JP3632812B2 - Substrate transfer equipment - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate transport / transfer apparatus for simultaneously loading and unloading a plurality of substrates into / from a substrate processing apparatus at a pitch larger than the pitch of a substrate cassette housing the substrates during the manufacturing process of liquid crystal substrates and semiconductors. .
[0002]
[Prior art]
Conventionally, vacuum processing apparatuses such as sputtering, CVD, and dry etching for forming a thin film on a substrate surface have been used in the semiconductor and liquid crystal industries. In these vacuum processing apparatuses, a single wafer type multi-chamber vacuum processing apparatus having a plurality of vacuum processing chambers each having an independent exhaust system has been put into practical use.
[0003]
An example of this single wafer type multi-chamber vacuum processing apparatus is shown in FIG. FIG. 13 shows a plan view of the apparatus. A plurality of process chambers 109 and a load lock chamber 107 are arranged around the transfer chamber 110 located in the center. A gate valve V105 is provided between each process chamber 109 and the transfer chamber 110 and between the transfer chamber 110 and the load lock chamber 107, and a gate valve A106 is provided between the load lock chamber 107 and the atmosphere. Each of the chamber 110 and the load lock chamber 107 is composed of a vacuum pump that exhausts air independently.
[0004]
The transfer chamber 110 is provided with a vacuum transfer robot 108 for transferring the substrate 109, and the substrate 102 in the load lock chamber 107 is moved to each process by rotating in the vertical direction with respect to the paper surface and extending and contracting in the horizontal plane. Loading into the chamber 109 and unloading from each process chamber 109 to the load lock chamber 107 are performed. The vacuum transfer robot 108 transfers the substrates 102 one by one.
[0005]
Further, an atmospheric transfer robot 103 is installed on the atmosphere side, and the substrate cassette 104 storing a plurality of substrates 102 is transferred to the load lock chamber 106.
[0006]
The operation of this apparatus will be described.
[0007]
The atmospheric transfer robot 103 carries the substrate cassette 104 storing the plurality of substrates 102 on the atmosphere side into the load lock chamber 106 from the gate valve A106. Then, the gate valve A106 is closed, and the inside of the load lock chamber 106 is evacuated by a vacuum pump. When the inside of the load lock chamber 106 reaches a predetermined degree of vacuum, the gate valve V105 is opened, and the vacuum transfer robot 108 in the transfer chamber 110 takes out one substrate 102 from the substrate cassette 104 and transfers it to the process chamber 109. The substrate 102 processed in the process chamber 109 is returned to the cassette 104 by the vacuum transfer robot 108. This is repeated, and when all the substrate cassette 104 is filled with the processed substrate 102, the gate valve V105 is closed, the load lock chamber 106 is released to the atmosphere, the gate valve A106 is opened, and the substrate cassette 104 is loaded. It is taken out from the lock chamber 106.
[0008]
In order to improve productivity, the processing time in the process chamber tends to be shortened. Further, as the substrate size increases, the transfer time and transfer mechanism of the vacuum transfer system are increasing. Such a condition overlaps, causing a problem that the substrate that has been processed is not immediately unloaded in the conventional processing apparatus.
[0009]
As a method for solving these problems and increasing the throughput, there is a batch type vacuum processing apparatus in which a plurality of process boxes are provided in one process chamber and a plurality of substrates are processed simultaneously.
[0010]
14 and 15 show an outline of a batch type vacuum processing apparatus. A plan view and a side view of the vacuum processing apparatus are shown in FIGS. Components that are substantially the same as those in FIG.
[0011]
As shown in the figure, a process chamber 112 having a load lock chamber 111 is arranged radially from one atmospheric transfer robot 115. A plurality of process boxes 112a are provided in the process chamber 112, and a plurality of substrates 102 can be processed simultaneously. The atmospheric transfer robot 115 includes an elevating unit 115a, a transfer unit 115b, and a substrate loader unit 115c, and is arranged in the atmosphere. A gate valve A 113 is disposed on the load transfer chamber 111 on the atmospheric transfer robot 115 side, and a gate valve V 114 is disposed on the process chamber 112 side of each load lock chamber 111. The load lock chamber 111 is in contact with the atmospheric part via the gate valve A113. Inside the load lock chamber 111, there is disposed a vacuum transfer table 116 that has a plurality of substrate support members for transferring the substrates 102 to each process box 112a one by one and is movable in only one direction.
[0012]
The atmospheric transfer robot 115 is linked to the vacuum transfer table 116 inside the load lock chamber 111 and has a mechanism capable of transferring the substrate 102 at high speed by vacuum suction or the like. Further, the atmospheric transfer robot 115 has a mechanism that allows the substrate 102 to be taken in and out of the substrate cassette 104 directly.
[0013]
The operation of this vacuum processing apparatus will be described. The substrate 102 is taken out from the substrate cassette 104 placed in the atmosphere by the atmospheric transfer robot 115. Next, the gate valve A 113 of the load lock chamber 111 is opened and transferred onto the substrate support member of the vacuum transfer table 116 in the load lock chamber 111. This operation is repeated for the number of substrate support members of the vacuum transfer table 116. Next, the gate valve A113 is closed, and the load lock chamber 111 is evacuated. Thereafter, the gate valve V14 is opened, and a plurality of substrates 102 are simultaneously transferred to the process box 112a in the process chamber 112 by the vacuum transfer table 116. The gate valve V114 is closed and the substrate 102 is processed in the process chamber 112. After the processing, the substrate 102 is taken out from the process chamber 112, and the substrate 102 is stored in the substrate cassette 104 by the reverse operation. The process is completed in such a procedure.
[0014]
[Problems to be solved by the invention]
However, the above-described conventional configuration has the following problems.
[0015]
In recent years, in order to improve production efficiency, the processing time in the process chamber tends to be shortened. Further, as the substrate size increases, the transfer time of the vacuum transfer system is increasing.
[0016]
In the single wafer type multi-chamber vacuum processing apparatus, such a condition is overlapped, and in the conventional processing apparatus, there is a problem that the substrate that has been processed is not immediately carried out. In addition, the operating rate and transfer speed of the vacuum transfer robot are increased, the burden on the joint is increased, and the life of the parts in the joint is shortened and the failure rate is increased. In particular, when the conveyance speed is increased and the weight of the conveyed product is increased in the conveyance in a vacuum, this phenomenon appears remarkably.
[0017]
In a batch-type vacuum processing apparatus that processes a large number of substrates at the same time, the throughput is restricted by the transfer time of the atmospheric transfer robot. Further, since the pitch of the substrate to be loaded is different from the pitch of the substrate storage cassette used for transporting the substrate between the apparatuses, it is necessary to convert the pitch of the substrate when the substrate is loaded into these processing apparatuses.
[0018]
In view of the problems as described above, the present invention is capable of simultaneously loading and unloading a plurality of substrates at a pitch different from the pitch of the substrate cassette with respect to a plurality of substrate processing apparatuses capable of processing a large number of substrates at the same time. An object is to provide a transfer apparatus.
[0019]
[Means for Solving the Problems]
In order to achieve the above object, the substrate transfer apparatus of the present invention has the following configuration.
[0020]
In the substrate transfer / transfer apparatus for transferring a substrate between apparatuses, the substrate transfer / transfer apparatus includes a substrate holding unit that holds a plurality of substrates, a substrate transfer unit that can simultaneously transfer a plurality of substrates, and the substrate holding unit. A substrate loader having a substrate support member for holding a plurality of substrates as the substrate holding means, the substrate loader being mounted on the substrate loader. The holding pitch is the same as the substrate holding pitch of the substrate transfer apparatus that transfers the substrate loader and the substrate.
[0021]
Substrate transport and transfer device the above The substrate holding device has a substrate loader having a substrate support member twice as many as the number of substrates to which the substrate is transferred, and the pitch of the odd-numbered substrate support members and the even-numbered substrate support of the substrate loader The pitch of the members is the same as the substrate pitch on the apparatus side that transfers the substrate.
[0022]
Substrate transport and transfer device the above In this transport apparatus, a flat plate which is equal to or slightly larger than the substrate transported to the lower portion of the substrate support member of the substrate loader is provided in parallel with the substrate support member.
[0023]
Substrate transport and transfer device the above In this transport apparatus, a portion of the substrate loader that contacts the substrate of the substrate support member is formed of an elastic body.
[0024]
Substrate transport and transfer device the above In this transport apparatus, a concave portion is provided around the portion of the substrate loader that contacts the substrate of the substrate support member.
[0025]
Substrate transport and transfer device the above In this transport apparatus, the substrate support member of the substrate loader is made of a magnetic material, and a magnet is provided around the portion of the substrate support member that contacts the substrate.
[0026]
Substrate transport and transfer device the above In this transport apparatus, a cover for covering the substrate loader portion is provided, a substrate support shelf for supporting the substrate is provided on the inner wall of the cover, and the substrate is supported by the shelf portion while the transport carriage is moving.
[0027]
Substrate transport and transfer device the above In this transport apparatus, a portion of the inner wall of the cover that contacts the substrate of the substrate support shelf is formed of an elastic body.
[0028]
Substrate transport and transfer device the above And a plurality of substrate processing apparatuses for simultaneously processing a plurality of substrates, the substrate processing apparatuses are arranged in parallel with each other perpendicular to the track, and reciprocate on the track. A plurality of substrates are simultaneously transferred between the transport carriage and the substrate processing apparatus.
[0029]
Substrate transport and transfer device the above A substrate transfer / transfer apparatus, a substrate cassette storing a plurality of substrates, a substrate buffer storing a plurality of substrates at the same pitch as a substrate holding pitch of the substrate transfer apparatus, and a transfer between the substrate cassette and the substrate buffer. A substrate transfer robot that performs loading, and the substrate buffers are arranged side by side on the track so that a plurality of substrates can be simultaneously transferred between the transport carriage that reciprocates on the track and the substrate buffer. It is characterized by.
[0030]
(Function)
According to the above configuration, the carriage equipped with the substrate loader capable of holding a plurality of substrates moves on a predetermined track to the front of the substrate delivery device, and simultaneously delivers the plurality of substrates between the substrate delivery device and the substrate loader. can do.
[0031]
According to the above configuration, the above In this transfer apparatus, the substrate loading and unloading can be carried out at a time by one carriage with the substrate transfer apparatus by the two substrate loaders for loading and unloading.
[0032]
According to the above configuration, the above In this transport apparatus, the substrate loader is provided with a substrate support member twice as many as the number of substrates that can be handled simultaneously by the substrate loader, and the pitches of the odd-numbered substrate support members and the even-numbered substrate support members are respectively By being the same as the pitch, a single substrate loader can carry in and carry out the substrate to / from the substrate transfer device at one time with one carriage.
[0033]
According to the above configuration, the above In this transport apparatus, by providing a flat plate below the substrate support member of the substrate loader, it is possible to cover the particles generated at the top so that they do not stick to the substrate.
[0034]
According to the above configuration, the above In this transport apparatus, by making the portion of the substrate loader that contacts the substrate of the substrate loader an elastic body, it is possible to prevent particles from being generated due to the contact between the substrate and the substrate support member.
[0035]
According to the above configuration, the above In this transport apparatus, the concave portion is provided around the portion of the substrate loader that contacts the substrate of the substrate loader, so that particles generated by the contact between the substrate and the substrate supporting member accumulate in the concave portion.
[0036]
According to the above configuration, the above In this transport apparatus, the substrate support member of the substrate loader is made of a magnetic material, and a magnet is provided around the portion in contact with the substrate, so that particles generated by the contact between the substrate and the substrate support member are attracted to the magnet.
[0037]
According to the above configuration, the above In this transport apparatus, a cover that covers the substrate loader portion is provided, a substrate support shelf that supports the substrate is provided on the inner wall of the cover, and the substrate is supported by the shelf portion while the transport carriage is moving, so that the carriage is moved. Thus, the substrate can be stabilized.
[0038]
According to the above configuration, the above In this transport apparatus, the portion of the inner wall of the cover that comes into contact with the substrate of the substrate support shelf is made of an elastic body, so that particles are less likely to be generated due to the contact between the substrate and the shelf.
[0039]
According to the above configuration, the above In this transfer apparatus, the carriage moves relative to a plurality of substrate processing apparatuses for simultaneously processing a plurality of substrates, and a plurality of substrates can be carried in and out at the same time.
[0040]
According to the above configuration, the substrate transfer robot performs transfer between the substrate cassette and the substrate buffer having the same substrate holding pitch as the substrate transfer device, and a plurality of substrates are simultaneously transferred between the substrate buffer and the transport carriage. Can be carried out.
[0041]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
[0042]
( reference Form 1)
The first embodiment of the present invention will be described with reference to FIGS. reference Will be described.
[0043]
Figure 1 Form Configuration of a vacuum processing system that employs the substrate transfer and transfer device Form The outline of the positional relationship between the configuration of the transport carriage and the load lock 6 is shown in FIG.
[0044]
Figure 1 Form The structure of the vacuum processing system which employ | adopted the board | substrate conveyance transfer apparatus of this is shown. Book Form The substrate transfer / transfer apparatus loads and unloads a plurality of substrates 4 to / from a plurality of substrate processing apparatuses 8 that can simultaneously process a plurality of substrates.
[0045]
The transport carriage 1 can carry a plurality of substrates 4 and can freely reciprocate on the track 2. The substrate transfer robot 5 loads the substrate 4 in the substrate cassette 3 onto the transport cart 1 and stores the substrate 4 from the transport cart 1 into the substrate cassette 3.
[0046]
A plurality of vacuum processing apparatuses 8 are installed perpendicular to the track 2. Each vacuum processing apparatus 8 includes a load lock 6 and a process chamber 7, and can process a plurality of substrates 4 at the same time. Gate valves 9 a and 9 b are provided between the atmosphere and the load lock 6 and between the load lock 6 and the process chamber 7, respectively, and the gate valves 9 a and 9 b are not opened simultaneously when the substrate 4 is loaded and unloaded. The inside is always kept in a vacuum state.
[0047]
FIG. 2 shows an outline of the positional relationship between the configuration of the transport carriage 1 and the load lock 6. The transport cart 1 includes a cart unit 13 that moves on the track 2, a substrate loader 10, a transport unit 12, and a cover 14 of the substrate loader 10. The carriage unit 13 can freely reciprocate on the track 2 and moves the entire transport carriage 1 to a predetermined position in front of the substrate transfer robot 5 and in front of each vacuum processing apparatus 8. The transport unit 12 moves the substrate loader 10 in the vertical direction and toward the vacuum processing apparatus 8 side.
[0048]
The substrate loader 10 has a plurality of substrate support claws 11, holds the plurality of substrates 4 on the substrate support claws 11, and delivers the substrate 4 to and from the vacuum transfer system 6 a in the load lock 6. The substrate loader 10 is almost at the same height as the load lock 6, moves in parallel to the load lock 6 side, and enters the load lock 6 from the gate valve A 9 a, so that the vacuum transfer system 6 a in the load lock 6 The substrate 4 can be transferred.
[0049]
The cover 14 covers the entire substrate loader 10 and prevents dust and dirt from adhering to the substrate 4 while the transport cart 1 is moving on the track 2. When carrying in / out the substrate 4, the cover opening / closing part 14a is opened.
[0050]
As shown in FIG. 3, the pitch between the substrate support claws 11 is the same as the pitch of the substrate support portion of the vacuum transfer system 6a in the load lock 6, and a plurality of substrates 4 can be transferred at the same time.
[0051]
Next book Form The operation of the substrate transfer / transfer apparatus will be described.
[0052]
First, the transport carriage 1 is positioned and stopped in front of the substrate transfer robot 5, and the opening / closing cover 14a is opened. The substrate transfer robot 5 takes out the substrate 4 from the substrate cassette 3 and mounts the substrate on the substrate support claw 11 of the substrate loader 10. At this time, the substrate transfer robot 5 is mounted on the transport carriage 1 one by one or plural sheets so that the mounting is completed within an allowable time. When the substrates are mounted on all the substrate support claws 11, the open / close cover 14a is closed. Then, the transport carriage 1 moves on the track 2 and stops before the load lock 6 of the vacuum processing apparatus 8 into which the substrate 4 is to be carried. When the transport carriage 1 stops, the opening / closing cover 14a and the gate valve A9a of the load lock 6 are opened, and the substrate loader 10 carries a plurality of substrates 4 into the load lock 6 simultaneously.
[0053]
The substrate loader 10 moves in parallel to the load lock 6 side from a position where the substrate 4 held is higher than the substrate support position of the vacuum transfer system 6a. Passing through the gate valve A9a, it enters a predetermined position in the load lock 6 and descends from there. With this operation, the support of the substrate 4 is transferred from the substrate loader 10 to the vacuum transfer system 6a. Thereafter, the substrate loader 10 moves backward toward the transport carriage 1, the opening / closing cover 14a and the gate valve A9a of the load lock 6 are closed, and the delivery of the substrate 4 is completed.
[0054]
Thereafter, the load lock 6 is evacuated, and when a predetermined degree of vacuum is reached, the gate valve V9b is opened, and the substrate 4 is carried into the process chamber 7 by the vacuum transfer system 6a. Then, a predetermined process is performed on the loaded substrate 4. When the processing is completed, the substrate 4 is taken out from the process chamber 7 to the load lock 6 by the vacuum transfer system 6a. Then, the inside of the load lock 6 is returned to the atmosphere, and the empty transport cart 1 waiting before the load lock 6 of the vacuum processing apparatus 8 uses the procedure for reversing the substrate 4 that has completed the processing in the load lock 6 as described above. Take out with. After the removal of the processed substrate 4 is completed, the transport carriage 1 returns to the front of the substrate transfer robot 5, and the processed substrate 4 in the transport carriage 1 is taken out by the substrate transfer robot 5 and stored in the substrate cassette 3.
[0055]
If two transport carts 1 for carrying in the substrate and carrying out the substrate are prepared, the time required for taking out the processed substrate 4 from the vacuum device 8 and carrying in the untreated substrate can be shortened.
[0056]
Further, by providing a substrate buffer between the substrate transfer robot 5 and the transport carriage 1, the burden on the substrate transfer robot 5 can be reduced. This will be described with reference to FIG. As shown in FIG. 4, a substrate buffer 15 is provided between the substrate transfer robot 5 and the transport carriage 1. Then, the substrate transfer robot 5 carries the substrate 4 between the substrate cassette 3 and the substrate buffer 15. The transport carriage 1 transports the substrate 4 between the substrate buffer 15 and the vacuum processing apparatus 8.
[0057]
Therefore, the substrate transfer robot 5 can always carry the substrate 4 between the substrate buffer 15 and the substrate cassette 3. The substrate transfer robot 5 can carry the substrate 4 even when the carriage 1 is separated from the substrate transfer robot 5 in order to carry the substrate 4 into and out of the vacuum apparatus 8. When the substrate 4 is transferred to the transfer carriage 1, it operates only when the transfer carriage 1 is in front of the substrate transfer robot 5 and is driven at a high speed in order to shorten the transfer time. However, it does not operate when the transport carriage 1 is not in front of the substrate transfer robot 5.
[0058]
On the other hand, when the substrate buffer 15 is provided, the substrate transfer robot 5 always performs the transfer operation, but it can be performed at a low speed, and the burden on the substrate transfer robot 5 can be reduced. The life of the substrate transfer robot 5 is reduced by reducing the burden, and the cost is low due to the low speed.
[0059]
As described above, a plurality of substrates can be simultaneously loaded into and unloaded from a plurality of substrate processing apparatuses at a pitch different from the pitch of the substrate cassette, and a substrate transfer / transfer apparatus with high transfer efficiency can be realized.
[0060]
( reference Form 2)
The second embodiment of the present invention will be described with reference to FIG. reference Will be described. First reference Only the portion of the substrate loader is different from this embodiment, and the same components as those in FIGS.
[0061]
The carrying carriage is provided with two loading substrate loaders 20 and two loading substrate loaders 21 and two conveyance units for driving them. The carry-in substrate loader 20 and the carry-out substrate loader 21 are respectively provided with a carry-in substrate support claw 22 and a carry-out substrate support claw 23. The pitch of the carry-in substrate support claw 22 and the carry-out substrate support claw 23 is the same as the substrate support pitch D of the vacuum transfer system 6a in the load lock 6, and the pitch between the two substrate loaders 20 and 21 is d. The unloading substrate loader 21 unloads the processed substrate 4b from the load lock 6 and the unloading substrate loader 20 loads the unprocessed substrate 4a into the load lock 6 independently. Do.
[0062]
Next, the operation will be described. After the unprocessed substrate 4a is loaded from the substrate cassette onto the loading substrate support claw 22 of the loading substrate loader 20 by the substrate transfer robot, the transport carriage moves in front of the load lock 6 that loads and unloads the substrate. First, the unloading substrate loader 21 unloads the processed substrate 4 b held by the vacuum transfer system 6 a in the load lock 6 and holds it on the unloading substrate support claw 23. Then, the unprocessed substrate 4a held by the loading substrate loader 20 on the loading substrate support claw 22 is loaded into the load lock 6 and transferred to the vacuum transfer system 6a. When the unprocessed substrate 4a is loaded, the transport carriage returns to the front of the substrate transfer robot, and the processed substrate 4b is stored in the substrate cassette by the substrate transfer robot.
[0063]
As described above, by providing the two substrate loaders for loading and unloading, it is possible to carry out the unloading of the processed substrate and the unprocessed substrate continuously with one trolley. Substrate loading and unloading is completed once. In addition, a plurality of substrates can be simultaneously loaded and unloaded at a pitch different from the pitch of the substrate cassette with respect to the plurality of substrate processing apparatuses, and a substrate transfer / transfer apparatus with high transfer efficiency can be realized.
[0064]
( reference Form 3)
The third embodiment of the present invention will be described with reference to FIGS. reference Will be described.
[0065]
1st, 2nd reference Only the portion of the substrate loader is different from that of FIG. 1. The same reference numerals are given to the same components as those in FIGS. 1 to 5, and the description thereof will be omitted.
[0066]
As shown in FIG. 6, the substrate loader 30 is provided with two sets of carry-in substrate support claws 31 and carry-out substrate support claws 32 with the number of substrates D that can be processed simultaneously by the substrate processing apparatus. The distance between the substrate support claw 31 and the carry-out substrate support claw 32 is d. The pitch D is the same as the substrate support pitch D of the vacuum transfer system 6 a in the load lock 6.
[0067]
With reference to FIG. 7, a method for carrying the substrate 4 into and out of the load lock 6 will be described. First, as shown in FIG. 7A, an unprocessed substrate 4a is supported by the substrate transfer robot on the carry-in substrate support claw 31 of the substrate loader 30, and the vacuum transfer system 6a in the load lock 6 has a process. The used substrate 4b is held. The substrate loader 30 is positioned so that the carry-out substrate support claw 32 is slightly below the processed substrate 4 b in the load lock 6, and is inserted into the load lock 6.
[0068]
Next, as shown in FIG. 7B, the processed substrate 4 b is transferred to the carry-out substrate support claw 32 by raising the inserted substrate loader 30. Then, the substrate loader 30 moves backward and returns from the load lock 6 into the transport carriage. Then, as shown in FIG. 7C, in the substrate loader 30, the unprocessed substrate 4b rises slightly above the height of the substrate support portion of the vacuum transfer system 6a in the load lock 6. Further, as shown in FIG. 7D, when the substrate loader 30 is again inserted into the load lock 6 and lowered, the unprocessed substrate 4a on the carry-in substrate support claw 31 is transferred to the vacuum transfer system 6a. . Finally, as shown in FIG. 7E, the substrate loader 30 moves backward and returns from the load lock 6 into the transport carriage. Thus, the delivery of the substrate 4 is completed.
[0069]
In this form, the substrate 4 can be carried in and out by one substrate loader 30. As compared with the second embodiment, the number of mechanisms can be reduced, the reliability of the apparatus is high, and the generation of particles is small. The substrate loader is provided with a substrate support claw twice the number of substrates that can be processed simultaneously by the substrate processing apparatus. If there are no problems such as interference in loading and unloading of the substrate to the substrate processing apparatus, the substrate support is further supported. By increasing the number of claws, it is possible to carry in / out substrates to / from a plurality of substrate processing apparatuses, and to reduce the number of times the transport carriage returns to the substrate transfer robot.
[0070]
As described above, a plurality of substrates can be simultaneously loaded into and unloaded from a plurality of substrate processing apparatuses at a pitch different from the pitch of the substrate cassette, and a substrate transfer / transfer apparatus with high transfer efficiency can be realized.
[0071]
(Embodiment 1 )
FIG. 8 to FIG. 1 The embodiment will be described.
[0072]
1st to 3rd reference Only the portions of the cover and the substrate support claw are different from the above embodiment, and the same reference numerals are assigned to the same components as those in FIGS. 1 to 7 and the description thereof is omitted.
[0073]
A shelf portion 14 b is provided on the inner wall of the cover 14 covering the entire substrate loader 10 of the transport carriage 1. The pitch of the shelf 14b is the same as the substrate support pitch D of the vacuum transfer system in the load lock. The substrate 4 is held by the substrate support claw 11 and transferred by the substrate loader 10. When the substrate loader 10 returns into the transport carriage 1, the substrate loader descends and the substrate 4 is held on the shelf 14 b on the inner wall of the cover 14. This can hold the substrate more stably than holding the substrate support claws 11.
[0074]
Also, as shown in FIG. 9, the portion of the shelf 14b that contacts the substrate 4 is an elastic body 33, so that the vibration of the substrate 10 is absorbed by the elastic body 33, the substrate is damaged, and particles from the contact portion are absorbed. Generation can be reduced.
[0075]
Further, as shown in FIG. 10, a recess 34 b is provided around the substrate support protrusion 34 a of the substrate support claw 34. FIG. 10A is a perspective view of the substrate support claw 34, and FIG. 10B is a cross-sectional view of the substrate support claw 34. 10 (a) and 10 (b) are reference forms of the present invention. As shown in the figure, the substrate support convex portion 34 a comes into contact with the substrate 4. Particles are generated from the contact portion between the substrate support convex portion 34a and the substrate 4 due to vibration, sliding, etc. during substrate transportation. The generated particles fall near the concave portion 34b provided around the substrate support convex portion 34a. Since the shape is concave, the particles are unlikely to come out of the concave portion 34b and accumulate in the concave portion 34b. Further, as shown in FIG. 10C, the magnet 35 is provided in the recess 34b, and the substrate support claw 34 is made of a magnetic material, whereby the generated particles can be attracted by the magnet and can be prevented from being scattered.
[0076]
As described above, it is possible to simultaneously carry in and out a plurality of substrates at a pitch different from the pitch of the substrate cassette with respect to a plurality of substrate processing apparatuses, and to realize a substrate transfer / transfer apparatus with low particle generation and high transfer efficiency. Can do.
[0077]
(Embodiment 2 )
FIG. 11 and FIG. 2 The embodiment will be described.
[0078]
1st to 1st 3 of reference Form of And the first embodiment The only difference is the substrate loader portion, and the same reference numerals are given to the same components as those in FIGS. 1 to 10 and the description thereof is omitted.
[0079]
As shown in FIG. 11, a particle guard 36 made of a flat plate substantially the same as or larger than the substrate 4 is provided below the substrate support claw 11. The particle guard 36 prevents particles generated when the substrate 4 is delivered from dropping from the upper part and sticking to the lower substrate 4. In addition, as shown in FIG. 12, by using the substrate supporting convex portion 38 of the substrate transport claw 37 as an elastic body, the vibration of the substrate is absorbed, and the damage of the substrate and the generation of particles from the contact portion can be reduced. it can.
[0080]
As described above, it is possible to simultaneously carry in and out a plurality of substrates at a pitch different from the pitch of the substrate cassette with respect to a plurality of substrate processing apparatuses, and to realize a substrate transfer / transfer apparatus with low particle generation and high transfer efficiency. Can do.
[0081]
【The invention's effect】
With respect to a plurality of substrate processing apparatuses that process a plurality of substrates at the same time, a transport carriage equipped with a substrate loader capable of holding a plurality of substrates moves on a predetermined track, and a plurality of substrates can be loaded and unloaded simultaneously. When the transport carriage is moved, the substrate can be stably held by the shelf provided on the inner wall of the cover. In addition, by making the portion that comes into contact with the substrate when holding the substrate an elastic body, it is possible to prevent particles from being generated and to prevent particles generated due to particle protection or the like from adhering to the substrate. Furthermore, by providing a substrate buffer, the burden on the substrate transfer robot can be reduced.
[0082]
As described above, according to the substrate transport / transfer apparatus of the present invention, a plurality of substrates can be simultaneously loaded and unloaded at a pitch different from the pitch of the substrate cassette with respect to the plurality of substrate processing apparatuses, the generation of particles is small, and the transport Efficient substrate transfer and transfer can be realized.
[Brief description of the drawings]
FIG. 1 of the present invention reference It is a top view which shows the structure of the vacuum processing system of the form 1 of.
FIG. 2 of the present invention reference It is a side view which shows the structure of the board | substrate conveyance transfer apparatus of the form 1 of.
FIG. 3 of the present invention reference It is explanatory drawing of the board | substrate delivery of the form 1 of.
FIG. 4 of the present invention reference It is a block diagram of the board | substrate conveyance transfer apparatus of the form 1 of.
FIG. 5 shows the present invention. reference It is a block diagram of the board | substrate conveyance transfer apparatus of the form 2 of.
FIG. 6 shows the present invention. reference It is a block diagram of the board | substrate conveyance transfer apparatus of the form 3 of.
FIG. 7 shows the present invention. reference It is explanatory drawing of the board | substrate delivery of the form 3.
FIG. 8 shows an embodiment of the present invention. 1 It is a block diagram of the board | substrate conveyance transfer apparatus.
FIG. 9 shows an embodiment of the present invention. 1 It is a block diagram of the board | substrate conveyance transfer apparatus.
FIG. 10 shows an embodiment of the present invention. 1 It is a block diagram of the board | substrate conveyance transfer apparatus.
FIG. 11 shows an embodiment of the present invention. 2 It is a block diagram of the board | substrate conveyance transfer apparatus.
FIG. 12 shows an embodiment of the present invention. 2 FIG.
FIG. 13 is a plan view showing a configuration of a conventional substrate transfer apparatus.
FIG. 14 is a plan view showing a configuration of a conventional substrate transfer apparatus.
FIG. 15 is a side view showing a configuration of a conventional substrate transfer apparatus.
[Explanation of symbols]
1 Transport cart
2 orbit
3 Substrate cassette
4 Substrate
4a Untreated substrate
4b treated substrate
5 Substrate transfer robot
6 Load lock
6a Vacuum transfer system
7 Process chamber
8 Vacuum processing equipment
9a Gate valve A
9b Gate valve V
10 Board loader
11 Substrate support nails
12 Transport section
13 trolley
14 Cover
14a Cover opening / closing part
14b shelf
20 Loading board loader
21 Unloading board loader
22 Loading substrate support claw
23 Unloading board support claw
30 Substrate loader
31 Loading substrate support claw
32 Unloading board support claw
33 Elastic body
34 Substrate support nails
34a Substrate support convex part
34b recess
35 magnets
36 Particle protection
37 Substrate support nails
38 Substrate support convex
102 substrates
103 Atmospheric transfer robot
104 Substrate cassette
105 Gate valve V
106 Gate valve A
107 load lock
108 Vacuum transfer robot
109 process chamber
110 Transfer chamber
111 load lock
112 process chamber
112a process box
113 Gate valve A
114 Gate valve V
115 Atmospheric transfer robot
115a Lifting part
115b Conveying unit
115c loader section
116 transfer table

Claims (3)

In a substrate transfer / transfer apparatus for transferring and transferring a substrate between apparatuses,
Substrate holding means for holding a plurality of substrates;
A substrate delivery means capable of delivering a plurality of substrates simultaneously;
The substrate holding means and the substrate delivery means are mounted, and includes a moving means that travels on a predetermined track,
As the substrate holding means, a substrate loader having a plurality of substrate support members for holding a substrate,
The substrate holding pitch of the substrate loader is the same as the substrate holding pitch of the substrate transfer device that transfers the substrate loader and the substrate,
A substrate transport / transfer apparatus, wherein a flat plate that is equal to or slightly larger than a substrate held by each substrate support member is provided above each substrate support member of the substrate loader in parallel with the substrate support member. In a substrate transfer / transfer apparatus for transferring and transferring a substrate between apparatuses,
Substrate holding means for holding a plurality of substrates;
A substrate delivery means capable of delivering a plurality of substrates simultaneously;
The substrate holding means and the substrate delivery means are mounted, and includes a moving means that travels on a predetermined track,
As the substrate holding means, a substrate loader having a plurality of substrate support members for holding a substrate,
The substrate holding pitch of the substrate loader is the same as the substrate holding pitch of the substrate transfer device that transfers the substrate loader and the substrate,
A substrate support member of the substrate loader is made of a magnetic material, and a magnet that adsorbs particles generated by contact between the substrate and the substrate support member is provided around a portion of the substrate support member that contacts the substrate. A substrate transfer and transfer device. 3. The substrate transport / transfer apparatus according to claim 2, wherein a portion of the substrate support member that contacts the substrate is a convex portion with respect to the substrate support member, and the magnet is provided on the substrate support member around the convex portion. On the other hand, the substrate transfer apparatus is provided in a recess.

Images