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JPS6322665A - Manufacture of thermal head - Google Patents

Manufacture of thermal head

Info

Publication number
JPS6322665A
JPS6322665A JP4614886A JP4614886A JPS6322665A JP S6322665 A JPS6322665 A JP S6322665A JP 4614886 A JP4614886 A JP 4614886A JP 4614886 A JP4614886 A JP 4614886A JP S6322665 A JPS6322665 A JP S6322665A
Authority
JP
Japan
Prior art keywords
tantalum
glass
thermal head
thermal resistor
heating resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4614886A
Other languages
Japanese (ja)
Inventor
Juichi Kishida
岸田 寿一
Hirotake Nakayama
仲山 浩偉
Toru Miyagawa
宮川 亨
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4614886A priority Critical patent/JPS6322665A/en
Publication of JPS6322665A publication Critical patent/JPS6322665A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335Structure of thermal heads

Landscapes

  • Electronic Switches (AREA)

Abstract

PURPOSE:To improve a print quality and reduce power consumption by forming a recessed part in the glass of a thermal resistor electrode using a photoetching method and thereby forming a projected thermal resistor. CONSTITUTION:A printed and baked glass having a thickness of 30-80mum is formed on the entire upper surface of a ceramic substrate 1, and a tantalum 3 having a film thickness of 500-1,200Angstrom is formed by a sputtering method. After the formation of a regist 4 at a position which becomes the bottom of a thermal resistor using a photolithograph technique, the tantalum 3 and glass 2 are etched simultaneously with fluoric acid and the regist 4 is stripped off. Then they are heated to 480-550 deg.C in an oxygen atmosphere and consequently the tantalum 3 is oxidized to tantalum pentaoxide 5. A thermal resistor 6 of chromium silicon having a film thickness of 500-1,200Angstrom is formed, and then an electrode 7 of thin aluminium film having a thickness of 0.5-2mum is formed using a sputtering technique.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発FJAは、プリンタ、ファクシミリ記録部などに使
用されるサーマル・ヘッドの製作方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present FJA relates to a method of manufacturing a thermal head used in printers, facsimile recording units, etc.

〔従来の技術ノ サーマル・ヘッドにおいては、印画品質の向上と、低消
費電力化のために発熱抵抗体部を電極4部よりも凸状く
形成してサーマル・ヘッドと感熱記録紙の密着性を同上
させることが有効である。
[In conventional thermal heads, in order to improve printing quality and reduce power consumption, the heating resistor part is formed more convexly than the four electrode parts to improve the adhesion between the thermal head and the thermal recording paper. It is effective to do the same as above.

そこで、従来のサーマル・ヘッドにおいては、たとえば
特開昭59−11407d号公報に記載されているよう
に、金属酸化物の焼成体を主成分とする凸部を磁器基板
上に設け、その凸部上に発熱体を形成したものが提案さ
れている。
Therefore, in conventional thermal heads, as described in Japanese Patent Application Laid-Open No. 59-11407d, a convex portion mainly composed of a fired body of metal oxide is provided on a ceramic substrate, and the convex portion One in which a heating element is formed on the top has been proposed.

〔発明が解決しようとする問題点J しかるに前記提案の構成では、凸部の位置制御が困難な
ため、同一基板上に多数個のサーマル・ヘッドを作成す
る場合、凸部の中心と発熱抵抗体の中心とが一致しない
ことがある。
[Problem to be solved by the invention J] However, in the proposed configuration, it is difficult to control the position of the convex part, so when creating a large number of thermal heads on the same substrate, the center of the convex part and the heating resistor are difficult to control. The center of the image may not match.

たとえば第2図(、)に凸部中心と発熱抵抗体の中心と
が一致した状態を示し、第2図(b)に凸部中心に対し
て発熱抵抗体の中心が感熱記録紙の移動方向にずれた状
態を示す如く、セラミック基板1の表面に厚さ60μm
の球面状をしたガラス2が印刷焼成され、その外周面に
耐薬品層の二酸化タンタル5が形成され、さらに五酸化
タンタル5の表面忙発熱抵抗体6が電極部7とともに形
成されている。
For example, Figure 2 (,) shows a state in which the center of the protrusion and the center of the heating resistor are aligned, and Figure 2 (b) shows that the center of the heating resistor is aligned with the center of the protrusion in the direction of movement of the thermal recording paper. As shown in the deviated state, the surface of the ceramic substrate 1 is coated with a thickness of 60 μm.
A glass 2 having a spherical shape is printed and fired, a chemical-resistant layer of tantalum dioxide 5 is formed on its outer peripheral surface, and a heat-generating resistor 6 made of tantalum pentoxide 5 is formed together with an electrode portion 7.

このような構成をした感熱記録方式においては。In a thermal recording system having such a configuration.

発熱抵抗体6上をプラテンロー、F(図示せず)k押さ
れた感熱記録紙8が矢印Aの方向に移動したとき、これ
に同期して発熱抵抗体6I/cパルス電流を流すことに
より、記録面を形成する。
When the thermal recording paper 8 pressed by the platen row F (not shown) moves on the heating resistor 6 in the direction of the arrow A, by passing a pulse current I/c through the heating resistor 6 in synchronization with this, Form a recording surface.

しかるに前記第2図(a)および第2図(b) Kおけ
る夫々のサーマル・ヘッドの全ドツト印画時の消費電力
と感熱記録紙の黒化度との関係は、第3図(a)および
第3図(b) K示す如く、jfr2図(b)に示す(
凸部中心に対して発熱抵抗体の中心がずれてhる)場合
には、サーマル・ヘッドと感熱記録紙との密着性が悪化
して消費電力が大きくなる問題がるる。
However, the relationship between the power consumption when printing all dots of the respective thermal heads in FIGS. 2(a) and 2(b) and the degree of blackening of the thermal recording paper is as shown in FIGS. 3(a) and 2(b). Figure 3 (b) As shown in K, jfr2 as shown in Figure (b) (
If the center of the heating resistor deviates from the center of the convex portion (h), there is a problem that the adhesion between the thermal head and the thermal recording paper deteriorates and power consumption increases.

そこで前記の問題点を解決するため、従来は凸部の幅を
広げて凸部上面の面積を大きくする方法が実施されてい
る。
Therefore, in order to solve the above-mentioned problems, a method has conventionally been implemented in which the width of the convex portion is widened to increase the area of the upper surface of the convex portion.

しかるに前記の方法では、発熱抵抗体を凸部にすること
の本来の目的であるサーマル・ヘッドと感熱記録紙との
密着性が悪化する問題がある。
However, in the above method, there is a problem that the adhesion between the thermal head and the thermal recording paper, which is the original purpose of forming the heating resistor into a convex portion, deteriorates.

本発明の目的は前記従来の問題点を解決し、凸部の幅を
狭まくしてもその位置精度を向上し、これによって印画
品質の向上および低消費電力を可能とするサーマル・ヘ
ッドの製作方法を提供することにある。
An object of the present invention is to solve the above-mentioned conventional problems, and to manufacture a thermal head that improves the positional accuracy even if the width of the convex part is narrowed, thereby making it possible to improve printing quality and reduce power consumption. The purpose is to provide a method.

〔問題点を解決するための手段j 上記目的は、発熱抵抗体電極部のガラスをホト・エツチ
ングの手法炉よル凹部を形成し、これによって実質的に
発熱抵抗体部を凸状に形成することくより解決される。
[Means for Solving the Problems] The above purpose is to form a concave portion in the furnace wall by photo-etching the glass of the electrode portion of the heating resistor, thereby substantially forming the heating resistor portion in a convex shape. It will be resolved more easily.

〔作用) 従来の厚膜印刷技術に比較して位置精度の高^ホト・エ
ツチング技術を使用するととkよ〕、発熱抵抗体部の凸
状を高0n!1度に形成することができる。
[Function] Using photo-etching technology, which has higher positional accuracy than conventional thick-film printing technology, allows the convex shape of the heating resistor to be made to a height of 0n! It can be formed at one time.

〔実施例J 以下、本発明の一実施例を示すwc1図(a)〜(f)
によシ詳細に説明する。第1図(a)〜(f)は発熱抵
抗体部を凸状に形成する裂作手履を示す図である。
[Example J Hereinafter, wc1 diagrams (a) to (f) showing an example of the present invention
I will explain it in detail. FIGS. 1(a) to 1(f) are views showing a pair of sandals in which a heating resistor portion is formed in a convex shape.

第1図(a) IC示す如く、セラミック基板1の上面
全体に30〜80μmの均一な厚さで印刷焼成したガラ
ス2を形成する。
As shown in FIG. 1(a) IC, printed and fired glass 2 is formed on the entire upper surface of a ceramic substrate 1 to a uniform thickness of 30 to 80 μm.

ついで、第1図(b)に示す如く、上記ガラス2上にス
パッタリング法によル500〜1200Xの膜厚のタン
タル3を形成する。
Next, as shown in FIG. 1(b), tantalum 3 having a thickness of 500 to 1200× is formed on the glass 2 by sputtering.

ついで、第1図(0)に示す如く、ホト・リングラフの
手法によシ発熱抵抗体の下部となる位置くとシスト4を
形成し冬のち、第1図(d)に示す如くふっ酸を用すて
タンタル3およびガラス2を同時にエツチングする。
Next, as shown in Fig. 1 (0), cysts 4 are formed at the lower part of the heating resistor using the photo-phosphorographic method, and after winter, hydrofluoric acid is applied as shown in Fig. 1 (d). The used tantalum 3 and the glass 2 are etched at the same time.

ついで第1図(e)に示す如く、レジスト4を剥離し次
のち、酸素雰囲気中で480〜550’Cに加熱するこ
とにより、タンタル3が酸化して五酸化タンタル5に変
化する。
Next, as shown in FIG. 1(e), the resist 4 is peeled off and then heated to 480 to 550'C in an oxygen atmosphere, whereby the tantalum 3 is oxidized and transformed into tantalum pentoxide 5.

ついで第1図(f’)に示す如く、スパッタリング法に
よシフロム・シリコンからなる膜厚5oo〜1200X
の発熱抵抗体6を形成したのち、スパッタリング法また
は蒸着法によシアルミニウムからなる膜厚0.5〜2μ
mの電極部7を形成することによって発熱抵抗体部が完
成する。
Next, as shown in FIG. 1(f'), a film made of Sifrom silicon with a thickness of 500 to 1200× is formed by sputtering.
After forming the heating resistor 6 of
The heating resistor section is completed by forming the electrode section 7 of m.

なお、一般に薄層型サーマル・ヘッドにおいては、ガラ
ス2からの汚染防止のため、五酸化タンタル5を発熱抵
抗体6の下部に形成する。そのため本実施例においては
ホト−エツチング工程のみが作業増加になる。
In general, in a thin-layer thermal head, tantalum pentoxide 5 is formed below the heating resistor 6 to prevent contamination from the glass 2. Therefore, in this embodiment, only the photo-etching step requires an additional work.

ガラス2をエツチングして凹部を形成する方法としては
、上記実施例以外にガラス2上に直接レジストを形成す
る方法が考えられる。
As a method of etching the glass 2 to form the recessed portions, a method other than the above-mentioned embodiment may be considered, in which a resist is directly formed on the glass 2.

しかるに上記の方法では、レジストの露光時に紫外線が
セラミック面で散乱し、この散乱によるレジストの感光
があるため、実用的ではない。
However, the above method is not practical because the ultraviolet rays are scattered by the ceramic surface during exposure of the resist, and the resist is exposed to light due to this scattering.

また、本実施例においては、第1図(d) K示す如く
、ガラス2のエツチングをガラス2の膜厚の2分の1程
度で打ち切っている。
Further, in this embodiment, as shown in FIG. 1(d) K, the etching of the glass 2 is stopped at about half the film thickness of the glass 2.

この理由はガラス2の膜厚までエツチングすると、表面
の荒れたセラミック面に配線を形成することKなって配
線不良が増加するためである。
The reason for this is that if the film is etched to the thickness of the glass 2, wiring will be formed on a ceramic surface with a rough surface, resulting in an increase in wiring defects.

従来の厚膜印刷技術でも第1図(d) K示すガラス2
0層と類似なものを炸裂することが可能であるが、厚膜
印刷技術では2回以上の印刷焼成が必要くなるため、作
業時間が増加する。
Even with conventional thick film printing technology, the glass 2 shown in Fig. 1(d)
Although it is possible to explode something similar to the zero layer, thick film printing techniques require two or more printing bakes, which increases the working time.

〔発明の効果j 以上述べたる如く、本発明によれば、発熱抵抗体部の凸
部の位置を高精度に形成することができるので、狭い幅
の凸部にすることが可能となシ、これKよって印画品質
を向上し、低消費電力のサーマル・ヘッドを形成するこ
とができる効果がある。
[Effects of the Invention j As described above, according to the present invention, the position of the convex portion of the heating resistor portion can be formed with high precision, so that the convex portion can be formed with a narrow width. This has the effect of improving printing quality and making it possible to form a thermal head with low power consumption.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(Jk)〜(f)は本発明の一実施例を示すサー
マル・ヘッドの凸状の発熱抵抗体の製作手順を示す図、
第2図<a>は従来のサーマル・ヘッドにおける凸部中
心と発熱抵抗体の中心とが一致してhる状態を示す断面
図、第2図(b)は従来のサーマル・ヘッドにおける凸
部中心に対して発熱抵抗体の中心がずれている状態を示
す断面図、第5図(atは前記第2図(aXb) K示
す従来のサーマル・ヘッドの全ドツト印画時の消費電力
と感熱記録紙の黒化度との関係を示す図である。 1・・・セラミック基板、2・・・ガラス、3・・・タ
ンタル、4・・・レジスト、5・・・五酸化タンタル、
6・・・発熱抵抗体、7・・・電極部、8用窓熱記録部
。 fi:j!I八fへ埋± 41ノ11勝男゛−尾 1 
口 A 2図 (α) 1 tラミ1.フ纂津反 (b)              2  n”う入3
 ヲ〉ヲル 見 3 口 5角 費電力 手続補正書(1式) %式% 発明の名称 サーマル−ヘッドの製作方法補正をする者 鰭との関係 特許出願人 名 *   (51G)株式会社 日 立 製 作 所
代  理  人 補正の対象 明細書の図面の簡単な説明の欄 補正の内容
Figures 1 (Jk) to (f) are diagrams showing the manufacturing procedure of a convex heating resistor of a thermal head showing an embodiment of the present invention;
Figure 2 <a> is a cross-sectional view showing the state in which the center of the convex part in a conventional thermal head and the center of the heating resistor coincide with h, and Figure 2 (b) is a cross-sectional view of the convex part in a conventional thermal head. FIG. 5 is a cross-sectional view showing a state in which the center of the heat generating resistor is shifted from the center (at is shown in FIG. It is a diagram showing the relationship with the degree of blackening of paper. 1... Ceramic substrate, 2... Glass, 3... Tantalum, 4... Resist, 5... Tantalum pentoxide,
6... Heating resistor, 7... Electrode section, Window heat recording section for 8. fi:j! Buried in I8F 41-11 Katsuo 1
Mouth A 2 figure (α) 1 t lami 1. Futsutan (b) 2 n” Uiri 3
〲〉〉〇〲〇〉〉〉〉〉〉〉〉〇〉〉〉〉〉〉〉〉〉〉〉〉〉〉〉〉 Title of invention〉Relationship with fin of thermal head manufacturing method〉Name of patent applicant * (51G) Manufactured by Hitachi, Ltd. Agent Contents of amendment in the brief explanation of drawings in the specification subject to personal amendment

Claims (1)

【特許請求の範囲】 1、ガラス層を表面に形成するセラミック基板上に多数
個の発熱抵抗体を形成し、これらの発熱抵抗体の電極と
なる部分の前記ガラス層をエッチックにより凹部を形成
することを特徴とするサーマル・ヘッドの製作方法。 2、前記凹部を下記製作手順により形成することを特徴
とする特許請求の範囲第1項記載のサーマル・ヘッドの
製作方法。 イ、ガラス上にタンクル層を形成する。 ロ、発熱抵抗体の下部となる部分にレジストを付着し、
電極となる部分にレジストを付けない。 ハ、上記タンタル層をエッチングしたのち、同一のエッ
チング液でガラス層をエッチングする。 ニ、レジストを剥離する。 ホ、タンタル層を酸化して五酸化タンタル層にする。
[Claims] 1. A large number of heating resistors are formed on a ceramic substrate on which a glass layer is formed, and recesses are formed by etching the glass layer in the portions that will become electrodes of these heating resistors. A method of manufacturing a thermal head characterized by the following. 2. The method of manufacturing a thermal head according to claim 1, wherein the recess is formed by the following manufacturing procedure. B. Form a tankle layer on the glass. B. Attach resist to the lower part of the heating resistor,
Do not apply resist to the part that will become the electrode. C. After etching the tantalum layer, the glass layer is etched using the same etching solution. D. Peel off the resist. E. Oxidize the tantalum layer to form a tantalum pentoxide layer.
JP4614886A 1986-03-05 1986-03-05 Manufacture of thermal head Pending JPS6322665A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4614886A JPS6322665A (en) 1986-03-05 1986-03-05 Manufacture of thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4614886A JPS6322665A (en) 1986-03-05 1986-03-05 Manufacture of thermal head

Publications (1)

Publication Number Publication Date
JPS6322665A true JPS6322665A (en) 1988-01-30

Family

ID=12738886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4614886A Pending JPS6322665A (en) 1986-03-05 1986-03-05 Manufacture of thermal head

Country Status (1)

Country Link
JP (1) JPS6322665A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6964724B2 (en) 1999-03-15 2005-11-15 Nec Corporation Etching and cleaning methods and etching and cleaning apparatuses used therefor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6964724B2 (en) 1999-03-15 2005-11-15 Nec Corporation Etching and cleaning methods and etching and cleaning apparatuses used therefor
US7862658B2 (en) 1999-03-15 2011-01-04 Renesas Electronics Corporation Etching and cleaning methods and etching and cleaning apparatuses used therefor
US8420549B2 (en) 1999-03-15 2013-04-16 Renesas Electronics Corporation Etching and cleaning methods and etching and cleaning apparatuses used therefor

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