JPH0530063B2 - - Google Patents
Info
- Publication number
- JPH0530063B2 JPH0530063B2 JP58163037A JP16303783A JPH0530063B2 JP H0530063 B2 JPH0530063 B2 JP H0530063B2 JP 58163037 A JP58163037 A JP 58163037A JP 16303783 A JP16303783 A JP 16303783A JP H0530063 B2 JPH0530063 B2 JP H0530063B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- semiconductor wafer
- peripheral edge
- semiconductor
- placement section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 41
- 230000002093 peripheral effect Effects 0.000 claims description 25
- 235000012431 wafers Nutrition 0.000 description 49
- 230000007246 mechanism Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は、半導体ウエハ搬送治具に関する。
〔発明の技術的背景〕
近年、集積回路の製造に用いられる半導体ウエ
ハは、自動化された機構でその搬送を行つてい
る。このような自動化された半導体ウエハの搬送
手段として、移動ベルト上に半導体ウエハを載置
するベルト搬送、半導体ウエハをチヤツクで掴む
チヤツク搬送、或は、第1図に示す如く、受け皿
1上に半導体ウエハ2を載置する受け皿搬送が採
用されている。これらの搬送手段は、通常組合せ
て使用されている。また、チヤツク搬送によるも
のは、半導体ウエハをチヤツクする際にごみ等に
よつて汚染するため、次第に使用されない傾向に
ある。
一方、搬送される半導体ウエハの径は、生産性
を向上させるために種々のものが選ばれている。
〔背景技術の問題点〕
然るに、半導体ウエハの径が変化すると、搬送
手段の特に搬送系を全部交換しなければならず、
生産性を著しく低下する問題があつた。因に、ベ
ルト搬送では、ベルト幅を調整しなければなら
ず、受け皿搬送の場合には、受け皿機構の全てを
交換しなければならない。その結果、半導体ウエ
ハの搬送を真空または減圧状態の雰囲気中で行う
場合には、真空等の状態を一度解除して再び設定
し直すことになり、著しい生産性の低下を招く。
〔発明の目的〕
本発明は、径の異なる複数種類の半導体ウエハ
の搬送に適用が可能で生産性の向上を達成した半
導体ウエハ搬送治具を提供することをその目的と
するものである。
〔発明の概要〕
本発明は、半導体ウエハの収容部内にその内径
よりも小さい径でウエハ固定用周縁部を設けて、
径の異なる複数種類の半導体ウエハの搬送を可能
にして作業性の向上を達成した半導体ウエハ搬送
治具である。
〔発明の実施例〕
以下、本発明の実施例について図面を参照して
説明する。
第2図は、本発明の一実施例の斜視図である。
図中10は、略馬蹄形をなる治具本体である。治
具本体10の周囲には、嵌入する半導体ウエハ1
1の肉厚よりも僅に大きい高さの周縁部12が形
成されている。周縁部12の肉径は、例えば5イ
ンチの大型の半導体ウエハ11の直径よりも僅に
大きく設定されている。また、周縁部12の外周
面には、把持柄13が取付けられている。また、
周縁部12で囲まれた治具本体10の床部13の
中央部分には、例えば4インチの小型の半導体ウ
エハが嵌入する程度の内径になるウエハ固定用周
縁部14を有する段部が形成されている。この段
部の中心部分から周縁部12にかけて開口部15
が形成されている。この開口部15は、通常搬送
される半導体ウエハ11は、支持ピン等の上に載
置されているので、支持ピン等を開口部15内に
収容することによつて、支えられた半導体ウエハ
11を治具本体10ですくい込むようにして、周
縁部12或はウエハ固定用周縁部14内に嵌入す
るためのものである。
このように構成された半導体ウエハ搬送治具2
0によれば、大型の半導体ウエハ11を周縁部1
2内に嵌入して搬送し、小型の半導体ウエハをウ
エハ固定用周縁部14内に嵌入して搬送すること
ができる。従つて、搬送する半導体ウエハ11の
径が変化しても搬送機構の調整、交換を全く不要
にして円滑に搬送作業を続行することができる。
このため、搬送する目的地点で真空状態等の雰囲
気を設定している場合であつても、これらの設定
態等を何らくずさず半導体ウエハ11の搬送作業
を続行することができる。その結果、作業性を著
しく向上させることができる。因に、真空状態を
設定した系内で5インチの半導体ウエハから4イ
ンチの半導体ウエハの搬送を、実施例の半導体ウ
エハ搬送治具20で行つたところ、半導体ウエハ
の径の変更に要した調整時間は、約10分であつ
た。これに比べて従来の搬送治具を使用するもの
では、真空状態の解除、再設定に長時間を要し、
結局4時間の調整時間を必要とすることが判つ
た。
なお、実施例では、径の小さい半導体ウエハを
嵌入させるために、周縁部12の内部にウエハ固
定用周縁部14を設けたものについて説明した
が、この他にも第3図に示す如く、周縁部12内
に径の小さい半導体ウエハの周側面が当接するウ
エハ固定用周縁ピン21を取付けるようにしたも
のでも良い。
また、ウエハ固定用周縁部14及びウエハ固定
用周縁ピン21は、2種類以上の径の異なる半導
体ウエハを収容できるように形成しても良いこと
は勿論である。
また、ウエハ固定用周縁14は、実施例の如
く、治具本体10に一体に形成しても良いし、或
は、治具本体10内に着脱可能な略コ字形の保持
板で形成し、種々の径の半導体ウエハに応じて何
数類かを揃えておくようにしても良い。
〔発明の効果〕
以上説明した如く、本発明に係る半導体ウエハ
搬送治具によれば、径の異なる複数種類の半導体
ウエハの搬送に適用が可能であり、生産性を向上
させることができるものである。 DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a semiconductor wafer transfer jig. [Technical Background of the Invention] In recent years, semiconductor wafers used in the manufacture of integrated circuits are transported by automated mechanisms. Such automated semiconductor wafer transport means include belt transport in which the semiconductor wafer is placed on a moving belt, chuck transport in which the semiconductor wafer is gripped by a chuck, or as shown in FIG. A tray conveyor on which the wafer 2 is placed is employed. These conveying means are usually used in combination. In addition, chuck transport systems tend to become less and less used because semiconductor wafers are contaminated with dust and the like when chucked. On the other hand, various diameters of semiconductor wafers to be transported are selected in order to improve productivity. [Problems with the background art] However, when the diameter of the semiconductor wafer changes, the entire transport means, especially the transport system, must be replaced.
There was a problem that significantly reduced productivity. Incidentally, in the case of belt conveyance, the belt width must be adjusted, and in the case of tray conveyance, the entire tray mechanism must be replaced. As a result, when semiconductor wafers are transported in a vacuum or reduced pressure atmosphere, the vacuum or other state must be released and then reset, resulting in a significant drop in productivity. [Object of the Invention] An object of the present invention is to provide a semiconductor wafer transport jig that can be applied to transport a plurality of types of semiconductor wafers having different diameters and achieves improved productivity. [Summary of the Invention] The present invention provides a wafer fixing peripheral portion with a diameter smaller than the inner diameter of the semiconductor wafer storage portion,
This is a semiconductor wafer transfer jig that achieves improved workability by making it possible to transfer multiple types of semiconductor wafers with different diameters. [Embodiments of the Invention] Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 2 is a perspective view of one embodiment of the invention.
In the figure, 10 is a jig main body having a substantially horseshoe shape. A semiconductor wafer 1 to be fitted is placed around the jig main body 10.
A peripheral edge portion 12 is formed with a height slightly larger than the wall thickness of 1. The diameter of the peripheral edge portion 12 is set to be slightly larger than the diameter of the large semiconductor wafer 11 of, for example, 5 inches. Furthermore, a gripping handle 13 is attached to the outer peripheral surface of the peripheral portion 12. Also,
In the center of the floor 13 of the jig main body 10 surrounded by the peripheral edge 12, a stepped portion is formed which has a wafer fixing peripheral edge 14 with an inner diameter large enough to fit, for example, a 4-inch small semiconductor wafer. ing. An opening 15 extends from the center of this step to the peripheral edge 12.
is formed. Since the semiconductor wafer 11 to be transported is normally placed on support pins or the like, the semiconductor wafer 11 supported by the opening 15 can be opened by housing the support pins or the like in the opening 15. This is for fitting into the peripheral edge part 12 or the wafer fixing peripheral edge part 14 by scooping it with the jig main body 10. Semiconductor wafer transfer jig 2 configured in this way
According to No. 0, a large semiconductor wafer 11 is placed at a peripheral portion 1.
A small semiconductor wafer can be inserted into the wafer fixing peripheral portion 14 and transported. Therefore, even if the diameter of the semiconductor wafer 11 to be transported changes, there is no need to adjust or replace the transport mechanism, and the transport work can be continued smoothly.
Therefore, even if an atmosphere such as a vacuum state is set at the destination point to be transported, the work of transporting the semiconductor wafer 11 can be continued without changing these settings in any way. As a result, workability can be significantly improved. Incidentally, when the semiconductor wafer transfer jig 20 of the embodiment was used to transfer a 5-inch semiconductor wafer to a 4-inch semiconductor wafer in a system set in a vacuum state, the adjustment required to change the diameter of the semiconductor wafer was The time was about 10 minutes. In comparison, with conventional transport jigs, it takes a long time to release and reset the vacuum state.
In the end, it was found that 4 hours of adjustment time was required. In the embodiment, a wafer fixing peripheral part 14 was provided inside the peripheral part 12 in order to fit a semiconductor wafer with a small diameter, but in addition to this, as shown in FIG. A peripheral pin 21 for fixing a wafer, which is in contact with the peripheral side of a semiconductor wafer having a small diameter, may be installed in the portion 12. Further, it goes without saying that the wafer fixing peripheral portion 14 and the wafer fixing peripheral pin 21 may be formed so as to accommodate two or more types of semiconductor wafers with different diameters. Further, the wafer fixing peripheral edge 14 may be formed integrally with the jig main body 10 as in the embodiment, or it may be formed with a substantially U-shaped holding plate that is detachable within the jig main body 10. Several types may be prepared depending on semiconductor wafers of various diameters. [Effects of the Invention] As explained above, the semiconductor wafer transfer jig according to the present invention can be applied to transfer multiple types of semiconductor wafers with different diameters, and productivity can be improved. be.
第1図は、従来の半導体ウエハ搬送治具の斜視
図、第2図は、本発明の一実施例の斜視図、第3
図は、本発明の他の実施例の斜視図である。
10……治具本体、11……半導体ウエハ、1
2…周縁部、13………把持柄、14……ウエハ
固定用周縁部、15……開口部、20,22……
半導体ウエハ搬送治具、21……ウエハ固定用周
縁ピン。
FIG. 1 is a perspective view of a conventional semiconductor wafer transfer jig, FIG. 2 is a perspective view of an embodiment of the present invention, and FIG.
The figure is a perspective view of another embodiment of the invention. 10...Jig body, 11...Semiconductor wafer, 1
2... Peripheral portion, 13... Gripping handle, 14... Peripheral portion for wafer fixing, 15... Opening, 20 , 22 ...
Semiconductor wafer transfer jig, 21...peripheral pin for wafer fixation.
Claims (1)
該ウエハ載置部の周縁部に連結された把持柄とを
具備し、前記ウエハ載置部の中央部には開口部を
設けると共に、前記ウエハ載置部の周縁部には、
前記把持部が連結されている位置とは別の位置
に、前記開口部に連通した切欠部を設けた半導体
ウエハ搬送治具において、 前記ウエハ載置部は、載置されるウエハの下面
に接触してこれを保持するために設けられた、所
定幅を有する第一環状保持面と、該第一環状保持
面の外周縁から該保持面に対して垂直かつ上方に
向けて立設された第一ウエハ当接面と、前記第一
環状保持面の内周縁から該保持面に対して垂直か
つ下方に向けて垂設された第二ウエハ当接面と、
該第二ウエハ当接面の下端から前記第一環状保持
面に対して平行かつ内側に向けて所定幅で延設さ
れ、載置されるウエハの下面に接触してこれを保
持する第二環状保持面とを具備することを特徴と
する半導体ウエハ搬送治具。[Claims] 1. A wafer placement section on which a semiconductor wafer is placed;
a gripping handle connected to a peripheral edge of the wafer placement section, an opening provided in the center of the wafer placement section, and a gripping handle connected to a peripheral edge of the wafer placement section;
In the semiconductor wafer transfer jig, the semiconductor wafer transfer jig is provided with a notch communicating with the opening at a position different from a position where the gripping part is connected, wherein the wafer mounting part is in contact with a lower surface of the wafer to be mounted. a first annular holding surface having a predetermined width and provided for holding the first annular holding surface; a second wafer contact surface that extends vertically and downward from the inner peripheral edge of the first annular holding surface;
A second annular shape extending from the lower end of the second wafer contacting surface parallel to and inward to the first annular holding surface with a predetermined width to contact and hold the lower surface of the wafer to be placed. A semiconductor wafer transfer jig characterized by comprising a holding surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16303783A JPS6054449A (en) | 1983-09-05 | 1983-09-05 | Conveying jig for semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16303783A JPS6054449A (en) | 1983-09-05 | 1983-09-05 | Conveying jig for semiconductor wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6054449A JPS6054449A (en) | 1985-03-28 |
JPH0530063B2 true JPH0530063B2 (en) | 1993-05-07 |
Family
ID=15765980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16303783A Granted JPS6054449A (en) | 1983-09-05 | 1983-09-05 | Conveying jig for semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6054449A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0555891B1 (en) * | 1985-10-24 | 1999-01-20 | Texas Instruments Incorporated | Vacuum processing system and method |
JPH0713217Y2 (en) * | 1988-09-24 | 1995-03-29 | 株式会社リコー | Lower electrode of semiconductor manufacturing equipment |
JP3107310B2 (en) * | 1988-11-30 | 2000-11-06 | 東京エレクトロン株式会社 | Processing equipment |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54103034A (en) * | 1978-01-30 | 1979-08-14 | Matsushita Electric Ind Co Ltd | Automatic developer |
JPS57159534A (en) * | 1981-02-13 | 1982-10-01 | Ramu Research Corp | Load lock |
-
1983
- 1983-09-05 JP JP16303783A patent/JPS6054449A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54103034A (en) * | 1978-01-30 | 1979-08-14 | Matsushita Electric Ind Co Ltd | Automatic developer |
JPS57159534A (en) * | 1981-02-13 | 1982-10-01 | Ramu Research Corp | Load lock |
Also Published As
Publication number | Publication date |
---|---|
JPS6054449A (en) | 1985-03-28 |
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