JPH01115604A - Device of cutting wafer - Google Patents
Device of cutting waferInfo
- Publication number
- JPH01115604A JPH01115604A JP62274537A JP27453787A JPH01115604A JP H01115604 A JPH01115604 A JP H01115604A JP 62274537 A JP62274537 A JP 62274537A JP 27453787 A JP27453787 A JP 27453787A JP H01115604 A JPH01115604 A JP H01115604A
- Authority
- JP
- Japan
- Prior art keywords
- grindstone
- ingot
- hone
- rotating body
- shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/003—Multipurpose machines; Equipment therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/028—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a ring blade having an inside cutting edge
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mining & Mineral Resources (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体等のウェハの切断装置に係り、特に柱状
体の材料を薄片状に切断してウェハを切断するウェハの
切断装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a cutting device for cutting wafers such as semiconductors, and more particularly to a cutting device for cutting wafers by cutting columnar material into thin pieces.
従来、半導体等の柱状体材料(シリコンインゴット等)
を薄片状に切断し、ウェハを切断する装置として、−船
釣に、スライシングマシンが使用されている。Conventionally, columnar materials such as semiconductors (silicon ingots, etc.)
A slicing machine is used for boat fishing as a device for cutting wafers into thin pieces.
ところで、このスライシングマシンは、インゴットを切
断する内周刃の摩耗、目詰まり等により、内周刃が受け
る切断抵抗を一定に維持できない。However, in this slicing machine, the cutting resistance applied to the inner peripheral blade cannot be maintained constant due to wear, clogging, etc. of the inner peripheral blade that cuts the ingot.
このような場合、第6図に示すように、内周刃100は
、切断方向に対して不規則に移動し、ウェハ102の切
断面に、反り、ソーマーク(凹凸)104等が形成され
る。In such a case, as shown in FIG. 6, the inner peripheral blade 100 moves irregularly with respect to the cutting direction, and warps, saw marks (unevenness) 104, etc. are formed on the cut surface of the wafer 102.
一方、半導体材料は大径化の傾向があり、大径化が進む
程インゴットを切断してウェハを製造する際、ウェハに
大きな反り等が発生し、この反りを修正するためにラッ
ピング等余分な後工程が必要であった。On the other hand, there is a tendency for semiconductor materials to become larger in diameter, and as the diameter increases, large warps occur on the wafers when cutting ingots to produce wafers. Post-processing was necessary.
そこで、特開昭61−106207号公報において、ウ
ェハの反り等を容易に除去する方法が開示されている。Therefore, Japanese Unexamined Patent Publication No. 106207/1983 discloses a method for easily removing warpage from a wafer.
この方法は、内周刃に近接してカップ型砥石を配置し、
ウェハを切断後、インゴット切断面を平面研削し、ウェ
ハの切断された面の平面度を高精度に仕上げるものであ
る。これにより、反り等のないウェハを容易に提供する
ことが可能である。This method places a cup-shaped grindstone close to the inner peripheral blade,
After cutting the wafer, the cut surface of the ingot is ground to a high degree of precision. Thereby, it is possible to easily provide a wafer without warping or the like.
しかしながら、前記公報のウェハ切断方法ではスライシ
ングの限られたスペースに内周刃と砥石とを配置する具
体的な構成は開示されておらず、内周刃と砥石とを効率
よ(配置したウェハの切断装置の開発が望まれていた。However, the wafer cutting method of the above-mentioned publication does not disclose a specific configuration for arranging the inner peripheral blade and the grinding wheel in the limited space for slicing. The development of a cutting device was desired.
本発明はこのような事情に鑑みてなされたもので、砥石
と内周刃とを効率よく配置したウェハの切断装置を提供
することを目的としている。The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a wafer cutting device in which a grindstone and an inner peripheral blade are efficiently arranged.
C問題点を解決するための手段〕
本発明は、前記目的を達成するために、回転体と、回転
体に取付けられ柱状体材料を薄片状に切断する内周刃と
、先端に砥石が取り付けられ、回転体内部に同軸上に配
置され回転体と一体的に回転すると共に軸線方向に移動
して砥石を内周刃に対して進退させる砥石軸と、砥石軸
を軸線方向へ移動させる送り装置と、を有することを特
徴とする。Means for Solving Problem C] In order to achieve the above object, the present invention comprises a rotating body, an inner circumferential blade attached to the rotating body for cutting the columnar material into thin pieces, and a grindstone attached to the tip. A grinding wheel shaft that is arranged coaxially inside the rotating body and rotates integrally with the rotating body and moves in the axial direction to move the grinding wheel forward and backward relative to the inner peripheral blade, and a feeding device that moves the grinding wheel shaft in the axial direction. It is characterized by having the following.
本発明のウェハの切断装置によれば、内周刃が回転する
と同時に、砥石軸が回転体と一体的に回転し、砥石軸上
端に取り付けられている砥石が回転する。次に、送り装
置を作動させて砥石を研削位置まで移動する。次いで、
砥石でインゴット端面を研削し、内周刃でインゴットを
薄片状に切断する。According to the wafer cutting device of the present invention, at the same time as the inner peripheral blade rotates, the grindstone shaft rotates integrally with the rotating body, and the grindstone attached to the upper end of the grindstone shaft rotates. Next, the feeder is activated to move the grindstone to the grinding position. Then,
The end face of the ingot is ground with a grindstone, and the ingot is cut into thin pieces with an inner peripheral blade.
このように、回転体の内部に同軸上に砥石軸を進退移動
可能に配置し、この砥石軸を進退させてインゴット切断
面を研磨するようにしたので、コンパクトなウェハの切
断装置に構成することができる。また、ラッピング工程
を省略でき、作業効率を向上させることができる。In this way, the grindstone shaft is arranged coaxially inside the rotating body so that it can move forward and backward, and the cut surface of the ingot is polished by moving the grindstone shaft back and forth, so that a compact wafer cutting device can be constructed. Can be done. Moreover, the wrapping process can be omitted, and work efficiency can be improved.
以下添付図面に従って本発明に係るウェハの切断装置の
好ましい実施例を詳説する。Preferred embodiments of the wafer cutting apparatus according to the present invention will be described in detail below with reference to the accompanying drawings.
第1図は、本発明に係るウェハの切断装置の全体斜視図
で、このウェハの切断装置10の本体12の上面には、
内周刃14が配置され、この内周刃14内には第2図に
示すカップ型の砥石】6が同軸上に回転自在に取り付け
られている。さらに、この砥石16の下方には内周刃1
4およびカップ型砥石16を回転させる回転機構18(
第2図で図示)が取り付けられている。FIG. 1 is an overall perspective view of a wafer cutting apparatus according to the present invention.
An inner peripheral blade 14 is disposed, and a cup-shaped grindstone 6 shown in FIG. 2 is coaxially and rotatably mounted within the internal peripheral blade 14. Furthermore, an inner peripheral blade 1 is provided below this grindstone 16.
4 and a rotating mechanism 18 (
(shown in Figure 2) is attached.
また、本体12には本体12の側面から内周刃14の略
中央部まで伸びているウェハ回収装置22が取り付けら
れている。さらに、ウェハ回収装置22の先端の吸着パ
ッド22Aに臨んでウェハの搬送装置24、および搬送
されたウエノ\を収納する収納ケース26が取り付けら
れている。Further, a wafer recovery device 22 is attached to the main body 12 and extends from the side surface of the main body 12 to approximately the center of the inner peripheral blade 14. Furthermore, facing the suction pad 22A at the tip of the wafer recovery device 22, a wafer transfer device 24 and a storage case 26 for storing the transferred wafers are attached.
また、本体12の上面には、切断送りテーブル28が第
1図に示す矢印AXB方向に摺動自在に支持され、図示
しない駆動源により往復動される。Further, a cutting feed table 28 is supported on the upper surface of the main body 12 so as to be slidable in the direction of arrow AXB shown in FIG. 1, and is reciprocated by a drive source (not shown).
また、切断送りテーブル2′8の左端部に支柱30が立
設されている。支柱3Gの正面には割出スライダ32が
、支柱30の長手方向、即ち上下方向に移動自在に支持
されている。割出スライダ32は、支柱30の長手方向
に取付けられている図示しない送りねじと螺合し、この
送りねじを回転することにより上下方向に移動すること
ができる。Further, a support 30 is provided upright at the left end of the cutting feed table 2'8. An index slider 32 is supported in front of the support column 3G so as to be movable in the longitudinal direction of the support column 30, that is, in the vertical direction. The index slider 32 is threadedly engaged with a feed screw (not shown) attached in the longitudinal direction of the support column 30, and can be moved in the vertical direction by rotating the feed screw.
また、割出スライダ32は、スライスベース36が固着
されたインゴット34を支持巳ている。これにより、イ
ンゴット34は、矢印A、B方向(切断方向)および上
下方向(インゴット切断厚さ調整方向)に移動すること
ができる。Further, the index slider 32 supports an ingot 34 to which a slice base 36 is fixed. Thereby, the ingot 34 can be moved in the directions of arrows A and B (cutting direction) and in the vertical direction (ingot cutting thickness adjustment direction).
第2図は内周刃14及び砥石160回転機構18を示す
断面図である。第2図に示すように、円筒状回転体38
が、本体12の一部である基台部40に、ベアリング4
2.42を介して回転自在に取り付けられている。回転
体38の上端部に、チャックボディ48が取り付けられ
ている。チャックボディ48には、内周面に内周刃14
を形成するドーナツ状のブレード52が一定の張力をイ
」与した状態で固着されている。また、回転体38の下
端部にはプーリ54が取り付けられ、ベルト56が、プ
ーリ54とモータ58のプーリ60との間に張設されて
いる。FIG. 2 is a sectional view showing the inner peripheral blade 14 and the grindstone 160 rotation mechanism 18. As shown in FIG. 2, the cylindrical rotating body 38
However, the bearing 4 is attached to the base portion 40 which is a part of the main body 12.
It is rotatably attached via 2.42. A chuck body 48 is attached to the upper end of the rotating body 38. The chuck body 48 has an inner peripheral cutter 14 on the inner peripheral surface.
A donut-shaped blade 52 forming a ring is fixed under a constant tension. Further, a pulley 54 is attached to the lower end of the rotating body 38, and a belt 56 is stretched between the pulley 54 and a pulley 60 of the motor 58.
砥石軸62が回転体38の孔38Aに同軸上に挿通され
、砥石軸62はスプライン結合44を介して軸方向にの
み移動自在に連結されている。砥石軸62の上端部には
カップ型砥石16が取り付けられている。砥石16は周
縁に突出した研削部64を有し、この研削部64は、同
一平面上になるように形成されている。これにより、砥
石16はスプライン結合44を介して内周刃14と一体
的に回転することができると共に軸方向へ押圧力を受け
ると移動する。また、砥石軸62の下端部には、軸方向
への押圧力を受ける接続板65が取り付けられている。The grindstone shaft 62 is coaxially inserted into the hole 38A of the rotating body 38, and is connected via the spline connection 44 so as to be movable only in the axial direction. A cup-shaped grindstone 16 is attached to the upper end of the grindstone shaft 62. The grinding wheel 16 has a protruding grinding portion 64 on its periphery, and the grinding portion 64 is formed on the same plane. Thereby, the grindstone 16 can rotate integrally with the inner peripheral blade 14 via the spline connection 44, and also moves when receiving a pressing force in the axial direction. Furthermore, a connecting plate 65 is attached to the lower end of the grindstone shaft 62 to receive a pressing force in the axial direction.
接続板65は、スラストベアリング66を介してジヨイ
ントケーシング68内に配置されている。一方、送り軸
70が、砥石軸62と同軸上にケーシング68の下端面
に取り付けられている。送り軸70は、ベアリング72
を介して回転する送りギア74の内部と軸線方向に移動
可能に螺合されている。送りギア74は、モータ76の
出力軸に取り付けた駆動ギア78によって回転される。The connecting plate 65 is disposed within the joint casing 68 via a thrust bearing 66. On the other hand, a feed shaft 70 is attached to the lower end surface of the casing 68 coaxially with the grindstone shaft 62. The feed shaft 70 has a bearing 72
The feed gear 74 is screwed to be movable in the axial direction with the inside of the rotating feed gear 74 via the feed gear 74 . The feed gear 74 is rotated by a drive gear 78 attached to the output shaft of a motor 76.
前記の如く構成された本発明に係るウェハの切断装置の
作用を説明する。The operation of the wafer cutting apparatus according to the present invention configured as described above will be explained.
第2図に示す駆動モータ58を回転すると、ベルト56
を介して回転体38が回転し、回転体38にスプライン
結合している砥石軸62も一体的に回転する。次に、イ
ンゴット34を下降させ、次いでモータ76を回転し、
駆動ギア78および送りギア74を介して送り軸70を
軸方向上方へ移動する。この移動により、ケーシング6
8は、上方へ移動し、砥石軸62を軸方向上方に移動さ
せる。送り軸70は、砥石16を研削位置まで移動し、
停止する。次に、第3図に示すように、インゴット34
を六方向へ移動すると、インゴット34の端面は、先ず
砥石16の研削部64により研削され、砥石16の研削
に若干に遅れて内周刃14がインゴット34を切断する
。この場合に、研削より先に切断すると、研削時に切断
中のウェハに無理な応力がかかり、折損等の虞があるの
で研削を先にした方が望ましい。When the drive motor 58 shown in FIG. 2 is rotated, the belt 56
The rotating body 38 rotates through the rotating body 38, and the grindstone shaft 62 spline-coupled to the rotating body 38 also rotates integrally with the rotating body 38. Next, the ingot 34 is lowered, and then the motor 76 is rotated,
The feed shaft 70 is moved axially upward via the drive gear 78 and the feed gear 74. This movement causes the casing 6
8 moves upward to move the grindstone shaft 62 upward in the axial direction. The feed shaft 70 moves the grindstone 16 to the grinding position,
Stop. Next, as shown in FIG.
When the ingot 34 is moved in six directions, the end face of the ingot 34 is first ground by the grinding portion 64 of the grindstone 16, and the inner peripheral blade 14 cuts the ingot 34 with a slight delay in the grinding of the grindstone 16. In this case, if the wafer is cut before the grinding, unreasonable stress will be applied to the wafer being cut during the grinding, and there is a risk of breakage, etc., so it is preferable to perform the grinding first.
切断終了後、テーブル28をB方向に移動して元の位置
に復帰させ、一方モータ76の逆回転により送り軸70
は、下方向へ移動する。これにより、砥石軸62が送り
軸70に従って下方向へ移動し、砥石16の下面がスト
ッパ50に当接し、砥石軸62が移動を停止する。以下
のこの動作を繰返してインゴット34を順次切断する。After cutting, the table 28 is moved in the direction B and returned to its original position, while the feed shaft 70 is rotated in the reverse direction by the motor 76.
moves downward. As a result, the grindstone shaft 62 moves downward according to the feed shaft 70, the lower surface of the grindstone 16 contacts the stopper 50, and the grindstone shaft 62 stops moving. This operation described below is repeated to sequentially cut the ingot 34.
このように、内周刃14と砥石16とを同一軸線上に配
置することにより、コンパクトなウェハの切断装置とす
ることができると共に作業効率を向上することができる
。また、機構を簡単にすることもできる。By arranging the inner circumferential blade 14 and the grindstone 16 on the same axis in this manner, it is possible to provide a compact wafer cutting device and to improve work efficiency. Moreover, the mechanism can also be simplified.
前記実施例では、インゴット34側の切断送りテーブル
28を移動して、インゴット34の切断を行ったが、こ
れに限らず、インゴット34は移動させないで内周刃1
4側を移動してインゴット34を切断してもよい。In the embodiment described above, the cutting feed table 28 on the ingot 34 side was moved to cut the ingot 34, but the present invention is not limited to this.
The ingot 34 may be cut by moving the four sides.
また、前記実施例では、インゴット34を研削しながら
同時にインゴット34を切断したが、これに限らず、第
4図の(a)に示すように、先ずインゴット34を薄片
状に切断し、次に第4図ら)で示すように切断面の研削
を行い、これを交互に繰返してもよい。Further, in the above embodiment, the ingot 34 was cut at the same time as it was ground, but the invention is not limited to this. As shown in FIG. 4(a), the ingot 34 is first cut into thin pieces, and then the The cut surface may be ground as shown in FIG. 4 et al., and this may be repeated alternately.
さらに、前記実施例では、砥石16と内周刃14とは1
個のモータ58により回転させたが、これに限らず、第
5図に示すように砥石16および内周刃14をそれぞれ
独自のモータ84.86で回転してもよい。Furthermore, in the embodiment, the grindstone 16 and the inner peripheral blade 14 are one
Although the grindstone 16 and the inner circumferential blade 14 are rotated by separate motors 58, the present invention is not limited thereto, and the grindstone 16 and the inner peripheral blade 14 may be rotated by their own motors 84 and 86, respectively, as shown in FIG.
以下第5図において、内周刃14及び砥石16をモータ
84.86で駆動する場合について説明する。尚、前記
第1実施例と同一部材についての説明は省略する。基台
部40にスラストおよびラジアル方向の荷重を受けるベ
アリング42.42を介して第1の回転体88が、回転
自在に取り付けられている。第1の回転体88の先端に
、チャックボディ48が取り付けられている。また、第
1の回転体88にベアリング90.90を介して第2の
回転体92が回転自在に取り付けられている。Referring to FIG. 5 below, a case will be described in which the inner peripheral blade 14 and the grindstone 16 are driven by motors 84 and 86. Note that explanations of the same members as in the first embodiment will be omitted. A first rotating body 88 is rotatably attached to the base portion 40 via bearings 42, 42 that receive loads in the thrust and radial directions. A chuck body 48 is attached to the tip of the first rotating body 88. Further, a second rotary body 92 is rotatably attached to the first rotary body 88 via bearings 90 and 90.
前記の如く構成された第2実施例に於いて、第1の回転
体88は、第1のモータ84の回転によりベルト94を
介して回転し、第2の回転体92は、第2のモータ86
の回転によりベルト96を介して回転する。また、砥石
16が取り付けられている砥石軸62は、前記実施例と
同様に第2の回転体92と同一回転する。このような構
成にすれば、砥石16と内周刃14との回転数をそれぞ
れ自由に選択することができる。In the second embodiment configured as described above, the first rotating body 88 is rotated via the belt 94 by the rotation of the first motor 84, and the second rotating body 92 is rotated by the rotation of the second motor 84. 86
Rotates via the belt 96 due to the rotation of. Further, the grindstone shaft 62 to which the grindstone 16 is attached rotates at the same time as the second rotating body 92, as in the embodiment described above. With such a configuration, the rotation speeds of the grindstone 16 and the inner peripheral blade 14 can be freely selected.
前記実施例では、砥石軸62は回転体38とスプライン
結合しているが、これに限らず、キーにより回転体38
と結合してもよい。In the embodiment described above, the grinding wheel shaft 62 is spline-coupled to the rotating body 38, but the invention is not limited to this, and the rotating body 38 can be connected by a key.
May be combined with
以上説明したように本発明に係るウェハの切断装置によ
れば、砥石を有する砥石軸が内周刃の回転体内部に同軸
線上に移動自在に取り付けられ、柱状体材料に対して砥
石が進退移動するので、コンパクトなウェハの切断装置
を提供することができる。As explained above, according to the wafer cutting apparatus according to the present invention, the grindstone shaft having the grindstone is attached to the inside of the rotating body of the inner peripheral blade so as to be movable coaxially, and the grindstone moves forward and backward with respect to the columnar material. Therefore, a compact wafer cutting device can be provided.
【図面の簡単な説明】
第1図は本発明に係るウェハの切断装置の全体斜視図、
第2図は本発明に係るウェハの切断装置の断面図、第3
図は本発明に係るウェハの切断装置によるインゴットの
研削右よび切断状態を示す図、第4図の(a)、(b)
は本発明に係るウェハの切断装置によるインゴットの他
の実施例の研削および切断状態を示す図、第5図は本発
明に係る他の実施例のウェハの切断装置の断面図、第6
図は従来のスライシングマシンによるインゴットの切断
状態を示す正面図である。
10・・・ウェハの切断装置、 14・・・内周刃、
16・・・カップ型砥石、 34・・・インゴット、
62・・・砥石軸、 70・・・送り軸。[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is an overall perspective view of a wafer cutting device according to the present invention;
FIG. 2 is a sectional view of the wafer cutting device according to the present invention, and FIG.
The figure shows the grinding and cutting state of an ingot by the wafer cutting device according to the present invention, and (a) and (b) in Fig. 4.
FIG. 5 is a cross-sectional view of another embodiment of the wafer cutting device according to the present invention; FIG.
The figure is a front view showing how an ingot is cut by a conventional slicing machine. 10... Wafer cutting device, 14... Inner peripheral blade,
16...Cup-shaped whetstone, 34...Ingot,
62... Grinding wheel shaft, 70... Feed shaft.
Claims (4)
刃と、 先端に砥石が取り付けられ、回転体内部に同軸上に配置
され回転体と一体的に回転すると共に軸線方向に移動し
て砥石を内周刃に対して進退させる砥石軸と、 砥石軸を軸線方向へ移動させる送り装置と、を有するこ
とを特徴とするウェハ切断装置。(1) A rotating body, an inner peripheral blade that is attached to the rotating body and cuts the columnar material into thin pieces, and a grindstone is attached to the tip, which is placed coaxially inside the rotating body and rotates integrally with the rotating body. A wafer cutting device comprising: a grindstone shaft that moves in the axial direction to move the grindstone forward and backward with respect to the inner peripheral blade; and a feed device that moves the grindstone shaft in the axial direction.
砥石とを一体的に回転することを特徴とする特許請求の
範囲第1項に記載のウェハの切断装置。(2) The wafer cutting apparatus according to claim 1, wherein the rotating body and the grindstone are spline-coupled so that the rotating body and the grindstone rotate integrally.
転自在に取付け、砥石軸と回転体とを独自の回転駆動源
に連結したことを特徴とする特許請求の範囲第1項に記
載のウェハの切断装置。(3) A grindstone shaft with a grindstone attached to the tip thereof is rotatably mounted inside a rotating body, and the grindstone shaft and the rotating body are connected to a unique rotational drive source. The wafer cutting device described.
を特徴とする特許請求の範囲第1項に記載のウェハの切
断装置。(4) The wafer cutting device according to claim 1, wherein the inner peripheral blade moves to cut the columnar material.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62274537A JPH01115604A (en) | 1987-10-29 | 1987-10-29 | Device of cutting wafer |
US07/150,376 US4852304A (en) | 1987-10-29 | 1988-01-29 | Apparatus and method for slicing a wafer |
EP19920119722 EP0534499A3 (en) | 1987-10-29 | 1988-01-29 | Method for slicing a wafer |
DE88101301T DE3884903T2 (en) | 1987-10-29 | 1988-01-29 | Device and method for cutting a semiconductor wafer. |
EP88101301A EP0313714B1 (en) | 1987-10-29 | 1988-01-29 | Apparatus and method for slicing a wafer |
KR1019880001384A KR930001284B1 (en) | 1987-10-29 | 1988-02-13 | Apparatus and method for slicing a wafer |
US07/344,956 US4894956A (en) | 1987-10-29 | 1989-04-28 | Apparatus and method for slicing a wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62274537A JPH01115604A (en) | 1987-10-29 | 1987-10-29 | Device of cutting wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01115604A true JPH01115604A (en) | 1989-05-08 |
JPH0471688B2 JPH0471688B2 (en) | 1992-11-16 |
Family
ID=17543090
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62274537A Granted JPH01115604A (en) | 1987-10-29 | 1987-10-29 | Device of cutting wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01115604A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0393509A (en) * | 1989-09-07 | 1991-04-18 | Tokyo Seimitsu Co Ltd | Cutting method of slicing machine |
EP0750972A1 (en) * | 1995-06-30 | 1997-01-02 | Tokyo Seimitsu Co.,Ltd. | Ingot slicing machine with built-in grinder |
CN116117619A (en) * | 2022-12-30 | 2023-05-16 | 江苏福旭科技有限公司 | Solar-grade monocrystalline silicon piece surface treatment equipment |
-
1987
- 1987-10-29 JP JP62274537A patent/JPH01115604A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0393509A (en) * | 1989-09-07 | 1991-04-18 | Tokyo Seimitsu Co Ltd | Cutting method of slicing machine |
EP0750972A1 (en) * | 1995-06-30 | 1997-01-02 | Tokyo Seimitsu Co.,Ltd. | Ingot slicing machine with built-in grinder |
US5836808A (en) * | 1995-06-30 | 1998-11-17 | Tokyo Seimitsu Co., Ltd. | Slicing machine with built-in grinder |
CN116117619A (en) * | 2022-12-30 | 2023-05-16 | 江苏福旭科技有限公司 | Solar-grade monocrystalline silicon piece surface treatment equipment |
CN116117619B (en) * | 2022-12-30 | 2023-10-13 | 江苏福旭科技有限公司 | Solar-grade monocrystalline silicon piece surface treatment equipment |
Also Published As
Publication number | Publication date |
---|---|
JPH0471688B2 (en) | 1992-11-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR930001284B1 (en) | Apparatus and method for slicing a wafer | |
JPH1190801A (en) | Double-face machining method and device for wafer | |
JP2921250B2 (en) | Mirror polishing method and apparatus for wafer chamfer | |
JPH01115604A (en) | Device of cutting wafer | |
JP2737783B2 (en) | Wafer cutting equipment | |
JPH01153259A (en) | Method and device for manufacturing circular article with at least one flat surface | |
US3025738A (en) | Cutting apparatus | |
KR102047717B1 (en) | Dressing mechanism of blade, cutting device provided with the mechanism, and dressing method of blade using the mechanism | |
JP2000229319A (en) | Coring machine | |
JP2001062686A (en) | Index type edge polisher | |
JP2002001637A (en) | Grinding device for linear part of outer periphery of wafer | |
JP2613081B2 (en) | Mirror polishing method for wafer periphery | |
JPH0788750A (en) | Cage window grinder | |
JPH1133887A (en) | Method for grinding semiconductor wafer and its device | |
JPH01115603A (en) | Method of cutting wafer | |
JP3088251B2 (en) | Groove processing machine for inner peripheral surface of carrier hole of lap carrier | |
JPH0919857A (en) | Chamfering method and device for wafer cut-out by slicing device and grinding wheel for chamfering | |
JPH0536621Y2 (en) | ||
JPS59187432A (en) | Turn table | |
JPH07329051A (en) | Cutter using free abrasive grain | |
JPS629859A (en) | Grinding and polishing method of ball | |
JPH0479786B2 (en) | ||
JPS62193766A (en) | Automatic polishing device for steel wire surface | |
JPS58212138A (en) | slicing equipment | |
JPS6353929B2 (en) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |