JP5117672B2 - Exposure method and exposure apparatus - Google Patents

Description

  The present invention relates to an exposure method and an exposure apparatus in which a pair of photomasks are arranged on both sides of a belt-shaped substrate conveyance path, and a pattern is transferred to both surfaces of the belt-shaped substrate by the pair of photomasks. The present invention relates to an alignment technique between photomasks.

  2. Description of the Related Art Conventionally, a wiring pattern such as an electric circuit is formed on a flexible substrate, which is a belt-shaped base material, by a circuit formation technique including an exposure process, a development process, an etching process, and the like using a photomask. In this exposure step, it is necessary to accurately align the flexible substrate and the photomask. For this alignment, for example, alignment marks are provided on a flexible substrate and a photomask, respectively, and both alignment marks are read by a CCD camera. That is, the relative position between the flexible substrate and the photomask is adjusted based on the mark position information from the image read by the CCD camera (see, for example, Patent Document 1).

  In recent years, flexible boards are not only manufactured as flat cables, but are required to have high-precision, high-density patterns and multilayers that can mount electronic components such as semiconductor devices, as well as rigid printed boards. It's getting on. Along with this, the pattern transfer accuracy on the front and back of the substrate as well as the pattern transfer accuracy on the flexible substrate is required in the exposure, that is, the two photomasks are aligned with each other with high accuracy and the two photomasks are mutually aligned. The need to align with high accuracy has arisen.

  Hereinafter, an example of a conventional alignment method in the case of performing both-side exposure will be described. 10 and 11, the flexible substrate 100, which is a belt-shaped material, is transported in the longitudinal direction T by the transport means. A photosensitive material (photoresist) is applied to both surfaces of the flexible substrate 100. In the flexible substrate 100, the exposure range 101 is set substantially continuously along the longitudinal direction. Translucent alignment marks 102 are respectively provided at four locations outside the four corners of each planned exposure range 101. The first photomask 103 and the second photomask 104 are arranged to face each other on both sides of the flexible substrate 100 to be conveyed. As shown in FIG. 11, the first photomask 103 is provided with a first pattern portion 103a. Non-transparent alignment marks 105 are provided at two locations outside the diagonal position of the first pattern portion 103a. As shown in FIG. 11, the second photomask 104 is provided with a second pattern portion 104a. Non-transparent alignment marks 106 are provided at two positions outside the diagonal position of the first photomask 103 and outside the diagonal position of the second pattern portion 104a.

  The reason why the pair of alignment marks 105 and 105 and the alignment marks 106 and 106 provided on the first photomask and the second photomask as described above are arranged at different diagonal positions is as follows. Since the alignment marks 105 and 106 are the same circular non-transparent mark and it is difficult to specify which mark when reading with the CCD camera, the alignment marks 105 and 106 do not overlap. This is because they have to be provided at different positions.

  The positions of the first photomask 103 and the second photomask 104 are adjusted with respect to the flexible substrate 100 by position adjusting means (not shown).

  The CCD camera 107 is disposed at a position far from the first photomask 103 with respect to the flexible substrate 100 and is set to be movable in the surface direction of the flexible substrate 100.

  In the above configuration, when the flexible substrate 100 is transported by a predetermined distance by the transport means, the exposure range 101 of the flexible substrate 100 is disposed substantially opposite to the first and second photomasks 103 and 104. Then, the positions of the four alignment marks 102, 105, 106 on the flexible substrate 100 are read by the CCD camera 107. Based on the position information of the mark obtained as a result, the positions of the first photomask 103 and the second photomask 104 with respect to the flexible substrate 100 are adjusted to perform alignment.

When the position adjustment of the first and second photomasks 103 and 104 with respect to the flexible substrate 100 is completed, the irradiation light L1 and L2 are irradiated to both surfaces of the flexible substrate 100 through the first and second photomasks 103 and 104, respectively. The pattern is transferred to both sides of 100.
JP 2004-347964 A (paragraph number 0024)

  However, in the above-described conventional alignment method at the time of exposure, the first photomask 103 and the second photomask 104 are aligned with reference to different alignment marks 102 on the flexible substrate 100. Therefore, if there are variations in the position accuracy, image recognition accuracy, and the like of each alignment mark 102, the first photomask 103 and the second photomask 104 are aligned under the influence of the variation. Therefore, the flexible substrate 100 and the first and second photomasks 103 and 104 are aligned with high accuracy, but the first photomask 103 and the second photomask 104 cannot be aligned with high accuracy. There's a problem. If the first photomask 103 and the second photomask 104 are not aligned with high accuracy, the positions of the patterns on both surfaces of the flexible substrate 100 are shifted.

  Therefore, the present invention solves the above-described problems, and provides an exposure method and an exposure apparatus that can align not only between the belt-shaped substrate and the first and second photomasks but also between the first photomask and the second photomask with high accuracy. The purpose is to provide.

The exposure method according to the present invention intermittently feeds a belt-like substrate having a photosensitive material formed on both sides along the longitudinal direction thereof, so that the exposure processing position faces both surfaces of the belt-like substrate. In addition, a first photomask and a second photomask are arranged, and light is applied to both surfaces of the belt-shaped substrate through the first photomask and the second photomask, whereby both surfaces of the belt-shaped substrate are irradiated. An exposure method for transferring a pattern drawn on each of the first photomask and the second photomask, wherein the band-shaped substrate, the first photomask, and the second photomask include the band-shaped substrate and to align the first photomask and the second photomask to each other, a plurality of alignment marks in opposite positions are respectively provided, the alignment mark of the strip-like base material It is a translucent circle, one of the alignment marks of the first photomask and the second photomask is a non-translucent annular shape, and the other is smaller in diameter than the inner circumference of the annular shape. It is a non-transparent circle, the annular alignment mark of the first or second photomask is the largest, the alignment mark of the strip substrate is the next largest, and the first or second photomask A circular alignment mark is set to be the smallest, and the first photomask and the second photomask are each provided with a plurality of auxiliary alignment marks at outer positions not opposed to the band-shaped substrate, One of the auxiliary alignment marks of the photomask and the second photomask is a non-transparent annular shape, and the other is a non-transparent circular shape having a smaller diameter than the inner circumference of the annular shape, First photoma Auxiliary alignment marks provided on each of the first photomask and the second photomask are simultaneously read by one CCD camera, and at least one of the first photomask and the second photomask is based on the data obtained as a result. One of them is moved in the X, Y, and θ directions to roughly align the first photomask and the second photomask, and an alignment mark provided on the band-shaped substrate at the opposite position, and the first photomask Three alignment marks provided on each of the mask and the second photomask are simultaneously read by one CCD camera, and based on the data obtained as a result, the first photomask and At least one of the second photomasks is moved in the X, Y, and θ directions so that the band-shaped substrate, the first photomask, Characterized by the serial second photomask aligned respectively.

In the exposure method according to the present invention, the belt-like base material is at an auxiliary position at the same longitudinal position as the positions of the auxiliary alignment marks of the first photomask and the second photomask in the longitudinal direction of the belt-like base material. The auxiliary alignment mark of the band-shaped base material is formed in a translucent circle, and each auxiliary alignment mark of the first photomask and the second photomask, and the band-shaped base The auxiliary alignment mark of the material is read by moving a CCD camera, and the band-shaped substrate, the first photomask, and the second photomask are roughly aligned.

In the exposure apparatus according to the present invention, the exposure apparatus according to the present invention is configured such that a predetermined exposure range is set continuously along the longitudinal direction, and alignment marks are provided at a plurality of positions for each predetermined exposure range. And a base material transport means for transporting the belt-like base material in the longitudinal direction and a position of the belt-like base material transport path sandwiching the belt-like base material, each of which is provided with alignment marks at a plurality of positions. 1 and a second photomask, and a CCD camera, and each of the alignment marks at a plurality of positions of the first and second photomasks is disposed at a position corresponding to the same alignment mark of the strip-shaped substrate, The alignment mark of the band-shaped substrate is a translucent circle, one of the alignment marks of the first photomask and the second photomask is a non-translucent annular shape, and the other is This circle A non-translucent circle having a smaller diameter than the inner circumferential circle, the annular alignment mark of the first or second photomask is the largest, the alignment mark of the band-shaped substrate is the next largest, The circular alignment mark of the first or second photomask is set to be the smallest, and the first photomask and the second photomask are respectively provided with auxiliary alignment marks at outer positions not opposed to the band-shaped substrate. One of the auxiliary alignment marks of the first photomask and the second photomask is provided with a non-transparent annular shape, and the other is non-translucent with a smaller diameter than the annular inner circumference. The CCD camera can simultaneously read three alignment marks at corresponding positions of the belt-shaped substrate, the first photomask, and the second photomask, and Two auxiliary alignment marks at corresponding positions of one photomask and the second photomask can be read simultaneously, and based on the data obtained as a result, the first photomask and the second photomask Position adjusting means for aligning the belt-shaped substrate, the first photomask, and the second photomask by moving at least one of the belt-shaped substrate in the X, Y, and θ directions, by irradiating light through the first and second photomask has a structure of transferring each pattern drawn in the first and second photo mask on both surfaces of the strip-like base material, the first photomask and the Data obtained as a result of reading the auxiliary alignment marks provided on each of the second photomasks simultaneously with one CCD camera. Based on this, the position adjusting means moves at least one of the first photomask and the second photomask in the X, Y, and θ directions to roughly align the first photomask and the second photomask. , The three alignment marks of the alignment mark provided on the belt-like base material at the opposed positions and the alignment mark provided on each of the first photomask and the second photomask at the same time. Based on the data obtained by reading with the CCD camera and the result, at least one of the first photomask and the second photomask is moved in the X, Y, and θ directions by the position adjusting means, and the belt-like substrate is moved. The material is aligned with the first photomask and the second photomask, respectively .

In the exposure apparatus according to the present invention, the belt-like base material is in the same longitudinal position as the positions of the auxiliary alignment marks of the first photomask and the second photomask in the longitudinal direction of the belt-like base material. An auxiliary alignment mark is provided, and the auxiliary alignment mark of the band-shaped substrate is formed in a translucent circle.

In the exposure apparatus according to the present invention, the base material transport unit has a vertical transport section for transporting the belt-shaped base material along a vertical direction, and the first and second photomasks are used in the vertical transport section. it characterized in that is opposed.

According to the present invention, since both the first photomask and the second photomask are aligned with reference to the same alignment mark on the belt-shaped substrate, the positional accuracy of the alignment mark on the belt-shaped substrate, the image recognition accuracy, etc. Not easily affected. Therefore, not only between the belt-shaped substrate and the first and second photomasks but also between the first photomask and the second photomask can be aligned with high accuracy.

According to the present invention, by taking into account the size and shape of each alignment mark, three alignments are performed at the accurate alignment position of the belt-shaped substrate, the first photomask, and the second photomask, and at least in the vicinity thereof. Marks can be read simultaneously.

According to the present invention, since both the first photomask and the second photomask are aligned with reference to the same alignment mark on the belt-like substrate, an error occurs in the alignment mark position accuracy, image recognition accuracy, and the like. However, it is not easily affected. Therefore, not only between the belt-shaped substrate and the first and second photomasks but also between the first photomask and the second photomask can be aligned with high accuracy.

According to the present invention, since the belt-like substrate does not bend by its own weight, the flatness of the belt-like substrate can be easily maintained without applying unnecessary tension, and therefore, the dimensional change due to the elongation of the belt-like substrate is small. Therefore, high alignment accuracy can be obtained during the exposure process. Moreover, it is difficult for dust to adhere to the belt-like substrate and the first and second photomasks. Furthermore, since a long optical path can be secured as compared with the case where the exposure part is in the horizontal part, faithful transfer with higher-quality parallel light is possible.

  Hereinafter, details of an exposure method and an exposure apparatus according to an embodiment of the present invention will be described with reference to the drawings.

1 to 5 show an embodiment of the present invention, FIG. 1 is a schematic block diagram of an exposure apparatus, and FIG. 2 is a diagram showing an arrangement of a flexible substrate and a first photomask viewed from the direction of arrow A in FIG. 3 is a cross-sectional view taken along the line BB in FIG. 2, FIG. 4 is an enlarged view of a main part of the portion C in FIG. 3 , and FIG. 5 is a diagram illustrating a state of three alignment marks at the alignment position.

  As shown in FIG. 1, the exposure apparatus 1 includes a base plate 2 and a housing 3 installed on the base plate 2. A dark room 3 a is formed in the housing 3.

  The base material conveying means 4 includes a feeding reel 5 installed on one base plate 2 outside the housing 3, a take-up reel 6 installed on the other base plate 2 outside the housing 3, and a feeding reel. A plurality of guide rolls 7 a to 7 n for forming a predetermined conveyance path between the reel 5 and the take-up reel 6, and a drive roll 8 that applies a conveyance force to the flexible substrate 10 that is a belt-like substrate. . Most of the transport path is arranged in the dark room 3a. A space between the guide roll 7f at the lower position and the guide roll 7h at the upper position in the dark room 3a is a vertical conveyance section for conveying the flexible substrate 10 in the vertical direction.

  The flexible substrate 10, which is a belt-like base material, is wound around the supply reel 5 and the take-up reel 6 at both ends, and is disposed along the transport path of the base material transport means 4. The flexible substrate 10 is transported by the substrate transport means 4 with the longitudinal direction as the transport direction T. A photosensitive material is applied to both surfaces of the flexible substrate 10.

  The first photomask 11 and the second photomask 12 are arranged to face each other on both sides of the flexible substrate 10 in the vertical conveyance section of the base material conveyance unit 4. The first and second photomasks 11 and 12 have first and second pattern portions 11a and 12a on which desired patterns are drawn, respectively.

  The first photomask 11 is held by a support. This support is supported by the first frame 14 via the first position adjusting means 13. Accordingly, the first photomask 11 is moved in the X, Y, θ (rotation direction of the XY plane) direction parallel to the surface of the flexible substrate 10 by the position adjusting means 13 and is positioned relative to the flexible substrate 10. It can be adjusted.

  The second photomask 12 is held by a support. This support is supported by the second frame 16 via the second position adjusting means 15. Accordingly, the second photomask 12 can be adjusted to a relative position with respect to the flexible substrate 10 by being moved in the X, Y, and θ directions parallel to the surface of the flexible substrate 10 by the position adjusting means 15. Yes.

By irradiating light through the first photomask 11 and the second photomask 12 by the light irradiating means 17 including a light source (not shown) and the first and second mirrors 18 and 19, the first photomask is applied to both surfaces of the flexible substrate 10. The drawn patterns are transferred to the mask 11 and the second photomask.

  The CCD camera 20 serving as a mark reading means is disposed at a position farther from the first photomask 11 with respect to the flexible substrate 10 and is provided so as to be movable in the X and Y directions on a plane parallel to the surface of the flexible substrate 10. Yes.

  Based on the image data from the CCD camera 20, an image processing device (not shown) calculates, and alignment is performed based on the calculation result.

  As shown in FIGS. 2 to 4, in the longitudinal direction of the flexible substrate 10, an exposure exposure range 21 (shown in FIG. 2) is set at a constant interval (or may be continuous), and each exposure exposure range is set. Alignment marks 22 (shown in FIGS. 2 to 4) are provided at four locations for each 21. Four alignment marks 22 are provided at four positions outside the four corners of the planned exposure range 21. Each alignment mark 22 is a translucent circle, and its peripheral part is formed of a non-translucent member.

  Alignment marks 25 and 26 (shown in FIGS. 2 to 4) are provided at four positions on the outer positions of the first and second pattern portions 11a and 12a of the first and second photomasks 11 and 12, respectively. Yes. The four alignment marks 25 of the first photomask 11 are provided at positions corresponding to all the four alignment marks 22 of the flexible substrate 10. Each alignment mark 25 of the first photomask 11 has a non-transparent annular shape. A peripheral portion of each alignment mark 25 of the first photomask 11 is formed of a translucent member. The four alignment marks 26 of the second photomask 12 are also provided at positions corresponding to all the four alignment marks 22 of the flexible substrate 10, similarly to the first photomask 25. Each alignment mark 26 of the second photomask 12 is a non-transparent circle. A peripheral portion of each alignment mark 26 of the second photomask 12 is formed of a translucent member.

  4 and 5, the outer diameter of the alignment mark 22 of the flexible substrate 10 is the largest, the annular alignment mark 25 of the first photomask 11 is the next largest, and the second photomask. The 12 circular alignment marks 26 are the smallest and are set smaller than the annular inner circumference.

  The operation of the exposure apparatus 1 will be described with reference to FIG.

  First, the flexible substrate 10 is transported by a predetermined distance by the substrate transport means 4, and the exposure range 21 of the flexible substrate 10 is disposed substantially opposite to the first and second photomasks 11 and 12.

  Next, the CCD camera 20 reads the peripheral positions around the four alignment marks 22 on the flexible substrate 10. Here, since the flexible substrate 10 is positioned at a predetermined position with respect to the first and second photomasks 11 and 12 by the transport of the base material transport means 4 described above, the CCD camera 20 has three alignment marks. 22, 25 and 26 can be read simultaneously. The amount of positional deviation between the flexible substrate 10 and the first and second photomasks 11 and 12 is calculated using at least two of the four mark image data. Based on the positional deviation amounts of the first photomask 11 and the second photomask 12, the position of the first photomask 11 is set by the first position adjusting means 13, and the position of the second photomask 12 is set by the second position adjusting means 15. Adjust according to each. Next, when the position adjustment is completed, the CCD camera 20 reads the three alignment marks 22, 25, and 26 again, and confirms that it is an accurate alignment position. The confirmation work may be omitted. At the correct alignment position, the three alignment marks 22, 25, and 26 are in the state shown in FIG. In FIG. 5, the area | region with a low luminance level is shown by hatching.

  Next, the light irradiation means 17 irradiates the flexible substrate 10 with the first irradiation light L1 and the second irradiation light L2 through the first photomask 11 and the second photomask 12, respectively. As a result, desired patterns are respectively transferred to both surfaces of the flexible substrate 10. By repeating the steps described above, the pattern is continuously transferred to the planned exposure range 21 of the flexible substrate 10.

  As described above, according to the present invention, in the above-described alignment step, the first photomask 11 and the second photomask 12 are both aligned with reference to the same alignment mark 22 on the flexible substrate 10. Even if errors occur in the position accuracy, image recognition accuracy, etc. of the alignment mark 22, they are not easily affected by the error. Therefore, not only the flexible substrate 10 and the first and second photomasks 11 and 12 but also the first photomask 11 and the second photomask 12 can be aligned with high accuracy.

  In this embodiment, the alignment mark 22 of the flexible substrate 10 is a translucent circle, the alignment mark 25 of the first photomask 11 is a non-translucent annular shape, and the second photomask. The twelve alignment marks 26 are non-translucent circles having a smaller diameter than the annular inner circumferential circle. The alignment marks 22, 25, and 26 of the flexible substrate 10, the first photomask 11, and the second photomask 12 have the largest outer diameters of the alignment marks 22 of the flexible substrate 10, and the first photomasks. Since the annular alignment mark 25 of the mask 11 is the next largest and the circular alignment mark 26 of the second photomask 12 is set to the smallest, the three alignment marks 22, 25 and 26 can be read simultaneously. it can.

  In contrast to this embodiment, a circular alignment mark may be provided on the first photomask 11 and an annular alignment mark may be provided on the second photomask 12.

  In this embodiment, the substrate transport path has a vertical transport section for transporting the flexible substrate 10 along the vertical direction, and the first and second photomasks 11 and 12 are arranged to face each other in the vertical transport section. Therefore, since the flexible substrate 10 is not bent by its own weight, it is easy to maintain the flatness of the flexible substrate 10 without applying unnecessary tension to the flexible substrate 10 during exposure. For this reason, the dimensional change of the flexible substrate 10 is small, and alignment can be performed with high accuracy. Further, dust hardly adheres to the flexible substrate 10 and the first and second photomasks 11 and 12. Furthermore, since a long optical path can be secured as compared with the case where the exposure part is in the horizontal part, faithful transfer with higher-quality parallel light is possible.

(First modification of alignment mark)
6 and 7 show a first modification of the alignment mark, FIG. 6 is an enlarged view of the main part showing the three alignment marks, and FIG. 7 shows the state of the three alignment marks at the accurate alignment position. FIG.

  As shown in FIGS. 6 and 7, the alignment mark 30 of the flexible substrate 10 is a transparent circle, and its peripheral portion is formed of a non-transmissive member. The alignment mark 31 of the first photomask 11 has a non-transparent annular shape. A peripheral portion of each alignment mark 31 of the first photomask 11 is formed of a translucent member. The alignment mark 32 of the second photomask 12 is a non-translucent circle. A peripheral portion of each alignment mark 32 of the second photomask 12 is formed of a translucent member. The size of each alignment mark 30, 31, 32 of the flexible substrate 10, the first photomask 11, and the second photomask 12 is the largest in the annular alignment mark 31 of the first photomask 11, and the flexible mark is flexible. The alignment mark 30 on the substrate 10 is the next largest, and the circular alignment mark 32 on the second photomask 12 is the smallest.

  Also in the first modification, at the alignment position of the flexible substrate 10, the first photomask 11 and the second photomask 12, and at least in the vicinity thereof, as shown in FIG. 7, three alignment marks 30, 31, 32 are provided. Can be read simultaneously.

(Second modification of alignment mark)
8 and 9 show a second modification of the alignment mark, FIG. 8 is a view showing the arrangement of the flexible substrate and the first photomask, and FIG. 9 is a sectional view taken along the line D-D in FIG.

  As shown in FIGS. 8 and 9, the flexible substrate 10, the first photomask 11, and the second photomask 12 are provided with alignment marks 22, 25, and 26 having the same configuration as the embodiment. In addition, auxiliary alignment marks 22a, 25a, and 26a are provided, respectively.

  That is, the flexible substrate 10 is provided with the auxiliary alignment mark 22 a outside the respective exposure scheduled ranges 21 and at an intermediate position between the two alignment marks 22. The first and second photomasks 11, 12 are provided with auxiliary alignment marks 25 a, 26 a at outer positions that are not opposed to the flexible substrate 10 and at the same position in the longitudinal direction T of the flexible substrate 10. Yes.

  The auxiliary alignment mark 22a of the flexible substrate 10 is a light-transmitting circle, and its peripheral portion is formed of a non-light-transmitting member. The auxiliary alignment mark 25a of the first photomask 11 has a non-transparent annular shape. A peripheral portion of the auxiliary alignment mark 25a of the first photomask 11 is formed of a translucent member. The auxiliary alignment mark 26a of the second photomask 12 is a non-translucent circle. A peripheral portion of the auxiliary alignment mark 26a of the second photomask 12 is formed of a translucent member.

  In addition, as a method of using the auxiliary alignment marks 25a and 26a, there are the following methods. That is, when the positions of the second photomask 12 and the flexible substrate 10 are greatly displaced by the alignment marks 22, 25, and 26 only as in the above embodiment, the flexible substrate 10 causes the second photomask 12 to move. A situation occurs in which the alignment mark 26 is hidden and cannot be read. However, in this second modification, even if the alignment mark 26 of the second photomask 12 is hidden by the flexible substrate 10 and its position cannot be read, the auxiliary alignment mark 26a of the second photomask 12 is There is no hiding. Therefore, if the rough alignment between the flexible substrate 10, the first photomask 11, and the second photomask 12 is performed using the three auxiliary alignment marks 22a, 25a, and 26a, the CCD camera is surely thereafter. Thus, the three alignment marks 22, 25, and 26 can be read. Therefore, alignment between the flexible substrate 10, the first photomask 11, and the second photomask 12 can be performed more reliably and smoothly.

(Other embodiments)
It should not be understood that the descriptions and drawings which form part of the disclosure of the above-described embodiments limit the present invention. From this disclosure, various alternative embodiments, examples and operational techniques will be apparent to those skilled in the art.

  For example, in the above-described embodiment and each modification thereof, the three alignment marks 22, 25, and 26 are circular and annular, but are not limited to this, but are triangular, triangular frame, and rectangular. It may be a rectangular frame shape, a polygonal shape, or a polygonal frame shape. In short, it is sufficient that the three alignment marks have a shape that can be read by one CCD camera.

  Moreover, in the said embodiment and each modification, the strip | belt-shaped material is the flexible substrate 10, However, The some rigid board | substrate connected with the strip | belt shape may be sufficient. Not only a strip-shaped material but also a rigid substrate may be used.

  Furthermore, in the said embodiment and its modification, with respect to each exposure plan range 21 of the flexible substrate 10, the 1st pattern part 11a of the 1st photomask 11, and the 2nd pattern part 12a of the 2nd photomask 12 The alignment marks 22, 25, and 26 are provided at four locations, respectively, but may be provided at a minimum of two locations. If only two positions are provided, the number of reading positions of the alignment marks 22, 25, and 26 is reduced compared to the conventional example, so that the exposure work is shortened and the manufacturing cost is reduced. However, when more than two locations are provided as in this embodiment, alignment with high accuracy and high reliability is possible.

  Moreover, in the said embodiment, although the 1st photomask 11 and the 2nd photomask 12 were opposingly arranged on the both sides of the area | region (vertical conveyance area) which conveys the flexible substrate 10 to a perpendicular direction, the flexible substrate 10 is horizontal direction. Of course, a photomask may be arranged oppositely above and below the area to be conveyed.

1 is a schematic block diagram of an exposure apparatus according to an embodiment of the present invention. It is a figure which shows arrangement | positioning of the flexible substrate seen from the arrow A direction of FIG. 1, and a 1st photomask. FIG. 3 is a sectional view taken along line B-B in FIG. 2. It is a principal part enlarged view of the C section of FIG. It is the figure seen from the 1st photomask side shown in FIG. 4, and is a figure which shows the state of the three alignment marks in an exact alignment position. It is a principal part enlarged view which shows the three alignment marks of a 1st modification. It is the figure seen from the 1st photomask side shown in FIG. 6, and is a figure which shows the state of the three alignment marks in the exact alignment position of a 1st modification. It is a figure which shows arrangement | positioning of the flexible substrate and 1st photomask of a 2nd modification. It is the DD sectional view taken on the line of FIG. It is a figure which shows arrangement | positioning of the flexible substrate of a prior art example, and a 1st photomask. It is the EE sectional view taken on the line of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Exposure apparatus 4 Base material conveyance means 10 Flexible substrate (band-shaped material)
DESCRIPTION OF SYMBOLS 11 1st photomask 11a 1st pattern part 12 2nd photomask 12a 2nd pattern part 13 1st position adjustment means 1 5 2nd position adjustment means 20 CCD camera (mark reading means)
21 Expected exposure range 22, 30 Flexible substrate alignment mark 25, 31 First photomask alignment mark 26, 32 Second photomask alignment mark

Claims (5)

A strip-shaped substrate having a photosensitive material formed on both sides thereof is intermittently sent along the longitudinal direction thereof, and the first photomask and the first photomask are disposed at the exposure processing position so as to face both sides of the strip-shaped substrate, respectively. 2 photomasks are disposed, and light is applied to both surfaces of the belt-like substrate through the first photomask and the second photomask, whereby the first photomask and the first photomask are applied to both surfaces of the belt-like substrate. An exposure method for transferring a pattern drawn on each of two photomasks,
The band-shaped substrate, the first photomask, and the second photomask have a plurality of positions at opposite positions in order to align the band-shaped substrate, the first photomask, and the second photomask with each other. Each alignment mark is provided,
The alignment mark of the band-shaped substrate is a translucent circle, one of the alignment marks of the first photomask and the second photomask is a non-translucent annular shape, and the other is It is a non-translucent circle having a smaller diameter than the annular inner circumferential circle, the annular alignment mark of the first or second photomask is the largest, and the alignment mark of the belt-like substrate is the next largest The circular alignment mark of the first or second photomask is set to be the smallest,
The first photomask and the second photomask are each provided with a plurality of auxiliary alignment marks at outer positions not opposed to the band-shaped substrate, and each auxiliary of the first photomask and the second photomask. One of the alignment marks is a non-transparent annular shape, and the other is a non-transparent circular shape having a smaller diameter than the inner circumferential circle of the annular shape,
An auxiliary alignment mark provided on each of the first photomask and the second photomask is simultaneously read by one CCD camera, and the first photomask and the second photomask are based on the data obtained as a result. Moving at least one of the masks in the X, Y, and θ directions to roughly align the first photomask and the second photomask;
Three CCD alignment marks, that is, an alignment mark provided on the belt-like base material at the opposed positions and an alignment mark provided on each of the first photomask and the second photomask, are simultaneously formed into one CCD. Based on data obtained by reading with a camera, at least one of the first photomask and the second photomask is moved in the X, Y, and θ directions to move the band-shaped substrate and the first photomask. And aligning the second photomask with each other. The exposure method according to claim 1,
The band-shaped substrate has auxiliary alignment marks at the same longitudinal position as the positions of the auxiliary alignment marks of the first photomask and the second photomask in the longitudinal direction of the band-shaped substrate;
The auxiliary alignment mark of the band-shaped substrate is formed of a translucent circle,
Each auxiliary alignment mark of the first photomask and the second photomask and the auxiliary alignment mark of the band-shaped substrate are read by moving a CCD camera, and the band-shaped substrate, the first photomask, An exposure method comprising rough alignment with a second photomask. An exposure schedule range is set continuously along the longitudinal direction, and a strip-shaped substrate in which alignment marks are provided at a plurality of positions for each exposure schedule range;
Base material transport means for transporting the belt-shaped base material in the longitudinal direction;
A first photomask and a second photomask that are respectively arranged at positions sandwiching the belt-like substrate in the conveyance path of the belt-like substrate, and each provided with alignment marks at a plurality of positions;
A CCD camera,
Each alignment mark at a plurality of positions of the first and second photomasks is disposed at a position corresponding to the same alignment mark of the belt-shaped substrate,
The alignment mark of the band-shaped substrate is a translucent circle, one of the alignment marks of the first photomask and the second photomask is a non-translucent annular shape, and the other is It is a non-translucent circle having a smaller diameter than the annular inner circumferential circle, the annular alignment mark of the first or second photomask is the largest, and the alignment mark of the belt-like substrate is the next largest The circular alignment mark of the first or second photomask is set to be the smallest,
Each of the first photomask and the second photomask is provided with an auxiliary alignment mark at an outer position not opposed to the band-shaped substrate, and each auxiliary alignment of the first photomask and the second photomask is provided. One of the marks is a non-transparent annular shape, and the other is a non-transparent circular shape having a smaller diameter than the inner circumference of the annular shape,
The CCD camera can simultaneously read three alignment marks at corresponding positions of the belt-like base material, the first photomask, and the second photomask, and the first photomask and the second photomask. The two auxiliary alignment marks at the corresponding position can be read simultaneously,
Based on the data obtained as a result, at least one of the first photomask and the second photomask is moved in the X, Y, and θ directions, and the belt-shaped substrate, the first photomask, and the second photomask are moved. Position adjustment means for aligning each photomask,
A structure in which patterns drawn on the first and second photomasks are transferred onto both surfaces of the belt-like substrate by irradiating light on both surfaces of the belt-like substrate through the first and second photomasks, respectively. And
The auxiliary alignment marks provided on each of the first photomask and the second photomask are simultaneously read by one CCD camera, and the first photomask is read by the position adjusting means based on the data obtained as a result. Moving at least one of the mask and the second photomask in the X, Y, and θ directions to roughly align the first photomask and the second photomask;
Three alignment marks, that is, an alignment mark provided on the belt-like base material at an opposed position and an alignment mark provided on each of the first photomask and the second photomask, are simultaneously combined into one of the above-mentioned alignment marks. Based on data obtained by reading with a CCD camera, at least one of the first photomask and the second photomask is moved in the X, Y, and θ directions by the position adjusting means, and the belt-like base material is moved. An exposure apparatus for aligning the first photomask and the second photomask with each other . An exposure apparatus according to claim 3 Symbol mounting,
The band-shaped substrate has auxiliary alignment marks at the same longitudinal position as the positions of the auxiliary alignment marks of the first photomask and the second photomask in the longitudinal direction of the band-shaped substrate;
The exposure apparatus according to claim 1, wherein the auxiliary alignment mark of the belt-like substrate is formed in a translucent circle. The exposure apparatus according to claim 3 or 4 , wherein
The base material transport path has a vertical transport section for transporting the belt-shaped base material along a vertical direction, and the first and second photomasks are arranged to face each other in the vertical transport section. apparatus.

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