JP4910010B2 - 半導体発光装置 - Google Patents
半導体発光装置 Download PDFInfo
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- JP4910010B2 JP4910010B2 JP2009072478A JP2009072478A JP4910010B2 JP 4910010 B2 JP4910010 B2 JP 4910010B2 JP 2009072478 A JP2009072478 A JP 2009072478A JP 2009072478 A JP2009072478 A JP 2009072478A JP 4910010 B2 JP4910010 B2 JP 4910010B2
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- 239000004065 semiconductor Substances 0.000 title claims description 47
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 70
- 230000003287 optical effect Effects 0.000 claims description 29
- 239000002245 particle Substances 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 13
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- 229910052712 strontium Inorganic materials 0.000 description 13
- 229910052788 barium Inorganic materials 0.000 description 11
- 239000011701 zinc Substances 0.000 description 11
- 239000012190 activator Substances 0.000 description 10
- 239000011777 magnesium Substances 0.000 description 10
- 238000005253 cladding Methods 0.000 description 9
- 229910052749 magnesium Inorganic materials 0.000 description 9
- 229910052725 zinc Inorganic materials 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 239000010931 gold Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 229910052771 Terbium Inorganic materials 0.000 description 7
- 150000004767 nitrides Chemical class 0.000 description 7
- 229910052684 Cerium Inorganic materials 0.000 description 6
- 229910052748 manganese Inorganic materials 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 229910002704 AlGaN Inorganic materials 0.000 description 4
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 4
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 4
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- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
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- 229910052787 antimony Inorganic materials 0.000 description 2
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- 229910052742 iron Inorganic materials 0.000 description 2
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- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
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- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910004709 CaSi Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
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- 229910052581 Si3N4 Inorganic materials 0.000 description 1
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- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229910052789 astatine Inorganic materials 0.000 description 1
- NWAIGJYBQQYSPW-UHFFFAOYSA-N azanylidyneindigane Chemical compound [In]#N NWAIGJYBQQYSPW-UHFFFAOYSA-N 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
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- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- PNHVEGMHOXTHMW-UHFFFAOYSA-N magnesium;zinc;oxygen(2-) Chemical compound [O-2].[O-2].[Mg+2].[Zn+2] PNHVEGMHOXTHMW-UHFFFAOYSA-N 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
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- 239000011574 phosphorus Substances 0.000 description 1
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- 238000002310 reflectometry Methods 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0225—Out-coupling of light
- H01S5/02257—Out-coupling of light using windows, e.g. specially adapted for back-reflecting light to a detector inside the housing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
- H01S5/0087—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping for illuminating phosphorescent or fluorescent materials, e.g. using optical arrangements specifically adapted for guiding or shaping laser beams illuminating these materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
- H01S5/021—Silicon based substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
- H01S5/0213—Sapphire, quartz or diamond based substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/02208—Mountings; Housings characterised by the shape of the housings
- H01S5/02216—Butterfly-type, i.e. with electrode pins extending horizontally from the housings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0225—Out-coupling of light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
- H01S5/32341—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm blue laser based on GaN or GaP
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/327—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIBVI compounds, e.g. ZnCdSe-laser
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- Physics & Mathematics (AREA)
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- Semiconductor Lasers (AREA)
Description
I0:励起光の強度
κ:係数
c:発光体中の蛍光体の濃度(重量)
t:発光体の厚さ(μm)
ctを横軸に、Iを縦軸にプロットしたグラフを図9に示す。
上記式により表される珪酸塩系蛍光体材料の中では、x=0.19、y=0、z=0.05、w=1.0の組成が望ましい。なお、結晶構造を安定化したり、発光強度を高めるために、ストロンチウム(Sr)、バリウム(Ba)、及びカルシウム(Ca)の一部をMg及びZnの少なくともいずれか一方に置き換えてもよい。
賦活剤として、Eu及びMnの少なくとも1つを含む。
上記組成において、x=2かつy=5、又はx=1かつy=7であることが望ましいが、x及びyは、任意の値とすることができる。
なお、Sを、Se及びTeの少なくともいずれかに置き換えてもよい。
なお、Tb、Pr、Mg、Ti、Nb、Ta、Ga、Sm、及びTmからなる群から選ばれる少なくとも1種を、賦活剤として含有してもよい。
なお、CrおよびTbの少なくとも一種を、賦活剤として含有してもよい。
なお、賦活剤として、Tbを含有してもよい。
(9)燐酸塩系蛍光体:(Sr(1−x)Bax)3(PO4)2:Eu、又は(Sr(1−x)Bax)2P2O7:Eu、Sn
なお、Ti及びCuのいずれか一方を、賦活剤として含有してもよい。
なお、Clの少なくとも一部を、フッ素(F)に置き換えてもよい。また、Sb及びMnの少なくとも1つを、賦活剤として含有してもよい。
以上説明した本発明の実施形態に係る半導体発光装置の実施例について、以下に説明する。
本実施例は、図1に示す半導体発光装置に係るものである。
本実施例は、図5に示す半導体発光装置に係るものである。
本実施例は、図7に示す半導体発光装置に係るものである。
Claims (8)
- 光取り出し口を有するパッケージと、このパッケージ内に配置され、紫外光から可視光までの範囲内のいずれかの波長の光を発する半導体レーザダイオードと、前記半導体レーザダイオードが発する光を吸収して波長の異なる可視光を出力する蛍光体を含み、周囲が前記パッケージに密着し、かつ前記レーザダイオードの光路上に配置された可視発光体とを備え、前記パッケージは、底部と蓋部とを備え、前記底部と蓋部の、前記半導体レーザダイオードが発する光の光路に面する面には、可視光および近紫外光を反射するミラーが設けられており、前記底部に設けられたミラーと蓋部に設けられたミラーとの間隔は、前記光路の断面の厚さに対応しており、前記可視発光体は、そのアスペクト比が、2:1以上の長方形もしくは多角形もしくは楕円形の形状を有し、前記レーザダイオードが発する光の出射形状の長軸と、前記可視発光体の長軸が同方向であり、前記可視発光体中の蛍光体の含有量は25〜75重量%であることを特徴とする半導体発光装置。
- 前記半導体レーザダイオードは、テーパ構造を有する2つのヒートシンクによって上下面において挟まれていることを特徴とする請求項1に記載の半導体発光装置。
- 前記2つのヒートシンクのうち少なくとも一方は、前記発光素子とハンダ若しくは導電性ペーストによって接合され、又は前記発光素子との接合面に金属厚膜を有し、密着することで熱的に接合され、他方のヒートシンクは、前記パッケージとの間にバネ状スペーサーを介在して固定されていることを特徴とする請求項2に記載の半導体発光装置。
- 前記2つのヒートシンクは、少なくとも表面に絶縁性を有する金属もしくはセラミックからなるパッケージにより上下から挟まれることにより固定されていることを特徴とする請求項2に記載の半導体発光装置。
- 前記ヒートシンクのテーパ面がミラーであることを特徴とする請求項2〜4のいずれかに記載の半導体発光装置。
- 前記可視発光体が、透明樹脂、無機のガラス、又は結晶中に少なくとも1種類以上の蛍光体粒子を分散してなることを特徴とする請求項1〜5のいずれかに記載の半導体発光装置。
- 前記可視発光体は、蛍光体の焼結体であることを特徴とする請求項1〜6のいずれかに記載の半導体発光装置。
- ガラスもしくは金属または樹脂を母体とする透明な板状もしくはレンズ状の構造物が前記可視発光体より外側に配置され、かつ、前記可視発光体と密着していることを特徴とする請求項1〜7のいずれかに記載の半導体発光装置。
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US12/729,636 US8369375B2 (en) | 2009-03-24 | 2010-03-23 | Semiconductor light-emitting device |
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JP4017269B2 (ja) | 1998-11-10 | 2007-12-05 | 松下電器産業株式会社 | 平行光発生装置 |
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JP5228412B2 (ja) * | 2006-11-21 | 2013-07-03 | 日亜化学工業株式会社 | 半導体発光装置 |
EP1926154B1 (en) * | 2006-11-21 | 2019-12-25 | Nichia Corporation | Semiconductor light emitting device |
JP4264109B2 (ja) | 2007-01-16 | 2009-05-13 | 株式会社東芝 | 発光装置 |
JP5347231B2 (ja) * | 2007-03-23 | 2013-11-20 | 日亜化学工業株式会社 | 半導体レーザ装置 |
JP5044329B2 (ja) | 2007-08-31 | 2012-10-10 | 株式会社東芝 | 発光装置 |
JP5193586B2 (ja) | 2007-12-25 | 2013-05-08 | 株式会社東芝 | 半導体発光装置 |
JP2009260053A (ja) * | 2008-04-17 | 2009-11-05 | Nichia Corp | 発光装置 |
JP5223447B2 (ja) * | 2008-05-12 | 2013-06-26 | 日亜化学工業株式会社 | 半導体発光装置 |
JP2009289976A (ja) * | 2008-05-29 | 2009-12-10 | Nichia Corp | 発光装置 |
JP5305758B2 (ja) | 2008-06-30 | 2013-10-02 | 株式会社東芝 | 半導体発光装置 |
JP5571889B2 (ja) | 2008-08-29 | 2014-08-13 | 株式会社東芝 | 発光装置及び照明装置 |
JP4823300B2 (ja) * | 2008-12-17 | 2011-11-24 | 株式会社東芝 | 半導体発光装置 |
JP2010199357A (ja) * | 2009-02-26 | 2010-09-09 | Nichia Corp | 発光装置及びその製造方法 |
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CN108604765A (zh) * | 2016-01-28 | 2018-09-28 | 索尼公司 | 半导体发光装置 |
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