JP5577009B2 - 改良型太陽電池 - Google Patents
改良型太陽電池 Download PDFInfo
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- JP5577009B2 JP5577009B2 JP2006517679A JP2006517679A JP5577009B2 JP 5577009 B2 JP5577009 B2 JP 5577009B2 JP 2006517679 A JP2006517679 A JP 2006517679A JP 2006517679 A JP2006517679 A JP 2006517679A JP 5577009 B2 JP5577009 B2 JP 5577009B2
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/20—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising organic-organic junctions, e.g. donor-acceptor junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/20—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising organic-organic junctions, e.g. donor-acceptor junctions
- H10K30/211—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising organic-organic junctions, e.g. donor-acceptor junctions comprising multiple junctions, e.g. double heterojunctions
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/10—Transparent electrodes, e.g. using graphene
- H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
- H10K2102/103—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/311—Phthalocyanine
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
- H10K85/621—Aromatic anhydride or imide compounds, e.g. perylene tetra-carboxylic dianhydride or perylene tetracarboxylic di-imide
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Description
(a)第1の電極の上に第1の有機物層を蒸着する段階と、
(b)第1の有機物層の上に第2の有機物層を蒸着する段階と、
(c)第2の有機物層の上に封止層を蒸着してスタック(stack)を形成する段階と、
(d)スタックをアニーリングする段階と、
(e)第2の有機物層の上に第2の電極を蒸着する段階と、を有し、
前記デバイスは、光に露出されると、電圧を発生させることができる。
[実施例1]
1500Å厚さで、透明で、電導性酸化インジウムすず(ITO)アノード(シート抵抗40Ω/□)で予め被覆されたガラス基板上にPV電池を堆積した。膜の蒸着のため真空システムにそれを移す直前に基板を洗浄した。有機材料は市販のものを得て、熱勾配昇華を利用する蒸着の前に浄化した。使用した光活性な材料は、銅フタロシアニン(CuPc)、および3,4,9,10−ペリレンテトラカルボキシル・ビス・ベンズイミダゾール(PTCBI)であり、またバソキュプロリン(BCP)を接点緩衝層(contact buffer layer;コンタクトバッファ層)として使用した。高真空熱蒸発(ベース圧力10−7〜10−6Torr)によって、タングステン・ボートから室温の基板上に、有機物層を成長させた。シャドウマスクを通した金属カソードの蒸着はをこの後に行い、0.3mmと1mmの接点直径を得た。
図2は層構造ITO/5000ÅCuPc:PTCBI(4:1)/1000ÅAgの断面のSEM画像を、(a)成長直後の薄膜、また(b)TA1=450K、(c)TA1=500K、(d)TA1=550Kでそれぞれ15分間アニーリングした薄膜について示す。この画像は、相分離し、選択的にCuPcとPTCBIに富んだ領域を示し、この断面はアニーリング温度の増加に従ってサイズが増加する領域を表している。550Kでは、領域サイズは〜20nmと観測される。
20nmの領域サイズが図3に示したX線回折データによって確認されている。アニーリングで、斜方晶系α−CuPc相に対応する回折ピークが現れ、Θ=2.5°と12.5°の間の広範囲のアモルファスのバックグラウンド信号が減少している。ピークの広い幅は制限された結晶領域サイズを示す。550Kでアニーリングされた薄膜について、2Θ=6.7°と2Θ=12.2°でのピークのFWHM(半値全幅)を使用して、図2の観測と一致する(12±1)nmの領域サイズを計算した。これは、アモルファスマトリックス中の領域成長に関連した分子不揃いと大きなひずみによって回折ピークも広がるので、領域サイズに対する下限を表現している。ピーク幅に対する追加の潜在的寄与は、CuPcとPTCBIの豊富な相の、PTCBIとCuPcそれぞれによる残りのドーピング処理である。
混合層PV電池の性能における相分離の基本的な物理過程をより良く理解するために、ミクロモデルが必要である。この手法は、数値的に効率的で同時に現象論的に信頼でき、再結晶と粒成長を個別にシミュレートする方法を提供するので、我々は、セル構造オートマトン(cellular automata)を使用してそのようなモデルを実施した。簡潔には、Nx×Ny×Nz=Nのセルを含む体積を、単純立方格子の三次元の配列に分割する。成長方向としてz−方向(すなわち基板平面に対して垂直)を定義する。周期的境界条件はxおよびy−方向で適用される。構造の自由エネルギーは以下の通りである。
2ECuPc,PTCBI=ECuPc,CuPc=EPTCBI,PTCBI
と仮定する。
アニーリング温度TA1の関数として、室温での外部量子効率ηEQE∝ηED・ηCCを測定することによって、励起子のこの形態変化および電荷輸送の効果を推論することができる。図4に挿入した図において、ITO/100ÅCuPc/600ÅCuPc:PTCBI(3:4)/100ÅPTCBI/1000ÅAgの層構造を持ったデバイスの作用スペクトルを、TA1の関数として示す。λ=690nmの波長で0.6%から19%まで、30倍のηEQEの増加が観測される。この増加は、CuPcおよびPTCBIの両方の吸収スペクトル全体で一定であり、単一成分だけでは確認できない。これは、ηEQEの増加が1つの材料特性の変化の結果ではなく、実際には、混合層全体の形態の変化に関連していることを裏付けている。
図4は、ITO/400ÅCuPc/400ÅPTCBI/1000ÅAgの層構造を持った二層デバイス(黒塗りの正方形)、並びに、ITO/100ÅCuPc/600ÅCuPc:PTCBI(x:y)/100ÅPTCBI/1000ÅAgでx:yが1:2(白抜きの丸)、3:4(白抜きの三角)および6:1(白抜きの正方形)であるような層構造を持った混合層デバイスに対する、λ=632nmでのηEQEを示す。これらの測定値については、これらのセルを、続いて340Kと380K、次に420Kと540Kの間の20K毎、550K、および560Kでそれぞれ2分アニーリングし、アニーリング段階の度に室温に戻してηEQEを測定した。二層デバイスのアニーリングはηEQEを著しく改善せず、TA1>450Kでのアニーリングでさえ減少する結果となった。対照的に、すべての混合層デバイスに関しては、TA1>450K、最適のアニーリング温度TA1=540Kでのアニーリングで、ηEQEの著しい増加が観測された。達成できる最大のηEQEは混合層構造に明確に依存するが、一方で、ηEQE対アニーリング温度の特徴は、混合物配合によらずに同様の形状を有する。
表1は、アニーリング処理の関数としてのITO/100ÅCuPc/600ÅCuPc:PTCBI(6:1)/100ÅPTCBI/1000ÅAgの構造を持った混合層デバイスの室温の性能特徴を記載している。参考のために、二層デバイスの性能パラメータも示した。セルは7.8mW/cm2の出力密度を持ったタングステンハロゲンランプで照射した。アニーリングの前に、混合層デバイスの短絡電流密度(JM SC=15.5μA/cm2)が二層の短絡電流密度(JB SC=340μA/cm2)より1桁以上小さく、ηP=(1.3±0.1)×10−2の低出力変換効率に通じる。TA1=520Kでのアニーリング後、JM SC=190μA/cm2であった。これは、同じ層構造(図4)を持ったデバイスのηEQEに対する結果と対照的になっており、その状況では、アニーリングされた混合層デバイスのηEQEが、成長直後の二層デバイスのそれに近づく。理論に縛られることなく、この見かけの矛盾は、ηEQE測定値と比べて、I−V特性の測定値の時に使用される一層高い光強度レベルの結果であると考えられる。0.26Vから0.1VへのVOCの低下は、JSCの増加を部分的にオフセットし、ηP=(6.5±0.4)×10−1%をもたらす。
実施例6で説明した接点交換方法は、105mW/cm2(すなわち〜1sun)の強度を持つ標準AM1照射条件下での高出力変換効果を持った太陽電池を作るのに使用された。ITO/150ÅCuPc/440ÅCuPc:PTCBI(1:1)/100ÅPTCBI/1000ÅAgのデバイス層構造を、まずTA1=520Kで2分間アニーリングした。続いて接点を剥離し、150ÅBCP/1000ÅAg接点の蒸着に交換した。第2のアニーリング後の太陽電池性能特性を、TA2の関数として図5(a)に示す。最大効率は、TA2=460Kに対して、過去16年間に亘り、CuPc/PTCBIのPV「Tang」電池で実現された最高の効率(〜50%)を表すηP=(1.42±0.07)%に達した。第2のアニーリング工程は、TA2=400Kで本質的に完結するので、電池改良につながるメカニズムは第1のアニーリング段階のものとは異なると考えられる。理論によって縛られることなく、第2のアニーリング工程の役割は、DA界面からH2OまたはO2などの、励起子、および/または、電荷再結合のためのサイトを提供する汚染物質を取り除くことであると考えられる。第1のアニーリング後に空気に露出されたサンプルが第2回目のアニーリングをされた時、ηPの類似の増加が観測された。空気に露出することはηPの急速な減少の原因となり、予め露出した値の50%未満まで減少させる。ここで、予め露出したηPは400Kまでアニーリングした後に回復する。DA混合層/BCP接点のいくらかの「形成」が第2の熱処理の間にも起こることが可能である。
110 基板
115 アノード
120 アノード平滑化層
125 ドナー層
130 アクセプタ層
140 カソード
Claims (15)
- 有機感光性オプトエレクトロニックデバイスを作る方法であって、順に
(a)第1の電極の上に第1の有機物及び第2の有機物を含む混合層を蒸着する段階と、
(b)前記混合層の上に封止層を蒸着してスタックを形成する段階と、
(c)前記スタックをアニーリングする段階と、
(d)前記スタックの上に第2の電極を蒸着する段階と、を有し、
前記デバイスは、光に露出されると、電圧を発生させることができることを特徴とする方法。 - 前記(a)段階の前に前記第1の電極の上に前記第1の有機物を含む第1の有機物層を蒸着する段階と、
前記(b)段階の前に前記第2の有機物を含む第2の有機物層を蒸着する段階とを更に備えた請求項1に記載の方法。 - 前記第1の有機物層はアクセプタ層であることを特徴とする請求項2に記載の方法。
- 前記第2の有機物層はドナー層であることを特徴とする請求項2に記載の方法。
- 前記第2の有機物層の上に第3の有機物層を蒸着する段階をさらに有することを特徴とする請求項2に記載の方法。
- 前記第3の有機物層は励起子障壁層であることを特徴とする請求項5に記載の方法。
- アニーリングは450Kから560Kの温度で行われることを特徴とする請求項1又は2に記載の方法。
- アニーリングは560Kの温度で行われることを特徴とする請求項7に記載の方法。
- アニーリングは10mTorr未満の圧力で行われることを特徴とする請求項7に記載の方法。
- アニーリングは真空または不活性ガス雰囲気中で行われることを特徴とする請求項9に記載の方法。
- アニーリングは5秒から30分の間行われることを特徴とする請求項1又は2に記載の方法。
- アニーリングは15分間行われることを特徴とする請求項11の方法。
- アニーリングは2分の間行われることを特徴とする請求項11の方法。
- 請求項1又は2に記載の方法によって作成された有機感光性オプトエレクトロニックデバイス。
- 複数の感光性オプトエレクトロニック・サブセルから成るスタックされた有機感光性オプトエレクトロニックデバイスであって、少なくとも1つのそのようなサブセルが請求項1又は2によって作製されることを特徴とするデバイス。
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CN1826186B (zh) | 2010-12-22 |
TWI419338B (zh) | 2013-12-11 |
JP2012134524A (ja) | 2012-07-12 |
KR101086129B1 (ko) | 2011-11-25 |
BRPI0411774A (pt) | 2006-08-08 |
TW200509405A (en) | 2005-03-01 |
CA2530362A1 (en) | 2005-01-13 |
EP1644135A1 (en) | 2006-04-12 |
CA2530362C (en) | 2015-04-14 |
AU2004253524A1 (en) | 2005-01-13 |
JP2007525010A (ja) | 2007-08-30 |
CN1826186A (zh) | 2006-08-30 |
US7597927B2 (en) | 2009-10-06 |
EP2631014A2 (en) | 2013-08-28 |
JP5836834B2 (ja) | 2015-12-24 |
JP2015179870A (ja) | 2015-10-08 |
AU2004253524C1 (en) | 2010-02-04 |
EP2631014A3 (en) | 2014-01-01 |
WO2005002745A1 (en) | 2005-01-13 |
HK1094881A1 (en) | 2007-04-13 |
KR20060064570A (ko) | 2006-06-13 |
AU2004253524B2 (en) | 2009-07-30 |
MXPA06000223A (es) | 2006-03-21 |
US20050061364A1 (en) | 2005-03-24 |
EP1644135A4 (en) | 2011-04-20 |
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