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JPS54103034A - Automatic developer - Google Patents

Automatic developer

Info

Publication number
JPS54103034A
JPS54103034A JP969978A JP969978A JPS54103034A JP S54103034 A JPS54103034 A JP S54103034A JP 969978 A JP969978 A JP 969978A JP 969978 A JP969978 A JP 969978A JP S54103034 A JPS54103034 A JP S54103034A
Authority
JP
Japan
Prior art keywords
developing
turntable
gases
samples
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP969978A
Other languages
Japanese (ja)
Other versions
JPS6255132B2 (en
Inventor
Mitsushi Katano
Shinzaburo Ishikawa
Yasuhiko Tanigawa
Tatsuyuki Tomioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP969978A priority Critical patent/JPS54103034A/en
Publication of JPS54103034A publication Critical patent/JPS54103034A/en
Publication of JPS6255132B2 publication Critical patent/JPS6255132B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photographic Processing Devices Using Wet Methods (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To automatically accomplish the developing and drying operations by placing a plurality of samples to be developed on a turntable, by sequentially injecting a developing liquid, a rinsing liquid and drying N2 gases from respective injecting nozzles simultaneously with the rotations and by stopping the rotatins simultaneously with the stop of injection of N2 gases.
CONSTITUTION: A plurality of large and rectangular samples 50 such as thermal head substrates are placed on a turntable which is mounted rotatably in a developing tube 1 of sealed construction. The turntable is turned by the control of a control unit 3 for controlling a developing step so that a developing liquid, a rinsing liquid and drying N2 gases are injected in the order specified onto a sample 50 for a preset time from spray nozzles 54, 56 and 57, respectively. Simultaneously as the injection of the N2 gases is stopped, the turntable 4 is stopped. Thus, a plurality of samples can be automatically developed, rinsed and dried to remarkably improve the productivity and reproductivity and to effect stable development.
COPYRIGHT: (C)1979,JPO&Japio
JP969978A 1978-01-30 1978-01-30 Automatic developer Granted JPS54103034A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP969978A JPS54103034A (en) 1978-01-30 1978-01-30 Automatic developer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP969978A JPS54103034A (en) 1978-01-30 1978-01-30 Automatic developer

Publications (2)

Publication Number Publication Date
JPS54103034A true JPS54103034A (en) 1979-08-14
JPS6255132B2 JPS6255132B2 (en) 1987-11-18

Family

ID=11727470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP969978A Granted JPS54103034A (en) 1978-01-30 1978-01-30 Automatic developer

Country Status (1)

Country Link
JP (1) JPS54103034A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633834A (en) * 1979-08-29 1981-04-04 Toshiba Corp Manufacturing device of semiconductor
JPS57173660U (en) * 1981-04-28 1982-11-01
JPS59104533U (en) * 1982-12-29 1984-07-13 富士通株式会社 Resist processing equipment
JPS6054449A (en) * 1983-09-05 1985-03-28 Toshiba Corp Conveying jig for semiconductor wafer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4974940A (en) * 1972-11-17 1974-07-19
JPS49134151U (en) * 1973-03-20 1974-11-18
JPS51132922A (en) * 1975-05-14 1976-11-18 Nec Corp Outline emphasis signal generation apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4974940A (en) * 1972-11-17 1974-07-19
JPS49134151U (en) * 1973-03-20 1974-11-18
JPS51132922A (en) * 1975-05-14 1976-11-18 Nec Corp Outline emphasis signal generation apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633834A (en) * 1979-08-29 1981-04-04 Toshiba Corp Manufacturing device of semiconductor
JPS6329406B2 (en) * 1979-08-29 1988-06-14 Tokyo Shibaura Electric Co
JPS57173660U (en) * 1981-04-28 1982-11-01
JPS59104533U (en) * 1982-12-29 1984-07-13 富士通株式会社 Resist processing equipment
JPH0356041Y2 (en) * 1982-12-29 1991-12-16
JPS6054449A (en) * 1983-09-05 1985-03-28 Toshiba Corp Conveying jig for semiconductor wafer
JPH0530063B2 (en) * 1983-09-05 1993-05-07 Tokyo Shibaura Electric Co

Also Published As

Publication number Publication date
JPS6255132B2 (en) 1987-11-18

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