JP6353655B2 - リチウムイオン二次電池の負極材製造方法及びリチウムイオン二次電池用負極材 - Google Patents
リチウムイオン二次電池の負極材製造方法及びリチウムイオン二次電池用負極材 Download PDFInfo
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- JP6353655B2 JP6353655B2 JP2013526969A JP2013526969A JP6353655B2 JP 6353655 B2 JP6353655 B2 JP 6353655B2 JP 2013526969 A JP2013526969 A JP 2013526969A JP 2013526969 A JP2013526969 A JP 2013526969A JP 6353655 B2 JP6353655 B2 JP 6353655B2
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- negative electrode
- secondary battery
- copper foil
- ion secondary
- lithium ion
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- 239000007773 negative electrode material Substances 0.000 title claims description 122
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 title claims description 56
- 229910001416 lithium ion Inorganic materials 0.000 title claims description 56
- 238000004519 manufacturing process Methods 0.000 title claims description 38
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 115
- 239000011889 copper foil Substances 0.000 claims description 92
- 239000002245 particle Substances 0.000 claims description 70
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 38
- 230000003746 surface roughness Effects 0.000 claims description 27
- 239000002923 metal particle Substances 0.000 claims description 26
- 229910001111 Fine metal Inorganic materials 0.000 claims description 23
- 229910052802 copper Inorganic materials 0.000 claims description 23
- 239000010949 copper Substances 0.000 claims description 23
- 229910052744 lithium Inorganic materials 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 20
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 19
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 229910000531 Co alloy Inorganic materials 0.000 claims description 5
- 239000003575 carbonaceous material Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 4
- 229910017052 cobalt Inorganic materials 0.000 claims description 4
- 239000010941 cobalt Substances 0.000 claims description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 238000005868 electrolysis reaction Methods 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims 1
- 239000011236 particulate material Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 62
- 230000000052 comparative effect Effects 0.000 description 35
- 238000000034 method Methods 0.000 description 29
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 25
- 239000011863 silicon-based powder Substances 0.000 description 21
- 239000011149 active material Substances 0.000 description 18
- 238000007788 roughening Methods 0.000 description 17
- 230000014759 maintenance of location Effects 0.000 description 14
- 238000011156 evaluation Methods 0.000 description 11
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 10
- 238000012423 maintenance Methods 0.000 description 10
- 238000007747 plating Methods 0.000 description 10
- 230000002265 prevention Effects 0.000 description 10
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000011888 foil Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000008602 contraction Effects 0.000 description 5
- 238000007599 discharging Methods 0.000 description 5
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- 239000007788 liquid Substances 0.000 description 5
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- 229910001297 Zn alloy Inorganic materials 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
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- 239000007822 coupling agent Substances 0.000 description 3
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- 239000007772 electrode material Substances 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VAYTZRYEBVHVLE-UHFFFAOYSA-N 1,3-dioxol-2-one Chemical compound O=C1OC=CO1 VAYTZRYEBVHVLE-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 2
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 2
- 229910013870 LiPF 6 Inorganic materials 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000010405 anode material Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
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- 229910052804 chromium Inorganic materials 0.000 description 2
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- 239000011247 coating layer Substances 0.000 description 2
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- 230000008878 coupling Effects 0.000 description 2
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- 239000011255 nonaqueous electrolyte Substances 0.000 description 2
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- 229910000077 silane Inorganic materials 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- XYCQRIWVOKLIMW-UHFFFAOYSA-N [Co].[Ni].[Zn] Chemical compound [Co].[Ni].[Zn] XYCQRIWVOKLIMW-UHFFFAOYSA-N 0.000 description 1
- GXDVEXJTVGRLNW-UHFFFAOYSA-N [Cr].[Cu] Chemical compound [Cr].[Cu] GXDVEXJTVGRLNW-UHFFFAOYSA-N 0.000 description 1
- ZUPBPXNOBDEWQT-UHFFFAOYSA-N [Si].[Ni].[Cu] Chemical compound [Si].[Ni].[Cu] ZUPBPXNOBDEWQT-UHFFFAOYSA-N 0.000 description 1
- QZLJNVMRJXHARQ-UHFFFAOYSA-N [Zr].[Cr].[Cu] Chemical compound [Zr].[Cr].[Cu] QZLJNVMRJXHARQ-UHFFFAOYSA-N 0.000 description 1
- 239000006230 acetylene black Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000788 chromium alloy Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- QHGJSLXSVXVKHZ-UHFFFAOYSA-N dilithium;dioxido(dioxo)manganese Chemical compound [Li+].[Li+].[O-][Mn]([O-])(=O)=O QHGJSLXSVXVKHZ-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 229910021484 silicon-nickel alloy Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- 125000003396 thiol group Chemical class [H]S* 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- OMSYGYSPFZQFFP-UHFFFAOYSA-J zinc pyrophosphate Chemical compound [Zn+2].[Zn+2].[O-]P([O-])(=O)OP([O-])([O-])=O OMSYGYSPFZQFFP-UHFFFAOYSA-J 0.000 description 1
Classifications
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- H01M10/00—Secondary cells; Manufacture thereof
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- H01M10/052—Li-accumulators
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- H01M4/0404—Methods of deposition of the material by coating on electrode collectors
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- H01M4/38—Selection of substances as active materials, active masses, active liquids of elements or alloys
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- H01M4/58—Selection of substances as active materials, active masses, active liquids of inorganic compounds other than oxides or hydroxides, e.g. sulfides, selenides, tellurides, halogenides or LiCoFy; of polyanionic structures, e.g. phosphates, silicates or borates
- H01M4/583—Carbonaceous material, e.g. graphite-intercalation compounds or CFx
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Inorganic Chemistry (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Cell Electrode Carriers And Collectors (AREA)
- Secondary Cells (AREA)
Description
参考例1では、実施例1で、電解銅箔Aの作製に用いた未処理銅箔の析出面に、実施例1と同様の防錆処理層及びシランカップリング剤処理層を設けた電解銅箔Dを用いた。そして、この電解銅箔Dの析出面側に、負極活物質としてシリコン粉1〜シリコン粉3のそれぞれ用いて、実施例1と同様にして負極合剤層を形成し、参考例負極材4−I、参考例負極材4−II、および参考例負極材4−IIIを作製した。
比較例1では、実施例1で用いた電解銅箔Aの粗化処理を省略した電解銅箔Eを用いた。そして、この電解銅箔Eの表面粗さ(Ra)が、下限値未満である陰極面に、負極活物質としてシリコン粉1〜シリコン粉3のそれぞれ用いて、実施例1と同様にして負極合剤層を形成し、比較用負極材5−I、比較用負極材5−II、および比較用負極材5−IIIを作製した。
比較例2は、実施例1で行った電解銅箔の作製方法と同一の方法において、未処理の電解銅箔の析出面側の粗化処理における微細銅粒子の付着形成の時間及び平滑めっき時間を変更し、表面粗さ(Ra)が上限値を超えた電解銅箔Fを得た。この電解銅箔Fの粗化処理された面の表面粗さ(Ra)は、0.60μmであった。そして、このときの微細銅粒子の平均粒径は、1.30μmであった。そして、この電解銅箔Fの粗化処理面側に、負極活物質としてシリコン粉1〜シリコン粉3のそれぞれ用いて、実施例1と同様にして負極合剤層を形成し、比較用負極材6−I、比較用負極材6−II、および比較用負極材6−IIIを作製した。
比較例3は、リチウムイオン二次電池用負極製造に用いる電解銅箔において、シランカップリング剤処理の有無の影響を検証するためのものであり、実施例1の防錆処理後のシランカップリング剤処理を省略した電解銅箔Gを作製した。このときの粗化処理面の表面粗さ(Ra)は0.21μm、微細銅粒子の平均粒径は、0.25μmであった。そして、この電解銅箔Gの粗化処理面側に、負極活物質としてシリコン粉1〜シリコン粉3のそれぞれ用いて、実施例1と同様にして負極合剤層を形成し、比較用負極材7−I、比較用負極材7−II、および比較用負極材7−IIIを作製した。
総合判定: リチウムイオン二次電池としての、「初回サイクル充放電効率(vs.Li)」、「50サイクル後の容量維持率(vs.LMO)」の測定結果を指標とし、リチウムイオン二次電池の性能の総合評価結果として、「◎」、「○」、「△」、「×」の四水準で判断した。このとき、実用上支障無く、且つ、良好なリチウムイオン二次電池用負極材となりうるのは「△〜◎」の範囲とした。
以下に、評価結果を表2に纏めて示すが、表2には、電解銅箔の表面粗さ(Ra)と活物質の平均粒径(D50(c))との関係を表す(Ra/D50(c))の値の順に、比較例1、実施例1、参考例1、実施例2、実施例3、比較例2の順に並べて掲載している。
Claims (4)
- 負極集電体の表面に、負極活物質を含む負極合剤層を備えたリチウムイオン二次電池の負極材製造方法において、
リチウムと合金化する粒状材料及びリチウムを吸蔵・放出する炭素材料から選択される1種又は2種以上を負極活物質として用い、
当該負極活物質の平均粒径(D 50 (c))が、2.0μm〜4.0μmの範囲であり、
当該負極集電体は、その片面或いは両面に、微細金属粒子を付着させた粗化処理面を備える電解銅箔であって、当該電解銅箔の表面粗さ(Ra)が、0.20μm<Ra<0.50μmの範囲にあり、且つ、当該負極活物質の平均粒径(D50(c))の値を基準としたとき、当該表面粗さ(Ra)が、[0.053×D50(c)]μm〜[0.210×D50(c)]μmの範囲にあり、当該負極活物質の平均粒径(D50(c))の値を基準として、当該微細金属粒子の平均粒径(D(p))が[0.06×D50(c)]μm〜[0.44×D50(c)]μmの範囲にある電解銅箔を選択的に用い、当該電解銅箔の表面にシランカップリング剤処理層を備え、その表面に当該負極活物質で負極合剤層を形成し、負極材とすることを特徴とするリチウムイオン二次電池の負極材製造方法。 - 前記電解銅箔は、銅、銅合金、ニッケル、ニッケル合金、コバルト及びコバルト合金のいずれかの成分からなる微細金属粒子を付着させた粗化処理面を備えるものを用いる請求項1に記載のリチウムイオン二次電池の負極材製造方法。
- 前記負極活物質は、リチウムと合金化する材料として、スズ又はケイ素を含むものを用いる請求項1又は請求項2に記載のリチウムイオン二次電池の負極材製造方法。
- 請求項1〜請求項3のいずれかに記載のリチウムイオン二次電池の負極材製造方法を用いて得られたことを特徴とするリチウムイオン二次電池用負極材。
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