JP3228527B2 - Manufacturing method of radiation image conversion panel - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a radiation image conversion panel, which comprises a step of forming a stimulable phosphor layer or a base layer thereof and heat-treating the same in the presence of an activator-containing powder. About the method.

[0002]

2. Description of the Related Art In the medical field, for example, radiation images such as X-ray images are often used for diagnosing diseases. As a method of forming such a radiation image, conventionally, X-rays transmitted through a subject are irradiated on a phosphor layer (fluorescent screen) to generate visible light, and this visible light is used in the same manner as when a normal photograph is taken. The so-called radiographic method of irradiating and developing a film using a silver salt has been generally used.

However, in recent years, as a method of directly taking out an image from a phosphor layer without using a film coated with a silver salt, radiation that has passed through a subject is absorbed by the phosphor, and then the phosphor is irradiated with light or heat, for example. A method has been proposed in which, by excitation with energy, radiation energy absorbed and accumulated in the phosphor is emitted as fluorescence, and the fluorescence is detected and imaged.

For example, US Pat. No. 3,859,527 and JP-A-55-12144 disclose radiation image conversion using a stimulable phosphor and using visible light or infrared light as stimulating excitation light. The method is shown. This method
A radiation image conversion panel having a stimulable phosphor layer formed on a substrate is used. Radiation transmitted through a subject is applied to the stimulable phosphor layer of the radiation image conversion panel, and radiation of each part of the subject is irradiated. A latent image is formed by accumulating radiation energy corresponding to the transmittance, and thereafter the stimulable phosphor layer is scanned with stimulating excitation light to emit the radiation energy accumulated in each part as stimulating light. The optical signal based on the intensity of the light is photoelectrically converted, for example, and is imaged by an image reproducing device. This final image is reproduced as a hard copy or on a CRT.

As a radiation image conversion panel having a stimulable phosphor layer used in this radiation image conversion method, Japanese Patent Laid-Open No. 61-73100 discloses a radiation image conversion panel in which a stimulable phosphor layer does not contain a binder. Conversion panels have been proposed.
Further, in the production of a radiation image conversion panel having a stimulable phosphor layer containing no such binder , conventionally,
After forming a stimulable phosphor layer or its base layer on a substrate, a heat treatment is performed in the presence of a powder containing an activator (Japanese Patent Application Nos. 62-175381 and 62-175381). -175382).

[0006]

However, according to the above-mentioned prior art, when heat treatment is performed using a powder containing an activator, the activator powder may be stimulable phosphor layer or its stimulable phosphor layer due to bumping or air current. It adheres to the surface of the base layer, and the portion is locally added with a high concentration of activator, resulting in a decrease in sensitivity and image defects. Therefore, an object of the present invention is to provide a method capable of manufacturing a radiation image conversion panel with few image defects.

[0007]

In order to achieve the above-mentioned object, in the present invention, after forming a stimulable phosphor layer or a base layer thereof, the layer is formed in the presence of a powder containing an activator. In a method for manufacturing a radiation image conversion panel including a step of heat treatment, a powder containing an activator and a stimulable phosphor layer or a base layer thereof are arranged, and a minimum
A heat treatment is provided by providing a filter having a pore diameter of 0.2 to 1 mm .

[0008]

[Function] An atmosphere in which a powder containing an activator is arranged,
Since a heat treatment is performed by providing a filter having a minimum pore diameter of 0.2 to 1 mm, which separates the atmosphere in which the stimulable phosphor layer or its base layer is disposed, an image due to bumping of the activator is provided. The occurrence of defects is effectively prevented.

Hereinafter, the present invention will be described specifically. In the present invention, in the step of forming a stimulable phosphor layer or a base layer thereof and then heat-treating this in the presence of an activator-containing powder , the activator-containing powder and A phosphor layer or a base layer thereof is disposed, and a filter is provided therebetween to perform heat treatment.

FIGS. 1 to 5 show examples of the arrangement of filters.
In these figures, 1 is a heat treatment container, 2 is a stimulable phosphor layer or its base layer, 3 is a substrate, 4 is a powder containing an activator, 5 is a filter, and 8 is a heater. The powder containing an activator is, for example, when the stimulable phosphor layer or its base layer is an RbBr: Tl phosphor or its base, respectively, RbBr: Tl phosphor powder, a mixed powder of RbBr and TlBr, Alternatively, it refers to TlBr powder or the like.
In FIG. 1, the inside of the heat treatment vessel 1 is divided into two chambers on the left and right sides by a filter 5 arranged at the center, and the stimulable phosphor layer or its base layer 2 is placed horizontally on the upper side of one of the chambers. The powder 4 containing the activator is arranged on the lower side of the other chamber. In FIG. 2, a powder 4 containing an activator is arranged on the lower side of the heat treatment vessel 1, and a filter 5 is arranged on the upper side to divide the inside of the heat treatment vessel 1 into two upper and lower chambers. In the side chamber, the stimulable phosphor layer or its base layer 2 is arranged in a horizontal position. The stimulable phosphor layer or its base layer 2 is provided on the surface of the substrate 3 facing the powder 4 containing the activator.

FIG. 3 has the same configuration as that of FIG. 1 except that the stimulable phosphor layer or its base layer 2 is arranged in a vertical position. In FIG. 4, the heat treatment vessel 1 is formed by two completely separated chambers 1A and 1B, a communication passage 6 is provided between the two chambers, and a powder 4 containing an activator is disposed below one of the chambers 1A. Then, the filter 5 is disposed on the wall of the other chamber 1B on the side where the communication passage 6 is provided to partition the two chambers, and the stimulable phosphor layer or its base layer 2 is disposed on the upper side of the other chamber 1B. are doing. Reference numeral 7 denotes a steam flow control valve provided in the communication passage 6. However, the steam flow control valve 7 is not always necessary. In FIG. 5, the configuration is the same as that of FIG. 2 except that the stimulable phosphor layer or its base layer 2 is arranged in a position on the back surface side of the substrate 3 with respect to the powder 4 containing the activator. I have. Among the above configurations, the configuration in FIG. 2 is preferable from the viewpoint that the activator can be uniformly and efficiently doped. Further, the heat treatment temperature T varies depending on the type of the stimulable phosphor, but is preferably lower than the melting point Tm of the stimulable phosphor matrix, and is preferably in a range of 0.40 Tm <T <0.75 Tm.

As the filter 5, (1) a filter made of a porous material having vent holes as shown in FIG. 6, and (2) a filter 5 shown in FIG.
A cloth made by weaving a fiber bundle like
(3) As shown in FIG. 8, a plate provided with a large number of holes 5A,
And the like. Among these, a porous body and a cloth are preferable from the viewpoint of preventing bumping of the powder, and a cloth (FIG. 7) into which a fiber bundle is woven is more preferable from the viewpoint of easy handling. The material of the filter 5 is preferably glass, ceramics such as alumina or zirconia, or a substance coated with ceramics, from the viewpoint of enhancing corrosion resistance.

The minimum pore diameter d of each pore passing through the filter 5 in the thickness direction may be basically smaller than the particle diameter of the powder containing the activator, but from the viewpoint of reliably preventing image defects due to bumping. , it is 1mm or less. The thickness of the filter 5 is preferably 5 mm or less from the viewpoint of handling and doping efficiency. As described above, the preferable heat treatment temperature T of the radiation image conversion panel is 0.4 Tm <T <0.75 Tm
(Tm: melting point of the stimulable phosphor base), the filter is also required to have heat resistance in this temperature range. For example, when the base is RbBr, the melting point Tm = 682
° C, therefore 0.4 Tm = 273 ° C, 0.75 Tm = 5
The temperature is 12 ° C., and the filter material is preferably glass, ceramics such as alumina or zirconia, or a substance coated with ceramics.

The density of the pores of the filter depends on the size of the pores, but is preferably at least 10 pores / cm ² . When the area of a portion having pores on the plane of the filter is A and the area of a portion without pores is B, the area ratio A / (A + B) is 30% or more from the viewpoint of improving the efficiency of doping. It is preferably at least 50%.
In particular, the larger the filter thickness, the better the area ratio. It is preferable to overlap the filters of FIGS. 6 to 8 with the positions of the holes shifted, since the filter effect is enhanced. In particular, when a plate having a large number of holes 5A shown in FIG. 8 is used as a filter, it is preferable that the positions of the holes 5A are shifted and overlapped as shown in FIG. Further, filters having different minimum pore diameters d may be stacked.

Examples of the method for forming the stimulable phosphor layer or its base layer to be subjected to the heat treatment include vapor deposition such as vapor deposition, sputtering, CVD, and ion plating. Here, the “base layer” refers to a stimulable phosphor layer containing no activator.

In one example in which a stimulable phosphor layer is formed by a vapor deposition method, after a substrate is placed in a vapor deposition apparatus,
The inside of the vapor deposition apparatus is evacuated to a vacuum degree of about 10 ⁻⁶ Torr, for example. Next, the evaporation source provided with the stimulable phosphor material is arranged at a predetermined position, and the stimulable phosphor material is heated and evaporated using a resistance heater or an electron beam, and the vapor flow is applied to the substrate. The stimulable phosphor is deposited to a predetermined thickness on the deposition surface. In the vapor deposition step, the stimulable phosphor layer can be formed in a plurality of times. Further, at the time of vapor deposition, the substrate may be cooled or heated as necessary.

FIG. 9 shows a specific configuration example of a radiation image conversion panel manufactured by the manufacturing method of the present invention. 10 substrates, 11 is a stimulable phosphor layer, 12 is a protective layer, 13 is a spacer, 14 Is a low refractive index layer.

As a material of the substrate 10, glass, ceramics, metal or the like is used. Specifically, quartz glass, glass such as chemically strengthened glass, crystallized glass, ceramics such as a sintered plate of alumina or zirconia, metal sheets of aluminum, aluminum-magnesium alloy, iron, stainless steel, copper, chromium, lead, etc. And the like. The thickness of the substrate 10 varies depending on its material and the like.
Generally, it is preferably 100 μm to 5 mm, and particularly preferably 200 μm to 2 mm from the viewpoint of convenient handling.

The protective layer 12 is provided for physically or chemically protecting the stimulable phosphor layer 11. The protective layer 12 may be provided so as to face the stimulable phosphor layer 11 with the low refractive index layer 14 interposed therebetween, or a protective layer coating solution may be directly applied on the stimulable phosphor layer. May be formed. Further, a protective layer separately formed in advance may be bonded onto the stimulable phosphor layer.

In the case where the protective layer 12 is provided with the low refractive index layer 14 interposed therebetween, as the constituent material of the protective layer 12, a material having good translucency and capable of being formed into a sheet is used. In order for the protective layer 12 to efficiently transmit stimulating excitation light and stimulating light emission, the protective layer 12 preferably has a high light transmittance in a wide wavelength range, and the light transmittance is preferably 80% or more. Examples of such a material include plate glass such as quartz, borosilicate glass, and chemically strengthened glass, and organic polymer compounds such as PET, drawn polypropylene, and polyvinyl chloride. Borosilicate glass is 80% in the wavelength range of 330 nm to 2.6 μm
The above light transmittance is shown, and quartz glass shows a high light transmittance even at a shorter wavelength. Further, it is preferable to provide an anti-reflection layer such as MgF _{2 on} the surface of the protective layer 12 because it has the effects of efficiently transmitting stimulated excitation light and stimulated emission and reducing the sharpness.

When the protective layer 12 is provided directly on the stimulable phosphor layer 11, the protective layer 12 may be composed of cellulose acetate, nitrocellulose, polymethyl methacrylate, polyvinyl butyral, polyvinyl formal,
Polycarbonate, polyester, polyethylene terephthalate, polyethylene, vinylidene chloride, nylon and the like can be used. The protective layer 12 is made of SiC, SiO ₂ , S
It may be formed by laminating inorganic substances such as i ₃ N ₄ and Al ₂ O ₃ . In this case, the thickness of the protective layer 12 is 0.1 to 10 when the protective layer 12 is provided directly on the stimulable phosphor layer 11.
The thickness is preferably 0 μm, and when it is provided via the low refractive index layer 14, it is 50 μm to 5 mm, preferably 100 μm to 3 mm. The thickness of the protective layer 12 is usually 50 μm to 5 m.
m, and in order to obtain good moisture resistance,
3 mm is preferred.

The low refractive index layer 14 is provided as needed from the viewpoint of further improving the sharpness of a radiation image. Specifically, CaF ₂ (refractive index 1.23 to 1.
26), Na ₃ AlF ₆ (refractive index: 1.35), MgF ₂
(Refractive index: 1.38), layer composed of SiO ₂ (refractive index: 1.46), etc .; ethanol (refractive index: 1.36), methanol
(Refractive index 1.33), diethyl ether (refractive index 1.3
5) a layer composed of a liquid such as air; a layer composed of a gas such as air, nitrogen, or argon; a layer having a refractive index of substantially 1 such as a vacuum layer; Particularly, a gas layer or a vacuum layer is preferable. In this case, the thickness of the low refractive index layer 14 is usually 0.05 to 3 mm.

The low-refractive-index layer 14 is preferably in close contact with the stimulable phosphor layer 11, and therefore the low-refractive-index layer 14
May be a liquid layer, a gas layer, or a vacuum layer, but the low refractive index layer 14 may be made of CaF ₂ , Na ₃ AlF ₆ , Mg
When the protective layer 12 is provided on the inner surface of the protective layer 12 using F ₂ , SiO _2, or the like, the stimulable phosphor layer 11 and the low refractive index layer 14 may be brought into close contact with each other by, for example, an adhesive.

When the protective layer 12 is disposed at a distance from the stimulable phosphor layer 11, the substrate 10 and the protective layer 12
In between, a spacer 13 surrounding the stimulable phosphor layer 11 is provided. As the spacer 13, the stimulable phosphor layer 1 is used.
There is no particular limitation as long as it can hold the device 1 in a state of being shielded from the external atmosphere, and glass, ceramics, metal, plastic, or the like is used.

In the present invention, the term "stimulable phosphor" refers to a stimulus such as optical, thermal, mechanical, chemical, or electrical (stimulated excitation) after the first irradiation of light or high-energy radiation. ) Means a phosphor that emits stimulable light corresponding to the dose of the first light or high-energy radiation. From a practical point of view, a phosphor that emits stimulable luminescence by a stimulating light having a wavelength of 500 nm or more. The body is preferred.

As the stimulable phosphor constituting the stimulable phosphor layer, an alkali halide phosphor represented by the following general formula is preferable. General _{formula: M I X · aM II X} '2 · bM III X''3 · cA: in dB the general formula, M _I represents Li, Na, K, Rb, at least one alkali metal Cs. M _II is Be, M
It represents at least one divalent metal of g, Ca, Sr, Ba, Zn, Cd, Cu, and Ni. M _III is Sc, Y,
La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, T
b, Dy, Ho, Er, Tm, Yb, Lu, Al, G
a, In represents at least one trivalent metal. X,
X ′ and X ″ represent at least one halogen of F, Cl, Br and I. A is an oxygen-containing compound composition, and preferably represents at least one of the compounds constituting the above-mentioned M _I , M _II , M _III and activator B described later. B
Is the activator composition, and Eu, Tb, Ce, Tm, D
y, Pr, Ho, Nd, Yb, Er, Gd, Lu, S
m, Y, Tl, Na, Ag, Cu, In, and Mg. a, b, c, and d are 0 ≦ a <
0.5, 0 ≦ b <0.5, 0 <c ≦ 0.5, preferably 10 ⁻⁶ <c ≦ 0.2, 0 <d ≦ 0.2. However, when A is an oxygen compound of the activator constituting B, d may be 0.

The following stimulable phosphor raw materials constituting the alkali halide stimulable phosphor are used. (1) LiF, LiCl, LiBr, LiI, NaF,
NaCl, NaBr, NaI, KF, KCl, KBr,
KI, RbF, RbCl, RbBr, RbI, CsF,
At least one of CsCl, CsBr and CsI. (2) BeF ₂ , BeCl ₂ , BeBr ₂ , BeI ₂ ,
MgF ₂ , MgCl ₂ , MgBr ₂ , MgI ₂ , CaF
₂ , CaCl ₂ , CaBr ₂ , CaI ₂ , SrF ₂ , S
rCl ₂ , SrBr ₂ , SrI ₂ , BaF ₂ , BaCl
₂ , BaBr ₂ , BaBr ₂ .2H ₂ O, BaI ₂ , Z
nF ₂ , ZnCl ₂ , ZnBr ₂ , ZnI ₂ , Cd
F ₂ , CdCl ₂ , CdBr ₂ , CdI ₂ , CuF ₂ ,
CuCl ₂ , CuBr ₂ , CuI ₂ , NiF ₂ , NiC
at least one of l ₂ , NiBr ₂ and NiI ₂ .

(3) ScF ₃ , ScCl ₃ , ScB
_{r 3, ScI 3, YF 3} , YCl 3, YBr 3, Y
I ₃ , LaF ₃ , LaCl ₃ , LaBr ₃ , LaI ₃ ,
_{CeF 3, CeCl 3, CeBr 3} , CeI 3, PrI
₃ , PrF ₃ , PrCl ₃ , PrBr ₃ , PrI ₃ , N
dF ₃ , NdCl ₃ , NdBr ₃ , NdI ₃ , Pm
F ₃ , PmCl ₃ , PmBr ₃ , PmI ₃ , SmF ₃ ,
SmCl ₃ , SmBr ₃ , SmI ₃ , EuF ₃ , EuC
l ₃ , EuBr ₃ , EuI ₃ , GdF ₃ , GdCl ₃ ,
GdBr ₃ , GdI ₃ , TbF ₃ , TbCl ₃ , TbB
r ₃ , TbI ₃ , DyF ₃ , DyCl ₃ , DyBr ₃ ,
DyI ₃ , HoF ₃ , HoCl ₃ , HoBr ₃ , HoI
₃ , ErF ₃ , ErCl ₃ , ErBr ₃ , ErI ₃ , T
mF ₃ , TmCl ₃ , TmBr ₃ , TmI ₃ , Yb
_{F 3, YbCl 3, YbBr 3} , YbI 3, LuF 3,
LuCl ₃ , LuBr ₃ , LuI ₃ , AlF ₃ , AlC
l ₃ , AlBr ₃ , AlI ₃ , GaF ₃ , GaCl ₃ ,
GaBr ₃ , GaI ₃ , InF ₃ , InCl ₃ , InB
r ₃ , at least one of InI ₃ . (4) Eu compound group, Tb compound group, Ce compound group, T
m compound group, Dy compound group, Pr compound group, Ho compound group, Nd compound group, Yb compound group, Er compound group, Gd
Compound group, Lu compound group, Sm compound group, Y compound group,
At least one activator raw material of a Tl compound group, a Na compound group, an Ag compound group, a Cu compound group, an In compound group, and a Mg compound group.

In the present invention, an alkali halide phosphor is particularly preferably used because it is suitable for a vapor deposition method. However, in the present invention, it is not limited to the above phosphors, and other phosphors may be used as long as the phosphors show stimulated emission when irradiated with radiation and then irradiated with stimulated excitation light. Can be.

FIG. 10 schematically shows a radiation image conversion apparatus constituted by using a radiation image conversion panel manufactured by the method of the present invention, wherein 20 is a radiation generator, 21 is a subject, 22 is a radiation image conversion panel, 23 is a photostimulated excitation light source, 24 is a photoelectric conversion device for detecting photostimulated light emitted from the radiation image conversion panel 22, and 25 is a photoelectric conversion device 2.
A reproducing device for reproducing the signal detected in 4 as an image, 2
Reference numeral 6 denotes a display device for displaying an image reproduced by the reproducing device 25, and reference numeral 27 denotes a filter that separates stimulated excitation light and stimulated emission and transmits only stimulated emission.

In this radiation image conversion apparatus, the radiation from the radiation generator 20 enters the radiation image conversion panel 22 through the subject 21. The incident radiation is absorbed by the stimulable phosphor layer of the radiation image conversion panel 22 and its energy is accumulated, thereby forming an accumulated radiation transmission image. Next, the accumulated image is excited by stimulating light from the stimulating light source 23 and emitted as stimulating light.
Since the intensity of the radiated stimulated emission is proportional to the amount of accumulated radiation energy, this optical signal is photoelectrically converted by a photoelectric conversion device 24 such as a photomultiplier tube, and reproduced as an image by a reproduction device 25. By displaying the image on the display device 26, a radiographic image of the subject 21 can be observed.

[0032]

EXAMPLES Examples of the present invention will be specifically described below, but the present invention is not limited to these examples. [Example 1] An RbBr evaporation source 37, which is a base of a stimulable phosphor, was installed in a crucible 35 of the evaporation apparatus shown in FIG.
A substrate 34 and a filter 43 made of crystallized glass having a thickness of 400 mm × 500 mm and a thickness of mm were set at predetermined positions. The crucible 3 is moved by moving the steam flow adjusting plate 30 so that the intersection angle between the stream line of the steam flow and the surface of the substrate 34 is substantially perpendicular.
5, the slit 30A of the adjustment plate 30 was positioned.
At this time, the distance between the crucible 35 and the substrate 34 was 30 cm, the distance between the adjustment plate 30 and the crucible 35 was 25 cm, and the width of the slit 30A was 3 cm. Next, the inside of the bell jar 31 was evacuated and kept at a vacuum of 2 × 10 ⁻⁶ Torr. Further, the substrate 34 is
Heated to 50 ° C. and kept at this temperature. Next, the substrate 3
While moving back and forth at a speed of 50 cm / min.
The electron beam gun 36 irradiates the electron beam 36A to the RbBr evaporation source 37 and heats the RbBr evaporation source 37 to continuously evaporate RbBr, which is the base of the stimulable phosphor. The deposition was proceeded while monitoring the deposition rate and the deposited film thickness by the film thickness monitor 32, and the deposition rate was 5 μm / min. When the film thickness of the stimulable phosphor layer reaches a predetermined film thickness of 300 μm indicated by the film thickness monitor 32, the vapor deposition is terminated.
4 and a plate P composed of a base layer of a stimulable phosphor were obtained. In FIG. 13, reference numeral 38 denotes a current introduction line;
Is a water cooling pipe, 40 is an auxiliary valve, 41 is a main valve, and 42 is a leak valve. As shown in FIG.
The plate P is horizontally arranged on the upper side in the heat treatment vessel 1 such that the base layer 2 of the stimulable phosphor is on the lower side, and RbBr: 5 × 10 ⁻⁴ TLB on the lower side in the heat treatment vessel 1.
A powder 4 containing r (activator) was placed, and a filter 5 for separating the powder 4 and the plate P was placed on top of the powder 4 and placed thereon, and heat treatment was performed at 500 ° C. for 1 hour. However, the filter 5 has the configuration shown in FIG. 6 and is made of a porous body made of alumina, and has a minimum pore diameter d of 1 mm.

A radiation image conversion panel was manufactured using the plate P after the heat treatment, and image defects were examined as described below. The results are as shown in Table 1 below. Image Defect Using the radiation image conversion panel, a test for reading and recording a radiation image by the radiation image conversion device shown in FIG. 10 was performed, and the unit area of the radiation image (400 mm × 400 mm) was measured.
mm), and the number of defects having a size of 1 mm or more was examined and evaluated.

[ Examples 2 to 5, 7 and Reference Example 1 ] A radiation image conversion panel was prepared by performing heat treatment in the same manner as in Example 1 except that the structure of the filter 5 was as shown in Table 1 below. Image defects were examined in the same manner. The results are as shown in Table 1 below.

Embodiment 6 In the embodiment 1, as shown in FIG.
Was placed in a state separated from the powder 4 containing the activator, heat treatment was performed in the same manner to produce a radiation image conversion panel, and image defects were examined in the same manner. The results are as shown in Table 1 below.

Comparative Example 1 A radiation image conversion panel was prepared by performing the same heat treatment as in Example 1 except that the filter 5 was not used, and an image defect was examined in the same manner. The results are as shown in Table 1 below.

[0037]

[Table 1]

As is clear from Table 1, according to the manufacturing method of the present invention, a radiation image conversion panel with few image defects can be obtained. Particularly, the pore diameter d of the filter is 0.2 to 1 m.
With m , image defects hardly occur.
According to the filter made of cloth and porous material,
Less image defects than those with holes in the plate. In addition, when the corrosion resistance of the filter was also examined, the filter made of alumina and zirconia used in the other examples was more excellent in corrosion resistance than the filter made of molybdenum used in Example 3.

[0039]

As described above in detail, according to the present invention, a radiation image conversion panel with less image defects can be obtained.

[Brief description of the drawings]

FIG. 1 is an explanatory diagram showing an example of the arrangement of filters.

FIG. 2 is an explanatory diagram showing an example of the arrangement of filters.

FIG. 3 is an explanatory diagram showing an example of the arrangement of filters.

FIG. 4 is an explanatory diagram showing an example of the arrangement of filters.

FIG. 5 is an explanatory diagram showing an example of arrangement of filters.

FIG. 6 is an explanatory diagram illustrating a configuration example of a filter.

FIG. 7 is an explanatory diagram illustrating a configuration example of a filter.

FIG. 8 is an explanatory diagram showing a configuration example of a filter.

FIG. 9 is an explanatory diagram illustrating a configuration example of a radiation image conversion panel.

FIG. 10 is an explanatory view schematically showing a radiation image conversion apparatus.

FIG. 11 is an explanatory view schematically showing a heat treatment container used in an example.

FIG. 12 is an explanatory view schematically showing a heat treatment container used in Examples.

FIG. 13 is an explanatory view schematically showing a vapor deposition apparatus used in an example.

FIG. 14 is an explanatory diagram illustrating a configuration example of a filter.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Heat treatment container 1A room 1B room 2 Stimulable phosphor layer or its base layer 3 Substrate 4 Powder containing activator 5 Filter 5A hole 6 Communication passage 7 Steam flow control valve 8 Heater 10 Substrate 11 Stimulable phosphor Layer 12 Protective layer 13 Spacer 14 Low refractive index layer 20 Radiation generator 21 Subject 22 Radiation image conversion panel 23 Stimulation excitation light source 24 Photoelectric conversion device 25 Reproduction device 26 Display device 27 Filter P plate 30 Adjustment plate 30A Slit 31 Bell jar 32 Film Thickness monitor 33 Heater 34 Substrate 35 Crucible 36 Electron beam gun 36A Electron beam 37 RbBr evaporation source 38 Current introduction line 39 Water cooling pipe 40 Auxiliary valve 41 Main valve 42 Leak valve 43 Filter

──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-1-131500 (JP, A) JP-A-50-51982 (JP, A) JP-A-62-157600 (JP, A) JP-A-61- 248230 (JP, A) JP-A 1-163459 (JP, U) JP-A 63-13254 (JP, U) JP-A 47-23140 (JP, Y2) (58) Field surveyed (Int. Cl. ⁷ , DB name) G21K 4/00

Claims (1)

(57) [Claims] 1. A method for producing a radiation image conversion panel, comprising a step of forming a stimulable phosphor layer or a base layer thereof and heat-treating the stimulable phosphor layer in the presence of a powder containing an activator. And a stimulable phosphor layer or its base layer, respectively, between which the minimum pore size is 0.1 μm.
A method for producing a radiation image conversion panel, wherein a heat treatment is performed by providing a filter having a size of 2 to 1 mm .