JPH02130155A - Preparation of glazed ceramic substrate for thermal head - Google Patents
Preparation of glazed ceramic substrate for thermal headInfo
- Publication number
- JPH02130155A JPH02130155A JP28632888A JP28632888A JPH02130155A JP H02130155 A JPH02130155 A JP H02130155A JP 28632888 A JP28632888 A JP 28632888A JP 28632888 A JP28632888 A JP 28632888A JP H02130155 A JPH02130155 A JP H02130155A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- ceramic substrate
- glass film
- photoresist
- thermal head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 46
- 239000000919 ceramic Substances 0.000 title claims abstract description 45
- 239000011521 glass Substances 0.000 claims abstract description 70
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 22
- 239000000843 powder Substances 0.000 claims abstract description 13
- 238000010438 heat treatment Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 7
- 238000001035 drying Methods 0.000 abstract description 2
- 238000005530 etching Methods 0.000 abstract description 2
- 238000010304 firing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 3
- 239000001856 Ethyl cellulose Substances 0.000 description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 229920001249 ethyl cellulose Polymers 0.000 description 2
- 235000019325 ethyl cellulose Nutrition 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- WUOACPNHFRMFPN-SECBINFHSA-N (S)-(-)-alpha-terpineol Chemical compound CC1=CC[C@@H](C(C)(C)O)CC1 WUOACPNHFRMFPN-SECBINFHSA-N 0.000 description 1
- 241000209761 Avena Species 0.000 description 1
- 235000007319 Avena orientalis Nutrition 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- OVKDFILSBMEKLT-UHFFFAOYSA-N alpha-Terpineol Natural products CC(=C)C1(O)CCC(C)=CC1 OVKDFILSBMEKLT-UHFFFAOYSA-N 0.000 description 1
- 229940088601 alpha-terpineol Drugs 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000009970 fire resistant effect Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Electronic Switches (AREA)
Abstract
Description
【発明の詳細な説明】
(イ)産業上の利用分野
この発明は、サーマルヘッド用グレーズドセラミック基
板の製法に関し、ことにサーマルプリンタのドツト印刷
用ライン型サーマルヘッドの製造に用いられる。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a method for manufacturing a glazed ceramic substrate for a thermal head, and is particularly used for manufacturing a line-type thermal head for dot printing in a thermal printer.
(ロ)従来の技術
従来、ドツト印刷用ライン型サーマルヘッドに用いられ
るグレーズドセラミック基板は第8図に示すようにセラ
ミック基板11の上に所定パターンのガラス膜44を印
刷・焼成法によって形成し、このガラス膜44の上に第
7図に示すように所定パターンとなるように隆起した形
状のガラス層22を印刷・焼成法によって形成して製造
されている。(B) Prior Art Conventionally, as shown in FIG. 8, a glazed ceramic substrate used in a line-type thermal head for dot printing has a predetermined pattern of glass film 44 formed on a ceramic substrate 11 by a printing and firing method. The glass layer 22 is manufactured by forming a raised glass layer 22 in a predetermined pattern on the glass film 44 by a printing and firing method, as shown in FIG.
サーマルヘッドは、前記グレーズドセラミック基板の隆
起した位置の上に発熱抵抗部を形成して製造されている
。The thermal head is manufactured by forming a heating resistor portion on the raised position of the glazed ceramic substrate.
このサーマルヘッドは画像信号を印字を行う行に分割し
て出力することにより同一線上の画像を被転写紙又は感
熱記録紙に印字できるように構成されている。This thermal head is configured so that images on the same line can be printed on transfer paper or thermal recording paper by dividing an image signal into lines to be printed and outputting them.
(ハ)発明が解決しようとをる課題
前記従来の製法で作製したサーマルヘッド用グレーズド
セラミック基板はパターンの直線精度が悪く、通常の場
合では±100μm程度の誤差があり、極めて精度よく
制御した場合であっても±50μmが限界であった。従
って、このグレーズドセラミック基板を用いて作製され
たサーマルヘッドは画素を形成する発熱抵抗部のライン
直線性が充分でなく、印字する紙に対する接触が不十分
となり、印字不良が発生する場合があった。(c) Problems to be Solved by the Invention The glazed ceramic substrate for thermal heads manufactured using the conventional manufacturing method has poor linear pattern accuracy, with an error of about ±100 μm in normal cases, and when controlled with extremely high precision. However, the limit was ±50 μm. Therefore, in a thermal head made using this glazed ceramic substrate, the line linearity of the heating resistor part that forms the pixel was not sufficient, resulting in insufficient contact with the paper being printed, which could result in printing defects. .
この発明の目的はガラス層の隆起部に形成する発熱抵抗
体の直線性を向上し、印字電力効率を均一化し、印字濃
度のバラツキ(ΔD)を小さくしかつ信頼性を高めたサ
ーマルヘッドを製造することができる直線精度の高いグ
レーズドセラミック基板の製法を提供することにある。The purpose of this invention is to improve the linearity of the heating resistor formed on the raised part of the glass layer, to equalize the printing power efficiency, to reduce the variation in printing density (ΔD), and to manufacture a thermal head with improved reliability. An object of the present invention is to provide a method for manufacturing a glazed ceramic substrate with high linear accuracy.
(ニ)課題を解決するための手段
この発明によれば、サーマルヘッド用セラミック基板の
上に、ガラス粉末のペーストを印刷し焼成してガラス膜
を形成し、この上にホトレジストを塗布し、形成を意図
するサーマルヘプトの発熱抵抗部に対応する位置のホト
レジストを残して前記ガラス膜の表面をパターン化し、
このパターンに従ってガラス膜をエツチングして直線状
のガラス層を形成し、更にこの上にガラス粉末のペース
トを印刷し焼成して直線状の隆起を有するグレーズドセ
ラミック基板を形成することを特徴とをるサーマルヘッ
ド用グレーズドセラミック基板の製法が提供される。(d) Means for Solving the Problems According to the present invention, a glass powder paste is printed and fired on a ceramic substrate for a thermal head to form a glass film, and a photoresist is applied on this to form a glass film. patterning the surface of the glass film, leaving a photoresist at a position corresponding to the heating resistor part of the thermal hept, which is intended for
The glass film is etched according to this pattern to form a linear glass layer, and a paste of glass powder is further printed on this and fired to form a glazed ceramic substrate having linear ridges. A method of manufacturing a glazed ceramic substrate for a thermal head is provided.
この発明においては、サーマルヘッド用セラミック基板
上に、ガラス粉末のペーストを印刷し焼成してガラス膜
を形成するのが適している。In this invention, it is suitable to form a glass film by printing a glass powder paste on a ceramic substrate for a thermal head and firing it.
前記サーマルヘッド用セラミック基板は、例えばA I
2t Os、Sin、、SiO,5isN4等の絶縁性
セラミックを用いることができ、例えば縦8釦ズ、横2
70xm、厚さ0.8■の外形を有しているものを用い
ることができる。The ceramic substrate for the thermal head is, for example, A.I.
Insulating ceramics such as 2t Os, Sin, SiO, 5isN4 can be used, for example, 8 buttons vertically and 2 horizontally.
A material having an outer diameter of 70 x m and a thickness of 0.8 cm can be used.
前記ガラス粉末は、例えばアルミノホウケイ酸ガラス、
ホウケイ酸ガラス等を用いることができ、これに耐火性
フィラーPbOlMgO,BaO。The glass powder is, for example, aluminoborosilicate glass,
Borosilicate glass etc. can be used, and refractory filler PbOlMgO, BaO is added thereto.
CaO等を添加し、媒体としてα−テルピネオール、エ
チルセルロース等を加えてペーストとして用いるのが適
している。このガラス粉末のペーストは印刷機を用いて
前記セラミックス基板上に塗布し、次いて例えば電気炉
を用いて、通常600〜1000℃で焼成して、通常厚
さ30〜90μmのガラス膜を形成するのが適している
。It is suitable to use it as a paste by adding CaO, etc., and α-terpineol, ethyl cellulose, etc. as a medium. This glass powder paste is applied onto the ceramic substrate using a printing machine, and then fired at a temperature of usually 600 to 1000°C using, for example, an electric furnace to form a glass film having a thickness of usually 30 to 90 μm. is suitable.
この発明においては、前記ガラス膜の上にホトレジスト
を塗布し、形成を意図するサーマルヘッドの発熱抵抗部
に対応する位置のホトレジストを残して前記ガラス膜の
表面をパターン化し、このパターンに従ってガラス膜を
エツチングして直線状のガラス層を形成するのが適して
いる。前記ホトレジストは、ネガ型ホトレジスト及びポ
ジ型ホトレノストを用いることかでき、例えば環状ゴム
系、ポリ佳皮酸ビニル系、ノボラックレジン−〇キノン
ジアゾ系のホトレジストを挙げることができる。このホ
トレジストの塗布は、例えば前記ガラス層を有するセラ
ミック基板をスピンナ(回転台)に乗せ高速で回転させ
ながらホトレジスト液を滴下して行うことができる。前
記形成を意図するサーマルヘッドの発熱抵抗部に対応す
る位置は、例えば前記セラミック基板の横端から1〜5
taXでかっ幅1,5〜5.0mmの直線状の位置が適
している。この位置のホトレジストは通常280〜48
0nmの波長の光を照射又は照射什ずして不溶性とし次
いで残りの易溶性のホトレジストを溶解除去し、前記ガ
ラス膜の表面をパターン化することができろ。In this invention, a photoresist is applied onto the glass film, the surface of the glass film is patterned leaving the photoresist at a position corresponding to the heating resistor of the thermal head to be formed, and the glass film is formed according to this pattern. Etching to form a straight glass layer is suitable. As the photoresist, a negative type photoresist or a positive type photoresist can be used, and examples thereof include cyclic rubber type, polyvinyl cinnamate type, and novolac resin-〇quinone diazo type photoresists. The photoresist can be applied, for example, by placing the ceramic substrate having the glass layer on a spinner (rotating table) and rotating it at high speed while dropping the photoresist solution. The position corresponding to the heating resistor of the thermal head to be formed is, for example, 1 to 5 points from the lateral end of the ceramic substrate.
A linear position with a width of 1.5 to 5.0 mm is suitable. The photoresist at this location is typically 280-48
The surface of the glass film can be patterned by making it insoluble by irradiating or not irradiating it with light having a wavelength of 0 nm, and then dissolving and removing the remaining easily soluble photoresist.
次に、このパターンに従って、例えばHF系水溶液を用
いて前記ガラス膜をエツチングして前記形成を意図する
サーマルヘッドの発熱抵抗部に対応する位置に、通常厚
さ30〜90μmの直線状のガラス層を形成することか
できる。Next, according to this pattern, the glass film is etched using, for example, an HF-based aqueous solution to form a linear glass layer, usually 30 to 90 μm thick, at a position corresponding to the heating resistor part of the thermal head intended to be formed. can be formed.
この発明においては、前記直線状のガラス層形成面にガ
ラス粉末のペーストを印刷し焼成して直線状の隆起を有
するグレーズドセラミック基板を形成するのが適してい
る。前記ガラス粉末は、例えば鉛ガラス、ホウケイ酸ガ
ラス等を用いることができ、これに耐火性フィラーPb
OXMgO。In this invention, it is suitable to print a paste of glass powder on the linear glass layer formation surface and bake it to form a glazed ceramic substrate having linear ridges. As the glass powder, for example, lead glass, borosilicate glass, etc. can be used, and a fire-resistant filler Pb is added to the glass powder.
OXMgO.
BadSCaO等を添加し媒体としてα−テルピネオー
ツ呟エチルセルロース等を加えてペーストとして用いる
のが適している。このガラス粉末のペーストは印刷機を
用いて前記直線状のガラス層形成面全面に塗布し、次い
で例えば電気炉を用いて通常600−1100℃で焼成
して、通常厚さ5〜50μmのガラス膜を形成しグレー
ズドセラミック基板とをるのが適している。このグレー
ズドセラミック基板は、前記焼成によってセラミック基
板と前記直線状のガラス層の間に生じていた急峻な段差
が緩和され、肩部がゆるやかな曲面でかつ上面が平坦な
直線状の隆起部を有する直線精度の高いしのとをること
ができろ。It is suitable to use it as a paste by adding BadSCaO or the like and adding α-terpine oats, ethyl cellulose or the like as a medium. This glass powder paste is applied to the entire surface of the linear glass layer forming surface using a printing machine, and then baked at a temperature of usually 600 to 1100°C using, for example, an electric furnace to form a glass film with a thickness of usually 5 to 50 μm. It is suitable for use with glazed ceramic substrates. This glazed ceramic substrate has a linear raised part whose shoulder part is a gently curved surface and whose top surface is flat, with the steep step difference between the ceramic substrate and the straight glass layer being alleviated by the firing. Be able to draw a line with high accuracy.
このグレーズドセラミック基板は、例えば蒸着、スパッ
タリング、ホトリソグラフィ等の手段によって、その直
線状の隆起部に発熱抵抗体を形成し、この発熱抵抗体を
多数に分割してそれぞれに電極を接続してサーマルヘッ
ドを作製することができる。このサーマルヘッドは通電
により発熱して、例えば感熱記録紙の上に多数の画素を
直線状に出力して均一な印字濃度で印字することができ
る。This glazed ceramic substrate is made by forming a heating resistor on its linear protuberance by means such as vapor deposition, sputtering, or photolithography, and then dividing this heating resistor into a number of parts and connecting electrodes to each of them. A head can be manufactured. This thermal head generates heat when energized, and can output a large number of pixels in a straight line onto, for example, heat-sensitive recording paper to print with uniform print density.
(ホ)作用
ホトレジストによってパターン化し、エツチングして直
線状のガラス層を形成するため、このガラス層の直線精
度が向上し、この上にガラス膜を焼成によって形成する
ため、このガラス膜の表面に形成されろ直線状の隆起部
は急峻な段差が無くなり、底部及び肩部がゆるやかな曲
線でありかつ上面が平面の直線精度の高いものとなる。(e) Function: Patterned with photoresist and etched to form a straight glass layer, improving the straight line accuracy of this glass layer.Since a glass film is formed on top of this by firing, the surface of this glass film is The linear raised portion that is formed has no steep steps, has a gentle curve at the bottom and shoulder, and has a flat top surface with high linear accuracy.
(へ)実施例 二の発明の実施例を図面を参照して説明する。(f) Example A second embodiment of the invention will be described with reference to the drawings.
まず、第2図に示すように縦80a+x、横270.7
.t。First, as shown in Figure 2, the height is 80a+x and the width is 270.7
.. t.
厚さQ、8ztrの高抵抗セラミック基板1(純119
0%以上のAl2tOi)の全面にエレクトロサイエン
スラボラトリ−社製 商品名4608Hのガラス粉末ペ
ーストを印刷機によって塗布し、930℃/ 5=’+
で焼成してガラス膜2を形成した。High resistance ceramic substrate 1 (pure 119) with thickness Q and 8ztr
Glass powder paste (trade name 4608H manufactured by Electro Science Laboratory) was applied by a printing machine to the entire surface of the Al2tOi (0% or more Al2tOi), and heated to 930℃/5='+
A glass film 2 was formed by firing the glass film.
次に、このセラミック基板をスピンナに取付け、ガラス
膜2の上にノボラックレジン−〇−キノンジアジド系ポ
ジ型ホトレジストの有i溶剤溶液を滴下して塗布し、乾
燥後、300na+の近紫外線を照射して易溶化し、リ
ン酸エステル系現象液で易溶部を溶解して現像し、所定
のパターンを形成した。Next, this ceramic substrate was attached to a spinner, and a solvent solution of novolac resin-〇-quinonediazide-based positive photoresist was applied dropwise onto the glass film 2. After drying, it was irradiated with near ultraviolet rays of 300 Na+. It was made easily soluble, and the easily soluble portion was dissolved and developed with a phosphoric acid ester-based phenomenon liquid to form a predetermined pattern.
次に第3図に示すようにHF系水溶液を用いて・前工己
パターンに従ってガラス膜2をエツチングし、ホトレジ
スト層3aをN−メチル−2−ピロリドン系剥離液によ
って除去して、第4図に示すように基板の横端部から2
.5xzの位置に縦10xm、 満270yrx、厚さ
60μmのガラス層2aを形成した。このガラスJiJ
2aは部方向の直線精度が±I Qamの範囲にあり精
度の高いものであった。Next, as shown in FIG. 3, the glass film 2 is etched according to the pre-etched pattern using an HF-based aqueous solution, and the photoresist layer 3a is removed using an N-methyl-2-pyrrolidone-based stripping solution. 2 from the side edge of the board as shown in
.. A glass layer 2a having a length of 10 x m, a total length of 270 yr, and a thickness of 60 μm was formed at a position of 5 x z. This glass JiJ
2a had a high linear accuracy in the section direction within the range of ±IQam.
次に、ガラスFJ2aを形成した基板面の全面にデュポ
ン社製 商品名8190の非晶質ガラスペーストを印#
11機を用いて塗布し、1050℃/ 15NBで焼成
して第1図に示すようにガラス層2λの上に膜厚20μ
mのガラス膜4を配設したグレーズドセラミック基板を
得た。このグレーズドセラミック基板は基板の横端部か
ら2.5xaの位置に幅1.2xx、長さ270xm、
高さ80μmの肩部がゆるやかな曲面でかつ上面が平面
の直線精度の高い隆起部を有するものであった。Next, an amorphous glass paste manufactured by DuPont under the trade name 8190 was stamped on the entire surface of the substrate on which the glass FJ2a was formed.
It was coated using a glass layer 2λ and baked at 1050°C/15NB to form a film with a thickness of 20μ on top of the glass layer 2λ as shown in Figure 1.
A glazed ceramic substrate on which a glass film 4 of m thickness was disposed was obtained. This glazed ceramic board has a width of 1.2xx and a length of 270xm at a position 2.5xa from the side edge of the board.
The shoulder portion with a height of 80 μm had a gently curved surface, and the upper surface had a flat raised portion with high linear accuracy.
更に、第5図〜第6図に示すようにグレーズドセラミッ
ク基板1aの上に厚さ2000人のTa−3ift発熱
体をスパッタリングによって積層して発熱抵抗層5を形
成し、更に厚さ12μmのアルミニウムからなる共通電
極層7、厚さ8000人のAf2系合金からなるリード
1i極膜6、絶縁1112、耐摩耗保護膜8、ソルダレ
ジスト層9を順次形成してサーマルヘッドを作製した。Furthermore, as shown in FIGS. 5 and 6, a heating resistor layer 5 is formed by laminating a Ta-3ift heating element with a thickness of 2000 on the glazed ceramic substrate 1a by sputtering, and an aluminum layer with a thickness of 12 μm is further formed. A thermal head was fabricated by sequentially forming a common electrode layer 7 consisting of a lead 1i electrode film 6 made of an Af2-based alloy having a thickness of 8000, an insulation 1112, an abrasion-resistant protective film 8, and a solder resist layer 9.
次に、得られたサーマルヘッドをサーマルプリンタに取
付けて印字試験を行った。その結果、従来のグレーズド
セラミック基板を用いて作製したサーマルヘッドと比較
して、印字濃度のばらつきが大幅に改善されることを確
認した。またサーマルヘッドの製造工程は、グレーズド
セラミック基板上に形成する発熱低抗体眉のステップカ
バレッジが良く、かつホトリソグラフィ工程におけるホ
トレジストの被覆性が改善され生産性がよく、サーマル
ヘッドの量産に適していた。Next, the obtained thermal head was attached to a thermal printer and a printing test was conducted. As a result, it was confirmed that the variation in print density was significantly improved compared to a thermal head fabricated using a conventional glazed ceramic substrate. In addition, the manufacturing process of the thermal head has good step coverage of the low heat generation antibody formed on the glazed ceramic substrate, and the coverage of the photoresist in the photolithography process has been improved, resulting in high productivity and is suitable for mass production of thermal heads. .
(ト)発明の効果
この発明によれば、急峻な段差が無く、底部及び肩部が
ゆるやかな局面でかつ上面が平面の直線精度の高い直線
状の隆起部を有するグレーズドセラミック基板の製法を
提供することができ、この製法によって作製したグレー
ズドセラミック基板を用いると、印字濃度のばらつきの
小さいサーマルヘッドを生産性よく製造することができ
る。(G) Effects of the Invention According to the present invention, there is provided a method for manufacturing a glazed ceramic substrate having a linear protrusion with high linear accuracy, which has no steep steps, has a gently curved bottom and shoulder, and has a flat top surface. By using a glazed ceramic substrate manufactured by this manufacturing method, a thermal head with small variations in printing density can be manufactured with high productivity.
第1図は、この発明の実施例において作製したグレーズ
ドセラミック基板の説明図、第2図〜第4図はこの発明
のグレーズドセラミック基板の製造工程説明図、第5図
及び第6図はこの発明の実施例において作製しfニサー
マルヘッドの説明図、第7図は従来のグレーズドセラミ
ンク基板の説明図、第8図は従来のグレーズドセラミッ
ク基板の製造工程の説明図である。
7・・・・・・共通電極層、
8・・・・・・耐摩耗保護膜、
9・・・・・・ソルダーレジスト層、
0・・・・・・発熱抵抗部、
12・・・・・・絶縁層。
1.11・・・・・・セラミック基板、la・・・・・
・グレーズドセラミック基板、2.4.44・・・・・
・ガラス膜、
2a、22・・・・・・ガラス層、
3.31・・・・・・ホトレジスト層、5・・・・・・
発熱抵抗層、 6・・・・・・リード電極膜、第
図
第
図
第
図
第
図FIG. 1 is an explanatory diagram of a glazed ceramic substrate produced in an example of the present invention, FIGS. 2 to 4 are explanatory diagrams of the manufacturing process of a glazed ceramic substrate of this invention, and FIGS. 5 and 6 are diagrams of the invention. FIG. 7 is an explanatory diagram of a conventional glazed ceramic substrate, and FIG. 8 is an explanatory diagram of the manufacturing process of a conventional glazed ceramic substrate. 7...Common electrode layer, 8...Wear-resistant protective film, 9...Solder resist layer, 0...Heating resistor part, 12... ...Insulating layer. 1.11...Ceramic substrate, la...
・Glazed ceramic substrate, 2.4.44...
・Glass film, 2a, 22...Glass layer, 3.31...Photoresist layer, 5...
Heat generating resistance layer, 6...Lead electrode film, Figure Figure Figure Figure Figure
Claims (1)
末のペーストを印刷し焼成してガラス膜を形成し、この
上にホトレジストを塗布し、形成を意図するサーマルヘ
ッドの発熱抵抗部に対応する位置のホトレジストを残し
て前記ガラス膜の表面をパターン化し、このパターンに
従ってガラス膜をエッチングして直線状のガラス層を形
成し、更にこの上にガラス粉末のペーストを印刷し焼成
して直線状の隆起を有するグレーズドセラミック基板を
形成することを特徴とをるサーマルヘッド用グレーズド
セラミック基板の製法。1. Print a glass powder paste on a ceramic substrate for a thermal head and bake it to form a glass film. Apply a photoresist on top of this and place it at a position corresponding to the heating resistor of the thermal head to be formed. The surface of the glass film is patterned leaving the photoresist, the glass film is etched according to this pattern to form a straight glass layer, and a paste of glass powder is printed on top of this and baked to form straight protuberances. A method for manufacturing a glazed ceramic substrate for a thermal head, characterized by forming a glazed ceramic substrate having a glazed ceramic substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28632888A JPH02130155A (en) | 1988-11-11 | 1988-11-11 | Preparation of glazed ceramic substrate for thermal head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28632888A JPH02130155A (en) | 1988-11-11 | 1988-11-11 | Preparation of glazed ceramic substrate for thermal head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02130155A true JPH02130155A (en) | 1990-05-18 |
Family
ID=17702967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28632888A Pending JPH02130155A (en) | 1988-11-11 | 1988-11-11 | Preparation of glazed ceramic substrate for thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02130155A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5917531A (en) * | 1996-02-13 | 1999-06-29 | Rohm Co., Ltd. | Thermal head and method of manufacturing the same |
CN109968826A (en) * | 2017-03-20 | 2019-07-05 | 深圳市博思得科技发展有限公司 | Thermal printing head |
-
1988
- 1988-11-11 JP JP28632888A patent/JPH02130155A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5917531A (en) * | 1996-02-13 | 1999-06-29 | Rohm Co., Ltd. | Thermal head and method of manufacturing the same |
CN109968826A (en) * | 2017-03-20 | 2019-07-05 | 深圳市博思得科技发展有限公司 | Thermal printing head |
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