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JPH03163418A - liquid crystal element - Google Patents

liquid crystal element

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Publication number
JPH03163418A
JPH03163418A JP30194889A JP30194889A JPH03163418A JP H03163418 A JPH03163418 A JP H03163418A JP 30194889 A JP30194889 A JP 30194889A JP 30194889 A JP30194889 A JP 30194889A JP H03163418 A JPH03163418 A JP H03163418A
Authority
JP
Japan
Prior art keywords
electrode
thickness
electrodes
liquid crystal
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30194889A
Other languages
Japanese (ja)
Other versions
JP2767145B2 (en
Inventor
Masaaki Suzuki
正明 鈴木
Naoya Nishida
直哉 西田
Masayuki Shimamune
島宗 正幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE:To obtain the liquid crystal element having good display quality by simultaneously forming spacers of the same thickness as thickness of electrodes on at least one glass substrate in the regions, exclusive of a display region, within a cell by using the same material. CONSTITUTION:The transparent electrodes, 2, 2 having 3,000Angstrom film thickness are formed in a stripe shape on the upper and lower glass substrates 1, 1' so as to face each other like an orthogonal matrix to form the display region (a). The lead electrodes 3, 3' of the same material and thickness as the material and thickness of the electrodes 2, 2' are simultaneously formed and the spacers 4, 4' for maintaining a prescribed cell gap uniformly at 1.5+ or -0.1mum over the entire surface by again using the same material to the same thickness. The spacers 4, 4' are formed to the shape extending the striped electrodes 2 up to the parts interposed with a sealing material 6 on the upper substrate 1 side and are provided on the outer side of the electrodes 2' in parallel therewith on the lower substrate 1' side. After the respective substrate surfaces formed with the patterns are subjected to an orientation treatment, glass beads 7 of 1.5mumphi mixed in the sealing material 6 by 1% are transferred by flexographic printing to 1mm width and 3mum thickness only on the substrate on one side. The substrates 1, 1' are stuck to each other and a buffer material is inserted between the substrates 1 and 1'. The element is then heated to cure the sealing material 6.

Description

【発明の詳細な説明】[Detailed description of the invention]

[a業上の利用分野] 本発明は、セル内の表示領域以外の領域に電極と同じ厚
さのスペーサーを形成して均一なセルギャップを得る液
晶表示素子の構成に関するものである.
[Field of Industrial Application] The present invention relates to a structure of a liquid crystal display element in which a uniform cell gap is obtained by forming a spacer having the same thickness as an electrode in a region other than a display region within a cell.

【従来技術】[Prior art]

従来の液晶表示素子構造を第5図、第6図に示す. 従来、液晶素子の製造方法は、2枚のガラス基板1.1
’の各々について、画面領域aとなる部分に電極2.2
′をパターン形成し同時に各電極に接続するリード電極
をパターン形成した後、その表面に配向処理を施す.次
に2枚のガラス基板1,1′を電極面同士を対向させて
、周辺をシール材6で封止し、それに囲まれたセル内部
をギャップ材5を介して貼り合わせる.このときプレス
等により加圧して所定のセルギャップを形成していた. [発明が解決しようとする課題] しかしながら、上記従来例では、第5図、第6図で示す
ように、貼り合わされた状態で電極2,2′同士が対向
した表示領域aとそれ以外の領域bでは、上下のガラス
基板1.1′をまったく平行にしてみた場合(側面から
みた場合)、形成された電極2.2′の厚さ分だけギャ
ップが異なるために、また全面均一に加圧したときに各
領域のギャップはセル内ギャップ材5やシール材6中の
フィラーやギャップ材7で保持されるために、電極2.
2′同士が対向された表示領域aの外周部では応力の集
中をうける.このためその部分でギャップ材5が変形ま
たは破壊し、あるいはギャップ材5が電極2.2′にく
い込み、これによりギャ−ツブ厚が他の表示部より薄く
なるという欠点があった.特に強誘電性液晶表示素子の
ようなギャップ厚が1〜2μmと非常に薄くしかも各基
板の電極をストライプ状に配しそれを直交させるように
して対向させた単純マトリックスの表示素子について、
表示面積を大きくし、かつ高ライン数としたときに配線
抵抗低下を防ぐため電極を厚くしなければならないとき
は、上記ギャップ不均一による問題が大きかった. 本発明は上記従来技術の欠点に鑑みなされたものであっ
て、ガラス基板貼り合わせ工程において、ギャップ差に
よる応力集中を軽減し均一なセルギャップを形成可能な
液晶表示素子の提供を目的とする. [課題を解決するための手段および作用]本発明によれ
ばセル内の表示領域以外の領域の少なくとも一方のガラ
ス基板上に電極と同じ厚さのスペーサーを形成し、しか
もそれを同材質で同時工程で形成したことにより、2枚
のガラス基板を貼り合わせ更に加圧する工程において、
上下のガラス基板をまったく平行にしてみた場合の電極
同士が対向された表示領域とそれ以外の領域とのギャッ
プ差に基づく応力集中を避けることができ、ギャップ材
の破壊・変形等によるギャップの薄い領域のない所定の
均一なセルギャップを形成できるようCしたものである
, [実施例] 第1図、第2図は本発明(係る強誘電性液晶を用いた液
晶表示素子の第一の実施例を示す.同図において1.1
′は上下の各ガラス基板で厚さは1.1  mmである
,2.2’ は各ガラス基板上にストライプ状に形成さ
れた膜厚3000人の透明電極( I To)であり、
貼り合わされた状態では直交マトリックス状に対向され
、この領域が表示領域aとなる,3.3’はリード電極
で透明電極2.2′と同じ材質・膜厚で同時に形成した
.bの領域にある4、4′は所定のセルギャップ1.5
±0.1μmを全面均一に維持するために形成したスペ
ーサーである.このスベーサ−4、4′も透明電極2.
2′およびリード電極3.3′と同じ材質・厚さで同時
に形成したものであり、その形成法はガラス基板1.1
′を貼り合わせる前の各基板上にスパッタリングにより
ITOを成膜し、その後フォトリソグラフィーエッチン
グ(よりパターンを形成したものである.このスペーサ
−4、4′の形状は第2図において、上側のガラス基板
1側ではストライプ状の電極2をシール材6を介する部
分まで延長して設けた形状とし、下側のガラス1′側で
は最外側のストライプ状の電極2′の外側にこれと平行
にシール材と重なる位置に同じくストライプ状に設けた
. 次にパターン形成した各基板表面に配向処理を施した後
,片側基板(のみフレキソ印刷にょりφ1.5μmのガ
ラスビーズ7(例えば商品、触媒化成■製シリカマイク
ロビーズ)をシール材6(例えば商品、三井東圧■製ス
トラクトボンドXN−21F)に1%(wet)混在さ
せたものを巾1量園厚さ3μm転写する.更に表示領域
部aのギャップを保持するためのφ1,5μmのガラス
ビーズからなるギャップ材5(例えば商品、触媒化戒■
製、シリカマイクロビーズ)を全面均一に250〜35
 0 / mm’の密度に散布した.しかる後に上下の
ガラス基板1.1′をストライプ状の透明電極2.2′
を直交するように対向させて貼り合わせ、更に加熱式プ
レス棧により70℃、2.5κg/co”で2分間加圧
した.但し圧力分布を全面均一にするためにプレス棧面
と、ガラス面間には各々*  1.Oma+のモルトブ
レンからなるU衝材を挟んだ。 このとき、シール材6を介する部分を含むセル内で透明
電極2.2′同士が対向してできた表示領域a以外の領
域bに前記したスペーサ−4、4′が形成されているた
め、φ1.5μmのギャップ材5およびシール材6中の
ガラスビーズ7によりガラス基板1.1′は平行に保た
れた状態で加圧される.したがって、応力・集中による
ギャップ材5の破砕もなく所定のセルギャップ1.5±
0.1 μmを全面均一に形成することができた。 その後170℃、4時間の加熱によりシール材6を硬化
させ、更にセル内に強誘電性液晶材を封入し、電気ドラ
イバーに接続して駆動させたところ、閾値特性の違いに
よるスイッチング不良や視覚的な色ムラもない非常に表
示品位のよい強誘電性液晶表示素子を得ることができた
. 第3図、第4図は本発明の別の実施例を示した図である
. ここでスベーサ−4は前記した実施例と同じく、ITO
1500人からなる電極2およびリード電極3と同じ材
買、厚さで同時に形成した.但しその領域は電極2.2
′同士が対向してできた表示領域aとリード電極3.3
′が対向した領域Cを除いた領域bの各々一方のガラス
基板にのみ単純にストライプ状の電極2.2′をシール
材を介する部分まで延長した形に形成した.次にパター
ン形成された各基板表面に配向処理を施した後、片側の
基板にフレキソ印刷によりφ1.65μmのガラスビー
ズ7をシール材6(例えば、商品三井東圧■製ストラク
トボンドXN−21F)に1%(wet)混在させたも
のを巾1 am,厚さ3μm転写する.更にφ1.5μ
mのガラスビーズからなるギャップ材5(例えば商品、
触媒化成■製シリカマイクロビーズ)を全面均−250
〜350ケ/■2の密度で散布した.しかる後に前記実
施例と同じく、上下のガラス基板1.1′を透明電極2
.2′を対向させて貼り合わせ、更に加熱式プレス棧に
よりプレス棧面とガラス面間に各々t1.0 mmのモ
ルトプレンの緩衝材を挟んだ状態で全面均一に70℃、
2.5Kg/cm’で2分間加圧した. このとき、電極2.2′が対向してできた表示領域a以
外のスベーサ−4を形成した領域bとリード電極3.3
′が対向された領域Cでは上下のガラス基板1.1′上
に形成された電極2.2′とリード電極3.3′および
スペーサ−4のトータルの厚さの違い、つまり上下のガ
ラス基板1.1′をまったく平行してみた場合のギャッ
プ厚が違うために、加圧したときの各領域のギャップは
ギャップ材5およびシール材中のガラスビーズ7で保持
されるので、領域bと領域Cに近い表示領域部は幾分応
力の集中を受ける.しかしながら、その部分で起こるギ
ャップ材5の破壊またはギャップ材5の透明電極2.2
′へのくい込みによるギャップ厚が他の表示領域部aよ
り薄くなる弊害は実用上問題とならない.即ち、領域b
と領域Cには厚さ1500人のスペーサ−4またはリー
ド電極3.3′があり表示領域a部との厚さの差は15
00人(0.15μm)しか無いため所定のセルギャッ
プ1.5±0,1μm内に収めることができた. [発明の効果] 以上説明したように、セル内の表示領域以外の領域の少
なくとも一方のガラス基板上に電極と同じ厚さのスペー
サーを形成し、しかもそれを同材貢で同時工程で形成す
ることにより、製造コストをまったく上げずに表示品位
の良い液晶表示素子を提供することができる.
The structure of a conventional liquid crystal display element is shown in Figures 5 and 6. Conventionally, the manufacturing method of liquid crystal elements consists of two glass substrates 1.1
For each of ', electrodes 2.2
After forming a pattern of ′ and at the same time forming a pattern of lead electrodes connected to each electrode, the surface is subjected to orientation treatment. Next, the electrode surfaces of the two glass substrates 1 and 1' are made to face each other, the periphery is sealed with a sealing material 6, and the inside of the cell surrounded by the sealing material 6 is bonded together via the gap material 5. At this time, pressure was applied using a press or the like to form a predetermined cell gap. [Problem to be Solved by the Invention] However, in the above conventional example, as shown in FIGS. 5 and 6, the display area a where the electrodes 2 and 2' face each other in a bonded state and the other area In b, when the upper and lower glass substrates 1.1' are made completely parallel (when viewed from the side), the gap is different by the thickness of the formed electrode 2.2', so the pressure cannot be applied uniformly over the entire surface. When this happens, the gap in each region is maintained by the filler and gap material 7 in the cell gap material 5 and sealing material 6, so that the electrode 2.
Stress is concentrated at the outer periphery of display area a where 2′ are opposed to each other. As a result, the gap material 5 may be deformed or destroyed in that area, or the gap material 5 may become embedded in the electrode 2.2', resulting in a disadvantage that the thickness of the gap becomes thinner than in other display areas. In particular, for simple matrix display elements such as ferroelectric liquid crystal display elements, which have a very thin gap thickness of 1 to 2 μm, and in which the electrodes of each substrate are arranged in stripes and are orthogonal to each other,
When the display area is increased and the number of lines is increased, and the electrodes must be made thicker to prevent a decrease in wiring resistance, the above-mentioned gap non-uniformity poses a major problem. The present invention was made in view of the above-mentioned drawbacks of the prior art, and an object of the present invention is to provide a liquid crystal display element that can reduce stress concentration due to gap differences and form a uniform cell gap in the process of bonding glass substrates. [Means and effects for solving the problem] According to the present invention, a spacer having the same thickness as the electrode is formed on at least one glass substrate in an area other than the display area in the cell, and is made of the same material and simultaneously formed. By forming it in the process, in the process of bonding two glass substrates together and further applying pressure,
Stress concentration due to the gap difference between the display area where the electrodes face each other and other areas when the upper and lower glass substrates are made completely parallel can be avoided, and the gap can be thinned due to breakage or deformation of the gap material. [Example] Figures 1 and 2 show a first embodiment of the present invention (a liquid crystal display element using a ferroelectric liquid crystal according to the present invention). An example is shown below. In the same figure, 1.1
' is the upper and lower glass substrates with a thickness of 1.1 mm, 2.2' is a transparent electrode (I To) with a film thickness of 3000 mm formed in a stripe shape on each glass substrate,
In the bonded state, they face each other in an orthogonal matrix, and this area becomes the display area a. 3.3' is a lead electrode formed at the same time with the same material and film thickness as the transparent electrode 2.2'. 4 and 4' in region b have a predetermined cell gap of 1.5
This is a spacer formed to maintain uniformity of ±0.1 μm over the entire surface. These substrates 4, 4' are also transparent electrodes 2.
2' and lead electrode 3.3' are formed at the same time using the same material and thickness, and the formation method is the same as that of glass substrate 1.1.
ITO was formed into a film by sputtering on each substrate before bonding the spacers 4 and 4', and then photolithography etched (to form a pattern). On the substrate 1 side, a striped electrode 2 is provided extending to the part through the sealing material 6, and on the lower glass 1' side, a seal is provided outside and parallel to the outermost striped electrode 2'. Next, after applying an orientation treatment to the surface of each patterned substrate, one side of the substrate (only for flexographic printing) was placed in a stripe pattern at a position overlapping with the material. A mixture of 1% (wet) silica microbeads manufactured by Mitsui Toatsu Co., Ltd. in a sealing material 6 (for example, Structobond Gap material 5 made of glass beads with a diameter of 1.5 μm to maintain the gap (for example, products, catalytic
250-35 silica microbeads) evenly distributed over the entire surface.
Sprayed at a density of 0/mm'. After that, the upper and lower glass substrates 1.1' are covered with striped transparent electrodes 2.2'.
They were laminated together facing each other perpendicularly, and then pressurized for 2 minutes at 70°C and 2.5κg/co" using a heating press. However, in order to make the pressure distribution uniform over the entire surface, A U-shield material made of maltbrene of *1. Since the spacers 4 and 4' described above are formed in the area b, the glass substrate 1.1' is kept parallel by the gap material 5 with a diameter of 1.5 μm and the glass beads 7 in the sealing material 6. Therefore, the gap material 5 is not crushed due to stress and concentration, and the predetermined cell gap is 1.5±.
A uniform thickness of 0.1 μm could be formed over the entire surface. After that, the sealing material 6 was cured by heating at 170°C for 4 hours, and a ferroelectric liquid crystal material was further sealed in the cell, and when it was connected to an electric driver and driven, it was found that there were switching defects and visual defects due to differences in threshold characteristics. We were able to obtain a ferroelectric liquid crystal display element with very good display quality and no color unevenness. FIGS. 3 and 4 are diagrams showing another embodiment of the present invention. Here, the substrate 4 is made of ITO as in the above embodiment.
They were formed at the same time using the same material and thickness as electrode 2 and lead electrode 3, which were made by 1,500 people. However, that area is electrode 2.2
' display area a and lead electrode 3.3 formed by facing each other.
Striped electrodes 2 and 2' were simply formed on each of the glass substrates in region b, excluding region C where electrodes 2 and 2' faced each other, extending to the part through the sealing material. Next, after performing orientation treatment on the surface of each patterned substrate, glass beads 7 with a diameter of 1.65 μm are applied to one side of the substrate by flexographic printing with a sealing material 6 (for example, Structbond XN-21F manufactured by Mitsui Toatsu ■). A mixture of 1% (wet) and 1% (wet) is transferred to a width of 1 am and a thickness of 3 μm. Furthermore φ1.5μ
Gap material 5 (for example, a product,
Silica microbeads (manufactured by Catalyst Kasei) were uniformly coated with -250
Sprayed at a density of ~350 seeds/■2. Thereafter, as in the previous embodiment, the upper and lower glass substrates 1.1' are connected to transparent electrodes 2.
.. 2' were pasted together facing each other, and the entire surface was heated uniformly at 70°C with a 1.0 mm moltprene buffer sandwiched between the press plate surface and the glass surface using a heated press plate.
Pressure was applied at 2.5 kg/cm' for 2 minutes. At this time, the area b where the spacer 4 is formed other than the display area a where the electrode 2.2' faces and the lead electrode 3.3
In the area C where the electrodes 1.1' and 1.1' face each other, there is a difference in the total thickness of the electrode 2.2' formed on the upper and lower glass substrates 1.1', the lead electrode 3.3', and the spacer 4, that is, the difference in the total thickness of the upper and lower glass substrates 1.1'. 1. Since the gap thickness is different when 1' are viewed completely parallel, the gap in each area when pressurized is maintained by the gap material 5 and the glass beads 7 in the sealing material, so the difference between area b and area The display area near C is subject to some stress concentration. However, the destruction of the gap material 5 occurring in that part or the transparent electrode 2.2 of the gap material 5
The problem that the gap thickness becomes thinner than the other display area part a due to the cutting into ' is not a practical problem. That is, area b
There is a spacer 4 or lead electrode 3.3' with a thickness of 1500 in area C, and the difference in thickness from display area a is 15.
Since there were only 0.00 people (0.15 μm), we were able to keep the cell gap within the specified cell gap of 1.5 ± 0.1 μm. [Effects of the Invention] As explained above, a spacer having the same thickness as the electrode is formed on at least one glass substrate in an area other than the display area in the cell, and moreover, it is formed using the same material and in the same process. This makes it possible to provide a liquid crystal display element with good display quality without increasing manufacturing costs at all.

【図面の簡単な説明】[Brief explanation of the drawing]

′s1図は、本発明の第一実施例に係る、液晶表示素子
の平面図、 第2図は、第1図のA−A’断面図、 第3図は、本発明の第二実施例に係る液晶表示素子の平
面図、 第4図は、第3図のA−A’断面図、 第5図は、従来の液晶表示素子を示す平面図、第6図は
、第5図のA−A’の断面図である.1.1’  :ガ
ラス基板、 2.2’  :電極、 3.3’  :リード電極、 4.4′ ニスベーサ− 5=ギャップ材、 6:シール材、 7:ガラスビーズ. 特許
Figure 's1 is a plan view of a liquid crystal display element according to the first embodiment of the present invention, Figure 2 is a sectional view taken along line AA' in Figure 1, and Figure 3 is a second embodiment of the present invention. 4 is a sectional view taken along line AA' in FIG. 3, FIG. 5 is a plan view showing a conventional liquid crystal display element, and FIG. 6 is a sectional view taken along line A-A in FIG. -A' is a cross-sectional view. 1.1': glass substrate, 2.2': electrode, 3.3': lead electrode, 4.4' varnish baser 5 = gap material, 6: sealing material, 7: glass beads. patent

Claims (5)

【特許請求の範囲】[Claims] (1)電極を形成した2枚の基板を電極面を対面させて
所定間隔を隔てて対向配置し、両基板間の電極対面部に
ギャップ材を介装し、該電極対面部の周囲をシール材で
封止し、該シール材封止部の少なくとも一方の基板上に
前記電極と同じ厚さのスペーサーを設けたことを特徴と
する液晶素子。
(1) Two substrates on which electrodes are formed are placed facing each other with the electrode surfaces facing each other with a predetermined gap between them, a gap material is interposed in the electrode facing area between both substrates, and the area around the electrode facing area is sealed. 1. A liquid crystal element, characterized in that a spacer having the same thickness as the electrode is provided on at least one substrate of the sealing material-sealed portion.
(2)前記スペーサーは、前記電極と同一工程で形成さ
れた同一材料からなることを特徴とする特許請求の範囲
第1項記載の液晶素子。
(2) The liquid crystal element according to claim 1, wherein the spacer is made of the same material and formed in the same process as the electrode.
(3)前記電極は複数の並列配置したストライプ状電極
からなり、2枚の基板の各電極を直交配置してマトリッ
クスを構成し、各ストライプ状電極に連続して同一厚さ
同一材料のリード電極を各基板の一側縁に並列して形成
したことを特徴とする特許請求の範囲第2項記載の液晶
素子。
(3) The electrodes are composed of a plurality of striped electrodes arranged in parallel, each electrode of two substrates is arranged orthogonally to form a matrix, and each striped electrode is continuously connected to a lead electrode of the same thickness and the same material. 3. The liquid crystal element according to claim 2, wherein: are formed in parallel on one side edge of each substrate.
(4)前記スペーサーは、前記各ストライプ状電極のリ
ード電極と反対側にシール材配設部まで延長して各スト
ライプ状電極に連続して形成されたことを特徴とする特
許請求の範囲第3項記載の液晶素子。
(4) The spacer is formed continuously with each stripe-shaped electrode so as to extend to a sealing material disposed portion on the side opposite to the lead electrode of each stripe-shaped electrode. The liquid crystal element described in .
(5)前記スペーサーは、最外側のストライプ状電極の
外側にこれと平行に前記シール材と重なるまでの位置に
形成されたことを特徴とする特許請求の範囲第3項記載
の液晶素子。
(5) The liquid crystal element according to claim 3, wherein the spacer is formed on the outside of the outermost striped electrode and parallel to the outermost striped electrode until it overlaps with the sealing material.
JP1301948A 1989-11-22 1989-11-22 Liquid crystal element Expired - Lifetime JP2767145B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1301948A JP2767145B2 (en) 1989-11-22 1989-11-22 Liquid crystal element

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Application Number Priority Date Filing Date Title
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JPH03163418A true JPH03163418A (en) 1991-07-15
JP2767145B2 JP2767145B2 (en) 1998-06-18

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Country Link
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Cited By (6)

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JPH08264796A (en) * 1995-03-18 1996-10-11 Semiconductor Energy Lab Co Ltd Display device and its forming method
US6774968B2 (en) 2000-09-14 2004-08-10 Seiko Epson Corporation Liquid crystal device and electronic apparatus
JP2005005724A (en) * 2004-07-06 2005-01-06 Semiconductor Energy Lab Co Ltd Semiconductor integrated circuit and its manufacturing method
US7214555B2 (en) 1995-03-18 2007-05-08 Semiconductor Energy Laboratory Co., Ltd. Method for producing display device
US7333172B1 (en) 1995-12-21 2008-02-19 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device having plurality of conductive layers between a substrate and sealing member and insulated by insulating film
US7462519B2 (en) 1994-12-27 2008-12-09 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, method of fabricating same, and, electrooptical device

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Publication number Priority date Publication date Assignee Title
JPS649424A (en) * 1987-07-02 1989-01-12 Optrex Kk Liquid crystal display element
JPH0324523A (en) * 1989-06-22 1991-02-01 Optrex Corp Electrooptical display cell

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Publication number Priority date Publication date Assignee Title
JPS649424A (en) * 1987-07-02 1989-01-12 Optrex Kk Liquid crystal display element
JPH0324523A (en) * 1989-06-22 1991-02-01 Optrex Corp Electrooptical display cell

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7462519B2 (en) 1994-12-27 2008-12-09 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, method of fabricating same, and, electrooptical device
US7504660B2 (en) 1994-12-27 2009-03-17 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, method of fabricating same, and, electrooptical device
US7468526B2 (en) 1994-12-27 2008-12-23 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, method of fabricating same, and electrooptical device
US7214555B2 (en) 1995-03-18 2007-05-08 Semiconductor Energy Laboratory Co., Ltd. Method for producing display device
JPH08264796A (en) * 1995-03-18 1996-10-11 Semiconductor Energy Lab Co Ltd Display device and its forming method
US7483091B1 (en) 1995-03-18 2009-01-27 Semiconductor Energy Laboratory Co., Ltd. Semiconductor display devices
US8012782B2 (en) 1995-03-18 2011-09-06 Semiconductor Energy Laboratory Co., Ltd. Method for producing display device
US7333172B1 (en) 1995-12-21 2008-02-19 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device having plurality of conductive layers between a substrate and sealing member and insulated by insulating film
US7394516B2 (en) 1995-12-21 2008-07-01 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device having a particular conductive layer
US7956978B2 (en) 1995-12-21 2011-06-07 Semiconductor Energy Laboratory Co., Ltd. Liquid-crystal display device having a particular conductive layer
US8194224B2 (en) 1995-12-21 2012-06-05 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device having particular conductive layers
US8665411B2 (en) 1995-12-21 2014-03-04 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device having particular conductive layer
US9316880B2 (en) 1995-12-21 2016-04-19 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device
US7088416B2 (en) 2000-09-14 2006-08-08 Seiko Epson Corporation Liquid crystal device having pronged dummy electrodes and electronic device
US6774968B2 (en) 2000-09-14 2004-08-10 Seiko Epson Corporation Liquid crystal device and electronic apparatus
JP2005005724A (en) * 2004-07-06 2005-01-06 Semiconductor Energy Lab Co Ltd Semiconductor integrated circuit and its manufacturing method

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