JP7337027B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP7337027B2 JP7337027B2 JP2020088190A JP2020088190A JP7337027B2 JP 7337027 B2 JP7337027 B2 JP 7337027B2 JP 2020088190 A JP2020088190 A JP 2020088190A JP 2020088190 A JP2020088190 A JP 2020088190A JP 7337027 B2 JP7337027 B2 JP 7337027B2
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- 239000004065 semiconductor Substances 0.000 title claims description 66
- 239000000758 substrate Substances 0.000 description 11
- 238000005452 bending Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 5
- 238000003780 insertion Methods 0.000 description 4
- 230000037431 insertion Effects 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000002457 bidirectional effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
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Description
実施の形態1について、図面を用いて以下に説明する。図1は、実施の形態1に係る半導体装置100の断面図である。図2は、図1のA-A線断面図である。図3は、制御端子4周辺の拡大断面図である。
次に、実施の形態2に係る半導体装置100について説明する。図6は、実施の形態2において制御端子4と支持部14の斜視図である。図7は、実施の形態2において制御端子4が溝14aに収容された状態を示す斜視図である。図8は、実施の形態2の変形例において制御端子4が溝14aに収容された状態を示す斜視図である。図6~図8において双方向の矢印YはY軸方向を示す。なお、実施の形態2において、実施の形態1で説明したものと同一の構成要素については同一符号を付して説明は省略する。
次に、実施の形態3に係る半導体装置100について説明する。図9は、実施の形態3において支持部14がケース1の側面部から取り外された状態を示す断面図である。なお、実施の形態3において、実施の形態1,2で説明したものと同一の構成要素については同一符号を付して説明は省略する。
次に、実施の形態4に係る半導体装置100Aについて説明する。図10は、実施の形態4に係る半導体装置100Aの断面図である。なお、実施の形態4において、実施の形態1~3で説明したものと同一の構成要素については同一符号を付して説明は省略する。
Claims (4)
- 開口を有するケースと、
前記ケースに内蔵された半導体素子と、
前記ケース内における前記半導体素子の上方に配置され、前記半導体素子を制御する制御回路が配置された制御基板と、
前記ケースの前記開口を覆う蓋と、
一端部が前記制御基板に配置された前記制御回路に接続され、かつ、他端部が前記ケースの外部に突出する制御端子と、を備え、
前記制御端子は、前記ケース内において屈曲する屈曲部を有し、
前記ケースの側面部に、前記屈曲部を支持可能な支持部が設けられ、
前記制御端子は、前記制御回路から上方に延びる第1の部分と、前記第1の部分における前記制御回路とは反対側の端部から横方向に延びる第2の部分と、前記第2の部分における前記第1の部分とは反対側の端部から上方に延びかつ前記蓋に形成された穴部から突出する第3の部分とを有し、
前記屈曲部は、前記第2の部分と前記第3の部分との間で屈曲する部分であり、
前記支持部は、前記ケースの前記側面部から内側に突出するように設けられ、前記屈曲部を下側から支持可能であり、
前記第2の部分と前記支持部の間には間隙が形成されている、半導体装置。 - 開口を有するケースと、
前記ケースに内蔵された半導体素子と、
前記ケース内における前記半導体素子の上方に配置され、前記半導体素子を制御する制御回路が配置された制御基板と、
前記ケースの前記開口を覆う蓋と、
一端部が前記制御基板に配置された前記制御回路に接続され、かつ、他端部が前記ケースの外部に突出する制御端子と、を備え、
前記制御端子は、前記ケース内において屈曲する屈曲部を有し、
前記ケースの側面部に、前記屈曲部を支持可能な支持部が設けられ、
前記制御端子は、前記制御回路から上方に延びる第1の部分と、前記第1の部分における前記制御回路とは反対側の端部から横方向に延びる第2の部分と、前記第2の部分における前記第1の部分とは反対側の端部から上方に延びかつ前記蓋に形成された穴部から突出する第3の部分とを有し、
前記屈曲部は、前記第2の部分と前記第3の部分との間で屈曲する部分であり、
前記支持部は、前記ケースの前記側面部から内側に突出するように設けられ、前記屈曲部を下側から支持可能であり、
前記ケースの前記側面部に、前記支持部の基端部が嵌合する嵌合穴が形成され、
前記支持部は前記嵌合穴に対して脱着可能である、半導体装置。 - 開口を有するケースと、
前記ケースに内蔵された半導体素子と、
前記ケース内における前記半導体素子の上方に配置され、前記半導体素子を制御する制御回路が配置された制御基板と、
前記ケースの前記開口を覆う蓋と、
一端部が前記制御基板に配置された前記制御回路に接続され、かつ、他端部が前記ケースの外部に突出する制御端子と、を備え、
前記制御端子は、前記ケース内において屈曲する屈曲部を有し、
前記蓋に、前記屈曲部を支持可能な支持部が設けられ、
前記制御端子は、前記制御回路から上方に延びる第1の部分と、前記第1の部分における前記制御回路とは反対側の端部から横方向に延びかつ前記ケースの側面部に形成された穴部から突出する第2の部分とを有し、
前記屈曲部は、前記第1の部分と前記第2の部分との間で屈曲する部分であり、
前記支持部は、前記蓋の下面から下方に突出するように設けられ、前記第1の部分を介して前記側面部の前記穴部と対向する側から前記屈曲部を支持可能である、半導体装置。 - 前記支持部における前記制御端子の前記屈曲部に対向する部分に、前記屈曲部を収容可能な溝が形成された、請求項1から請求項3のいずれか1項に記載の半導体装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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JP2020088190A JP7337027B2 (ja) | 2020-05-20 | 2020-05-20 | 半導体装置 |
US17/179,137 US11551983B2 (en) | 2020-05-20 | 2021-02-18 | Semiconductor device having control terminal and control substrate |
DE102021107468.1A DE102021107468B4 (de) | 2020-05-20 | 2021-03-25 | Halbleitervorrichtung |
CN202110528783.0A CN113707615B (zh) | 2020-05-20 | 2021-05-14 | 半导体装置 |
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JP2020088190A JP7337027B2 (ja) | 2020-05-20 | 2020-05-20 | 半導体装置 |
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JP2021182604A JP2021182604A (ja) | 2021-11-25 |
JP7337027B2 true JP7337027B2 (ja) | 2023-09-01 |
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JP (1) | JP7337027B2 (ja) |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000183278A (ja) | 1998-12-18 | 2000-06-30 | Fuji Electric Co Ltd | パワーモジュールの組立方法 |
JP2003249624A (ja) | 2001-07-23 | 2003-09-05 | Fuji Electric Co Ltd | 半導体装置 |
JP2009200416A (ja) | 2008-02-25 | 2009-09-03 | Mitsubishi Electric Corp | 半導体装置および半導体装置の製造方法 |
JP2013258321A (ja) | 2012-06-13 | 2013-12-26 | Fuji Electric Co Ltd | 半導体装置 |
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JP5100694B2 (ja) * | 2009-04-01 | 2012-12-19 | 三菱電機株式会社 | 半導体装置 |
EP2642517B1 (en) | 2010-11-16 | 2021-12-29 | Fuji Electric Co., Ltd. | Semiconductor device |
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- 2021-02-18 US US17/179,137 patent/US11551983B2/en active Active
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JP2000183278A (ja) | 1998-12-18 | 2000-06-30 | Fuji Electric Co Ltd | パワーモジュールの組立方法 |
JP2003249624A (ja) | 2001-07-23 | 2003-09-05 | Fuji Electric Co Ltd | 半導体装置 |
JP2009200416A (ja) | 2008-02-25 | 2009-09-03 | Mitsubishi Electric Corp | 半導体装置および半導体装置の製造方法 |
JP2013258321A (ja) | 2012-06-13 | 2013-12-26 | Fuji Electric Co Ltd | 半導体装置 |
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US20210366795A1 (en) | 2021-11-25 |
CN113707615A (zh) | 2021-11-26 |
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JP2021182604A (ja) | 2021-11-25 |
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