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JP5915835B2 - Lead frame with reflecting member for optical semiconductor device, lead frame for optical semiconductor device, lead frame substrate for optical semiconductor device, optical semiconductor device, method for manufacturing lead frame with reflecting member for optical semiconductor device, and optical semiconductor device Production method - Google Patents

Lead frame with reflecting member for optical semiconductor device, lead frame for optical semiconductor device, lead frame substrate for optical semiconductor device, optical semiconductor device, method for manufacturing lead frame with reflecting member for optical semiconductor device, and optical semiconductor device Production method Download PDF

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JP5915835B2
JP5915835B2 JP2011231757A JP2011231757A JP5915835B2 JP 5915835 B2 JP5915835 B2 JP 5915835B2 JP 2011231757 A JP2011231757 A JP 2011231757A JP 2011231757 A JP2011231757 A JP 2011231757A JP 5915835 B2 JP5915835 B2 JP 5915835B2
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optical semiconductor
semiconductor device
lead frame
substrate
frame
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JP2013089905A (en
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敦志 鳴海
敦志 鳴海
和範 小田
小田  和範
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Dai Nippon Printing Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12041LED

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Device Packages (AREA)

Description

本発明は、LED等の光半導体素子を載置する光半導体装置用反射部材付リードフレーム、光半導体装置用リードフレーム、光半導体装置用リードフレーム基板、光半導体装置、および、光半導体装置用反射部材付リードフレームの製造方法、並びに、光半導体装置の製造方法に関する。   The present invention relates to a lead frame with a reflecting member for an optical semiconductor device on which an optical semiconductor element such as an LED is mounted, a lead frame for an optical semiconductor device, a lead frame substrate for an optical semiconductor device, an optical semiconductor device, and a reflection for an optical semiconductor device. The present invention relates to a method for manufacturing a lead frame with members and a method for manufacturing an optical semiconductor device.

従来、LED(発光ダイオード)素子を光源として用いる照明装置が、各種家電、OA機器、車両機器の表示灯、一般照明、車載照明、およびディスプレイ等に用いられている。このような照明装置の中には、互いに絶縁された端子部(電極)を有するリードフレームとLED素子とを有する光半導体装置を含むものがある。   2. Description of the Related Art Conventionally, lighting devices that use LED (light emitting diode) elements as light sources are used in various home appliances, OA equipment, display lights for vehicle equipment, general lighting, in-vehicle lighting, displays, and the like. Some of such lighting devices include an optical semiconductor device having a lead frame having terminal portions (electrodes) insulated from each other and an LED element.

このような光半導体装置として、例えば、特許文献1には、PLCC(Plastic leaded chip carrier)タイプの光半導体装置が開示されている。特許文献1において、PLCCタイプの光半導体装置は、リードフレームを保持する構造体と、LED素子を封止するドーム形カプセル材料とを有している。   As such an optical semiconductor device, for example, Patent Document 1 discloses a PLCC (Plastic leaded chip carrier) type optical semiconductor device. In Patent Document 1, a PLCC type optical semiconductor device has a structure that holds a lead frame and a dome-shaped capsule material that seals an LED element.

ここで、上述のような光半導体装置においては、効率良く光を取り出すために、リフレクターを設ける必要がある。光半導体装置において、金属製の基板またはリードフレームを用いた場合には、リフレクターは樹脂により形成されることが一般的である。
しかしながら、樹脂製のリフレクターは反射率が十分でなく、かつ、樹脂劣化による反射率の低下が問題となる。また、LED素子の発光により生じた熱を、放熱する特性も十分ではない。
Here, in the optical semiconductor device as described above, it is necessary to provide a reflector in order to extract light efficiently. In an optical semiconductor device, when a metal substrate or a lead frame is used, the reflector is generally formed of a resin.
However, the reflector made of resin does not have sufficient reflectivity, and a decrease in reflectivity due to resin deterioration becomes a problem. Moreover, the characteristic which radiates the heat generated by the light emission of the LED element is not sufficient.

そこで、反射率や放熱特性を向上させることを目的に、リフレクターを金属製とすることが提案されている(特許文献2〜4)。
ただし、金属リフレクターを金属リードフレームに用いるためには、両者の絶縁を確保することが必要になる。
Therefore, it has been proposed that the reflector is made of metal for the purpose of improving the reflectance and heat dissipation characteristics (Patent Documents 2 to 4).
However, in order to use a metal reflector for a metal lead frame, it is necessary to ensure insulation between the two.

例えば、特許文献2には、絶縁性接着層を介して金属リフレクターを金属リードフレームに固定する光半導体装置、または、金属リフレクター(アルミニウム製)の表面に金属酸化膜(アルマイト)を形成し、導電性接着層を介して金属リフレクターを金属リードフレームに固定する光半導体装置が記載されている。   For example, in Patent Document 2, an optical semiconductor device that fixes a metal reflector to a metal lead frame via an insulating adhesive layer, or a metal oxide film (alumite) is formed on the surface of a metal reflector (aluminum) to conduct electricity. An optical semiconductor device that fixes a metal reflector to a metal lead frame via a conductive adhesive layer is described.

また、特許文献3には、金属リフレクターの底部を一部削除加工して段差を形成し、この段差に絶縁層を形成することで、金属リードフレームとの絶縁性を確保した光半導体装置が記載されている。   Further, Patent Document 3 describes an optical semiconductor device that secures insulation from a metal lead frame by forming a step by partially removing the bottom of a metal reflector and forming an insulating layer at the step. Has been.

また、特許文献4には、金属リフレクターとダイパッドを一体に形成し、絶縁性接着層を介してリード部(電極部)が固定されている光半導体装置が記載されている。   Patent Document 4 describes an optical semiconductor device in which a metal reflector and a die pad are integrally formed, and lead portions (electrode portions) are fixed via an insulating adhesive layer.

特開2007−49167号公報JP 2007-49167 A 特開2009−283653号公報JP 2009-283653 A 特開2009−283654号公報JP 2009-283654 A 特開2010−21426号公報JP 2010-21426 A

しかしながら、一般に、絶縁性接着層はエポキシ樹脂やアクリル樹脂などから構成されており、熱伝導率が低い。
それゆえ、上述のように、絶縁性接着層を介して金属リフレクターを金属リードフレームに固定する構造では、LED素子からの熱を金属リードフレームから金属リフレクターに効率良く伝達させることは困難であり、これに伴い、LED素子からの熱を金属リフレクターから放熱させることも困難になるので、放熱特性の向上は得られ難い。
However, generally, the insulating adhesive layer is made of an epoxy resin, an acrylic resin, or the like, and has a low thermal conductivity.
Therefore, as described above, in the structure in which the metal reflector is fixed to the metal lead frame through the insulating adhesive layer, it is difficult to efficiently transfer the heat from the LED element from the metal lead frame to the metal reflector. Along with this, it becomes difficult to dissipate heat from the LED element from the metal reflector, so it is difficult to improve the heat dissipation characteristics.

一方、アルマイト等の金属酸化膜は、一般に、酸化される前の金属よりも反射率が低いため、金属リフレクターの表面をアルマイトにした場合は、絶縁性は確保できたとしても、光の反射率は低下してしまうことになる。   On the other hand, a metal oxide film such as anodized generally has a lower reflectance than that of the metal before being oxidized. Therefore, when the surface of the metal reflector is anodized, even if insulation can be secured, the reflectance of light Will fall.

また、絶縁性確保のために、金属リフレクターの底部を一部削除して段差を形成する方法では、その削除した箇所からは光が反射されないため、反射効率が低下する。   Moreover, in order to ensure insulation, in the method of removing a part of the bottom of the metal reflector to form a step, light is not reflected from the removed portion, so that the reflection efficiency is lowered.

また、金属リフレクターとダイパッドを一体化する方法では、構造が複雑になり、このような光半導体装置を製造することは困難性を伴い、生産性が低下する。   Further, in the method of integrating the metal reflector and the die pad, the structure becomes complicated, and it is difficult to manufacture such an optical semiconductor device, and the productivity is lowered.

本発明は、上記実情に鑑みてなされたものであり、例えば、金属製のリフレクターとリードフレームを用いる場合においても、リフレクターとリードフレームのリード部(電極部)との間の絶縁性を確保しつつ、反射率が高く、放熱性に優れた光半導体装置用反射部材付リードフレーム、光半導体装置用リードフレーム、光半導体装置用リードフレーム基板、光半導体装置、および、光半導体装置用反射部材付リードフレームの製造方法、並びに、光半導体装置の製造方法を提供することを目的とする。   The present invention has been made in view of the above circumstances. For example, even when a metal reflector and a lead frame are used, insulation between the reflector and the lead portion (electrode portion) of the lead frame is ensured. However, a lead frame with a reflecting member for an optical semiconductor device having high reflectivity and excellent heat dissipation, a lead frame for an optical semiconductor device, a lead frame substrate for an optical semiconductor device, an optical semiconductor device, and a reflecting member for an optical semiconductor device It is an object of the present invention to provide a lead frame manufacturing method and an optical semiconductor device manufacturing method.

本発明者は、種々研究した結果、金属リードフレームのリード部(電極部)を段差構造とし、この段差に絶縁性樹脂を充填することで金属リフレクターとの絶縁性を確保し、一方、金属リードフレームのダイパッド部(素子載置部)と金属リフレクターとを、圧着により固着することで、上記課題を解決できることを見出して本発明を完成したものである。   As a result of various researches, the present inventor has made the lead part (electrode part) of the metal lead frame a step structure, and by filling the step with an insulating resin, the insulating property with the metal reflector is ensured. The present invention has been completed by finding that the above-mentioned problems can be solved by fixing the die pad portion (element placement portion) of the frame and the metal reflector by pressure bonding.

すなわち、本発明の請求項1に係る発明は、金属材料から構成され、天側の開口が底側の開口よりも大きくなるように開口側面が傾斜している枠状構造を有する第1部材と、金属材料から構成され、前記第1部材の前記枠状構造の底面の一部に固着されている第2部材と、金属材料から構成され、接続部と、前記接続部よりも厚さの薄い薄肉部とからなる段差構造を有し、平面視上、前記接続部が前記第1部材の底側の開口内に配置され、前記薄肉部が前記第1部材の前記枠状構造の底面の下に配置されている第3部材と、を備え、絶縁性樹脂が、前記第3部材と前記第1部材とが絶縁されるように、前記第3部材の薄肉部と前記第1部材の枠状構造の底面との間に介在し、かつ、前記第3部材と前記第2部材とが絶縁されるように、前記第3部材と前記第2部材との間に介在し、前記第1部材の前記枠状構造の底面には段差が無く、前記第1部材の前記枠状構造の底面と対応する前記第2部材の面は平坦であり、前記第1部材の前記枠状構造の底面と、該底面と対応する前記第2部材の面が、直接固着されていることを特徴とする光半導体装置用反射部材付リードフレームである。
That is, the invention according to claim 1 of the present invention includes a first member that is made of a metal material and has a frame-like structure in which the opening side surface is inclined so that the top opening is larger than the bottom opening. The second member is made of a metal material and is fixed to a part of the bottom surface of the frame-like structure of the first member, and is made of a metal material and is thinner than the connection portion and the connection portion. A step structure comprising a thin portion, and in plan view, the connecting portion is disposed in an opening on the bottom side of the first member, and the thin portion is below the bottom surface of the frame-like structure of the first member. A thin member of the third member and a frame shape of the first member so that the insulating resin is insulated from the third member and the first member. The first member is interposed between the bottom surface of the structure and the third member and the second member are insulated from each other. The surface of the second member that is interposed between the member and the second member, has no step on the bottom surface of the frame-like structure of the first member, and corresponds to the bottom surface of the frame-like structure of the first member Is a flat frame, and the bottom surface of the frame-like structure of the first member and the surface of the second member corresponding to the bottom surface are directly fixed to each other. It is.

また、本発明の請求項2に係る発明は、前記第1部材の開口側面に、銀を含むめっき膜が形成されていることを特徴とする請求項1に記載の光半導体装置用反射部材付リードフレームである。   In the invention according to claim 2 of the present invention, the plating member containing silver is formed on the opening side surface of the first member. Lead frame.

また、本発明の請求項3に係る発明は、前記第2部材における前記第1部材側の面、および前記第3部材の接続部における前記第1部材側の面に、銀を含むめっき膜が形成されていることを特徴とする請求項1または請求項2に記載の光半導体装置用反射部材付リードフレームである。   In the invention according to claim 3 of the present invention, a plating film containing silver is formed on the first member side surface of the second member and the first member side surface of the connection portion of the third member. The lead frame with a reflecting member for an optical semiconductor device according to claim 1, wherein the lead frame is formed.

また、本発明の請求項4に係る発明は、1個の前記第1部材に対して、前記第2部材または前記第3部材のいずれかを複数個、あるいはその両方を複数個有することを特徴とする請求項1乃至請求項3のいずれか一項に記載の光半導体装置用反射部材付リードフレームである。   According to a fourth aspect of the present invention, there is provided a plurality of either the second member or the third member or a plurality of both of the second member or the third member for one first member. A lead frame with a reflecting member for an optical semiconductor device according to any one of claims 1 to 3.

また、本発明の請求項5に係る発明は、請求項1乃至請求項4のいずれか一項に記載の光半導体装置用反射部材付リードフレームに用いられる光半導体装置用リードフレームであって、前記第2部材と、前記第3部材と、を有することを特徴とする光半導体装置用リードフレームである。   An invention according to claim 5 of the present invention is a lead frame for an optical semiconductor device used for a lead frame with a reflecting member for an optical semiconductor device according to any one of claims 1 to 4, An optical semiconductor device lead frame comprising the second member and the third member.

また、本発明の請求項6に係る発明は、請求項5に記載の光半導体装置用リードフレームと、前記第2部材と前記第3部材との間、および、前記第3部材の薄肉部上に形成された絶縁性樹脂と、を備えたことを特徴とする樹脂付き光半導体装置用リードフレームである。   According to a sixth aspect of the present invention, there is provided the optical semiconductor device lead frame according to the fifth aspect, between the second member and the third member, and on the thin portion of the third member. And a resin-coated lead frame for an optical semiconductor device.

また、本発明の請求項7に係る発明は、請求項1乃至請求項4のいずれか一項に記載の光半導体装置用反射部材付リードフレームの製造に用いられる光半導体装置用リードフレーム基板であって、前記第1部材に対応する一組の前記第2部材と前記第3部材とが平面上に複数組多面付けされており、前記第2部材と前記第3部材とが多面付けされている最外周には、前記第2部材および前記第3部材を保持する外枠部を有することを特徴とする光半導体装置用リードフレーム基板である。   According to a seventh aspect of the present invention, there is provided a lead frame substrate for an optical semiconductor device used for manufacturing a lead frame with a reflecting member for an optical semiconductor device according to any one of the first to fourth aspects. A plurality of sets of the second member and the third member corresponding to the first member are multifaceted on a plane, and the second member and the third member are multifaceted. The lead frame substrate for an optical semiconductor device has an outer frame portion that holds the second member and the third member on the outermost periphery.

また、本発明の請求項8に係る発明は、請求項7に記載の光半導体装置用リードフレーム基板と、前記第2部材と前記第3部材との間、および、前記第3部材の薄肉部上に形成された絶縁性樹脂と、を備えたことを特徴とする樹脂付き光半導体装置用リードフレーム基板である。   According to an eighth aspect of the present invention, there is provided the lead frame substrate for an optical semiconductor device according to the seventh aspect, between the second member and the third member, and a thin portion of the third member. And an insulating resin formed on the lead frame substrate for an optical semiconductor device with a resin.

また、本発明の請求項9に係る発明は、請求項1乃至請求項4のいずれか一項に記載の光半導体装置用反射部材付リードフレームと、前記第2部材における前記第1部材側の面に載置された光半導体素子と、前記光半導体素子を封止し、前記光半導体素子が発する光を透過する透光性樹脂と、を備えたことを特徴とする光半導体装置である。   According to a ninth aspect of the present invention, there is provided a lead frame with a reflecting member for an optical semiconductor device according to any one of the first to fourth aspects, and the first member side of the second member. An optical semiconductor device comprising: an optical semiconductor element placed on a surface; and a translucent resin that seals the optical semiconductor element and transmits light emitted from the optical semiconductor element.

また、本発明の請求項10に係る発明は、金属材料から構成され、天側の開口が底側の開口よりも大きくなるように開口側面が傾斜している枠状構造を有する第1部材と、金属材料から構成され、前記第1部材の前記枠状構造の底面の一部に固着されている第2部材と、金属材料から構成され、接続部と、前記接続部よりも厚さの薄い薄肉部とからなる段差構造を有し、平面視上、前記接続部が前記第1部材の底側の開口内に配置され、前記薄肉部が前記第1部材の前記枠状構造の底面の下に配置されている第3部材と、を備え、絶縁性樹脂が、前記第3部材と前記第1部材とが絶縁されるように、前記第3部材の薄肉部と前記第1部材の枠状構造の底面との間に介在し、かつ、前記第3部材と前記第2部材とが絶縁されるように、前記第3部材と前記第2部材との間に介在し、前記第1部材の前記枠状構造の底面には段差が無く、前記第1部材の前記枠状構造の底面と対応する前記第2部材の面は平坦であり、前記第1部材の前記枠状構造の底面と、該底面と対応する前記第2部材の面が、圧着により固着されている光半導体装置用反射部材付リードフレームの製造方法であって、前記第1部材が平面上に複数多面付けされた第1の基板を形成する工程と、前記第1部材に対応する一組の前記第2部材と前記第3部材が平面上に複数組多面付けされた第2の基板を形成する工程と、前記第2の基板の前記第2部材と前記第3部材の間、および、前記第3部材の接続部と薄肉部の段差を埋めるように前記絶縁性樹脂を形成する工程と、前記第1の基板と前記絶縁性樹脂を形成した前記第2の基板とを位置合わせして、前記第1の基板の複数の前記第1部材の各底面の一部と、前記第2の基板の各第2部材における前記第1部材側の面とを圧着し、多面付けされた前記光半導体装置用反射部材付リードフレームを形成する工程と、を備えることを特徴とする光半導体装置用反射部材付リードフレームの製造方法である。
The invention according to claim 10 of the present invention comprises a first member that is made of a metal material and has a frame-like structure in which the opening side surface is inclined so that the top side opening is larger than the bottom side opening. The second member is made of a metal material and is fixed to a part of the bottom surface of the frame-like structure of the first member, and is made of a metal material and is thinner than the connection portion and the connection portion. A step structure comprising a thin portion, and in plan view, the connecting portion is disposed in an opening on the bottom side of the first member, and the thin portion is below the bottom surface of the frame-like structure of the first member. A thin member of the third member and a frame shape of the first member so that the insulating resin is insulated from the third member and the first member. The third member is interposed between the bottom surface of the structure and the third member and the second member are insulated from each other. Interposed between the and the wood second member, the surface of the the bottom surface of the frame-like structure of the first member without a step, the second member corresponding to the bottom surface of the frame-like structure of the first member Is a method for producing a lead frame with a reflecting member for an optical semiconductor device , wherein the bottom surface of the frame-like structure of the first member and the surface of the second member corresponding to the bottom surface are fixed by pressure bonding. A step of forming a first substrate on which a plurality of the first members are provided on a plane, and a plurality of sets of the second member and the third member corresponding to the first member on the plane. A step of forming a multi-sided second substrate, a step between the second member and the third member of the second substrate, and a connecting portion and a thin portion of the third member are filled. Forming the insulating resin on the substrate and before forming the insulating resin with the first substrate. Aligning the second substrate, a part of each bottom surface of the plurality of first members of the first substrate, and a surface on the first member side of each second member of the second substrate; crimp the a multi-ordered method for fabricating a lead with an optical semiconductor device for reflecting member frame, characterized in that it comprises a step of forming the optical semiconductor device for reflecting member with the lead frame.

また、本発明の請求項11に係る発明は、請求項10に記載の光半導体装置用反射部材付リードフレームの製造方法により得られた多面付けされた光半導体装置用反射部材付リードフレームの前記第2部材における前記第1部材側の面に光半導体素子を載置する工程と、前記第1部材の開口に前記透光性樹脂を充填し、前記光半導体素子を封止して多面付けされた光半導体装置を得る工程と、前記多面付けされた光半導体装置を個片化して個々の光半導体装置を得る工程と、を備えることを特徴とする光半導体装置の製造方法である。   According to an eleventh aspect of the present invention, there is provided the lead frame with a reflecting member for an optical semiconductor device, which is provided by the method for manufacturing a lead frame with a reflecting member for an optical semiconductor device according to the tenth aspect. The step of placing the optical semiconductor element on the surface of the second member on the side of the first member, the opening of the first member is filled with the translucent resin, and the optical semiconductor element is sealed to be multifaceted A method for manufacturing an optical semiconductor device comprising: a step of obtaining an optical semiconductor device; and a step of obtaining individual optical semiconductor devices by dividing the multifaceted optical semiconductor devices into individual pieces.

上述のような構成を有するため、本発明によれば、リフレクターとリードフレームのリード部との間の絶縁性を確保でき、反射率が高く、放熱性に優れた光半導体装置用反射部材付リードフレーム、光半導体装置用リードフレーム、光半導体装置用リードフレーム基板、および光半導体装置を得ることができる。   Since it has the above-described configuration, according to the present invention, it is possible to ensure insulation between the reflector and the lead portion of the lead frame, have high reflectivity, and have excellent heat dissipation. A frame, a lead frame for an optical semiconductor device, a lead frame substrate for an optical semiconductor device, and an optical semiconductor device can be obtained.

本発明に係る光半導体装置用反射部材付リードフレームの一例を示す説明図であり、(a)は平面図、(b)は(a)のA−A断面図である。It is explanatory drawing which shows an example of the lead frame with a reflection member for optical semiconductor devices which concerns on this invention, (a) is a top view, (b) is AA sectional drawing of (a). 本発明に係る光半導体装置用反射部材付リードフレームの一例の構成を説明する斜視図である。It is a perspective view explaining the structure of an example of the lead frame with a reflection member for optical semiconductor devices which concerns on this invention. 本発明に係る光半導体装置用反射部材付リードフレームの他の例の構成部材を示す斜視図である。It is a perspective view which shows the structural member of the other example of the lead frame with a reflection member for optical semiconductor devices which concerns on this invention. 本発明に係る光半導体装置用リードフレームの一例の構成を説明する斜視図である。It is a perspective view explaining the structure of an example of the lead frame for optical semiconductor devices which concerns on this invention. 本発明に係る樹脂付き光半導体装置用リードフレームの一例の構成を説明する斜視図である。It is a perspective view explaining the structure of an example of the lead frame for optical semiconductor devices with a resin concerning this invention. 本発明に係る光半導体装置用リードフレーム基板の一例を示す説明図である。It is explanatory drawing which shows an example of the lead frame board | substrate for optical semiconductor devices which concerns on this invention. 本発明に係る樹脂付き光半導体装置用リードフレーム基板の一例を示す説明図である。It is explanatory drawing which shows an example of the lead frame board | substrate for optical semiconductor devices with a resin concerning this invention. 本発明に係る光半導体装置の一例を示す説明図であり、(a)は平面図、(b)は(a)のB−B断面図である。It is explanatory drawing which shows an example of the optical semiconductor device which concerns on this invention, (a) is a top view, (b) is BB sectional drawing of (a). 本発明に係る光半導体装置用反射部材付リードフレームの一例の製造工程における第1の基板を示す説明図である。It is explanatory drawing which shows the 1st board | substrate in the manufacturing process of an example of the lead frame with the reflection member for optical semiconductor devices which concerns on this invention. 本発明に係る光半導体装置用反射部材付リードフレームの一例の製造工程における第2の基板を示す説明図であり、(a)は樹脂形成前の状態を示し、(b)は樹脂形成後の状態を示す。It is explanatory drawing which shows the 2nd board | substrate in the manufacturing process of an example of the lead frame with a reflection member for optical semiconductor devices which concerns on this invention, (a) shows the state before resin formation, (b) is after resin formation. Indicates the state. 本発明に係る光半導体装置用反射部材付リードフレームの一例の製造工程における第1の基板と樹脂形成後の第2の基板を圧着した状態を示す説明図である。It is explanatory drawing which shows the state which crimped | bonded the 1st board | substrate and the 2nd board | substrate after resin formation in the manufacturing process of an example of the lead frame with a reflection member for optical semiconductor devices which concerns on this invention. 本発明に係る光半導体装置用反射部材付リードフレームの製造方法の一例を示す模式的工程図である。It is a typical process figure showing an example of a manufacturing method of a lead frame with a reflection member for optical semiconductor devices concerning the present invention. 本発明に係る光半導体装置の製造方法の一例を示す模式的工程図である。It is a typical process figure showing an example of a manufacturing method of an optical semiconductor device concerning the present invention. 本発明に係る光半導体装置の一例の製造工程における光半導体素子を載置した状態を示す説明図である。It is explanatory drawing which shows the state which mounted the optical semiconductor element in the manufacturing process of an example of the optical semiconductor device which concerns on this invention.

以下、本発明の光半導体装置用反射部材付リードフレーム、光半導体装置用リードフレーム、光半導体装置用リードフレーム基板、光半導体装置、および、光半導体装置用反射部材付リードフレームの製造方法、並びに、光半導体装置の製造方法について詳細に説明する。   Hereinafter, a lead frame with a reflecting member for an optical semiconductor device, a lead frame for an optical semiconductor device, a lead frame substrate for an optical semiconductor device, an optical semiconductor device, and a method for manufacturing a lead frame with a reflecting member for an optical semiconductor device according to the present invention, and The method for manufacturing the optical semiconductor device will be described in detail.

[光半導体装置用反射部材付リードフレーム]
まず、本発明の光半導体装置用反射部材付リードフレームについて説明する。
図1は、本発明に係る光半導体装置用反射部材付リードフレームの一例を示す説明図であり、(a)は平面図、(b)は(a)のA−A断面図であり、図2は、本発明に係る光半導体装置用反射部材付リードフレームの一例の構成を説明する斜視図である。
[Lead frame with reflecting member for optical semiconductor devices]
First, the lead frame with a reflecting member for an optical semiconductor device of the present invention will be described.
1A and 1B are explanatory views showing an example of a lead frame with a reflecting member for an optical semiconductor device according to the present invention, wherein FIG. 1A is a plan view, and FIG. 1B is a cross-sectional view taken along line AA in FIG. FIG. 2 is a perspective view illustrating the configuration of an example of a lead frame with a reflecting member for an optical semiconductor device according to the present invention.

図1、または図2に示すように、本発明に係る光半導体装置用反射部材付リードフレーム1は、金属材料から構成される第1部材11、第2部材12、および第3部材13を備えており、第3部材13と第1部材11とが絶縁されるように、かつ、第3部材13と第2部材12とが絶縁されるように、絶縁性樹脂14が設けられている。   As shown in FIG. 1 or FIG. 2, the lead frame 1 with a reflecting member for an optical semiconductor device according to the present invention includes a first member 11, a second member 12, and a third member 13 made of a metal material. The insulating resin 14 is provided so that the third member 13 and the first member 11 are insulated and the third member 13 and the second member 12 are insulated.

ここで、第1部材11は、天側の開口が底側の開口よりも大きくなるように開口側面11aが傾斜している枠状構造を有している。
また、第2部材12は、前記第1部材の前記枠状構造の底面の一部に固着されている。
ここで、前記第2部材12を前記第1部材の前記枠状構造の底面の一部に固着させる方法としては、前記第2部材12と前記第1部材とを圧着させる方法がある。なお、圧着とは、物理的圧力をかけることにより、ある物を別の物に固着させることをいう。
また、第3部材13は、接続部13Aと、前記接続部13Aよりも厚さの薄い薄肉部13Bとを有し、平面視上、前記接続部13Aは前記第1部材11の底側の開口内に配置されており、前記薄肉部13Bは、少なくとも一部が前記第1部材11の前記枠状構造の底面の下に配置されている。
そして、絶縁性樹脂14が、前記第3部材13と前記第1部材11とが絶縁されるように、前記第3部材13の薄肉部と前記第1部材11の枠状構造の底面との間に介在し、かつ、前記第3部材13と前記第2部材12とが絶縁されるように、前記第3部材13と前記第2部材12との間に介在している。
Here, the first member 11 has a frame-like structure in which the opening side surface 11a is inclined so that the opening on the top side is larger than the opening on the bottom side.
The second member 12 is fixed to a part of the bottom surface of the frame-like structure of the first member.
Here, as a method of fixing the second member 12 to a part of the bottom surface of the frame-like structure of the first member, there is a method of pressure-bonding the second member 12 and the first member. Note that the term “pressure bonding” refers to fixing a certain object to another object by applying physical pressure.
The third member 13 includes a connecting portion 13A and a thin portion 13B having a thickness smaller than that of the connecting portion 13A, and the connecting portion 13A is an opening on the bottom side of the first member 11 in plan view. The thin portion 13B is disposed at least partially under the bottom surface of the frame-like structure of the first member 11.
Then, the insulating resin 14 is disposed between the thin portion of the third member 13 and the bottom surface of the frame-like structure of the first member 11 so that the third member 13 and the first member 11 are insulated. In addition, the third member 13 and the second member 12 are interposed so that the third member 13 and the second member 12 are insulated.

第1部材11は、リフレクターとして機能するものであり、光反射性と放熱性を備えた材料である金属材料から構成されている。
また、第2部材12は、主にリードフレームのダイパッド部(素子載置部)として機能するものであり、第3部材13は、主にリードフレームのリード部(電極部)として機能するものである。第2部材12および第3部材13は、光反射性、放熱性、および導電性を備えた材料である金属材料から構成されている。
The 1st member 11 functions as a reflector, and is comprised from the metal material which is a material provided with light reflectivity and heat dissipation.
The second member 12 mainly functions as a die pad portion (element placement portion) of the lead frame, and the third member 13 mainly functions as a lead portion (electrode portion) of the lead frame. is there. The 2nd member 12 and the 3rd member 13 are comprised from the metal material which is a material provided with light reflectivity, heat dissipation, and electroconductivity.

上述のような第1部材11、第2部材12、第3部材13の材料としては、例えば、金属材料が挙げられ、好ましくは、銅(Cu)、銅合金、42合金(Ni40.5%〜43%のFe合金)である。   Examples of the material of the first member 11, the second member 12, and the third member 13 described above include metal materials, preferably copper (Cu), copper alloy, 42 alloy (Ni 40.5% to 43% Fe alloy).

また、前記第1部材11の開口側面11aには、銀(Ag)を含むめっき膜が形成されていることが好ましく、前記第2部材12における前記第1部材側の面、および前記第3部材13の接続部上面にも、銀を含むめっき膜が形成されていることが好ましい。光半導体素子からの光を、より効率良く反射することができるからである。
ここで、第1部材11においては、その開口側面11aに前記銀を含むめっき膜が形成されていれば上述の効果を奏するが、前記銀を含むめっき膜は、第1部材11の表面全体に形成されていてもよい。
また、前記第2部材12においては、前記第1部材11側の面であって前記第1部材の底側の開口に対応する部分に、前記銀を含むめっき膜が形成されていれば上述の効果を奏するが、前記銀を含むめっき膜は、第2部材12の表面全体に形成されていてもよい。
また、同様に、前記第3部材13においては、その接続部上面に前記銀を含むめっき膜が形成されていれば上述の効果を奏するが、前記銀を含むめっき膜は、第3部材13の表面全体に形成されていてもよい。
Moreover, it is preferable that a plating film containing silver (Ag) is formed on the opening side surface 11a of the first member 11, the surface of the second member 12 on the first member side, and the third member It is preferable that a plating film containing silver is also formed on the upper surface of the 13 connection portions. This is because the light from the optical semiconductor element can be reflected more efficiently.
Here, in the 1st member 11, although the above-mentioned effect is produced if the plating film containing silver is formed in the opening side surface 11a, the plating film containing silver is applied to the entire surface of the first member 11. It may be formed.
Further, in the second member 12, if the plating film containing silver is formed on the surface on the first member 11 side and corresponding to the opening on the bottom side of the first member, the above-described case is achieved. Although having an effect, the plating film containing silver may be formed on the entire surface of the second member 12.
Similarly, in the third member 13, the above-described effect can be achieved as long as the plating film containing silver is formed on the upper surface of the connection portion. It may be formed on the entire surface.

また、絶縁性樹脂14は絶縁性を有する樹脂であり、例えば、従来の光半導体装置のリフレクターに用いられている熱可塑性樹脂または熱硬化性樹脂を用いることができる。
例えば、熱可塑性樹脂としては、ポリアミド、ポリフタルアミド、ポリフェニレンサルファイド、液晶ポリマー、ポリエーテルサルホン、ポリブチレンテレフタレート等を用いることができる。
また、熱硬化性樹脂としては、シリコーン、エポキシ、ポリエーテルイミド、ポリウレタンおよびポリブチレンアクリレート等を用いることができる。
さらにまた、これらの樹脂中に光反射剤として、二酸化チタン、二酸化ジルコニウム、チタン酸カリウム、窒化アルミニウムおよび窒化ホウ素のうちいずれかを添加することによって、光の反射率を増大させることも可能である。
The insulating resin 14 is a resin having an insulating property, and for example, a thermoplastic resin or a thermosetting resin used in a reflector of a conventional optical semiconductor device can be used.
For example, as the thermoplastic resin, polyamide, polyphthalamide, polyphenylene sulfide, liquid crystal polymer, polyether sulfone, polybutylene terephthalate, or the like can be used.
As the thermosetting resin, silicone, epoxy, polyetherimide, polyurethane, polybutylene acrylate, or the like can be used.
Furthermore, it is also possible to increase the light reflectance by adding any of titanium dioxide, zirconium dioxide, potassium titanate, aluminum nitride and boron nitride as a light reflecting agent in these resins. .

上述のような構成を有するため、本発明の光半導体装置用反射部材付リードフレームは、リフレクター(第1部材)とリードフレームのリード部(第3部材)との絶縁性を確保しながらも、反射率が高く、放熱性に優れたものになっている。   Since it has the above-described configuration, the lead frame with a reflecting member for an optical semiconductor device of the present invention ensures insulation between the reflector (first member) and the lead portion (third member) of the lead frame, It has high reflectivity and excellent heat dissipation.

より詳しく説明すると、本発明においては、例えば金属材料のように光反射性と放熱性を備えた材料からなる枠状構造の第1部材を、リフレクターとして用いることにより、反射率が高い光半導体装置用反射部材付リードフレームとすることができる。   More specifically, in the present invention, an optical semiconductor device having a high reflectivity is obtained by using, as a reflector, a first member having a frame-like structure made of a material having light reflectivity and heat dissipation, such as a metal material. It can be set as a lead frame with a reflective member for use.

また、本発明においては、上述の特許文献3に記載されているような、絶縁性確保のために金属リフレクターの底部を一部削除して段差を形成したリードフレームとは異なり、リフレクターに相当する第1部材の底面には段差が無く、第2部材の素子載置面まで開口側面が形成されているため、光半導体素子からの光を効率よく反射することができる。   Further, in the present invention, unlike the lead frame described in the above-mentioned Patent Document 3 in which a step is formed by partially removing the bottom of the metal reflector to ensure insulation, it corresponds to a reflector. Since there is no step on the bottom surface of the first member and the opening side surface is formed up to the element mounting surface of the second member, light from the optical semiconductor element can be efficiently reflected.

また、本発明においては、リフレクターとして機能する第1部材に、主にリードフレームのダイパッド部として機能する第2部材が、固着されているため、第2部材に載置される光半導体素子からの熱を、第2部材から第1部材に効率良く伝達させることができ、かつ、第1部材から効率良く放熱させることができるので、放熱性に優れた光半導体装置用反射部材付リードフレームとすることができる。   In the present invention, since the second member that mainly functions as the die pad portion of the lead frame is fixed to the first member that functions as the reflector, the optical semiconductor element mounted on the second member Since heat can be efficiently transferred from the second member to the first member and can be efficiently radiated from the first member, the lead frame with a reflecting member for an optical semiconductor device excellent in heat dissipation can be obtained. be able to.

一方、主にリードフレームのリード部(電極部)として機能する第3部材について述べると、図1に示すように、まず、接続部13Aは、平面視上、第1部材11の底側の開口内に配置されるため、第1部材11とは非接触な関係、すなわち絶縁された関係であり、また、薄肉部13Bは、第1部材11の枠状構造の底面との間に絶縁性樹脂14が介在するため、第1部材11とは絶縁された関係である。
それゆえ、第3部材13は、第1部材11から絶縁されており、例えば、第1部材11を介して、第3部材13と第2部材12とが短絡するということはない。
なお、第3部材13と第2部材12との間には、絶縁性樹脂14が介在するため、第3部材13と第2部材12が直接接触することで短絡するということはない。
すなわち、本発明における第3部材13は、第1部材11および第2部材12に対し、絶縁性を確保したものである。
On the other hand, the third member functioning mainly as the lead part (electrode part) of the lead frame will be described. First, as shown in FIG. 1, the connection part 13A has an opening on the bottom side of the first member 11 in plan view. Since it is disposed inside, it is in a non-contact relationship with the first member 11, that is, an insulated relationship, and the thin portion 13 </ b> B is an insulating resin between the bottom surface of the frame-like structure of the first member 11. Since 14 is interposed, the first member 11 is insulated.
Therefore, the third member 13 is insulated from the first member 11. For example, the third member 13 and the second member 12 are not short-circuited via the first member 11.
In addition, since the insulating resin 14 is interposed between the third member 13 and the second member 12, the third member 13 and the second member 12 do not short-circuit due to direct contact.
That is, the third member 13 in the present invention ensures insulation with respect to the first member 11 and the second member 12.

また、本発明においては、第1部材11の前記枠状構造の底面の一部と、第3部材13の薄肉部13Bと第1部材11の枠状構造の底面との間に形成された絶縁性樹脂14とが、接着層を介して接合されている構成としてもよい。   Further, in the present invention, the insulation formed between a part of the bottom surface of the frame-like structure of the first member 11 and the thin portion 13B of the third member 13 and the bottom surface of the frame-like structure of the first member 11. It is good also as a structure joined with the adhesive resin 14 through the contact bonding layer.

このような構成であれば、第1部材11と絶縁性樹脂14との接合は、前記接着層が担うことになるため、絶縁性樹脂14には接合特性は要求されず、絶縁性樹脂14の材料選択において、より自由度が増すことになる。例えば、絶縁性樹脂14の材料として、光の反射特性がより高い材料を選択することができる。   With such a configuration, the bonding between the first member 11 and the insulating resin 14 is performed by the adhesive layer. Therefore, the insulating resin 14 is not required to have bonding characteristics. In selecting a material, the degree of freedom increases. For example, a material having higher light reflection characteristics can be selected as the material of the insulating resin 14.

なお、図1および図2においては、1個の第1部材11に対して、1個の第2部材12、および1個の第3部材13を有する光半導体装置用反射部材付リードフレームの例を示しているが、本発明においては、載置する光半導体素子の数や種類に応じて、1個の前記第1部材に対して、前記第2部材または前記第3部材のいずれかを複数個、あるいはその両方を複数個有する形態であってもよい。   1 and FIG. 2, an example of a lead frame with a reflecting member for an optical semiconductor device having one second member 12 and one third member 13 with respect to one first member 11. However, in the present invention, a plurality of either the second member or the third member is provided for one first member, depending on the number and type of optical semiconductor elements to be mounted. The form which has multiple pieces or both of them may be sufficient.

図3は、本発明に係る光半導体装置用反射部材付リードフレームの他の例の構成部材を示す斜視図である。なお、煩雑となるのを避けるため、図3においては、図2における第1部材11、および絶縁性樹脂14は記載せず、第2部材と第3部材のみを図示している。   FIG. 3 is a perspective view showing components of another example of a lead frame with a reflecting member for an optical semiconductor device according to the present invention. In order to avoid complication, in FIG. 3, the first member 11 and the insulating resin 14 in FIG. 2 are not shown, and only the second member and the third member are illustrated.

例えば、図3(a)または図3(b)に示すように、本発明においては、1個の第1部材に対して、1個の第2部材と2個の第3部材を有する構成としても良い。
ここで、図3(a)に示す例においては、1個の第2部材12aの一側面に対向して、2個の第3部材13a、13bが配置されており、図3(b)に示す例においては、1個の第2部材12bを両側から挟むようにして、2個の第3部材13c、13dが配置されている。
For example, as shown in FIG. 3 (a) or FIG. 3 (b), in the present invention, one second member and two third members are provided for one first member. Also good.
Here, in the example shown in FIG. 3A, two third members 13a and 13b are arranged to face one side surface of one second member 12a, and FIG. In the example shown, two third members 13c and 13d are arranged so as to sandwich one second member 12b from both sides.

また、同様に、本発明においては、1個の前記第1部材に対して、2個の第2部材と1個の第3部材を有する構成としても良い。例えば、図3(b)に示す例においては、2個の第2部材12c、12dの間に1個の第3部材13eが配置されている。   Similarly, in the present invention, one second member and one third member may be provided for one first member. For example, in the example shown in FIG. 3B, one third member 13e is disposed between the two second members 12c and 12d.

なお、上記の実施形態は例示であり、本発明は、上記の実施形態に限定されるものではない。本発明の特許請求の範囲に記載された技術的思想と、実質的に同一の構成を有し、同様な作用効果を奏するものは、いかなる場合であっても本発明の技術的範囲に包含される。   In addition, said embodiment is an illustration and this invention is not limited to said embodiment. What has substantially the same configuration as the technical idea described in the claims of the present invention and exhibits the same operational effects is included in the technical scope of the present invention in any case. The

[光半導体装置用リードフレーム]
次に、本発明の光半導体装置用リードフレームについて説明する。
図4は、本発明に係る光半導体装置用リードフレームの一例の構成を説明する斜視図である。
図4に示すように、本発明に係る光半導体装置用リードフレーム2は、上述の光半導体装置用反射部材付リードフレームに用いられる光半導体装置用リードフレームであって、第2部材12と、第3部材13とを有するものである。
なお、第2部材12、および第3部材13については、上述の光半導体装置用反射部材付リードフレームにおいて説明した内容と同様であるので、ここでの詳述は省略する。
また、本発明の光半導体装置用リードフレームは、上述の図3に示す第2部材および第3部材から構成されていても良い。
[Lead frame for optical semiconductor devices]
Next, the lead frame for optical semiconductor devices of the present invention will be described.
FIG. 4 is a perspective view illustrating the configuration of an example of the lead frame for an optical semiconductor device according to the present invention.
As shown in FIG. 4, an optical semiconductor device lead frame 2 according to the present invention is an optical semiconductor device lead frame used in the above-described lead frame with a reflecting member for an optical semiconductor device, and includes a second member 12; The third member 13 is included.
The second member 12 and the third member 13 are the same as those described in the above-described lead frame with a reflecting member for an optical semiconductor device, and therefore detailed description thereof is omitted here.
The lead frame for an optical semiconductor device of the present invention may be composed of the second member and the third member shown in FIG.

[樹脂付き光半導体装置用リードフレーム]
次に、本発明の樹脂付き光半導体装置用リードフレームについて説明する。
図5は、本発明に係る樹脂付き光半導体装置用リードフレームの一例の構成を説明する斜視図である。
図5に示すように、本発明に係る樹脂付き光半導体装置用リードフレーム3は、上述の光半導体装置用リードフレーム2と、第2部材12と第3部材13との間、および、第3部材13の薄肉部13Bの上に形成された絶縁性樹脂14と、を備えたものである。
なお、第2部材12、第3部材13、および絶縁性樹脂14については、上述の光半導体装置用反射部材付リードフレームにおいて説明した内容と同様であるので、ここでの詳述は省略する。
[Lead frames for optical semiconductor devices with resin]
Next, the lead frame for an optical semiconductor device with resin of the present invention will be described.
FIG. 5 is a perspective view illustrating the configuration of an example of a lead frame for an optical semiconductor device with a resin according to the present invention.
As shown in FIG. 5, the lead frame 3 for an optical semiconductor device with a resin according to the present invention includes the above-described lead frame 2 for an optical semiconductor device, the second member 12, the third member 13, and the third And an insulating resin 14 formed on the thin portion 13B of the member 13.
Since the second member 12, the third member 13, and the insulating resin 14 are the same as those described in the above-described lead frame with a reflecting member for an optical semiconductor device, detailed description thereof is omitted here.

[光半導体装置用リードフレーム基板]
次に、本発明の光半導体装置用リードフレーム基板について説明する。
図6は、本発明に係る光半導体装置用リードフレーム基板の一例を示す説明図である。
図6に示すように、本発明に係る光半導体装置用リードフレーム基板4は、上述の光半導体装置用反射部材付リードフレームの製造に用いられる光半導体装置用リードフレーム基板であって、前記第1部材11に対応する一組の前記第2部材12と前記第3部材13とが平面上に複数組多面付けされており、前記第2部材12と前記第3部材13とが多面付けされている最外周には、前記第2部材12および前記第3部材13を保持する外枠部41を有するものである。
一組の第2部材12と第3部材13の外周は、ダイシングライン42になっており、一組の第2部材と第3部材に隣接する他の一組の第2部材と第3部材は、このダイシングライン42で分離されることにより、個々の光半導体装置用リードフレームとなる。
なお、第2部材12、および第3部材13については、上述の光半導体装置用反射部材付リードフレームにおいて説明した内容と同様であるので、ここでの詳述は省略する。
[Lead frame substrate for optical semiconductor devices]
Next, the lead frame substrate for optical semiconductor devices of the present invention will be described.
FIG. 6 is an explanatory view showing an example of a lead frame substrate for an optical semiconductor device according to the present invention.
As shown in FIG. 6, an optical semiconductor device lead frame substrate 4 according to the present invention is an optical semiconductor device lead frame substrate used for manufacturing the above-described lead frame with a reflecting member for an optical semiconductor device. A set of the second member 12 and the third member 13 corresponding to one member 11 is multifaceted on a plane, and the second member 12 and the third member 13 are multifaceted. On the outermost periphery, there is an outer frame portion 41 that holds the second member 12 and the third member 13.
The outer periphery of one set of the second member 12 and the third member 13 is a dicing line 42, and the other set of the second member and the third member adjacent to the set of the second member and the third member is By being separated by the dicing line 42, individual lead frames for optical semiconductor devices are obtained.
The second member 12 and the third member 13 are the same as those described in the above-described lead frame with a reflecting member for an optical semiconductor device, and therefore detailed description thereof is omitted here.

[樹脂付き光半導体装置用リードフレーム基板]
次に、本発明の樹脂付き光半導体装置用リードフレーム基板について説明する。
図7は、本発明に係る樹脂付き光半導体装置用リードフレーム基板の一例を示す説明図である。
図7に示すように、本発明に係る樹脂付き光半導体装置用リードフレーム基板5は、上述の光半導体装置用リードフレーム基板と、前記第2部材12と前記第3部材13との間、および、前記第3部材13の薄肉部13Bの上に形成された絶縁性樹脂14と、を備えたものである。
上述の光半導体装置用リードフレーム基板と同様に、この樹脂付き光半導体装置用リードフレーム基板5においても、一組の第2部材12と第3部材13の外周は、ダイシングライン42になっており、一組の第2部材と第3部材に隣接する他の一組の第2部材と第3部材は、このダイシングライン42で分離されることにより、個々の樹脂付き光半導体装置用リードフレームとなる。
なお、第2部材12、第3部材13、および絶縁性樹脂14については、上述の光半導体装置用反射部材付リードフレームにおいて説明した内容と同様であるので、ここでの詳述は省略する。
[Lead frame substrate for optical semiconductor devices with resin]
Next, the lead frame substrate for an optical semiconductor device with resin of the present invention will be described.
FIG. 7 is an explanatory view showing an example of a lead frame substrate for an optical semiconductor device with a resin according to the present invention.
As shown in FIG. 7, the lead frame substrate 5 for an optical semiconductor device with a resin according to the present invention includes the above-described lead frame substrate for an optical semiconductor device, the second member 12 and the third member 13, and And an insulating resin 14 formed on the thin portion 13B of the third member 13.
Similarly to the above-described lead frame substrate for an optical semiconductor device, also in this lead frame substrate for an optical semiconductor device with resin 5, the outer periphery of the pair of the second member 12 and the third member 13 is a dicing line 42. The other pair of the second member and the third member adjacent to the pair of the second member and the third member are separated by the dicing line 42, so that each lead frame for an optical semiconductor device with resin can be separated from Become.
Since the second member 12, the third member 13, and the insulating resin 14 are the same as those described in the above-described lead frame with a reflecting member for an optical semiconductor device, detailed description thereof is omitted here.

[光半導体装置]
次に、本発明の光半導体装置について説明する。
図8は、本発明に係る光半導体装置の一例を示す説明図であり、(a)は平面図、(b)は(a)のB−B断面図である。
[Optical semiconductor device]
Next, the optical semiconductor device of the present invention will be described.
8A and 8B are explanatory views showing an example of the optical semiconductor device according to the present invention, in which FIG. 8A is a plan view and FIG.

図8に示すように、本発明に係る光半導体装置20は、上述の本発明に係る光半導体装置用反射部材付リードフレームと、前記第1部材11の底側の開口内の前記第2部材12の上面に載置された光半導体素子21と、前記光半導体素子21を封止し、前記光半導体素子21が発する光を透過する透光性樹脂24と、を備えたものである。   As shown in FIG. 8, the optical semiconductor device 20 according to the present invention includes the above-described lead frame with a reflecting member for an optical semiconductor device according to the present invention and the second member in the opening on the bottom side of the first member 11. 12 is provided with an optical semiconductor element 21 placed on the upper surface of 12 and a translucent resin 24 that seals the optical semiconductor element 21 and transmits light emitted from the optical semiconductor element 21.

本発明に係る光半導体装置においては、リードフレームとして、上述の本発明に係る光半導体装置用リードフレームを用いているため、リフレクターとリードフレームのリード部との絶縁性を確保しながらも、反射率が高く、放熱性に優れた光半導体装置とすることができる。   In the optical semiconductor device according to the present invention, since the above-described lead frame for an optical semiconductor device according to the present invention is used as a lead frame, reflection is achieved while ensuring insulation between the reflector and the lead portion of the lead frame. An optical semiconductor device having a high rate and excellent heat dissipation can be obtained.

上述の光半導体素子としては、例えば、従来一般に用いられているLED素子を用いることができる。ここで、LED素子は、発光層として、例えば、GaP、GaAs、GaAlAs、GaAsP、AlInGaP等の化合物半導体単結晶、または、InGaN等の各種GaN系化合物半導体単結晶からなる材料を適宜選ぶことにより、紫外光から赤外光に渡る発光波長を選択することができるものである。   As the above-described optical semiconductor element, for example, a conventionally used LED element can be used. Here, in the LED element, for example, by appropriately selecting a material made of a compound semiconductor single crystal such as GaP, GaAs, GaAlAs, GaAsP, and AlInGaP or various GaN-based compound semiconductor single crystals such as InGaN as the light emitting layer, An emission wavelength ranging from ultraviolet light to infrared light can be selected.

光半導体素子の載置形態としては、例えば、図8に示すように、1個の第2部材13の上面に1個の光半導体素子21が載置され、2本のボンディングワイヤ22により、第2部材13および第3部材14に接続される形態がある。
また、図示はしないが、光半導体素子が、第2部材と第3部材に跨るように載置され、ボンディングワイヤに代えて、半田や、導電性および伝熱性を有する接着剤等によって、第2部材と第3部材に接続される形態(Flip Chip Package)もある。
As a mounting form of the optical semiconductor element, for example, as shown in FIG. 8, one optical semiconductor element 21 is mounted on the upper surface of one second member 13, and two bonding wires 22 are used to There is a form in which the second member 13 and the third member 14 are connected.
Although not shown, the optical semiconductor element is placed so as to straddle the second member and the third member, and instead of the bonding wire, the second is formed by solder, an adhesive having conductivity and heat conductivity, or the like. There is also a form (Flip Chip Package) connected to the member and the third member.

また、上述の図3(a)または図3(b)に示すリードフレームを用いる場合は、1個の第2部材12aまたは12bの上面に2個の光半導体素子が載置され、ボンディングワイヤにより、第2部材と、2個の第3部材13aと13b、または13cと13dに接続される形態が挙げられる。   When the lead frame shown in FIG. 3 (a) or FIG. 3 (b) is used, two optical semiconductor elements are placed on the upper surface of one second member 12a or 12b, and are bonded by bonding wires. The second member and two third members 13a and 13b, or 13c and 13d may be connected.

さらに、上述の図3(c)に示すリードフレームを用いる場合は、2個の第2部材12cおよび12dの上面にそれぞれ光半導体素子が1個載置され、ボンディングワイヤにより、2個の第2部材12c、12dと1個の第3部材13eに接続される形態が挙げられる。   Further, when the lead frame shown in FIG. 3C is used, one optical semiconductor element is mounted on the upper surface of each of the two second members 12c and 12d, and two second semiconductor elements are bonded by bonding wires. The form connected to member 12c, 12d and the one 3rd member 13e is mentioned.

なお、光半導体素子21は、一般に、半田や、伝熱性を有する接着剤23により固定実装される。ここで、半田の代わりにダイボンディングペーストを用いる場合には、耐光性のあるエポキシ樹脂やシリコーン樹脂からなるダイボンディングペーストを選択することが可能である。   Note that the optical semiconductor element 21 is generally fixedly mounted by solder or an adhesive 23 having heat conductivity. Here, when a die bonding paste is used instead of solder, it is possible to select a die bonding paste made of a light-resistant epoxy resin or silicone resin.

また、ボンディングワイヤ22は、例えば、金(Au)等の導電性の良い材料からなり、1本のボンディングワイヤ22により光半導体素子21と第2部材が接続され、別のボンディングワイヤ22により光半導体素子21と第3部材が接続される。
なお、光半導体素子と第2部材、および第3部材との接続には、上述のように、ボンディングワイヤに代えて、半田や、導電性を有する接着剤等によって、第2部材、および第3部材に接続される方法もある。
また、ACF(異方性導電フィルム)、ACP(異方性導電ペースト)、NCF(非導電性フィルム)、またはNCP(非導電性ペースト)等を用いて光半導体素子の端子を第2部材、および第3部材の端子部に直接接続する方法もある。
The bonding wire 22 is made of a material having good conductivity such as gold (Au), for example, and the optical semiconductor element 21 and the second member are connected by one bonding wire 22, and the optical semiconductor is connected by another bonding wire 22. The element 21 and the third member are connected.
Note that, as described above, the connection between the optical semiconductor element and the second member and the third member is performed using solder, a conductive adhesive, or the like instead of the bonding wire. There is also a method of connecting to a member.
Further, the terminal of the optical semiconductor element is formed using the second member using ACF (anisotropic conductive film), ACP (anisotropic conductive paste), NCF (nonconductive film), NCP (nonconductive paste), or the like. There is also a method of directly connecting to the terminal portion of the third member.

次に、透光性樹脂について説明する。
本発明に係る透光性樹脂としては、光の取り出し効率を向上させるために、光半導体素子の発光波長において光透過率が高く、また屈折率が高い材料を選択するのが望ましい。例えば、耐熱性、耐候性、及び機械的強度が高いという特性を満たす樹脂として、エポキシ樹脂やシリコーン樹脂を選択することが可能である。特に、光半導体素子として高輝度LEDを用いる場合、透光性樹脂は強い光にさらされるため、透光性樹脂は高い耐候性を有するシリコーン樹脂からなることが好ましい。
Next, the translucent resin will be described.
As the translucent resin according to the present invention, it is desirable to select a material having a high light transmittance and a high refractive index at the emission wavelength of the optical semiconductor element in order to improve the light extraction efficiency. For example, an epoxy resin or a silicone resin can be selected as a resin that satisfies the characteristics of high heat resistance, weather resistance, and mechanical strength. In particular, when a high-brightness LED is used as the optical semiconductor element, the translucent resin is exposed to strong light, and therefore, the translucent resin is preferably made of a silicone resin having high weather resistance.

なお、第1部材11等、光半導体装置用反射部材付リードフレームを構成する各部材については、上述の光半導体装置用反射部材付リードフレームにおいて説明した内容と同様であるので、ここでの詳述は省略する。   The members constituting the lead frame with a reflecting member for an optical semiconductor device, such as the first member 11, are the same as those described in the above-described lead frame with a reflecting member for an optical semiconductor device. The description is omitted.

[光半導体装置用反射部材付リードフレームの製造方法]
次に、本発明に係る光半導体装置用反射部材付リードフレームの製造方法について説明する。
本発明に係る光半導体装置用反射部材付リードフレームの製造方法は、前記第1部材が平面上に複数多面付けされた第1の基板を形成する工程と、前記第1部材に対応する一組の前記第2部材と前記第3部材が平面上に複数組多面付けされた第2の基板を形成する工程と、前記第2の基板の前記第2部材と前記第3部材の間、および前記第3部材の接続部と薄肉部の段差を埋めるように前記絶縁性樹脂を形成する工程と、前記第1の基板の複数の第1部材と対応する前記第2の基板の各第2部材とを位置合わせして、前記第1の基板の複数の前記第1部材の各底面の一部と前記第2の基板の各第2部材における前記第1部材側の面とを圧着し、多面付けされた光半導体装置用反射部材付リードフレームを形成する工程と、を備えることを特徴とする。
[Method for Manufacturing Lead Frame with Reflective Member for Optical Semiconductor Device]
Next, a method for manufacturing a lead frame with a reflecting member for an optical semiconductor device according to the present invention will be described.
A method of manufacturing a lead frame with a reflecting member for an optical semiconductor device according to the present invention includes a step of forming a first substrate in which a plurality of first members are provided on a plane, and a set corresponding to the first member. Forming a second substrate having a plurality of sets of the second member and the third member on a plane, between the second member and the third member of the second substrate, and the Forming the insulating resin so as to fill a step between the connection portion and the thin portion of the third member; and each second member of the second substrate corresponding to the plurality of first members of the first substrate; Are aligned, and a part of each bottom surface of each of the plurality of first members of the first substrate and a surface on the first member side of each second member of the second substrate are pressure-bonded to form multiple surfaces Forming a lead frame with a reflecting member for an optical semiconductor device. To do.

まず、上述の製造方法における第1の基板を形成する工程について説明する。
図9は、本発明に係る光半導体装置用反射部材付リードフレームの一例の製造工程における第1の基板を示す説明図である。
図9に示すように、平板状の第1の基板30には、第1部材11が多面付けされており、最外周には、前記第1部材11を保持する外枠部31が設けられている。そして、隣接する第1部材11と第1部材11の間は、個々の光半導体装置に分離されるためのダイシングライン32になっている。
First, the process of forming the first substrate in the above manufacturing method will be described.
FIG. 9 is an explanatory view showing the first substrate in the manufacturing process of an example of the lead frame with a reflecting member for an optical semiconductor device according to the present invention.
As shown in FIG. 9, the flat plate-like first substrate 30 is provided with the first member 11 in multiple faces, and an outer frame portion 31 for holding the first member 11 is provided on the outermost periphery. Yes. And between the adjoining 1st member 11 and the 1st member 11, it becomes the dicing line 32 for isolate | separating into each optical semiconductor device.

第1の基板30を構成する材料は、第1部材11を構成する材料と同じであり、例えば、銅(Cu)、銅合金、42合金(Ni40.5%〜43%のFe合金)等からなる金属基板を使用することができる。また、第1の基板30の厚みは、例えば、0.05mm〜0.5mmの範囲である。   The material constituting the first substrate 30 is the same as the material constituting the first member 11, for example, from copper (Cu), copper alloy, 42 alloy (Ni 40.5% to 43% Fe alloy), or the like. A metal substrate can be used. Moreover, the thickness of the 1st board | substrate 30 is the range of 0.05 mm-0.5 mm, for example.

また、第1の基板30における第1部材11の開口側面には、銀(Ag)を含むめっき膜が形成されていることが好ましい。光半導体素子からの光を、より効率良く反射することができるからである。なお、前記めっき膜は、第1の基板30の表面全体に形成されていても良い。
前記めっき膜の厚みは、例えば、0.02μm〜12μmの範囲である。
Moreover, it is preferable that a plating film containing silver (Ag) is formed on the opening side surface of the first member 11 in the first substrate 30. This is because the light from the optical semiconductor element can be reflected more efficiently. Note that the plating film may be formed on the entire surface of the first substrate 30.
The thickness of the plating film is, for example, in the range of 0.02 μm to 12 μm.

上述のような第1の基板30は、エッチング法やプレス法等の加工方法を用いて金属基板等を加工することで形成することができる。
例えば、第1の基板30の材料として、銅を用いる場合、感光性レジストを塗布し、露光現像してパターニングした後に、エッチング液に塩化第二鉄水溶液を使用して、スプレーエッチングで加工することができる。
The first substrate 30 as described above can be formed by processing a metal substrate or the like using a processing method such as an etching method or a press method.
For example, when copper is used as the material of the first substrate 30, a photosensitive resist is applied, exposed and developed, patterned, and then processed by spray etching using an aqueous ferric chloride solution as an etching solution. Can do.

なお、本発明において第1部材は、天側の開口が底側の開口よりも大きくなるように開口側面が傾斜している枠状構造を有するが、例えば、上記のようにエッチング法で第1の基板30を加工する場合には、そのエッチング条件(スプレー圧や温度等)を調整することにより、前記開口側面の傾斜を所望の形状に形成することができる。   In the present invention, the first member has a frame-like structure in which the opening side surface is inclined so that the opening on the top side is larger than the opening on the bottom side. When processing the substrate 30, the inclination of the opening side surface can be formed in a desired shape by adjusting the etching conditions (spray pressure, temperature, etc.).

また、上述のような銀を含むめっき膜を形成する場合は、例えば、シアン化銀を主成分とした銀めっき液を用いた電解めっきを施すことにより、第1の基板30の表面に、めっき膜を形成することができる。
なお、前記めっき膜を形成する前に、例えば、電解脱脂工程、酸洗工程、銅ストライク工程、を適宜選択し、その後、電解めっき工程を経てめっき膜を形成してもよい。
Further, when forming a plating film containing silver as described above, for example, plating is performed on the surface of the first substrate 30 by performing electrolytic plating using a silver plating solution mainly composed of silver cyanide. A film can be formed.
In addition, before forming the plating film, for example, an electrolytic degreasing process, a pickling process, and a copper strike process may be appropriately selected, and then the plating film may be formed through an electrolytic plating process.

次に、上述の製造方法における第2の基板を形成する工程について説明する。
図10は、本発明に係る光半導体装置用反射部材付リードフレームの一例の製造工程における第2の基板を示す説明図であり、(a)は樹脂形成前の状態を示し、(b)は樹脂形成後の状態を示す。
Next, the process of forming the second substrate in the above manufacturing method will be described.
FIG. 10 is an explanatory view showing a second substrate in a manufacturing process of an example of a lead frame with a reflecting member for an optical semiconductor device according to the present invention, wherein (a) shows a state before resin formation, (b) The state after resin formation is shown.

まず、図10(a)に示すように、第2の基板40には、上述の第1の基板30に多面付けされたそれぞれの第1部材11に対応する、一組の第2部材12と第3部材13が、平面上に複数組多面付けされており、前記第2部材12と前記第3部材13が多面付けされている最外周には、前記第2部材12および前記第3部材13を保持する外枠部41が設けられている。そして、一組の第2部材12と第3部材13の外周は、個々の光半導体装置に分離されるためのダイシングライン42になっている。
すなわち、図10(a)に示す第2の基板40は、上述の図6に示す光半導体装置用リードフレーム基板4と同じ構成要素を有するものである。
First, as shown in FIG. 10A, the second substrate 40 includes a pair of second members 12 corresponding to the first members 11 that are multi-faced to the first substrate 30 described above. A plurality of third members 13 are multifaceted on a plane, and the second member 12 and the third member 13 are disposed on the outermost periphery where the second member 12 and the third member 13 are multifaceted. Is provided. The outer periphery of the pair of second member 12 and third member 13 is a dicing line 42 for separation into individual optical semiconductor devices.
That is, the second substrate 40 shown in FIG. 10A has the same components as those of the lead frame substrate 4 for optical semiconductor devices shown in FIG.

第2の基板40を構成する材料は、第2部材12、および第3部材13を構成する材料と同じであり、例えば、銅(Cu)、銅合金、42合金(Ni40.5%〜43%のFe合金)等からなる金属基板を使用することができる。第2の基板40の厚みは、例えば、0.05mm〜0.5mmの範囲である。   The material which comprises the 2nd board | substrate 40 is the same as the material which comprises the 2nd member 12 and the 3rd member 13, for example, copper (Cu), a copper alloy, 42 alloy (Ni40.5%-43%) A metal substrate made of an Fe alloy) or the like can be used. The thickness of the second substrate 40 is, for example, in the range of 0.05 mm to 0.5 mm.

また、第2の基板40における第2部材12の上面、および第3部材13の段差上面には、銀(Ag)を含むめっき膜が形成されていることが好ましい。光半導体素子からの光を、より効率良く反射することができるからである。なお、前記めっき膜は、第2の基板40の表面全体に形成されていても良い。
前記めっき膜の厚みは、例えば、0.02μm〜12μmの範囲である。
In addition, a plating film containing silver (Ag) is preferably formed on the upper surface of the second member 12 and the upper surface of the third member 13 in the second substrate 40. This is because the light from the optical semiconductor element can be reflected more efficiently. The plating film may be formed on the entire surface of the second substrate 40.
The thickness of the plating film is, for example, in the range of 0.02 μm to 12 μm.

上述のような第2の基板40は、エッチング法やプレス法等の加工方法を用いて金属基板等を加工することで形成することができる。
例えば、第2の基板40の材料として、銅を用いる場合、感光性レジストを塗布し、露光現像してパターニングした後に、エッチング液に塩化第二鉄水溶液を使用して、スプレーエッチングで加工することができる。
The second substrate 40 as described above can be formed by processing a metal substrate or the like using a processing method such as an etching method or a press method.
For example, when copper is used as the material of the second substrate 40, a photosensitive resist is applied, exposed and developed, patterned, and then processed by spray etching using an aqueous ferric chloride solution as an etchant. Can do.

なお、本発明において第3部材13は、上述のように、接続部13Aと、前記接続部よりも厚さの薄い薄肉部13Bとを有するが、このような段差構造は、例えば、第2の基板40をハーフエッチング加工することで得ることができる。   In the present invention, as described above, the third member 13 includes the connecting portion 13A and the thin-walled portion 13B having a thickness smaller than that of the connecting portion. It can be obtained by half-etching the substrate 40.

また、上述のような銀を含むめっき膜を形成する場合は、例えば、シアン化銀を主成分とした銀めっき液を用いた電解めっきを施すことにより、第2の基板40の表面に、めっき膜を形成することができる。
なお、前記めっき膜を形成する前に、例えば、電解脱脂工程、酸洗工程、銅ストライク工程、を適宜選択し、その後、電解めっき工程を経てめっき膜を形成してもよい。
Moreover, when forming the plating film containing silver as described above, for example, plating is performed on the surface of the second substrate 40 by performing electroplating using a silver plating solution mainly composed of silver cyanide. A film can be formed.
In addition, before forming the plating film, for example, an electrolytic degreasing process, a pickling process, and a copper strike process may be appropriately selected, and then the plating film may be formed through an electrolytic plating process.

次に、図10(b)に示すように、第2の基板40の第2部材12と第3部材13の間、および第3部材13の薄肉部13Bの上には、絶縁性樹脂14が形成される。
絶縁性樹脂14の形成は、例えば、所望の形状に加工した金型を用いて、熱可塑性樹脂を射出成型またはトランスファ成型することにより形成することができ、これにより、第2の基板40と絶縁性樹脂14とが一体に結合される。
なお、図10(b)に示す樹脂付き第2の基板50は、上述の図7に示す樹脂付き光半導体装置用リードフレーム基板5と同じ構成要素を有するものである。
Next, as shown in FIG. 10B, the insulating resin 14 is placed between the second member 12 and the third member 13 of the second substrate 40 and on the thin portion 13 </ b> B of the third member 13. It is formed.
The insulating resin 14 can be formed, for example, by injection molding or transfer molding of a thermoplastic resin using a mold that has been processed into a desired shape, thereby insulating the second substrate 40 from insulation. The conductive resin 14 is integrally bonded.
The second substrate 50 with resin shown in FIG. 10B has the same components as the lead frame substrate 5 for optical semiconductor device with resin shown in FIG. 7 described above.

次に、本発明の製造工程における前記第1の基板と前記絶縁性樹脂を形成した前記第2の基板とを圧着し、多面付けされた光半導体装置用反射部材付リードフレームを形成する工程について説明する。
本発明においては、前記第1の基板30と前記樹脂付き第2の基板50とを位置合わせして、前記第1の基板30の複数の前記第1部材11の各底面の一部と、それぞれ対応する前記樹脂付き第2の基板50の各第2部材13における前記第1部材側の面とを圧着し、多面付けされた光半導体装置用反射部材付リードフレーム60を形成する。
なお、前記第1の基板30と前記樹脂付き第2の基板50との位置合わせは、公知の方法で行えばよい。また、前記第1の基板30と前記樹脂付き第2の基板50との圧着は、公知の方法、例えば、両者を上記所定の面で接触させた後に、両者の接触面とは反対側の面から圧力をかける方法により行うことができる。
Next, the step of press-bonding the first substrate and the second substrate on which the insulating resin is formed in the manufacturing process of the present invention to form a multifaceted lead frame with a reflecting member for an optical semiconductor device. explain.
In the present invention, the first substrate 30 and the second substrate with resin 50 are aligned, a part of each bottom surface of the plurality of first members 11 of the first substrate 30, and The second member 13 of the corresponding second substrate 50 with resin is pressure-bonded to the surface on the first member side to form a multi-faced lead frame 60 with a reflecting member for an optical semiconductor device.
The alignment between the first substrate 30 and the second substrate 50 with resin may be performed by a known method. Further, the first substrate 30 and the second substrate 50 with resin may be pressure-bonded by a known method, for example, a surface opposite to the contact surface between the two after contacting them on the predetermined surface. The pressure can be applied by a method of applying pressure.

図11は、本発明に係る光半導体装置用反射部材付リードフレームの一例の製造工程における第1の基板と樹脂形成後の第2の基板を圧着した状態を示す説明図である。
図11に示すように、圧着後の第1の基板30の複数の第1部材11の開口からは、それぞれ対応する樹脂付き第2の基板50の一組の第2部材12の上面の一部、第3部材13の接続部13A、および、絶縁性樹脂14の一部が露出している。
すなわち、図11は、本発明に係る光半導体装置用反射部材付リードフレーム1が、平板状に多面付けされた形態を示しており、例えば、ダイシングライン32で切断(ダイシング)されることによって、多面付け光半導体装置用反射部材付リードフレーム60から、個片化された個々の光半導体装置用反射部材付リードフレーム1を得ることができる。
なお、本発明に係る光半導体装置用反射部材付リードフレームを用いて光半導体装置を製造する方法としては、例えば、光半導体装置用反射部材付リードフレームを個片化した後に半導体素子載置工程を行う方法や、光半導体装置用反射部材付リードフレームが多面付けされた状態で半導体素子載置工程を行う方法があり、本発明においては、いずれの方法も用いることができるが、製造効率の面から、後述の多面付けされた状態で半導体素子載置工程を行う方法が好ましい。
FIG. 11 is an explanatory view showing a state in which the first substrate and the second substrate after resin formation are pressure-bonded in the manufacturing process of an example of the lead frame with a reflecting member for an optical semiconductor device according to the present invention.
As shown in FIG. 11, from the openings of the plurality of first members 11 of the first substrate 30 after crimping, a part of the upper surface of the pair of second members 12 corresponding to the second substrate 50 with resin, respectively. The connecting portion 13A of the third member 13 and a part of the insulating resin 14 are exposed.
That is, FIG. 11 shows a form in which the lead frame 1 with a reflecting member for an optical semiconductor device according to the present invention is multifaceted in a flat plate shape. For example, by cutting (dicing) at a dicing line 32, FIG. From the lead frame 60 with a reflecting member for a multi-sided optical semiconductor device, the individual lead frames 1 with a reflecting member for an optical semiconductor device can be obtained.
In addition, as a method for manufacturing an optical semiconductor device using the lead frame with a reflecting member for an optical semiconductor device according to the present invention, for example, after the lead frame with a reflecting member for an optical semiconductor device is singulated, a semiconductor element mounting step And a method of performing a semiconductor element mounting step in a state where the lead frame with a reflecting member for an optical semiconductor device is applied in multiple faces. In the present invention, either method can be used. From the surface, a method of performing the semiconductor element mounting step in a multifaceted state described later is preferable.

次に、上述の本発明に係る光半導体装置用反射部材付リードフレームの一例の製造工程を、各工程における断面図を用いて説明する。
図12は、本発明に係る光半導体装置用リードフレームの製造方法の一例を示す模式的工程図である。
Next, a manufacturing process of an example of the above-described lead frame with a reflecting member for an optical semiconductor device according to the present invention will be described with reference to cross-sectional views in each process.
FIG. 12 is a schematic process chart showing an example of a method for manufacturing a lead frame for an optical semiconductor device according to the present invention.

まず、図12(a)に示すように、平板状の第2の基板材料40Aを準備し、上述のエッチング法やプレス法により所望の形状に加工して、一組の第2部材12と第3部材13が平面上に複数組多面付けされた第2の基板40を形成する(図12(b))。なお、図示はしないが、上述のように、電解めっき法により、第2の基板40の表面に銀を含むめっき膜を形成しても良い。   First, as shown in FIG. 12A, a flat plate-like second substrate material 40A is prepared, processed into a desired shape by the above-described etching method or pressing method, and a pair of the second member 12 and the first member 12A. A second substrate 40 having a plurality of sets of three members 13 formed on a plane is formed (FIG. 12B). Although not shown, a plating film containing silver may be formed on the surface of the second substrate 40 by electrolytic plating as described above.

次に、図12(c)に示すように、第2の基板40の第2部材12と第3部材13の間、および第3部材13の接続部13Aと薄肉部13Bの段差を埋めるように、絶縁性樹脂14を形成する。成型方法には、上述のように、所望の形状に加工した金型を用いて、熱可塑性樹脂を射出成型またはトランスファ成型する方法を用いることができる。   Next, as shown in FIG. 12C, the step between the second member 12 and the third member 13 of the second substrate 40 and between the connecting portion 13A and the thin portion 13B of the third member 13 is filled. Then, the insulating resin 14 is formed. As the molding method, as described above, a method of injection molding or transfer molding of a thermoplastic resin using a mold processed into a desired shape can be used.

次に、図12(d)に示すように、別途、エッチング法等で形成した第1の基板30と、前記絶縁性樹脂14を形成した第2の基板(樹脂付き第2の基板50)とを、位置合わせし、第1の基板30の複数の第1部材11の底面の一部と、それぞれ対応する樹脂付き第2の基板50の各第2部材12における前記第1部材側の面とを圧着して、多面付けされた形態の本発明に係る光半導体装置用反射部材付リードフレーム60を得る(図12(e))。   Next, as shown in FIG. 12D, a first substrate 30 separately formed by an etching method or the like, and a second substrate (second substrate 50 with resin) on which the insulating resin 14 is formed, Are aligned, and a part of the bottom surface of the plurality of first members 11 of the first substrate 30 and the surface on the first member side of each second member 12 of the corresponding second substrate 50 with resin, To obtain a lead frame 60 with a reflecting member for an optical semiconductor device according to the present invention in a multi-faced form (FIG. 12E).

上述のように、本発明に係る光半導体装置用反射部材付リードフレームの製造方法によれば、第1部材が平面上に複数多面付けされた第1の基板と、前記第1部材に対応する一組の前記第2部材と前記第3部材が平面上に複数組多面付けされた樹脂付き第2の基板とを、位置合わせして圧着することで、複数個の本発明に係る光半導体装置用反射部材付リードフレームを一括して製造することができる。
また、前記第1の基板、および前記樹脂付き第2の基板とも、互いに圧着される面は平坦であるため、突起形状がある場合に比べて、位置合わせや圧着は容易である。
それゆえ、本発明によれば、生産性良く、光半導体装置用反射部材付リードフレームを製造することができる。
As described above, according to the method of manufacturing a lead frame with a reflecting member for an optical semiconductor device according to the present invention, the first member corresponds to the first member having a plurality of first surfaces on a plane and the first member. A plurality of optical semiconductor devices according to the present invention are obtained by aligning and press-bonding a pair of second members and a third substrate with a plurality of sets of the second members and a plurality of sets of the third members on a plane. The lead frame with a reflective member for use can be manufactured collectively.
In addition, since the surfaces to which the first substrate and the second substrate with resin are pressed are flat, alignment and pressure bonding are easier than in the case where there is a protruding shape.
Therefore, according to the present invention, a lead frame with a reflecting member for an optical semiconductor device can be manufactured with high productivity.

また、本発明に係る光半導体装置用反射部材付リードフレームの製造方法により得られる光半導体装置用反射部材付リードフレームは、リフレクター(第1部材)とリードフレームのリード部(第3部材)との絶縁性を確保しながらも、反射率が高く、放熱性に優れたものになっている。   The lead frame with a reflecting member for an optical semiconductor device obtained by the method for manufacturing a lead frame with a reflecting member for an optical semiconductor device according to the present invention includes a reflector (first member) and a lead portion (third member) of the lead frame. While ensuring the insulating property, the reflectance is high and the heat dissipation is excellent.

より詳しく説明すると、本発明に係る光半導体装置用反射部材付リードフレームの製造方法により得られる光半導体装置用反射部材付リードフレームは、金属材料のように光反射性と放熱性を備えた材料からなる枠状構造の第1部材を、リフレクターとして用いることにより、反射率が高い光半導体装置用反射部材付リードフレームとすることができる。   More specifically, the lead frame with a reflecting member for an optical semiconductor device obtained by the method for manufacturing a lead frame with a reflecting member for an optical semiconductor device according to the present invention is a material having light reflectivity and heat dissipation like a metal material. By using the first member having a frame-like structure made of as a reflector, a lead frame with a reflecting member for an optical semiconductor device having high reflectivity can be obtained.

また、本発明に係る光半導体装置用反射部材付リードフレームの製造方法により得られる光半導体装置用反射部材付リードフレームにおいては、上述の特許文献3に記載されているような、絶縁性確保のために金属リフレクターの底部を一部削除して段差を形成したリードフレームとは異なり、リフレクターに相当する第1部材の底面には段差が無く、第2部材の素子載置面まで開口側面が形成されているため、光半導体素子からの光を効率よく反射することができる。   Further, in the lead frame with a reflecting member for an optical semiconductor device obtained by the method for manufacturing a lead frame with a reflecting member for an optical semiconductor device according to the present invention, insulation as described in Patent Document 3 described above is ensured. Therefore, unlike the lead frame in which the bottom of the metal reflector is partially removed to form a step, there is no step on the bottom surface of the first member corresponding to the reflector, and the opening side surface is formed up to the element mounting surface of the second member Therefore, the light from the optical semiconductor element can be reflected efficiently.

また、本発明に係る光半導体装置用反射部材付リードフレームの製造方法により得られる光半導体装置用反射部材付リードフレームにおいては、リフレクターとして機能する第1部材と、主にリードフレームのダイパッド部として機能する第2部材が圧着されているため、第2部材に載置される光半導体素子からの熱を、第2部材から第1部材に効率良く伝達させることができ、かつ、第1部材から効率良く放熱させることができるので、放熱性に優れた光半導体装置用反射部材付リードフレームとすることができる。   In the lead frame with a reflecting member for an optical semiconductor device obtained by the method for manufacturing a lead frame with a reflecting member for an optical semiconductor device according to the present invention, a first member that functions as a reflector and a die pad part of the lead frame mainly. Since the functioning second member is pressure-bonded, the heat from the optical semiconductor element placed on the second member can be efficiently transferred from the second member to the first member, and from the first member Since heat can be efficiently radiated, a lead frame with a reflecting member for an optical semiconductor device having excellent heat dissipation can be obtained.

[光半導体装置の製造方法]
次に、本発明に係る光半導体装置の製造方法について、説明する。
図13は、本発明に係る光半導体装置の製造方法の一例を示す模式的工程図である。
また、図14は、本発明に係る光半導体装置の一例の製造工程における光半導体素子を載置した状態を示す説明図である。
[Method for Manufacturing Optical Semiconductor Device]
Next, a method for manufacturing an optical semiconductor device according to the present invention will be described.
FIG. 13 is a schematic process diagram showing an example of a method of manufacturing an optical semiconductor device according to the present invention.
Moreover, FIG. 14 is explanatory drawing which shows the state which mounted the optical semiconductor element in the manufacturing process of an example of the optical semiconductor device based on this invention.

本発明に係る光半導体装置の製造方法は、上述の光半導体装置用反射部材付リードフレームの製造方法により得られた多面付けされた光半導体装置用反射部材付リードフレームの前記第2部材における前記第1部材側の面に光半導体素子を載置する工程と、前記第1部材の開口に前記透光性樹脂を充填し、前記光半導体素子を封止して多面付けされた光半導体装置を得る工程と、前記多面付けされた光半導体装置を個片化して個々の光半導体装置を得る工程と、を備えることを特徴とする。   The manufacturing method of the optical semiconductor device according to the present invention is the above-described second member of the multi-sided lead frame with a reflecting member for an optical semiconductor device obtained by the above-described manufacturing method of the lead frame with a reflecting member for an optical semiconductor device. A step of placing an optical semiconductor element on the surface of the first member; and an optical semiconductor device in which the opening of the first member is filled with the translucent resin and the optical semiconductor element is sealed to be multifaceted And obtaining the individual optical semiconductor devices by dividing the multi-faced optical semiconductor devices into individual pieces.

本発明に係る光半導体装置の製造方法としては、まず、図13(a)に示すように、上述の製造方法により得られた多面付け光半導体装置用反射部材付リードフレーム60を準備し、次いで、第1部材11の開口内の第2部材12の上面に、半田、または伝熱性を有する接着剤23を介して光半導体素子21を載置し、ボンディングワイヤ22により、光半導体素子21と第2部材12、および、光半導体素子21と第3部材13とを電気的に接続する。(図13(b))。   As an optical semiconductor device manufacturing method according to the present invention, first, as shown in FIG. 13A, a lead frame 60 with a reflecting member for a multi-sided optical semiconductor device obtained by the above-described manufacturing method is prepared, and then The optical semiconductor element 21 is placed on the upper surface of the second member 12 in the opening of the first member 11 via solder or a heat conductive adhesive 23, and the optical semiconductor element 21 and the first semiconductor element 21 are bonded to each other by the bonding wire 22. The two members 12 and the optical semiconductor element 21 and the third member 13 are electrically connected. (FIG. 13B).

ここで、第3部材13は、接続部13Aと薄肉部13Bからなる段差構造を有しているため、接続部13Aの上面を、第2部材12の上面と同じ高さ位置にしておけば、ボンディングワイヤ22による接続は容易になる。   Here, since the third member 13 has a step structure composed of the connecting portion 13A and the thin portion 13B, if the upper surface of the connecting portion 13A is at the same height as the upper surface of the second member 12, Connection by the bonding wire 22 is facilitated.

なお、この図13(b)における状態の平面図が図14に相当する。
図14に示すように、第1の基板30に多面付けされた複数個の第1部材11の開口内の第2部材12の上面には、光半導体素子21が載置され、ボンディングワイヤ22により、光半導体素子21と第2部材12、および、光半導体素子21と第3部材13とが、電気的に接続されている。
Note that the plan view of the state in FIG. 13B corresponds to FIG.
As shown in FIG. 14, an optical semiconductor element 21 is placed on the upper surface of the second member 12 in the openings of the plurality of first members 11 that are multifaceted to the first substrate 30, and is bonded by bonding wires 22. The optical semiconductor element 21 and the second member 12 and the optical semiconductor element 21 and the third member 13 are electrically connected.

次に、図13(c)に示すように、第1部材11の開口に透光性樹脂24を充填して光半導体素子21を封止し、次いで、第1の基板30および第2の基板40を、ダイシングライン32で切断(ダイシング)して、個片化された個々の光半導体装置20を得る(図13(d)、(e))。   Next, as shown in FIG. 13C, the opening of the first member 11 is filled with a translucent resin 24 to seal the optical semiconductor element 21, and then the first substrate 30 and the second substrate 40 is cut (diced) by a dicing line 32 to obtain individual optical semiconductor devices 20 separated into individual pieces (FIGS. 13D and 13E).

上述のように、本発明によれば、前記光半導体装置用反射部材付リードフレームの製造方法により得られた多面付け光半導体装置用反射部材付リードフレームを用いて、複数個の光半導体装置を一括して製造することができる。
ここで、前記多面付け光半導体装置用反射部材付リードフレームは、従来の平板状のリードフレームに樹脂製のリフレクターを形成したリードフレームと同様に扱えるため、従来と同様な自動化ラインを用いて、本発明に係る光半導体装置を一括して製造することができる。
すなわち、特殊な専用ラインを新たに導入する必要がないため、生産コストの上昇を抑制することができる。
As described above, according to the present invention, a plurality of optical semiconductor devices are manufactured using the lead frame with a reflecting member for a multi-sided optical semiconductor device obtained by the method for manufacturing a lead frame with a reflecting member for an optical semiconductor device. Can be manufactured in batch.
Here, the lead frame with a reflecting member for a multi-sided optical semiconductor device can be handled in the same manner as a conventional lead frame in which a resin-made reflector is formed on a flat plate-like lead frame. The optical semiconductor devices according to the present invention can be manufactured collectively.
That is, since it is not necessary to newly introduce a special dedicated line, an increase in production cost can be suppressed.

また、本発明に係る光半導体装置用反射部材付リードフレームは、従来の樹脂製のリフレクターを有するリードフレームに比べて、反射率が高く、放熱性に優れたものであるため、本発明に係る光半導体装置も、従来の樹脂製のリフレクターを有する光半導体装置に比べて、反射率が高く、放熱性に優れたものになる。   In addition, the lead frame with a reflecting member for an optical semiconductor device according to the present invention has higher reflectivity and excellent heat dissipation than a conventional lead frame having a resin reflector. The optical semiconductor device also has higher reflectivity and excellent heat dissipation than an optical semiconductor device having a conventional resin reflector.

以上、本発明の光半導体装置用反射部材付リードフレーム、光半導体装置用リードフレーム、光半導体装置用リードフレーム基板、光半導体装置、および、光半導体装置用反射部材付リードフレームの製造方法、並びに、光半導体装置の製造方法について説明したが、本発明は、上記実施形態に限定されるものではない。上記実施形態は例示であり、本発明の特許請求の範囲に記載された技術的思想と、実質的に同一の構成を有し、同様な作用効果を奏するものは、いかなる場合であっても本発明の技術的範囲に包含される。   As described above, the lead frame with a reflecting member for an optical semiconductor device, the lead frame for an optical semiconductor device, the lead frame substrate for an optical semiconductor device, the optical semiconductor device, the method for manufacturing the lead frame with a reflecting member for an optical semiconductor device, and The manufacturing method of the optical semiconductor device has been described, but the present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the technical idea described in the claims of the present invention has substantially the same configuration and exhibits the same function and effect regardless of the case. It falls within the technical scope of the invention.

1・・・光半導体装置用反射部材付リードフレーム
2・・・光半導体装置用リードフレーム
3・・・樹脂付き光半導体装置用リードフレーム
4・・・光半導体装置用リードフレーム基板
5・・・樹脂付き光半導体装置用リードフレーム基板
11・・・第1部材
11a・・・開口側面
12、12a、12b、12c・・・第2部材
13、13a、13b、13c、13d、13e・・・第3部材
13A・・・接続部
13B・・・薄肉部
14・・・絶縁性樹脂
20・・・光半導体装置
21・・・光半導体素子
22・・・ボンディングワイヤ
23・・・接着剤
24・・・透光性樹脂
30・・・第1の基板
31・・・外枠部
32・・・ダイシングライン
40・・・第2の基板
40A・・・第2の基板材料
41・・・外枠部
42・・・ダイシングライン
50・・・樹脂付き第2の基板
60・・・多面付け光半導体装置用反射部材付リードフレーム
DESCRIPTION OF SYMBOLS 1 ... Lead frame with reflection member for optical semiconductor devices 2 ... Lead frame for optical semiconductor devices 3 ... Lead frame for optical semiconductor devices with resin 4 ... Lead frame substrate for optical semiconductor devices 5 ... Lead frame substrate for optical semiconductor device with resin 11... First member 11 a... Open side surface 12, 12 a, 12 b, 12 c... Second member 13, 13 a, 13 b, 13 c, 13 d, 13 e. Three members 13A ... Connection part 13B ... Thin part 14 ... Insulating resin 20 ... Optical semiconductor device 21 ... Optical semiconductor element 22 ... Bonding wire 23 ... Adhesive 24 ... -Translucent resin 30 ... 1st board | substrate 31 ... Outer frame part 32 ... Dicing line 40 ... 2nd board | substrate 40A ... 2nd board | substrate material 41 ... Outer frame part 42 ... Lee Sing line 50 ... resin with the second substrate 60 ... multi with optical semiconductor device for reflecting member with lead frame

Claims (11)

金属材料から構成され、天側の開口が底側の開口よりも大きくなるように開口側面が傾斜している枠状構造を有する第1部材と、
金属材料から構成され、前記第1部材の前記枠状構造の底面の一部に固着されている第2部材と、
金属材料から構成され、
接続部と、前記接続部よりも厚さの薄い薄肉部とからなる段差構造を有し、
平面視上、
前記接続部が前記第1部材の底側の開口内に配置され、
前記薄肉部が前記第1部材の前記枠状構造の底面の下に配置されている第3部材と、
を備え、
絶縁性樹脂が、
前記第3部材と前記第1部材とが絶縁されるように、前記第3部材の薄肉部と前記第1部材の枠状構造の底面との間に介在し、かつ、
前記第3部材と前記第2部材とが絶縁されるように、前記第3部材と前記第2部材との間に介在し、
前記第1部材の前記枠状構造の底面には段差が無く、
前記第1部材の前記枠状構造の底面と対応する前記第2部材の面は平坦であり、
前記第1部材の前記枠状構造の底面と、該底面と対応する前記第2部材の面が、直接固着されていることを特徴とする光半導体装置用反射部材付リードフレーム。
A first member made of a metal material and having a frame-like structure in which the opening side surface is inclined so that the opening on the top side is larger than the opening on the bottom side;
A second member made of a metal material and fixed to a part of the bottom surface of the frame-like structure of the first member;
Composed of metal material,
It has a step structure composed of a connection part and a thin part having a thickness smaller than that of the connection part,
In plan view,
The connecting portion is disposed in an opening on a bottom side of the first member;
A third member in which the thin portion is disposed below the bottom surface of the frame-like structure of the first member;
With
Insulating resin
Interposed between the thin portion of the third member and the bottom surface of the frame-like structure of the first member so that the third member and the first member are insulated; and
Interposed between the third member and the second member so that the third member and the second member are insulated;
There is no step on the bottom surface of the frame-like structure of the first member,
The surface of the second member corresponding to the bottom surface of the frame-like structure of the first member is flat,
A lead frame with a reflecting member for an optical semiconductor device, wherein a bottom surface of the frame-like structure of the first member and a surface of the second member corresponding to the bottom surface are directly fixed.
前記第1部材の開口側面に、銀を含むめっき膜が形成されていることを特徴とする請求項1に記載の光半導体装置用反射部材付リードフレーム。   The lead frame with a reflecting member for an optical semiconductor device according to claim 1, wherein a plating film containing silver is formed on an opening side surface of the first member. 前記第2部材における前記第1部材側の面、および前記第3部材の接続部における前記第1部材側の面に、銀を含むめっき膜が形成されていることを特徴とする請求項1または請求項2に記載の光半導体装置用反射部材付リードフレーム。   The plating film containing silver is formed in the surface at the said 1st member side in the said 2nd member, and the surface at the said 1st member side in the connection part of the said 3rd member, The Claim 1 characterized by the above-mentioned. The lead frame with a reflecting member for an optical semiconductor device according to claim 2. 1個の前記第1部材に対して、前記第2部材または前記第3部材のいずれかを複数個、あるいはその両方を複数個有することを特徴とする請求項1乃至請求項3のいずれか一項に記載の光半導体装置用反射部材付リードフレーム。   4. The apparatus according to claim 1, wherein the first member includes a plurality of the second members or the third members, or a plurality of both of the second members and the third members. 5. A lead frame with a reflecting member for an optical semiconductor device according to the item. 請求項1乃至請求項4のいずれか一項に記載の光半導体装置用反射部材付リードフレームに用いられる光半導体装置用リードフレームであって、前記第2部材と、前記第3部材と、を有することを特徴とする光半導体装置用リードフレーム。   An optical semiconductor device lead frame used in the lead frame with a reflecting member for an optical semiconductor device according to any one of claims 1 to 4, wherein the second member and the third member are A lead frame for an optical semiconductor device, comprising: 請求項5に記載の光半導体装置用リードフレームと、
前記第2部材と前記第3部材との間、および、前記第3部材の薄肉部上に形成された絶縁性樹脂と、
を備えたことを特徴とする樹脂付き光半導体装置用リードフレーム。
A lead frame for an optical semiconductor device according to claim 5,
An insulating resin formed between the second member and the third member and on the thin portion of the third member;
A lead frame for an optical semiconductor device with a resin, comprising:
請求項1乃至請求項4のいずれか一項に記載の光半導体装置用反射部材付リードフレームの製造に用いられる光半導体装置用リードフレーム基板であって、
前記第1部材に対応する一組の前記第2部材と前記第3部材とが平面上に複数組多面付けされており、前記第2部材と前記第3部材とが多面付けされている最外周には、前記第2部材および前記第3部材を保持する外枠部を有することを特徴とする光半導体装置用リードフレーム基板。
A lead frame substrate for an optical semiconductor device used for manufacturing a lead frame with a reflecting member for an optical semiconductor device according to any one of claims 1 to 4,
A plurality of sets of the second member and the third member corresponding to the first member are multi-faceted on a plane, and the outermost periphery where the second member and the third member are multi-faceted The lead frame substrate for an optical semiconductor device has an outer frame portion for holding the second member and the third member.
請求項7に記載の光半導体装置用リードフレーム基板と、
前記第2部材と前記第3部材との間、および、前記第3部材の薄肉部上に形成された絶縁性樹脂と、
を備えたことを特徴とする樹脂付き光半導体装置用リードフレーム基板。
A lead frame substrate for an optical semiconductor device according to claim 7,
An insulating resin formed between the second member and the third member and on the thin portion of the third member;
A lead frame substrate for an optical semiconductor device with a resin, comprising:
請求項1乃至請求項4のいずれか一項に記載の光半導体装置用反射部材付リードフレームと、
前記第2部材における前記第1部材側の面に載置された光半導体素子と、
前記光半導体素子を封止し、前記光半導体素子が発する光を透過する透光性樹脂と、
を備えたことを特徴とする光半導体装置。
A lead frame with a reflecting member for an optical semiconductor device according to any one of claims 1 to 4,
An optical semiconductor element placed on the first member side surface of the second member;
A transparent resin that seals the optical semiconductor element and transmits light emitted from the optical semiconductor element;
An optical semiconductor device comprising:
金属材料から構成され、天側の開口が底側の開口よりも大きくなるように開口側面が傾斜している枠状構造を有する第1部材と、金属材料から構成され、前記第1部材の前記枠状構造の底面の一部に固着されている第2部材と、金属材料から構成され、接続部と、前記接続部よりも厚さの薄い薄肉部とからなる段差構造を有し、平面視上、前記接続部が前記第1部材の底側の開口内に配置され、前記薄肉部が前記第1部材の前記枠状構造の底面の下に配置されている第3部材と、を備え、絶縁性樹脂が、前記第3部材と前記第1部材とが絶縁されるように、前記第3部材の薄肉部と前記第1部材の枠状構造の底面との間に介在し、かつ、前記第3部材と前記第2部材とが絶縁されるように、前記第3部材と前記第2部材との間に介在し、前記第1部材の前記枠状構造の底面には段差が無く、前記第1部材の前記枠状構造の底面と対応する前記第2部材の面は平坦であり、前記第1部材の前記枠状構造の底面と、該底面と対応する前記第2部材の面が、圧着により固着されている光半導体装置用反射部材付リードフレームの製造方法であって、
前記第1部材が平面上に複数多面付けされた第1の基板を形成する工程と、
前記第1部材に対応する一組の前記第2部材と前記第3部材が平面上に複数組多面付けされた第2の基板を形成する工程と、
前記第2の基板の前記第2部材と前記第3部材の間、および、前記第3部材の接続部と薄肉部の段差を埋めるように前記絶縁性樹脂を形成する工程と、
前記第1の基板と前記絶縁性樹脂を形成した前記第2の基板とを位置合わせして、前記第1の基板の複数の前記第1部材の各底面の一部と、前記第2の基板の各第2部材における前記第1部材側の面とを圧着し、多面付けされた前記光半導体装置用反射部材付リードフレームを形成する工程と、
を備えることを特徴とする光半導体装置用反射部材付リードフレームの製造方法。
A first member having a frame-like structure made of a metal material and having an opening side surface inclined so that the opening on the top side is larger than the opening on the bottom side; and The second member fixed to a part of the bottom of the frame-like structure, a metal material, and having a step structure including a connecting portion and a thin-walled portion having a thickness smaller than the connecting portion. And a third member in which the connecting portion is disposed in the opening on the bottom side of the first member, and the thin portion is disposed below the bottom surface of the frame-like structure of the first member, Insulating resin is interposed between the thin portion of the third member and the bottom surface of the frame-like structure of the first member so that the third member and the first member are insulated, and Interposed between the third member and the second member so that the third member and the second member are insulated, There is no step on the bottom surface of the frame-shaped structure of one member, the surface of the second member corresponding to the bottom surface of the frame-shaped structure of the first member is flat, and the frame-shaped structure of the first member is flat. A method of manufacturing a lead frame with a reflecting member for an optical semiconductor device, wherein a bottom surface and the surface of the second member corresponding to the bottom surface are fixed by pressure bonding,
Forming a first substrate on which a plurality of the first members are multi-faced on a plane;
Forming a second substrate in which a plurality of sets of the second member and the third member corresponding to the first member are multi-faced on a plane;
Forming the insulating resin between the second member and the third member of the second substrate and filling the step between the connecting portion and the thin portion of the third member;
Positioning the first substrate and the second substrate on which the insulating resin is formed, a part of each bottom surface of the plurality of first members of the first substrate, and the second substrate A step of pressure-bonding the first member side surface of each of the second members to form a multi-faced lead frame with a reflecting member for an optical semiconductor device,
A method of manufacturing a lead frame with a reflecting member for an optical semiconductor device.
請求項10に記載の光半導体装置用反射部材付リードフレームの製造方法により得られた多面付けされた光半導体装置用反射部材付リードフレームの前記第2部材における前記第1部材側の面に光半導体素子を載置する工程と、
前記第1部材の開口に前記透光性樹脂を充填し、前記光半導体素子を封止して多面付けされた光半導体装置を得る工程と、
前記多面付けされた光半導体装置を個片化して個々の光半導体装置を得る工程と、
を備えることを特徴とする光半導体装置の製造方法。
Light is applied to the surface on the first member side of the second member of the multi-sided lead frame with a reflecting member for an optical semiconductor device obtained by the method for manufacturing a lead frame with a reflecting member for an optical semiconductor device according to claim 10. Placing a semiconductor element;
Filling the translucent resin into the opening of the first member, sealing the optical semiconductor element, and obtaining an optical semiconductor device with multiple faces;
Dividing the multifaceted optical semiconductor device into individual pieces to obtain individual optical semiconductor devices; and
An optical semiconductor device manufacturing method comprising:
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