JP5178732B2 - 粘着剤、粘着シート、多層粘着シート及び電子部品の製造方法 - Google Patents
粘着剤、粘着シート、多層粘着シート及び電子部品の製造方法 Download PDFInfo
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- JP5178732B2 JP5178732B2 JP2009537797A JP2009537797A JP5178732B2 JP 5178732 B2 JP5178732 B2 JP 5178732B2 JP 2009537797 A JP2009537797 A JP 2009537797A JP 2009537797 A JP2009537797 A JP 2009537797A JP 5178732 B2 JP5178732 B2 JP 5178732B2
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Description
101 シリコンウエハ
102 リングフレーム
103 粘着剤層
104 ダイシングブレード
105 ダイアタッチフィルム
106 基材フィルム
107 切り込み
108 ダイチップ
110 粘着シート
111 リードフレーム
本明細書において、単量体とは、いわゆる単量体そのもの、または単量体に由来する構造を意味する。本明細書の部及び%は、特に記載がない限り質量基準とする。本明細書において(メタ)アクリロイル基とはアクリロイル基及びメタアクリロイル基の総称である。(メタ)アクリル酸等の(メタ)を含む化合物等も同様に、名称中に「メタ」を有する化合物と「メタ」を有さない化合物の総称である。ウレタンアクリレートオリゴマの官能基数とは、ウレタンアクリレートオリゴマ分子1個あたりのビニル基数をいう。
図1は、本実施形態の多層粘着シートの構成を説明する断面図である。
本実施形態の多層粘着シート(ダイアタッチフィルム一体型シート)100は、図1(1)に示すように、基材フィルム106と、その基材フィルム106に後述する粘着剤を塗布してなる粘着剤層103と、その粘着剤層103上に積層されてなるダイアタッチフィルム105と、を備える。
粘着剤層103は、(メタ)アクリル酸エステル重合体と、ビニル基を4個以上有するウレタンアクリレートオリゴマと、シリコーングラフト重合体と、を含有する粘着剤から構成される。かかる粘着剤からなる粘着剤層103は、ダイチップ108のピックアップ作業時にダイアタッチフィルム105と粘着剤層103との剥離を容易なものとすることができる。また、ダイシング時のチップ保持性が良好であり、ダイアタッチフィルム105に対する汚染性も低い。
粘着シート110は、粘着剤を基材フィルム106上に塗布することによって製造され、基材フィルム106と、その基材フィルム106上に積層されてなる粘着剤層103とからなる。基材フィルム106の厚さは30μm以上とすることが好ましく、60μm以上とすることがさらに好ましい。また、基材フィルム106の厚さは、300μm以下とすることが好ましく、200μm以下とすることがさらに好ましい。
ダイアタッチフィルム105は、粘着剤や接着剤をフィルム状に成形した粘着性のシートである。ダイアタッチフィルム105は、PET樹脂等からなる剥離用フィルム等に接着剤や粘着剤を積層した状態で市販されており、接着剤や粘着剤を被着体に転写することができる。
電子部品の製造には、粘着シート110の粘着剤塗布面にダイアタッチフィルム105を積層してなる多層粘着シート100を使用する方法が好適に用いられる。本実施形態の多層粘着シート100を使用した電子部品の製造方法は特に限定されないが、例えば図1に示す下記の手順が挙げられる。
(2)ダイシングブレード104でシリコンウエハ101をダイシングする。
(3)多層粘着シート100の基材フィルム106側から紫外線及び/又は放射線(不図示)を照射し、次いで、多層粘着シート100を放射状に拡大してダイチップ108間隔を広げた後、ダイチップ108をニードル等(不図示)で突き上げる。そして、真空コレット又はエアピンセット等(不図示)でダイチップ108を吸着し、粘着シート110とダイアタッチフィルム105との間で剥離し、ダイアタッチフィルム105が付着したダイチップ108をピックアップする。
(4)ダイアタッチフィルム105が付着したダイチップ108をリードフレーム111又は回路基板上に搭載(マウント)する。そして、ダイアタッチフィルム105を加熱し、ダイチップ108とリードフレーム111又は回路基板とを加熱接着する。最後に、リードフレーム111又は回路基板に搭載したダイチップ108を樹脂(不図示)でモールドする。
以下、本実施形態の多層粘着シート100の作用効果について図1を参照しながら説明する。
実施例に係る粘着剤、粘着シート、及び多層粘着シートなどの各種実験材料は下記の処方で製造した。
・(メタ)アクリル酸エステル重合体A:エチルアクリレート54%、ブチルアクリレート22%、メトキシエチルアクリレート24%の共重合体であって懸濁重合により得られたもの(当社重合品)。
・(メタ)アクリル酸エステル重合体B:2−エチルヘキシルアクリレート95%、2−ヒドロキシエチルアクリレート5%の共重合体であって溶液重合により得られたもの(当社重合品)。
・ウレタンアクリレートオリゴマB:ポリ(プロピレンオキサイド)ジオールの末端にトリレンジイソシアネート(芳香族ジイソシアネート)を反応させてなる末端イソシアネートオリゴマに、更にジペンタエリスリトールペンタアクリレートを反応させてなる末端アクリレートオリゴマ。Mnが3,800でアクリレート官能基数10個(10官能)(当社重合品)。
・ウレタンアクリレートオリゴマC:ポリ(エチレンオキサイド)ジオールの末端にイソホロンジイソシアネート(脂環族ジイソシアネート)の三量体を反応させてなる末端イソシアネートオリゴマに、更にジペンタエリスリトールペンタアクリレートを反応させてなる末端アクリレートオリゴマ。Mnが2,800で、1分子あたりのアクリレート官能基数10個(10官能)(当社重合品)。
・ウレタンアクリレートオリゴマD:ポリ(プロピレンオキサイド)ジオールの末端にヘキサメチレンジイソシアネートを反応させてなる末端イソシアネートオリゴマに、更に2−ヒドロキシエチルアクリレートを反応させてなる末端アクリレートオリゴマ。数平均分子量(Mn)が3,400、ビニル基数は1分子あたり2個(2官能)(当社重合品)。
・シリコーングラフト重合体B:シリコーングラフトオリゴマ30質量部、ブチルアクリレート20質量部、メチルメタアクリレート20質量部、2−ヒドロキシメチルアクリレート20質量部、メタクリル酸10質量部を重合し、更にグリシジルメタクリレートを付加重合してなるシリコーングラフト重合体(当社重合品)。シリコーングラフトオリゴマはシリコーン分子鎖の末端にメタアクリロイル基を有するシリコーングラフトオリゴマ(当社重合品)を使用した。
・シリコーン化合物A:シリコーン油(信越化学社製、製品名KF−96)。
・硬化剤:1,6−ヘキサメチレンジイソシアネートのトリメチロールプロパンアダクト体(日本ポリウレタン社製、製品名コロネートHL)。
ダイアタッチフィルム:厚さ30μmのフィルムであり、その組成は、ポリイミド接着剤及びエポキシ接着剤の混合物である。
電子部品の製造には、ダミーの回路パターンを形成した直径6インチ×厚さ0.4mmのシリコンウエハを用いた。
粘着シートへの切り込み量は30μmとした。ダイシングは10mm×10mmのチップサイズで行った。
ダイシング装置はDISCO社製 DAD341を用いた。ダイシングブレードはDISCO社製NBC−ZH205O−27HEEEを用いた。
ダイシングブレード形状:外径55.56mm、刃幅35μm、内径19.05mm。
ダイシングブレード回転数:40,000rpm。
ダイシングブレード送り速度:80mm/秒。
切削水温度:25℃。
切削水量 :1.0L/分。
多層粘着シートを用いてシリコンウエハをダイシングした後、エキスパンド装置を用いてエキスパンドを行った。
エキスパンド装置:HUGLE社製ELECTRONICS HS−1800型。
引き落とし量:20mm。
引き落とし速度:20mm/秒。
加温条件:40℃×1分。
1.多層粘着シートの粘着力:多層粘着シートを予め80℃に加温したシリコンウエハ上に貼り合せ、2kgロ−ラの1往復で圧着し、圧着1日後に、紫外線を300mJ/cm2照射した前後の試料を用いて粘着シートとダイアタッチフィルムとの界面を剥離した。結果を表1、表2に示す。
剥離方法:180°ピ−ル。
引張り速度:300mm/分。
◎(優):多層粘着シートに保持されているチップが95%以上。
○(良):多層粘着シートに保持されているチップが90%以上95%未満。
×(不可):多層粘着シートに保持されているチップが90%未満。
◎(優):95%以上のチップがピックアップできた。
○(良):80%以上95%未満のチップがピックアップできた。
×(不可):80%未満のチップがピックアップできた。
◎(優):パーティクルが500個未満。
○(良):パーティクルが2000個未満。
×(不可):パーティクルが2000個以上。
表1および表2に示した実験結果からわかるように、本発明に係る粘着剤を用いた多層粘着シートは、ダイシング時のチップ保持性に優れ、ピックアップ作業時にダイアタッチフィルムと粘着剤層との剥離が容易であり、かつ、微少な糊残りによる汚染性も低い。
Claims (9)
- エチルアクリレートとブチルアクリレートとメトキシエチルアクリレートとを含む(メタ)アクリル酸エステル重合体と、
ヒドロキシル基と複数の(メタ)アクリレート基を含有する(メタ)アクリレート化合物をイソシアネート三量体と反応させることによって形成される、ビニル基を4個以上有するウレタンアクリレートオリゴマと、
シリコーングラフト重合体と、
を含有し、
前記(メタ)アクリル酸エステル重合体100質量部に対して、前記ビニル基を4個以上有するウレタンアクリレートオリゴマ20質量部以上200質量部以下を含有し、前記シリコーングラフト重合体0.05質量部以上20質量部以下を含有する、粘着剤。 - 前記シリコーングラフト重合体が、重合前の配合物の一つを(メタ)アクリル酸エステル単量体とする、請求項1に記載の粘着剤。
- 前記(メタ)アクリル酸エステル単量体がヒドロキシル基を有する、請求項2記載の粘着剤。
- 前記ウレタンアクリレートオリゴマが、10又は15のビニル基を有する、請求項1に記載の粘着剤。
- 基材フィルムと、該基材フィルムに請求項1乃至4のいずれか一項に記載の粘着剤を塗布してなる粘着剤層と、を備える、粘着シート。
- 電子部品固定用である、請求項5に記載の粘着シート。
- 請求項6に記載の粘着シートと、該粘着シートの前記粘着剤層側に積層されてなるダイアタッチフィルムと、を備える、多層粘着シート。
- ウエハをダイシングして得られる電子部品の製造方法であって、請求項7に記載の多層粘着シートの前記ダイアタッチフィルム表面にウエハを貼り合わせる工程と、該多層粘着シートに貼り合わされた状態で、該ウエハのダイシングを行う工程と、該ダイシング後に、該ダイアタッチフィルムおよび前記粘着剤層とを剥離することによって、該ウエハおよび該ウエハの裏面に付着しているダイアタッチフィルムを併せてピックアップする工程と、を含む、電子部品の製造方法。
- ウエハをダイシングして得られる電子部品の製造方法であって、ウエハの裏面にペースト状接着剤を全面塗布する工程と、該ペースト状接着剤を加熱してシート状に半硬化させて接着剤半硬化層を形成する工程と、該ウエハの接着剤半硬化層と請求項6に記載の粘着シートの粘着剤層とを貼り合わせる工程と、該粘着シートに貼り合わされた状態で、該ウエハのダイシングを行う工程と、該ダイシング後に、該接着剤半硬化層および前記粘着剤層とを剥離することによって、該ウエハおよび該ウエハの裏面に付着している接着剤半硬化層を併せてピックアップする工程と、を含む、電子部品の製造方法。
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KR (1) | KR101359748B1 (ja) |
CN (1) | CN101842455A (ja) |
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Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4107417B2 (ja) * | 2002-10-15 | 2008-06-25 | 日東電工株式会社 | チップ状ワークの固定方法 |
SG175933A1 (en) * | 2009-05-12 | 2011-12-29 | Denki Kagaku Kogyo Kk | Adhesive, adhesive sheet, and process for producing electronic components |
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KR20120099238A (ko) * | 2009-11-30 | 2012-09-07 | 덴끼 가가꾸 고교 가부시키가이샤 | 점착시트 및 전자부품 |
PH12012501270A1 (en) * | 2009-12-21 | 2012-11-05 | Denki Kagaku Kogyo Kk | Adhesive sheet and production method for electronic component |
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US9064879B2 (en) * | 2010-10-14 | 2015-06-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Packaging methods and structures using a die attach film |
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JP5161284B2 (ja) * | 2010-10-14 | 2013-03-13 | 電気化学工業株式会社 | 電子部品の製造方法 |
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CN107207674A (zh) * | 2015-01-27 | 2017-09-26 | 日产化学工业株式会社 | 易解体性树脂薄膜形成组合物和易解体性树脂薄膜 |
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JP7348838B2 (ja) * | 2018-06-05 | 2023-09-21 | 積水化学工業株式会社 | 粘着テープ |
JP7410645B2 (ja) * | 2019-03-08 | 2024-01-10 | 積水化学工業株式会社 | 粘着テープ |
JP7255373B2 (ja) * | 2019-06-10 | 2023-04-11 | 三菱ケミカル株式会社 | 活性エネルギー線硬化性剥離型粘着剤組成物および剥離型粘着シート |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02123182A (ja) * | 1988-11-01 | 1990-05-10 | Nitto Denko Corp | 再剥離型粘着剤 |
JPH0745557A (ja) * | 1993-07-27 | 1995-02-14 | Lintec Corp | ウェハ貼着用粘着シート |
JPH11293201A (ja) * | 1998-04-10 | 1999-10-26 | Nippon Synthetic Chem Ind Co Ltd:The | 再剥離型粘着剤 |
JP2001162732A (ja) * | 1999-12-08 | 2001-06-19 | Nippon Kayaku Co Ltd | 放射線硬化型樹脂組成物の硬化皮膜を有するフィルム |
JP2002158276A (ja) * | 2000-11-20 | 2002-05-31 | Hitachi Chem Co Ltd | ウエハ貼着用粘着シートおよび半導体装置 |
JP2002226796A (ja) * | 2001-01-29 | 2002-08-14 | Hitachi Chem Co Ltd | ウェハ貼着用粘着シート及び半導体装置 |
JP2003073629A (ja) * | 2001-09-03 | 2003-03-12 | Somar Corp | 粘着組成物及び粘着シート |
JP2004221336A (ja) * | 2003-01-15 | 2004-08-05 | Hitachi Chem Co Ltd | ダイボンドダイシング一体型フィルム |
JP2005268552A (ja) * | 2004-03-18 | 2005-09-29 | Sanyo Electric Co Ltd | 半導体装置およびその製造方法 |
JP2006137816A (ja) * | 2004-11-11 | 2006-06-01 | Denki Kagaku Kogyo Kk | 半導体部材用粘着シート |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2678655B2 (ja) | 1989-03-20 | 1997-11-17 | 日東電工株式会社 | 半導体チップ固着キャリヤの製造方法及びウエハ固定部材 |
JP3483161B2 (ja) | 1994-08-11 | 2004-01-06 | リンテック株式会社 | 粘接着テープおよびその使用方法 |
JP3966808B2 (ja) | 2002-12-03 | 2007-08-29 | 古河電気工業株式会社 | 粘接着テープ |
US7495344B2 (en) * | 2004-03-18 | 2009-02-24 | Sanyo Electric Co., Ltd. | Semiconductor apparatus |
-
2007
- 2007-10-16 KR KR1020107010495A patent/KR101359748B1/ko active Active
- 2007-10-16 CN CN200780101127A patent/CN101842455A/zh active Pending
- 2007-10-16 US US12/738,083 patent/US8389629B2/en active Active
- 2007-10-16 WO PCT/JP2007/070165 patent/WO2009050785A1/ja active Application Filing
- 2007-10-16 JP JP2009537797A patent/JP5178732B2/ja active Active
- 2007-10-19 TW TW96139197A patent/TWI413671B/zh active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02123182A (ja) * | 1988-11-01 | 1990-05-10 | Nitto Denko Corp | 再剥離型粘着剤 |
JPH0745557A (ja) * | 1993-07-27 | 1995-02-14 | Lintec Corp | ウェハ貼着用粘着シート |
JPH11293201A (ja) * | 1998-04-10 | 1999-10-26 | Nippon Synthetic Chem Ind Co Ltd:The | 再剥離型粘着剤 |
JP2001162732A (ja) * | 1999-12-08 | 2001-06-19 | Nippon Kayaku Co Ltd | 放射線硬化型樹脂組成物の硬化皮膜を有するフィルム |
JP2002158276A (ja) * | 2000-11-20 | 2002-05-31 | Hitachi Chem Co Ltd | ウエハ貼着用粘着シートおよび半導体装置 |
JP2002226796A (ja) * | 2001-01-29 | 2002-08-14 | Hitachi Chem Co Ltd | ウェハ貼着用粘着シート及び半導体装置 |
JP2003073629A (ja) * | 2001-09-03 | 2003-03-12 | Somar Corp | 粘着組成物及び粘着シート |
JP2004221336A (ja) * | 2003-01-15 | 2004-08-05 | Hitachi Chem Co Ltd | ダイボンドダイシング一体型フィルム |
JP2005268552A (ja) * | 2004-03-18 | 2005-09-29 | Sanyo Electric Co Ltd | 半導体装置およびその製造方法 |
JP2006137816A (ja) * | 2004-11-11 | 2006-06-01 | Denki Kagaku Kogyo Kk | 半導体部材用粘着シート |
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TWI413671B (zh) | 2013-11-01 |
JPWO2009050785A1 (ja) | 2011-02-24 |
CN101842455A (zh) | 2010-09-22 |
TW200918623A (en) | 2009-05-01 |
KR101359748B1 (ko) | 2014-02-06 |
US8389629B2 (en) | 2013-03-05 |
WO2009050785A1 (ja) | 2009-04-23 |
KR20100100787A (ko) | 2010-09-15 |
US20100248452A1 (en) | 2010-09-30 |
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