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JP6476302B2 - 着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置 - Google Patents

着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置 Download PDF

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Publication number
JP6476302B2
JP6476302B2 JP2017537671A JP2017537671A JP6476302B2 JP 6476302 B2 JP6476302 B2 JP 6476302B2 JP 2017537671 A JP2017537671 A JP 2017537671A JP 2017537671 A JP2017537671 A JP 2017537671A JP 6476302 B2 JP6476302 B2 JP 6476302B2
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JPWO2017038339A1 (ja
Inventor
金子　祐士
祐士 金子
高桑　英希
英希 高桑
恒光 留場
恒光 留場
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Fujifilm Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/805—Coatings
    • H10F39/8053—Colour filters

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Solid State Image Pick-Up Elements (AREA)
JP2017537671A 2015-08-31 2016-08-01 着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置 Active JP6476302B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015171586 2015-08-31
JP2015171586 2015-08-31
PCT/JP2016/072492 WO2017038339A1 (ja) 2015-08-31 2016-08-01 着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置

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JPWO2017038339A1 JPWO2017038339A1 (ja) 2018-03-01
JP6476302B2 true JP6476302B2 (ja) 2019-02-27

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JP (1) JP6476302B2 (zh)
KR (1) KR102079525B1 (zh)
TW (1) TWI699618B (zh)
WO (1) WO2017038339A1 (zh)

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CN110537147B (zh) * 2017-04-21 2024-03-12 日产化学株式会社 感光性树脂组合物
CN110573963B (zh) * 2017-04-21 2023-10-24 日产化学株式会社 感光性树脂组合物
JP7090628B2 (ja) * 2017-09-20 2022-06-24 富士フイルム株式会社 着色組成物、硬化膜、パターン形成方法、カラーフィルタ、固体撮像素子及び画像表示装置
KR102456394B1 (ko) * 2018-03-20 2022-10-19 동우 화인켐 주식회사 녹색 감광성 수지 조성물 및 이를 포함하는 컬러필터
WO2019202908A1 (ja) 2018-04-19 2019-10-24 富士フイルム株式会社 パターンの製造方法、光学フィルタの製造方法、固体撮像素子の製造方法、画像表示装置の製造方法、光硬化性組成物および膜
WO2020066919A1 (ja) * 2018-09-26 2020-04-02 富士フイルム株式会社 着色組成物、硬化膜の形成方法、カラーフィルタの製造方法および表示装置の製造方法
JPWO2020202329A1 (ja) * 2019-03-29 2021-10-28 昭和電工マテリアルズ株式会社 感光性樹脂組成物、硬化物、感光性エレメント、及び、レジストパターンの製造方法
JP6885518B1 (ja) * 2019-07-22 2021-06-16 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置
KR20220119011A (ko) * 2019-12-20 2022-08-26 미쯔비시 케미컬 주식회사 감광성 수지 조성물, 격벽, 유기 전계 발광 소자, 및 화상 표시 장치
CN116249920A (zh) 2020-11-17 2023-06-09 株式会社艾迪科 着色层的制造方法、剂及层叠体
CN115207003A (zh) * 2021-04-09 2022-10-18 和鑫光电股份有限公司 光感测装置的光感测单元
KR102352657B1 (ko) * 2021-07-19 2022-01-18 동우 화인켐 주식회사 반사방지 필름 및 이를 포함하는 유기발광 표시장치
WO2024053662A1 (ja) * 2022-09-07 2024-03-14 富士フイルム株式会社 光吸収フィルタ、光学フィルタ及びその製造方法、有機エレクトロルミネッセンス表示装置、無機エレクトロルミネッセンス表示装置及び液晶表示装置

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JP5535814B2 (ja) * 2009-09-14 2014-07-02 富士フイルム株式会社 光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、液晶表示装置、平版印刷版原版、並びに、新規化合物
JP5657442B2 (ja) 2011-03-22 2015-01-21 富士フイルム株式会社 着色感放射線性組成物、パターンの形成方法、カラーフィルタ及びそのカラーフィルタの製造方法、並びに、固体撮像素子
JP5604398B2 (ja) * 2011-09-30 2014-10-08 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
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JP2015082046A (ja) * 2013-10-23 2015-04-27 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、及び、電子デバイス

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Publication number Publication date
WO2017038339A1 (ja) 2017-03-09
KR102079525B1 (ko) 2020-02-20
TW201708955A (zh) 2017-03-01
TWI699618B (zh) 2020-07-21
KR20180034570A (ko) 2018-04-04
JPWO2017038339A1 (ja) 2018-03-01

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