JPH07119087B2 - Manufacturing method of flexible double-sided metal-clad laminate - Google Patents
Manufacturing method of flexible double-sided metal-clad laminateInfo
- Publication number
- JPH07119087B2 JPH07119087B2 JP63245598A JP24559888A JPH07119087B2 JP H07119087 B2 JPH07119087 B2 JP H07119087B2 JP 63245598 A JP63245598 A JP 63245598A JP 24559888 A JP24559888 A JP 24559888A JP H07119087 B2 JPH07119087 B2 JP H07119087B2
- Authority
- JP
- Japan
- Prior art keywords
- clad laminate
- polyimide
- group
- polymerizable compound
- imide ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 229920001721 polyimide Polymers 0.000 claims description 51
- 239000004642 Polyimide Substances 0.000 claims description 30
- 239000002966 varnish Substances 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 19
- 239000011888 foil Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000009719 polyimide resin Substances 0.000 claims description 10
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 9
- 239000011162 core material Substances 0.000 claims description 8
- 238000001035 drying Methods 0.000 claims description 6
- -1 hexafluoroisopropylidene Chemical group 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 4
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000000654 isopropylidene group Chemical group C(C)(C)=* 0.000 claims description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid group Chemical group C(\C=C/C(=O)O)(=O)O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 2
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- 125000005462 imide group Chemical group 0.000 claims 5
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 claims 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims 1
- 125000005641 methacryl group Chemical group 0.000 claims 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 19
- 239000012790 adhesive layer Substances 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 150000004985 diamines Chemical class 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229920003192 poly(bis maleimide) Polymers 0.000 description 7
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 6
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 239000003832 thermite Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 150000003949 imides Chemical group 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000011889 copper foil Substances 0.000 description 4
- 239000002798 polar solvent Substances 0.000 description 4
- 229920005575 poly(amic acid) Polymers 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 3
- BWAPJIHJXDYDPW-UHFFFAOYSA-N 2,5-dimethyl-p-phenylenediamine Chemical compound CC1=CC(N)=C(C)C=C1N BWAPJIHJXDYDPW-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 125000005591 trimellitate group Chemical group 0.000 description 3
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 2
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 2
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 2
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 229920002472 Starch Polymers 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000003522 acrylic cement Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 239000008107 starch Substances 0.000 description 2
- 235000019698 starch Nutrition 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229920006259 thermoplastic polyimide Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- AWBZBZSXLLURQQ-UHFFFAOYSA-N 1,6-dimethylcyclohexa-3,5-diene-1,3-diamine Chemical compound CC1(CC(=CC=C1C)N)N AWBZBZSXLLURQQ-UHFFFAOYSA-N 0.000 description 1
- PUKLCKVOVCZYKF-UHFFFAOYSA-N 1-[2-(2,5-dioxopyrrol-1-yl)ethyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CCN1C(=O)C=CC1=O PUKLCKVOVCZYKF-UHFFFAOYSA-N 0.000 description 1
- LNAIBNHJQKDBNR-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)-2-methylphenyl]pyrrole-2,5-dione Chemical compound CC1=C(N2C(C=CC2=O)=O)C=CC=C1N1C(=O)C=CC1=O LNAIBNHJQKDBNR-UHFFFAOYSA-N 0.000 description 1
- FJKKJQRXSPFNPM-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)-4-methylphenyl]pyrrole-2,5-dione Chemical compound CC1=CC=C(N2C(C=CC2=O)=O)C=C1N1C(=O)C=CC1=O FJKKJQRXSPFNPM-UHFFFAOYSA-N 0.000 description 1
- IPJGAEWUPXWFPL-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(N2C(C=CC2=O)=O)=C1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 1
- PYVHLZLQVWXBDZ-UHFFFAOYSA-N 1-[6-(2,5-dioxopyrrol-1-yl)hexyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CCCCCCN1C(=O)C=CC1=O PYVHLZLQVWXBDZ-UHFFFAOYSA-N 0.000 description 1
- IFUXXUAAJBKDGO-UHFFFAOYSA-N 2,3,5-trimethylbenzene-1,4-diamine Chemical compound CC1=CC(N)=C(C)C(C)=C1N IFUXXUAAJBKDGO-UHFFFAOYSA-N 0.000 description 1
- 229940075142 2,5-diaminotoluene Drugs 0.000 description 1
- MJAVQHPPPBDYAN-UHFFFAOYSA-N 2,6-dimethylbenzene-1,4-diamine Chemical compound CC1=CC(N)=CC(C)=C1N MJAVQHPPPBDYAN-UHFFFAOYSA-N 0.000 description 1
- OBCSAIDCZQSFQH-UHFFFAOYSA-N 2-methyl-1,4-phenylenediamine Chemical compound CC1=CC(N)=CC=C1N OBCSAIDCZQSFQH-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- MFTFTIALAXXIMU-UHFFFAOYSA-N 3-[4-[2-[4-(3-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)C(C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MFTFTIALAXXIMU-UHFFFAOYSA-N 0.000 description 1
- NYRFBMFAUFUULG-UHFFFAOYSA-N 3-[4-[2-[4-(3-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=C(N)C=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=CC(N)=C1 NYRFBMFAUFUULG-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- YSMXOEWEUZTWAK-UHFFFAOYSA-N 3-[4-[[4-(3-aminophenoxy)phenyl]methyl]phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(CC=3C=CC(OC=4C=C(N)C=CC=4)=CC=3)=CC=2)=C1 YSMXOEWEUZTWAK-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- RYYUUQPLFHRZOY-UHFFFAOYSA-N 4-[2-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC=C1OC1=CC=C(N)C=C1 RYYUUQPLFHRZOY-UHFFFAOYSA-N 0.000 description 1
- IOUVQFAYPGDXFG-UHFFFAOYSA-N 4-[4-[2-[4-(3,4-dicarboxyphenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=C(C(C(O)=O)=CC=3)C(O)=O)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 IOUVQFAYPGDXFG-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- MRTAEHMRKDVKMS-UHFFFAOYSA-N 4-[4-[4-(3,4-dicarboxyphenoxy)phenyl]sulfanylphenoxy]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC(C=C1)=CC=C1SC(C=C1)=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 MRTAEHMRKDVKMS-UHFFFAOYSA-N 0.000 description 1
- UTDAGHZGKXPRQI-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(S(=O)(=O)C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 UTDAGHZGKXPRQI-UHFFFAOYSA-N 0.000 description 1
- QHHKLPCQTTWFSS-UHFFFAOYSA-N 5-[2-(1,3-dioxo-2-benzofuran-5-yl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)(C(F)(F)F)C(F)(F)F)=C1 QHHKLPCQTTWFSS-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- VZUHQRBBQSLSHS-SSZFMOIBSA-N Isoimide Chemical group C1=CC(Br)=CC=C1\N=C/1C(CCCC2)=C2C(=O)O\1 VZUHQRBBQSLSHS-SSZFMOIBSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- BBRLKRNNIMVXOD-UHFFFAOYSA-N bis[4-(3-aminophenoxy)phenyl]methanone Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)C(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 BBRLKRNNIMVXOD-UHFFFAOYSA-N 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、耐熱性良好なフレキシブル両面金属張り積層
板の製造法に関する。The present invention relates to a method for producing a flexible double-sided metal-clad laminate having good heat resistance.
フレキシブル金属張り積層板を製造する方法として、金
属箔とポリイミドフイルムをアクリル系,エポキシ系,
ゴム系接着剤で張り合わせる方法、銅箔とポリイミドフ
イルムで熱可塑性のあるポリイミドフイルムをはさみ加
熱圧着する方法、ポリアミド酸ワニスを基材表面に塗
布,加熱して溶剤の揮散とイミド化反応を行わせること
によりポリイミド樹脂層を形成し、被接着物を重ね合わ
せて加熱圧着する方法が知られている。As a method of manufacturing a flexible metal-clad laminate, a metal foil and a polyimide film are made of acrylic, epoxy,
Method of laminating with rubber adhesive, method of heat-pressing by sandwiching thermoplastic polyimide film with copper foil and polyimide film, coating of polyamic acid varnish on substrate surface, heating to volatilize solvent and imidization reaction There is known a method in which a polyimide resin layer is formed by heating, and the adherends are superposed and heated and pressed.
金属箔とポリイミドフイルムをアクリル系,エポキシ
系,ゴム系の接着剤で張り合わせる方法は、接着層に耐
熱性の低い材料を用いているため、ポリイミドフイルム
の高耐熱性を生かしておらず、特に高温でのピール強度
に問題があつた。また熱可塑性のあるポリイミドフイル
ムを接着層として用いる場合、接着用ポリイミドフイル
ムをポリアミド酸あるいはポリイミドワニスから流延等
の方法により製造しなければならず、コスト高になる経
済性の面で問題があつた。更に、ポリアミド酸ワニスを
基材表面に塗布,加熱後,被接着物を重ね合わせる方法
は、加熱時に起るイミド化の脱水により接着層にピンホ
ールが発生する恐れがある、脱水閉環反応による体積収
縮のため基材に内部応力が残りやすいという問題点があ
つた。The method of laminating the metal foil and the polyimide film with an acrylic, epoxy, or rubber adhesive does not take advantage of the high heat resistance of the polyimide film because a material with low heat resistance is used for the adhesive layer. There was a problem with the peel strength at high temperatures. Further, when a thermoplastic polyimide film is used as the adhesive layer, the adhesive polyimide film must be produced from a polyamic acid or a polyimide varnish by a method such as casting, which poses a problem in terms of cost and economy. It was Furthermore, the method of applying the polyamic acid varnish to the surface of the base material and heating and then stacking the adherends together is such that the dehydration of imidization that occurs during heating may cause pinholes in the adhesive layer. There is a problem that internal stress is likely to remain in the substrate due to shrinkage.
本発明は、耐熱性特に高温時のピール強度に優れ残留内
部応力の少ない経済的なフレキシブル両面金属張り積層
板の製造法を提供するものである。The present invention provides a method for producing a flexible double-sided metal-clad laminate which is excellent in heat resistance, particularly peel strength at high temperature, and has little residual internal stress.
本発明は、フレキシブルな芯材の両側にポリイミドワニ
スを塗布し、乾燥後、両面に金属箔を積層し加熱加圧す
ることを特徴とするものである。The present invention is characterized in that a polyimide varnish is applied to both sides of a flexible core material, dried, and then metal foils are laminated on both sides and heated and pressed.
芯材としてはフイルム、または金属箔が用いられ、これ
らは、高耐熱,高強度が必要である。このため、フイル
ムとしては、ポリイミドフイルムを使用することが望ま
しい。なお、必要に応じ、ポリイミドフイルムをカツプ
リング材で処理することも可能である。また、金属箔と
しては、鉄箔,アルミニウム箔,銅箔等があり、両面に
積層され金属箔も同様のものが使用される。A film or metal foil is used as the core material, and these require high heat resistance and high strength. For this reason, it is desirable to use a polyimide film as the film. If necessary, the polyimide film can be treated with a coupling material. As the metal foil, there are iron foil, aluminum foil, copper foil, and the like, and the same metal foil is used on both sides.
前記ポリイミドワニスは、これを芯材に塗布し乾燥する
ことにより、未硬化の接着剤層を形成し、さらにこれを
加熱加圧するときには熱硬化反応を起こすものが好まし
い。接着剤層が熱可塑性を示すものに比べて耐熱性,耐
薬品性が優れている。The polyimide varnish is preferably one that forms an uncured adhesive layer by applying the polyimide varnish to a core material and drying the core material, and further causes a thermosetting reaction when the adhesive layer is heated and pressed. It has superior heat resistance and chemical resistance as compared with adhesive layers that exhibit thermoplasticity.
前記ポリイミドワニスは、例えば、ポリイミド樹脂及び
イミド環を有する重合性化合物を有機溶剤に溶解してな
るものが好ましい。これは、該重合性化合物を含むこと
により、熱硬化性を示すだけでなく、未硬化の接着剤層
の流動性をよくし、金属箔との接着性を向上させる。こ
の熱硬化した接着剤層はイミド系樹脂からなると言え
る。The polyimide varnish is preferably formed by dissolving a polyimide resin and a polymerizable compound having an imide ring in an organic solvent. By containing the polymerizable compound, this not only exhibits thermosetting property, but also improves the fluidity of the uncured adhesive layer and improves the adhesive property with the metal foil. It can be said that the thermosetting adhesive layer is made of an imide resin.
上記ポリイミド樹脂は、3,3′,4,4′−ベンゾフエノン
テトラカルボン酸二無水物、3,3′,4,4′−ビフエニル
テトラカルボン酸二無水物、3,3′,4,4′−ジフエニル
オキシテトラカルボン酸二無水物、2,2′−ビス(3,4−
ジカルボキシフエニル)ヘキサフルオロプロパン二無水
物、2,2−ビス〔4−(3,4−ジカルボキシフエノキシ)
フエニル〕ヘキサフルオロプロパン二無水物、4,4′−
ビス(3,4−ジカルボキシフエノキシ)ジフエニルスル
フイド二無水物、エチレンビストリメリテート二無水
物、ビスフエノールAビストリメリテート二無水物、ビ
フエニルビストリメリテート二無水物、ピロメリツト酸
二無水物等の酸二無水物と4,4′−ジアミノジフエニル
メタン、4,4′−ジアミノジフエニルエーテル、4,4′−
ジアミノジフエニルスルホン、3,3′−ジアミノジフエ
ニルスルホン等のジアミンを反応させて得られるもので
あつて、イミド化が終了したものであつて、かつ、有機
溶剤に可溶なものが使用される。上記のジアミンとし
て、すでに例示したもの以外に次に示す一般式(I)で
表わされるジアミン、一般式(II)で表わされるジアミ
ンを使用することができる。The polyimide resin is 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenyl tetracarboxylic dianhydride, 3,3 ′, 4. , 4'-Diphenyloxytetracarboxylic dianhydride, 2,2'-bis (3,4-
Dicarboxyphenyl) hexafluoropropane dianhydride, 2,2-bis [4- (3,4-dicarboxyphenoxy)
Phenyl] hexafluoropropane dianhydride, 4,4'-
Bis (3,4-dicarboxyphenoxy) diphenyl sulfide dianhydride, ethylene bis trimellitate dianhydride, bisphenol A bis trimellitate dianhydride, biphenyl bis trimellitate dianhydride, pyromellitic acid Acid dianhydrides such as dianhydride and 4,4′-diaminodiphenylmethane, 4,4′-diaminodiphenyl ether, 4,4′-
A product obtained by reacting a diamine such as diaminodiphenyl sulfone or 3,3'-diaminodiphenyl sulfone, which has completed imidization and is soluble in an organic solvent, is used. It As the above-mentioned diamine, diamines represented by the following general formula (I) and diamines represented by the general formula (II) can be used in addition to those already exemplified.
一般式(I) (ただし、一般式(I)中、Xは、イソプロピリデン,
ヘキサフルオロイソプロピリデン,O,S,SO2,CH2,CF2及び
COから成る群から選ばれる少なくとも一種の基、nは、
2以上である。) 一般式(II) (ただし、一般式(II)中、mは、0又は1〜4の整数
である。) 一般式(I)で表わされる化合物としては、1,3−ビス
(4−アミノフエノキシ)ベンゼン、1,3−ビス(3−
アミノフエノキシ)ベンゼン、ビス〔4−(4−アミノ
フエノキシ)フエニル〕スルホン、ビス〔4−(3−ア
ミノフエノキシ)フエニル〕ケトン、2,2−ビス〔4−
(4−アミノフエノキシ)フエニル〕プロパン、2,2−
ビス〔4−(3−アミノフエノキシ)フエニル〕プロパ
ン、ビス〔4−(3−アミノフエノキシ)フエニル〕メ
タン、ビス〔4−(4−アミノフエノキシ)フエニル〕
ジフルオロメタン、ビス〔4−(3−アミノフエノキ
シ)フエニルスルフイド、2,2−ビス〔4−(3−アミ
ノフエノキニ)フエニル〕ヘキサフルオロプロパン等が
ある。General formula (I) (However, in the general formula (I), X is isopropylidene,
Hexafluoroisopropylidene, O, S, SO 2 , CH 2 , CF 2 and
At least one group selected from the group consisting of CO, n is
It is 2 or more. ) General formula (II) (However, in the general formula (II), m is 0 or an integer of 1 to 4.) Examples of the compound represented by the general formula (I) include 1,3-bis (4-aminophenoxy) benzene, 1, 3-bis (3-
Aminophenoxy) benzene, bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] ketone, 2,2-bis [4-
(4-Aminophenoxy) phenyl] propane, 2,2-
Bis [4- (3-aminophenoxy) phenyl] propane, bis [4- (3-aminophenoxy) phenyl] methane, bis [4- (4-aminophenoxy) phenyl]
Examples include difluoromethane, bis [4- (3-aminophenoxy) phenyl sulfide, and 2,2-bis [4- (3-aminophenoxy) phenyl] hexafluoropropane.
一般式(II)で表わされる化合物としては、メタフエニ
レンジアミン、パラフエニレンジアミン、2,4−ジアミ
ノトルエン、2,5−ジアミノトルエン、2,6−ジアミノト
ルエン、2,3−ジメチルパラフエニレンジアミン、2,5−
ジメチルパラフエニレンジアミン、2,6−ジメチルパラ
フエニレンジアミン、3,4−ジメチルメタフエニレンジ
アミン、2,3,5−トリメチルパラフエニレンジアミン、
2,3,4−トリメチルメタフエニレンジアミン、2,3,6−ト
リメチルメタフエニレンアミン、ジアミノジユレン等が
ある。Examples of the compound represented by the general formula (II) include metaphenylenediamine, paraphenylenediamine, 2,4-diaminotoluene, 2,5-diaminotoluene, 2,6-diaminotoluene and 2,3-dimethylparaphenylene. Diamine, 2,5-
Dimethylparaphenylenediamine, 2,6-dimethylparaphenylenediamine, 3,4-dimethylmetaphenylenediamine, 2,3,5-trimethylparaphenylenediamine,
There are 2,3,4-trimethyl metaphenylenediamine, 2,3,6-trimethyl metaphenylenediamine, diaminodiurene and the like.
前記のポリイミドとしては、3,3′,4,4′−ベンゾフエ
ノンテトラカルボン酸二無水物並びに一般式(I)で表
わされるジアミン50〜100モル%(好ましくは55〜90モ
ル%)及び一般式(II)で表わされるジアミン0〜50モ
ル%(好ましくは10〜45モル%)からなるジアミンを反
応させて得られるものが好ましい。Examples of the polyimide include 3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride and the diamine represented by the general formula (I) in an amount of 50 to 100 mol% (preferably 55 to 90 mol%) and Those obtained by reacting a diamine consisting of 0 to 50 mol% (preferably 10 to 45 mol%) of the diamine represented by the general formula (II) are preferable.
ポリイミド樹脂の製造は、反応成分を有機溶剤(特に極
性溶剤)中で反応せしめてポリアミド酸ワニスとした
後、液温を10℃以下に保ちながら閉環剤と閉環触媒を加
えイミド化し、次いでこの溶液を水中あるいは、メタノ
ール,エタノール中に滴下することにより、固形ポリイ
ミドとした後乾燥する方法で粉体状として製造する。こ
の際、用いる極性溶剤としてはN−メチルピロリドン、
N,N−ジメチルアセトアミド、N,N−ジメチルホルムアミ
ド、ジメチルスルホキシド等が好ましい。また、イミド
化に用いる閉環剤としては、無水酢酸、ジシクロヘキシ
ルカルボジイミドなどがあり、閉環触媒としては、ピリ
ジン、N,N−ジメチルアニリン、トリエチルアミン等が
好ましい。Polyimide resin is manufactured by reacting the reaction components in an organic solvent (particularly a polar solvent) to form a polyamic acid varnish, then adding a ring-closing agent and a ring-closing catalyst while keeping the liquid temperature at 10 ° C or lower, and then imidizing this solution. Is dropped into water or methanol or ethanol to form a solid polyimide, which is then dried to obtain a powder. At this time, the polar solvent used is N-methylpyrrolidone,
N, N-dimethylacetamide, N, N-dimethylformamide, dimethyl sulfoxide and the like are preferable. The ring-closing agent used for imidization includes acetic anhydride, dicyclohexylcarbodiimide and the like, and the ring-closing catalyst is preferably pyridine, N, N-dimethylaniline, triethylamine and the like.
この方法以外に、反応成分を溶媒中加熱して直接イミド
化する一段法、ジアミンの代わりに対応するジイソシア
ネートを用いる方法等も使用できる。ポリイミド樹脂は
反応成分を共縮合させて得る場合、ランダム重合体であ
つてもブロツク重合体あつてもよい。Besides this method, a one-step method in which the reaction components are heated in a solvent to directly imidize, a method using a corresponding diisocyanate instead of the diamine, and the like can be used. When the polyimide resin is obtained by co-condensing the reaction components, it may be a random polymer or a block polymer.
前記したイミド環を有する重合性化合物は、ポリイミド
樹脂のアミノ基及び/又はカルボキシル基と反応性の官
能基を有しているのが好ましい。また、イミド環がイソ
イミド基に変わつたものも、上記重合性化合物を包含さ
せる。このようなものとしては、分子末端にビニル基,
エチル基,アリル基,メタクリル基,アクリル基,アル
ケニル基,ノルボルネン構造,マレイン酸構造を持つも
のが好ましい。The above-mentioned polymerizable compound having an imide ring preferably has a functional group reactive with the amino group and / or the carboxyl group of the polyimide resin. In addition, those in which the imide ring is changed to an isoimide group also include the above-mentioned polymerizable compound. Examples of such products include vinyl groups at the end of the molecule,
Those having an ethyl group, an allyl group, a methacrylic group, an acryl group, an alkenyl group, a norbornene structure, and a maleic acid structure are preferable.
上記重合性化合物としては、一般式(III) ただし、式中、R及びR′はCH2=CH−,CH≡C−,CH2=
CH−CH2−, CH2=CH−COO−, 等であり、RとR′は同一でも異なつていてもよい。Ar
1は、 (ここで、X′は、O,CO,SO2,CH2, 等である)等であり、Ar2は、 (ここで、X″はX′と同様のものであり、kは1〜6
の整数である)等であり、Ar2が複数個ある場合は、同
一でも異なつていてもよく、lは0又は1〜100の整数
を示す。一般式(III)において、lは0又は1〜20の
整数のものが成形の改善に特に好ましい。Examples of the polymerizable compound include those represented by the general formula (III) However, in the formula, R and R'are CH 2 = CH-, CH≡C-, CH 2 =
CH-CH 2- , CH 2 = CH-COO-, Etc., and R and R'may be the same or different. Ar
1 is (Here, X'is O, CO, SO 2 , CH 2 , And so on, and Ar 2 is (Here, X ″ is the same as X ′, and k is 1 to 6
When there are a plurality of Ar 2 , they may be the same or different, and l represents 0 or an integer of 1 to 100. In the general formula (III), 1 is particularly preferably 0 or an integer of 1 to 20 for improving molding.
一般式(III)で表わされる化合物の具体例としては、 及び (ただし、p及びqは平均重合度を示し、約1である)
は、サーミツドMC−600、サーミツドFA−700(ナシヨナ
ルスターチアンドケミカル社商品名)として市販されて
いる。Specific examples of the compound represented by the general formula (III) include: as well as (However, p and q represent an average degree of polymerization and are about 1.)
Are commercially available as Thermite MC-600 and Thermite FA-700 (trade name of National Starch and Chemical Co.).
また、 (ただし、rは平均重合度を示す)は、サーミツドIP−
600(r=1)、サーミツドIP−603(r=3)、サーミ
ツドIP−615(r=15)及びサーミツドIP−630(r=3
0)〔これらはいずれも、ナシヨナルスターチアンドケ
ミカル社商品名)として市販されている。Also, (Where r is the average degree of polymerization) is the thermite IP-
600 (r = 1), Thermite IP-603 (r = 3), Thermite IP-615 (r = 15) and Thermite IP-630 (r = 3)
0) [All of these are commercially available as National Starch and Chemical Co., Ltd.].
前記重合性化合物としては、一般式(III)で表される
化合物以外にポリマレイミドが使用できる。As the polymerizable compound, polymaleimide can be used in addition to the compound represented by the general formula (III).
本発明に用いることのできるポリマレイミドの具体例と
してはN,N′−(4,4′−ジフエニルメタン)ビスマレイ
ミド、N,N′−(4,4′−ジフエニルオキシ)ビスマレイ
ミド、N,N′−p−フエニレンビスマレイミド、N,N′−
m−フエニレンビスマレイミド、N,N′−2,4−トリレン
ビスマレイミド、N,N′−2,6−トリレンビスマレイミ
ド、N,N′−エチレンビスマレイミド、N,N′−ヘキサメ
チレンビスマレイミド、 (ただし、hは1〜10の整数である。) といつた構造式で表わされるポリマレイミドがあり、こ
れらを単独あるいは二種以上混合しても用いることがで
きる。Specific examples of the polymaleimide that can be used in the present invention include N, N '-(4,4'-diphenylmethane) bismaleimide, N, N'-(4,4'-diphenyloxy) bismaleimide, N, N '. -P-phenylene bismaleimide, N, N'-
m-phenylene bismaleimide, N, N'-2,4-tolylene bismaleimide, N, N'-2,6-tolylene bismaleimide, N, N'-ethylene bismaleimide, N, N'-hexa Methylene bismaleimide, (However, h is an integer of 1 to 10.) and polymaleimide represented by the structural formula, and these may be used alone or in combination of two or more kinds.
芯材に塗布するポリイミドワニスは、上述のポリイミド
樹脂50〜99重量%と前記重合性化合物1〜50重量%とを
極性溶剤中に溶解することにより合成する。特にポリイ
ミド樹脂の割合は、80〜95重量%が好ましい。極性溶剤
としてはN,N−ジメチルアセトアミド、N,N−ジメチルホ
ルムアミド、N−メチルピロリドン、ジメチルスルホキ
シド等が望ましい。ポリイミドワニス中の固形分濃度
は、10〜50重量%であることが望ましく、特に15〜20重
量%が適している。ワニスの粘度は50〜1000ポイズが好
ましく、100〜800ポイズがより好ましい。The polyimide varnish applied to the core material is synthesized by dissolving 50 to 99% by weight of the above-mentioned polyimide resin and 1 to 50% by weight of the polymerizable compound in a polar solvent. Particularly, the proportion of the polyimide resin is preferably 80 to 95% by weight. As the polar solvent, N, N-dimethylacetamide, N, N-dimethylformamide, N-methylpyrrolidone, dimethylsulfoxide and the like are preferable. The solid content concentration in the polyimide varnish is preferably 10 to 50% by weight, and particularly preferably 15 to 20% by weight. The viscosity of the varnish is preferably 50 to 1000 poise, more preferably 100 to 800 poise.
このポリイミドワニスは、プレードコーター,ナイフコ
ーター,ロツドコーター,スクイズコーターの様な塗工
機でフイルムまたは金属箔等の芯剤の両面にうすく塗布
する。次いで連続的に加熱乾燥し溶剤を除去する。この
際の乾燥温度は80〜250℃が好ましく100〜230℃がより
好ましい。また、乾燥温度を段階的に設定し乾燥を異な
る温度で行うことも可能である。得られる接着剤層の厚
みは5〜50μmが好ましい。次いで、この両面に銅箔を
積層し、バツチ式あるいは連続式に加熱加圧する。この
際、加熱温度は、200〜300℃、加圧は、5〜50kg/cm2の
条件で行うことが好ましい。なお、加熱温度低温より段
階的に上げて実施することも可能である。This polyimide varnish is applied thinly on both sides of a core material such as a film or a metal foil with a coating machine such as a blade coater, knife coater, rod coater or squeeze coater. Next, the solvent is removed by continuously heating and drying. The drying temperature at this time is preferably 80 to 250 ° C, more preferably 100 to 230 ° C. It is also possible to set the drying temperature stepwise and perform the drying at different temperatures. The thickness of the obtained adhesive layer is preferably 5 to 50 μm. Next, copper foils are laminated on both sides and heated and pressed in a batch or continuous manner. At this time, it is preferable that the heating temperature is 200 to 300 ° C. and the pressurization is 5 to 50 kg / cm 2 . It is also possible to increase the heating temperature stepwise from the low temperature.
実施例1 撹拌装置,N2ガス置換装置を備えた10フラスコに1,3−
ビス(4−アミノフエノキシ)ベンゼン409.2gと2,5−
ジメチル−パラ−フエニレンジアミン190.4gとN,N−ジ
メチルホルムアミド5031.6gを加えN2ガンスを流しなが
ら溶解した。溶液温度を35℃に冷却した後、3,3′,4,
4′−ベゾフエノンテトラカルボン酸二無水物(BTDA)9
01.6gを液温が10℃を越えない様に50分間で加えた。こ
の後、3時間撹拌を続けた。この段階で粘度は、1000ポ
イズ以上になつていることを確認する。N,N−ジメチル
ホルムアミド1677.2gを加え樹脂固形分を20重量%にし
た。次いで、得られた溶液を0℃以下に冷却し、液温が
5℃を越えない様にしながらピリジン553gと無水酢酸71
4gを加え引続き2時間撹拌した。得られたポリイミドを
含む溶液を5倍量の水中に注ぎポリイミドを線状固形化
し、続いて粉砕した。粉砕したポリイミドをアセトン中
に入れ2時間撹拌した後、ロ過により粉体ポリイミドを
分離した。分離したポリイミドを再びアセトン中に浸漬
し一日放置した。この後、ロ過により分離したポリイミ
ドを130℃で4時間乾燥し粉状ポリイミド1780gを得た。Example 1 1,3− in 10 flasks equipped with a stirrer and a N 2 gas replacement device
Bis (4-aminophenoxy) benzene 409.2g and 2,5-
Dimethyl-para-phenylenediamine (190.4 g) and N, N-dimethylformamide (5031.6 g) were added and dissolved while flowing N 2 guns. After cooling the solution temperature to 35 ℃, 3,3 ', 4,
4'-bezophenone tetracarboxylic dianhydride (BTDA) 9
01.6 g was added over 50 minutes so that the liquid temperature did not exceed 10 ° C. After this, stirring was continued for 3 hours. At this stage, make sure that the viscosity is over 1000 poise. 1677.2 g of N, N-dimethylformamide was added to make the resin solid content 20% by weight. Then, the obtained solution was cooled to 0 ° C. or lower, and 553 g of pyridine and acetic anhydride were added so that the temperature of the solution did not exceed 5 ° C.
4 g was added and the mixture was continuously stirred for 2 hours. The solution containing the obtained polyimide was poured into 5 times the amount of water to solidify the polyimide linearly, and then pulverized. The crushed polyimide was put in acetone and stirred for 2 hours, and then the powdered polyimide was separated by filtration. The separated polyimide was immersed again in acetone and left for one day. Then, the polyimide separated by filtration was dried at 130 ° C. for 4 hours to obtain 1780 g of powdery polyimide.
上記粉状ポリイミド1400gとN,N′−(4,4′−ジフエニ
ルメタン)ビスマレイミド140gをN,N′−ジメチルホル
ムアミド5600gに溶解後、ロ過することによりポリイミ
ドワニスを製造した。A polyimide varnish was produced by dissolving 1400 g of the above powdery polyimide and 140 g of N, N '-(4,4'-diphenylmethane) bismaleimide in 5600 g of N, N'-dimethylformamide and then filtering.
ポリイミドフイルム(カプトン100H,デユポン製)の両
面に塗工機を用いて上記ポリイミドワニスを約140μm
厚に塗工した。引続き100℃の連続硬化炉で加熱後、200
℃の連続硬化炉を通して加熱処理を行つた。形成された
接着剤層の厚さは25μmであつた。ついで、このフイル
ムの両側に銅箔を積層し275℃,50kg/cm2の条件で30分間
プレスした。得られた両面銅張り積層板は、よく接着し
ており、室温で2.7kgf/cmのピール強度を有しており高
温時(150℃)のピール強度も1.4kgf/cmと現行のアクリ
ル系接着剤を用いたものの2.4倍と優れた値を示した。Approximately 140 μm of the above polyimide varnish using a coating machine on both sides of a polyimide film (Kapton 100H, made by Dyupon).
It was applied thickly. After heating in a continuous curing oven at 100 ℃, 200
The heat treatment was carried out through a continuous curing furnace at ℃. The thickness of the formed adhesive layer was 25 μm. Then, copper foil was laminated on both sides of this film and pressed at 275 ° C. and 50 kg / cm 2 for 30 minutes. The obtained double-sided copper-clad laminate has good adhesion, has a peel strength of 2.7 kgf / cm at room temperature, and has a peel strength of 1.4 kgf / cm at high temperature (150 ° C), which is the current acrylic adhesive. The value was 2.4 times better than that using the agent.
実施例2 実施例1のポリイミドフイルムの替わりにアルミニウム
箔を用いたが実施例1と同様に高温時のピール強度に優
れた両面銅張り積層板が得られた。Example 2 An aluminum foil was used instead of the polyimide film of Example 1, but a double-sided copper-clad laminate excellent in peel strength at high temperature was obtained as in Example 1.
実施例3 アミンとして1,3−ビス(4−アミノフエノキシ)ベン
ゼンと2,5ジメチルパラフエニレンジアミンの代わりに
ビス〔4−(3−アミノフエノキシ)フエニル〕スルホ
ン(m−APPS)604.8gと4−メチル−1,3−ジアミノベ
ンゼン170.8gを使用する以外は実施例1と同様にして製
造したポリイミドワニスを用い、実施例1と同様にして
両面銅張り積層板を得た。この積層板の室温におけるピ
ール強度3.1kgf/cmであり、150℃におけるピール強度は
1.6kgf/cmとアクリル系接着剤を用いたものの2.6倍であ
る非常に優れていた。Example 3 Instead of 1,3-bis (4-aminophenoxy) benzene and 2,5 dimethylparaphenylenediamine as amines, 604.8 g of bis [4- (3-aminophenoxy) phenyl] sulfone (m-APPS) and 4- A double-sided copper-clad laminate was obtained in the same manner as in Example 1 except that the polyimide varnish produced in the same manner as in Example 1 was used except that 170.8 g of methyl-1,3-diaminobenzene was used. The peel strength of this laminate at room temperature is 3.1 kgf / cm, and the peel strength at 150 ° C is
It was 1.6 kgf / cm, which was 2.6 times that of the one using an acrylic adhesive, which was excellent.
実施例4 BTDA32.2g,m−APPS21.6g及び2,4−ジアミノトルエン6.1
gを撹拌機,温度計,窒素ガス導入管,冷却管を備えた
四つ口フラスコに入れ、m−クレゾール539g,トルエン1
08gを添加し、窒素ガスを流しながら加熱撹拌した。150
〜160℃で16時間反応させた樹脂分17.8重量%,粘度15
ポイズのポリイミドを含む溶液を得た。この溶液をアセ
トン中に注いで再沈し粉砕,洗浄,乾燥することによつ
てポリイミド粉末を得た。ポリイミド粉末の還元粘度
〔濃度0.1g/dl,溶媒N,N−ジメチルホルムアミド(DM
F),温度30.0℃〕は0.72dl/gであつた。得られたポリ
イミド粉末100gとN,N′−(4,4′−ジフエニルメタン)
ビスマレイミド10gをN,N−ジメチルホルムアミド400gに
溶解しポリイミドワニスを得た。Example 4 BTDA32.2g, m-APPS 21.6g and 2,4-diaminotoluene 6.1
g into a four-necked flask equipped with a stirrer, a thermometer, a nitrogen gas introduction tube, and a cooling tube, and m-cresol 539 g, toluene 1
08 g was added, and the mixture was heated and stirred while flowing nitrogen gas. 150
Resin content 17.8% by weight, viscosity 15 after reacting at ~ 160 ℃ for 16 hours
A solution containing poise polyimide was obtained. This solution was poured into acetone, reprecipitated, pulverized, washed and dried to obtain a polyimide powder. Reduced viscosity of polyimide powder [concentration 0.1 g / dl, solvent N, N-dimethylformamide (DM
F), temperature 30.0 ° C] was 0.72 dl / g. 100 g of the obtained polyimide powder and N, N '-(4,4'-diphenylmethane)
10 g of bismaleimide was dissolved in 400 g of N, N-dimethylformamide to obtain a polyimide varnish.
このワニスを用いて実施例1と同様にして両面銅張積層
板を得た。室温におけるピール強度は2.8kgf/cm、150℃
におけるピール強度は1.5kgf/cmであつた。Using this varnish, a double-sided copper clad laminate was obtained in the same manner as in Example 1. Peel strength at room temperature is 2.8kgf / cm, 150 ℃
The peel strength was 1.5 kgf / cm.
比較例1 実施例1においてビスマレイミドを添加しないこと以外
は実施例1と同様にしてポリイミドワニスを得、このワ
ニスを用いて実施例1と同様にして両面銅張積層板を得
た。この積層板の室温でのピール強度は0.5kgf/cmと弱
いものであつた。Comparative Example 1 A polyimide varnish was obtained in the same manner as in Example 1 except that bismaleimide was not added, and a double-sided copper clad laminate was obtained in the same manner as in Example 1 using this varnish. The peel strength of this laminate at room temperature was as weak as 0.5 kgf / cm.
比較例2 実施例3において、ビスマレイミドを添加しないこと以
外は実施例3と同様にしてポリイミドワニスを得、この
ワニスを用いて実施例1と同様にして両面銅張積層板を
得た。この積層板の室温でのピール強度は0.6kgf/cmと
弱いものであつた。Comparative Example 2 A polyimide varnish was obtained in the same manner as in Example 3 except that bismaleimide was not added, and a double-sided copper clad laminate was obtained in the same manner as in Example 1 using this varnish. The peel strength of this laminate at room temperature was as weak as 0.6 kgf / cm.
本発明のフレキシブル両面金属張り積層板は、接着層に
イミド系樹脂を用いているため、耐熱性特に高温時のピ
ール強度に優れている。また接着層はポリイミドワニス
のコーテイング法を用いているため、従来の接着用ポリ
イミドフイルムを用いる方法よりも経済性に優れてい
る。Since the flexible double-sided metal-clad laminate of the present invention uses an imide resin for the adhesive layer, it is excellent in heat resistance, especially in peel strength at high temperatures. Further, since the adhesive layer uses a coating method of polyimide varnish, it is more economical than the conventional method using a polyimide film for adhesion.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 石橋 武彦 茨城県結城市大字鹿窪1772番地2 日立化 成工業株式会社南結城工場内 (72)発明者 宮寺 康夫 茨城県つくば市和台48番 日立化成工業株 式会社筑波開発研究所内 (72)発明者 横野 春樹 茨城県結城市大字鹿窪1772番地2 日立化 成工業株式会社南結城工場内 (56)参考文献 特開 昭55−18426(JP,A) 特開 昭61−22937(JP,A) 特開 昭62−104840(JP,A) 特開 昭62−30122(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Takehiko Ishibashi 2772, Kajiku, Yuki-shi, Ibaraki Prefecture 2 Minami Yuki Plant, Hitachi Chemical Co., Ltd. (72) Inventor Yasuo Miyadera 48, Wadai, Tsukuba, Ibaraki (72) Inventor, Haruki Yokono, Industrial Building Co., Ltd. Tsukuba R & D Lab. 1772, Kagoku, Yuki City, Ibaraki Prefecture 2 72, Minami-Yuki Plant, Hitachi Chemical Co., Ltd. (56) Reference JP-A-55-18426 (JP, A) JP-A-61-22937 (JP, A) JP-A-62-104840 (JP, A) JP-A-62-30122 (JP, A)
Claims (5)
ンテトラカルボン酸;を用い ジアミンとして、一般式(I) (ただし、式中、Xは、イソプロピリデン、ヘキサフル
オロイソプロピリデン、O、CH2、CF2及びCOから成る群
から選ばれる少なくとも一種の基、nは、2以上であ
る)で表わされる化合物;50〜100モル%、と 一般式(II) (ただし、式中、mは、0又は1〜4の整数) で表わされる化合物;0〜50モル%、とを用いて反応させ
て得られるポリイミド樹脂;及び (b)イミド環を有する重合性化合物; (b)イミド環を有する重合性化合物; を有機溶剤に溶解してなるポリイミドワニスを、塗布
し、乾燥した後、両面に金属箔を積層し加熱加圧するこ
とを特徴とする、フレキシブル両面金属張り積層板の製
造法。1. A flexible core material is provided on both sides with (a) 3,3 ′, 4,4′-benzophenonetetracarboxylic acid as an acid dianhydride; (Wherein, X is at least one group selected from the group consisting of isopropylidene, hexafluoroisopropylidene, O, CH 2 , CF 2 and CO, and n is 2 or more); 50 to 100 mol%, and general formula (II) (Wherein, m is 0 or an integer of 1 to 4); a polyimide resin obtained by reacting with a compound; 0 to 50 mol%; and (b) an imide ring-containing polymerizable compound. Compound; (b) a polymerizable compound having an imide ring; is applied to a polyimide varnish obtained by dissolving the compound in an organic solvent, and after drying, a metal foil is laminated on both sides and heated and pressed, which is flexible both sides Manufacturing method of metal-clad laminate.
り、イミド環を有する重合性化合物の量が1〜50重量%
である、請求項1に記載のフレキシブル両面金属張り積
層板の製造法。2. The amount of the polyimide resin is 50 to 99% by weight, and the amount of the polymerizable compound having an imide ring is 1 to 50% by weight.
The method for producing a flexible double-sided metal-clad laminate according to claim 1, wherein
にビニル基、エチニル基、アリル基、メタクリル基、ア
クリル基、アルケニル基、ノルボルネン構造又はマレイ
ン酸構造を持つものである、請求項1又は2のいずれか
に記載のフレキシブル両面金属張り積層板の製造法。3. The polymerizable compound having an imide ring is one having a vinyl group, an ethynyl group, an allyl group, a methacryl group, an acryl group, an alkenyl group, a norbornene structure or a maleic acid structure at the terminal of the molecule. 2. The method for producing a flexible double-sided metal-clad laminate according to any one of 2 above.
イミドである、請求項1又は2のいずれかに記載のフレ
キシブル両面金属張り積層板の製造法。4. The method for producing a flexible double-sided metal-clad laminate according to claim 1, wherein the polymerizable compound having an imide ring is polymaleimide.
る、請求項1〜4のいずれかに記載のフレキシブル両面
金属張り積層板の製造法。5. The method for producing a flexible double-sided metal-clad laminate according to claim 1, wherein the core material is a polyimide film or a metal foil.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63245598A JPH07119087B2 (en) | 1987-09-30 | 1988-09-29 | Manufacturing method of flexible double-sided metal-clad laminate |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24702487 | 1987-09-30 | ||
JP62-247024 | 1987-09-30 | ||
JP63245598A JPH07119087B2 (en) | 1987-09-30 | 1988-09-29 | Manufacturing method of flexible double-sided metal-clad laminate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01157846A JPH01157846A (en) | 1989-06-21 |
JPH07119087B2 true JPH07119087B2 (en) | 1995-12-20 |
Family
ID=26537298
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63245598A Expired - Lifetime JPH07119087B2 (en) | 1987-09-30 | 1988-09-29 | Manufacturing method of flexible double-sided metal-clad laminate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07119087B2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2691086B2 (en) * | 1991-04-10 | 1997-12-17 | 住友ベークライト株式会社 | Method for manufacturing flexible printed circuit board |
JP2653582B2 (en) * | 1991-09-17 | 1997-09-17 | 住友ベークライト株式会社 | Polyimide film having a polyamic acid layer on the surface having openings and flexible printed circuit board or circuit board using the same |
JP2653583B2 (en) * | 1991-09-17 | 1997-09-17 | 住友ベークライト株式会社 | Polyimide film having a polyamic acid layer on its surface and substrate for flexible printed circuit using the same |
JPH09148695A (en) * | 1995-11-24 | 1997-06-06 | Mitsui Toatsu Chem Inc | Flexible printed circuit board and its manufacture |
JP2000096010A (en) * | 1998-09-22 | 2000-04-04 | Toray Ind Inc | Adhesive tape for semiconductor device |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5518426A (en) * | 1978-07-27 | 1980-02-08 | Asahi Chem Ind Co Ltd | Heat-resistant flexible electronic parts |
JPS6122937A (en) * | 1984-07-11 | 1986-01-31 | 三井金属鉱業株式会社 | Printed wiring board and manufacture thereof |
JPS6230122A (en) * | 1985-04-18 | 1987-02-09 | Hitachi Chem Co Ltd | Thermally curable resin composition |
JPH0686534B2 (en) * | 1985-10-31 | 1994-11-02 | 三井東圧化学株式会社 | Flexible printed circuit board manufacturing method |
-
1988
- 1988-09-29 JP JP63245598A patent/JPH07119087B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH01157846A (en) | 1989-06-21 |
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