JPH04372900A - Manufacture of radioactive ray image converting - Google Patents

Abstract

PURPOSE:To obtain a radioactive ray image converting panel of few image defects, by providing a filter to divide the inside of a vessel into an atmosphere which powders to include an activator occupies and an atmosphere which a stimulative phospher layer occupies, and heat-treating it. CONSTITUTION:A plate P is horizontally arranged into the upper side within a heat treatment vessel 1 so that a host layer 2 of a stimulative phospher becomes the underside. Powders 4 to include RbBr: 5X10<-4>T1Br (activator) are arranged in the lower side within this vessel 1. A filter 5 to divide these powders 4 and the plate P is arranged, piled on the upper part of the powders 4. Heat treatment is carried out for 1 hour at 500 deg.C. Provided that the filter 5 is a porous body consisting of alumina, and the minimum pore diameter (d) is 1mm. A radiation image converting panel of few image defects can be obtained by using the plate P after heat treatment.

Description

[Detailed description of the invention]

0001

[Industrial Application Field] The present invention relates to the production of a radiation image conversion panel, which includes the step of forming a stimulable phosphor layer or its base layer and then heat-treating it in the presence of powder containing an activator. Regarding the method.

0002

2. Description of the Related Art For example, in the medical field, radiographic images such as X-ray images are often used to diagnose diseases. The conventional method for forming such radiographic images is to irradiate X-rays that have passed through the subject onto a phosphor layer (phosphor screen), thereby generating visible light, which is then used in the same way as when taking ordinary photographs. In addition, the so-called radiographic method, in which a film using a silver salt is irradiated and developed, was common.

However, in recent years, as a method for directly taking out an image from a phosphor layer without using a film coated with silver salt, radiation transmitted through an object is absorbed by a phosphor, and then this phosphor is exposed to light or heat, for example. A method has been proposed in which the radiation energy absorbed and accumulated in this phosphor is emitted as fluorescence by exciting it with energy, and this fluorescence is detected and imaged.

For example, US Pat. No. 3,859,527 and Japanese Unexamined Patent Publication No. 12144/1987 disclose radiation image conversion using a stimulable phosphor and using visible light or infrared rays as stimulable excitation light. A method is shown. This method is
This uses a radiation image conversion panel in which a stimulable phosphor layer is formed on a substrate, and the radiation transmitted through the object is applied to the stimulable phosphor layer of this radiation image conversion panel to detect the radiation of each part of the object. Radiation energy corresponding to the transmittance is accumulated to form a latent image, and then this photostimulable phosphor layer is scanned with photostimulation excitation light to emit the radiation energy accumulated in each part as stimulated luminescence. For example, an optical signal based on the intensity of this light is photoelectrically converted and converted into an image by an image reproducing device. This final image can be reproduced as a hard copy or reproduced on a CRT.

[0005] As a radiation image conversion panel having a stimulable phosphor layer used in this radiation image conversion method, JP-A-61-73100 discloses a radiation image conversion panel having a stimulable phosphor layer that does not contain a binder in the stimulable phosphor layer. A conversion panel is proposed. In addition, in manufacturing a radiation image conversion panel having a stimulable phosphor layer that does not contain such a binder, conventionally, after forming a stimulable phosphor layer or its base layer on a substrate, heat treatment in the presence of powder containing an activator (see Japanese Patent Application Nos. 175381/1981 and 175382/1982).

[0006]

[Problems to be Solved by the Invention] However, in the above-mentioned conventional technology, when a powder containing an activator is heat-treated, the activator powder is damaged by bumping or air currents in the stimulable phosphor layer or its surroundings. It adheres to the surface of the base layer, and since a high concentration of activator is added locally to that part, sensitivity decreases and image defects occur. SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a method for manufacturing a radiation image conversion panel with fewer image defects.

[0007]

[Means for Solving the Problems] In order to achieve the above object, in the present invention, after forming a stimulable phosphor layer or its base layer, this is coated in the presence of a powder containing an activator. In a method for manufacturing a radiation image conversion panel including a heat treatment step, a filter is provided to separate an atmosphere in which a powder containing an activator is placed and an atmosphere in which a stimulable phosphor layer or its matrix layer is placed. It is characterized by being heat treated.

[0008]

[Action] An atmosphere in which powder containing an activator is placed,
Since the heat treatment is performed using a filter that separates the stimulable phosphor layer from the atmosphere in which the stimulable phosphor layer or its base layer is placed, image defects due to bumping of the activator can be effectively prevented.

The present invention will be specifically explained below. In the present invention, in the step of forming a stimulable phosphor layer or its base layer and then heat-treating it in the presence of a powder containing an activator, an atmosphere in which the powder containing an activator is placed is used. The heat treatment is performed by providing a filter that partitions the stimulable phosphor layer or the atmosphere in which the stimulable phosphor layer or its matrix layer is placed.

Examples of the arrangement of filters are shown in FIGS. 1 to 5. In these figures, 1 is a heat treatment container, 2 is a stimulable phosphor layer or its matrix layer, 3 is a substrate, 4 is a powder containing an activator, 5 is a filter, and 8 is a heater. The powder containing an activator is, for example, when the stimulable phosphor layer or its matrix layer is an RbBr:Tl phosphor or its matrix, RbBr:Tl phosphor powder, a mixed powder of RbBr and TlBr, Alternatively, it refers to TlBr powder, etc. In FIG. 1, the inside of a heat treatment container 1 is divided into two chambers, left and right, by a filter 5 placed in the center, and a stimulable phosphor layer or its matrix layer 2 is placed in a horizontal position on the upper side of one chamber. Powder 4 containing an activator is placed on the lower side of the other chamber. In FIG. 2, a powder 4 containing an activator is placed on the lower side of a heat treatment container 1, a filter 5 is placed on top of the powder 4, and the inside of the heat treatment container 1 is divided into two upper and lower chambers. In the side chamber, the stimulable phosphor layer or its matrix layer 2 is arranged in a horizontal position. The stimulable phosphor layer or its matrix layer 2 is provided on the side of the substrate 3 facing the powder 4 containing the activator.

In FIG. 3, the structure is the same as that in FIG. 1 except that the stimulable phosphor layer or its matrix layer 2 is arranged in a vertical position. In FIG. 4, the heat treatment container 1 is formed of two completely separated chambers 1A and 1B, a communication path 6 is provided between the two, and a powder 4 containing an activator is placed in the lower side of one chamber 1A. Then, a filter 5 is placed on the wall of the other chamber 1B on the side where the communication path 6 is provided to partition the two chambers, and a stimulable phosphor layer or its matrix layer 2 is placed on the upper side of the other chamber 1B. are doing. 7 is a steam flow control valve provided in the communication path 6. However, this steam flow control valve 7 is not necessarily required. In FIG. 5, the structure is the same as that in FIG. 2 except that the stimulable phosphor layer or its matrix layer 2 is placed on the back side of the substrate 3 with respect to the powder 4 containing the activator. There is. Among the above configurations, the configuration shown in FIG. 2 is preferable from the viewpoint of uniformly and efficiently doping the activator. Further, although the heat treatment temperature T varies depending on the type of stimulable phosphor, it is preferably lower than the melting point Tm of the stimulable phosphor matrix, and is preferably in the range of 0.40Tm<T<0.75Tm.

The filter 5 may be (1) made of a porous material having ventilation holes as shown in FIG. 6, or (2) as shown in FIG.
A cloth made of fiber bundles woven into a cloth, such as (3
) As shown in FIG. 8, an example is one in which a large number of holes 5A are provided in a plate. Among the above, porous bodies and cloths are preferred from the viewpoint of preventing powder bumping, and cloths woven with fiber bundles (FIG. 7) are more preferred from the viewpoint of ease of handling. Further, from the viewpoint of improving corrosion resistance, the material of the filter 5 is preferably glass, ceramics such as alumina, zirconia, or a material coated with ceramics.

The minimum pore diameter d of each pore passing through the thickness of the filter 5 should basically be smaller than the particle diameter of the powder containing the activator, but from the viewpoint of reliably preventing image defects due to bumping, , preferably 1 mm or less. The thickness of the filter 5 is 5 mm from the viewpoint of handling and doping efficiency.
The following are preferred. As mentioned above, the preferable heat treatment temperature T of the radiation image conversion panel is 0.4Tm<T<0.75T.
m (Tm: melting point of the stimulable phosphor matrix), the filter is similarly required to have heat resistance in this temperature range. For example, when the base material is RbBr, the melting point Tm=682
℃, therefore 0.4Tm=273℃, 0.75Tm=5
The temperature is 12° C., and the filter material is preferably glass, ceramics such as alumina or zirconia, or materials coated with ceramics.

The density of pores in the filter varies depending on the size of the pores, but is preferably 10 pores/cm 2 or more. Furthermore, when the area of the part with pores on the plane of the filter is A, and the area of the part without pores is B, the area ratio A/(A+B) should be 30% or more from the viewpoint of improving doping efficiency. Preferably, 50% or more is more preferable. In particular, the thicker the filter, the better the area ratio is larger. It is preferable to overlap the filters shown in FIGS. 6 to 8 with the holes shifted in position to increase the filter effect. In particular, when using a plate with a large number of holes 5A as shown in FIG. 8 as a filter, it is preferable to shift the positions of the holes 5A and stack them as shown in FIG. 14. Furthermore, filters having different minimum pore diameters d may be stacked.

Methods for forming the stimulable phosphor layer or its base layer to be subjected to heat treatment include vapor deposition methods such as vapor deposition, sputtering, CVD, and ion plating. Here, the term "base layer" refers to a stimulable phosphor layer that does not contain an activator.

[0016] In one example of forming a stimulable phosphor layer by a vapor deposition method, after placing the substrate in a vapor deposition apparatus,
The inside of the vapor deposition apparatus is evacuated to a degree of vacuum of, for example, about 10<-6 >Torr. Next, an evaporation source with a stimulable phosphor material is placed in a predetermined position, and the stimulable phosphor material is heated and evaporated using a resistance heater or an electron beam, and the vapor flow is applied to the substrate. The stimulable phosphor is applied to the deposition surface to deposit the stimulable phosphor to a predetermined thickness. In the vapor deposition process, it is also possible to form the stimulable phosphor layer in multiple steps. Further, during vapor deposition, the substrate may be cooled or heated as necessary.

FIG. 9 shows a specific structural example of a radiation image conversion panel manufactured by the manufacturing method of the present invention, in which 10 is a substrate, 11 is a stimulable phosphor layer, 12 is a protective layer, 13 is a spacer, and 14 is a stimulable phosphor layer. is a low refractive index layer.

[0018] As the material of the substrate 10, glass, ceramics, metal, etc. are used. Specifically, glass such as quartz glass and chemically strengthened glass, crystallized glass, ceramics such as sintered plates of alumina or zirconia, metal sheets such as aluminum, aluminum-magnesium alloy, iron, stainless steel, copper, chromium, and lead. etc. The thickness of the substrate 10 varies depending on its material, etc., but is generally preferably 100 μm to 5 mm, and particularly preferably 200 μm to 2 mm for ease of handling.

The protective layer 12 is provided to protect the stimulable phosphor layer 11 physically or chemically. This protective layer 12 may be provided so as to face the stimulable phosphor layer 11 with the low refractive index layer 14 interposed therebetween, or a coating solution for the protective layer may be applied directly onto the stimulable phosphor layer. It may be formed by Alternatively, a protective layer separately formed in advance may be adhered onto the stimulable phosphor layer.

When the protective layer 12 is provided via the low refractive index layer 14, the material used for the protective layer 12 has good translucency and can be formed into a sheet shape. In order to efficiently transmit stimulated excitation light and stimulated luminescence, the protective layer 12 desirably exhibits high light transmittance over a wide wavelength range, and preferably has a light transmittance of 80% or more. Examples of such materials include plate glasses such as quartz, borosilicate glass, and chemically strengthened glass, and organic polymer compounds such as PET, oriented polypropylene, and polyvinyl chloride. Borosilicate glass is 80% in the wavelength range of 330nm to 2.6μm
It shows the above light transmittance, and quartz glass shows even higher light transmittance at shorter wavelengths. Furthermore, it is preferable to provide an anti-reflection layer such as MgF2 on the surface of the protective layer 12, since this is effective in efficiently transmitting stimulated excitation light and stimulated luminescence and reduces deterioration in sharpness.

When the protective layer 12 is provided directly on the stimulable phosphor layer 11, the constituent materials of the protective layer 12 include cellulose acetate, nitrocellulose, polymethyl methacrylate, polyvinyl butyral, polyvinyl formal,
Polycarbonate, polyester, polyethylene terephthalate, polyethylene, vinylidene chloride, nylon, etc. can be used. Moreover, this protective layer 12 is made of SiC, SiO2,
It may also be formed by laminating inorganic materials such as Si3 N4 and Al2 O3. In this case, the layer thickness of the protective layer 12 is 0.000 mm when the protective layer 12 is provided directly on the stimulable phosphor layer 11.
The thickness is preferably 1 to 100 μm, and when provided via the low refractive index layer 14, the thickness is 50 μm to 5 mm, preferably 100 μm to
It is 3mm. Further, the thickness of the protective layer 12 is usually 50 μm.
m to 5 mm, and in order to obtain good moisture resistance, 10
0 μm to 3 mm is preferable.

The low refractive index layer 14 is provided as necessary from the viewpoint of further improving the sharpness of the radiation image. Specifically, CaF2 (refractive index 1.23 to 1
．． 26) , Na3 AlF6 (refractive index 1.35)
, MgF2 (refractive index 1.38), SiO2 (refractive index 1.46), etc.; ethanol (refractive index 1
．． 36) A layer consisting of a liquid such as methanol (refractive index 1.33) or diethyl ether (refractive index 1.35); a layer consisting of a gas such as air, nitrogen, or argon; 1; and so on. In particular, a gas layer or a vacuum layer is preferred. In this case, the thickness of the low refractive index layer 14 is usually 0.05 to 3 mm.

It is preferable that the low refractive index layer 14 is in close contact with the stimulable phosphor layer 11. Therefore, the low refractive index layer 14
If it is a liquid layer, a gas layer, or a vacuum layer, it may be left as is, but the low refractive index layer 14 may be made of CaF2, Na3 AlF6.
, MgF2, SiO2, etc., on the inner surface of the protective layer 12, the stimulable phosphor layer 11 and the low refractive index layer 1
4 may be brought into close contact with, for example, an adhesive or the like.

When the protective layer 12 is disposed at a distance from the stimulable phosphor layer 11, the substrate 10 and the protective layer 12
A spacer 13 surrounding the stimulable phosphor layer 11 is provided between the two. As the spacer 13, the stimulable phosphor layer 1
There is no particular restriction on the material as long as the material can be kept isolated from the external atmosphere, and glass, ceramics, metal, plastic, etc. can be used.

In the present invention, "stimulable phosphor" refers to a stimulable phosphor that is stimulated optically, thermally, mechanically, chemically, or electrically after being irradiated with the first light or high-energy radiation. ) refers to a phosphor that exhibits stimulated luminescence corresponding to the irradiation amount of initial light or high-energy radiation; Body is preferred.

The stimulable phosphor constituting the stimulable phosphor layer is preferably an alkali halide phosphor represented by the following general formula. General formula: MIX・aMIIX' 2
・bMIII X''3 ・cA: dB In the general formula, M
I represents at least one alkali metal of Li, Na, K, Rb, and Cs. MII is Be, Mg, Ca,
Represents at least one divalent metal of Sr, Ba, Zn, Cd, Cu, and Ni. MIII is Sc, Y, La,
Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, D
y, Ho, Er, Tm, Yb, Lu, Al, Ga, In
represents at least one trivalent metal. X, X',
X'' represents at least one halogen selected from F, Cl, Br, and I. A is a compound composition containing oxygen, and preferably represents at least one of the compounds constituting MI, MII, MIII, and activator B described later. B is the activator composition, which includes Eu, Tb, Ce, Tm
, Dy, Pr, Ho, Nd, Yb, Er, Gd, Lu,
Represents at least one metal selected from Sm, Y, Tl, Na, Ag, Cu, In, and Mg. a, b, c, d are 0≦a<
0.5, 0≦b<0.5, 0<c≦0.5, preferably 10-6<c≦0.2, 0<d≦0.2. However, when A is an oxygen compound of the activator constituting B, d may be 0.

The following materials are used as the stimulable phosphor raw materials constituting the alkali halide stimulable phosphor. (1) LiF, LiCl, LiBr, LiI, NaF,
NaCl, NaBr, NaI, KF, KCl, KBr,
KI, RbF, RbCl, RbBr, RbI, CsF,
At least one of CsCl, CsBr, and CsI. (2) BeF2, BeCl2, BeBr2, Be
I2, MgF2, MgCl2, MgBr2, M
gI2, CaF2, CaCl2, CaBr2,
CaI2, SrF2, SrCl2, SrBr2
, SrI2, BaF2, BaCl2, BaBr2
, BaBr2 ・2H2 O, BaI2 , ZnF2
, ZnCl2, ZnBr2, ZnI2, CdF
2, CdCl2, CdBr2, CdI2, Cu
F2, CuCl2, CuBr2, CuI2, Ni
At least one of F2, NiCl2, NiBr2, and NiI2.

(3) ScF3, ScCl3, ScB
r3, ScI3, YF3, YCl3, YBr3
, YI3, LaF3, LaCl3, LaBr3
, LaI3, CeF3, CeCl3, CeBr
3, CeI3, PrI3, PrF3, PrCl
3, PrBr3, PrI3, NdF3, NdC
l3, NdBr3, NdI3, PmF3, Pm
Cl3, PmBr3, PmI3, SmF3, S
mCl3, SmBr3, SmI3, EuF3,
EuCl3, EuBr3, EuI3, GdF3
, GdCl3, GdBr3, GdI3, TbF3
, TbCl3, TbBr3, TbI3, DyF
3, DyCl3, DyBr3, DyI3, Ho
F3, HoCl3, HoBr3, HoI3, E
rF3, ErCl3, ErBr3, ErI3,
TmF3, TmCl3, TmBr3, TmI3
, YbF3, YbCl3, YbBr3, YbI3
, LuF3, LuCl3, LuBr3, LuI
3, AlF3, AlCl3, AlBr3, Al
I3, GaF3, GaCl3, GaBr3, G
aI3, InF3, InCl3, InBr3,
At least one type of InI3. (4) Eu compound group, Tb compound group, Ce compound group, T
m compound group, Dy compound group, Pr compound group, Ho compound group, Nd compound group, Yb compound group, Er compound group, Gd
compound group, Lu compound group, Sm compound group, Y compound group,
At least one activator raw material from the Tl compound group, the Na compound group, the Ag compound group, the Cu compound group, the In compound group, and the Mg compound group.

In the present invention, alkali halide phosphors are particularly preferably used since they are suitable for vapor deposition. However, the present invention is not limited to the above-mentioned phosphors, and other phosphors may also be used as long as they exhibit stimulated luminescence when irradiated with radiation and then irradiated with stimulated excitation light. Can be done.

FIG. 10 schematically shows a radiation image conversion device constructed using a radiation image conversion panel manufactured by the method of the present invention, in which 20 is a radiation generator, 21 is a subject, 22 is a radiation image conversion panel, 23 is a stimulated excitation light source, 24 is a photoelectric conversion device that detects stimulated luminescence emitted from the radiation image conversion panel 22, and 25 is a photoelectric conversion device 24.
a reproduction device that reproduces the detected signal as an image, 26;
27 is a display device that displays the image reproduced by the reproduction device 25; and 27 is a filter that separates stimulated excitation light and stimulated luminescence and allows only stimulated luminescence to pass through.

In this radiation image conversion apparatus, radiation from the radiation generator 20 enters the radiation image conversion panel 22 through the subject 21. This incident radiation is absorbed by the stimulable phosphor layer of the radiation image conversion panel 22, its energy is accumulated, and an accumulated radiation image is formed. Next, this accumulated image is excited with stimulated excitation light from the stimulated excitation light source 23 and is emitted as stimulated luminescence. The strength of the emitted stimulated luminescence is proportional to the amount of accumulated radiation energy, so this optical signal is photoelectrically converted by a photoelectric conversion device 24 such as a photomultiplier tube, and reproduced as an image by a reproduction device 25. By displaying it on the display device 26, a radiographic image of the subject 21 can be observed.

[0032]

EXAMPLES Examples of the present invention will be specifically described below, but the present invention is not limited to these examples. [Example 1] An RbBr evaporation source 37, which is the base of the stimulable phosphor, was installed in the crucible 35 of the vapor deposition apparatus shown in FIG.
A substrate 34 made of crystallized glass measuring 400 mm x 500 mm in thickness and a filter 43 were placed at predetermined positions. The crucible 3 is moved by moving the vapor flow adjustment plate 30 so that the intersection angle between the streamline of the vapor flow and the surface of the substrate 34 is approximately a right angle.
The slit 30A of the adjustment plate 30 was positioned directly above the adjustment plate 5. At this time, the distance between the crucible 35 and the substrate 34 was 30 cm, the distance between the adjusting plate 30 and the crucible 35 was 25 cm, and the width of the slit 30A was 3 cm. Next, the inside of the bell jar 31 was evacuated and maintained at a vacuum level of 2×10 −6 Torr. In addition, the substrate 34 is heated once by the heater 33.
It was heated to 50°C and held at this temperature. Next, the substrate 3
4 back and forth at a speed of 50 cm/min,
The RbBr evaporation source 37 was irradiated with an electron beam 36A by the electron beam gun 36 and heated to continuously evaporate RbBr, which is the matrix of the stimulable phosphor. Incidentally, the deposition proceeded while monitoring the deposition rate and the deposited film thickness using the film thickness monitor 32, and the deposition rate was set at 5 μm/min. When the film thickness of the stimulable phosphor layer reaches the predetermined film thickness of 300 μm displayed on the film thickness monitor 32, the vapor deposition is terminated, and the substrate 3
A plate P was obtained consisting of a host layer of 4 and a stimulable phosphor. In addition, in FIG. 13, 38 is a current introduction line, 39
4 is a water cooling pipe, 40 is an auxiliary valve, 41 is a main valve, and 42 is a leak valve. As shown in Figure 11,
The plate P is placed horizontally on the upper side of the heat treatment container 1 so that the matrix layer 2 of the stimulable phosphor is on the lower side, and RbBr: 5 × 10 -4 Tl is placed on the lower side of the heat treatment container 1.
A powder 4 containing Br (activator) is placed, and this powder 4
A filter 5 that partitions the powder and the plate P was placed on top of the powder 4, and heat treatment was performed at 500° C. for 1 hour. However, the filter 5 has the configuration shown in FIG. 6, is made of a porous material made of alumina, and has a minimum pore diameter d of 1 mm.

A radiation image conversion panel was prepared using the heat-treated plate P, and image defects were examined as follows. The results are shown in Table 1 below. Image Defect Using the radiation image conversion panel described above, a test was conducted in which a radiation image was read and recorded by the radiation image conversion device shown in FIG.
Evaluation was made by examining the number of defects with a size of 1 mm or more present per mm).

[Examples 2 to 6, 8] In Example 1,
A radiation image conversion panel was prepared by heat treatment in the same manner except that the configuration of the filter 5 was changed as shown in Table 1 below, and image defects were examined in the same manner. The results are shown in Table 1 below.

[Example 7] Heat treatment was carried out in the same manner as in Example 1 except that the filter 5 was placed apart from the powder 4 containing the activator as shown in FIG. A conversion panel was produced and image defects were examined in the same manner. The results are shown in Table 1 below.

[Comparative Example 1] A radiation image conversion panel was prepared by performing heat treatment in the same manner as in Example 1 except that filter 5 was not used, and image defects were examined in the same manner. The results are shown in Table 1 below.

[0037]

[Table 1]

As is clear from Table 1, according to the manufacturing method of the present invention, a radiation image conversion panel with fewer image defects can be obtained. In particular, if the pore diameter d of the filter is 1 mm or less, almost no image defects will occur. Furthermore, a filter made of cloth or a porous material has fewer image defects than a filter made of a plate with holes. In addition, when the corrosion resistance of the filter was also investigated, it was found that the filters made of alumina and zirconia used in the other Examples had better corrosion resistance than the filter made of molybdenum used in Example 3.

[0039]

As described above in detail, according to the present invention, a radiation image conversion panel with fewer image defects can be obtained.

[Brief explanation of drawings]

FIG. 1 is an explanatory diagram showing an example of arrangement of filters.

FIG. 2 is an explanatory diagram showing an example of arrangement of filters.

FIG. 3 is an explanatory diagram showing an example of arrangement of filters.

FIG. 4 is an explanatory diagram showing an example of arrangement of filters.

FIG. 5 is an explanatory diagram showing an example of arrangement of filters.

FIG. 6 is an explanatory diagram showing a configuration example of a filter.

FIG. 7 is an explanatory diagram showing a configuration example of a filter.

FIG. 8 is an explanatory diagram showing an example of the configuration of a filter.

FIG. 9 is an explanatory diagram showing a configuration example of a radiation image conversion panel.

FIG. 10 is an explanatory diagram showing an outline of a radiation image conversion device.

FIG. 11 is an explanatory diagram schematically showing a heat treatment container used in Examples.

FIG. 12 is an explanatory diagram schematically showing a heat treatment container used in Examples.

FIG. 13 is an explanatory diagram schematically showing a vapor deposition apparatus used in Examples.

FIG. 14 is an explanatory diagram showing a configuration example of a filter.

[Explanation of symbols]

1 Heat treatment container
1A Chamber 1B Chamber 2 Stimulable phosphor layer or its matrix layer 3
substrate
4 Powder containing activator 5 Filter
5A Hole 6 Communication path
7 Steam flow control valve 8 Heater
10 Substrate 11 Stimulable phosphor layer
12 Protective layer 13
Spacer
14 Low refractive index layer 20 Radiation generator
21 Subject 22 Radiation image conversion panel
23 Photostimulation excitation light source 24 Photoelectric conversion device
25 Playback device 26 Display device
27 Filter P plate
30 Adjustment plate 30A slit
31
Bell jar 32 film thickness monitor
33 Heater 34 Substrate
35 Crucible 36 Electron beam gun 36A Electron beam 37 RbBr evaporation source
38 Current introduction line 39 Water cooling pipe
40 Auxiliary valve 41 Main valve
42 Leak valve 43 Filter

Claims (1)

[Claims] Claim 1. A method for producing a radiation image conversion panel, which comprises a step of forming a stimulable phosphor layer or its base layer and then heat-treating it in the presence of a powder containing an activator. 1. A method for producing a radiation image conversion panel, comprising heat-treating the panel by providing a filter that partitions an atmosphere in which a powder containing the stimulable phosphor layer or its base layer is placed from an atmosphere in which a stimulable phosphor layer or its matrix layer is placed.