JP2010285571A - Silicone resin composition for die bonding - Google Patents
Silicone resin composition for die bonding Download PDFInfo
- Publication number
- JP2010285571A JP2010285571A JP2009141877A JP2009141877A JP2010285571A JP 2010285571 A JP2010285571 A JP 2010285571A JP 2009141877 A JP2009141877 A JP 2009141877A JP 2009141877 A JP2009141877 A JP 2009141877A JP 2010285571 A JP2010285571 A JP 2010285571A
- Authority
- JP
- Japan
- Prior art keywords
- sio
- component
- group
- composition
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J9/00—Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Die Bonding (AREA)
- Led Device Packages (AREA)
Abstract
【課題】高硬度で、耐熱性、透明性及び低波長領域での光透過性が優れた硬化物を与えることができ、かつ高いダイシェア強度を示す、LED素子等のダイボンディングに有用なシリコーン樹脂組成物を提供する。
【解決手段】(A)式(1)で表される直鎖状オルガノポリシロキサン、
(B)式(2)で表され、23℃で蝋状又は固体の三次元網状オルガノポリシロキサン樹脂、
(C)式(3)で表され、ケイ素原子に結合した水素原子を1分子中に少なくとも2個有するオルガノハイドロジェンポリシロキサン、
(D)白金族金属系触媒、
(E)煙霧質シリカ
を含有するダイボンディング用シリコーン樹脂組成物。
【選択図】なしSilicone resin useful for die bonding of LED elements and the like, which can give a cured product having high hardness, excellent heat resistance, transparency and light transmittance in a low wavelength region, and exhibiting high die shear strength. A composition is provided.
(A) A linear organopolysiloxane represented by the formula (1):
(B) a three-dimensional network organopolysiloxane resin represented by the formula (2) and waxy or solid at 23 ° C.
(C) an organohydrogenpolysiloxane represented by formula (3) and having at least two hydrogen atoms bonded to silicon atoms in one molecule;
(D) a platinum group metal catalyst,
(E) A silicone resin composition for die bonding containing fumed silica.
[Selection figure] None
Description
本発明は、発光ダイオード(以下、「LED」という)素子等のダイボンディングに有用なシリコーン樹脂組成物に関する。 The present invention relates to a silicone resin composition useful for die bonding of a light emitting diode (hereinafter referred to as “LED”) element or the like.
従来、LED素子の封止材及びダイボンド材(即ち、LED素子等のダイとパッケージ等の基体とを接着させる接着材)にはエポキシ樹脂が使用されている。特にダイボンド材においては樹脂が軟らかすぎると、ダイボンド工程の後に行われるワイヤーボンディング工程において、ボンディングができないという不具合が発生するため、従来、このダイボンド材としては、高硬度の接着剤であるエポキシ樹脂が使用されてきた。しかし、エポキシ樹脂からなる封止材及びダイボンド材は、青色LED、白色LED等に用いると、強い紫外線により黄変し光を吸収することがあるので、LEDの輝度の低下を招く等、耐久性に問題がある。 Conventionally, an epoxy resin is used as a sealing material for LED elements and a die bonding material (that is, an adhesive for bonding a die such as an LED element and a substrate such as a package). In particular, if the resin is too soft in the die bond material, there is a problem that bonding cannot be performed in the wire bonding process performed after the die bond process. Therefore, conventionally, as the die bond material, an epoxy resin that is a high-hardness adhesive is used. Have been used. However, when used for blue LEDs, white LEDs, etc., the sealing material and die bond material made of epoxy resin may be yellowed by strong ultraviolet rays and absorb light. There is a problem.
近年、LEDの耐久性に対する期待は更に高まり、LED素子の封止材はエポキシ樹脂から耐久性が良好なシリコーン樹脂に代わってきている。封止材と同様に、ダイボンド材にも耐久性が求められている。また、ダイボンド材には輝度の向上と共に耐熱性の向上が一層求められることが予想される。艶色性の観点から紫外光を発するLEDが将来より多く使用される可能性もある。 In recent years, expectations for the durability of LEDs have further increased, and the sealing material of LED elements has been replaced by epoxy resins having good durability instead of epoxy resins. Like the sealing material, the die bond material is also required to have durability. Further, it is expected that the die bond material is required to further improve the heat resistance as well as the luminance. There is a possibility that more LEDs will be used in the future from the viewpoint of glossiness.
そのような観点から、シリコーン樹脂を使用したダイボンド材が開発されてきた。しかしながら、シリコーンダイボンド材は弾性率と接着力という点で従来のエポキシ樹脂よりも劣るため、ダイシェア強度が不十分となる場合がある。
なお、本発明に関連する従来技術として、下記文献が挙げられる。
From such a viewpoint, a die bond material using a silicone resin has been developed. However, since the silicone die-bonding material is inferior to the conventional epoxy resin in terms of elastic modulus and adhesive force, the die shear strength may be insufficient.
In addition, the following literature is mentioned as a prior art relevant to this invention.
本発明は、上記事情を鑑みてなされたものであって、高硬度で、耐熱性、透明性及び低波長領域での光透過性が優れた硬化物を与えることができ、かつ高いダイシェア強度を示す、LED素子等のダイボンディングに有用なシリコーン樹脂組成物を提供することを目的とする。 The present invention has been made in view of the above circumstances, and can provide a cured product having high hardness, excellent heat resistance, transparency, and light transmittance in a low wavelength region, and high die shear strength. It aims at providing the silicone resin composition useful for die bonding of LED element etc. to show.
本発明者は、上記目的を達成するために鋭意検討を重ねた結果、(A)平均組成式(1)で表される直鎖状オルガノポリシロキサン、(B)平均組成式(2)で表され、23℃で蝋状又は固体の三次元網状オルガノポリシロキサン樹脂、(C)平均組成式(3)で表され、ケイ素原子に結合した水素原子を1分子中に少なくとも2個有するオルガノハイドロジェンポリシロキサン、(D)白金族金属系触媒及び(E)煙霧質シリカの特定量を含有するダイボンディング用シリコーン樹脂組成物が、高硬度で、耐熱性、透明性及び低波長領域での光透過性に優れ、かつ高いダイシェア強度を示す硬化物を与えることができ、LED素子等のダイボンディングに有用であることを見出し、本発明をなすに至った。 As a result of intensive studies to achieve the above object, the present inventor has (A) a linear organopolysiloxane represented by an average composition formula (1) and (B) an average composition formula (2). A waxy or solid three-dimensional network organopolysiloxane resin at 23 ° C., (C) an organohydrogen represented by an average composition formula (3) and having at least two hydrogen atoms bonded to silicon atoms in one molecule Silicone resin composition for die bonding containing specific amounts of polysiloxane, (D) platinum group metal catalyst and (E) fumed silica has high hardness, heat resistance, transparency and light transmission in low wavelength region It has been found that a cured product having excellent properties and high die shear strength can be provided, and is useful for die bonding of LED elements and the like, and has led to the present invention.
従って、本発明は、下記に示すダイボンディング用シリコーン樹脂組成物を提供する。
〔請求項1〕
(A)下記平均組成式(1):
(R3 3SiO1/2)2(R1R2SiO)x(R2 2SiO)y…(1)
(式中、R1は独立にアルケニル基を表し、R2は独立に脂肪族不飽和結合を含まない1価炭化水素基を表し、全R2の少なくとも80モル%はメチル基であり、R3はR1又はR2である。xは1以上の整数、yは3以上の整数で、0.01≦x/y≦0.30を満たす数である。)
で表される直鎖状オルガノポリシロキサン:40〜10質量部、
(B)下記平均組成式(2):
(R5 3SiO1/2)k(R4R5 2SiO1/2)m(R4R5SiO)n(R5 2SiO)p
(R4SiO3/2)q(R5SiO3/2)r(SiO2)s…(2)
(式中、R4は独立にアルケニル基を表し、R5は独立に脂肪族不飽和結合を含まない1価炭化水素基を表し、全R5の少なくとも80モル%はメチル基であり、1>k≧0、1>m≧0、1>n≧0、1>p≧0、1>q≧0、1>r≧0及び1>s≧0、並びにm+n+q>0、q+r+s>0であり、かつk+m+n+p+q+r+s=1を満たす数である。)
で表され、23℃で蝋状又は固体の三次元網状オルガノポリシロキサン樹脂:60〜90質量部、(但し、(A)成分と(B)成分との合計は100質量部である。)
(C)下記平均組成式(3):
R6 aHbSiO(4-a-b)/2…(3)
(式中、R6は独立に脂肪族不飽和結合を含まない非置換又は置換の1価炭化水素基を表し、但し、全R6の少なくとも50モル%はメチル基であり、aは0.7≦a≦2.1、bは0.001≦b≦1.0を満たす数であり、但し、a+bは0.8≦a+b≦3.0を満たす数である。)
で表され、ケイ素原子に結合した水素原子を1分子中に少なくとも2個有するオルガノハイドロジェンポリシロキサン:(A)成分及び(B)成分中の全ケイ素原子結合アルケニル基に対して(C)成分中のケイ素原子に結合した水素原子が0.5〜5.0倍モルとなる量、
(D)白金族金属系触媒:有効量、及び
(E)煙霧質シリカ:(A)〜(C)成分の合計100質量部に対して1〜20質量部
を含有するダイボンディング用シリコーン樹脂組成物。
〔請求項2〕
前記組成物中の(A)〜(C)成分において、アルケニル基以外のケイ素原子に結合した全1価炭化水素基の90モル%以上がメチル基である請求項1に記載の組成物。
〔請求項3〕
前記組成物を硬化させて得られる硬化物のショアD硬度が30以上である請求項1又は2に記載の組成物。
Therefore, this invention provides the silicone resin composition for die bonding shown below.
[Claim 1]
(A) The following average composition formula (1):
(R 3 3 SiO 1/2 ) 2 (R 1 R 2 SiO) x (R 2 2 SiO) y (1)
(Wherein R 1 independently represents an alkenyl group, R 2 independently represents a monovalent hydrocarbon group containing no aliphatic unsaturated bond, and at least 80 mol% of all R 2 is a methyl group; 3 is R 1 or R 2. x is an integer of 1 or more, y is an integer of 3 or more, and is a number satisfying 0.01 ≦ x / y ≦ 0.30.
Linear organopolysiloxane represented by: 40 to 10 parts by mass,
(B) The following average composition formula (2):
(R 5 3 SiO 1/2 ) k (R 4 R 5 2 SiO 1/2 ) m (R 4 R 5 SiO) n (R 5 2 SiO) p
(R 4 SiO 3/2 ) q (R 5 SiO 3/2 ) r (SiO 2 ) s (2)
(In the formula, R 4 independently represents an alkenyl group, R 5 independently represents a monovalent hydrocarbon group containing no aliphatic unsaturated bond, and at least 80 mol% of all R 5 is a methyl group; > K ≧ 0, 1> m ≧ 0, 1> n ≧ 0, 1> p ≧ 0, 1> q ≧ 0, 1> r ≧ 0 and 1> s ≧ 0, and m + n + q> 0, q + r + s> 0. And a number satisfying k + m + n + p + q + r + s = 1.)
And a waxy or solid three-dimensional network organopolysiloxane resin at 23 ° C .: 60 to 90 parts by mass (provided that the total of component (A) and component (B) is 100 parts by mass).
(C) The following average composition formula (3):
R 6 a H b SiO (4-ab) / 2 (3)
(In the formula, R 6 independently represents an unsubstituted or substituted monovalent hydrocarbon group that does not contain an aliphatic unsaturated bond, provided that at least 50 mol% of all R 6 is a methyl group; (7 ≦ a ≦ 2.1, b is a number satisfying 0.001 ≦ b ≦ 1.0, where a + b is a number satisfying 0.8 ≦ a + b ≦ 3.0.)
And an organohydrogenpolysiloxane having at least two hydrogen atoms bonded to a silicon atom in one molecule: (C) component with respect to all silicon atom-bonded alkenyl groups in component (A) and component (B) An amount in which hydrogen atoms bonded to silicon atoms are 0.5 to 5.0 times mol,
(D) Platinum group metal catalyst: effective amount, and (E) fumed silica: silicone resin composition for die bonding containing 1 to 20 parts by mass with respect to 100 parts by mass in total of components (A) to (C). object.
[Claim 2]
2. The composition according to claim 1, wherein in the components (A) to (C) in the composition, 90 mol% or more of all monovalent hydrocarbon groups bonded to silicon atoms other than alkenyl groups are methyl groups.
[Claim 3]
The composition according to claim 1 or 2, wherein a Shore D hardness of a cured product obtained by curing the composition is 30 or more.
本発明の組成物は、高硬度(好ましい実施形態ではショアD硬度が30以上)で、高いダイシェア強度を示す硬化物を与えることができ、LED素子等のダイボンディングに用いられるダイボンド材として特に有用なものである。 The composition of the present invention can provide a cured product having high hardness (Shore D hardness of 30 or more in a preferred embodiment) and high die shear strength, and is particularly useful as a die bond material used for die bonding of LED elements and the like. It is a thing.
以下、各成分について詳細に説明する。なお、本明細書において、「Me」はメチル基を表し、「Vi」はビニル基を表す。
本発明の組成物は、下記の(A)〜(E)成分を含有してなる。
Hereinafter, each component will be described in detail. In the present specification, “Me” represents a methyl group, and “Vi” represents a vinyl group.
The composition of the present invention comprises the following components (A) to (E).
<(A)成分>
(A)成分は、組成物の粘度を下げるとともに、組成物の硬化後に応力緩和をもたらし、かつダイシェア強度を高めるための成分である。(A)成分は、下記平均組成式(1):
(R3 3SiO1/2)2(R1R2SiO)x(R2 2SiO)y…(1)
(式中、R1は独立にアルケニル基を表し、R2は独立に脂肪族不飽和結合を含まない1価炭化水素基を表し、全R2の少なくとも80モル%はメチル基であり、R3はR1又はR2である。xは1以上の整数、yは3以上の整数で、0.01≦x/y≦0.30を満たす数である。x+yは、25℃における粘度が、50〜50,000mPa・sとなる範囲が好ましい。)
で表され、アルケニル基を有するシロキサン単位(R1R2SiO単位、以下DVi単位(アルケニル基を代表するものとしてViを記載したが、ビニル基に限定されるものではない)とする)と脂肪族不飽和結合を有さないシロキサン単位(R2 2SiO単位、以下D単位とする)のランダム共重合体であり、分子鎖両末端がトリオルガノシロキシ基で封鎖された、基本的に直鎖状の分子構造を有するオルガノポリシロキサンである。
<(A) component>
The component (A) is a component for reducing the viscosity of the composition, causing stress relaxation after the composition is cured, and increasing the die shear strength. The component (A) has the following average composition formula (1):
(R 3 3 SiO 1/2 ) 2 (R 1 R 2 SiO) x (R 2 2 SiO) y (1)
(Wherein R 1 independently represents an alkenyl group, R 2 independently represents a monovalent hydrocarbon group containing no aliphatic unsaturated bond, and at least 80 mol% of all R 2 is a methyl group; 3 is R 1 or R 2. x is an integer of 1 or more, y is an integer of 3 or more, and is a number satisfying 0.01 ≦ x / y ≦ 0.30, x + y is a viscosity at 25 ° C. The range of 50 to 50,000 mPa · s is preferable.)
And a siloxane unit having an alkenyl group (R 1 R 2 SiO unit, hereinafter referred to as a D Vi unit (Vi is described as a representative alkenyl group, but is not limited to a vinyl group)) and It is a random copolymer of siloxane units (R 2 2 SiO units, hereinafter referred to as D units) having no aliphatic unsaturated bonds, and both ends of the molecular chain are blocked with triorganosiloxy groups. It is an organopolysiloxane having a chain molecular structure.
組成物の硬化後に応力緩和をもたらすためには、DVi/Dの比率をある程度小さくする必要があり、ダイシェア強度を高めるためにはDVi/Dの比率をある程度大きくする必要がある。すなわち、DVi/D(上記式(1)中のx/y)の比率は0.01≦DVi/D≦0.30とする必要があり、特に0.02≦DVi/D≦0.15が好ましい。この比率が小さすぎると硬化物の応力緩和がなくなり、クラックが発生し易くなり、この比率が大きすぎるとダイシェア強度が低くなってしまう。 In order to relieve stress after the composition is cured, the ratio of D Vi / D needs to be reduced to some extent, and in order to increase the die shear strength, the ratio of D Vi / D needs to be increased to some extent. That is, the ratio of D Vi / D (x / y in the above formula (1)) needs to be 0.01 ≦ D Vi /D≦0.30, particularly 0.02 ≦ D Vi / D ≦ 0. .15 is preferred. When this ratio is too small, stress relaxation of the cured product is lost, and cracks are likely to occur. When this ratio is too large, the die shear strength is lowered.
前記ケイ素原子に結合したアルケニル基(上記式(1)中のR1)は、炭素原子数が、通常、2〜8、好ましくは2〜4のものである。その具体例としては、ビニル基、アリル基、ブテニル基、ペンテニル基、ヘキセニル基、ヘプテニル基等が挙げられ、好ましくはビニル基である。 The alkenyl group bonded to the silicon atom (R 1 in the above formula (1)) usually has 2 to 8 carbon atoms, preferably 2 to 4 carbon atoms. Specific examples thereof include a vinyl group, an allyl group, a butenyl group, a pentenyl group, a hexenyl group, and a heptenyl group, and a vinyl group is preferable.
(A)成分のオルガノポリシロキサン分子中において、前記脂肪族不飽和結合以外のケイ素原子に結合した有機基(上記式(1)中のR2)は、脂肪族不飽和結合を有しないものであれば特に限定されず、例えば、非置換又は置換の、炭素原子数が、通常、1〜12、好ましくは1〜10の1価炭化水素基である。この非置換又は置換の1価炭化水素基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基等のアルキル基;シクロヘキシル基等のシクロアルキル基;フェニル基、トリル基、キシリル基、ナフチル基等のアリール基;ベンジル基、フェネチル基等のアラルキル基;これらの基の水素原子の一部又は全部が塩素原子、フッ素原子、臭素原子等のハロゲン原子で置換された、クロロメチル基、3−クロロプロピル基、3,3,3−トリフロロプロピル基等のハロゲン化アルキル基等が挙げられ、好ましくはアルキル基であり、より好ましくはメチル基である。 In the organopolysiloxane molecule of component (A), the organic group bonded to the silicon atom other than the aliphatic unsaturated bond (R 2 in the above formula (1)) does not have an aliphatic unsaturated bond. There is no particular limitation as long as it is, for example, an unsubstituted or substituted monovalent hydrocarbon group having 1 to 12, preferably 1 to 10, carbon atoms. Examples of the unsubstituted or substituted monovalent hydrocarbon group include alkyl groups such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, and a heptyl group; a cycloalkyl group such as a cyclohexyl group; Aryl groups such as a group, tolyl group, xylyl group and naphthyl group; aralkyl groups such as a benzyl group and a phenethyl group; some or all of hydrogen atoms of these groups are halogen atoms such as a chlorine atom, a fluorine atom and a bromine atom Examples thereof include halogenated alkyl groups such as substituted chloromethyl group, 3-chloropropyl group and 3,3,3-trifluoropropyl group, preferably an alkyl group, and more preferably a methyl group.
本発明においては、前記脂肪族不飽和結合以外のケイ素原子に結合した全有機基中、少なくとも80モル%(80〜100モル%)、好ましくは90〜100モル%、より好ましくは98〜100モル%がメチル基である。メチル基が前記脂肪族不飽和結合以外のケイ素原子に結合した全有機基の80モル%未満であると耐光性や耐候性が低下し、硬化物が変色し易くなる。 In the present invention, at least 80 mol% (80 to 100 mol%), preferably 90 to 100 mol%, more preferably 98 to 100 mol in all organic groups bonded to silicon atoms other than the aliphatic unsaturated bonds. % Is a methyl group. When the methyl group is less than 80 mol% of all organic groups bonded to silicon atoms other than the aliphatic unsaturated bond, light resistance and weather resistance are lowered, and the cured product is easily discolored.
(A)成分のオルガノポリシロキサンは、25℃における粘度が、好ましくは50〜50,000mPa・s)、より好ましくは100〜10,000mPa・sである。粘度が低すぎても、高すぎてもダイボンド材の作業性が低下する場合がある。なお、本発明において、粘度は、回転粘度計により測定した値である(以下、同じ)。 The viscosity of the organopolysiloxane (A) at 25 ° C. is preferably 50 to 50,000 mPa · s, more preferably 100 to 10,000 mPa · s. If the viscosity is too low or too high, the workability of the die bond material may be reduced. In the present invention, the viscosity is a value measured with a rotational viscometer (hereinafter the same).
(A)成分のオルガノポリシロキサンは、例えば、下記平均組成式(4)で表される。
R7 cR8 dSiO(4-c-d)/2…(4)
(式中、R7は独立に脂肪族不飽和結合を有しない非置換又は置換の1価炭化水素基であり、R8は独立にアルケニル基であり、cは1.7〜2.1の数、dは0.01〜0.3の数であり、但し、c+dは2.0〜2.2を満たす。)
The organopolysiloxane of component (A) is represented by, for example, the following average composition formula (4).
R 7 c R 8 d SiO (4-cd) / 2 (4)
(Wherein, R 7 is an unsubstituted or substituted monovalent hydrocarbon group having no aliphatic unsaturated bonds independently, R 8 is independently an alkenyl group, c is the 1.7 to 2.1 The number d is a number from 0.01 to 0.3, provided that c + d satisfies 2.0 to 2.2.
上記平均組成式(4)中、R7で表される脂肪族不飽和結合を有しない非置換又は置換の1価炭化水素基は、前記脂肪族不飽和結合以外のケイ素原子に結合した有機基として例示したものと同種のものである。また、R8で表されるアルケニル基は、前記ケイ素原子に結合したアルケニル基として例示したものと同種のものである。 The above average composition formula (4), the monovalent hydrocarbon radical unsubstituted or substituted no aliphatic unsaturated bond represented by R 7 is an organic group bonded to a silicon atom other than the aliphatic unsaturated bonds It is the same kind as what was illustrated as. Moreover, the alkenyl group represented by R 8 is the same kind as that exemplified as the alkenyl group bonded to the silicon atom.
(A)成分のオルガノポリシロキサンとしては、例えば、下記一般式(5)〜(8):
R9 3SiO(ViR9SiO)e(R9 2SiO)fSiR9 3…(5)
ViR9 2SiO(ViR9SiO)e(R9 2SiO)fSiR9 2Vi…(6)
Vi2R9SiO(ViR9SiO)e(R9 2SiO)fSiR9Vi2…(7)
Vi3SiO(ViR9SiO)e(R9 2SiO)fSiVi3…(8)
(式中、R9は独立に脂肪族不飽和結合を含まない非置換又は置換の1価炭化水素基を表し、e+fは10〜1,000、好ましくは50〜500であり、e/fは0.01〜0.30、好ましくは0.02〜0.15である。)
で表されるもの等が例示される。
Examples of the organopolysiloxane of the component (A) include the following general formulas (5) to (8):
R 9 3 SiO (ViR 9 SiO) e (R 9 2 SiO) f SiR 9 3 (5)
ViR 9 2 SiO (ViR 9 SiO) e (R 9 2 SiO) f SiR 9 2 Vi (6)
Vi 2 R 9 SiO (ViR 9 SiO) e (R 9 2 SiO) f SiR 9 Vi 2 (7)
Vi 3 SiO (ViR 9 SiO) e (R 9 2 SiO) f SiVi 3 (8)
(Wherein, R 9 represents a substituted or unsubstituted monovalent hydrocarbon radical independently contains no aliphatic unsaturated bonds, e + f is 10 to 1,000, preferably 50 to 500, e / f is 0.01 to 0.30, preferably 0.02 to 0.15.)
What is represented by etc. is illustrated.
上記一般式(5)〜(8)中、R9で表される非置換又は置換の1価炭化水素基は、炭素原子数が、好ましくは1〜10、より好ましくは1〜6のものである。その具体例として、好ましくは前記脂肪族不飽和結合以外のケイ素原子に結合した有機基として例示したもの、中でもアリール基、アラルキル基以外のものと同種のものが挙げられるが、硬化物の耐光性及び耐熱性が優れるので、より好ましくはアルキル基、特に好ましくはメチル基である。 In the general formula (5) to (8), monovalent hydrocarbon radical unsubstituted or substituted as represented by R 9 has a number of carbon atoms, preferably 1 to 10, more preferably those of 1 to 6 is there. Specific examples thereof include those exemplified as an organic group bonded to a silicon atom other than the aliphatic unsaturated bond, and among them, the same type as those other than an aryl group and an aralkyl group may be mentioned. And since it is excellent in heat resistance, it is more preferably an alkyl group, particularly preferably a methyl group.
(A)成分のオルガノポリシロキサンは、例えば、
で表されるものが好ましい。
The organopolysiloxane of component (A) is, for example,
The thing represented by these is preferable.
(A)成分の具体例としては、
(A)成分は、一種単独で用いても二種以上を併用してもよい。
As a specific example of the component (A),
(A) A component may be used individually by 1 type, or may use 2 or more types together.
<(B)成分>
(B)成分は、硬化物の透明性を維持したまま、補強性を得るための成分である。(B)成分は、下記平均組成式(2)で表され、23℃において蝋状もしくは固体である、分子中に、ケイ素原子に結合したアルケニル基と、三官能性シロキサン単位及び/又はSiO4/2単位とを必須に含有する、三次元網状のオルガノポリシロキサン樹脂である。なお、「蝋状」とは、23℃において、10,000,000mPa・s以上、特に100,000,000mPa・s以上の、ほとんど自己流動性を示さないガム状(生ゴム状)であることを意味する。
<(B) component>
The component (B) is a component for obtaining reinforcing properties while maintaining the transparency of the cured product. The component (B) is represented by the following average composition formula (2) and is waxy or solid at 23 ° C., and in the molecule, an alkenyl group bonded to a silicon atom, a trifunctional siloxane unit and / or SiO 4. This is a three-dimensional network-like organopolysiloxane resin that essentially contains 2 units. In addition, “wax” means a gum (raw rubber) that shows no self-fluidity at 23 ° C. of 10,000,000 mPa · s or more, particularly 100,000,000 mPa · s or more. means.
(R5 3SiO1/2)k(R4R5 2SiO1/2)m(R4R5SiO)n(R5 2SiO)p
(R4SiO3/2)q(R5SiO3/2)r(SiO2)s…(2)
(式中、R4はアルケニル基を表し、R5は脂肪族不飽和結合を含まない1価炭化水素基を表し、全R5の少なくとも80モル%はメチル基であり、1>k≧0、1>m≧0、1>n≧0、1>p≧0、1>q≧0、1>r≧0及び1>s≧0、並びにm+n+q>0、q+r+s>0であり、かつk+m+n+p+q+r+s=1を満たす数である。)
(R 5 3 SiO 1/2 ) k (R 4 R 5 2 SiO 1/2 ) m (R 4 R 5 SiO) n (R 5 2 SiO) p
(R 4 SiO 3/2 ) q (R 5 SiO 3/2 ) r (SiO 2 ) s (2)
Wherein R 4 represents an alkenyl group, R 5 represents a monovalent hydrocarbon group containing no aliphatic unsaturated bond, and at least 80 mol% of all R 5 is a methyl group, and 1> k ≧ 0 1> m ≧ 0, 1> n ≧ 0, 1> p ≧ 0, 1> q ≧ 0, 1> r ≧ 0 and 1> s ≧ 0, and m + n + q> 0, q + r + s> 0, and k + m + n + p + q + r + s = A number that satisfies 1.)
上記平均組成式(2)中、R4で表されるアルケニル基は、(A)成分の式(1)においてR1で表されるアルケニル基として例示したものと同種のものであるが、入手のし易さ及び価格面からビニル基が好ましい。 In the average composition formula (2), the alkenyl group represented by R 4 is the same as the alkenyl group represented by R 1 in the formula (1) of the component (A), but is available. A vinyl group is preferable from the viewpoint of ease of use and price.
R5で表される脂肪族不飽和結合を含まない1価炭化水素基は、(A)成分の式(1)においてR2で表される脂肪族不飽和結合以外のケイ素原子に結合した有機基として例示したものと同種のものであるが、全R5の少なくとも80モル%(80〜100モル%)、好ましくは90〜100モル%、より好ましくは98〜100モル%はメチル基である。メチル基の割合が全R5の80モル%未満の場合には、(A)成分との相溶性に劣るため、組成物が白濁してしまい、目的とする高透明性の硬化物が得られないことがある。 The monovalent hydrocarbon group not containing an aliphatic unsaturated bond represented by R 5 is an organic compound bonded to a silicon atom other than the aliphatic unsaturated bond represented by R 2 in the formula (1) of the component (A). The same as those exemplified as the group, but at least 80 mol% (80 to 100 mol%), preferably 90 to 100 mol%, more preferably 98 to 100 mol% of the total R 5 is a methyl group. . When the proportion of methyl groups is less than 80 mol% of the total R 5 , the composition becomes cloudy because of poor compatibility with the component (A), and the desired highly transparent cured product is obtained. There may not be.
kは0〜0.65、mは0〜0.65、nは0〜0.5、pは0〜0.5、qは0〜0.8、rは0〜0.8、sは0〜0.6の数であることが好ましい。また、m+n+qは0.1〜0.8、特に0.2〜0.65の数であることが好ましく、q+r+sは0.1〜0.8、特に0.2〜0.6の数であることが好ましい。
また、(B)成分のオルガノポリシロキサン樹脂のGPC(ゲルパーミエーションクロマトグラフ)におけるポリスチレン換算重量平均分子量は、400〜100,000、特に500〜50,000であることが好ましい。
k is 0 to 0.65, m is 0 to 0.65, n is 0 to 0.5, p is 0 to 0.5, q is 0 to 0.8, r is 0 to 0.8, s is The number is preferably 0 to 0.6. Further, m + n + q is preferably a number of 0.1 to 0.8, particularly 0.2 to 0.65, and q + r + s is a number of 0.1 to 0.8, particularly 0.2 to 0.6. It is preferable.
Moreover, it is preferable that the polystyrene conversion weight average molecular weight in GPC (gel permeation chromatograph) of the organopolysiloxane resin of (B) component is 400-100,000, It is preferable that it is 500-50,000 especially.
(B)成分中、ケイ素原子に結合したアルケニル基の含有量は、(B)成分100g当たり、0.01〜1molの範囲であることが好ましく、0.05〜0.5molの範囲であることがより好ましい。アルケニル基の含有量が0.01〜1molの範囲を満たすと、架橋反応が十分に進行し、より高硬度の硬化物が得られる。 In the component (B), the content of the alkenyl group bonded to the silicon atom is preferably in the range of 0.01 to 1 mol, and in the range of 0.05 to 0.5 mol, per 100 g of the component (B). Is more preferable. When the content of the alkenyl group satisfies the range of 0.01 to 1 mol, the crosslinking reaction proceeds sufficiently, and a cured product with higher hardness can be obtained.
(B)成分のオルガノポリシロキサン樹脂は、例えば、
(R5 3SiO1/2)k(R4R5 2SiO1/2)m(SiO2)s
(R4R5 2SiO1/2)m(SiO2)s
(R4R5SiO)n(R5 2SiO)p(R5SiO3/2)r
(R4R5 2SiO1/2)m(R5 2SiO)p(R4SiO3/2)q
(R4R5 2SiO1/2)m(R5 2SiO)p(R5SiO3/2)r
(R5 3SiO1/2)k(R4R5 2SiO1/2)m(R5 2SiO)p(R5SiO3/2)r
(R5 3SiO1/2)k(R4R5 2SiO1/2)m(R4R5SiO)n(R5 2SiO)p(R5SiO3/2)r
(式中、R4、R5、k、m、n、p、q、r及びsは、前記平均組成式(2)で定義した通りである。)
で表されるものが好ましい。
The organopolysiloxane resin of component (B) is, for example,
(R 5 3 SiO 1/2 ) k (R 4 R 5 2 SiO 1/2 ) m (SiO 2 ) s
(R 4 R 5 2 SiO 1/2 ) m (SiO 2 ) s
(R 4 R 5 SiO) n (R 5 2 SiO) p (R 5 SiO 3/2) r
(R 4 R 5 2 SiO 1/2 ) m (R 5 2 SiO) p (R 4 SiO 3/2 ) q
(R 4 R 5 2 SiO 1/2 ) m (R 5 2 SiO) p (R 5 SiO 3/2 ) r
(R 5 3 SiO 1/2 ) k (R 4 R 5 2 SiO 1/2 ) m (R 5 2 SiO) p (R 5 SiO 3/2 ) r
(R 5 3 SiO 1/2 ) k (R 4 R 5 2 SiO 1/2 ) m (R 4 R 5 SiO) n (R 5 2 SiO) p (R 5 SiO 3/2 ) r
(In the formula, R 4 , R 5 , k, m, n, p, q, r and s are as defined in the average composition formula (2).)
The thing represented by these is preferable.
(B)成分の具体例としては、
(Me3SiO1/2)0.4(ViMe2SiO1/2)0.1(SiO2)0.5、
(ViMeSiO)0.4(Me2SiO)0.15(MeSiO3/2)0.45、
(ViMe2SiO1/2)0.2(Me2SiO)0.25(MeSiO3/2)0.55
等が挙げられる。
(B)成分は、一種単独で用いても二種以上を併用してもよい。
As a specific example of the component (B),
(Me 3 SiO 1/2 ) 0.4 (ViMe 2 SiO 1/2 ) 0.1 (SiO 2 ) 0.5 ,
(ViMeSiO) 0.4 (Me 2 SiO) 0.15 (MeSiO 3/2 ) 0.45 ,
(ViMe 2 SiO 1/2 ) 0.2 (Me 2 SiO) 0.25 (MeSiO 3/2 ) 0.55
Etc.
(B) A component may be used individually by 1 type, or may use 2 or more types together.
(B)成分の(A)成分に対する比率も本発明の組成物の重要なファクターの一つである。(B)成分の配合量は、(A)成分と(B)成分との合計100質量部に対して60〜90質量部とする必要があり、好ましくは65〜80質量部、より好ましくは70〜80質量部である。(B)成分の配合量が60質量部未満の場合には、十分な硬度が得られないことがあり、90質量部を超える場合には、組成物の粘度が著しく高くなり、組成物をLED素子等のダイボンド材として用いる場合の作業性が著しく低下する。 The ratio of the component (B) to the component (A) is also an important factor of the composition of the present invention. (B) The compounding quantity of a component needs to be 60-90 mass parts with respect to a total of 100 mass parts of (A) component and (B) component, Preferably it is 65-80 mass parts, More preferably, it is 70. ~ 80 parts by mass. When the blending amount of the component (B) is less than 60 parts by mass, sufficient hardness may not be obtained, and when it exceeds 90 parts by mass, the viscosity of the composition becomes remarkably high, and the composition is LED Workability when used as a die-bonding material for an element or the like is significantly reduced.
<(C)成分>
(C)成分は、(A)成分及び(B)成分中のアルケニル基とヒドロシリル化反応により架橋する架橋剤として働くと共に、組成物を希釈して使用用途に適した粘度にする反応性希釈剤としても働く成分である。(C)成分は、下記平均組成式(3)で表され、ケイ素原子に結合した水素原子(即ち、SiH基)を1分子中に少なくとも2個(通常、2〜200個)、好ましくは3個以上(例えば、3〜100個程度)有するオルガノハイドロジェンポリシロキサンである。
<(C) component>
The component (C) acts as a crosslinking agent that crosslinks with the alkenyl group in the component (A) and the component (B) by a hydrosilylation reaction and dilutes the composition to a viscosity suitable for the intended use. Is a component that also works as a The component (C) is represented by the following average composition formula (3), and has at least two hydrogen atoms (that is, SiH groups) bonded to silicon atoms in one molecule (usually 2 to 200), preferably 3 It is an organohydrogenpolysiloxane having at least one (for example, about 3 to 100).
R6 aHbSiO(4-a-b)/2…(3)
(式中、R6は独立に脂肪族不飽和結合を含まない非置換又は置換の1価炭化水素基を表し、但し、全R6の少なくとも50モル%はメチル基であり、aは0.7≦a≦2.1、bは0.001≦b≦1.0を満たす数であり、但し、a+bは0.8≦a+b≦3.0を満たす数である。)
R 6 a H b SiO (4-ab) / 2 (3)
(In the formula, R 6 independently represents an unsubstituted or substituted monovalent hydrocarbon group that does not contain an aliphatic unsaturated bond, provided that at least 50 mol% of all R 6 is a methyl group; (7 ≦ a ≦ 2.1, b is a number satisfying 0.001 ≦ b ≦ 1.0, where a + b is a number satisfying 0.8 ≦ a + b ≦ 3.0.)
上記平均組成式(3)中、R6で表される脂肪族不飽和結合を含まない非置換又は置換の1価炭化水素基は、(A)成分の式(1)においてR2で表される脂肪族不飽和結合以外のケイ素原子に結合した有機基として例示したものと同種のものであるが、全R6の少なくとも50モル%(50〜100モル%)、好ましくは60〜100モル%、特に好ましくは90〜100モル%はメチル基である。メチル基の割合が全R6の50モル%未満の場合には、(A)成分及び(B)成分との相溶性に劣り、白濁もしくは組成物が相分離したりするという問題が発生する。 In the average composition formula (3), the unsubstituted or substituted monovalent hydrocarbon group not containing an aliphatic unsaturated bond represented by R 6 is represented by R 2 in the formula (1) of the component (A). Are the same as those exemplified as the organic group bonded to the silicon atom other than the aliphatic unsaturated bond, but at least 50 mol% (50 to 100 mol%), preferably 60 to 100 mol% of the total R 6 Particularly preferably, 90 to 100 mol% is a methyl group. When the proportion of methyl groups is less than 50 mol% of the total R 6 , the compatibility with the component (A) and the component (B) is inferior, and there arises a problem that the composition becomes cloudy or phase separates.
aは1.0〜2.0、bは0.01〜1.0、a+bは1.1〜2.6の数であることが好ましい。 It is preferable that a is 1.0 to 2.0, b is 0.01 to 1.0, and a + b is 1.1 to 2.6.
(C)成分中、前記ケイ素原子に結合した水素原子の含有量は、(C)成分1g当たり、0.001〜0.02molの範囲であることが好ましく、0.002〜0.017molの範囲であることがより好ましい。ケイ素原子結合水素原子の含有量が少なすぎると十分な硬度が得られない場合があり、多すぎると硬化性や耐熱性等が低下する場合がある。 In the component (C), the content of hydrogen atoms bonded to the silicon atom is preferably in the range of 0.001 to 0.02 mol, and in the range of 0.002 to 0.017 mol, per gram of the component (C). It is more preferable that If the content of silicon-bonded hydrogen atoms is too small, sufficient hardness may not be obtained, and if it is too high, curability and heat resistance may be reduced.
1分子中に2個以上、好ましくは3個以上含有されるケイ素原子に結合した水素原子(即ち、SiH基)は、分子鎖末端、分子鎖途中のいずれに位置していてもよく、またこの両方に位置するものであってもよい。また、このオルガノハイドロジェンポリシロキサンの分子構造は直鎖状、環状、分岐状、三次元網状構造のいずれであってもよいが、1分子中のケイ素原子の数(又は重合度)は、通常、2〜400個、好ましくは3〜200個、より好ましくは4〜100個程度のものが望ましい。 Hydrogen atoms bonded to silicon atoms contained in two or more, preferably three or more in one molecule (that is, SiH groups) may be located either at the end of the molecular chain or in the middle of the molecular chain. It may be located in both. The molecular structure of the organohydrogenpolysiloxane may be any of linear, cyclic, branched, and three-dimensional network structures, but the number of silicon atoms in one molecule (or the degree of polymerization) is usually 2 to 400, preferably 3 to 200, and more preferably about 4 to 100.
(C)成分のオルガノハイドロジェンポリシロキサンは、25℃における粘度が、好ましくは1,000mPa・s以下(通常、1〜1,000mPa・s)、より好ましくは5〜200mPa・sである。 The organohydrogenpolysiloxane of component (C) has a viscosity at 25 ° C. of preferably 1,000 mPa · s or less (usually 1 to 1,000 mPa · s), more preferably 5 to 200 mPa · s.
(C)成分のオルガノハイドロジェンポリシロキサンとしては、具体的には、例えば、1,1,3,3−テトラメチルジシロキサン、1,3,5,7−テトラメチルシクロテトラシロキサン、トリス(ハイドロジェンジメチルシロキシ)メチルシラン、トリス(ハイドロジェンジメチルシロキシ)フェニルシラン、メチルハイドロジェンシクロポリシロキサン、メチルハイドロジェンシロキサン・ジメチルシロキサン環状共重合体、両末端トリメチルシロキシ基封鎖メチルハイドロジェンポリシロキサン、両末端トリメチルシロキシ基封鎖ジメチルシロキサン・メチルハイドロジェンシロキサン共重合体、両末端ジメチルハイドロジェンシロキシ基封鎖ジメチルポリシロキサン、両末端ジメチルハイドロジェンシロキシ基封鎖ジメチルシロキサン・メチルハイドロジェンシロキサン共重合体、両末端トリメチルシロキシ基封鎖メチルハイドロジェンシロキサン・ジフェニルシロキサン共重合体、両末端トリメチルシロキシ基封鎖メチルハイドロジェンシロキサン・ジフェニルシロキサン・ジメチルシロキサン共重合体、両末端トリメチルシロキシ基封鎖メチルハイドロジェンシロキサン・メチルフェニルシロキサン・ジメチルシロキサン共重合体、両末端ジメチルハイドロジェンシロキシ基封鎖メチルハイドロジェンシロキサン・ジメチルシロキサン・ジフェニルシロキサン共重合体、両末端ジメチルハイドロジェンシロキシ基封鎖メチルハイドロジェンシロキサン・ジメチルシロキサン・メチルフェニルシロキサン共重合体、(CH3)2HSiO1/2単位と(CH3)3SiO1/2単位とSiO4/2単位とからなる共重合体、(CH3)2HSiO1/2単位とSiO4/2単位とからなる共重合体、(CH3)2HSiO1/2単位とSiO4/2単位と(C6H5)3SiO1/2単位とからなる共重合体等が挙げられるほか、下記一般式(9)、(10):
R6 3SiO(R6HSiO)tSiR6 3…(9)
環状の(R6HSiO)u…(10)
(式中、R6は前記の通りであり、tは2〜30、好ましくは2〜25の整数であり、uは4〜8の整数である。)
で表されるもの、下記一般式:
Specific examples of the organohydrogenpolysiloxane of component (C) include 1,1,3,3-tetramethyldisiloxane, 1,3,5,7-tetramethylcyclotetrasiloxane, tris (hydro Gendimethylsiloxy) methylsilane, tris (hydrogendimethylsiloxy) phenylsilane, methylhydrogencyclopolysiloxane, methylhydrogensiloxane / dimethylsiloxane cyclic copolymer, trimethylsiloxy group-blocked methylhydrogenpolysiloxane, trimethyl at both ends Siloxy group-blocked dimethylsiloxane / methylhydrogensiloxane copolymer, both ends dimethylhydrogensiloxy group-blocked dimethylpolysiloxane, both ends dimethylhydrogensiloxy group-blocked dimethylsiloxy Methylhydrogensiloxane copolymer, trimethylsiloxy group-blocked methylhydrogensiloxane / diphenylsiloxane copolymer, trimethylsiloxy group-blocked methylhydrogensiloxane / diphenylsiloxane / dimethylsiloxane copolymer, both-end trimethyl Siloxy group-blocked methylhydrogensiloxane / methylphenylsiloxane / dimethylsiloxane copolymer, both ends dimethylhydrogensiloxy group-blocked methylhydrogensiloxane / dimethylsiloxane / diphenylsiloxane copolymer, both ends dimethylhydrogensiloxy group-blocked methylhydro Gensiloxane / dimethylsiloxane / methylphenylsiloxane copolymer, (CH 3 ) 2 HSiO 1/2 unit and (CH 3 ) 3 SiO 1/2 Copolymer consisting of units and SiO 4/2 units, copolymer consisting of (CH 3 ) 2 HSiO 1/2 units and SiO 4/2 units, (CH 3 ) 2 HSiO 1/2 units and SiO 4 / 2 units and a copolymer composed of (C 6 H 5 ) 3 SiO 1/2 units, and the following general formulas (9) and (10):
R 6 3 SiO (R 6 HSiO) t SiR 6 3 (9)
Annular (R 6 HSiO) u (10)
(Wherein R 6 is as described above, t is an integer of 2 to 30, preferably 2 to 25, and u is an integer of 4 to 8)
Represented by the following general formula:
で表されるもの等が例示される。
What is represented by etc. is illustrated.
(C)成分の具体例としては、下記一般式(11):
Me3SiO(MeHSiO)tSiMe3…(11)
(式中、tは前記の通りである。)
で表されるもの、下記構造式:
Specific examples of the component (C) include the following general formula (11):
Me 3 SiO (MeHSiO) t SiMe 3 (11)
(Wherein t is as described above.)
Represented by the following structural formula:
(C)成分は、一種単独で用いても二種以上を併用してもよい。
(C) A component may be used individually by 1 type, or may use 2 or more types together.
(C)成分の配合量は、(A)成分及び(B)成分中の全ケイ素原子に結合したアルケニル基に対して(C)成分中のケイ素原子に結合した水素原子が0.5〜5.0倍モルとなる量であることが必要であり、好ましくは0.7〜3.0倍モルとなる量である。かかる配合量が0.5〜5.0倍モルとなる量を満たさない場合には、架橋のバランスが不適切なものとなる。 Component (C) is blended in an amount of 0.5 to 5 hydrogen atoms bonded to silicon atoms in component (C) relative to alkenyl groups bonded to all silicon atoms in components (A) and (B). It is necessary that the amount be 0.0 mol, and preferably 0.7 to 3.0 mol. When the blending amount does not satisfy the amount of 0.5 to 5.0 moles, the balance of crosslinking becomes inappropriate.
<(D)成分>
(D)成分である白金族金属系触媒は、前記(A)〜(C)成分のヒドロシリル化反応を進行及び促進させるための成分である。白金族金属系触媒は、特に限定されず、例えば、白金、パラジウム、ロジウム等の白金族金属;塩化白金酸、アルコール変性塩化白金酸、塩化白金酸とオレフィン類、ビニルシロキサン又はアセチレン化合物との配位化合物等の白金化合物、テトラキス(トリフェニルホスフィン)パラジウム、クロロトリス(トリフェニルホスフィン)ロジウム等の白金族金属化合物等が挙げられるが、(A)〜(C)成分との相溶性が良好であり、クロル不純物をほとんど含有しないので、好ましくは塩化白金酸をシリコーン変性したものである。
(D)成分は、一種単独で用いても二種以上を併用してもよい。
<(D) component>
The platinum group metal catalyst as component (D) is a component for proceeding and promoting the hydrosilylation reaction of the components (A) to (C). The platinum group metal catalyst is not particularly limited, and examples thereof include platinum group metals such as platinum, palladium, rhodium; chloroplatinic acid, alcohol-modified chloroplatinic acid, chloroplatinic acid and olefins, vinyl siloxane, or acetylene compounds. Examples include platinum compounds such as coordination compounds, platinum group metal compounds such as tetrakis (triphenylphosphine) palladium, chlorotris (triphenylphosphine) rhodium, etc., and good compatibility with the components (A) to (C). Since chloro impurities are hardly contained, chloroplatinic acid is preferably silicone-modified.
(D) A component may be used individually by 1 type, or may use 2 or more types together.
(D)成分の配合量は、触媒としての有効量であればよいが、通常、(A)〜(C)成分の合計に対して、白金族金属元素の質量換算で1〜500ppm、好ましくは3〜100ppm、特に好ましくは5〜40ppmである。この配合量を適切なものとすると、ヒドロシリル化反応をより効果的に促進させることができる。 (D) The compounding quantity of a component should just be an effective amount as a catalyst, However, Usually, it is 1-500 ppm in conversion of the mass of a platinum group metal element with respect to the sum total of (A)-(C) component, Preferably 3 to 100 ppm, particularly preferably 5 to 40 ppm. If this blending amount is appropriate, the hydrosilylation reaction can be promoted more effectively.
<(E)成分>
(E)成分である煙霧質シリカは、組成物にチクソ性を付与し、作業性を向上させるとともに、フィレットを形成させ、ダイシェア強度を向上させるための成分である。ダイボンディングに使用するために組成物は薄膜化される必要があり、粒子径の小さい煙霧質シリカが好ましい。
<(E) component>
The fumed silica as component (E) is a component for imparting thixotropy to the composition and improving workability, forming fillets, and improving die shear strength. The composition must be thinned for use in die bonding, and fumed silica with a small particle size is preferred.
煙霧質シリカのBET法による比表面積は、50〜500m2/g、特に100〜400m2/gであることが好ましい。 The specific surface area of the fumed silica by the BET method is preferably 50 to 500 m 2 / g, particularly preferably 100 to 400 m 2 / g.
煙霧質シリカは、組成物中への分散性を上げるため、シラン類、シラザン類あるいはシロキサン類で表面処理されたものが好ましい。 The fumed silica is preferably surface-treated with silanes, silazanes or siloxanes in order to increase dispersibility in the composition.
(E)成分の配合量は、通常、(A)〜(C)成分の合計100質量部に対して1〜20質量部、好ましくは3〜10質量部である。この配合量が少なすぎると、チクソ性付与の効果が乏しく、多すぎると、作業性の悪化及びダイシェア強度の低下を引き起こす。 (E) The compounding quantity of a component is 1-20 mass parts normally with respect to a total of 100 mass parts of (A)-(C) component, Preferably it is 3-10 mass parts. When the blending amount is too small, the effect of imparting thixotropy is poor, and when it is too large, workability is deteriorated and the die shear strength is reduced.
<その他の成分>
本発明の組成物は、上記(A)〜(E)成分以外にも、本発明の目的を損なわない限り、以下に例示するその他の成分を配合してもよい。
<Other ingredients>
The composition of this invention may mix | blend the other component illustrated below other than the said (A)-(E) component, unless the objective of this invention is impaired.
その他の成分としては、例えば、結晶性シリカ等の光散乱剤あるいは補強材;蛍光体;石油系溶剤、反応性官能基を有しない非反応性シリコーンオイル等の粘度調整剤;カーボンファクンショナルシラン、エポキシ基、アルコキシ基、ケイ素原子に結合した水素原子(即ち、SiH基)及びケイ素原子に結合したビニル基等のアルケニル基の少なくとも一種を有する(A)〜(C)成分以外のシリコーン化合物等の接着性向上剤;銀、金等の金属粉等の導電性付与剤;着色のための顔料及び染料;テトラメチルテトラビニルテトラシクロシロキサン等の反応抑制剤等が挙げられる。
これらのその他の成分は、一種単独で用いても二種以上を併用してもよい。
Other components include, for example, light scattering agents or reinforcing materials such as crystalline silica; phosphors; petroleum solvents, viscosity modifiers such as non-reactive silicone oils that do not have reactive functional groups; carbon functional silanes Silicone compounds other than components (A) to (C) having at least one of alkenyl groups such as epoxy groups, alkoxy groups, hydrogen atoms bonded to silicon atoms (ie, SiH groups) and vinyl groups bonded to silicon atoms, etc. Adhesion improvers; conductivity imparting agents such as metal powders such as silver and gold; pigments and dyes for coloring; reaction inhibitors such as tetramethyltetravinyltetracyclosiloxane;
These other components may be used alone or in combination of two or more.
<組成物について>
本発明の組成物中の(A)〜(C)成分において、脂肪族不飽和結合以外のケイ素原子に結合した全1価炭化水素基の80モル%以上(80〜100モル%)、特に90モル%以上(90〜100モル%)がメチル基であることが、耐熱性、耐光性(耐紫外線性)に優れるため、熱的及び紫外線等のストレスによる変色を含んだ劣化に対する耐性に優れるために好ましい。
<About the composition>
In the components (A) to (C) in the composition of the present invention, 80 mol% or more (80 to 100 mol%) of all monovalent hydrocarbon groups bonded to silicon atoms other than aliphatic unsaturated bonds, particularly 90 It is excellent in heat resistance and light resistance (ultraviolet light resistance), and in resistance to deterioration including discoloration due to stress such as heat and ultraviolet rays, when the mol% or more (90 to 100 mol%) is a methyl group. Is preferable.
・調製方法
本発明の組成物は、(A)〜(E)成分及び場合によってはその他の成分を混合して調製することができるが、例えば、十分な保存安定性を確保するため(C)成分を含有するパートと(D)成分を含有するパートとを別個に調製しておき、使用時にそれら2パートを混合して使用することもできる。
-Preparation method The composition of the present invention can be prepared by mixing the components (A) to (E) and optionally other components. For example, in order to ensure sufficient storage stability (C) The part containing the component and the part containing the component (D) can be prepared separately, and these two parts can be mixed and used at the time of use.
・硬化条件
組成物の硬化は、公知の条件で行えばよく、例えば、60〜180℃で10分〜5時間加熱することにより行うことができる。また、組成物を硬化させて得られる硬化物のショアD硬度は30以上、とりわけ50〜90であることが好ましい。
Curing conditions The composition may be cured under known conditions, for example, by heating at 60 to 180 ° C. for 10 minutes to 5 hours. Moreover, it is preferable that the Shore D hardness of the hardened | cured material obtained by hardening a composition is 30 or more, especially 50-90.
・用途
本発明の組成物は、特にLED素子等のダイボンディングに用いられるダイボンド材として有用である。
Application The composition of the present invention is particularly useful as a die bond material used for die bonding of LED elements and the like.
<ダイボンディング方法>
本発明の組成物を用いてLED素子をダイボンディングする方法の一例としては、本発明の組成物をシリンジに充填し、ディスペンサを用いてパッケージ等の基体上に乾燥状態で例えば5〜100μmの厚さとなるように塗布した後、塗布した組成物上にLED素子を配し、該組成物を硬化させることにより、LED素子を基体上にダイボンディングする方法が挙げられる。組成物の硬化条件は、上述の通りとすればよい。
<Die bonding method>
As an example of a method for die-bonding an LED element using the composition of the present invention, a syringe is filled with the composition of the present invention, and a thickness of, for example, 5 to 100 μm is dried on a substrate such as a package using a dispenser. After the application, the LED element is placed on the applied composition, and the composition is cured, whereby the LED element is die-bonded on the substrate. The curing conditions for the composition may be as described above.
以下、調製例、実施例及び比較例を用いて本発明を具体的に説明するが、これらの実施例は本発明を何ら制限するものではない。なお、下記の例において、シリコーンオイル又はシリコーンレジンの平均組成を示す記号は以下の通りの単位を示す。また、各シリコーンオイル又は各シリコーンレジンのモル数は、各成分中に含有されるビニル基又はSiH基のモル数を示すものである。
MH:(CH3)2HSiO1/2
M:(CH3)3SiO1/2
MVi:(CH2=CH)(CH3)2SiO1/2
DH:(CH3)HSiO2/2
D:(CH3)2SiO2/2
DVi:(CH2=CH)(CH3)SiO2/2
Q:SiO4/2
EXAMPLES Hereinafter, although this invention is demonstrated concretely using a preparation example, an Example, and a comparative example, these Examples do not restrict | limit this invention at all. In addition, in the following example, the symbol which shows the average composition of a silicone oil or a silicone resin shows the following units. The number of moles of each silicone oil or each silicone resin indicates the number of moles of vinyl groups or SiH groups contained in each component.
M H : (CH 3 ) 2 HSiO 1/2
M: (CH 3 ) 3 SiO 1/2
M Vi : (CH 2 ═CH) (CH 3 ) 2 SiO 1/2
D H : (CH 3 ) HSiO 2/2
D: (CH 3 ) 2 SiO 2/2
D Vi : (CH 2 ═CH) (CH 3 ) SiO 2/2
Q: SiO 4/2
[調製例1]白金触媒の調製
本実施例に使用した白金触媒は、六塩化白金酸とsym−テトラメチルジビニルジシロキサンとの反応生成物であり、この反応生成物を白金含量が1.0質量%となるように粘度0.6Pa・sの液体ジメチルビニルシロキシ末端ポリジメチルシロキサンで希釈したもの(触媒A)である。
[Preparation Example 1] Preparation of platinum catalyst The platinum catalyst used in this example is a reaction product of hexachloroplatinic acid and sym-tetramethyldivinyldisiloxane, and this reaction product has a platinum content of 1.0. This is a catalyst diluted with liquid dimethylvinylsiloxy-terminated polydimethylsiloxane having a viscosity of 0.6 Pa · s so as to have a mass% (catalyst A).
本実施例中の(E)成分は、平均粒子径10nm、比表面積300m2/gであり、表面をジメチルシロキシ単位で処理した煙霧質シリカ(シリカB)を使用した。 The component (E) in the present example used fumed silica (silica B) having an average particle diameter of 10 nm and a specific surface area of 300 m 2 / g, and the surface treated with dimethylsiloxy units.
<実施例1>
M単位とMVi単位とQ単位とから構成され、MVi単位に対するM単位のモル比が6.25であり、Q単位に対するM単位とMVi単位との合計のモル比が0.8であるシリコーンレジン80g(65.6ミリモル)のトルエン溶液と、粘度が6,000mPa・sで平均組成式:M2D416DVi 22のシリコーンオイル20g(13.2ミリモル、DVi/D=0.05)、及び平均構造式:M2DH 8で表されるメチルハイドロジェンシロキサン11g(16.0ミリモル)とを混合した。得られた液状混合物を120℃で10mmHg以下の減圧下でトルエンを除去することにより、室温で粘ちょうな液体を得た。
<Example 1>
Is composed of a M units and M Vi units and Q units, is 6.25 molar ratio of M units to M Vi units, in a molar ratio of the sum of M units and M Vi units to Q units is 0.8 80 g (65.6 mmol) of a silicone resin and 20 g (13.2 mmol, D Vi / D = 0) of silicone oil having a viscosity of 6,000 mPa · s and an average composition of M 2 D 416 D Vi 22 .05), and 11 g (16.0 mmol) of methylhydrogensiloxane represented by the average structural formula: M 2 DH 8 . By removing toluene from the obtained liquid mixture at 120 ° C. under reduced pressure of 10 mmHg or less, a viscous liquid was obtained at room temperature.
この粘ちょうな液体100gに対して、反応制御剤としてエチニルシクロヘキサノール0.1g、テトラメチルテトラビニルテトラシクロシロキサン3g(34.8ミリモル)、触媒A0.30g、及び下記構造式(12):
<実施例2>
M単位とMVi単位とQ単位とから構成され、MVi単位に対するM単位のモル比が6.25であり、Q単位に対するM単位とMVi単位との合計のモル比が0.8であるシリコーンレジン80g(65.6ミリモル)のトルエン溶液と、粘度が700mPa・sで平均組成式:M2D178DVi 20のシリコーンオイル20g(26.0ミリモル、DVi/D=0.11)、及び平均構造式:M2DH 8で表されるメチルハイドロジェンシロキサン13g(18.9ミリモル)とを混合した。得られた液状混合物を120℃で10mmHg以下の減圧下でトルエンを除去することにより、室温で粘ちょうな液体を得た。
この粘ちょうな液体100gに対して、反応制御剤としてエチニルシクロヘキサノール0.1g、テトラメチルテトラビニルテトラシクロシロキサン3g(34.8ミリモル)、触媒A0.30g、及び上記構造式(12)で示されるエポキシ基含有シロキサン化合物5g(42.5ミリモル)を混合し、透明の液状混合物を得た。更に、この混合物100質量部に対し、シリカBを5質量部混合し、ダイボンディング用組成物を得た。この組成物を用いて、1mm×1mm、厚み0.35mmのシリコンチップを銀めっき上にダイボンディングした。加熱硬化条件は100℃,1時間+150℃,5時間とした。これを用いてダイシェア強度を実施例1と同様に測定した。更に、同様の硬化条件で厚さ2mmの板状成型物を作製し、硬度を実施例1と同様に測定した。このときのダイシェア強度と硬度を表1に示す。
<Example 2>
Is composed of a M units and M Vi units and Q units, is 6.25 molar ratio of M units to M Vi units, in a molar ratio of the sum of M units and M Vi units to Q units is 0.8 80 g (65.6 mmol) of a silicone resin in toluene solution and 20 g (26.0 mmol, D Vi /D=0.11) of silicone oil having a viscosity of 700 mPa · s and an average composition formula: M 2 D 178 D Vi 20 ), And 13 g (18.9 mmol) of methylhydrogensiloxane represented by the average structural formula: M 2 DH 8 . By removing toluene from the obtained liquid mixture at 120 ° C. under reduced pressure of 10 mmHg or less, a viscous liquid was obtained at room temperature.
With respect to 100 g of this viscous liquid, 0.1 g of ethynylcyclohexanol, 3 g (34.8 mmol) of tetramethyltetravinyltetracyclosiloxane, 0.30 g of catalyst A, and the above structural formula (12) are used as reaction control agents. 5 g (42.5 mmol) of an epoxy group-containing siloxane compound was mixed to obtain a transparent liquid mixture. Furthermore, 5 parts by mass of silica B was mixed with 100 parts by mass of this mixture to obtain a composition for die bonding. Using this composition, a silicon chip having a size of 1 mm × 1 mm and a thickness of 0.35 mm was die-bonded on the silver plating. The heat curing conditions were 100 ° C., 1 hour + 150 ° C., 5 hours. Using this, the die shear strength was measured in the same manner as in Example 1. Further, a plate-like molded product having a thickness of 2 mm was produced under the same curing conditions, and the hardness was measured in the same manner as in Example 1. Table 1 shows the die shear strength and hardness at this time.
<比較例1>
M単位とMVi単位とQ単位とから構成され、MVi単位に対するM単位のモル比が6.25であり、Q単位に対するM単位とMVi単位との合計のモル比が0.8であるシリコーンレジン80g(65.6ミリモル)のトルエン溶液と、粘度が100mPa・sで平均組成式:M2D20DVi 20のシリコーンオイル20g(118.8ミリモル、DVi/D=1.0)、及び平均構造式:M2DH 8で表されるメチルハイドロジェンシロキサン24g(348.0ミリモル)とを混合した。得られた液状混合物を120℃で10mmHg以下の減圧下でトルエンを除去することにより、室温で粘ちょうな液体を得た。
この粘ちょうな液体100gに対して、反応制御剤としてエチニルシクロヘキサノール0.1g、テトラメチルテトラビニルテトラシクロシロキサン3g(34.8ミリモル)、触媒A0.30g、及び上記構造式(12)で示されるエポキシ基含有シロキサン化合物5g(42.5ミリモル)を混合し、透明の液状混合物を得た。更に、この混合物100質量部に対し、シリカBを5質量部混合し、ダイボンディング用組成物を得た。この組成物を用いて、1mm×1mm、厚み0.35mmのシリコンチップを銀めっき上にダイボンディングした。加熱硬化条件は100℃,1時間+150℃,5時間とした。これを用いてダイシェア強度を実施例1と同様に測定した。更に、同様の硬化条件で厚さ2mmの板状成型物を作製し、硬度を実施例1と同様に測定した。このときのダイシェア強度と硬度を表1に示す。
<Comparative Example 1>
Is composed of a M units and M Vi units and Q units, is 6.25 molar ratio of M units to M Vi units, in a molar ratio of the sum of M units and M Vi units to Q units is 0.8 80 g (65.6 mmol) of a silicone resin and 20 g (118.8 mmol, D Vi /D=1.0) of a silicone oil having a viscosity of 100 mPa · s and an average composition formula of M 2 D 20 D Vi 20 And 24 g (348.0 mmol) of methylhydrogensiloxane represented by the average structural formula: M 2 DH 8 . By removing toluene from the obtained liquid mixture at 120 ° C. under reduced pressure of 10 mmHg or less, a viscous liquid was obtained at room temperature.
With respect to 100 g of this viscous liquid, 0.1 g of ethynylcyclohexanol, 3 g (34.8 mmol) of tetramethyltetravinyltetracyclosiloxane, 0.30 g of catalyst A, and the above structural formula (12) are used as reaction control agents. 5 g (42.5 mmol) of an epoxy group-containing siloxane compound was mixed to obtain a transparent liquid mixture. Furthermore, 5 parts by mass of silica B was mixed with 100 parts by mass of this mixture to obtain a composition for die bonding. Using this composition, a silicon chip having a size of 1 mm × 1 mm and a thickness of 0.35 mm was die-bonded on the silver plating. The heat curing conditions were 100 ° C., 1 hour + 150 ° C., 5 hours. Using this, the die shear strength was measured in the same manner as in Example 1. Further, a plate-like molded product having a thickness of 2 mm was produced under the same curing conditions, and the hardness was measured in the same manner as in Example 1. Table 1 shows the die shear strength and hardness at this time.
<比較例2>
M単位とMVi単位とQ単位とから構成され、Q単位に対するM単位とMVi単位との合計のモル比が0.8であるシリコーンレジン80g(65.6ミリモル)のトルエン溶液と、粘度が60mPa・sで平均組成式:MVi 2D50のシリコーンオイル20g(12.6ミリモル、DVi/D=0)、及び平均構造式:M2DH 8で表されるメチルハイドロジェンシロキサン11g(16.0ミリモル)とを混合した。得られた液状混合物を120℃で10mmHg以下の減圧下でトルエンを除去することにより、室温で粘ちょうな液体を得た。
この粘ちょうな液体100gに対して、反応制御剤としてエチニルシクロヘキサノール0.1g、テトラメチルテトラビニルテトラシクロシロキサン3g(34.8ミリモル)、触媒A0.30g、及び上記構造式(12)で示されるエポキシ基含有シロキサン化合物5g(42.5ミリモル)を混合し、透明の液状混合物を得た。更に、この混合物100質量部に対し、シリカBを5質量部混合し、ダイボンディング用組成物を得た。この組成物を用いて、1mm×1mm、厚み0.35mmのシリコンチップを銀めっき上にダイボンディングした。加熱硬化条件は100℃,1時間+150℃,5時間とした。これを用いてダイシェア強度を実施例1と同様に測定した。更に、同様の硬化条件で厚さ2mmの板状成型物を作製し、硬度を実施例1と同様に測定した。このときのダイシェア強度と硬度を表1に示す。
<Comparative example 2>
80 g (65.6 mmol) of a toluene solution of a silicone resin composed of M units, M Vi units, and Q units, and having a total molar ratio of M units and M Vi units to Q units of 0.8; 20 g (12.6 mmol, D Vi / D = 0) of silicone oil having an average composition formula of M Vi 2 D 50 and methyl structure siloxane represented by M 2 DH 8 11 g (16.0 mmol) were mixed. By removing toluene from the obtained liquid mixture at 120 ° C. under reduced pressure of 10 mmHg or less, a viscous liquid was obtained at room temperature.
With respect to 100 g of this viscous liquid, 0.1 g of ethynylcyclohexanol, 3 g (34.8 mmol) of tetramethyltetravinyltetracyclosiloxane, 0.30 g of catalyst A, and the above structural formula (12) are used as reaction control agents. 5 g (42.5 mmol) of an epoxy group-containing siloxane compound was mixed to obtain a transparent liquid mixture. Furthermore, 5 parts by mass of silica B was mixed with 100 parts by mass of this mixture to obtain a composition for die bonding. Using this composition, a silicon chip having a size of 1 mm × 1 mm and a thickness of 0.35 mm was die-bonded on the silver plating. The heat curing conditions were 100 ° C., 1 hour + 150 ° C., 5 hours. Using this, the die shear strength was measured in the same manner as in Example 1. Further, a plate-like molded product having a thickness of 2 mm was produced under the same curing conditions, and the hardness was measured in the same manner as in Example 1. Table 1 shows the die shear strength and hardness at this time.
*2 加熱後シリコーン硬化物にクラックが発生
Claims (3)
(R3 3SiO1/2)2(R1R2SiO)x(R2 2SiO)y…(1)
(式中、R1は独立にアルケニル基を表し、R2は独立に脂肪族不飽和結合を含まない1価炭化水素基を表し、全R2の少なくとも80モル%はメチル基であり、R3はR1又はR2である。xは1以上の整数、yは3以上の整数で、0.01≦x/y≦0.30を満たす数である。)
で表される直鎖状オルガノポリシロキサン:40〜10質量部、
(B)下記平均組成式(2):
(R5 3SiO1/2)k(R4R5 2SiO1/2)m(R4R5SiO)n(R5 2SiO)p
(R4SiO3/2)q(R5SiO3/2)r(SiO2)s…(2)
(式中、R4は独立にアルケニル基を表し、R5は独立に脂肪族不飽和結合を含まない1価炭化水素基を表し、全R5の少なくとも80モル%はメチル基であり、1>k≧0、1>m≧0、1>n≧0、1>p≧0、1>q≧0、1>r≧0及び1>s≧0、並びにm+n+q>0、q+r+s>0であり、かつk+m+n+p+q+r+s=1を満たす数である。)
で表され、23℃で蝋状又は固体の三次元網状オルガノポリシロキサン樹脂:60〜90質量部、(但し、(A)成分と(B)成分との合計は100質量部である。)
(C)下記平均組成式(3):
R6 aHbSiO(4-a-b)/2…(3)
(式中、R6は独立に脂肪族不飽和結合を含まない非置換又は置換の1価炭化水素基を表し、但し、全R6の少なくとも50モル%はメチル基であり、aは0.7≦a≦2.1、bは0.001≦b≦1.0を満たす数であり、但し、a+bは0.8≦a+b≦3.0を満たす数である。)
で表され、ケイ素原子に結合した水素原子を1分子中に少なくとも2個有するオルガノハイドロジェンポリシロキサン:(A)成分及び(B)成分中の全ケイ素原子結合アルケニル基に対して(C)成分中のケイ素原子に結合した水素原子が0.5〜5.0倍モルとなる量、
(D)白金族金属系触媒:有効量、及び
(E)煙霧質シリカ:(A)〜(C)成分の合計100質量部に対して1〜20質量部
を含有するダイボンディング用シリコーン樹脂組成物。 (A) The following average composition formula (1):
(R 3 3 SiO 1/2 ) 2 (R 1 R 2 SiO) x (R 2 2 SiO) y (1)
(Wherein R 1 independently represents an alkenyl group, R 2 independently represents a monovalent hydrocarbon group containing no aliphatic unsaturated bond, and at least 80 mol% of all R 2 is a methyl group; 3 is R 1 or R 2. x is an integer of 1 or more, y is an integer of 3 or more, and is a number satisfying 0.01 ≦ x / y ≦ 0.30.
Linear organopolysiloxane represented by: 40 to 10 parts by mass,
(B) The following average composition formula (2):
(R 5 3 SiO 1/2 ) k (R 4 R 5 2 SiO 1/2 ) m (R 4 R 5 SiO) n (R 5 2 SiO) p
(R 4 SiO 3/2 ) q (R 5 SiO 3/2 ) r (SiO 2 ) s (2)
(In the formula, R 4 independently represents an alkenyl group, R 5 independently represents a monovalent hydrocarbon group containing no aliphatic unsaturated bond, and at least 80 mol% of all R 5 is a methyl group; > K ≧ 0, 1> m ≧ 0, 1> n ≧ 0, 1> p ≧ 0, 1> q ≧ 0, 1> r ≧ 0 and 1> s ≧ 0, and m + n + q> 0, q + r + s> 0. And a number satisfying k + m + n + p + q + r + s = 1.)
And a waxy or solid three-dimensional network organopolysiloxane resin at 23 ° C .: 60 to 90 parts by mass (provided that the total of component (A) and component (B) is 100 parts by mass).
(C) The following average composition formula (3):
R 6 a H b SiO (4-ab) / 2 (3)
(In the formula, R 6 independently represents an unsubstituted or substituted monovalent hydrocarbon group that does not contain an aliphatic unsaturated bond, provided that at least 50 mol% of all R 6 is a methyl group; (7 ≦ a ≦ 2.1, b is a number satisfying 0.001 ≦ b ≦ 1.0, where a + b is a number satisfying 0.8 ≦ a + b ≦ 3.0.)
And an organohydrogenpolysiloxane having at least two hydrogen atoms bonded to a silicon atom in one molecule: (C) component with respect to all silicon atom-bonded alkenyl groups in component (A) and component (B) An amount in which hydrogen atoms bonded to silicon atoms are 0.5 to 5.0 times mol,
(D) Platinum group metal catalyst: effective amount, and (E) fumed silica: silicone resin composition for die bonding containing 1 to 20 parts by mass with respect to 100 parts by mass in total of components (A) to (C). object.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009141877A JP2010285571A (en) | 2009-06-15 | 2009-06-15 | Silicone resin composition for die bonding |
TW99119283A TW201120146A (en) | 2009-06-15 | 2010-06-14 | Silicone resin composition for die bonding |
KR1020100055899A KR20100134516A (en) | 2009-06-15 | 2010-06-14 | Silicone resin composition for die bonding |
CN2010102072326A CN101921488A (en) | 2009-06-15 | 2010-06-17 | Silicone resin composite for die bonding |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009141877A JP2010285571A (en) | 2009-06-15 | 2009-06-15 | Silicone resin composition for die bonding |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2010285571A true JP2010285571A (en) | 2010-12-24 |
Family
ID=43336715
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009141877A Pending JP2010285571A (en) | 2009-06-15 | 2009-06-15 | Silicone resin composition for die bonding |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2010285571A (en) |
KR (1) | KR20100134516A (en) |
CN (1) | CN101921488A (en) |
TW (1) | TW201120146A (en) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012144616A (en) * | 2011-01-11 | 2012-08-02 | Shin-Etsu Chemical Co Ltd | Temporary adhesive composition, and method for manufacturing thin wafer |
JP2012209280A (en) * | 2011-03-29 | 2012-10-25 | Toshiba Lighting & Technology Corp | Light-emitting device and illumination device |
JP2012222202A (en) * | 2011-04-11 | 2012-11-12 | Sekisui Chem Co Ltd | Die-bonding material for optical semiconductor device, and optical semiconductor device using the same |
JP2013089802A (en) * | 2011-10-19 | 2013-05-13 | Sekisui Chem Co Ltd | Die bond material for optical semiconductor devices and optical semiconductor device using the same |
JP2013129792A (en) * | 2011-12-22 | 2013-07-04 | Shin-Etsu Chemical Co Ltd | Curable silicone resin composition with high reliability and optical semiconductor device using the same |
KR20140134611A (en) * | 2013-05-14 | 2014-11-24 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Curable resin composition, cured product thereof and optical semiconductor device |
WO2015143591A1 (en) * | 2014-03-26 | 2015-10-01 | 苏州桐力光电技术服务有限公司 | Transparent organic silicone gel binder |
JP2017218474A (en) * | 2016-06-03 | 2017-12-14 | 信越化学工業株式会社 | Addition-curable silicone resin composition and die attach material for optical semiconductor device |
KR20200049595A (en) | 2018-10-30 | 2020-05-08 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Addition-curable silicone resin composition, cured product thereof, and optical semiconductor device |
KR20200050875A (en) | 2018-11-02 | 2020-05-12 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Addition-curable silicone resin composition, cured product thereof, and optical semiconductor device |
KR20200134162A (en) | 2019-05-21 | 2020-12-01 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Silicone composition for die-bonding, cured product thereof, and optical semiconductor device |
KR20210125426A (en) | 2020-04-08 | 2021-10-18 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Silicone composition for die-bonding, cured product thereof, and optical semiconductor device |
WO2024135806A1 (en) * | 2022-12-23 | 2024-06-27 | ダウ・東レ株式会社 | Hot melt curable silicone composition, layered product using said composition, and method for producing semiconductor device |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5912600B2 (en) * | 2011-09-16 | 2016-04-27 | 東レ・ダウコーニング株式会社 | Curable silicone composition, cured product thereof, and optical semiconductor device |
CN103797073B (en) * | 2011-09-29 | 2016-07-06 | 道康宁东丽株式会社 | Curable organosilicon composition and cured product thereof |
WO2014084624A1 (en) * | 2012-11-30 | 2014-06-05 | 코오롱생명과학 주식회사 | Curable transparent silicon composition for optical device |
CN104745142A (en) * | 2013-12-27 | 2015-07-01 | 蓝星有机硅(上海)有限公司 | Curable silicon rubber composition used for LED package |
CN105802489B (en) * | 2014-12-29 | 2018-06-12 | 广州慧谷化学有限公司 | The breakage-proof glue composition of glass and glassware and application |
TWI762649B (en) * | 2017-06-26 | 2022-05-01 | 日商杜邦東麗特殊材料股份有限公司 | Curable silicon composition for die bonding |
JP6823578B2 (en) * | 2017-11-02 | 2021-02-03 | 信越化学工業株式会社 | Additive-curable silicone composition, cured product, optical element |
JP2020125430A (en) * | 2019-02-06 | 2020-08-20 | 信越化学工業株式会社 | Organic modified silicone resin composition for die bonding, and cured product thereof and optical semiconductor element |
JP7003075B2 (en) * | 2019-02-15 | 2022-01-20 | 信越化学工業株式会社 | Wafer-level optical semiconductor device resin composition and wafer-level optical semiconductor device using the composition |
JP2020132739A (en) * | 2019-02-18 | 2020-08-31 | 信越化学工業株式会社 | Silicone resin composition for die bonding, cured product and light emitting diode element |
JP2020132743A (en) * | 2019-02-18 | 2020-08-31 | 信越化学工業株式会社 | Die-bonding silicone resin composition, cured product, light-emitting diode element, and method for producing said composition |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5434362A (en) * | 1977-08-24 | 1979-03-13 | Shin Etsu Chem Co Ltd | Curable organopolysiloxane composition |
JPS6372775A (en) * | 1986-09-16 | 1988-04-02 | Toshiba Silicone Co Ltd | Bonding composition |
JP2000038560A (en) * | 1998-07-22 | 2000-02-08 | Konishi Co Ltd | Moisture-curing adhesive composition excellent in transparency |
JP2001164231A (en) * | 1999-12-07 | 2001-06-19 | Shigeru Koshibe | High-purity adhesive for semiconductor |
JP2006342200A (en) * | 2005-06-07 | 2006-12-21 | Shin Etsu Chem Co Ltd | Silicone resin composition for die bonding |
JP2008156578A (en) * | 2006-12-26 | 2008-07-10 | Momentive Performance Materials Japan Kk | Addition reaction curable silicone composition and semiconductor device |
JP2008156441A (en) * | 2006-12-22 | 2008-07-10 | Momentive Performance Materials Japan Kk | Adhesive polyorganosiloxane composition |
JP2009114365A (en) * | 2007-11-08 | 2009-05-28 | Momentive Performance Materials Japan Kk | Silicone adhesive composition for optical semiconductor and optical semiconductor device using the same |
JP2010070599A (en) * | 2008-09-17 | 2010-04-02 | Dow Corning Toray Co Ltd | Liquid die bonding agent |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6124407A (en) * | 1998-10-28 | 2000-09-26 | Dow Corning Corporation | Silicone composition, method for the preparation thereof, and silicone elastomer |
JP4933179B2 (en) * | 2006-07-14 | 2012-05-16 | 信越化学工業株式会社 | Curable silicone rubber composition and cured product thereof |
-
2009
- 2009-06-15 JP JP2009141877A patent/JP2010285571A/en active Pending
-
2010
- 2010-06-14 TW TW99119283A patent/TW201120146A/en unknown
- 2010-06-14 KR KR1020100055899A patent/KR20100134516A/en not_active Withdrawn
- 2010-06-17 CN CN2010102072326A patent/CN101921488A/en active Pending
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5434362A (en) * | 1977-08-24 | 1979-03-13 | Shin Etsu Chem Co Ltd | Curable organopolysiloxane composition |
JPS6372775A (en) * | 1986-09-16 | 1988-04-02 | Toshiba Silicone Co Ltd | Bonding composition |
JP2000038560A (en) * | 1998-07-22 | 2000-02-08 | Konishi Co Ltd | Moisture-curing adhesive composition excellent in transparency |
JP2001164231A (en) * | 1999-12-07 | 2001-06-19 | Shigeru Koshibe | High-purity adhesive for semiconductor |
JP2006342200A (en) * | 2005-06-07 | 2006-12-21 | Shin Etsu Chem Co Ltd | Silicone resin composition for die bonding |
JP2008156441A (en) * | 2006-12-22 | 2008-07-10 | Momentive Performance Materials Japan Kk | Adhesive polyorganosiloxane composition |
JP2008156578A (en) * | 2006-12-26 | 2008-07-10 | Momentive Performance Materials Japan Kk | Addition reaction curable silicone composition and semiconductor device |
JP2009114365A (en) * | 2007-11-08 | 2009-05-28 | Momentive Performance Materials Japan Kk | Silicone adhesive composition for optical semiconductor and optical semiconductor device using the same |
JP2010070599A (en) * | 2008-09-17 | 2010-04-02 | Dow Corning Toray Co Ltd | Liquid die bonding agent |
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012144616A (en) * | 2011-01-11 | 2012-08-02 | Shin-Etsu Chemical Co Ltd | Temporary adhesive composition, and method for manufacturing thin wafer |
JP2012209280A (en) * | 2011-03-29 | 2012-10-25 | Toshiba Lighting & Technology Corp | Light-emitting device and illumination device |
JP2012222202A (en) * | 2011-04-11 | 2012-11-12 | Sekisui Chem Co Ltd | Die-bonding material for optical semiconductor device, and optical semiconductor device using the same |
JP2013089802A (en) * | 2011-10-19 | 2013-05-13 | Sekisui Chem Co Ltd | Die bond material for optical semiconductor devices and optical semiconductor device using the same |
JP2013129792A (en) * | 2011-12-22 | 2013-07-04 | Shin-Etsu Chemical Co Ltd | Curable silicone resin composition with high reliability and optical semiconductor device using the same |
KR102178132B1 (en) * | 2013-05-14 | 2020-11-12 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Curable resin composition, cured product thereof and optical semiconductor device |
JP2014221880A (en) * | 2013-05-14 | 2014-11-27 | 信越化学工業株式会社 | Curable resin composition, cured product of the same and optical semiconductor device |
US9403967B2 (en) | 2013-05-14 | 2016-08-02 | Shin-Etsu Chemical Co., Ltd. | Curable resin composition, cured product thereof and photosemiconductor apparatus |
KR20140134611A (en) * | 2013-05-14 | 2014-11-24 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Curable resin composition, cured product thereof and optical semiconductor device |
WO2015143591A1 (en) * | 2014-03-26 | 2015-10-01 | 苏州桐力光电技术服务有限公司 | Transparent organic silicone gel binder |
US9994745B2 (en) | 2014-03-26 | 2018-06-12 | Suzhou T-Power Optronics Technical Service Co. Ltd | Transparent organosilicon gel adhesive |
JP2017218474A (en) * | 2016-06-03 | 2017-12-14 | 信越化学工業株式会社 | Addition-curable silicone resin composition and die attach material for optical semiconductor device |
KR20200049595A (en) | 2018-10-30 | 2020-05-08 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Addition-curable silicone resin composition, cured product thereof, and optical semiconductor device |
CN111117256A (en) * | 2018-10-30 | 2020-05-08 | 信越化学工业株式会社 | Addition-curable silicone resin composition, cured product thereof, and optical semiconductor device |
CN111138860A (en) * | 2018-11-02 | 2020-05-12 | 信越化学工业株式会社 | Addition-curable silicone resin composition, cured product thereof, and optical semiconductor device |
KR20200050875A (en) | 2018-11-02 | 2020-05-12 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Addition-curable silicone resin composition, cured product thereof, and optical semiconductor device |
CN111138860B (en) * | 2018-11-02 | 2021-12-31 | 信越化学工业株式会社 | Addition-curable silicone resin composition, cured product thereof, and optical semiconductor device |
KR20200134162A (en) | 2019-05-21 | 2020-12-01 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Silicone composition for die-bonding, cured product thereof, and optical semiconductor device |
KR20210125426A (en) | 2020-04-08 | 2021-10-18 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Silicone composition for die-bonding, cured product thereof, and optical semiconductor device |
JP2021167364A (en) * | 2020-04-08 | 2021-10-21 | 信越化学工業株式会社 | Silicone composition for die bonding, cured product of the same, and optical semiconductor device |
JP7282712B2 (en) | 2020-04-08 | 2023-05-29 | 信越化学工業株式会社 | Silicone composition for die bonding, cured product thereof, and optical semiconductor device |
TWI861388B (en) * | 2020-04-08 | 2024-11-11 | 日商信越化學工業股份有限公司 | Polysilicone composition for die bonding, cured product thereof, and optical semiconductor device |
WO2024135806A1 (en) * | 2022-12-23 | 2024-06-27 | ダウ・東レ株式会社 | Hot melt curable silicone composition, layered product using said composition, and method for producing semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
CN101921488A (en) | 2010-12-22 |
TW201120146A (en) | 2011-06-16 |
KR20100134516A (en) | 2010-12-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2010285571A (en) | Silicone resin composition for die bonding | |
JP4648099B2 (en) | Silicone resin composition for die bonding | |
KR102081781B1 (en) | Addition-curable silicone resin composition, method for preparing the composition, and optical semiconductor device | |
JP2009256400A (en) | Silicone adhesive for semiconductor element | |
JP2008019385A (en) | Curable silicone rubber composition and cured product thereof | |
CN103003364A (en) | Curable organopolysiloxane composition and optical semiconductor device | |
KR102769563B1 (en) | Silicone composition for die-bonding, cured product thereof, and optical semiconductor device | |
KR102482134B1 (en) | Addition-curable silicone composition, method for producing the composition, and optical semiconductor device | |
JP2011086844A (en) | Die bonding material for light emitting diode | |
JP2009215420A (en) | Composition giving high-hardness silicone rubber and semiconductor device using the same as sealing agent | |
JP2007258317A (en) | Manufacturing method of semiconductor device | |
JP2010109034A (en) | Silicone resin composition for light-emitting diode element, and light-emitting diode element | |
TW202104377A (en) | Silicone resin composition for die-bonding, cured product and light-emitting diode element | |
JP2020070402A (en) | Addition-curable silicone resin composition, cured product thereof, and optical semiconductor device | |
TWI830872B (en) | Silicone resin compositions, hardened materials and optical semiconductor devices for chip bonding | |
JP2019087588A (en) | Silicone composition for die bonding, cured product thereof, and light emitting diode device | |
TW202104378A (en) | Silicone resin composition for die-bonding cured product light-emitting diode element and method for producing said composition | |
JP7282712B2 (en) | Silicone composition for die bonding, cured product thereof, and optical semiconductor device | |
JP6006554B2 (en) | Addition-curable silicone composition, optical element sealing material comprising the composition, optical element sealed with the optical element sealing material, and method for producing addition-curable silicone composition | |
JP5974977B2 (en) | Heat resistant silicone rubber composition |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110527 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20111007 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111019 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20120229 |