.05mmのものを用い、型部材表面に形成する被覆
層として、金と銅とニッケルのいずれかからなるものを
用いた転写型を3種類試作して各々について凹凸模様の
転写を行った場合に、型部材の表面に剥離した配向膜準
備層が付着しているか否かについて観察する試験を行っ
た。その結果、ニッケル被覆層のものでは図8(b)に
示すように直径0.5〜3mmの剥離部分が班点状に付
着してしまう結果となり、この例の配向膜との付着領域
は30%以下であることが判明した。なお、金被覆層と
銅被覆層を形成した型部材を用いた転写装置にあって
は、配向膜準備層が型部材に付着する現象は見られなか
った。[Test Example 2] Next, transfer using the above-mentioned mold member having a thickness of 0.05 mm and using a coating layer formed on the surface of the mold member made of any one of gold, copper and nickel A test for observing whether or not the peeled alignment film preparation layer is attached to the surface of the mold member was performed when three types of prototypes were prototyped and an uneven pattern was transferred to each of them. As a result, in the case of the nickel coating layer, the peeled portion having a diameter of 0.5 to 3 mm adheres in a spot-like shape as shown in FIG. 8B, and the adhesion region with the alignment film in this example is 30. It was found to be below%. In the transfer device using the mold member having the gold coating layer and the copper coating layer, the phenomenon that the alignment film preparation layer adhered to the mold member was not observed.
【0032】[0032]
【発明の効果】以上説明したように本発明は、プレス基
体に弾性部材を介して薄い型部材を取り付けているの
で、配向膜準備層に型部材を押し付けて凹凸模様の転写
を行う場合に、基板上面が基体に対して平行ではなく多
少傾斜していてもこの傾斜に対して弾性部材が変形し追
従するので、型部材の凹凸模様を配向膜準備層の全面に
確実に押し付けることができ、十分な転写率を得ること
ができる。よって多少の傾斜を有する基板上に形成され
た配向膜準備層に凹凸模様を転写する場合であっても、
全面に均一の凹凸模様が形成された配向膜を製造するこ
とができる。次に、型部材として厚さ0.001〜0.2
mmのものを用いると、配向膜準備層に基板の微細なう
ねりや凹凸あるいは傾斜に起因する多少のうねりや凹凸
あるいは傾斜を有していても、このうねりや凹凸あるい
は傾斜に合わせて弾性部材と型部材が変形し、追従する
ので、型部材の凹凸模様を配向膜準備層の全面に確実に
押し付けることができ、十分な転写率を得ることができ
る。よって多少のうねりや凹凸あるいは傾斜を有する基
板上に形成された配向膜準備層に凹凸模様を転写する場
合であっても、全面に均一の凹凸模様が形成された高品
質の配向膜を製造することができる。As described above, according to the present invention, since a thin mold member is attached to the press base through the elastic member, when the mold member is pressed against the alignment film preparation layer to transfer the uneven pattern, Even if the upper surface of the substrate is not parallel to the base but is slightly inclined, the elastic member is deformed and follows this inclination, so that the uneven pattern of the mold member can be reliably pressed against the entire surface of the alignment film preparation layer, A sufficient transfer rate can be obtained. Therefore, even when transferring the uneven pattern to the alignment film preparation layer formed on the substrate having a slight inclination,
It is possible to manufacture an alignment film having a uniform uneven pattern formed on the entire surface. Next, as a mold member, the thickness is 0.001 to 0.2.
In the case where the alignment film preparatory layer has a slight waviness, unevenness, or inclination due to the fine waviness, unevenness, or inclination of the substrate, an elastic member is used in accordance with the waviness, unevenness, or inclination. Since the mold member deforms and follows, the uneven pattern of the mold member can be surely pressed against the entire surface of the alignment film preparation layer, and a sufficient transfer rate can be obtained. Therefore, even when transferring a concavo-convex pattern to the alignment film preparation layer formed on a substrate having some undulations, concavities and convexities or inclination, a high-quality alignment film having a uniform concavo-convex pattern formed on the entire surface is manufactured. be able to.
【0033】また、型部材の表面に金や銅の被覆層を形
成しておくと、配向膜準備層に凹凸模様を転写して型部
材を配向膜準備層から離型する場合に、配向膜準備層が
型部材に付着して剥離することが起こらない。よって、
剥離部分などの欠陥の全く無い配向膜を得ることができ
る。更に、基体としては、平板状のものでも良く、ロー
ラー状のものでも良い。平板状の基体に弾性部材と型部
材を取り付けたものでは、1回の押し付け操作で配向膜
準備層に対する凹凸形状の転写が可能であり、ローラー
状の基体を用いたものではこの基体を基板上の配向膜準
備層に沿って回転させながら押し付けることで型部材の
凹凸模様を基板上の配向膜準備層に転写することができ
る。Further, if a gold or copper coating layer is formed on the surface of the mold member, the alignment film can be released from the alignment film preparation layer by transferring an uneven pattern to the alignment film preparation layer. The preparation layer does not adhere to the mold member and peel off. Therefore,
It is possible to obtain an alignment film having no defects such as peeled portions. Further, the base may be a flat plate or a roller. With a flat plate-shaped base to which an elastic member and a mold member are attached, it is possible to transfer the uneven shape to the alignment film preparation layer by one pressing operation. With a roller-shaped base, this base is placed on the substrate. It is possible to transfer the uneven pattern of the mold member to the alignment film preparation layer on the substrate by pressing while rotating along the alignment film preparation layer.
【図1】本発明に係る転写装置の第1実施例を示す側面
図である。FIG. 1 is a side view showing a first embodiment of a transfer device according to the present invention.
【図2】図1に示す転写装置で基板上の配向膜準備層に
対して凹凸模様の転写を行っている状態を示す側面図で
ある。FIG. 2 is a side view showing a state where an uneven pattern is transferred to an alignment film preparation layer on a substrate by the transfer device shown in FIG.
【図3】本発明に係る転写装置の第2実施例を示す側面
図である。FIG. 3 is a side view showing a second embodiment of the transfer device according to the present invention.
【図4】図3に示す転写装置で基板上の配向膜準備層に
対して凹凸模様の転写を行っている状態を示す側面図で
ある。FIG. 4 is a side view showing a state where an uneven pattern is being transferred to an alignment film preparation layer on a substrate by the transfer device shown in FIG.
【図5】本発明に係る転写装置の第3実施例を示す側面
図である。FIG. 5 is a side view showing a third embodiment of the transfer device according to the present invention.
【図6】図5に示す転写装置で基板上の配向膜準備層に
対して凹凸模様の転写を行っている状態を示す側面図で
ある。FIG. 6 is a side view showing a state in which an uneven pattern is transferred to the alignment film preparation layer on the substrate by the transfer device shown in FIG.
【図7】得られた配向膜の一例を拡大して示す斜視図で
ある。FIG. 7 is an enlarged perspective view showing an example of the obtained alignment film.
【図8】図8(a)は試験例で行った干渉光計測試験の
試験結果を示す図、図8(b)は試験例で行った剥離試
験結果を示す図である。8A is a diagram showing a test result of an interference light measurement test performed in a test example, and FIG. 8B is a diagram showing a peeling test result performed in a test example.
【図9】図9(a)は従来の転写装置の一例を示す側面
図、図9(b)は従来の転写装置で転写を行っている状
態を示す側面図である。FIG. 9A is a side view showing an example of a conventional transfer device, and FIG. 9B is a side view showing a state where transfer is being performed by the conventional transfer device.
10、20、30 転写装置 11 プレス基体 12、22、32 弾性部材 13、23、33 型部材 15 基板 16 配向膜準備層 21 ローラー(プレス基体) 31 ローラー(プレス基体) 10, 20, 30 Transfer device 11 Press base 12, 22, 32 Elastic member 13, 23, 33 Mold member 15 Substrate 16 Alignment film preparation layer 21 Roller (press base) 31 Roller (press base)
フロントページの続き (72)発明者 鹿野 満 東京都大田区雪谷大塚町1番7号 アルプ ス電気株式会社内Continued Front Page (72) Inventor Mitsuru Kano 1-7 Yukiya Otsukacho, Ota-ku, Tokyo Alps Electric Co., Ltd.
Claims (6)
配向膜準備層に押圧して配向膜準備層上面に凹凸模様を
転写することにより配向膜を形成する凹凸模様の転写装
置において、 剛体からなるプレス基体と、このプレス基体に対向配置
された弾性部材と、この弾性部材の前記プレス基体と対
向していない側に設けられたシート状の型部材を具備し
てなることを特徴とする配向膜に対する凹凸模様の転写
装置。1. An uneven pattern transfer device for forming an alignment film by pressing a mold member on which an uneven pattern is formed against an alignment film preparation layer on a substrate to transfer the uneven pattern onto the upper surface of the alignment film preparation layer, A press base made of a rigid body, an elastic member arranged to face the press base, and a sheet-shaped mold member provided on a side of the elastic member not facing the press base. Transferring device for uneven pattern to the alignment film.
付けられており、前記弾性部材の表面に前記型部材が取
り付けられていることを特徴とする請求項1に記載の配
向膜に対する凹凸模様の転写装置。2. The uneven pattern of the alignment film according to claim 1, wherein the elastic member is attached to a surface of a press base, and the mold member is attached to a surface of the elastic member. Transfer device.
特徴とする請求項1または2記載の配向膜に対する凹凸
模様の転写装置。3. The transfer device for an uneven pattern onto an alignment film according to claim 1, wherein the press base has a flat plate shape.
とを特徴とする請求項1または2記載の配向膜に対する
凹凸模様の転写装置。4. The transfer device for an uneven pattern onto an alignment film according to claim 1, wherein the press base is roller-shaped.
2mm以下の範囲の厚さに形成されていることを特徴と
する請求項1、2、3または4記載の配向膜に対する凹
凸模様の転写装置。5. The mold member has a length of 0.001 mm or more, and 0.01 mm or more.
The transfer device for transferring an uneven pattern to an alignment film according to claim 1, wherein the transfer device is formed to have a thickness of 2 mm or less.
るいは銅または銅合金からなる被覆層が形成されている
ことを特徴とする請求項1、2、3、4または5記載の
配向膜に対する凹凸模様の転写装置。6. The alignment film according to claim 1, wherein a coating layer made of gold, a gold alloy, copper or a copper alloy is formed on the surface of the mold member. Transfer device for uneven patterns against.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6143659A JPH086027A (en) | 1994-06-24 | 1994-06-24 | Transfer device of rugged pattern to oriented film |
KR1019950015976A KR0148669B1 (en) | 1994-06-24 | 1995-06-16 | Liquid crystal element, its manufacturing method, liquid crystal element alignment film formation method, liquid crystal element alignment film formation transfer type, its manufacturing method, and uneven | corrugated transfer apparatus for alignment film |
GB9512661A GB2290629A (en) | 1994-06-24 | 1995-06-21 | Liquid crystal alignment film |
DE19523132A DE19523132A1 (en) | 1994-06-24 | 1995-06-26 | Liquid crystal element and its manufacture, forming an alignment layer for a liquid crystal element, embossing device for forming an alignment layer and its manufacture and device for embossing irregular patterns on an alignment layer |
TW084106947A TW436650B (en) | 1994-06-24 | 1995-07-05 | Liquid crystal display device, method of preparing liquid crystal oriented film, transfer mold for preparing oriented film of liquid crystal device, and transfer device of rugged pattern to the oriented film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6143659A JPH086027A (en) | 1994-06-24 | 1994-06-24 | Transfer device of rugged pattern to oriented film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH086027A true JPH086027A (en) | 1996-01-12 |
Family
ID=15343944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6143659A Withdrawn JPH086027A (en) | 1994-06-24 | 1994-06-24 | Transfer device of rugged pattern to oriented film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH086027A (en) |
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JP2006163080A (en) * | 2004-12-08 | 2006-06-22 | Nippon Paper Chemicals Co Ltd | Liquid crystal alignment film forming material and method of forming liquid crystal alignment film |
KR100778839B1 (en) * | 2000-02-24 | 2007-11-22 | 엘지.필립스 엘시디 주식회사 | Plate for forming an alignment film of a liquid crystal display and a liquid crystal alignment method using the same |
KR100847612B1 (en) * | 2004-03-31 | 2008-07-21 | 인텔 코오퍼레이션 | Process for micro-grooving a polymer alignment layer for a liquid crystal display |
JP2009006620A (en) * | 2007-06-29 | 2009-01-15 | Hitachi Industrial Equipment Systems Co Ltd | Imprint stamper and manufacturing method thereof |
KR100885518B1 (en) * | 2008-05-13 | 2009-02-26 | (주)티에스티아이테크 | Method for manufacturing a light guide plate provided with a coating layer of a predetermined pattern |
WO2010001538A1 (en) * | 2008-06-30 | 2010-01-07 | 株式会社日立製作所 | Fine structure and stamper for imprinting |
WO2012099024A1 (en) * | 2011-01-19 | 2012-07-26 | 住友化学株式会社 | Method for determining concavo-convex shape of optical member |
-
1994
- 1994-06-24 JP JP6143659A patent/JPH086027A/en not_active Withdrawn
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KR100778839B1 (en) * | 2000-02-24 | 2007-11-22 | 엘지.필립스 엘시디 주식회사 | Plate for forming an alignment film of a liquid crystal display and a liquid crystal alignment method using the same |
JP2003065751A (en) * | 2001-08-24 | 2003-03-05 | Toshiba Corp | End face accuracy detecting method for laminated material |
KR100847612B1 (en) * | 2004-03-31 | 2008-07-21 | 인텔 코오퍼레이션 | Process for micro-grooving a polymer alignment layer for a liquid crystal display |
JP2006163080A (en) * | 2004-12-08 | 2006-06-22 | Nippon Paper Chemicals Co Ltd | Liquid crystal alignment film forming material and method of forming liquid crystal alignment film |
JP2009006620A (en) * | 2007-06-29 | 2009-01-15 | Hitachi Industrial Equipment Systems Co Ltd | Imprint stamper and manufacturing method thereof |
KR100885518B1 (en) * | 2008-05-13 | 2009-02-26 | (주)티에스티아이테크 | Method for manufacturing a light guide plate provided with a coating layer of a predetermined pattern |
WO2010001538A1 (en) * | 2008-06-30 | 2010-01-07 | 株式会社日立製作所 | Fine structure and stamper for imprinting |
WO2012099024A1 (en) * | 2011-01-19 | 2012-07-26 | 住友化学株式会社 | Method for determining concavo-convex shape of optical member |
JP2012150292A (en) * | 2011-01-19 | 2012-08-09 | Sumitomo Chemical Co Ltd | Method for determining uneven shape of optical member |
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