JPH05228449A - Method for washing glass substrate and apparatus therefor - Google Patents
Method for washing glass substrate and apparatus thereforInfo
- Publication number
- JPH05228449A JPH05228449A JP3539392A JP3539392A JPH05228449A JP H05228449 A JPH05228449 A JP H05228449A JP 3539392 A JP3539392 A JP 3539392A JP 3539392 A JP3539392 A JP 3539392A JP H05228449 A JPH05228449 A JP H05228449A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- glass
- cleaning
- speed
- brush
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011521 glass Substances 0.000 title claims abstract description 145
- 239000000758 substrate Substances 0.000 title claims abstract description 109
- 238000000034 method Methods 0.000 title claims description 18
- 238000005406 washing Methods 0.000 title abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 44
- 229920002994 synthetic fiber Polymers 0.000 claims abstract description 34
- 239000012209 synthetic fiber Substances 0.000 claims abstract description 34
- 238000004140 cleaning Methods 0.000 claims description 62
- 238000005507 spraying Methods 0.000 claims description 17
- 238000005452 bending Methods 0.000 claims description 7
- 239000004677 Nylon Substances 0.000 description 11
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 11
- 229920001778 nylon Polymers 0.000 description 11
- -1 silver halide Chemical class 0.000 description 11
- 239000005329 float glass Substances 0.000 description 10
- 239000012634 fragment Substances 0.000 description 10
- 239000000839 emulsion Substances 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000007921 spray Substances 0.000 description 5
- 230000007547 defect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229920001634 Copolyester Polymers 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910021612 Silver iodide Inorganic materials 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920001291 polyvinyl halide Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Brushes (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ガラス基板の洗浄方法
およびガラス基板の洗浄装置に関し、更に詳しくは、ガ
ラス表面に洗浄液を散布しながら、ガラス表面をブラシ
で摺擦することにより、ガラス表面に固着する異物を、
効率的に除去するガラス基板の洗浄方法およびそのガラ
ス基板の洗浄方法に用いられるガラス基板の洗浄装置に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass substrate cleaning method and a glass substrate cleaning apparatus. More specifically, the glass surface is rubbed with a brush while spraying a cleaning liquid on the glass surface. Foreign matter that adheres to the
The present invention relates to a method for efficiently cleaning a glass substrate and a glass substrate cleaning apparatus used in the method for cleaning the glass substrate.
【０００２】[0002]
【従来の技術と発明が解決しようとする課題】従来より
ガラス基板は、寸法安定性に優れるため電子回路用フォ
トマスクやディスプレイ用フォトマスクの基板および液
晶パネル等に広く用いられている。これらのガラス基板
に、ガラス切断時および取扱中に発生するガラス破片
や、フロ−トガラス製造時にボトム面上（溶融錫槽と接
触する面）に付着する錫黒点や汚れ等が存在すると、上
記製品の製造において、歩留まり低下が起きるという問
題点がある。特にハロゲン化銀乳剤を用いるフォトマス
ク用の場合、ガラス基板上にハロゲン化乳剤を塗布し、
露光により原画パタ−ンを作成し、この原画パタ−ンを
用いて他のハロゲン化銀乾板と密着露光することにより
複製パタ−ンを形成する工程、およびフォトレジスト層
を有する基板と前記原画パタ−ンとを密着露光して、フ
ォトレジストの複製パタ−ンを形成する工程で、ガラス
基板上にガラス破片が存在すると、密着露光時に、該ガ
ラス破片により原画パタ−ンや複製パタ−ンを破壊し、
これらが使用不可になるという問題点がある。2. Description of the Related Art Conventionally, glass substrates have been widely used as substrates for photomasks for electronic circuits and photomasks for displays, liquid crystal panels, etc. because of their excellent dimensional stability. If these glass substrates have glass fragments generated during glass cutting or during handling, or tin black spots or stains that adhere to the bottom surface (surface contacting the molten tin bath) during the production of the float glass, the above product There is a problem in that the yield is reduced in the manufacture of. Especially for a photomask using a silver halide emulsion, the halide emulsion is coated on a glass substrate,
A step of forming an original pattern by exposure and forming a duplicate pattern by exposing the original pattern to another silver halide dry plate using the original pattern, and a substrate having a photoresist layer and the original pattern. In the step of forming a duplicate pattern of the photoresist by contact exposure with a glass, if glass fragments are present on the glass substrate, the original pattern or the duplicate pattern is formed by the glass fragments during the contact exposure. Destroyed,
There is a problem that these cannot be used.
【０００３】そこで、このようなガラス表面上の欠陥を
除去するために、通常、ガラス表面を研磨剤で研磨処理
することにより、ガラス表面の欠陥を除去することが行
なわれている。Therefore, in order to remove such defects on the glass surface, it is usual to remove the defects on the glass surface by polishing the glass surface with an abrasive.
【０００４】しかしながら、この方法においては、研磨
処理がバッチ処理であるから、大量のガラス基板を高速
で短時間の内に洗浄処理することができず、したがって
生産性が低いという欠点を有している。However, in this method, since the polishing process is a batch process, a large amount of glass substrates cannot be cleaned at a high speed in a short time, and therefore the productivity is low. There is.
【０００５】本発明は前記事情に基づいてなされたもの
である。本発明者らは、ガラス基板が搬送される洗浄ラ
インにおいて、特定の特性を有する合成繊維のブラシを
用いて回転洗浄と同時に回転ブラシが特定方向に移動さ
せるとガラス表面に固着する上記欠陥を除去させること
を見出した。The present invention has been made based on the above circumstances. The inventors of the present invention remove the above-mentioned defects that adhere to the glass surface when a rotating brush is moved in a specific direction at the same time as rotational cleaning using a synthetic fiber brush having a specific property in a cleaning line where glass substrates are transported. I found that.
【０００６】本発明の目的は、ガラス表面に固着する異
物が除去されたガラス基板を、高い生産性で、安価に供
給することができるガラス基板の洗浄方法およびガラス
基板の洗浄装置を提供するものである。An object of the present invention is to provide a glass substrate cleaning method and a glass substrate cleaning apparatus capable of supplying a glass substrate from which foreign substances adhered to the glass surface have been removed with high productivity and at low cost. Is.
【０００７】[0007]
【課題を解決するための手段】前記課題を解決するため
の請求項１に記載の発明は、搬送手段により搬送される
と共に洗浄水を散布されているガラス基板を、直径が
０．２〜３ｍｍである合成繊維をドラムに植設してなる
回転ブラシで、前記搬送手段によるガラス基板の搬送速
度よりも早い回転速度で、かつ一定の軌跡を移動しなが
ら前記ガラス基板表面を摺擦することを特徴とするガラ
ス基板の洗浄方法であり、請求項２に記載の発明は、前
記回転ブラシの軌跡が搬送手段の搬送方向に対して直交
方向である前記請求項１に記載のガラス基板の洗浄方法
であり、請求項３に記載の発明は、前記合成繊維は、曲
げ強さが２００〜１，５００ｋｇ／ｃｍ2 である前記請
求項１または２に記載のガラス基板の洗浄方法であり、
請求項４に記載の発明は、搬送手段によるガラス基板の
搬送速度に対する回転ブラシの移動速度の比が５０倍以
上である前記請求項１，２および３のいずれかに記載の
ガラス基板の洗浄方法であり、請求項５に記載の発明
は、ガラス基板を搬送する搬送手段と、前記ガラス基板
に洗浄水を散布する洗浄水散布手段と、直径が０．２〜
３ｍｍであるである合成繊維で形成されたブラシを植設
すると共に、前記搬送手段によるガラス基板の搬送速度
よりも早い回転速度で、かつ一定の軌跡を移動しながら
前記ガラス基板表面を摺擦する回転ブラシとを備えてな
ることを特徴とするガラス基板の洗浄装置である。According to a first aspect of the present invention for solving the above-mentioned problems, a glass substrate which is transported by a transport means and sprayed with cleaning water has a diameter of 0.2 to 3 mm. With a rotating brush formed by implanting the synthetic fiber in a drum, it is possible to rub the surface of the glass substrate at a rotational speed higher than the transportation speed of the glass substrate by the transportation means and while moving a certain locus. A method of cleaning a glass substrate according to claim 2, wherein the invention described in claim 2 is the method for cleaning a glass substrate according to claim 1, wherein the locus of the rotary brush is a direction orthogonal to the transport direction of the transport means. The invention according to claim 3 is the method for cleaning a glass substrate according to claim 1 or 2, wherein the synthetic fiber has a bending strength of 200 to 1,500 kg / cm 2 .
The invention according to claim 4 is the method for cleaning a glass substrate according to any one of claims 1, 2 and 3, wherein the ratio of the moving speed of the rotating brush to the carrying speed of the glass substrate by the carrying means is 50 times or more. According to a fifth aspect of the present invention, the conveying means for conveying the glass substrate, the cleaning water spraying means for spraying the cleaning water on the glass substrate, and the diameter of 0.2 ~
A brush made of synthetic fiber having a size of 3 mm is implanted, and the surface of the glass substrate is rubbed while moving at a rotation speed higher than the transportation speed of the glass substrate by the transportation means and while moving along a constant locus. An apparatus for cleaning a glass substrate, comprising: a rotating brush.
【０００８】以下、本発明について詳述する。本発明に
おいては、まずガラス基板が搬送手段により一定速度で
一定の方向に搬送されている。The present invention will be described in detail below. In the present invention, first, the glass substrate is conveyed by the conveying means at a constant speed in a constant direction.
【０００９】本発明に用いられるガラス基板としては、
電子回路用フォトマスクやディスプレイ用フォトマスク
の基板および液晶パネル等に用いられるガラス基板が挙
げられる。ガラス基板を構成する材質としては、石英ガ
ラス、ソ−ダ石灰ガラス、バリウムガラス、硼珪酸ガラ
ス等を挙げることができる。ハロゲン化銀乳剤等を塗布
するフォトマスク用としては、ソ−ダ石灰組成のフロ−
トガラスが好ましい。これらのガラス基板は、ガラス端
面からガラス破片が飛散しないように、端面に“面取
り”処理を施しておくことが望ましい。As the glass substrate used in the present invention,
Examples thereof include substrates for photomasks for electronic circuits and photomasks for displays, and glass substrates used for liquid crystal panels and the like. Examples of the material forming the glass substrate include quartz glass, soda-lime glass, barium glass, borosilicate glass and the like. As a photomask for coating a silver halide emulsion, etc., a soda-lime composition flower is used.
Glass is preferred. It is desirable that the end faces of these glass substrates be “chamfered” so that glass fragments do not scatter from the end faces of the glass.
【００１０】前記搬送手段としては、ガラス基板を固定
した状態で一定方向に搬送することができるのであれば
どのような構造を有していても良い。例えば、搬送手段
として、搬送ベルトとその搬送ベルトを無限軌道上で回
転させる駆動手段例えば駆動輪および従動手段例えば従
動輪とを備えた第一の搬送装置、ガラス基板を固定する
固定手段と、この固定手段に取り付けられると共に軌道
上を転動する車輪と、前記固定手段を牽引する牽引手段
例えば固定手段に結合された鋼索とその鋼索を巻き取る
巻き取り装置とを備えた第二の搬送装置等を挙げること
ができるが、本発明における搬送手段はこれらに限定さ
れるものではない。また、ガラス基板の搬送方向につい
ても、その方向が水平方向であっても、垂直方向であっ
ても、また斜め方向であっても良い。The transporting means may have any structure as long as it can transport the glass substrate in a fixed direction in a fixed state. For example, as a conveying means, a conveying belt and a first conveying device having a driving means for rotating the conveying belt on an endless track, for example, a drive wheel and a driven means such as a driven wheel, a fixing means for fixing a glass substrate, and A second conveying device provided with a wheel attached to the fixing means and rolling on the track, a pulling means for pulling the fixing means, for example, a steel rope connected to the fixing means and a winding device for winding the steel rope. However, the conveying means in the present invention is not limited to these. Further, the glass substrate may be conveyed in the horizontal direction, the vertical direction, or the oblique direction.
【００１１】ガラス基板を搬送する際の搬送速度は、ガ
ラス基板を用いて各種の製品を製造するラインの速度に
応じて適宜に決定するのであるが、余り早すぎると洗浄
を十分に実行することができないこともあり、また余り
遅すぎると効率的でないこともあるので、通常のところ
は、０．１〜１０ｍ／分の範囲内であり、好ましくは
０．５〜５ｍ／分の範囲内である。The transportation speed for transporting the glass substrate is appropriately determined according to the speed of the line for manufacturing various products using the glass substrate, but if it is too fast, sufficient cleaning should be performed. Since it may not be possible, and it may not be efficient if it is too slow, it is usually in the range of 0.1 to 10 m / min, preferably in the range of 0.5 to 5 m / min. is there.
【００１２】本発明においては、搬送されるガラス基板
の表面には、洗浄水散布手段により洗浄水が散布され
る。洗浄水散布手段は、搬送されていくガラス基板の表
面に洗浄水を散布することができる限りその構造につい
ては特に制限がない。例えば、ガラス基板の搬送方向に
対して、直交する方向に一列もしくは複数の列をもって
配置された洗浄水散布ノズルとその洗浄水散布ノズルに
所定の水圧で洗浄水を供給する洗浄水供給手段とを備え
た洗浄水散布装置、後述する回転ブラシにおけるドラム
の表面に多数の洗浄水散布口を設け、回転ブラシの回転
と共にドラム表面からガラス表面に向けて洗浄水を散布
することができるようにした洗浄水散布装置、後述する
回転ブラシの移動に従動すると共に一定方向に配列され
た一列もしくは複数列の洗浄水散布ノズルとその洗浄水
散布ノズルに所定の水圧で洗浄水を供給する洗浄水供給
手段とを備えた洗浄水散布装置、後述する回転ブラシが
ガラス基板面を摺擦する部位に向けて洗浄水を発射する
ことができるように構成された洗浄水散布装置等、各種
の洗浄水散布装置を挙げることができる。In the present invention, cleaning water is sprayed on the surface of the glass substrate to be transported by the cleaning water spraying means. The structure of the cleaning water spraying means is not particularly limited as long as the cleaning water can be sprayed on the surface of the glass substrate being conveyed. For example, a cleaning water spray nozzle arranged in one row or a plurality of rows in a direction orthogonal to the transport direction of the glass substrate and cleaning water supply means for supplying cleaning water to the cleaning water spray nozzle at a predetermined water pressure. A washing water sprinkling device equipped with a large number of washing water sprinkling ports on the surface of the drum of the rotating brush described below, so that the washing water can be sprinkled from the drum surface to the glass surface as the rotating brush rotates. A water spraying device, one row or a plurality of rows of cleaning water spray nozzles arranged in a fixed direction and driven by the movement of a rotating brush described later, and a cleaning water supply means for supplying cleaning water to the cleaning water spray nozzles at a predetermined water pressure. A cleaning water spraying device including a cleaning water sprayer configured to be capable of spraying cleaning water toward a portion where a rotary brush described later rubs the glass substrate surface. It can be given device or the like, various kinds of washing water spraying device.
【００１３】また、洗浄水散布手段によりガラス基板表
面に洗浄水が散布されるタイミングと後述する回転ブラ
シがガラス基板表面を摺擦するタイミングとは同時であ
ること、すなわち、洗浄水散布手段によりガラス基板表
面に洗浄水を散布しながら回転ブラシでガラス基板を摺
擦するのが好ましいのであるが、ガラス基板の表面に洗
浄水散布手段で洗浄水を散布してから、直ちにあるいは
所定の時間の経過後に回転ブラシでガラス基板の表面を
摺擦するようにしても良い。Further, the timing at which the cleaning water is sprayed on the surface of the glass substrate by the cleaning water spraying means and the timing at which the rotary brush, which will be described later, slides on the surface of the glass substrate are the same, that is, the cleaning water spraying means sprays the glass. It is preferable to rub the glass substrate with a rotating brush while spraying the cleaning water on the surface of the substrate, but immediately or after a predetermined time elapses after spraying the cleaning water on the surface of the glass substrate with the cleaning water spraying means. After that, the surface of the glass substrate may be rubbed with a rotating brush.
【００１４】ここで、洗浄水としては、ガラス基板に付
着する汚れの性質に応じて適宜に選択することができ、
水、超純水、有機溶媒、水溶性有機溶媒と水との混合溶
媒、二種以上の有機溶媒からなる混合溶媒等を挙げるこ
とができる。ガラス基板の表面に前述したような錫黒点
等の汚れが存在するときには、洗浄水として水を使用す
るのが良い。Here, the washing water can be appropriately selected according to the nature of the dirt adhering to the glass substrate,
Examples thereof include water, ultrapure water, an organic solvent, a mixed solvent of a water-soluble organic solvent and water, and a mixed solvent composed of two or more kinds of organic solvents. When the surface of the glass substrate is contaminated with tin black dots as described above, it is preferable to use water as the cleaning water.
【００１５】本発明においては、前記搬送手段により搬
送されるガラス基板の表面を、洗浄水を散布してから、
あるいは洗浄水を散布しつつ、一定の軌跡を描いてガラ
ス基板に対して相対的に移動する回転ブラシで摺擦す
る。In the present invention, cleaning water is sprayed on the surface of the glass substrate conveyed by the conveying means,
Alternatively, while spraying the cleaning water, it is rubbed with a rotating brush that draws a certain trajectory and moves relatively to the glass substrate.
【００１６】この回転ブラシは、ドラムの表面に、直径
が０．２ｍｍ以上、好ましくは０．２〜３ｍｍ、特に好
ましくは０．５〜１．５ｍｍである合成繊維を植設して
なる。合成繊維の直径が０．２ｍｍ未満であると合成繊
維自身の腰が弱く、ガラス面との接触時に歪曲し、充分
な洗浄作用が発揮されない。一方、合成繊維の直径が３
ｍｍを超えると、腰は強くなり、異物除去性を有する
が、ガラス面への抵抗が大きくてガラス表面に傷をつけ
るので好ましくない。This rotary brush is formed by implanting synthetic fibers having a diameter of 0.2 mm or more, preferably 0.2 to 3 mm, particularly preferably 0.5 to 1.5 mm, on the surface of a drum. If the diameter of the synthetic fiber is less than 0.2 mm, the synthetic fiber itself has a weak stiffness, and the synthetic fiber is distorted at the time of contact with the glass surface, failing to exert a sufficient cleaning action. On the other hand, the diameter of synthetic fiber is 3
If it exceeds mm, the stiffness becomes strong and the foreign matter is removed, but the resistance to the glass surface is large and the glass surface is scratched, which is not preferable.
【００１７】ドラムに植設された合成繊維の曲げ強さ
は、２００〜１，５００ｋｇ／ｃｍ2、好ましくは４５
０〜１３００ｋｇ／ｃｍ2 であるのが望ましい。ここ
で、合成繊維の曲げ強さが前記範囲にあると、回転ブラ
シのガラス基板に対する相対的な移動運動と相俟って効
率的にガラス表面上の汚れを除去することができる。そ
の曲げ強さが２００ｋｇ／ｃｍ2 未満であると、合成繊
維自身の腰が弱く、ガラス面との接触時に歪曲し、充分
な洗浄作用の奏されないことがある。一方、合成繊維の
曲げ強さが１，５００ｋｇ／ｃｍ2 を超えると、腰は強
くなり、異物除去性を有するが、ガラス面への抵抗が大
きくガラスに傷が発生しやすくなることがある。The bending strength of the synthetic fibers planted in the drum is 200 to 1,500 kg / cm 2 , preferably 45.
It is preferably 0 to 1300 kg / cm 2 . Here, when the bending strength of the synthetic fiber is within the above range, the dirt on the glass surface can be efficiently removed in combination with the relative movement of the rotary brush with respect to the glass substrate. If the bending strength is less than 200 kg / cm 2 , the synthetic fiber itself has a weak rigidity, and it may be distorted when it comes into contact with the glass surface, and a sufficient cleaning action may not be achieved. On the other hand, when the bending strength of the synthetic fiber exceeds 1,500 kg / cm 2 , the stiffness becomes strong and the foreign matter removing property is provided, but the resistance to the glass surface is large and the glass may be easily scratched.
【００１８】また、植設された合成繊維の毛足の長さに
は特に制限がないが、ドラム表面から２ｍｍ〜３０ｍｍ
の範囲内が好ましい。The length of the synthetic synthetic fibers that are planted is not particularly limited, but is 2 mm to 30 mm from the drum surface.
The range of is preferable.
【００１９】このような特性を有する合成繊維は、公知
の各種の素材から選択することができる。その合成繊維
の例としては、６−ナイロン、６６−ナイロン、共重合
ナイロン等のポリアミドや、ポリエチレンテレフタレ−
ト、ポリブチレンテレフタレ−ト、共重合ポリエステル
等のポリエステルや、ポリエチレン、ポリプロピレン等
のポリオレフィンや、ポリ塩化ビニル、ポリ弗化ビニリ
デン等のポリハロゲン化ビニル等を挙げることができ
る。これらの内、折曲げ強度や摩擦に対する抵抗が大き
いナイロン系が好ましい。The synthetic fiber having such characteristics can be selected from various known materials. Examples of the synthetic fibers include polyamides such as 6-nylon, 66-nylon and copolymer nylon, and polyethylene terephthalate.
And polyester such as polybutylene terephthalate and copolyester, polyolefin such as polyethylene and polypropylene, polyvinyl halide such as polyvinyl chloride and polyvinylidene fluoride, and the like. Of these, nylon-based materials, which have high bending strength and resistance to friction, are preferable.
【００２０】前記合成繊維をドラムの表面に植設する場
合、一種の合成繊維を用いても良く、また、複数の合成
繊維、例えば６６−ナイロンとそれ以外の合成繊維とを
ドラムの表面にランダムにあるいは適当な規則性をもっ
て植設しても良い。この場合、適当な規則性とは、例え
ば６６−ナイロンとその他の合成繊維とを交互に植設す
るような規則性、ドラム表面上で６６−ナイロンで植設
した領域とそのその他の合成繊維を植設した領域とを交
互に繰り返す規則性、ドラム表面上を例えば６６−ナイ
ロンで一様に植設すると共にその６６−ナイロンの植設
領域内にスポット状にその他の合成繊維を植設する規則
性等を挙げることができる。要するに、洗浄効果を高め
るために様々の植設態様を適宜に選択することができる
のである。When implanting the synthetic fibers on the surface of the drum, a kind of synthetic fibers may be used, and a plurality of synthetic fibers, for example, 66-nylon and other synthetic fibers may be randomly distributed on the surface of the drum. Alternatively, it may be planted with proper regularity. In this case, appropriate regularity means, for example, regularity in which 66-nylon and other synthetic fibers are alternately planted, and the area in which 66-nylon is planted on the drum surface and the other synthetic fibers are defined. Regularity of alternating with planted areas, for example, uniform planting of 66-nylon on the drum surface and other synthetic fibers in spots within the 66-nylon planting area. Sex and the like can be mentioned. In short, various planting modes can be appropriately selected to enhance the cleaning effect.
【００２１】また、合成繊維をドラム状に植設するとき
の、植設密度（ドラム表面の単位面積あたりの合成繊維
の占有面積で規定される。）としては、通常、０．０２
以上であり、好ましくは０．０２〜０．８であり、特に
好ましくは０．１〜０．５である。植設面積が前記範囲
を下回ると、合成繊維の植設状態が疎の状態になり、洗
浄効果が発揮されないことがある。When the synthetic fibers are planted in a drum shape, the planting density (defined by the occupied area of the synthetic fibers per unit area of the drum surface) is usually 0.02.
It is above, preferably 0.02 to 0.8, and particularly preferably 0.1 to 0.5. If the planted area is less than the above range, the synthetic fibers may be sparsely planted and the cleaning effect may not be exhibited.
【００２２】なお、回転ブラシの具体的一例を図１に示
す。１で示すのはドラムであり、その周側面には多数の
合成繊維２が植設されている。この図１に示す回転ブラ
シにおいては、一種の合成樹脂例えば６６−ナイロンか
らなるブラシが植設されている。A specific example of the rotary brush is shown in FIG. Reference numeral 1 denotes a drum, on the peripheral side surface of which a large number of synthetic fibers 2 are planted. In the rotary brush shown in FIG. 1, a brush made of a kind of synthetic resin such as 66-nylon is implanted.
【００２３】本発明においては、前記回転ブラシの回転
速度は、ガラス基板の汚れを除去することができる限り
任意に決定することができるが、効率的な洗浄効果を追
求するのであれば、１００〜３０００ｍ／分、好ましく
は２００〜１０００ｍ／分にするのが良い。また、ガラ
ス基板が搬送される搬送速度に対する回転ブラシの回転
速度は、５０倍以上であるのが好ましく、特に２００〜
１０００倍であるのが好ましい。ガラス基板の搬送速度
に対する相対的な回転ブラシの回転速度が５０倍未満で
あると、ガラス基板状の汚れを完全に除去することがで
きないことがある。その反面、上記の回転速度が５０倍
以上であると、回転ブラシにおける合成繊維の特性と相
俟ってガラス基板状の汚れを完全に除去することができ
るようになる。In the present invention, the rotating speed of the rotating brush can be arbitrarily determined as long as the stain on the glass substrate can be removed. It is set to 3000 m / min, preferably 200 to 1000 m / min. Further, the rotation speed of the rotary brush is preferably 50 times or more the transportation speed at which the glass substrate is transported, and particularly 200 to
It is preferably 1000 times. If the rotation speed of the rotary brush relative to the transport speed of the glass substrate is less than 50 times, the stains on the glass substrate may not be completely removed. On the other hand, when the rotation speed is 50 times or more, the glass substrate-like dirt can be completely removed in combination with the characteristic of the synthetic fiber in the rotating brush.
【００２４】回転ブラシを植設したドラムは、搬送され
るガラス基板の搬送方向に対してドラムの中心線が直交
するように配置されているのが好ましいのであるが、場
合によっては、ガラス基板の搬送方向に沿って配置され
ていても良い。このようにガラス基板の搬送方向に沿っ
て回転ブラシが配置されているときには、回転ブラシで
ガラス基板表面を摺擦しつつ回転ブラシをガラス基板の
端部から他方の端部へと往復動させるのが好ましい。ガ
ラス基板の搬送方向に対してドラムの中心線が直交する
ように回転ブラシを配置するときには、回転ブラシの回
転方向はガラス基板の搬送方向と同じ方向（ガラス基板
を巻き込む方向）であっても良いが、効率的な洗浄を追
求するのであればガラス基板の搬送方向とは反対方向
（ガラス基板の搬送方向に逆らう方向）であるのが好ま
しい。It is preferable that the drum in which the rotary brush is planted is arranged so that the center line of the drum is orthogonal to the conveying direction of the glass substrate to be conveyed. It may be arranged along the transport direction. In this way, when the rotating brush is arranged along the transport direction of the glass substrate, the rotating brush reciprocates from one end of the glass substrate to the other end while rubbing the surface of the glass substrate with the rotating brush. Is preferred. When the rotary brush is arranged so that the center line of the drum is orthogonal to the glass substrate transport direction, the rotation direction of the rotary brush may be the same direction as the glass substrate transport direction (direction in which the glass substrate is wound). However, in the case of pursuing efficient cleaning, it is preferable that the direction is opposite to the glass substrate transport direction (direction counter to the glass substrate transport direction).
【００２５】またこの発明において重要なことのひとつ
は、回転ブラシが自ら回転すると共に、ガラス基板に対
して一定の軌跡を描く運動を行うことである。この場合
の好ましい一定の軌跡としては、ガラス基板の搬送方向
に対して直交する方向に回転ブラシが振動する軌跡を挙
げることができる。この場合、軌跡を描く運動は振動運
動とみなすこともでき、そのときの振動数は、通常１０
０回／分以上が好ましく、特に２００〜８００回／分で
あり、振幅は５〜１５ｍｍであるのが好ましい。Further, one of the important things in the present invention is that the rotary brush rotates by itself and also makes a motion that draws a constant locus with respect to the glass substrate. In this case, a preferable fixed locus is a locus in which the rotating brush vibrates in a direction orthogonal to the glass substrate transport direction. In this case, the motion that draws the locus can be regarded as a vibration motion, and the frequency at that time is usually 10
It is preferably 0 times / minute or more, particularly preferably 200 to 800 times / minute, and the amplitude is preferably 5 to 15 mm.
【００２６】以上のようにして本発明によってガラス基
板はその表面を洗浄することができるのであるが、回転
ブラシで摺擦した後に、さらにガラス基板に洗浄水を散
布して洗浄を完全なものにしても良い。As described above, according to the present invention, the surface of the glass substrate can be cleaned. After rubbing with the rotary brush, the glass substrate is further sprayed with cleaning water to complete the cleaning. May be.
【００２７】本発明のガラス基板の洗浄方法および洗浄
装置を用いて得られたガラス基板は、これを用いて、電
子回路用フォトマスクや、ディスプレイ用フォトマスク
の基板等に好適に使用することができる。The glass substrate obtained by using the method and apparatus for cleaning a glass substrate of the present invention can be suitably used for a substrate for a photomask for an electronic circuit, a photomask for a display, or the like. it can.
【００２８】その際に、本発明によって洗浄されたガラ
ス基板の上に塗布される感光材料としては、ハロゲン化
銀乳剤では特にハロゲン化銀粒子が０．１μｍ以下のリ
−プマン型乳剤や、ハロゲン化銀粒子が０．４μｍ以下
の塩臭化銀乳剤を用いるのが好ましく、また、基板の上
にクロムを蒸着した後、フォトレジストを塗布すること
も好ましい。At this time, as a light-sensitive material coated on the glass substrate washed according to the present invention, a silver halide emulsion, particularly a Lepman type emulsion in which silver halide grains are 0.1 μm or less, or a halogen is used. It is preferable to use a silver chlorobromide emulsion having a silver halide grain of 0.4 μm or less, and it is also preferable to deposit chromium on a substrate and then apply a photoresist.
【００２９】[0029]
【実施例】次に本発明の実施例および比較例を示し、本
発明についてさらに具体的に説明するが、本実施例の実
施態様はこれらに限定されない。EXAMPLES Next, the present invention will be described more specifically by showing Examples and Comparative Examples of the present invention, but the embodiment of the present Example is not limited to these.
【００３０】（実施例１）下記に示す条件で、ガラスの
端面を面取りしたフロ−トガラスのボトム面側が合成繊
維を植設した回転ブラシで洗浄されるように、フロート
ガラスを搬送して洗浄を行なった。フロートガラスの搬
送速度は２ｍ／分とした。(Example 1) Under the conditions shown below, the float glass was conveyed and washed so that the bottom surface side of the float glass having the chamfered end surface of the glass was washed with a rotary brush in which synthetic fibers were planted. I did. The transportation speed of the float glass was 2 m / min.
【００３１】回転ブラシは、図１に示すように、ドラム
１であるアルミコアと、その表面に均一に植設されたと
ころの、直径が０．７ｍｍであると共にアルミコア表面
からの毛足が１３ｍｍである６６−ナイロンからなるブ
ラシとを有している。As shown in FIG. 1, the rotary brush has an aluminum core, which is a drum 1, and a diameter of 0.7 mm when it is evenly planted on the surface of the drum, and the bristles from the surface of the aluminum core are 13 mm. A 66-nylon brush.
【００３２】ブラシ先端の回転速度が７００ｍ／分であ
り、回転ブラシの左右方向の振幅回数が３００回／分で
ある条件の下に、フロートガラスの表面に水を散布しな
がら回転ブラシをフロートガラスの表面に摺接すること
により、フロートガラスの表面を洗浄した後、水切りを
し、フロートガラスを乾燥した。このような洗浄操作を
行うことにより、洗浄されたフロートガラスを三枚作成
した。Under the condition that the rotating speed of the brush tip is 700 m / min and the number of times of amplitude of the rotating brush in the left-right direction is 300 times / min, the rotating brush is floated on the surface of the float glass while sprinkling water. The surface of the float glass was washed by sliding contact with the surface of the float glass, then drained, and the float glass was dried. By carrying out such a washing operation, three washed float glasses were prepared.
【００３３】これらのガラス基板につき、ガラス破片、
錫黒点、ガラス傷の有無について、４０倍の実体顕微鏡
下で前記三枚のフロートガラスにつきそれぞれ検査を行
ない、評価した。なお、ガラス破片、錫黒点、ガラス傷
の評価は、一枚当たり４０００ｃｍ2 の面積について行
われた。評価結果を表１に示す。Regarding these glass substrates, glass fragments,
The presence or absence of tin black spots and glass scratches was evaluated by inspecting each of the three float glasses under a stereoscopic microscope of 40 times. The glass fragments, tin black spots and glass scratches were evaluated for an area of 4000 cm 2 per sheet. The evaluation results are shown in Table 1.
【００３４】[0034]
【表１】 [Table 1]
【００３５】（比較例１）実施例１において、ブラシの
毛材の直径を０．１ｍｍに代えた以外は、実施例１と同
様にした。評価結果を表１に示す。(Comparative Example 1) The procedure of Example 1 was repeated, except that the diameter of the bristle material of the brush was changed to 0.1 mm. The evaluation results are shown in Table 1.
【００３６】（比較例２）実施例１において、ブラシの
毛材の直径を３．５ｍｍに代えた以外は、実施例１と同
様にした。評価結果を表１に示す。(Comparative Example 2) The procedure of Example 1 was repeated except that the diameter of the bristle material of the brush was changed to 3.5 mm. The evaluation results are shown in Table 1.
【００３７】（実施例２）実施例１と同様に実施するこ
とにより、洗浄したガラス基板二枚を得た。(Example 2) By carrying out in the same manner as in Example 1, two washed glass substrates were obtained.
【００３８】沃化銀４モル％、臭化銀９６モル％からな
る平均粒径０．０５μｍのリップマン型ハロゲン化銀乳
剤を化学熟成した後、常法の増感色素、抑制剤、硬膜
剤、シランカップリング剤を添加した乳剤を、前記ガラ
ス基板における洗浄された表面に塗布することにより、
試料１を得た。この試料１を二枚作成した。なお、Ａｇ
量２．８ｇ／ｍ2 、ゼラチン量５．９ｇ／ｍ2 であっ
た。After chemically ripening a Lippmann type silver halide emulsion having an average grain size of 0.05 μm, which comprises 4 mol% of silver iodide and 96 mol% of silver bromide, a conventional sensitizing dye, an inhibitor and a hardener are used. By applying an emulsion to which a silane coupling agent has been added to the cleaned surface of the glass substrate,
Sample 1 was obtained. Two sheets of this sample 1 were prepared. In addition, Ag
The amount was 2.8 g / m 2 and the amount of gelatin was 5.9 g / m 2 .
【００３９】試料１の内の一枚を、フォトプロッタ−に
て描画露光し現像処理を行ない、原画パタ−ンを作成し
た。この原画パタ−ンをマスタ−として、試料１の内の
残りの一枚に、真空密着露光を与えた後、現像処理し、
複製パタ−ンを作成した。得られた複製パタ−ンにつ
き、ガラス破片、錫黒点、ガラス傷の有無について、４
０倍の実体顕微鏡下で検査を行ない、前記実施例１と同
様にして評価した。評価結果を表２に示す。One of the samples 1 was exposed by drawing with a photo plotter and developed to prepare an original image pattern. Using this original pattern as a master, the remaining one of the samples 1 was subjected to vacuum contact exposure and then developed.
A duplicate pattern was created. Regarding the obtained duplicate pattern, regarding the presence of glass fragments, tin black spots, and glass scratches, 4
The sample was examined under a stereoscopic microscope of 0 magnification and evaluated in the same manner as in Example 1. The evaluation results are shown in Table 2.
【００４０】（比較例３）比較例１と同様に実施するこ
とにより、洗浄したガラス基板二枚を得た。(Comparative Example 3) Two cleaned glass substrates were obtained in the same manner as in Comparative Example 1.
【００４１】洗浄したガラス基板につき、実施例２と同
様にして試料２を作成した。試料２につき、実施例２で
得られた原画パタ−ンを用いて、実施例２と同様に真空
密着露光を与えた後、現像処理し、複製パタ−ンを作成
した。得られた複製パタ−ンにつき、ガラス破片、錫黒
点、ガラス傷の有無について、４０倍の実体顕微鏡下で
検査を行ない、評価した。評価結果を表２に示す。Sample 2 was prepared in the same manner as in Example 2 for the washed glass substrate. With respect to Sample 2, the original pattern obtained in Example 2 was used, vacuum contact exposure was applied in the same manner as in Example 2, and then development processing was performed to prepare a duplicate pattern. The obtained duplicated pattern was inspected for the presence of glass fragments, tin black spots, and glass scratches under a stereoscopic microscope of 40 times and evaluated. The evaluation results are shown in Table 2.
【００４２】（比較例４）比較例２と同様に実施するこ
とにより、洗浄したガラス基板二枚を得た。(Comparative Example 4) By performing the same operation as in Comparative Example 2, two cleaned glass substrates were obtained.
【００４３】洗浄したガラス基板につき、実施例２と同
様にして試料３を作成した。試料３につき、実施例２で
得られた原画パタ−ンを用いて、実施例２と同様に真空
密着露光を与えた後、現像処理し、複製パタ−ンを作成
した。得られた複製パタ−ンにつき、ガラス破片、錫黒
点、ガラス傷の有無について、４０倍の実体顕微鏡下で
検査を行ない、評価した。評価結果を表２に示す。Sample 3 was prepared in the same manner as in Example 2 for the washed glass substrate. For sample 3, the original pattern obtained in Example 2 was used, vacuum contact exposure was applied in the same manner as in Example 2, and then development processing was performed to prepare a duplicate pattern. The obtained duplicated pattern was inspected for the presence of glass fragments, tin black spots, and glass scratches under a stereoscopic microscope of 40 times and evaluated. The evaluation results are shown in Table 2.
【００４４】[0044]
【表２】 [Table 2]
【００４５】（評価）実施例１および比較例１、２の結
果から、本発明による試料は、ガラス破片および錫黒点
も検出されず、またガラス傷もなく良好であった。(Evaluation) From the results of Example 1 and Comparative Examples 1 and 2, the sample according to the present invention was good in that neither glass fragments nor tin black spots were detected and there was no glass scratch.
【００４６】実施例２および比較例３、４の結果によれ
ば、比較例３による試料２の複製パタ−ンは、パタ−ン
が一部破壊され、また錫黒点も存在し、不良パタ−ンと
なった。また、比較例４による試料３はガラス傷が検出
され不良パタ−ンとなったのに対し、本発明による試料
１はガラス片、錫黒点もなく良好であった。According to the results of Example 2 and Comparative Examples 3 and 4, the duplicate pattern of Sample 2 according to Comparative Example 3 had some patterns destroyed and tin black spots were also present. It became Further, the sample 3 according to Comparative Example 4 had a defective pattern due to the detection of glass scratches, whereas the sample 1 according to the present invention was good with no glass pieces and tin black spots.
【００４７】[0047]
【発明の効果】本発明により、ガラス基板を搬送、洗浄
することにより、ガラス表面に固着する異物が除去され
たガラス基板を、高い生産性で、安価に供給することが
できるガラス基板の洗浄方法およびガラス基板の洗浄装
置を提供することができる。According to the present invention, a glass substrate cleaning method capable of supplying a glass substrate from which foreign substances adhering to the glass surface are removed by transporting and cleaning the glass substrate with high productivity and at low cost. Further, it is possible to provide a cleaning device for a glass substrate.
【図１】図１は、本発明に用いられる回転ブラシを示す
断面図である。FIG. 1 is a cross-sectional view showing a rotating brush used in the present invention.
１ ドラム ２ 合成繊維 1 drum 2 synthetic fiber
Claims (5)
を散布されているガラス基板を、直径が０．２〜３ｍｍ
である合成繊維をドラムに植設してなる回転ブラシで、
前記搬送手段によるガラス基板の搬送速度よりも早い回
転速度で、かつ一定の軌跡を移動しながら前記ガラス基
板表面を摺擦することを特徴とするガラス基板の洗浄方
法。1. A glass substrate having a diameter of 0.2 to 3 mm, which is transported by a transport means and sprayed with cleaning water.
With a rotating brush made by implanting synthetic fiber that is
A method for cleaning a glass substrate, comprising: rubbing the surface of the glass substrate at a rotation speed faster than the transportation speed of the glass substrate by the transporting unit and while moving along a constant trajectory.
方向に対して直交方向である前記請求項１に記載のガラ
ス基板の洗浄方法。2. The method for cleaning a glass substrate according to claim 1, wherein the locus of the rotary brush is a direction orthogonal to the carrying direction of the carrying means.
〜１，５００ｋｇ／ｃｍ2 である前記請求項１または２
に記載のガラス基板の洗浄方法。3. The synthetic fiber has a bending strength of 200.
The said 1 or 2 which is -1,500 kg / cm < 2 >.
The method for cleaning a glass substrate according to.
対する回転ブラシの移動速度の比が５０倍以上である前
記請求項１，２および３のいずれかに記載のガラス基板
の洗浄方法。4. The method for cleaning a glass substrate according to claim 1, wherein the ratio of the moving speed of the rotary brush to the carrying speed of the glass substrate by the carrying means is 50 times or more.
ガラス基板に洗浄水を散布する洗浄水散布手段と、直径
が０．２〜３ｍｍである合成繊維で形成されたブラシを
植設すると共に、前記搬送手段によるガラス基板の搬送
速度よりも早い回転速度で、かつ一定の軌跡を移動しな
がら前記ガラス基板表面を摺擦する回転ブラシとを備え
てなることを特徴とするガラス基板の洗浄装置。5. A transfer means for transferring a glass substrate, a cleaning water spraying means for spraying cleaning water on the glass substrate, and a brush made of synthetic fiber having a diameter of 0.2 to 3 mm are implanted. An apparatus for cleaning a glass substrate, comprising: a rotating brush that rubs the surface of the glass substrate while moving at a rotational speed higher than the speed at which the glass substrate is conveyed by the conveying means and while moving along a constant locus. ..
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3539392A JPH05228449A (en) | 1992-02-21 | 1992-02-21 | Method for washing glass substrate and apparatus therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3539392A JPH05228449A (en) | 1992-02-21 | 1992-02-21 | Method for washing glass substrate and apparatus therefor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05228449A true JPH05228449A (en) | 1993-09-07 |
Family
ID=12440675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3539392A Withdrawn JPH05228449A (en) | 1992-02-21 | 1992-02-21 | Method for washing glass substrate and apparatus therefor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05228449A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6671918B2 (en) | 2000-06-15 | 2004-01-06 | Sharp Kabushiki Kaisha | Substrate cleaning apparatus |
| JP2010207656A (en) * | 2009-03-06 | 2010-09-24 | Oji Paper Co Ltd | Dust collector |
| JP2012094602A (en) * | 2010-10-25 | 2012-05-17 | Tokyo Electron Ltd | Brush, substrate processing apparatus, and substrate processing method |
| WO2015133389A1 (en) * | 2014-03-07 | 2015-09-11 | コニカミノルタ株式会社 | Brush for cleaning sunlight-reflecting mirror, method for cleaning sunlight-reflecting mirror and cleaning apparatus for same |
| WO2015137241A1 (en) * | 2014-03-13 | 2015-09-17 | コニカミノルタ株式会社 | Brush for cleaning sunlight-reflecting mirror, method for cleaning sunlight-reflecting mirror and cleaning apparatus for same |
| WO2016152449A1 (en) * | 2015-03-20 | 2016-09-29 | コニカミノルタ株式会社 | Brush for cleaning sunlight reflecting mirror, and cleaning system, cleaning method and cleaning apparatus for sunlight reflecting mirror |
-
1992
- 1992-02-21 JP JP3539392A patent/JPH05228449A/en not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6671918B2 (en) | 2000-06-15 | 2004-01-06 | Sharp Kabushiki Kaisha | Substrate cleaning apparatus |
| JP2010207656A (en) * | 2009-03-06 | 2010-09-24 | Oji Paper Co Ltd | Dust collector |
| JP2012094602A (en) * | 2010-10-25 | 2012-05-17 | Tokyo Electron Ltd | Brush, substrate processing apparatus, and substrate processing method |
| WO2015133389A1 (en) * | 2014-03-07 | 2015-09-11 | コニカミノルタ株式会社 | Brush for cleaning sunlight-reflecting mirror, method for cleaning sunlight-reflecting mirror and cleaning apparatus for same |
| WO2015137241A1 (en) * | 2014-03-13 | 2015-09-17 | コニカミノルタ株式会社 | Brush for cleaning sunlight-reflecting mirror, method for cleaning sunlight-reflecting mirror and cleaning apparatus for same |
| WO2016152449A1 (en) * | 2015-03-20 | 2016-09-29 | コニカミノルタ株式会社 | Brush for cleaning sunlight reflecting mirror, and cleaning system, cleaning method and cleaning apparatus for sunlight reflecting mirror |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19990518 |