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JPH0348140B2 - - Google Patents

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Publication number
JPH0348140B2
JPH0348140B2 JP59144850A JP14485084A JPH0348140B2 JP H0348140 B2 JPH0348140 B2 JP H0348140B2 JP 59144850 A JP59144850 A JP 59144850A JP 14485084 A JP14485084 A JP 14485084A JP H0348140 B2 JPH0348140 B2 JP H0348140B2
Authority
JP
Japan
Prior art keywords
sol
filter
quartz glass
polypropylene
filtration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59144850A
Other languages
Japanese (ja)
Other versions
JPS6126521A (en
Inventor
Satoru Myashita
Sadao Kanbe
Motoyuki Toki
Tetsuhiko Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP14485084A priority Critical patent/JPS6126521A/en
Publication of JPS6126521A publication Critical patent/JPS6126521A/en
Publication of JPH0348140B2 publication Critical patent/JPH0348140B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Silicon Compounds (AREA)

Description

【発明の詳細な説明】 〔技術分野〕 本発明はゾル・ゲル法による石英ガラスの製造
方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for producing quartz glass by a sol-gel method.

〔従来技術〕[Prior art]

石英ガラスはIC製造工程中でるつぼやボード、
拡散炉等に使用されるようになり、その有用性が
認められ、更に水酸基の少ないものや高学的均一
性の良いものが開発されたことによつて、各種の
光学的用途に使用されるようになり、特に光通信
用の石英ガラスフアイバーが最近注目されてい
る。
Quartz glass is used in crucibles and boards during the IC manufacturing process.
It began to be used in diffusion furnaces, etc., and its usefulness was recognized, and with the development of products with fewer hydroxyl groups and better optical uniformity, it was used for various optical applications. In particular, silica glass fibers for optical communications have been attracting attention recently.

このように石英ガラスは種々の分野で使用さ
れ、その利用範囲も広がつている。しかし石英ガ
ラスの製造コストも高く、高価なことが問題とな
つている。安価で高品質の石英ガラスを製造する
方法として、ゾル・ゲル法が認められている。
As described above, quartz glass is used in various fields, and the scope of its use is expanding. However, the manufacturing cost of quartz glass is high, and the high price has become a problem. The sol-gel method is recognized as a method for manufacturing inexpensive, high-quality quartz glass.

ゾル・ゲル法を用いて歩留り良く、大型の石英
ガラスを得る方法として、アルキルシリケートを
加水分解したゾル中に微粉末シリカを加え、更に
PHを3〜6に調整した後、50〜90℃で乾燥し、焼
結する方法がある。ドライゲル製作中の割れの問
題と、焼結中の割れやクラツクの問題を同時に解
決したものであり、かなり大きな石英ガラス
(4inchφ以上)が低コストで製造できるようなつ
た。
As a method to obtain large-sized quartz glass with good yield using the sol-gel method, fine powdered silica is added to a sol prepared by hydrolyzing alkyl silicate.
One method is to adjust the pH to 3 to 6, then dry and sinter at 50 to 90°C. This solution simultaneously solved the problem of cracks during dry gel production and the problems of cracks and cracks during sintering, making it possible to manufacture fairly large quartz glass (4 inch diameter or more) at low cost.

結晶、気泡、不純物を含まない高品質の石英ガ
ラスを製造する方法としては、調音波振動により
微粉末シリカの分散を効果的に行なう方法、分散
が不充分で残存する塊状物を遠心分離により除去
する方法等が提案され、それなりに効果をあげて
いる。しかし不定形状異物(数μm〜50μm)が
わずかながら存在し、完全に均質な石英ガラスを
製造するには至つていない。
Methods for producing high-quality quartz glass that does not contain crystals, bubbles, or impurities include a method that effectively disperses fine powder silica using harmonic vibration, and a method that uses centrifugation to remove lumps that remain due to insufficient dispersion. Several methods have been proposed and have shown some success. However, a small amount of irregularly shaped foreign matter (several μm to 50 μm) is present, and it has not been possible to produce completely homogeneous quartz glass.

不定形状異物は、製造工程中に混入するゴミや
市販されている微粉末シリカ(例えばCab−o−
sil(Cabot社製)、Aerosil(Degussa社製)、
Fransil(F−ransil社製)、D.C.Silica(Daw
Corning社製))中に含まれる粗粒(45μmのフイ
ルターを通らない)が原因と考えられる。ゾル中
に既に存在するこれらの異物を分離し、均質なゾ
ルを調整できないと高品質の石英ガラスを製造す
ることはできない。現在のままでは光学系等に使
用できない為、その応用範囲が極めて限られたも
のになつている。
Irregularly shaped foreign particles include dust mixed in during the manufacturing process and commercially available fine powder silica (e.g. Cab-o-
sil (manufactured by Cabot), Aerosil (manufactured by Degussa),
Fransil (manufactured by F-ransil), DC Silica (Daw
The cause is thought to be coarse particles (which do not pass through a 45 μm filter) contained in the product (manufactured by Corning Inc.). High-quality quartz glass cannot be manufactured unless these foreign substances already present in the sol are separated and a homogeneous sol is prepared. As it currently stands, it cannot be used in optical systems, etc., so its range of applications is extremely limited.

〔目的〕〔the purpose〕

本発明はこのような問題点を解決するもので、
ポリプロピレン製のフイルターを用いて加圧濾過
することにより完全に均質な高品質の石英ガラス
を製造する方法を提供することにある。
The present invention solves these problems,
The object of the present invention is to provide a method for producing completely homogeneous high-quality quartz glass by pressure filtration using a polypropylene filter.

〔概要〕〔overview〕

本発明の石英ガラスの製造方法は、少なくとも
アルキルシリケートおよび微粉末シリカを原料と
するゾル・ゲル法による石英ガラスの製造方法に
おいて、アルキルシリケートの加水分解溶液に微
粉末シリカを添加撹拌してゾル溶液とし、このゾ
ル溶液に超音波を印加したのち、該ゾル溶液を遠
心分離をして、ポリプロピレン製の50μm以下の
フイルターを用いて加圧濾過を行なうことを特徴
とする。
The method for producing quartz glass of the present invention is a method for producing quartz glass by a sol-gel method using at least an alkyl silicate and finely powdered silica as raw materials. After applying ultrasonic waves to this sol solution, the sol solution is centrifuged and filtered under pressure using a polypropylene filter with a diameter of 50 μm or less.

更に、上記本願発明の構成要素の作用について
以下に説明する。
Furthermore, the functions of the above-mentioned constituent elements of the present invention will be explained below.

まず、混合したゾル溶液に超音波を印加する作
用効果はゾル中の粒径を小さくし、かつ粘土を下
げることによつて次工程の遠心分離、及びフイル
ター濾過を容易することにある。
First, the effect of applying ultrasonic waves to the mixed sol solution is to reduce the particle size in the sol and lower the clay content, thereby facilitating the next step of centrifugation and filter filtration.

次に、遠心分離は数μmの小さな異物から
100μm程度以上の大きなかたまりまで高範囲な
異物を取り除く働きがあり、少なくとも100μm
程度以上の大きなかたまりは確実に取り除くこと
ができるので、次工程の50μmのフイルター濾過
を容易にする働きがある。
Next, centrifugation removes foreign particles as small as a few μm.
It works to remove foreign substances in a wide range, including large particles of about 100μm or more, and at least 100μm.
Since the larger lumps can be reliably removed, it facilitates filtration with a 50 μm filter in the next step.

また、遠心分離は超音波印加と同様に粘度を下
げる働きをもち、さきの超音波で印加したゾルの
粘度を更に下げる働きがあり、次工程のフイルタ
ー濾過を容易にする。
In addition, centrifugation has the effect of lowering the viscosity in the same way as the application of ultrasonic waves, and has the effect of further reducing the viscosity of the sol applied with the previous ultrasonic wave, thereby facilitating filter filtration in the next step.

次に、ポリプロピレン製のフイルターを用いた
場合、ポリプロピレンが疎水性であるため、親水
性のガラスフイルターを用いた場合のようにアル
キルシリケートの加水分解物がもつている−OH
基とガラスが極めて親和性がよくて、アルキルシ
リケートの加水分解物またはアルキルシリケート
の加水分解物と微粉末シリカとの混合物がガラス
を核として付着成長して目づまりするということ
は起りにくく、さらに加圧することによつて面積
の大きいカートリツジタイプのフイルターを用い
ても、効率的に大量のフイルター処理ができる。
また50μmのフイルター濾過は少なくとも50μm
以上の肉視で容易に容認できるような異物を完全
に除去できるし、これ以上の粗さのフイルターを
用いた濾過では濾過効果が少ない。
Next, when using a polypropylene filter, since polypropylene is hydrophobic, the -OH
Since the group and glass have extremely good affinity, it is difficult for a hydrolyzate of an alkyl silicate or a mixture of a hydrolyzate of an alkyl silicate and fine powder silica to adhere to and grow on the glass as a nucleus and cause clogging. By applying pressure, even if a cartridge type filter with a large area is used, a large amount of filter processing can be performed efficiently.
Also, 50μm filter filtration is at least 50μm.
It is possible to completely remove foreign substances that can be easily recognized by the naked eye, and filtration using a filter with a coarser roughness has little filtration effect.

さらに、50μmのフイルター濾過についで、
10μm以下の濾過をしても同様に目づまりを起こ
すことなく効果的に粒径の揃つたゾルを得ること
ができるようにするものである。
Furthermore, following 50μm filter filtration,
It is possible to effectively obtain a sol with uniform particle size without causing clogging even when filtered with a particle diameter of 10 μm or less.

〔実施例〕〔Example〕

以下、本発明について実施例に基づき詳細に説
明する。
Hereinafter, the present invention will be described in detail based on examples.

実施例 1 エチルシリケート4.4と0.05規定塩酸水溶液
3.6を激しく撹拌し、無色透明の均一溶液を得
た。そこに微粉末シリカ(Aerosil OX−50)1.5
Kgを徐々に添加し、充分に撹拌した。ゾルを20℃
に保ちながら28KHzの超音波を2時間照射する
と、粘性は50cp(25℃)から25cpに低下し、平均
粒径も0.22μmから0.16μmに減少した。更に
1500Gの遠心力を10分間かけ、分散が不充分の巨
大粒子を沈降させた。
Example 1 Ethyl silicate 4.4 and 0.05N hydrochloric acid aqueous solution
3.6 was stirred vigorously to obtain a colorless and transparent homogeneous solution. There is fine powdered silica (Aerosil OX-50) 1.5
Kg was gradually added and stirred thoroughly. sol at 20℃
When irradiated with 28KHz ultrasonic waves for 2 hours while maintaining the temperature at Furthermore
A centrifugal force of 1500G was applied for 10 minutes to sediment the insufficiently dispersed large particles.

得られた均質度の高いゾル(以後ゾルAと呼
ぶ)をエアーポンプを用いて孔径50μmのフイル
ター(ポリプロピレン製カートリツジ型フイルタ
ー(東洋科学産業株式会社社製))に送り、0.3
Kg/cm2の圧力で濾過を行なつた。8のゾルが2
分間で処理できた。
The obtained highly homogeneous sol (hereinafter referred to as sol A) was sent to a filter (polypropylene cartridge type filter (manufactured by Toyo Kagaku Sangyo Co., Ltd.)) with a pore size of 50 μm using an air pump, and the sol was 0.3 μm in diameter.
Filtration was carried out at a pressure of Kg/cm 2 . 8 sol is 2
I was able to process it in minutes.

回収したゾルをPH4.2に調整してから、ポリプ
ロピレン製容器(幅20cm×20cm×高さ10cm)に深
さが1cmになる量のゾルを移入し、60℃で7日間
乾燥させた。直径14cm、厚さ0.7cmのドライゲル
が得られ、180℃/hrの昇温速度で1300℃まで加
熱すると、直径10cm、厚さ0.5cmの石英ガラスが
製造できた。
After adjusting the pH of the collected sol to 4.2, an amount of the sol to a depth of 1 cm was transferred to a polypropylene container (width 20 cm x 20 cm x height 10 cm) and dried at 60°C for 7 days. A dry gel with a diameter of 14 cm and a thickness of 0.7 cm was obtained, and when heated to 1300 °C at a heating rate of 180 °C/hr, quartz glass with a diameter of 10 cm and a thickness of 0.5 cm was produced.

石英ガラス中に数十μmの不定形状異物を若干
含むものの、ゾルAをそのままゲル化させて製造
した石英ガラスより品質的にすぐれていた。
Although the quartz glass contained some irregularly shaped foreign matter of several tens of micrometers, it was superior in quality to the quartz glass produced by directly gelling Sol A.

実施例 2 ゾルAを実施例1で用いたと同じ孔径50μmの
フイルターを通してから更にポリプロピレン製の
カートリツジ型フイルター(東洋科学産業株式会
社製)で孔径10μmのフイルターを通した。3
Kg/cm2の圧力をかけ8のゾルが3分間で処理で
きた。
Example 2 Sol A was passed through the same filter with a pore size of 50 μm as used in Example 1, and then passed through a polypropylene cartridge type filter (manufactured by Toyo Kagaku Sangyo Co., Ltd.) with a pore size of 10 μm. 3
Applying a pressure of Kg/cm 2 , 8 sols could be processed in 3 minutes.

回収したゾルを実施例1と同様の操作により石
英ガラスとしたところ、10〜20μmの不定形状異
物が1mm2に数個存在しているのみで、かなり均質
度が高かつた。
When the recovered sol was made into quartz glass by the same operation as in Example 1, it was found to have a fairly high degree of homogeneity, with only a few irregularly shaped foreign particles of 10 to 20 μm present per 1 mm 2 .

実施例 3 ゾルAを実施例1で用いたと同じ孔径50μmの
フイルターを通してから更に実施例2で用いたと
同じ孔径10μmのフイルターを3回通した。
Example 3 Sol A was passed through the same filter with a pore size of 50 μm as used in Example 1, and then passed through the same filter with a pore size of 10 μm as used in Example 2 three times.

回収したゾルを実施例1と同様の操作により石
英ガラスとしたところ、10μm以上の不定形状異
物は全く存在せず、極めて高品質だつた。
When the recovered sol was made into quartz glass by the same operation as in Example 1, there was no irregularly shaped foreign matter of 10 μm or more, and the quality was extremely high.

実施例 4 ゾルAを実施例1で用いたと同じ孔径50μm及
び実施例2で用いたと同じ10μmのフイルターを
通した後、更にポリプロピレン製のカートリツジ
型フイルター(東洋科学産業株式会社製)の孔径
5μmのフイルターを通した。0.5Kg/cm2の圧力を
かけ8のゾルが3分間で処理できた。
Example 4 Sol A was passed through a filter with the same pore size of 50 μm as used in Example 1 and 10 μm as used in Example 2, and then the pore size of a polypropylene cartridge type filter (manufactured by Toyo Kagaku Sangyo Co., Ltd.) was passed through.
Passed through a 5 μm filter. By applying a pressure of 0.5 kg/cm 2 , 8 sols could be processed in 3 minutes.

回収したゾルを実施例1と同様の操作により石
英ガラスとしたところ、10μm以上の不定形状異
物は全く存在せず、極めて高品質だつた。
When the recovered sol was made into quartz glass by the same operation as in Example 1, there was no irregularly shaped foreign matter of 10 μm or more, and the quality was extremely high.

実施例 5 ゾルAを孔径50μm及び10μmのポリプロピレ
ン製のフイルターを通した後、更に孔径1μmの
ポリプロピレン製のフイルターを通した。0.5
Kg/cm2の圧力をかけ8のゾルが5分間で処理で
きた。
Example 5 Sol A was passed through polypropylene filters with pore diameters of 50 μm and 10 μm, and then further passed through a polypropylene filter with pore diameter of 1 μm. 0.5
Applying a pressure of Kg/cm 2 , 8 sols could be processed in 5 minutes.

回収したゾルを実施例1と同様の操作により石
英ガラスとしたところ、完全に均質であり、極め
て高品質だつた。
When the recovered sol was made into quartz glass by the same operation as in Example 1, it was completely homogeneous and of extremely high quality.

比較例 1 ゾルAをフイルターを通さず、実施例1と同様
の操作により石英ガラスとしたところ、数十μm
の不定形状異物が点在し、外部から混入したと思
われる糸クス状のものも観察された。
Comparative Example 1 When Sol A was made into quartz glass by the same operation as in Example 1 without passing it through a filter, it was found that the silica glass had a thickness of several tens of μm.
Irregularly shaped foreign objects were scattered, and string-like objects that were thought to have been mixed in from the outside were also observed.

比較例 2 実施例1と同様にしてフイルターのみを#2の
ガラスフイルターに変えて8のゾルを濾過した
ところ5は濾過できたが、それ以上は濾過でき
なかつた。
Comparative Example 2 When sol No. 8 was filtered in the same manner as in Example 1, only the filter was replaced with glass filter #2, sol No. 5 could be filtered, but no more could be filtered.

目づまりを起こして全く濾過できなくなつた時
間は25分経過後であつた。
It was after 25 minutes that the filter became clogged and could no longer be filtered.

〔効果〕〔effect〕

以上述べたように本発明によれば、少なくとも
アルキルシリケート及び微粉末シリカを原料とす
るゾル・ゲル法による石英ガラスの製造方法にお
いて、アルキルシリケートの加水分解溶液に微粉
末シリカを添加撹拌したゾル溶液に超音波を印加
したのち、該ゾルを遠心分離をして、ポリプロピ
レン製の50μm以下のフイルターを用いて加圧濾
過を行なうことにより、数10μm以下の不定形異
物を取り除くことができ、しかも、大量濾過して
も目づまりが殆んど越えることがなく、したがつ
て途中でフイルターを取変える必要もないので、
長時間連続的に効率よく濾過することができる。
この結果、光学的に完全に均質な高品質の石英ガ
ラスを容易に大量に製造できる。
As described above, according to the present invention, in a method for producing quartz glass by a sol-gel method using at least an alkyl silicate and finely powdered silica as raw materials, a sol solution in which finely powdered silica is added and stirred to a hydrolyzed solution of an alkylsilicate. By applying ultrasonic waves to the sol, centrifuging the sol, and performing pressure filtration using a polypropylene filter with a diameter of 50 μm or less, it is possible to remove amorphous foreign substances with a size of several tens of μm or less. Even if a large amount of filtration is performed, clogging will hardly occur, so there is no need to change the filter midway through the process.
It is possible to efficiently filter continuously for a long time.
As a result, optically completely homogeneous, high-quality quartz glass can be easily produced in large quantities.

このように大量にフイルター処理が可能となつ
たことにより、フオトマスク用石英基盤、光通信
用石英ガラスフアイバー、各種光学用セル等、限
りない応用の道が開かれた。
The ability to process large quantities of filters has opened up endless possibilities for applications such as quartz substrates for photomasks, quartz glass fibers for optical communications, and various optical cells.

Claims (1)

【特許請求の範囲】[Claims] 1 少なくともアルキルシリケートおよび微粉末
シリカを原料とするゾル・ゲル法による石英ガラ
スの製造方法において、アルキルシリケートの加
水分解溶液に微粉末シリカを添加撹拌してゾル溶
液とし、該ゾル溶液に超音波を印加したのち、該
ゾル溶液を遠心分離をして、ポリプロピレン製の
50μm以下のフイルターを用いて加圧濾過を行な
うことを特徴とする石英ガラスの製造方法。
1. In a method for producing quartz glass by the sol-gel method using at least alkyl silicate and fine powder silica as raw materials, fine powder silica is added and stirred to a hydrolyzed solution of alkyl silicate to form a sol solution, and the sol solution is subjected to ultrasonic waves. After applying the voltage, the sol solution is centrifuged and made of polypropylene.
A method for producing quartz glass characterized by performing pressure filtration using a filter of 50 μm or less.
JP14485084A 1984-07-12 1984-07-12 Production of quartz glass Granted JPS6126521A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14485084A JPS6126521A (en) 1984-07-12 1984-07-12 Production of quartz glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14485084A JPS6126521A (en) 1984-07-12 1984-07-12 Production of quartz glass

Publications (2)

Publication Number Publication Date
JPS6126521A JPS6126521A (en) 1986-02-05
JPH0348140B2 true JPH0348140B2 (en) 1991-07-23

Family

ID=15371867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14485084A Granted JPS6126521A (en) 1984-07-12 1984-07-12 Production of quartz glass

Country Status (1)

Country Link
JP (1) JPS6126521A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0822749B2 (en) * 1986-04-16 1996-03-06 セイコーエプソン株式会社 Glass manufacturing method
JP2018090440A (en) * 2016-12-02 2018-06-14 クアーズテック株式会社 Manufacturing method of optical component having acute angle portion

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JPS5978948A (en) * 1982-10-28 1984-05-08 Seiko Epson Corp Silica glass manufacturing method
JPS59116135A (en) * 1982-12-23 1984-07-04 Seiko Epson Corp Silica glass manufacturing method

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