JP5342282B2 - Coating device - Google Patents

Abstract

PURPOSE: A coating apparatus and a coating method are provided to form a coating solution in a stripe shape on a substrate by discharging the coating solution including an organic electroluminescence in a column state. CONSTITUTION: Nozzles(52a to 52c) discharge a coating solution from tip-end parts. A substrate(P) is placed on the upper side of a stage(21). A nozzle moving unit(51) moves the nozzles to a transversal direction over the stage. Liquid receiving parts(53L, 53R) receive the coating solution which is discharged on the outside of the stage. A gas supplying unit supplies a pre-set gas to the rear space of the nozzles.

Description

  The present invention relates to a coating apparatus, and more specifically, to a coating apparatus that applies and applies a coating liquid in a liquid column state from a nozzle onto a substrate placed on a stage.

  2. Description of the Related Art Conventionally, there has been developed a coating apparatus that applies a coating liquid onto a substrate like a single stroke while discharging the coating liquid from a nozzle. For example, in an apparatus for manufacturing an organic EL display device, a coating liquid containing an organic EL material in a predetermined pattern shape is applied by a nozzle to a main surface of a substrate such as a glass substrate placed on a stage. In such a coating apparatus, when the coating liquid is applied to the substrate, the coating liquid is applied to the outside of the substrate in order to collect the coating liquid applied to the outside of the substrate or the unnecessary coating liquid when the nozzle moves out of the substrate. A liquid receiving part is provided (see, for example, Patent Document 1).

  As shown in FIG. 12, in the coating apparatus, when a coating liquid containing red, green, and blue organic EL materials is applied, any one organic material of red, green, and blue is used in order to increase manufacturing efficiency. In general, a coating liquid containing an EL material is applied by discharging from a plurality of nozzles at the same time. In the coating apparatus, for example, a coating liquid containing an organic EL material is simultaneously ejected from 10 to 20 nozzles. In FIG. 12, the coating liquid containing an organic EL material is simultaneously applied from three nozzles 102 to 104. An example of discharging is described. In addition to the nozzles 102 to 104, the coating apparatus includes a stage 101 on which a glass substrate P that receives coating of a coating liquid containing an organic EL material is placed, and a liquid that collects the organic EL material discharged outside the substrate P. The receiving part 105 is provided. As the organic EL material, for example, when a groove is formed on the substrate P in a stripe shape, an organic EL material having a viscosity enough to flow so as to expand in the groove is used. Then, the organic EL material is ejected from the nozzles 102 to 104 into a straight bar shape (hereinafter referred to as a liquid column state) at a predetermined pressure and flow rate, and is applied onto the substrate P. In addition, the liquid receiving part 105 is arrange | positioned by opening the upper surface at the both sides outer side of the board | substrate P (only one is shown in FIG. 12).

  The nozzles 102 to 104 are supported by a holding member (not shown) in a state where they are arranged obliquely with respect to the nozzle reciprocation direction, which will be described later, and the holding member and the stage 101 are supported by each driving mechanism of the coating apparatus. Operate. The drive mechanism moves the nozzles 102 to 104 in a direction crossing the substrate P in a predetermined direction (a direction in which a stripe-shaped coating row is formed on the substrate P, the direction of the arrow F in the figure; hereinafter referred to as a nozzle reciprocating direction). The supporting member to be supported is reciprocated. At this time, the drive mechanism traverses the substrate P from the upper space of the liquid receiving portion 105 disposed on the one side outer side of the substrate P, and the liquid receiving portion 105 disposed on the other side outer side of the substrate P. The holding member is reciprocated to the upper space. The drive mechanism moves the stage 101 by a predetermined pitch in a predetermined direction (perpendicular to the paper surface) perpendicular to the nozzle reciprocating direction when the holding member is disposed in the upper space of the liquid receiving unit 105. Simultaneously with the operation of the drive mechanism, the organic EL material is discharged from the nozzles 102 to 103 in a liquid column state, whereby the coating liquid containing the organic EL material is discharged onto the substrate P, and the coating liquid containing the organic EL material is discharged. An application row is formed.

  However, when the liquid column state coating liquid is discharged to the liquid receiving portion 105 provided outside the substrate P, there are the following problems. As the distance between the nozzles 102 to 104 and the liquid receiving part 105 (h1 + h2 shown in FIG. 12) becomes longer, the coating liquid in the liquid column state becomes droplets due to surface tension. For example, the distance h1 from the tip of the nozzles 102 to 104 to the upper surface of the substrate P can be set to a distance that can guarantee the liquid column state to about 0.25 to 0.50 mm, but the distance h1 + h2 is 20 mm or more. In this case, it is difficult to prevent droplets from being formed into droplets only by adjusting the discharge pressure or the flow rate, or to prevent the applied coating liquid from being divided into finer mists. Further, when the nozzles 102 to 104 move at high speed in the F direction in the drawing, the space behind the nozzles 102 to 104 that move at high speed becomes negative pressure, and the mist-like coating liquid rises to the vicinity of the nozzles 102 to 104. . As a result, the mist-like coating liquid generated outside the substrate P falls on the substrate P and adheres to the upper surface, which causes a coating failure.

  On the other hand, as shown in FIG. 13, the coating apparatus described in Patent Document 1 is provided with a liquid receiving portion 106 in which a slit S is formed. The slit S is formed on the upper surface of the liquid receiving part 106 in parallel with the nozzle reciprocating direction. Further, the slit S is formed at a position deviating from the stage 101 in the nozzle reciprocating direction and at a position vertically downward from the tip portions of the nozzles 102 to 104. The upper surface of the liquid receiving unit 106 in which the slit S is formed is provided at substantially the same height as the upper surface of the stage 101 (that is, the distance h2 is a small value about the thickness of the substrate P). The liquid column state coating liquid discharged from the nozzle through the opening is collected by the liquid receiving unit 106 to prevent the mist-like coating liquid from leaking out of the liquid receiving unit 106.

JP 2006-181410 A

  However, as described above, the coating apparatus generally uses a plurality of nozzles in terms of manufacturing efficiency and the like. Further, as described above, the plurality of nozzles are supported in a state where they are arranged obliquely with respect to the nozzle reciprocation direction, and reciprocate in the nozzle reciprocation direction, so that the coating liquid from all the nozzles passes therethrough. Therefore, it is necessary to make the opening width of the slit S wide. Therefore, in the coating apparatus disclosed in Patent Document 1, it is necessary to form the slit S with a large opening area, and as a result, the mist-like coating liquid from the opening of the slit S is outside the liquid receiving unit 106. It is thought that it leaks out.

  Further, when the nozzles 102 to 104 move at a high speed in the direction F in the figure, the coating liquid that has become droplets according to the speed and the finely divided mist-shaped coating liquid float inside the liquid receiving unit 106. Then, since the space behind the nozzles 102 to 104 that move at high speed is in a negative pressure state, the dropletized coating liquid or mist-shaped coating liquid floating inside the liquid receiving unit 106 is discharged from the opening of the slit S to the nozzle 102. It is sucked up to the space behind 104. As a result, the dropletized coating liquid or mist-shaped coating liquid inside the liquid receiving unit 106 may fall on the substrate P and adhere to the upper surface, which may cause defective coating.

  Therefore, an object of the present invention is to provide a coating apparatus in which the coating liquid discharged outside the substrate does not affect the substrate when the coating liquid is applied to the substrate.

In order to achieve the above object, the present invention has the following features.
1st invention is the coating device which apply | coats a coating liquid on a board | substrate. The coating apparatus includes a nozzle, a stage, a nozzle moving mechanism, a liquid receiving unit, and a gas supply mechanism. The nozzle discharges the coating liquid from its tip. The stage places the substrate on its upper surface. The nozzle moving mechanism reciprocates the nozzle in a direction crossing the stage surface in the space on the stage. The liquid receiving portion receives the coating liquid discharged from the nozzle to the outside when the nozzle moving mechanism moves the nozzle while discharging the coating liquid from the nozzle to a position off the stage along the transverse direction. . In the state where the nozzle moving mechanism moves the nozzle while discharging the coating liquid from the nozzle onto the stage from the position on the liquid receiving portion along at least the transverse direction, the gas supply mechanism is in the direction in which the nozzle moves. Then, a predetermined gas is supplied to the space behind the nozzle.

  In a second aspect based on the first aspect, the gas supply mechanism locally supplies gas from above the liquid receiving portion toward the upper surface of the liquid receiving portion.

  In a third aspect based on the second aspect, the liquid receiving portion is traversed in a direction that is vertically downward from a tip portion of a nozzle disposed at a position off the stage along the traversing direction. Is formed on the upper surface, and the coating liquid discharged from the nozzle through the opening is collected. The gas supply mechanism locally supplies gas from above the liquid receiver to the opening of the liquid receiver.

  In a fourth aspect based on the first aspect, the gas supply mechanism supplies gas from the vicinity of the nozzle toward the rear space.

  In a fifth aspect based on the fourth aspect, the gas supply mechanism includes a first gas supply pipe and a second gas supply pipe. The first gas supply pipe is provided in the vicinity of the nozzle and supplies gas in one direction along the transverse direction. The second gas supply pipe is provided in the vicinity of the nozzle and supplies gas in the other direction along the transverse direction. The liquid receiver includes a first liquid receiver and a second liquid receiver. The first liquid receiver is provided outside the stage in one direction along the transverse direction. The second liquid receiver is provided outside the stage in the other direction along the transverse direction. The gas supply mechanism supplies gas from the first gas supply pipe when the nozzle moves onto the stage from at least a position on the first liquid receiving portion, and the nozzle moves from at least the position on the second liquid receiving portion onto the stage. When moving, gas is supplied from the second gas supply pipe.

  In a sixth aspect based on the fifth aspect, the first gas supply pipe and the second gas supply pipe reciprocate in the direction crossing the nozzle by the nozzle moving mechanism.

  In a seventh aspect based on the sixth aspect, the first gas supply pipe and the second gas supply pipe respectively supply gas to a position directly above the reciprocation axis of the nozzle that moves along the transverse direction. The discharge port is fixed so as to be disposed, and is reciprocated in a direction transverse to the nozzle by a nozzle moving mechanism.

  An eighth invention according to the sixth invention is further provided with a control unit. The control unit controls the gas supply operation by at least the gas supply mechanism. The control unit supplies gas from the first gas supply pipe and supplies gas from the second gas supply pipe when the nozzle is positioned on one side with respect to the intermediate point in the reciprocating movement. Close. A control part supplies gas via a 2nd gas supply pipe | tube, when the nozzle is located in the other direction side on the basis of an intermediate point, and closes supply of the gas from a 1st gas supply pipe | tube.

  According to a ninth invention, in any one of the fourth to eighth inventions, an exhaust part is further provided. The exhaust unit is provided at a position facing the discharge port through which the gas supply mechanism discharges and supplies gas via the upper space of the liquid receiving unit, and sucks the gas in the upper space.

  In a tenth aspect based on the first aspect, the gas supply mechanism locally supplies gas from above along a boundary surface between the upper space of the liquid receiving portion and the upper space of the stage.

  According to the first aspect, when the nozzle moves from the position on the liquid receiving portion toward the substrate, the space behind the moving nozzle is in a negative pressure state. Since the gas is supplied, the negative pressure state is reduced, or the dropletized coating liquid or the mist-shaped coating liquid floating outside the liquid receiving unit is prevented from entering the stage side. Accordingly, it is possible to prevent a coating failure caused by the dropletized coating liquid or the mist-shaped coating liquid floating inside the liquid receiving unit falling on the substrate on the stage and adhering to the upper surface.

  According to the second aspect of the invention, by generating a local downflow from above the liquid receiver to the upper surface of the liquid receiver, the negative pressure state in the space behind the nozzle that has become a negative pressure state is reduced, It is possible to prevent the coating liquid in the form of droplets or mist-shaped coating liquid floating inside the liquid receiving portion from being sucked into the negative pressure space.

  According to the third aspect of the present invention, since a local downflow is generated with respect to the slit opened on the upper surface of the liquid receiving part, the droplets of the coating liquid and the mist form floating inside the liquid receiving part The coating liquid can be further prevented from being sucked into the negative pressure space.

  According to the fourth aspect of the invention, since the gas is supplied from the vicinity of the nozzle to the rear of the moving nozzle, the negative pressure state in the space behind the nozzle that has become a negative pressure state is reduced, and the liquid receiving portion It is possible to prevent liquid droplets or mist-like coating fluid floating on the surface from being sucked into the negative pressure space.

  According to the fifth aspect, when the liquid receiving portions are provided at both ends in the reciprocating movement of the nozzle, the gas is supplied from the different gas supply pipes to the rear of the nozzle, thereby floating inside the respective liquid receiving portions. It is possible to prevent the coating liquid or the mist-like coating liquid from being sucked up into the negative pressure space.

  According to the sixth aspect, by moving the gas supply pipe together with the nozzle, it becomes possible to always supply the gas from the vicinity of the nozzle to the rear of the nozzle. Further, in the space behind the moving nozzle, the vicinity of the nozzle is often in the highest negative pressure state, but since it is possible to supply gas to the vicinity of the nozzle, the effect of reducing the negative pressure state Becomes higher.

  According to the seventh aspect of the present invention, the negative pressure state behind the nozzle can be efficiently reduced by arranging the discharge port for discharging the gas at a position directly above the reciprocating movement axis of the nozzle.

  According to the eighth aspect, gas supply that is unnecessary for reducing the negative pressure state behind the nozzle can be closed according to the nozzle position.

  According to the ninth aspect, a gas flow is formed in which the gas discharged from the gas supply mechanism is guided to the exhaust part via the space above the liquid receiving part. Therefore, even if the coating liquid in the form of droplets or mist-like coating liquid floating inside the liquid receiving part floats to the outside, the coating liquid is sucked in the exhaust part, so that the coating liquid floating from the inside of the liquid receiving part However, it is possible to prevent poor coating due to dropping onto the substrate and adhering to the upper surface.

  According to the tenth aspect of the invention, even when the coating liquid in the form of droplets or a mist-like coating liquid floating inside the liquid receiving part floats outside, it floats from the space above the liquid receiving part to the space above the substrate. Since the coating liquid does not enter, it is possible to prevent a coating failure due to the coating liquid falling onto the substrate and adhering to the upper surface.

The top view and front view which show an example of the principal part schematic structure of the coating device 1 which concerns on one Embodiment of this invention The block diagram which shows an example of the control function and supply part of the coating device 1 of FIG. The perspective view which shows an example of the structure of the liquid receiving part 53 of FIG. The perspective view which shows an example of the positional relationship of the organic electroluminescent material discharged from the nozzles 52a-52c, and the liquid receiving part 53. FIG. The perspective view which shows an example of the downflow production | generation part 530. The perspective view which shows an example of the downflow production | generation part 531. Front view and side view showing an example of a schematic configuration of the nozzle unit 50 Top view showing an example of a schematic configuration of the nozzle unit 50 A top view showing an example of a schematic configuration provided with an exhaust part 537 The top view which shows an example which fixed and provided gas supply pipe | tube 538L and 538R in the site | parts of the coating device 1 other than the nozzle unit 50. Side sectional view showing a structural example of the liquid receiving portion 53 in which the porous member 534 is provided inside the box portion 532 Side surface schematic diagram which shows the positional relationship of the nozzles 102-104 and the liquid receiving part 105 of the conventional coating device. The perspective view which shows the structure of the conventional liquid receiving part 106

(First embodiment)
Hereinafter, with reference to the drawings, a coating apparatus 1 according to a first embodiment of the present invention will be described. In order to make the description more specific, the following description is given using an example in which the coating apparatus 1 is applied to a coating apparatus that applies a coating solution containing an organic EL material to manufacture an organic EL device. Note that the organic EL material in this specification is a material for forming an organic layer (a layer containing an organic substance among a light emitting layer, a charge transport layer, a charge injection layer, and the like). It is a material that is soluble in solvents. The coating apparatus 1 forms an organic layer by applying a coating solution containing an organic EL material in a predetermined pattern shape on an object to be coated (for example, a glass substrate) placed on a stage, thereby forming an organic EL device. Is to be manufactured. FIG. 1A is a plan view illustrating an example of a schematic configuration of a main part of the coating apparatus 1. FIG. 1B is a front view illustrating an example of a schematic configuration of a main part of the coating apparatus 1. The coating apparatus 1 uses a plurality of types of coating liquids containing an organic EL material as described above. An example of using a coating liquid containing an organic EL material that forms a light-emitting layer will be described as a representative of these.

  In FIG. 1, the coating device 1 generally includes a substrate mounting device 2 and an organic EL coating mechanism 5. The organic EL coating mechanism 5 includes a nozzle moving mechanism 51, a nozzle unit 50, and liquid receivers 53L and 53R. The nozzle moving mechanism 51 includes a guide member 511 that extends horizontally in the illustrated X-axis direction, and moves the nozzle unit 50 along the guide member 511 in the illustrated X-axis direction (main scanning direction). The nozzle unit 50 holds a plurality of nozzles 52 that discharge a coating liquid containing an organic EL material of any one of red, green, and blue in a juxtaposed manner. Note that n (for example, 10 to 20) nozzles 52 can be arranged in parallel in the coating apparatus 1, and in this case, an organic EL material of any one color of red, green, and blue is used. The coating liquid that is included is discharged from the n nozzles 52. In the following, description will be made using an example in which three nozzles 52a, 52b, and 52c are arranged in parallel in the coating apparatus 1 as shown in FIG. Each nozzle 52a to 52c is supplied with a coating liquid containing an organic EL material of any one of red, green, and blue from a supply unit (see FIG. 2). As described above, the coating liquid containing the organic EL material of the same color is ejected from the plurality of nozzles 52. For the sake of specific explanation, the red organic EL material is ejected from the three nozzles 52a to 52c. An example is used.

  The substrate mounting apparatus 2 includes a stage 21, a turning unit 22, a parallel movement table 23, a guide receiving unit 24, and a guide member 25. The stage 21 places a substrate P such as a glass substrate to be coated on the upper surface of the stage. The lower part of the stage 21 is supported by the turning unit 22, and the stage 21 is configured to be rotatable in the θ direction shown in the figure by the turning operation of the turning unit 22. The stage 21 is provided with a heating mechanism for preheating the substrate P coated with the organic EL material on the stage surface, a suction mechanism for the substrate P, a delivery pin mechanism, etc. Not shown).

  A guide member 25 is extended and fixed in the Y-axis direction shown in the drawing, which is a horizontal direction perpendicular to the X-axis direction, so as to pass under the organic EL coating mechanism 5. A guide receiving portion 24 that abuts on the guide member 25 and slides on the guide member 25 is fixed to the lower surface of the translation table 23. In addition, the swivel unit 22 is fixed on the upper surface of the translation table 23. As a result, the parallel movement table 23 can be moved in the Y-axis direction (sub-scanning direction) along the guide member 25 by receiving a driving force from, for example, a linear motor (not shown). The stage 21 supported by the turning unit 22 moves horizontally by the movement.

  When the substrate P is placed on the stage 21 via the delivery pin mechanism, the substrate P is sucked and fixed, and the parallel movement table 23 moves to the lower side of the organic EL coating mechanism 5, the substrate P becomes red organic. This is a position where the coating liquid containing the EL material is applied from the nozzles 52a to 52c. Then, the control unit (see FIG. 2) controls the nozzle moving mechanism unit 51 to reciprocate the nozzle unit 50 in the X-axis direction, and moves the stage 21 by a predetermined pitch in the Y-axis direction for each linear movement. The parallel movement table 23 is controlled to discharge the coating liquid containing the organic EL material at a predetermined flow rate from the nozzles 52a to 52c. Further, at the discharge positions in the X-axis direction of the nozzles 52a to 52c, a liquid that receives the coating liquid containing the organic EL material discharged from the substrate P is discharged to both side spaces deviating from the substrate P placed on the stage 21. Receiving portions 53L and 53R are fixed. The nozzle moving mechanism 51 is disposed outside the other side of the substrate P from the upper space of the liquid receiving portion 53 (for example, the liquid receiving portion 53L) disposed outside the one side of the substrate P across the substrate P. The nozzle unit 50 is reciprocated to the upper space of the liquid receiver 53 (for example, the liquid receiver 53R) provided. The translation table 23 moves the stage 21 by a predetermined pitch in a predetermined direction (Y-axis direction in the drawing) perpendicular to the nozzle reciprocating direction when the nozzle unit 50 is disposed in the upper space of the liquid receiving portion 53. Let Simultaneously with the operation of the nozzle moving mechanism 51 and the parallel movement table 23, the coating liquid containing the organic EL material is discharged from the nozzles 52a to 52c in a liquid column state, so that the coating liquid containing the red organic EL material becomes the substrate. A stripe-shaped coating row is formed on P.

  Next, with reference to FIG. 2, the schematic configuration of the control function and the supply unit in the coating apparatus 1 will be described. FIG. 2 is a block diagram illustrating an example of the control function of the coating apparatus 1 and a supply unit.

  In FIG. 2, the coating apparatus 1 includes a control unit 3 and a supply unit 54 in addition to the components described above. The supply unit 54 supplies a coating liquid containing a red organic EL material to each of the nozzles 52a to 52c.

  The supply unit 54 is branched and supplied to a supply source 541 of a coating liquid containing an organic EL material, a pressure unit 542 for sending a coating liquid containing an organic EL material from the supply source 541, and nozzles 52a to 52c. Flow meters 543a to 543c for detecting the flow rate of the coating liquid containing each organic EL material are provided. Then, the control unit 3 controls the operations of the supply unit 54, the turning unit 22, the parallel movement table 23, and the nozzle movement mechanism unit 51. In addition, each piping from the supply source 541 to the nozzles 52a to 52c uses a pipe member made of PE (polyethylene), PP (polypropylene), a fluororesin, or the like. The supply source 541 stores a coating liquid containing an organic EL material to be applied by the coating apparatus 1, and stores, for example, a coating liquid containing the organic EL material in a flexible pack. The pressurizing unit 542 pressurizes the supply source 541 to take out the coating liquid containing the organic EL material stored in the supply source 541 and flow it to the nozzles 52 a to 52 c.

  The nozzle 52 a has a filter unit 529 a for removing foreign substances in the coating liquid containing the organic EL material supplied from the supply unit 54. The nozzle 52b has a filter unit 529b for removing foreign substances in the coating liquid containing the organic EL material supplied from the supply unit 54. The nozzle 52 c has a filter unit 529 c for removing foreign matter in the coating liquid containing the organic EL material supplied from the supply unit 54. In addition, since the nozzles 52a to 52c have the same structure, the reference numeral “52” is used for the description in the generic description.

  Here, as an example, a plurality of stripe-shaped grooves corresponding to a predetermined pattern shape to which the coating liquid containing the organic EL material is to be applied are formed on the surface of the substrate P that receives the coating liquid containing the red organic EL material. It may be formed so as to be arranged side by side. In this case, as the coating liquid containing the organic EL material, for example, a coating liquid containing an organic EL material having a viscosity that flows so as to spread in the groove on the substrate P is used. A coating solution containing a polymer type organic EL material for each is used.

  The nozzle unit 50 can adjust the coating pitch interval of the nozzles 52a to 52c. In the nozzle unit 50, the nozzles 52a to 52c are arranged substantially linearly apart with respect to the X-axis direction in FIG. 1 and are slightly shifted in the Y-axis direction in FIG. The distance between the adjacent two nozzles 52 in the Y-axis direction is adjusted so as to correspond to the desired interval between the application rows. For example, it is set to be equal to several times (for example, 3 times, etc.) the stripe-shaped groove pitch formed in advance on the surface of the substrate P. Further, even when there is no such groove, the Y-axis direction pitch of the nozzles 52 is similarly adjusted so as to correspond to a desired stripe-shaped application row interval.

  Various configurations for adjusting the pitch in the Y-axis direction of the nozzle 52 described above are conceivable. For example, by configuring the nozzles 52a to 52c to be movable in the Y-axis direction (sub-scanning direction), the Y-axis direction pitch of each nozzle 52 can be adjusted. As another example, the nozzle unit 50 is supported so as to be rotatable around a predetermined vertical support shaft, and the coating pitch interval is adjusted by rotating the nozzle unit 50 around the support shaft under the control of the control unit 3. can do.

  Based on the position and direction of the substrate P placed on the stage 21, the control unit 3 is configured to form a coating row on the substrate P (for example, when the groove is formed on the substrate P, the direction of the groove). ) Is adjusted so as to be in the X-axis direction, and a coating start point, that is, a coating start position at which coating is started at one end side forming the coating row on the substrate P is calculated. . The application start position is an upper space of one liquid receiving portion 53. Then, the control unit 3 drives the parallel movement table 23 and the nozzle movement mechanism unit 51 as described above.

  At the application start position, the control unit 3 instructs the pressurization unit 542 to start discharging the application liquid containing the organic EL material from the nozzles 52a to 52c. At this time, the control unit 3 uses the nozzles 52a to 52c so that the coating amount of the coating liquid containing the organic EL material at each point in the striped coating row becomes uniform and the organic EL material is discharged in a liquid column state. The application amount is controlled according to the moving speed, and the flow rate information from the flow meters 543a to 543c is fed back and controlled. Then, the control unit 3 causes the nozzle unit 50 to move to the guide member 511 while discharging the coating liquid containing the organic EL material onto the substrate P in order to form a coating row of the coating liquid containing the organic EL material on the substrate P. Control to move along. By this operation, a coating row is formed in which the coating liquid containing the red organic EL material discharged from the nozzles 52a to 52c in the liquid column state is simultaneously coated on the substrate P.

  When the control unit 3 is positioned on the other liquid receiving portion 53 fixed on the outside of the other end portion of the substrate P across the substrate P, the organic EL material from the nozzles 52a to 52c. The movement of the nozzle unit 50 by the nozzle moving mechanism unit 51 is stopped while the discharge of the coating liquid containing is continued. By this one movement, the application liquid containing the organic EL material is simultaneously applied to the application rows corresponding to the number of nozzles 52. Specifically, when a coating liquid containing the organic EL material of the same color is ejected from each nozzle 52a to 52c, the organic EL material is applied to a total of three coating rows in which one coating row is to be applied every three rows. A coating solution containing is applied.

  Next, the control unit 3 pitches the parallel movement table 23 by a predetermined distance in the positive direction of the Y axis so that the application liquid containing the organic EL material can be applied to the application row to be applied next. . When the control unit 3 moves the nozzle unit 50 from the upper space of the other liquid receiving unit 53 across the substrate P in the opposite direction and is positioned on the one liquid receiving unit 53, the organic material from the nozzles 52a to 52c. While the discharge of the coating liquid containing the EL material is continued, the movement of the nozzle unit 50 by the nozzle moving mechanism 51 is stopped. By this second movement, the application of the coating liquid containing the organic EL material to the next three rows of coating rows is completed. By repeating such an operation, a coating row coated with a coating liquid containing a red organic EL material is formed.

  Next, the liquid receiver 53 will be described with reference to FIGS. FIG. 3 is a perspective view showing an example of the structure of the liquid receiving portion 53. FIG. 4 is a schematic side view of the liquid receiving portion 53 viewed from the direction D of FIG. FIG. 4 is a perspective view showing an example of the positional relationship between the organic EL material discharged from the nozzles 52 a to 52 c and the liquid receiving portion 53. FIG. 6 is a perspective view showing an example of a positional relationship with the liquid receiving portion 53 when the nozzles 52a to 52c move. The liquid receiving portions 53L and 53R (see FIG. 1) on both sides with respect to the stage 21 have the same structure with the stage 21 symmetrical, and FIGS. A liquid receiver 53 is shown.

  In FIG. 3, the liquid receiving part 53 includes a box part 532, an upper plate member 533, and a box suction part 536.

  The box unit 532 is connected to, for example, the nozzle moving mechanism unit 51 (or a member provided in a fixed manner) and fixed so that the positional relationship with the nozzle moving mechanism unit 51 is always fixed. The box portion 532 has a box shape with an upper surface opened, and an upper plate member 533 is provided and closed so as to cover the upper surface. The upper plate member 533 is formed with a slit opening 533a whose longitudinal opening direction is the X-axis direction shown in the drawing. The upper plate member 533 is attached like a lid of the box portion 532 and is detachably fitted from the box portion 532. When the upper plate member 533 is attached to the box portion 532, the slit opening 533a functions as an opening between the internal space and the external space of the box portion 532.

  The upper surface of the upper plate member 533 is fixed so as to have substantially the same height as the upper surface of the stage 21. The side surfaces of the box portion 532 and the upper plate member 533 on the stage 21 side are fixedly provided with a predetermined gap in the vicinity of the stage 21. And on the upper surface of the upper plate member 533, with respect to the substrate P (shown by a broken line in FIG. 3) placed so as to partially protrude from the side surface of the stage 21 in the positive direction of the X axis in the figure, Some of them are arranged overlapping.

  The box portion 532 is provided with a suction port at the center of the side surface or the like, and the suction unit 536 in the box sucks the gas, coating liquid, and the like inside the box unit 532 from the suction port. Then, the gas sucked from the inside of the box unit 532 and the coating solution (the coating solution formed into droplets generated inside the box unit 532, the mist-like coating solution, and the coating solution discharged into the box unit 532 in a liquid state are used. Are sucked from the suction port by the suction unit 536 in the box and collected in a drain tank (not shown).

  Next, the positional relationship between the nozzles 52a to 52c and the liquid receiving portion 53 will be described with reference to FIG. In FIG. 4, the nozzles 52a to 52c, the liquid receiving portion 53, and the substrate P are mainly shown, and other portions are omitted. For the liquid receiving part 53, only the box part 532 and the upper plate member 533 are shown. As described above, when the coating liquid containing the organic EL material is applied to the substrate P, the nozzles 52 a to 52 c are placed in the upper space of the liquid receiving portion 53 at the start and end of application, or when the X-axis direction turns back. Be placed. At this time, the nozzles 52a to 52c discharge the organic EL material in a liquid column state from above the liquid receiving portion 53 toward the slit opening portion 533a.

  When the nozzles 52a to 52c move to the upper space of the liquid receiving part 53, the coating liquid containing the organic EL material discharged from the nozzles 52a to 52c is received inside the box part 532 through the slit opening part 533a. In addition, a liquid receiving portion 53 is provided. That is, when the nozzles 52a to 52c go out of the substrate P in the X-axis direction, the slit openings 533a are formed so as to include all the positions immediately below the respective tip portions (discharge ports) of the nozzles 52a to 52c. Therefore, the moving direction (X-axis direction) of the nozzles 52a to 52c and the longitudinal formation direction (X-axis direction) of the slit opening 533a are parallel to each other, and the Z-axis negative direction (vertical direction) with respect to the tip ends of the nozzles 52a to 52c. ) Is formed with a slit opening 533a. Here, the nozzles 52a to 52c are arranged slightly shifted from each other in the Y-axis direction in the drawing in order to simultaneously apply the coating liquid containing the organic EL material to the three rows in the X-axis direction. The slit opening 533a has a width through which all the coating liquid containing an organic EL material discharged in a liquid column state from these nozzles 52a to 52c is passed.

  As shown in FIG. 4, when the nozzles 52a to 52c are arranged in the upper space of the liquid receiving portion 53, the nozzles 52a to 52c eventually move at high speed in the direction C shown in the negative X-axis direction. Even when the nozzles 52 a to 52 c move from the upper space of the liquid receiving portion 53 in the direction C in the figure, all the coating liquid containing the organic EL material discharged from the nozzles 52 a to 52 c is slit until it is discharged onto the substrate P. It passes through the opening 533a in a liquid column state and is collected in the box 532.

  Next, an example of the downflow generation unit 530 will be described with reference to FIG. FIG. 5 is a perspective view illustrating an example of the downflow generation unit 530.

  In FIG. 5, a downflow generator 530 is provided in the space above the liquid receiver 53. The downflow generation unit 530 is fixed at a position that does not hinder the movement of the nozzle unit 50. The downflow generation unit 530 uses a gas (for example, air) that is pressurized and supplied from the outside of the coating apparatus 1 toward the slit opening 533a in the liquid receiving unit 53, so that a local downflow with a predetermined flow rate is performed. Form. The downflow generation unit 530 is provided in the upper space of the liquid receiving unit 53L and the upper space of the liquid receiving unit 53R, respectively.

  Here, when the nozzle unit 50 (nozzles 52a to 52c) moves at a high speed in the direction C shown in the figure from the position directly above the liquid receiving portion 53 toward the substrate P, the coating liquid formed into droplets or further divided according to the speed. The fine mist-like coating liquid thus floats inside the liquid receiving portion 53. Since the space behind the nozzle unit 50 that moves at high speed (in FIG. 5, the X-axis positive direction side of the nozzle unit 50) is in a negative pressure state, the coating liquid that has been formed into droplets floating inside the liquid receiving portion 53 It is conceivable that the mist-like coating liquid is sucked up into the negative pressure space from the slit opening 533a. However, since a local downflow having a predetermined flow rate is formed from the downflow generation unit 530 toward the slit opening 533a, the negative pressure state near the slit opening 533a in the negative pressure space is reduced. For example, when the downflow generation unit 530 downflows the gas at a linear velocity at which the negative pressure state in the space near the slit opening 533a can be canceled, liquid is received behind the nozzle unit 50 that moves at high speed from the slit opening 533a. It is possible to prevent the droplet-like coating liquid or mist-like coating liquid floating inside the unit 53 from being sucked up. The state in which the negative pressure state in the vicinity of the slit opening 533a is canceled is, for example, a state in which the pressure in the space near the slit opening 533a is higher than the pressure in the liquid receiving portion 53, or in the vicinity of the slit opening 533a. It shows a state where the space is at or above atmospheric pressure. Accordingly, it is possible to prevent a coating failure caused by the coating liquid floating from the inside of the liquid receiving portion 53 dropping on the substrate P and adhering to the upper surface.

  In consideration of the fact that the nozzle unit 50 reciprocates at high speed in the X-axis direction (main scanning direction), the downflow generator 530 always generates a downflow regardless of the position of the nozzle unit 50 in the reciprocal movement. Continue the state. If at least the nozzle unit 50 moves from the position directly above the liquid receiving portion 53 in the direction of the substrate P, if the downflow is formed with respect to the liquid receiving portion 53, the position of the nozzle unit 50 in the reciprocating movement Accordingly, the downflow generation unit 530 may switch on / off the generation of the downflow.

  The downflow generation unit 530 uses an example in which a local downflow is formed toward the slit opening 533a in the liquid receiving unit 53, but the nozzle unit 50 is located from a position directly above the liquid receiving unit 53. As long as the local downflow is formed in the rearward direction toward the substrate P, the downflow may be formed in another position. As a first example, the downflow generation unit may form a local downflow toward at least a part of the opening that does not overlap with the substrate P in the slit opening 533a. A local downflow may be formed on the entire portion 53 (for example, the entire upper plate member 533) or a part of the liquid receiving portion 53.

  As a second example, the downflow generation unit may form a local downflow (for example, an air curtain) along the boundary surface between the upper space of the liquid receiving unit 53 and the upper space of the substrate P. Absent. For example, as shown in FIG. 6, a downflow generation unit 531 that forms a local downflow (air curtain) is provided along the boundary surface between the upper space of the liquid receiving unit 53 and the upper space of the substrate P. Yes. For example, the downflow generation unit 531 is fixed at a position that does not hinder the movement of the nozzle unit 50 above the boundary surface between the upper space of the liquid receiving unit 53 and the upper space of the substrate P. The downflow generation unit 531 uses a gas (for example, air) pressurized and supplied from the outside of the coating apparatus 1 toward the end of the substrate P disposed on the liquid receiving unit 53, and has a predetermined flow rate. A local downflow (air curtain) is formed. The downflow generation unit 531 is provided in the upper space of the liquid receiving unit 53L and the upper space of the liquid receiving unit 53R, respectively. In the second example, even if the dropletized coating liquid or mist-shaped coating liquid floating inside the liquid receiving unit 53 floats outside from the slit opening 533a, the downflow ( Since the coating liquid that is blocked by the air curtain) does not enter the space above the substrate P from the space above the liquid receiving portion 53, the coating liquid falls onto the substrate P and adheres to the upper surface. Application failure can be prevented.

  In the first example and the second example described above, a downflow is formed with respect to the liquid receiving unit 53 when at least the nozzle unit 50 moves from the position directly above the liquid receiving unit 53 toward the substrate P. If so, the downflow generation unit may switch on / off the generation of the downflow according to the position of the nozzle unit 50 in the reciprocal movement. Further, considering that the nozzle unit 50 reciprocates in the X-axis direction (main scanning direction) at a high speed, the downflow generation unit always performs the downflow regardless of the position of the nozzle unit 50 in the reciprocal movement. You can continue the generated state.

(Second Embodiment)
Hereinafter, a coating apparatus according to a second embodiment of the present invention will be described with reference to the drawings. The coating apparatus according to the second embodiment is different from the above-described coating apparatus according to the first embodiment only in a mechanism for supplying gas behind the nozzle unit 50 that moves at high speed. Therefore, in the following description, the gas supply mechanism in the second embodiment will be mainly described, and the same configuration as that of the coating apparatus according to the first embodiment will be described with the same reference numerals. Is omitted.

  Next, the structure of the nozzle unit 50 will be described with reference to FIGS. FIG. 7A is a front view illustrating an example of a schematic configuration of the nozzle unit 50. FIG. 7B is a side view illustrating an example of a schematic configuration of the nozzle unit 50. FIG. 8 is a top view illustrating an example of a schematic configuration of the nozzle unit 50.

  7 and 8, the nozzle unit 50 includes a nozzle holder 520 that is reciprocally moved in the X-axis direction (see FIG. 1) along the guide member 511 by the nozzle moving mechanism 51. The nozzle holder 520 is made of, for example, an L-shaped plate-like member, and is arranged so that the bottom surface extending in the horizontal direction is parallel to the upper surface of the stage 21. The nozzle holder 520 supports the three nozzles 52a to 52c on the bottom surface.

  A gas supply mechanism support member 524 is fixed to the nozzle holder 520. The gas supply mechanism support member 524 is composed of, for example, an L-shaped plate-like member, and is fixed so that the bottom surface extending in the horizontal direction is parallel to the bottom surface of the nozzle holder 520 in the space above the nozzles 52a to 52c. Established.

  Gas supply pipes 521L and 521R and an electromagnetic valve 523 are fixed to the gas supply mechanism support member 524. The gas supply pipe 521L discharges gas (for example, air) pressurized and supplied from the outside of the coating apparatus 1 to the X-axis negative direction side of the nozzle unit 50 through the electromagnetic valve 523 at a predetermined flow rate. Specifically, as shown in FIG. 7B, the gas supply pipe 521L discharges the gas, and is provided above the nozzles 52a to 52c. The nozzles 52a to 52c are installed in positions that are directly above the moving shaft that reciprocates. Further, the gas supply pipe 521R discharges the gas at a predetermined flow rate to the X axis positive direction side of the nozzle unit 50 via the electromagnetic valve 523. Specifically, similarly to the gas supply pipe 521L, the gas supply pipe 521R has a discharge port through which the gas supply pipe 521R discharges the gas above the nozzles 52a to 52c. The nozzles 52a to 52c are installed at positions directly above the moving shaft that reciprocates.

  The electromagnetic valve 523 opens and closes the gas flow path of the gas supply pipe 521L and the gas flow path of the gas supply pipe 521R, respectively, and discharges the gas through the gas supply pipe 521L and discharges the gas through the gas supply pipe 521R. Switch the discharge. The electromagnetic valve 523 is controlled to be opened and closed under the control of the control unit 3 and performs switching to discharge gas from the nozzle unit 50.

  For example, as shown in FIG. 8, when the nozzle unit 50 moves in the illustrated C direction from the position directly above the liquid receiving portion 53R toward the substrate P, the control unit 3 causes the gas to flow from the gas supply pipe 521R to the X axis. The opening and closing of the solenoid valve 523 is switched so as to be discharged toward the positive direction. Further, when the nozzle unit 50 moves from the position directly above the liquid receiving portion 53L (see FIG. 1) toward the substrate P, the control portion 3 discharges the gas from the gas supply pipe 521L to the X axis negative direction side. As described above, the opening and closing of the electromagnetic valve 523 is switched. When the nozzle unit 50 (nozzles 52 a to 52 c) moves from the position immediately above the liquid receiving portion 53 to the substrate P side by such gas supply control of the control unit 3, the movement to the rear with respect to the moving direction of the nozzle unit 50. The gas is discharged in the direction opposite to the direction.

  Here, when the nozzle unit 50 (nozzles 52a to 52c) moves at a high speed in the direction C shown in the drawing, the coating liquid formed into droplets according to the speed and the finely divided mist-shaped coating liquid are received by the liquid receiving portion 53R. Floating inside. Since the space behind the nozzle unit 50 that moves at high speed (specifically, the X-axis positive direction side of the nozzle unit 50) is in a negative pressure state, the droplets of the coating liquid floating inside the liquid receiving portion 53R It is conceivable that the mist-like coating liquid is sucked up into the negative pressure space from the slit opening 533a. However, when the nozzle unit 50 moves from the position directly above the liquid receiving portion 53R in the direction C (direction of the substrate P) in the figure, the gas is discharged from the gas supply pipe 521R in the direction opposite to the moving direction into the negative pressure space. The Therefore, the gas discharged from the gas supply pipe 521R reduces the negative pressure state in the negative pressure space, and the liquid droplets float inside the liquid receiving portion 53R to the rear of the nozzle unit 50 moving at high speed from the slit opening 533a. It is possible to prevent the applied coating liquid or mist-shaped coating liquid from being sucked up. Further, when the nozzle unit 50 moves in the direction of the substrate P from the position immediately above the liquid receiving portion 53L, the gas is discharged from the gas supply pipe 521L to the rear of the nozzle unit 50 that moves at a high speed in the direction opposite to the moving direction. The Accordingly, the negative pressure state behind the nozzle unit 50 is reduced by the gas discharged from the gas supply pipe 521L, and the liquid droplet floating inside the liquid receiving portion 53R to the rear of the nozzle unit 50 moving at high speed from the slit opening 533a. It is possible to prevent the liquefied coating liquid and the mist-shaped coating liquid from being sucked up. Accordingly, it is possible to prevent a coating failure caused by the coating liquid floating from the liquid receiving portions 53L and 53R falling on the substrate P and adhering to the upper surface.

  In consideration of the reciprocating movement of the nozzle unit 50 in the X-axis direction (main scanning direction) at a high speed, the above-described solenoid valve 523 is roughly divided into two types depending on the position of the nozzle unit 50 in the reciprocating movement. The gas flow path may be switched. For example, the gas flow path is switched by the electromagnetic valve 523 with reference to an intermediate point (ie, an intermediate position between the liquid receiving portion 53L and the liquid receiving portion 53R) where the nozzle unit 50 reciprocates. Specifically, when the nozzle unit 50 is positioned on the liquid receiving portion 53L side with respect to the intermediate point, the control unit 3 controls the electromagnetic valve 523 to discharge gas only from the gas supply pipe 521L. On the other hand, when the nozzle unit 50 is located on the liquid receiving portion 53R side with respect to the intermediate point, the control unit 3 controls the electromagnetic valve 523 to discharge gas only from the gas supply pipe 521R. In addition, the timing of switching the gas flow path by the electromagnetic valve 523 can be considered. At least when the nozzle unit 50 moves from the position directly above the liquid receiving portion 53L toward the substrate P, the gas is discharged from the gas supply pipe 521L. If the gas is discharged from the gas supply pipe 521R when the nozzle unit 50 moves from the position directly above the liquid receiving portion 53R toward the substrate P, the gas flow path is switched at another timing. It doesn't matter.

  Further, an exhaust unit 537 that sucks the gas in the above-described negative pressure space may be further provided in the coating apparatus 1. For example, as shown in FIG. 9, an exhaust part 537R that sucks the gas in the upper space of the liquid receiving part 53R is provided on the X axis positive direction side of the liquid receiving part 53R. As a result, the gas above the liquid receiving portion 53R is sucked into the exhaust portion 537R, so that the gas discharged from the gas supply pipe 521R is guided to the exhaust portion 537R via the space above the liquid receiving portion 53R. Is formed. Therefore, even if the liquid dropletized coating liquid or the mist-shaped coating liquid floating inside the liquid receiving portion 53R floats outside from the slit opening portion 533a, the coating liquid is sucked by the exhaust portion 537R. Application failure caused by the coating liquid floating from the inside of the portion 53R dropping on the substrate P and adhering to the upper surface can be prevented. Similarly to the exhaust portion 537R, an exhaust portion 537L that sucks the gas in the upper space of the liquid receiving portion 53L is also provided on the X axis negative direction side of the liquid receiving portion 53L. As a result, the gas above the liquid receiving portion 53L is sucked into the exhaust portion 537L, so that the gas discharged from the gas supply pipe 521L is guided to the exhaust portion 537L via the space above the liquid receiving portion 53L. Is formed. Therefore, even if the dropletized coating liquid or mist-shaped coating liquid floating inside the liquid receiving portion 53L floats outside from the slit opening 533a, the coating liquid is sucked by the exhaust portion 537L. Application failure caused by the coating liquid floating from the inside of the portion 53L dropping on the substrate P and adhering to the upper surface can be prevented.

  In the above description, the discharge ports of the gas supply pipes 521L and 521R are both provided above the nozzles 52a to 52c, which are directly above the moving shaft in which the nozzles 52a to 52c reciprocate in the nozzle reciprocating direction. The gas supply pipes 521L and 521R may be provided with discharge ports at the positions. The gas is respectively supplied to the upper space of the liquid receiving portions 53L and 53R that are in the negative pressure state behind the nozzle unit 50 that moves at high speed (specifically, the X axis positive direction side or the X axis negative direction side of the nozzle unit 50). If it is a position which can supply gas, you may provide the discharge port of gas supply pipe | tube 521L and 521R in another position.

  As a first example, the discharge ports of the gas supply pipes 521L and 521R are provided in the vicinity of the nozzles 52a to 52c including positions other than the position directly above the moving shaft. As described above, in the vicinity of the nozzles 52a to 52c, gas is supplied to the upper spaces of the liquid receiving portions 53L and 53R that are in the negative pressure state behind the nozzle unit 50 that moves at a high speed in the same manner as the position directly above. Needless to say, you can.

  As a second example, gas supply pipes 538L and 538R are fixed to parts of the coating apparatus 1 other than the nozzle unit 50, and exhaust ports for supplying gas to the upper space are provided. For example, as shown in FIG. 10, a gas supply pipe 538 </ b> R that supplies gas to the space above the liquid receiving portion 53 </ b> R is fixed at a position that does not hinder the movement of the nozzle unit 50. Specifically, it is on the X axis negative direction side with respect to the liquid receiving portion 53R, on the Y axis positive direction side with respect to the reciprocation space of the nozzle unit 50, and with respect to the Z axis direction, the nozzle unit. The gas supply pipe 538R is fixed at a position where the height is equal to 50 (the mode shown in FIG. 10). In this case, the gas supply pipe 538R discharges gas from the position on the X axis negative direction and Y axis positive direction side to the upper space with respect to the upper space of the liquid receiving portion 53R. As a result, the gas supply pipe 538R can supply gas to the space above the liquid receiving portion 53R that is behind the nozzle unit 50 that moves at high speed and is in a negative pressure state. Further, the gas supply pipe 538L is provided in the upper space of the liquid receiving portion 53L so as to have a left-right symmetrical installation relationship similarly to the gas supply pipe 538R. As a result, the gas supply pipe 538L can supply gas to the space above the liquid receiving portion 53L that becomes the negative pressure state behind the nozzle unit 50 that moves at high speed.

  Further, as another example, it is on the X axis negative direction side with respect to the liquid receiving portion 53R, is on the Y axis negative direction side with respect to the reciprocation space of the nozzle unit 50, and is on the Z axis direction. The gas supply pipe may be fixed at a position having a height equivalent to that of the nozzle unit 50. In this case, the gas supply pipe discharges gas from the position on the X axis negative direction side and the Y axis negative direction side to the upper space with respect to the upper space of the liquid receiving portion 53R. As a result, the gas supply pipe can supply gas to the space above the liquid receiving portion 53R that is behind the nozzle unit 50 that moves at high speed and is in a negative pressure state. Further, another gas supply pipe is provided in the upper space of the liquid receiving portion 53L so as to have a symmetrical installation relationship as in the case of the gas supply pipe. As a result, the other gas supply pipe can supply gas to the space above the liquid receiving portion 53 </ b> L that becomes the negative pressure state behind the nozzle unit 50 that moves at high speed.

  Further, the exhaust part 539 may be provided at a position facing the discharge port of the gas supply pipe in the second example via the space above the liquid receiving part 53. For example, as shown in FIG. 10, liquid is supplied to a gas supply pipe 538 </ b> R that discharges gas to the upper space from a position on the X axis negative direction and Y axis positive direction side with respect to the upper space of the liquid receiving portion 53 </ b> R. An exhaust part 539R that sucks the gas in the upper space is fixed at a position on the Y axis negative direction side with respect to the upper space of the receiving part 53R. Thus, a gas flow is formed in which the gas discharged from the gas supply pipe 538R is guided to the exhaust part 539R through the space above the liquid receiving part 53R. Therefore, even if the dropletized coating liquid or mist-like coating liquid floating inside the liquid receiving portion 53R floats outside from the slit opening portion 533a, the coating liquid is sucked by the exhaust portion 539R. Application failure caused by the coating liquid floating from the inside of the portion 53R dropping on the substrate P and adhering to the upper surface can be prevented.

  Further, in the first embodiment and the second embodiment described above, an example in which air supplied by being pressurized from the outside of the coating apparatus 1 is supplied to the rear of the nozzle unit 50 that moves at high speed is used. Other gases may be supplied. For example, other gas may be supplied as long as it is a gas that does not affect the coating environment applied to the substrate P, such as nitrogen. Further, in the coating apparatus 1, a static pressure bearing (for example, an air static pressure bearing) is configured between the guide member 511 and the nozzle unit 50 in order to enable the nozzles 52 a to 52 c to move at high speed on the substrate P. May be. In this case, it is possible to discharge a part of the gas (for example, air or nitrogen) for the hydrostatic bearing supplied to the nozzle unit 50 from the gas supply pipes 521L and 521R.

  In the above-described embodiment, an example in which the slit opening 533 a is formed on the upper surface of the liquid receiving portion 53 has been described. However, an opening in another mode may be formed on the upper surface of the liquid receiving portion 53. For example, an aspect in which the entire upper surface of the liquid receiving portion 53 is open (that is, an aspect without the upper plate member 533) may be used. In this case, the downflow generating unit 530 in the first embodiment forms a local downflow with respect to the entire upper surface of the liquid receiving unit 53.

  Further, in the above-described embodiment, the present invention can be applied even to the coating apparatus 1 in which the liquid receiving portion 53 in which the porous member 534 is provided in the box portion 532 is provided. FIG. 11 is a side sectional view showing a structural example of the liquid receiving portion 53 in which the porous member 534 is provided inside the box portion 532.

  As shown in FIG. 11, a plate-like porous member 534 is provided inside the box portion 532. The porous member 534 is made of a hard plate-like porous material having pores at a predetermined ratio. And the porous member 534 is installed above the inside of the box part 532 so that the upper surface opening part of the box part 532 of the aspect without the upper board member 533 may be covered. That is, a space inside the box portion 532 is formed below the porous member 534, and gas, coating liquid, and the like in the space are sucked from the suction port of the suction portion 536 in the box. Therefore, when the coating liquid containing the organic EL material is discharged on the upper surface of the porous member 534, the coating liquid flows into the space inside the box portion 532 through the pores formed in the porous member 534. To do. Then, the coating liquid that has flowed into the space is sucked from the suction port of the suction unit 536 in the box and discharged to the outside of the coating apparatus 1. Even in such a coating apparatus 1 using the liquid receiving portion 53 in which the porous member 534 is provided in the box portion 532, the mist-like coating liquid rises upward from the upper surface of the porous member 534 and the substrate. Needless to say, the present invention is applicable to prevent adhesion to P. In addition, when using the downflow production | generation part 530 in 1st Embodiment with respect to the liquid receiving part 53 in which the porous member 534 was provided in the box part 532, as shown in FIG. A local downflow is formed on the entire upper surface (that is, the entire upper surface of the porous member 534).

  In the above-described embodiment, each time the nozzle unit 50 linearly moves in the X-axis direction, the stage 21 is moved by a predetermined pitch in the Y-axis direction, so that the nozzle unit 50 and the stage 21 are relative to the Y-axis direction. However, the present invention is not limited to this. For example, each time the nozzle unit 50 linearly moves in the X-axis direction, the nozzle unit 50 is moved by a predetermined pitch in the Y-axis direction (that is, the organic EL coating mechanism 5 moves in the Y-axis direction). The relative positional relationship between the stage 21 and the stage 21 in the Y-axis direction may be changed. In this case, the liquid receiving unit 53 moves together with the organic EL coating mechanism 5 by a predetermined pitch in the Y-axis direction.

  In the above-described embodiment, the example in which the coating apparatus 1 applies the coating liquid containing the organic EL material forming the light emitting layer to the substrate P is used. However, the red light emitting polymer organic EL material and the green light emitting polymer are used. It goes without saying that a coating solution containing an organic EL material and a blue-light emitting polymer organic EL material can be applied. Further, the coating apparatus 1 of the present invention is a coating that includes other organic EL materials such as a hole transport layer material, a hole injection layer material, an electron transport layer material, and an electron injection layer material in addition to the organic light emitting layer material. It can also be used when applying a liquid.

  Specifically, when the coating apparatus 1 in the above-described embodiment applies a coating liquid containing a polymer organic EL material that emits red light out of red, green, and blue light, this coating process includes an organic EL device. It is an intermediate process of manufacturing. When manufacturing an organic EL device, a hole injection layer material coating, a hole transport material (for example, PEDOT) coating, a red light emitting organic EL material coating, a green light emitting organic EL material coating, a blue light emitting organic EL material coating There are coating processes such as application of an electron transport material and coating of an electron injection layer material, and the coating apparatus of the present invention can be used in any coating process.

  Further, red, green, and blue organic EL materials may be simultaneously discharged from the plurality of nozzles 52, respectively. In this case, a so-called stripe arrangement in which three colors of red, green, and blue are arranged is formed by one coating process.

  In addition, the shape, number, installation position, and the like of each component of the coating apparatus 1 described above are merely examples, and it goes without saying that the present invention can be realized even with other shapes, numbers, and installation positions.

  Moreover, in embodiment mentioned above, although the glass substrate was used as an example of a to-be-coated body, another member can also be used as a to-be-coated body. For example, a flexible substrate made of polyethylene terephthalate (PET), polycarbonate (PC), or the like may be used as the coating object of the coating apparatus 1.

  In the above-described embodiment, the manufacturing apparatus of an organic EL display device that applies a coating liquid containing an organic EL material as a coating liquid has been described as an example. However, the present invention can also be applied to other coating apparatuses. For example, the present invention can be applied to an apparatus for applying a fluorescent material used to manufacture a resist solution, a SOG (Spin On Glass) solution, or a PDP (plasma display panel). Further, the present invention can also be applied to an apparatus for applying a color material used for manufacturing a color filter configured in a liquid crystal cell in order to perform color display on a liquid crystal color display.

  The coating apparatus according to the present invention can prevent the coating liquid discharged outside the substrate from affecting the substrate when the coating liquid is applied to the substrate. It is useful as a device for coating.

DESCRIPTION OF SYMBOLS 1 ... Coating apparatus 2 ... Substrate mounting apparatus 21 ... Stage 22 ... Turning part 23 ... Parallel movement table 24 ... Guide receiving part 25, 511 ... Guide member 3 ... Control part 5 ... Organic EL coating mechanism 50 ... Nozzle unit 51 ... Nozzle Moving mechanism 52 ... Nozzle 520 ... Nozzle holder 521, 538 ... Gas supply pipe 523 ... Electromagnetic valve 524 ... Gas supply mechanism support member 529 ... Filter part 53 ... Liquid receiving part 530, 531 ... Downflow generation part 532 ... Box part 533 ... Upper plate member 534 ... Porous member 536 ... In-box suction parts 537, 539 ... Exhaust part 54 ... Supply part 541 ... Supply source 542 ... Pressurizing part 543 ... Flow meter

Claims (6)

A coating apparatus for coating a coating liquid on a substrate,
A nozzle for discharging the coating liquid from the tip,
A stage for placing the substrate on its upper surface;
A nozzle moving mechanism for reciprocally moving the nozzle in a direction across the stage surface in the space on the stage;
When the nozzle moving mechanism moves the nozzle while discharging the coating liquid from the nozzle to a position off the stage along the transverse direction, the coating liquid discharged from the nozzle to the outside of the stage A liquid receiver for receiving,
In a state in which the nozzle moves in a state in which the nozzle moving mechanism moves the nozzle while discharging the coating liquid from the nozzle onto the stage from a position on the liquid receiver along at least the transverse direction. In contrast, a gas supply mechanism that supplies a predetermined gas to the space behind the nozzle,
Wherein the gas supply mechanism, before Symbol toward the rear space, also supplying the gas in a direction parallel to the upper surface of the liquid receiving part, the coating fabric device. The gas supply mechanism is
A first gas supply pipe for supplying the direction the gas while along the direction of pre-SL crossing,
To the other direction along the direction of pre-SL crossing and a second gas supply pipe for supplying the gas,
The liquid receiver is
A first liquid receiver provided outside the stage in the one direction along the transverse direction;
A second liquid receiver provided outside the stage in the other direction along the transverse direction,
The gas supply mechanism supplies the gas from the first gas supply pipe when at least the nozzle moves from the position on the first liquid receiver to the stage, and at least on the second liquid receiver. supplying the gas from the second gas supply pipe when the nozzle is moved from a position on the stage, the coating apparatus of claim 1. The coating apparatus according to claim 2 , wherein the first gas supply pipe and the second gas supply pipe reciprocate in the transverse direction together with the nozzle by the nozzle moving mechanism. The first gas supply pipe and the second gas supply pipe each have a discharge port for discharging the gas at a position directly above the reciprocation axis of the nozzle that moves along the transverse direction. The coating apparatus according to claim 3 , wherein the coating apparatus is fixed in such a manner as to reciprocate in the transverse direction together with the nozzle by the nozzle moving mechanism. A control unit that controls at least the gas supply operation by the gas supply mechanism;
The control unit supplies the gas via the first gas supply pipe and supplies the second gas when the nozzle is positioned on the one direction side with respect to an intermediate point in the reciprocating movement. Shut off the gas supply from the tube,
The control unit supplies the gas through the second gas supply pipe when the nozzle is positioned on the other direction side with respect to the intermediate point, and from the first gas supply pipe, The coating apparatus according to claim 3 , wherein the gas supply is closed. The gas supply mechanism further includes an exhaust unit that is provided at a position facing the discharge port through which the gas is discharged and supplied through the upper space of the liquid receiving unit, and sucks the gas in the upper space. coating apparatus according to any one of 1 to 5.

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