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JPH0495371A - Manufacture of electric connecting member - Google Patents

Manufacture of electric connecting member

Info

Publication number
JPH0495371A
JPH0495371A JP20638790A JP20638790A JPH0495371A JP H0495371 A JPH0495371 A JP H0495371A JP 20638790 A JP20638790 A JP 20638790A JP 20638790 A JP20638790 A JP 20638790A JP H0495371 A JPH0495371 A JP H0495371A
Authority
JP
Japan
Prior art keywords
etching
holder
electrical connection
recess
connection member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20638790A
Other languages
Japanese (ja)
Inventor
Toyohide Miyazaki
豊秀 宮崎
Tetsuo Yoshizawa
吉沢 徹夫
Hiroshi Kondo
浩史 近藤
Takashi Sakaki
隆 榊
Yoshimi Terayama
寺山 芳実
Yoichi Tamura
洋一 田村
Takahiro Okabayashi
岡林 高弘
Kazuo Kondo
和夫 近藤
Yasuo Nakatsuka
康雄 中塚
Yuichi Ikegami
池上 祐一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Nippon Steel Corp
Original Assignee
Canon Inc
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc, Sumitomo Metal Industries Ltd filed Critical Canon Inc
Priority to JP20638790A priority Critical patent/JPH0495371A/en
Priority to US07/630,881 priority patent/US5145552A/en
Publication of JPH0495371A publication Critical patent/JPH0495371A/en
Pending legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Electrical Connectors (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Combinations Of Printed Boards (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電気回路部品同士を電気的に接続する電気的接
続部材を製造する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing an electrical connection member that electrically connects electrical circuit components to each other.

〔従来技術〕[Prior art]

電気回路部品同士を電気的に接続する方法としては、ワ
イヤボンディング方法、 TAB(Tape Aut。
Wire bonding methods and TAB (Tape Out) are methods for electrically connecting electrical circuit components to each other.

mated Bonding )法等が公知である。と
ころがこれらの方法にあっては、相隣する接続部同士が
接触しないようにする為の最小ピッチが比較的大きい為
、接続部同士のピッチに小さいものが要求される場合に
は対応できないという問題点があった。
(mated bonding) method etc. are well known. However, with these methods, the minimum pitch required to prevent adjacent connection parts from coming into contact with each other is relatively large, so there is a problem that they cannot be used when a small pitch between connection parts is required. There was a point.

このような問題点を解決すべく、絶縁保持体中に複数の
導電部材を相互に絶縁して保持させた構成をなす電気的
接続部材を用いて電気回路部品同士を電気的に接続する
ことが提案されている(特開昭63−222437号公
報、特開昭63−224235号公報等)。
In order to solve these problems, electrical circuit components can be electrically connected to each other using an electrical connection member that has a structure in which a plurality of conductive members are mutually insulated and held in an insulating holder. It has been proposed (Japanese Unexamined Patent Publication No. 63-222437, Unexamined Japanese Patent Application No. 63-224235, etc.).

第3図は、このような電気的接続部材を用いた電気回路
部品間の電気的接続を示す模式図であり、図中31は電
気的接続部材、 32.33は接続すべき電気回路部品
を示す。電気的接続部材31は、金属または合金からな
る複数の棒状の導電部材34を、夫々の導電部材34同
士を電気的に絶縁して、電気的絶縁材料からなる薄板状
の保持体35中に保持した構成をなし、導電部材34の
両端を夫々ハンプ38及び39として電気回路部品32
及び33側に突出しである(第3図(a))。そして、
一方の電気回路部品32の接続部36と導電部材34の
バンプ38とを、また、他方の電気回路部品33の接続
部37と導電部材34のバンプ39とを夫々例えば超音
波加熱法等によって合金化することにより接続し、電気
回路部品32゜33同士を電気的に接続する(第3図(
b))。
FIG. 3 is a schematic diagram showing electrical connections between electrical circuit components using such electrical connection members, in which reference numeral 31 indicates electrical connection members, and 32 and 33 indicate electrical circuit components to be connected. show. The electrical connection member 31 holds a plurality of rod-shaped conductive members 34 made of metal or alloy in a thin plate-like holder 35 made of an electrically insulating material, with the conductive members 34 electrically insulated from each other. The electric circuit component 32 has a configuration in which both ends of the conductive member 34 are used as humps 38 and 39, respectively.
and a protrusion on the 33 side (Fig. 3(a)). and,
The connecting portion 36 of one electric circuit component 32 and the bump 38 of the conductive member 34, and the connecting portion 37 of the other electric circuit component 33 and the bump 39 of the conductive member 34 are alloyed by, for example, ultrasonic heating. The electrical circuit components 32 and 33 are electrically connected to each other (see Fig. 3).
b)).

ところで上記電気的接続部材31を製造する方法として
本出願人の一方は第4図に示す方法を提案している(特
願昭63−133401号)。
By the way, as a method for manufacturing the electrical connection member 31, one of the present applicants has proposed a method shown in FIG. 4 (Japanese Patent Application No. 133401/1982).

まず、導電材製の基体40上に前記保持体35となる感
光性樹脂35aを塗布する(第4図(a))。次に後工
程で前記導電部材34を充填する所定の位置を露光、現
像することにより、感光性樹脂35aに孔35bを形成
して基体40を露出させ、次いで温度を高めて感光性樹
脂35aを硬化させる(第4図(b))。
First, a photosensitive resin 35a that will become the holder 35 is applied onto the base 40 made of a conductive material (FIG. 4(a)). Next, in a post-process, a predetermined position to be filled with the conductive member 34 is exposed and developed to form a hole 35b in the photosensitive resin 35a and expose the base 40, and then the temperature is raised to form the photosensitive resin 35a. Harden (Fig. 4(b)).

そして孔35b内の近傍の基体40のエツチングを行い
孔35bの下部に凹部41を形成する(第4図(C))
Then, the substrate 40 near the hole 35b is etched to form a recess 41 in the lower part of the hole 35b (FIG. 4(C)).
.

その後、基体40に対する金等のメツキ処理を行うこと
により、凹部41及び孔35b内に導電部材34を充填
していき、凹部41内に前記ハンプ39を形成し、感光
性樹脂35aの上面にバンプ38を形成する(第4図(
d))。
Thereafter, by plating the base body 40 with gold or the like, the conductive member 34 is filled in the recess 41 and the hole 35b, the hump 39 is formed in the recess 41, and the bump is formed on the upper surface of the photosensitive resin 35a. 38 (Fig. 4 (
d)).

その後、基体40を金属エツチングによって除去するこ
とにより、前記電気的接続部材31が完成する(第4図
(e))。
Thereafter, the electrical connection member 31 is completed by removing the base 40 by metal etching (FIG. 4(e)).

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところで、上述の製造工程において、基体40に凹部4
1を形成する為にエツチングを行っている。
By the way, in the above manufacturing process, the recess 4 is formed in the base body 40.
Etching is performed to form 1.

このエツチングは、例えば塩化第2銅、過硫酸アンモニ
ウム、塩化第2鉄等の一般的なエツチング液を用いる化
学エツチングである。このような化学エツチングにより
銅等の結晶粒界を持つ金属製の基体40をエツチングし
ようとすると、結晶粒界及び/又はエツチングされやす
い結晶面からエツチングが行われ、エツチング後、凹部
41の表面に結晶粒による凹凸が残る。この為、四部4
1内にメツキによって形成されるバンプ39の表面にも
凹凸が形成される結果、各ハンプ39の形状及び高さが
不均一となり、ハンプ39側で電気回路部品と均一な接
続が行えないという問題がある。特にハンプが微細、高
密度化してきた場合に、この結晶粒界による影響が大き
くなる。
This etching is a chemical etching using a common etching solution such as cupric chloride, ammonium persulfate, or ferric chloride. When attempting to etch a metal substrate 40 having grain boundaries such as copper by such chemical etching, etching is performed from the grain boundaries and/or crystal planes that are easily etched, and after etching, the surface of the recess 41 is etched. Unevenness due to crystal grains remains. For this reason, Part 4
As a result of unevenness being formed on the surface of the bumps 39 formed by plating in the inside of the bump 39, the shape and height of each hump 39 become uneven, and the problem that uniform connection with electric circuit components cannot be made on the side of the hump 39. There is. In particular, when the humps become finer and more dense, the influence of these grain boundaries becomes greater.

また、このように凹部41の表面形状及び深さが不均一
になると、メツキによって隆起して形成される反対側の
パン138の高さ、形状にも影響が出る為、バンプ38
側でも同様に電気回路部品と均一な接続が行えなくなる
Moreover, if the surface shape and depth of the recessed portion 41 become uneven in this way, the height and shape of the opposite side bread 138, which is formed by being raised by plating, will also be affected.
Similarly, even connections with electrical circuit components cannot be made on the side.

本発明は斯かる事情に鑑みてなされたものであり、結晶
粒界を持つ金属製の基体を用いて電気的接続部材を製造
する際に、凹凸が少ない均一な表面形状及び深さの凹部
を基体に複数形成して形状及び高さにバラツキがない均
一なバンプを複数形成することが可能な電気的接続部材
の製造方法の提供を目的とする。
The present invention has been made in view of the above circumstances, and it is possible to create recesses with a uniform surface shape and depth with few irregularities when manufacturing an electrical connection member using a metal substrate having grain boundaries. An object of the present invention is to provide a method for manufacturing an electrical connection member that can form a plurality of uniform bumps with no variation in shape and height by forming a plurality of bumps on a base body.

〔課題を解決するための手段〕[Means to solve the problem]

本発明に係る第1の電気的接続部材の製造方法は、基体
と電気的絶縁材製の保持体とを積層してなる母材に前記
保持体を貫通する複数の孔を形成し、該孔内に露出する
前記基体の一部をエツチングして前記孔に連通ずる凹部
を形成し、該凹部及び前記孔にその一端が前記保持体の
表面から露出するように導電部材を充填した後、前記基
体を除去して前記保持体の裏面から前記導電部材の他端
を露出させる電気的接続部材の製造方法において、前記
エツチングは、化学エツチングと電解エツチングとを順
に行うことを特徴とする。
A first method for manufacturing an electrical connection member according to the present invention includes forming a plurality of holes penetrating the holder in a base material formed by laminating a base body and a holder made of an electrically insulating material, and forming a plurality of holes through the holder. After etching a portion of the base body exposed inside to form a recess communicating with the hole, and filling the recess and the hole with a conductive member such that one end thereof is exposed from the surface of the holder, In the method of manufacturing an electrical connection member in which the other end of the conductive member is exposed from the rear surface of the holder by removing the base, the etching is performed by sequentially performing chemical etching and electrolytic etching.

また本発明に係る第2の電気的接続部材の製造方法は、
第1の電気的接続部材の製造方法において、前記化学エ
ツチングと前記電解エツチングとを含む前記エツチング
の工程を複数回繰り返すことを特徴とする。
Further, the second method for manufacturing an electrical connection member according to the present invention includes:
The first method for manufacturing an electrical connection member is characterized in that the etching process including the chemical etching and the electrolytic etching is repeated multiple times.

〔作用〕[Effect]

保持体の貫通孔を通じて露出する基体の一部には、まず
、処理時間が短い化学エツチングが施され、次に電解エ
ツチングが施される。そうすると、化学エツチングによ
って短時間でエツチングされた四部の表面に残る結晶粒
による凹凸は、電解エツチング液こよって研磨され平滑
化される。これにより凹部及び貫通孔に導電部材が充填
されると、導電部材の保持体からの露出部分は夫々均一
な形状及び突出高さに形成される。
The portion of the substrate exposed through the through-hole of the holder is first subjected to chemical etching, which requires a short processing time, and then electrolytic etching. Then, the unevenness caused by crystal grains remaining on the surface of the four parts that have been etched in a short time by chemical etching is polished and smoothed by the electrolytic etching solution. As a result, when the recess and the through-hole are filled with the conductive member, the exposed portions of the conductive member from the holder are each formed to have a uniform shape and protrusion height.

〔実施例) 以下、本発明をその実施例を示す図面に基づいて具体的
に説明する。
[Examples] Hereinafter, the present invention will be specifically described based on drawings showing examples thereof.

第1図は本発明に係る電気的接続部材の製造工程を示す
模式的断面図である。第1図(a)〜(b)は前述した
従来方法と同一であり、基体1として例えば銅箔を用い
、該基体1上に前記保持体たる絶縁層2として例えばネ
ガ型のポリイミド樹脂を塗布してブリへイクを行ったも
のが母材として用意される(第1図(a))。次に導電
部材の配設パターンが形成されたフォトマスクを介して
絶縁層2に光を照射(露光)し、現像を行う。本実施例
においては、フォトマスクを使用することにより、光が
照射された部分に現像後ポリイミド樹脂が残り、光が照
射されていない部分は現像によりポリイミド樹脂が除去
され、複数の孔3が形成される(第1図(b))。その
後、温度を高めてポリイミド樹脂の硬化を行い、絶縁層
2を硬化させる。これにより、絶縁層2の答礼3によっ
て基体】の一部が露出する。
FIG. 1 is a schematic cross-sectional view showing the manufacturing process of an electrical connection member according to the present invention. 1(a) to (b) are the same as the conventional method described above, in which copper foil, for example, is used as the base 1, and a negative type polyimide resin, for example, is coated on the base 1 as the insulating layer 2 serving as the holder. Then, the material is prepared as a base material (Fig. 1(a)). Next, the insulating layer 2 is irradiated with light (exposure) through a photomask on which a conductive member arrangement pattern is formed, and development is performed. In this example, by using a photomask, the polyimide resin remains after development in the areas irradiated with light, and the polyimide resin is removed by development in the areas not irradiated with light, forming a plurality of holes 3. (Fig. 1(b)). Thereafter, the temperature is raised to cure the polyimide resin, thereby curing the insulating layer 2. As a result, a part of the base body is exposed by the cover 3 of the insulating layer 2.

次に露出された基体1を、前述した一般的なエツチング
液を用いて化学エツチングして孔3に連通する凹部4a
を基体1に形成する(第1図(C))。
Next, the exposed substrate 1 is chemically etched using the general etching solution mentioned above to form the recess 4a communicating with the hole 3.
is formed on the substrate 1 (FIG. 1(C)).

例えば凹部4aの深さを4〜5μmに形成する場合、エ
ツチング時間は5〜20秒程度であり、この化学エツチ
ングでは基体1に使用しである銅の結晶粒界及び/又は
活性化エネルギーが少ない(111)結晶面等のの結晶
面からエツチングが進行し、凹部4aの表面に結晶粒(
銅の場合、1〜30μm)による凹凸が残る。この凹凸
により各凹部4aは、形状及び深さが不均一になってい
る。
For example, when forming the recess 4a to a depth of 4 to 5 μm, the etching time is about 5 to 20 seconds, and in this chemical etching, the crystal grain boundaries and/or activation energy of the copper used in the substrate 1 is small. Etching progresses from crystal planes such as (111) crystal planes, and crystal grains (
In the case of copper, unevenness of 1 to 30 μm remains. Due to this unevenness, each recess 4a has an uneven shape and depth.

次にこの化学エツチングが終了した基体1を陽極とし、
負極にCu板を対向させた電解エツチングを行う。ここ
で電解質としては、2N−H2SO4、又は)1cI、
Na0)1+N)I、Cff等を使用することができ、
例えば電解’i4コ2N−)12SO,を使用し両電極
間Q:0.33V印加した場合に1〜10分の電解エツ
チングを行うと、凹部4aの表面の凹凸の白部分からエ
ツチングが進行して凹凸が研磨され、エツチング終了後
、平滑な表面形状を有する凹部4bが形成される(第1
図(d))。なお、前工程の化学エツチング時にはエツ
チング液に含まれている有機物の不純物が凹部4aに付
着し、これが凹部表面の凹凸を更に悪化させるのである
が、この不純物は電解を行うことにより除去できる。
Next, the substrate 1 after this chemical etching is used as an anode,
Electrolytic etching is performed with a Cu plate facing the negative electrode. Here, the electrolyte is 2N-H2SO4 or) 1cI,
Na0)1+N)I, Cff, etc. can be used,
For example, when electrolytic etching is performed for 1 to 10 minutes with Q: 0.33 V applied between both electrodes using electrolytic 'i4co2N-)12SO, etching progresses from the white part of the unevenness on the surface of the recess 4a. After the etching is finished, the recesses 4b with a smooth surface shape are formed (the first
Figure (d)). Note that during the chemical etching in the previous step, organic impurities contained in the etching solution adhere to the recesses 4a, which further worsens the unevenness of the recess surfaces, but these impurities can be removed by electrolysis.

次に基体1に対して金等のメツキ処理を施すことにより
、凹部4b及び孔3内に導電部材5となる金属を充填し
ていき、凹部4b内にバンブ51を、絶縁N2の表面側
にバンプ52を夫々形成する。
Next, by plating the base 1 with gold or the like, the recess 4b and the hole 3 are filled with metal that will become the conductive member 5, and the bump 51 is placed inside the recess 4b on the surface side of the insulation N2. Bumps 52 are respectively formed.

最後に、絶縁層2及び導電部材5をエツチングしないよ
うなエツチング液を用いて基体1をエツチング除去する
ことにより、絶縁層2を導電部材5の保持体として構成
する電気的接続部材6を製造する(第1図(f))。
Finally, the base 1 is etched away using an etching solution that does not etch the insulating layer 2 and the conductive member 5, thereby producing an electrical connection member 6 in which the insulating layer 2 serves as a holder for the conductive member 5. (Figure 1(f)).

なお、ハンプ51及び52の保持体2からの突出高さの
目標値を夫々5μmとした場合、従来方法、即ち基体l
における凹部を化学エツチングのみによって形成した場
合、ハンプ52では誤差が±3μmとかなりのバラツキ
があり、ハンプ51の形状も不均一であったが、本発明
方法により電解エツチングを併用した場合は、その誤差
が±1μmにまで縮小され、両ハンプ共、形状が均一化
された。
Note that when the target value of the protrusion height of the humps 51 and 52 from the holder 2 is 5 μm, the conventional method, that is, the base l
When the concave portions were formed only by chemical etching, there was considerable variation in the error of ±3 μm in the hump 52, and the shape of the hump 51 was also non-uniform. However, when electrolytic etching was used in conjunction with the method of the present invention, The error was reduced to ±1 μm, and the shapes of both humps were made uniform.

第2図は上記製造工程において基体1に形成される凹部
の表面状態を示すものである。第2図(a)は化学エツ
チング後の、また、第2図(b)は電解エツチング後の
凹部表面を夫々示しである。この図から明らかなように
化学エツチングによって生じた凹部表面の凹凸が電解エ
ツチングによる研磨作用で平滑化していることが分かる
FIG. 2 shows the surface condition of the recesses formed in the base body 1 in the above manufacturing process. FIG. 2(a) shows the surface of the recess after chemical etching, and FIG. 2(b) shows the surface of the recess after electrolytic etching. As is clear from this figure, the unevenness on the surface of the recesses caused by chemical etching has been smoothed by the polishing action of electrolytic etching.

〔効果〕〔effect〕

以上の如く本発明に係る電気的接続部材の製造方法にあ
っては、化学エツチングと電解エツチングとを併用して
結晶粒界を持つ基体に凹部を形成することにより、化学
エツチングした場合に生じる凹部表面の凹凸が電解エツ
チングによって研磨。
As described above, in the method for manufacturing an electrical connection member according to the present invention, by using a combination of chemical etching and electrolytic etching to form recesses in a substrate having grain boundaries, recesses that occur when chemically etching are removed. Surface irregularities are polished by electrolytic etching.

平滑化され、その際、化学エジチングにより凹部に付着
したエツチング液の不純物も除去される。
The surface is smoothed, and at this time, impurities of the etching solution adhering to the recesses are also removed by chemical etching.

この結果、複数の凹部の形状及び深さが均一となる為、
その凹部内に形成される導電部材のバンプの形状及び保
持体からの突出高さも均一化され、更にそれに伴って保
持体を介した反対側に形成されるバンプも形状及び突出
高さが均一化され、両面において電気回路部品と均一で
良好な接続性を確保できる。
As a result, the shape and depth of the multiple recesses become uniform, so
The shape and protrusion height of the bumps of the conductive member formed in the recess are made uniform, and the bumps formed on the opposite side of the holder are also made uniform in shape and protrusion height. This ensures uniform and good connectivity with electrical circuit components on both sides.

また、凹部はその大部分を処理時間が短い化学エツチン
グによって形成し、比較的長時間を要する電解エツチン
グは、凹部表面の凹凸の研磨を目的として行うので、エ
ツチング全体の処理時間も短時間で済み、生産性が高い
等、本発明は優れた効果を奏する。
In addition, most of the recesses are formed by chemical etching, which takes a short processing time, and electrolytic etching, which takes a relatively long time, is performed for the purpose of polishing the unevenness on the surface of the recesses, so the overall etching processing time can be shortened. The present invention has excellent effects such as high productivity.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る電気的接続部材の製造工程を示す
模式的断面図、第2図は基体に形成された凹部の表面状
態を示すもの、第3図は電気的接続部材の構成を示す模
式図、第4図は電気的接続部材の従来の製造工程を示す
模式的断面図である。 1・・・基体 2・・・絶縁N(保持体) 3・・・孔
4a、 4b・・・凹部 5・・・導電部材 6・・・
電気的接続部材 51.52・・・バンプ 特 許 出願人 キャノン株式会社(外1名)代理人 
弁理士  河  野  登  夫] 図 第 図(a) 第 図(b) 第 斗 図 手続補正書く方式) 平成2年11月20日 平成2年特許願第206387号 事件との関係 特許出願人 所在地 東京都大田区下丸子3丁目30番2号名 称 
キャノン株式会社 代表者 山路 敬三 所在地 大阪市中央区北浜4丁目5番33号名 称 (
211)住友金属工業株式会社代表者新宮康男
Fig. 1 is a schematic cross-sectional view showing the manufacturing process of the electrical connection member according to the present invention, Fig. 2 shows the surface condition of the recess formed in the base, and Fig. 3 shows the structure of the electrical connection member. The schematic diagram shown in FIG. 4 is a schematic sectional view showing a conventional manufacturing process of an electrical connection member. DESCRIPTION OF SYMBOLS 1... Base body 2... Insulation N (holding body) 3... Hole 4a, 4b... Recessed part 5... Conductive member 6...
Electrical connection member 51.52...Bump patent Applicant Canon Co., Ltd. (1 other person) Agent
Patent Attorney Noboru Kono] Figure (a) Figure (b) Figure (b) Procedure amendment method) November 20, 1990 Relationship with 1990 Patent Application No. 206387 Location of patent applicant Tokyo 3-30-2 Shimomaruko, Ota-ku, Tokyo Name
Canon Co., Ltd. Representative Keizo Yamaji Address 4-5-33 Kitahama, Chuo-ku, Osaka Name (
211) Yasuo Shingu, Representative of Sumitomo Metal Industries, Ltd.

Claims (2)

【特許請求の範囲】[Claims] 1.基体と電気的絶縁材製の保持体とを積層してなる母
材に前記保持体を貫通する複数の孔を形成し、該孔内に
露出する前記基体の一部をエッチングして前記孔に連通
する凹部を形成し、該凹部及び前記孔にその一端が前記
保持体の表面から露出するように導電部材を充填した後
、前記基体を除去して前記保持体の裏面から前記導電部
材の他端を露出させる電気的接続部材の製造方法におい
て、 前記エッチングは、 化学エッチングと電解エッチングとを順に行うこと を特徴とする電気的接続部材の製造方法。
1. A plurality of holes passing through the holder are formed in a base material formed by laminating a base body and a holder made of an electrically insulating material, and a part of the base body exposed in the holes is etched to form the holes. After forming a communicating recess and filling the recess and the hole with a conductive member such that one end thereof is exposed from the surface of the holder, the base is removed and the other conductive member is inserted from the back surface of the holder. A method of manufacturing an electrical connection member in which an end is exposed, wherein the etching includes chemical etching and electrolytic etching performed in sequence.
2.前記化学エッチングと前記電解エッチングとを含む
前記エッチングの工程を複数回繰り返す請求項1記載の
電気的接続部材の製造方法。
2. 2. The method of manufacturing an electrical connection member according to claim 1, wherein the etching process including the chemical etching and the electrolytic etching is repeated multiple times.
JP20638790A 1989-12-21 1990-08-02 Manufacture of electric connecting member Pending JPH0495371A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP20638790A JPH0495371A (en) 1990-08-02 1990-08-02 Manufacture of electric connecting member
US07/630,881 US5145552A (en) 1989-12-21 1990-12-20 Process for preparing electrical connecting member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20638790A JPH0495371A (en) 1990-08-02 1990-08-02 Manufacture of electric connecting member

Publications (1)

Publication Number Publication Date
JPH0495371A true JPH0495371A (en) 1992-03-27

Family

ID=16522505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20638790A Pending JPH0495371A (en) 1989-12-21 1990-08-02 Manufacture of electric connecting member

Country Status (1)

Country Link
JP (1) JPH0495371A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06209155A (en) * 1992-09-30 1994-07-26 American Teleph & Telegr Co <Att> Connection using anisotropic conductive member of electronic component
US6453553B1 (en) * 1997-07-22 2002-09-24 Commissariat A L'energie Atomique Method for making an anisotropic conductive coating with conductive inserts
JP2020068360A (en) * 2018-10-26 2020-04-30 京セラ株式会社 Substrate for power module and power module

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06209155A (en) * 1992-09-30 1994-07-26 American Teleph & Telegr Co <Att> Connection using anisotropic conductive member of electronic component
US6453553B1 (en) * 1997-07-22 2002-09-24 Commissariat A L'energie Atomique Method for making an anisotropic conductive coating with conductive inserts
JP2020068360A (en) * 2018-10-26 2020-04-30 京セラ株式会社 Substrate for power module and power module

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