JP2015116662A - Flow rate adjustment device, liquid weighing device, and microchannel device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a flow rate adjustment device which can easily perform the control of a liquid flow rate in a microchannel device and can be produced easily.SOLUTION: A flow rate adjustment device 1 is provided in a predetermined area E of a microchannel 2 and comprises an elastic film 6 and a gas generating film 7 made of a photoresponsive gas generating agent. A bottom surface of the microchannel 2 is composed of the elastic film 6. Gas is generated by irradiating the gas generating film 7 with light, and pressure by the gas is applied from the back surface side of the elastic film 6. Thereby, the elastic film 6 expands in the area E and closes the microchannel 2. When releasing the application of the pressure by the gas, the elastic film 6 returns to its original shape, and the microchannel 2 is opened.

Description

  The present invention relates to a flow rate adjusting device, a liquid weighing device, and a microchannel device. The present invention is useful for adjusting the flow rate of a small amount of liquid flowing through a microchannel.

  There are known microchannel devices (microdevices, microfluidic devices) that can handle a small amount of liquid sample. For example, a microchannel for transporting a liquid sample or the like is formed in a substrate (chip) that can be easily handled by hand. If necessary, the sample introduction part, reagent holding part, reaction A microchannel device provided with a tank or the like is known (for example, Patent Documents 1 and 2).

  In recent years, an analyzer having excellent portability using a microchannel device has been used in the medical field and the field of environmental measurement. A flow rate adjusting device for adjusting the flow rate of the sample solution is used for the microchannel device, and dilution, concentration, and the like can be performed for blood and environmental analysis. Such a flow rate adjusting device is disclosed in Patent Document 3 below, for example. The flow rate adjusting device disclosed in Patent Document 3 has a deformed portion that expands or contracts due to a temperature change and changes in volume, and deforms the deformed portion to adjust the flow rate of the liquid flowing through the microchannel. To do.

  In addition, a technique that can weigh a small volume of liquid with a microchannel device is known (for example, Patent Document 4).

JP 2012-132879 A JP 2012-215535 A JP 2012-31894 A JP 2007-279068 A

  In the flow rate adjustment device described in Patent Document 3, the heating unit and the cooling unit are required to open and close the device. However, in this configuration, a time difference occurs in opening and closing of the valve depending on how heat is transmitted, and it becomes difficult to control fluid such as liquid. Further, in this flow rate adjusting device, it is necessary to separately arrange a heat-changing material in the microchannel, and it becomes difficult to manufacture the microfluidic device itself.

  In view of the above situation, the present invention is capable of easily controlling the flow rate of a liquid in a microfluidic device and is easy to manufacture, a liquid weighing device using the flow rate adjusting device, and a microfluidic device. An object is to provide a road device.

  One aspect of the present invention for solving the above-described problem is a flow rate adjusting device that adjusts the flow rate of the liquid flowing through the predetermined position by changing the cross-sectional area of the predetermined position in the microchannel. A photoresponsive gas generating agent that generates gas by irradiating light and an elastic film, and the film constitutes the inner wall of the microchannel at the predetermined position. The shape of the inner wall of the microchannel at the predetermined position is changed by applying pressure to the film from the side opposite to the inner wall of the microchannel in the film and elastically deforming the film. The flow rate adjusting device is characterized in that the flow path cross-sectional area is changed.

  The flow rate adjusting device of the present invention adjusts the flow rate of the liquid flowing through the predetermined position by changing the flow path cross-sectional area at the predetermined position in the micro flow path. The flow rate adjusting device of the present invention has a photoresponsive gas generating agent, and can generate gas by irradiating the photoresponsive gas generating agent with light. The flow rate adjusting device of the present invention has an elastic film, and the film constitutes the inner wall of the microchannel at the predetermined position. In the flow rate adjusting device of the present invention, the pressure of the gas generated from the photoresponsive gas generating agent is applied to the film from the side opposite to the inner wall of the microchannel in the film and applied to the film for elasticity. By deforming, the shape of the inner wall of the micro-channel at a predetermined position is changed, thereby changing the channel cross-sectional area. In the flow rate adjusting device of the present invention, since the gas generated from the photoresponsive gas generating agent is used, the flow rate can be adjusted by a simple operation only by irradiating light, and operations such as heating and cooling are not required. . Furthermore, since the flow rate of the liquid is adjusted by changing the shape of the inner wall of the microchannel itself, it is not necessary to install a separate body in the microchannel, and manufacturing is easy.

  Here, the “micro flow path” refers to a fine flow path that is formed in a shape and dimension that develops a so-called micro effect in the liquid flowing through the flow path. Specifically, it is a fine channel that is formed in a shape and dimension that exhibits a behavior different from that of a liquid that flows through a normal-sized channel because the liquid flowing through the channel is strongly influenced by surface tension and capillary action. .

  Preferably, the flow path cross-sectional area at the predetermined position is reduced by expansion of the film, and the flow path cross-sectional area at the predetermined position is increased by contraction of the film.

  Preferably, the microchannel can be closed at the predetermined position by the expansion of the film, and then the microchannel can be opened at the predetermined position by the contraction of the film.

  Preferably, a mask for limiting the light irradiation range is further provided, and the mask can irradiate light mainly on a region corresponding to the predetermined position in the photoresponsive gas generating agent.

  Preferably, the microchannel is formed on a plate-like base material, and the film and the photoresponsive gas generating agent are laminated in this order on the base material.

  Preferably, it further has a gas discharge mechanism for discharging the gas applied to the film.

  With this configuration, the flow rate adjusting channel can be easily closed.

  Preferably, the gas discharge mechanism includes a gas discharge path and a valve provided in the gas discharge path.

  Preferably, the bulb uses a light-stimulated peeling film that self-peels when irradiated with light.

  Preferably, the photoresponsive gas generating agent further contains an acrylic binder and a photosensitizer.

  Preferably, the light-shielding film is covered when not in use, and the light-shielding film is removed when in use.

  Another aspect of the present invention is a liquid weighing device that is provided on a microchip and for measuring a small volume of a small volume of liquid, and includes a flow rate adjusting device having the above-described configuration and a sealed space having a certain volume. The liquid weighing device is capable of weighing a fixed volume of liquid by introducing the liquid into the sealed space through the flow rate adjusting device.

  The present invention relates to a liquid weighing device. The liquid weighing device of the present invention has the flow rate adjusting device having the above-described configuration, and measures the liquid in a sealed space having a constant volume through the flow rate adjusting device. With this configuration, it is possible to weigh a small volume of liquid with a simpler configuration.

  Still another aspect of the present invention is a microchannel device having a sample movement path through which a liquid sample moves, and is generated from the flow rate adjustment device having the above-described configuration and the photoresponsive gas generating agent in the flow rate adjustment device. A gas supply path through which gas is supplied; a film communication path branched from the gas supply path and connected to the elastic film in the flow rate adjusting device; and installed between the gas supply path and the sample movement path, It consists of a valve that communicates or closes between the gas supply path and the sample movement path by opening and closing, and a micro flow path in the flow rate adjusting device, with one end communicating with the sample movement path and the other end externally. An external communication path that opens, and gas generated from the photoresponsive gas generating agent is supplied to the film through the film communication path, so that the film is elastic. And form a microchannel device, wherein the a of the external communication passage can be closed.

  The present invention relates to a micro-channel device having a sample moving path through which a liquid sample moves, and has the flow rate adjusting device having the above-described configuration. Furthermore, the microchannel device of the present invention has a gas supply path, a film communication path, a valve, and an external communication path. A gas generated from the photoresponsive gas generating agent is supplied to the gas supply path. The film communication path branches from the gas supply path and is connected to an elastic film. The valve is installed between the gas supply path and the sample movement path, and communicates or closes between the gas supply path and the sample movement path by opening and closing the valve. The external communication path is a micro flow path, one end of which communicates with the sample moving path, and the other end opens to the outside. In the microchannel device, the gas generated from the photoresponsive gas generating agent is supplied to the film through the film communication path, the film is elastically deformed, and the external communication path can be closed. According to the microchannel device of the present invention, the gas generated from the photoresponsive gas generating agent can be used to open and close the flow rate adjusting device and to move the liquid sample in the sample moving path. Therefore, a trace amount liquid can be handled with a simpler configuration.

  According to the flow rate adjusting device of the present invention, the flow rate of a trace amount liquid can be adjusted with a simpler operation. In addition, it is not necessary to install a separate body in the microchannel, and manufacturing is easy.

  According to the liquid weighing device of the present invention, it is possible to weigh a small volume of liquid with a simpler configuration on a microchip.

  According to the microchannel device of the present invention, a trace amount liquid can be handled with a simpler configuration.

It is explanatory drawing which represents typically the basic composition of the flow volume adjustment device and microchannel which concern on one Embodiment of this invention. It is a section perspective view showing the lamination structure of a micro channel device, and a micro channel. It is a top view showing only the part of a flow control device and a micro channel. It is AA sectional drawing of FIG. It is BB sectional drawing of FIG. It is a disassembled perspective view showing a flow regulating device. It is sectional drawing showing the mode of a deformation | transformation of an elastic film, (a) is an undeformed state, (b) is a state in which the expansion part is growing, (c) is a state in which the expansion part has closed the microchannel. Represents. It is sectional drawing showing the basic composition of a gas discharge mechanism. It is explanatory drawing showing the example which operates the gas discharge mechanism of FIG. It is explanatory drawing showing another example which operates the gas discharge mechanism of FIG. It is sectional drawing showing the example of installation of a light shielding film. It is sectional drawing showing another example of installation of a light shielding film. (A) And (b) is sectional drawing showing the elastic body film which concerns on other embodiment. It is explanatory drawing which represents typically the basic composition of the liquid weighing device which concerns on one Embodiment of this invention. (A)-(c) is explanatory drawing showing the usage method of the liquid weighing device of FIG. It is explanatory drawing showing the example of installation of the flow volume adjustment device which concerns on other embodiment. It is explanatory drawing showing the example of installation of the flow volume adjustment device which concerns on other embodiment, (a) and (b) show the example from which the direction through which a liquid flows differs. It is explanatory drawing showing the example of installation of the flow volume adjustment device which concerns on other embodiment, (a) and (b) show the example from which the direction through which a liquid flows differs. It is explanatory drawing showing the example of installation of the flow volume adjustment device which concerns on other embodiment, (a) and (b) show the example from which the direction through which a liquid flows differs. It is explanatory drawing showing the example of installation of the flow volume adjustment device which concerns on other embodiment, (a) and (b) show the example from which the direction through which a liquid flows differs. It is explanatory drawing showing the example of installation of the flow volume adjustment device which concerns on other embodiment, (a) and (b) show the example from which the direction through which a liquid flows differs. It is explanatory drawing showing the structure of the flow volume adjustment device used in Example 12. FIG. It is explanatory drawing which represents typically the basic composition of the microchannel device which concerns on one Embodiment of this invention. It is explanatory drawing which shows an example of the usage method of the microchannel device of FIG.

  Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings. However, the following embodiment is merely an example, and the present invention is not limited to the following embodiment. Further, the drawings referred to in each embodiment are schematically described, and the ratio of dimensions of members and the like drawn in the drawings may be different from the ratio of dimensions of actual members and the like. Specific ratios of dimensions of members and the like should be determined in consideration of the following explanation. Unless otherwise specified, the vertical direction in the following description is based on the posture in which the base material 5 is on the upper side and the mask 10 is on the lower side, and in the horizontal direction, the microchannel 2a is on the left side and the microchannel 2b is on the right side. Based on the posture.

A flow rate adjusting device 1 according to an embodiment of the present invention is provided in a predetermined region E (predetermined position) of the micro flow path 2 and adjusts the flow rate of the liquid flowing through the region E as shown in FIG. is there. The micro flow channel 2 is divided into a micro flow channel 2 a and a micro flow channel 2 b by the flow rate adjusting device 1.
As shown in FIG. 2, in the present embodiment, the flow rate adjusting device 1 and the microchannel 2 (2a, 2b) are both provided in a flat microchannel device 3 having a laminated structure.
The channel diameter (inner diameter) of the microchannel 2 is preferably 50 μm or more and 3 mm or less. The channel length of the microchannel 2 is preferably 1 μm or more and 1000 μm or less.

  As shown in FIGS. 2 to 6, the part of the flow rate adjusting device 1 in the micro-channel device 3 includes a plate-like base material 5, an elastic film 6, a gas generating film (photoresponsive gas generating agent) 7, The gas barrier layer 8 and the mask 10 have a basic structure laminated in this order. And the flow volume adjustment part 12 is comprised by a part of base material 5 and a part of elastic body film 6, On the other hand, the gas generation part 15 is comprised by the gas generation film 7, the gas barrier layer 8, and the mask 10. FIG. . The position of the flow rate adjustment unit 12 overlaps the region E.

  The micro flow path 2 is formed in the base material 5. The microchannel 2 has a cylindrical shape with a rectangular cross section, the top surface and both side surfaces are configured by a part of the base material 5, and the bottom surface is configured by the elastic film 6. Examples of the material constituting the substrate 5 include resin, glass, and ceramics. Examples of the resin include organic siloxane compounds, polymethacrylate resins, polyolefin resins, and the like. Examples of the polyolefin resin include cyclic polyolefin resins. Examples of the organosiloxane compound include polydimethylsiloxane (PDMS) and polymethylhydrogensiloxane.

  As shown in FIGS. 2 and 4 to 6, an elastic film 6 is provided on the lower surface of the substrate 5. The elastic film 6 is provided on substantially the entire bottom surface of the substrate 5. Thereby, the elastic film 6 constitutes the bottom surface of the microchannel 2. The elastic film 6 can be elastically deformed, and can be repeatedly expanded and contracted as described later, for example.

  Examples of the material constituting the elastic film 6 include rubber and silicon resin. Examples of the resin include natural rubber, isoprene rubber, butadiene rubber, styrene / butadiene rubber, chloroprene rubber, nitrile rubber, polyisobutylene, ethylene propylene rubber, chlorosulfonated polyethylene, acrylic rubber, fluorine rubber, epichlorohydrin rubber, urethane rubber, silicone Examples thereof include organic siloxane compounds such as rubber and polydimethylsiloxane. The thickness of the elastic film 6 is preferably 1 μm or more and 200 μm or less, more preferably 3 μm or more and 100 μm or less, and further preferably 5 μm or more and 50 μm or less.

  A gas generating film (light-responsive gas generating agent) 7 is provided on the lower surface of the elastic film 6. The gas generating film 7 is made of a material that generates gas when irradiated with light, and generates gas when irradiated with light. The gas generating film 7 is provided on the substantially entire surface of the elastic film 6 or at least in a region covering the region directly below the region E in the microchannel 2.

The thickness of the gas generating film 7 is not particularly limited, but is preferably 5 μm or more and 5 mm or less, more preferably 10 μm or more and 500 μm or less.
Specific examples of materials constituting the gas generating film 7 will be described later.

A gas barrier layer 8 is provided on the lower surface of the gas generating film 7. The gas barrier layer 8 is provided so that the gas generated from the gas generating film 7 is supplied only to the elastic film 6 side and to suppress the back pressure. The gas barrier layer 8 has low gas permeability and is light transmissive. Further, the light transmission property of the gas barrier layer 8 is preferably a property in which light in the ultraviolet region is not easily attenuated. The material constituting the gas barrier layer 8 is polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate, glass, quartz. Examples thereof include glass and pyrex glass.
The thickness of the gas barrier layer 8 may be appropriately selected depending on the material constituting the gas barrier layer 8 and is not particularly limited, but is preferably 10 μm or more and 1 mm or less, more preferably 50 μm or more and 500 μm or less.

A mask 10 is provided on the lower surface of the gas barrier layer 8. The mask 10 has a circular opening 20 at a position corresponding to a position immediately below the region E (FIGS. 3 and 6). Thereby, when light is irradiated from under the mask 10, the light irradiation area is limited to a portion immediately below the region E.
Examples of the material constituting the mask 10 include a graphite-containing polyethylene film. Moreover, the mask 10 can also be comprised by vapor-depositing gold | metal | money on the surface of glass and forming a mask pattern.

  In the flow control device 1 of the present embodiment, the gas generated from the gas generating film 7 is supplied to the back side of the elastic film 6. Specifically, a light source is installed immediately below the opening 20 of the mask 10, and light is emitted toward the opening 20. Then, light enters from the opening 20, passes through the gas barrier layer 8, and reaches the gas generating film 7. Here, in the present embodiment, the light irradiation area is limited by the mask 10, so that light is radiated mainly on the position immediately below the region E. Thereby, gas is generated from the gas generating film 7, and the gas is supplied to the back surface side of the elastic film 6. At this time, the gas is intensively supplied to the portion immediately below the region E. Thereby, the pressure by gas is provided with respect to the elastic body film 6, and especially a pressure is mainly applied to the part directly under the area | region E. FIG.

  In the flow rate adjusting device 1 of the present invention, the elastic film 6 is deformed and expanded in the region E by applying the gas pressure to the elastic film 6 as described above. Thereby, the flow-path cross-sectional area in the area | region E can be restrict | squeezed, and it can finally close. Here, the change in the shape of the elastic film 6 in the region E and the change in the flow path cross-sectional area will be described with reference to FIG.

Fig.7 (a) has shown the mode of the elastic body film 6 in the state which is not used, ie, the state by which the pressure by gas is not provided. When not in use, the elastic film 6 is not deformed, and the bottom surface of the microchannel 2 in the region E is flat. Liquid can freely pass through region E.
From this state, gas is supplied from the back surface side (gas generating film 7 side) of the elastic film 6, and pressure due to the gas is applied to the elastic film 6. Then, the elastic film 6 starts to expand in the region E, and rises like a small mountain toward the inside of the microchannel 2 as shown in FIG. Thereby, the channel cross-sectional area of the region E is gradually reduced.
When the pressure is further applied, the expansion portion 17 grows and reaches all the inner walls of the microchannel 2 to close the region E (FIG. 7C). As a result, the liquid cannot pass through the region E.
As described above, in the flow rate adjustment device 1 of the present embodiment, the elastic film 6 is expanded to form the expanded portion 17 by applying the gas pressure to the elastic film 6, and the expanded portion 17 forms the microscopic portion. A predetermined position of the flow path 2 can be closed. This means that the expansion portion 17 of the elastic film 6 functions as a flow rate adjusting valve. Further, a part of the inner wall constituting the microchannel 2 functions as a valve as it is.

  In order to reopen the closed region E, it is only necessary to contract the expanding portion 17 and return the elastic film 6 to its original shape. Thereby, it can return to the state shown to Fig.7 (a). Here, since the elastic film 6 is elastically deformed, it can be easily returned to its original shape.

  The expansion portion 17 can be contracted by releasing the pressure applied by the gas. For example, the gas supplied to the elastic film 6 can be discharged to release the pressure. Below, the example of the gas discharge mechanism for achieving the said objective is demonstrated.

  The gas discharge mechanism 21 shown in FIG. 8 includes a gas discharge path 22 and a sealing film (valve) 23. One end of the gas discharge path 22 is located immediately below the region E and between the elastic film 6 and the gas generation film 7. The other end of the gas discharge path 22 is open to the outside from the back side of the microchannel device 3. The opening 25 at the other end of the gas discharge path 22 is closed with a sealing film 23. According to this gas discharge mechanism 21, by peeling off the sealing film 23, the gas can be discharged from the opening 25, and the pressure application can be released.

  An example of a measure for peeling off the blocking film 23 is to configure the blocking film 23 with a slightly adhesive film. By using the slightly adhesive film, the sealing film 23 cannot withstand the pressure and is peeled off from the opening 25 when a pressure equal to or higher than a predetermined value is applied to the gas discharge path 22. Specifically, as shown in FIG. 9, the gas is continuously supplied by continuing to irradiate light from the opening 20 of the mask 10 (see arrows). Thereby, the pressure in the gas discharge path 22 can be increased to a predetermined value or more, and the sealing film 23 composed of the slightly adhesive film can be peeled off.

As another example, the blocking film 23 may be composed of a light-stimulated release film. The photo-stimulated release film generates gas when irradiated with light, and self-releases at that pressure. As a specific operation, as shown in FIG. 10, the sealing film 23 is continuously irradiated with light (see arrows). Thereby, the film 23 for sealing comprised with the light stimulus peeling film generate | occur | produces gas, and self peels with the pressure.
In addition, in FIG. 9, FIG. 10, illustration of the base material 5 is abbreviate | omitted.

About the flow volume adjustment device 1 of this embodiment, the structure which covers with a light shielding film at the time of unused and removes a light shielding film at the time of use can be employ | adopted. By covering with a light shielding film, light can be blocked, and malfunction when not in use, for example, unintended expansion of the elastic film 6 and unintended operation of the gas discharge mechanism 21 can be prevented.
Examples of installation of the light shielding film are shown in FIGS. In the example shown in FIG. 11, a light shielding film 27 is provided on the back surface of the mask 10. In the example shown in FIG. 12, a light shielding film 27 is provided between the gas barrier layer 8 and the mask 10.

In addition, it is preferable that the light source for irradiating light to the gas generation film 7 or the film 23 for sealing is a light emitting diode (LED). Light emitting diodes have many advantages such as fast response speed, high luminous efficiency, low heat generation, low power consumption, small size and high density mounting. As the light emitting diode, for example, an ultraviolet light emitting diode that emits light having a wavelength of about 330 nm to 410 nm and a light output of about 10 mW to 400 mW may be selected. The light having such characteristics can generate gas while suppressing an increase in temperature of the gas generating agent or the like due to light irradiation.
Examples of light sources other than light emitting diodes include lasers, electroluminescent elements (EL elements), plasma light emitting elements, external electrode fluorescent lamps (EEFL), micro halogen lamps, optical fibers, and light sources that can be taken out by a combination of optical selectors. Can be mentioned.
The light source is preferably one that can repeat blinking.

  In the above-described embodiment, the example in which the flow rate of the liquid is adjusted by fully opening and closing the region E by the inflating unit 17 has been described, but the opening degree of the region E may be changed continuously or stepwise. For example, by adjusting the amount of gas supplied from the gas generating film 7, the degree of expansion (volume) of the expansion portion 17 can be adjusted, and thereby the opening degree of the region E can be adjusted. The gas supply amount can be adjusted by, for example, the light irradiation time.

  In the present embodiment, as a measure for expanding the elastic film 6 at a predetermined position, the light irradiation range is limited using the mask 10, but other measures are also conceivable. For example, as shown in FIG. 13A, a cut 28 may be provided in the elastic film 6. As a result, stress concentrates on the portion of the notch 28, and expansion preferentially occurs from the portion of the notch 28. As another example, as shown in FIG. 13 (b), the thickness of a part of the elastic film 6 may be reduced. Thereby, expansion occurs preferentially from the portion where the thickness is small.

  Next, an embodiment of the liquid weighing device of the present invention will be described. A liquid weighing device 30 according to an embodiment of the present invention is provided on a microchip, and includes two flow rate adjusting devices similar to the flow rate adjusting device 1 having the above-described configuration. As shown in FIG. 14, the liquid weighing device 30 has a structure in which the micro flow path 2a, the flow rate adjusting device 1a, the sealed space 32, the flow rate adjusting device 1b, and the micro flow path 2b are connected in series in this order. doing. That is, the flow rate adjusting devices 1 a and 1 b are provided at both ends of the sealed space 32.

  The sealed space 32 is a space having a constant volume. In the present embodiment, the sealed space 32 has an elongated cylindrical shape similar to the microchannels 2a and 2b. The sealed space 32 may have a shape other than the microchannel, for example, a so-called microchamber.

  A pump 33 is connected to the sealed space 32. The liquid filled in the sealed space 32 can be transferred to the micro flow path 2a or the micro flow path 2b by the pump 33. The pump 33 is not particularly limited, and is a diagram type pump, an electroosmotic flow type pump, a pump that generates gas by light or thermal decomposition, or a chemical reaction utilizing generation of oxygen by hydrogen peroxide and sodium permanganate. A pump, etc. can be employed.

A procedure for measuring (weighing) a fixed volume of liquid using the liquid weighing device 30 will be described.
As a preparation, the flow rate adjusting devices 1a and 1b are closed. Specifically, light is emitted from below the flow rate adjusting devices 1a and 1b to generate gas, grow the expansion portion 17, and close the region E.
In this state, first, a liquid to be weighed is introduced into the microchannel 2a. The amount of introduction is equal to or greater than the volume of the sealed space 32 (FIG. 15A).
Next, the flow rate adjusting device 1 a adjacent to the micro flow path 2 a is opened, and the liquid is transferred to the sealed space 32. Specifically, the gas discharge mechanism 21 shown in FIG. 8 is operated to open the region E of the flow rate adjustment device 1a. Thereby, the liquid is introduced into the sealed space 32 through the flow rate adjusting device 1a. The liquid transfer is continued until the sealed space 32 is completely filled with the liquid (FIG. 15B).

  When the sealed space 32 is completely filled with the liquid, the flow regulating device 1a is closed. Specifically, light is irradiated from below the flow control device 1a to generate gas, grow the inflatable portion 17, and close the region E. As a result, a fixed volume of liquid is weighed into the sealed space 32.

Next, the flow rate adjusting device 1b adjacent to the microchannel 2b is opened, and the liquid is transferred to the microchannel 2b. Specifically, the gas discharge mechanism 21 shown in FIG. 8 is operated to open the area E of the flow rate adjusting device 1b. At the same time, the pump 33 is operated to push the liquid toward the micro flow path 2b. Thereby, the liquid is introduced into the micro flow path 2b through the flow rate adjusting device 1b, and a fixed volume of liquid is recovered into the micro flow path 2b (FIG. 15C).
In this way, a fixed volume of liquid can be weighed using the liquid weighing device 30.

  In the above-described embodiment, the flow rate adjusting device 1 is integrally installed in the middle of the micro flow path 2, in other words, installed between the micro flow path 2a and the micro flow path 2b, and these are connected in series. However, other embodiments are possible. Another embodiment is shown in FIGS. In FIGS. 17-21, (a) and (b) differ only in the direction (arrow) in which a liquid flows, and the structure itself is the same.

  FIG. 16 shows an example in which the flow rate adjusting device 1 is provided between two microchannels 2c and 2d having different channel cross-sectional areas. In this example, the flow rate adjusting device 1 is connected between the end surface of the thin microchannel 2c and the side surface of the thick microchannel 2d. The flow rate adjusting device 1 is provided on the side surface of the microchannel 2d and in the vicinity of the end.

  FIGS. 17A and 17B also show an example in which the flow rate adjusting device 1 is provided between two microchannels 2c and 2d having different channel cross-sectional areas. Also in this example, the flow rate adjusting device 1 is connected between the end surface of the thin microchannel 2c and the side surface of the thick microchannel 2d, but the flow rate adjusting device 1 is separated from the end of the microchannel 2d. In position.

  In the example shown in FIGS. 18A and 18B, the flow rate is adjusted between the thin microchannel 2c and the thick microchannel 2d and between the thin microchannel 2e and the thick microchannel 2d. One device 1 is provided. In this example, the flow rate adjusting device 1 is connected between the end surfaces of the thin microchannels 2c and 2e and the side surface of the thick microchannel 2d. The two flow rate adjusting devices 1 are provided on the side surfaces of the micro flow path 2d so as to face each other in the vicinity of the end portion.

  19 (a) and 19 (b), the flow rate is adjusted between the thin microchannel 2c and the thick microchannel 2d and between the thin microchannel 2e and the thick microchannel 2d. One device 1 is provided. Also in this example, the flow rate adjusting device 1 is connected between the end surfaces of the thin microchannels 2c and 2e and the side surface of the thick microchannel 2d, and these flow rate adjusting devices 1 are provided to face each other. The flow rate adjusting device 1 is located away from the end of the micro flow path 2d.

  In the example shown in FIGS. 20A and 20B, between the thin microchannel 2c and the thick microchannel 2d, between the thin microchannel 2e and the thick microchannel 2d, and the thin microchannel One flow rate adjusting device 1 is provided between the path 2f and the thick microchannel 2d. In this example, the flow rate adjusting device 1 is connected between the end surfaces of the thin microchannels 2c and 2e and the side surface of the thick microchannel 2d. Furthermore, the flow rate adjusting device 1 is connected between the end surface of the thin microchannel 2f and the end surface of the thick microchannel 2d. The flow rate adjusting device 1 connected to the micro flow path 2c and the micro flow path 2e is provided on the side surface of the micro flow path 2d and in the vicinity of the end portion.

  FIGS. 21A and 21B are examples in which the flow rate adjusting device 1 is provided between a microchannel and a microchamber. In this example, a plurality of microchannels 2g to 2o are radially connected to one microchamber 35. And the flow volume adjustment device 1 is each provided between the micro chamber 35 and the micro flow paths 2g-2o. Note that another micro flow path 36 is directly connected to the micro chamber 35.

  Next, an embodiment of a microchannel device that employs the flow rate adjusting device of the present invention will be described.

  FIG. 23 schematically illustrates the basic configuration of a microchannel device 40 according to an embodiment of the present invention. A microchannel device 40 shown in FIG. 23 has a sample moving path 45. That is, the liquid sample 38 introduced into the sample moving path 45 can move along the sample moving path 45.

The microchannel device 40 is constituted by a substrate, for example, and the sample moving path 45 is formed on the substrate, for example.
The sample moving path 45 satisfies the above-mentioned “microchannel” conditions. That is, the sample moving path 45 is composed of a fine flow path formed in a shape and dimension in which a so-called micro effect appears in the flowing liquid.

The microchannel device 40 includes a flow rate adjustment device 41. The main configuration of the flow rate adjustment device 41 is common to the configuration of the flow rate adjustment device 1 shown in FIGS. That is, the flow rate adjusting device 41 includes an external communication path 42 that is a micro flow path, an elastic film (an elastic film) 46, and a photoresponsive gas generating agent 47.
The photoresponsive gas generating agent 47 has a film shape similar to that of the gas generating film 7 described above, for example.
The elastic film 46 has the same configuration as the elastic film 6 described above.

In the flow rate adjustment device 41 of the present embodiment, the elastic film 46 forms the inner wall of the external communication path 42 in a predetermined region E of the external communication path (micro flow path) 42. Then, the elastic film 46 is expanded by the pressure of the gas generated from the photoresponsive gas generating agent 47 and the region E can be closed. Further, by discharging the gas, the elastic film 46 contracts and the region E can be opened. That is, the area E of the external communication path 42 functions as a valve. In addition, in FIG. 23, the state which the elastic body film 46 expand | swells and has closed the area | region E is shown typically as a representative example.
Moreover, when discharging | emitting gas, the gas discharge mechanism 21 shown in FIGS. 8-10 is employable, for example.

  The microchannel device 40 further includes a gas supply path 48, a film communication path 50, and a valve 51. The photoresponsive gas generating agent 47, the gas supply path 48, the valve 51, and the sample moving path 45 are arranged in this order. In the following description, the photoresponsive gas generating agent 47 side is defined as upstream and the sample moving path 45 is defined as downstream, corresponding to the gas flow direction.

  The upstream end of the gas supply path 48 is connected to the photoresponsive gas generating agent 47, whereby the gas generated from the photoresponsive gas generating agent 47 is supplied to the gas supply path 48.

  The film communication path 50 branches from the gas supply path 48 and is connected to the elastic film 46. That is, one end (upstream side) of the film communication path 50 is connected to the gas supply path 48, and the other end (downstream side) is connected to the elastic film 46. As a result, the gas supplied to the gas supply path 48 is supplied to the back surface side of the elastic film 46 (the side opposite to the inner wall of the external communication path 42) via the film communication path 50.

  A valve 51 is provided at the downstream end of the gas supply path 48. The valve 51 is installed between the gas supply path 48 and the sample moving path 45. In other words, the downstream end of the gas supply path 48 and the upstream end of the sample moving path 45 are connected via the valve 51. By opening and closing the valve 51, the gas supply path 48 and the sample moving path 45 are communicated or closed. Thereby, when the valve 51 is opened, the gas supplied to the gas supply path 48 is supplied to the sample moving path 45.

  An external communication path 42, which is a component of the flow rate adjustment device 41, branches off from the sample moving path 45. That is, one end of the external communication path 42 communicates with the sample moving path 45. On the other hand, the other end of the external communication path 42 is open to the outside. Thereby, when the flow rate adjustment device 41 is opened, specifically, when the region E is opened, the sample moving path 45 communicates with the outside. Conversely, when the flow rate adjustment device 41 is closed, specifically, when the region E is closed, the sample moving path 45 is blocked from the outside.

  The gas supply path 48 and the film communication path 50 can also have a shape that satisfies the above-mentioned “micro flow path”.

A method for transferring the liquid sample 38 using the microchannel device 40 will be described.
First, a predetermined amount of the liquid sample 38 is placed on the sample moving path 45. The liquid sample 38 can be introduced into the sample moving path 45 via the external communication path 42, for example.

  Subsequently, the photoresponsive gas generating agent 47 is irradiated with light to generate gas. At this time, the generated gas is supplied to the gas supply path 48. Further, the gas supplied to the gas supply path 48 flows into the film communication path 50 and is supplied to the back side of the elastic film 46. Thereby, the elastic body film 46 expand | swells and the area | region E of the film communicating path 50 closes. By closing the region E, the sample moving path 45 is blocked from the outside.

  When the pressure in the gas supply path 48 increases, the valve 51 is opened. Thereby, the gas generated from the photoresponsive gas generating agent 47 is supplied to the sample moving path 45 via the valve 51. At this time, the pressure of the supplied gas is applied to the liquid sample 38, and the liquid sample 38 moves.

  That is, in the present embodiment, the pressure generated by the gas generated from the photoresponsive gas generating agent 47 is used for both the opening / closing of the flow rate adjusting device 41 and the driving force for moving the liquid sample 38.

  As shown in FIG. 24, the liquid sample 38 can be reciprocated in the sample moving path 45 by combining two microchannel devices 40 of the present embodiment. In the embodiment shown in FIG. 24, the two microchannel devices 40a and 40b are connected so as to share the sample moving path 45. A liquid sample 38 is disposed in the sample moving path 45.

  In the embodiment shown in FIG. 24, when the liquid sample 38 is moved from left to right, the photoresponsive gas generating agent 47a of the left microchannel device 40a is irradiated with light to generate gas. At this time, the flow rate adjustment device 41b of the right micro-channel device 40b is opened for degassing. On the other hand, when the liquid sample 38 is moved from right to left, the photoresponsive gas generating agent 47b of the right microchannel device 40b is irradiated with light to generate gas. At this time, the flow rate adjusting device 41a of the microchannel device 40a on the left side is opened for degassing.

  In this manner, the liquid sample 38 can be reciprocated in the sample moving path 45 by alternately repeating the light irradiation to the left microchannel device 40a and the light irradiation to the right microchannel device 40b. it can. This embodiment is useful, for example, when performing a nucleic acid amplification reaction in which the temperature of a liquid sample represented by the PCR method is repeatedly raised and lowered. For example, a plurality of temperature regions are set in the sample moving path 45. The liquid sample 38 can be repeatedly raised and lowered by reciprocating the liquid sample 38 between the temperature regions.

Here, the material which comprises the said photoresponsive gas generating agent is demonstrated. Examples of the material (compound) that generates gas by light irradiation include azo compounds, azide compounds, and polyoxyalkylene compounds. In these compounds, the photolysis reaction proceeds by light irradiation. As for these compounds, only 1 type may be used and 2 or more types may be used together.
Examples of the azo compound include 2,2′-azobis- (N-butyl-2-methylpropionamide). Examples of the azide compound include 3-azidomethyl-3-methyloxetane and glycidyl azide polymer.

  The photoresponsive gas generating agent may contain a binder resin. The binder resin plays a role of fixing the compound that generates gas by light irradiation, imparting adhesiveness to the gas generating agent, and adding various functions to the gas generating agent. For example, the gas generating agent can be used by dispersing a compound that generates gas by light irradiation in a binder resin, or by dissolving a compound that generates gas by light irradiation in the binder resin. By using the binder resin, it is easy to process the gas generating agent into a desired shape. By using the binder resin, for example, a solid gas generating material such as a film can be easily obtained.

  Preferable examples of the binder resin include acrylic resins and epoxy resins. However, the binder resin is not limited to these resins. The binder resin itself may have a property of generating gas when irradiated with light. As for the said binder resin, only 1 type may be used and 2 or more types may be used together.

  The binder resin may contain, for example, an adhesive resin in order to impart tackiness. The gas generating material may contain the adhesive agent resin. When the gas generating material contains an adhesive resin, the tackiness and adhesiveness between the gas generating material and the substrate are further enhanced. As for the said adhesive agent resin, only 1 type may be used and 2 or more types may be used together.

  In addition, it is preferable that the said adhesive agent resin has a property which adhesiveness does not fall by irradiation of light. In this case, high adhesiveness between the gas generating material and the base can be maintained even after light irradiation is started on the gas generating agent. Moreover, it is preferable that the said adhesive agent resin has a property which is not bridge | crosslinked, for example by light irradiation.

Examples of the adhesive resin include a rubber-based adhesive resin, a (meth) acrylic adhesive resin, a silicone-based adhesive resin, a urethane-based adhesive resin, and styrene-isoprene- Examples thereof include styrene copolymer-based adhesive resins, styrene-butadiene-styrene copolymer adhesive resins, epoxy-based adhesive resins, and isocyanate-based adhesive resins.
The gas generating agent may contain a photosensitizer. Examples of the photosensitizer include thioxanthone, benzophenone, acetophenones, and porphyrin.

The gas generating agent may further contain various additives as necessary in addition to the components described above. Examples of the additive include a coupling agent, a plasticizer, a surfactant, a tackifier, a crosslinking agent, and a stabilizer. Other examples of the additive include porous bodies, fillers, metal foils, microcapsules, and other particles. When the porous material, filler, metal foil, microcapsule and other particles are dispersed in the gas generating material, gas diffusion is further accelerated.
In any of the above-described materials constituting the photoresponsive gas generating agent, the gas generating reaction is quickly stopped when the light source is turned off. Therefore, the above material is suitably used as a gas generating agent with good response.

  Examples of the liquid that is an object of the present invention include water, oil, biochemical buffer, blood, lymph, urine, soil extraction water, hydroponic water, and the like. Further, since the microchannel is a minute channel, the liquid may be, for example, a droplet in the microchannel.

A microchannel device having the configuration shown in FIGS. 15 to 20 was fabricated by combining the flow rate adjusting device 1 having the above-described configuration and the microchannel, and an experiment for flowing a liquid was performed.
The base material 5 was made of silicon resin (manufactured by Toray Dow Corning, SILPOT 184) by soft lithography. The thin microchannels 2c, 2e, and 2f were 0.5 mm wide and 0.5 mm deep. The size of the thick microchannel 2d was 0.8 mm wide and 0.8 mm deep. An elastic film 6 having a thickness of 0.05 mm was produced using silicon resin (SILPOT 184, manufactured by Toray Dow Corning).

  The elastic film 6 was affixed to the base material 5, and the gas generation film 7, the gas barrier layer 8, and the mask 10 were affixed. The mask 10 was produced by punching a graphite-containing polyethylene film into a circle having a diameter of 6 mm. As a light source for light irradiation, an LED (manufactured by Nitride Semiconductor: NS375-5RFS) was used.

Example 1
In the microchannel device shown in FIG. 16, liquid feeding from the microchannel 2c to the microchannel 2d was performed. Subsequently, the flow rate adjusting device 1 was irradiated with light and closed, and liquid feeding from the microchannel 2c to the microchannel 2d was stopped.

(Example 2)
In the microchannel device shown in FIG. 17A, the liquid is allowed to flow in the microchannel 2c and the microchannel 2d in the direction indicated by the arrows, and the liquid in the microchannel 2c is merged with the microchannel d and mixed. . Thereafter, the flow rate adjusting device 1 was irradiated with light and closed, and liquid feeding from the microchannel 2c to the microchannel 2d was stopped.

(Example 3)
In the microchannel device shown in FIG. 17B, a liquid was caused to flow in the microchannel 2d in the direction indicated by the arrow, and at the same time, the liquid was allowed to branch from the microchannel 2d into the microchannel 2c. Thereafter, the flow rate adjusting device 1 was irradiated with light and closed, and liquid feeding from the microchannel 2d to the microchannel 2c was stopped.

Example 4
In the microchannel device shown in FIG. 18A, a liquid was passed through the microchannel 2c and the microchannel 2e in the direction indicated by the arrow, and the liquid was fed to the microchannel 2d. Thereafter, each flow rate adjusting device 1 was sequentially irradiated with light and closed, and liquid feeding from the microchannels 2c and 2e to the microchannel 2d was sequentially stopped.

(Example 5)
In the microchannel device shown in FIG. 18B, a liquid was allowed to flow in the microchannel 2d in the direction indicated by the arrow, and at the same time, the microchannels 2c and 2e were also branched from the microchannel 2d to flow the liquid. Thereafter, each flow rate adjusting device 1 was sequentially irradiated with light and closed, and liquid feeding from the microchannel 2d to the microchannels 2c and 2e was sequentially stopped.

(Example 6)
In the microchannel device shown in FIG. 19 (a), liquid flows in the microchannels 2c and 2e and the microchannel 2d in the direction indicated by the arrows, and the liquid in the microchannels 2c and 2e merges into the microchannel 2d. Allowed to mix. Thereafter, each flow rate adjusting device 1 was sequentially irradiated with light and closed, and liquid feeding from the microchannels 2c and 2e to the microchannel 2d was sequentially stopped.

(Example 7)
In the microchannel device shown in FIG. 19 (b), the liquid was caused to flow in the microchannel 2d in the direction indicated by the arrow, and at the same time, the liquid was allowed to branch from the microchannel 2d into the microchannels 2c and 2e. Thereafter, each flow rate adjusting device 1 was sequentially irradiated with light and closed, and liquid feeding from the microchannel 2d to the microchannels 2c and 2e was sequentially stopped.

(Example 8)
In the microchannel device shown in FIG. 20 (a), the liquid flows in the microchannels 2c, 2e, 2f and the microchannel 2d in the direction indicated by the arrows, and the liquid in the microchannels 2c, 2e, 2f flows into the microchannel. Combined in path 2d and mixed. Thereafter, each flow rate adjusting device 1 was sequentially irradiated with light and closed, and liquid feeding from the microchannels 2c, 2e, and 2f to the microchannel 2d was sequentially stopped.

Example 9
In the microchannel device shown in FIG. 20B, the liquid is caused to flow in the microchannel 2d in the direction indicated by the arrow, and at the same time, the microchannels 2c, 2e, and 2f are branched from the microchannel 2d. did. Thereafter, each flow rate adjusting device 1 was sequentially irradiated with light and closed, and liquid feeding from the microchannel 2d to the microchannels 2c, 2e, and 2f was sequentially stopped.

(Example 10)
In the microchannel device shown in FIG. 21A, a liquid was flowed from the microchannels 2g to 2o to the microchamber 35 in the direction indicated by the arrow, and the liquid was mixed in the microchamber 35. Thereafter, each flow rate adjusting device 1 was sequentially irradiated with light and closed, and liquid feeding from the micro flow paths 2g to 2o to the micro chamber 35 was sequentially stopped. Further, the liquid collected in the microchamber 35 was transferred to the outside of the system through the microchannel 36.

(Example 11)
In the microchannel device shown in FIG. 21 (b), the liquid was allowed to flow through the microchannels 2 g to 2 o in the direction indicated by the arrows while introducing the liquid from the microchannel 36 into the microchamber 35. Thereafter, each flow rate adjusting device 1 was sequentially irradiated with light and closed, and liquid feeding from the microchamber 35 to the microchannels 2g to 2o was sequentially stopped.

(Example 12)
As shown in FIG. 22, a microchannel device in which a gas discharge mechanism 21 was added to the configuration shown in FIG. 16 was produced. A slightly adhesive tape (manufactured by Sekisui Chemical Co., Ltd .: product name 624L) was used as the sealing film 23. By continuing the light irradiation and continuing to apply the pressure by the gas, the sealing film 23 was peeled off and the gas was discharged. As a result, the flow rate adjusting device 1 was opened and the liquid transfer was resumed.

  A microchannel device having the same configuration as in Example 11 was prepared and experimented except that a light-stimulated release film (product name: SELFA) was used as the blocking film 23. By irradiating the sealing film 23 with light, the sealing film 23 was peeled off and the gas was discharged. Thereby, the flow control device 1 was opened, and the liquid transfer was resumed.

DESCRIPTION OF SYMBOLS 1 Flow control device 2,2a-2o Micro flow path 5 Base material 6 Elastic body film (film which has elasticity)
7 Gas generating film (photoresponsive gas generating agent)
12 Flow Control Unit 15 Gas Generation Unit 17 Expansion Unit 21 Gas Discharge Mechanism 22 Gas Discharge Path 23 Sealing Film (Valve)
27 Light-shielding film 30 Liquid weighing device 32 Sealed space 38 Liquid sample 40, 40a, 40b Micro flow channel device 41, 41a, 41b Flow rate adjusting device 42 External communication channel (micro flow channel)
45 Sample moving path 46 Elastic film (elastic film)
47, 47a, 47b Photoresponsive gas generating agent 48 Gas supply path 50 Film communication path 51 Valve

Claims (12)

A flow rate adjustment device that adjusts the flow rate of the liquid flowing through the predetermined position by changing the flow path cross-sectional area at a predetermined position in the micro flow path,
A photoresponsive gas generating agent that generates gas by irradiating light, and an elastic film;
The film constitutes the inner wall of the microchannel in the predetermined position;
The pressure of the gas generated from the photoresponsive gas generating agent is applied to the film from the side opposite to the inner wall of the microchannel in the film to elastically deform the film, thereby A flow rate adjusting device characterized by changing the shape of the inner wall and changing the cross-sectional area of the flow path.   2. The flow rate adjustment according to claim 1, wherein when the film expands, a flow path cross-sectional area at the predetermined position decreases, and when the film contracts, a flow path cross-sectional area at the predetermined position increases. device.   The microchannel can be closed at the predetermined position by the expansion of the film, and then the microchannel can be opened at the predetermined position by the contraction of the film. Flow control device.   A mask for limiting a light irradiation range is further provided, and the mask can irradiate light mainly on a region corresponding to the predetermined position in the photoresponsive gas generating agent. The flow regulating device according to any one of 1 to 3.   The said microchannel is formed in a plate-shaped base material, The said film and the said photoresponsive gas generating agent are laminated | stacked in this order on the said base material. The flow adjustment device according to the above.   The flow rate adjusting device according to any one of claims 1 to 5, further comprising a gas discharge mechanism for discharging the gas applied to the film.   The flow rate adjusting device according to claim 6, wherein the gas discharge mechanism includes a gas discharge path and a valve provided in the gas discharge path.   The flow rate adjusting device according to claim 7, wherein the valve uses a light-stimulated release film that self-peels when irradiated with light.   The flow rate adjusting device according to claim 1, wherein the photoresponsive gas generating agent further contains an acrylic binder and a photosensitizer.   The flow rate adjusting device according to claim 1, wherein the flow rate adjusting device is covered with a light shielding film when not in use, and the light shielding film is removed at the time of use. A liquid weighing device provided on a microchip for weighing a small volume of liquid,
The flow control device according to any one of claims 1 to 10, and a sealed space having a constant volume,
A liquid weighing device characterized in that a liquid of a constant volume can be weighed by introducing the liquid into the sealed space through the flow rate adjusting device. A microchannel device having a sample movement path through which a liquid sample moves,
A flow regulating device according to claim 1;
A gas supply path through which gas generated from the photoresponsive gas generating agent in the flow rate adjusting device is supplied;
A film communication path branched from the gas supply path and connected to a film having elasticity in the flow rate adjustment device;
A valve that is installed between the gas supply path and the sample movement path and communicates or closes between the gas supply path and the sample movement path by opening and closing;
Consists of a micro flow path in the flow rate adjustment device, one end communicates with the sample moving path, the other end has an external communication path that opens to the outside,
A microchannel device characterized in that gas generated from the photoresponsive gas generating agent is supplied to the film through the film communication path, the film is elastically deformed, and the external communication path can be closed.

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