TWI830872B - Silicone resin compositions, hardened materials and optical semiconductor devices for chip bonding - Google Patents
Silicone resin compositions, hardened materials and optical semiconductor devices for chip bonding Download PDFInfo
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- TWI830872B TWI830872B TW109104944A TW109104944A TWI830872B TW I830872 B TWI830872 B TW I830872B TW 109104944 A TW109104944 A TW 109104944A TW 109104944 A TW109104944 A TW 109104944A TW I830872 B TWI830872 B TW I830872B
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- component
- group
- bonded
- silicone resin
- mass
- Prior art date
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- 229920002050 silicone resin Polymers 0.000 title claims abstract description 29
- 239000011342 resin composition Substances 0.000 title claims abstract description 26
- 239000000463 material Substances 0.000 title claims description 33
- 230000003287 optical effect Effects 0.000 title claims description 30
- 239000004065 semiconductor Substances 0.000 title claims description 27
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 56
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 44
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 33
- 150000003961 organosilicon compounds Chemical class 0.000 claims abstract description 10
- 239000003054 catalyst Substances 0.000 claims abstract description 8
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- -1 siloxane unit Chemical group 0.000 claims description 67
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 48
- 229910052710 silicon Inorganic materials 0.000 claims description 27
- 150000002430 hydrocarbons Chemical group 0.000 claims description 18
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 229930195733 hydrocarbon Natural products 0.000 claims description 3
- 239000000203 mixture Substances 0.000 description 55
- 125000004432 carbon atom Chemical group C* 0.000 description 13
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 229910004283 SiO 4 Inorganic materials 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- 229920001577 copolymer Polymers 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 8
- 229910052697 platinum Inorganic materials 0.000 description 8
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 8
- 238000002834 transmittance Methods 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 239000002683 reaction inhibitor Substances 0.000 description 7
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 125000005388 dimethylhydrogensiloxy group Chemical group 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 239000000945 filler Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical group FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 4
- 125000005370 alkoxysilyl group Chemical group 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 229940098779 methanesulfonic acid Drugs 0.000 description 4
- 238000006386 neutralization reaction Methods 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 150000001451 organic peroxides Chemical class 0.000 description 3
- 125000005375 organosiloxane group Chemical group 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 150000003377 silicon compounds Chemical class 0.000 description 3
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000003623 enhancer Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006459 hydrosilylation reaction Methods 0.000 description 2
- NYMPGSQKHIOWIO-UHFFFAOYSA-N hydroxy(diphenyl)silicon Chemical class C=1C=CC=CC=1[Si](O)C1=CC=CC=C1 NYMPGSQKHIOWIO-UHFFFAOYSA-N 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 2
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 1
- ZHJVTEQTDADLKP-UHFFFAOYSA-N 1-methyl-4-(4-methylphenyl)peroxybenzene Chemical compound C1=CC(C)=CC=C1OOC1=CC=C(C)C=C1 ZHJVTEQTDADLKP-UHFFFAOYSA-N 0.000 description 1
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 1
- FRBAZRWGNOJHRO-UHFFFAOYSA-N 6-tert-butylperoxycarbonyloxyhexyl (2-methylpropan-2-yl)oxy carbonate Chemical compound CC(C)(C)OOC(=O)OCCCCCCOC(=O)OOC(C)(C)C FRBAZRWGNOJHRO-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical class OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004954 Polyphthalamide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- HFPVSQSQZKVPNT-UHFFFAOYSA-N [1,6-dicarboxyoxy-1-(4-methylbenzoyl)peroxyhexyl] 4-methylbenzenecarboperoxoate Chemical compound C1=CC(C)=CC=C1C(=O)OOC(CCCCCOC(O)=O)(OC(O)=O)OOC(=O)C1=CC=C(C)C=C1 HFPVSQSQZKVPNT-UHFFFAOYSA-N 0.000 description 1
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 description 1
- OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical group [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 description 1
- FDTGUDJKAXJXLL-UHFFFAOYSA-N acetylene Chemical group C#C.C#C FDTGUDJKAXJXLL-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229940045985 antineoplastic platinum compound Drugs 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- KQNZLOUWXSAZGD-UHFFFAOYSA-N benzylperoxymethylbenzene Chemical compound C=1C=CC=CC=1COOCC1=CC=CC=C1 KQNZLOUWXSAZGD-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical group 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
- ARLJCLKHRZGWGL-UHFFFAOYSA-N ethenylsilicon Chemical compound [Si]C=C ARLJCLKHRZGWGL-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 150000008282 halocarbons Chemical group 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- DKAGJZJALZXOOV-UHFFFAOYSA-N hydrate;hydrochloride Chemical compound O.Cl DKAGJZJALZXOOV-UHFFFAOYSA-N 0.000 description 1
- NOKUWSXLHXMAOM-UHFFFAOYSA-N hydroxy(phenyl)silicon Chemical compound O[Si]C1=CC=CC=C1 NOKUWSXLHXMAOM-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 150000003058 platinum compounds Chemical class 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920006375 polyphtalamide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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Abstract
本發明提供可賦予低折射率、高硬度且透明性及晶片剪切強度優異之硬化物之晶片黏合用矽氧樹脂組成物。 該晶片黏合用矽氧樹脂組成物之特徵係含有 (A)一分子中具有2個以上鍵結至Si原子之烯基與1個以上之CF3 (CF2 )m (CH2 )n 基,黏度為1,000mPa・s以下之直鏈狀有機聚矽氧烷,(B)一分子中具有2個以上鍵結至Si原子之烯基與1個以上之CF3 (CF2 )o (CH2 )p 基,具有Q單位及/或T單位之分支狀有機聚矽氧烷:相對於(A)、(B)成分之合計100質量份為60~90質量份,(C)一分子中具有2個以上SiH基之有機矽化合物:相對於(A)、(B)成分中之1個烯基,(C)成分中之SiH基成為0.5~5.0個之量,以及(D)鉑族金屬系觸媒。The present invention provides a silicone resin composition for wafer bonding that can provide a cured product with low refractive index, high hardness and excellent transparency and wafer shear strength. The silicone resin composition for chip bonding is characterized by containing (A) one molecule having more than two alkenyl groups bonded to Si atoms and one or more CF 3 (CF 2 ) m (CH 2 ) n groups, Linear organopolysiloxane with a viscosity of 1,000 mPa·s or less, (B) having more than two alkenyl groups bonded to Si atoms and more than one CF 3 (CF 2 ) o (CH 2 ) p group, branched organopolysiloxane having Q unit and/or T unit: 60 to 90 parts by mass relative to 100 parts by mass of the total of components (A) and (B), (C) having Organosilicon compounds with more than 2 SiH groups: 0.5 to 5.0 SiH groups in component (C) per alkenyl group in components (A) and (B), and (D) platinum group metal Department of catalyst.
Description
本發明有關於發光二極體元件等之晶片黏合中有用之矽氧樹脂組成物、其硬化物及光半導體裝置。The present invention relates to a silicone resin composition useful in chip bonding of light-emitting diode elements, its cured product, and an optical semiconductor device.
作為發光二極體(以下亦稱為「LED」)元件之晶片黏合材,提案使用矽氧樹脂(專利文獻1~3)。矽氧樹脂與以往之環氧樹脂比較,由於耐熱性、耐候性、耐變色性優異,故主要使用於藍色LED、白色LED。 然而,該等由以往之矽氧樹脂材料所成之晶片黏合材料主要由甲基系矽氧樹脂組成物所成,光學元件性能並非充分滿足者,尤其400nm之光透過性並非必較高者。 另一方面,專利文獻4中,雖提案藉由含氟之矽氧組成物而賦予具有低折射率,透明性良好且光擷取效率優異之彈性體之加成硬化型矽氧組成物及由該組成物所成之光學元件用密封材,但尤其於晶片黏合材中,樹脂若過軟,則晶片黏合步驟後進行之打線接合步驟中,會發生無法接合之缺點。 [先前技術文獻] [專利文獻]It is proposed to use silicone resin as a chip bonding material for light-emitting diode (hereinafter also referred to as "LED") elements (Patent Documents 1 to 3). Compared with conventional epoxy resins, silicone resin has excellent heat resistance, weather resistance, and discoloration resistance, so it is mainly used in blue LEDs and white LEDs. However, these chip bonding materials made of conventional silicone resin materials are mainly made of methyl-based silicone resin compositions, and the optical element performance is not fully satisfactory, especially the light transmittance of 400 nm is not necessarily high. On the other hand, Patent Document 4 proposes an addition-hardening silicone composition that provides an elastomer with a low refractive index, good transparency, and excellent light-capturing efficiency through a fluorine-containing silicone composition. The composition is used as a sealing material for optical components. However, especially in chip bonding materials, if the resin is too soft, the bonding process may not be possible during the wire bonding step after the chip bonding step. [Prior technical literature] [Patent Document]
[專利文獻1] 日本特開2006-342200號公報 [專利文獻2] 日本特開2015-093970號公報 [專利文獻3] 日本特開2018-150493號公報 [專利文獻4] 日本特開2013-010881號公報[Patent Document 1] Japanese Patent Application Publication No. 2006-342200 [Patent Document 2] Japanese Patent Application Publication No. 2015-093970 [Patent Document 3] Japanese Patent Application Publication No. 2018-150493 [Patent Document 4] Japanese Patent Application Publication No. 2013-010881
[發明欲解決之課題][Problem to be solved by the invention]
本發明係鑑於上述情況而完成者,其目的在於提供可賦予低折射率、高硬度且透明性及晶片剪切強度優異之硬化物之晶片黏合用矽氧樹脂組成物、其硬化物及以該硬化物將光半導體元件晶片黏合之光半導體裝置。 [用以解決課題之手段]The present invention was made in view of the above circumstances, and its object is to provide a silicone resin composition for chip bonding that can provide a cured product with low refractive index, high hardness and excellent transparency and wafer shear strength, a cured product thereof, and the same. An optical semiconductor device in which the optical semiconductor element wafer is bonded by a hardened substance. [Means used to solve problems]
為了達成上述課題,本發明提供一種晶片黏合用矽氧樹脂組成物,其特徵係含有:(A)一分子中具有2個以上鍵結至矽原子之烯基及1個以上之鍵結至矽原子之CF3 -(CF2 )m -(CH2 )n -基,且於25℃時之黏度為1,000mPa・s以下之直鏈狀有機聚矽氧烷(但,m為0以上之整數,n為1以上之整數);(B)一分子中具有2個以上鍵結至矽原子之烯基與1個以上之鍵結至矽原子之CF3 -(CF2 )o -(CH2 )p -基,且具有以SiO4/2 或R3 SiO3/2 表示之矽氧烷單位之至少一者之分支狀有機聚矽氧烷(但,o為0以上之整數,p為1以上之整數,R3 為取代或非取代之一價烴基):相對於(A)、(B)成分之合計100質量份,(B)成分為60~90質量份;(C)一分子中具有2個以上鍵結於矽原子之氫原子之有機矽化合物:相對於前述(A)成分及前述(B)成分中之1個鍵結於矽原子之烯基,前述(C)成分中之鍵結於矽原子之氫原子成為0.5 ~5.0個之量,以及(D)鉑族金屬系觸媒。In order to achieve the above object, the present invention provides a silicone resin composition for chip bonding, which is characterized by containing: (A) one molecule having more than two alkenyl groups bonded to silicon atoms and one or more alkenyl groups bonded to silicon A linear organopolysiloxane with an atomic CF 3 -(CF 2 ) m -(CH 2 ) n -group and a viscosity of 1,000 mPa·s or less at 25°C (however, m is an integer above 0 , n is an integer above 1); (B) One molecule has more than 2 alkenyl groups bonded to silicon atoms and more than 1 CF 3 -(CF 2 ) o -(CH 2 ) p -group, and a branched organopolysiloxane having at least one of the siloxane units represented by SiO 4/2 or R 3 SiO 3/2 (however, o is an integer above 0, and p is 1 The above integers, R 3 is a substituted or unsubstituted monovalent hydrocarbon group): relative to the total of 100 parts by mass of the components (A) and (B), the component (B) is 60 to 90 parts by mass; (C) in one molecule An organosilicon compound having two or more hydrogen atoms bonded to a silicon atom: with respect to one alkenyl group bonded to a silicon atom in the component (A) and the component (B), one of the components (C) The number of hydrogen atoms bonded to silicon atoms is 0.5 to 5.0, and (D) a platinum group metal catalyst.
依據如此之本發明之晶片黏合用矽氧樹脂組成物係低折射率,可賦予高硬度且透明性及晶片剪切強度優異的硬化物。According to the above, the silicone resin composition for wafer bonding of the present invention has a low refractive index and can provide a cured product with high hardness and excellent transparency and wafer shear strength.
該情況,(C)成分較佳係1分子中具有1個以上鍵結至矽原子之CF3 -(CF2 )q -(CH2 )r -基(但,q為0以上之整數,r為1以上之整數)者。In this case, (C) component preferably has one or more CF 3 -(CF 2 ) q -(CH 2 ) r -groups bonded to the silicon atom in one molecule (however, q is an integer of 0 or more, and r is an integer above 1).
基於低折射率化之觀點,(C)成分亦較佳具有此等基。From the viewpoint of lowering the refractive index, it is also preferred that the component (C) has these groups.
又本發明提供一種矽氧硬化物,其特徵係上述晶片黏合用矽氧樹脂組成物的硬化物。The present invention also provides a silicone cured product, which is a cured product of the silicone resin composition for wafer bonding.
如此之本發明之矽氧硬化物,成為低折射率、高硬度且透明性及晶片剪切強度優異者,作為LED元件等之晶片黏合所用之晶片黏合材特別有用。In this way, the cured silicone material of the present invention has a low refractive index, high hardness, and excellent transparency and chip shear strength, and is particularly useful as a chip bonding material for chip bonding of LED elements and the like.
該情況,於25℃下之波長589nm之光的折射率較佳為1.40以下。In this case, the refractive index of light with a wavelength of 589 nm at 25° C. is preferably 1.40 or less.
據此,可成為於25℃下之可見光,尤其是波長400nm之光透過性優異者,並且亦成為光擷取效率優異者。According to this, it can become one with excellent transmittance of visible light at 25° C., especially light with a wavelength of 400 nm, and also one with excellent light capture efficiency.
又,本發明之矽氧硬化物較佳蕭氏D硬度為40以上。In addition, the preferred Shore D hardness of the silicone hardened material of the present invention is 40 or more.
如此依據本發明之矽氧硬化物,於晶片黏合步驟中使LED元件接著後,於打線接合步驟中連接性亦穩定故而較佳。In this way, the silicone hardened material according to the present invention is preferable because it has stable connectivity during the wire bonding step after the LED components are bonded in the chip bonding step.
且,本發明提供一種光半導體裝置,其特徵係以上述硬化物將光半導體元件進行晶片黏合者。Furthermore, the present invention provides an optical semiconductor device characterized by wafer-bonding optical semiconductor elements using the above-mentioned hardened material.
如此依據本發明之光半導體裝置,於晶片黏合步驟後進行之打線接合步驟中,由於難以發生晶粒剝離、無法黏合等之缺點,故信賴性高,其生產性亦提高。 [發明效果]In this way, the optical semiconductor device according to the present invention has high reliability and improved productivity because defects such as chip peeling and inability to bond are less likely to occur in the wire bonding step performed after the chip bonding step. [Effects of the invention]
本發明之晶片黏合用矽氧樹脂組成物係低折射率,可賦予高硬度且透明性及晶片剪切強度優異的硬化物,作為LED元件等之晶片黏合所用之晶片黏合材特別有用。而且於晶片黏合步驟後進行之打線接合步驟中,由於難以發生晶粒剝離、無法黏合等之缺點,故以該矽氧硬化物將光半導體元件晶片黏合之光半導體裝置之信賴性高,其生產性亦提高。The silicone resin composition for chip bonding of the present invention has a low refractive index and can provide a cured product with high hardness and excellent transparency and chip shear strength. It is particularly useful as a chip bonding material for chip bonding of LED components and the like. Furthermore, in the wire bonding step performed after the chip bonding step, defects such as chip peeling and inability to bond are difficult to occur, so the reliability of the optical semiconductor device using the silicone hardened material to bond the optical semiconductor element wafer is high, and its production Sex also improves.
如以上,謀求開發低折射率,可賦予高硬度且透明性及晶片剪切強度優異的硬化物,可賦予成為LED元件等之晶片黏合所用之晶片黏合材之矽氧硬化物的矽氧組成物。As mentioned above, it is sought to develop a silicone composition that has a low refractive index and can provide a cured material with high hardness, transparency and excellent chip shear strength, and can provide a silicone cured material that can be used as a die bonding material for chip bonding of LED elements and the like. .
本發明人等針對上述課題重複積極檢討之結果,發現若為包含後述(A)、(B)、(C)及(D)成分之矽氧樹脂組成物,可解決上述課題,因而完成本發明。As a result of repeated active examination of the above-mentioned problems, the inventors found that the above-mentioned problems can be solved by using a silicone resin composition containing the components (A), (B), (C) and (D) described below, and thus completed the present invention. .
亦即,本發明係一種晶片黏合用矽氧樹脂組成物,其特徵係含有 (A)一分子中具有2個以上鍵結至矽原子之烯基及1個以上之鍵結至矽原子之CF3 -(CF2 )m -(CH2 )n -基,且於25℃時之黏度為1,000mPa・s以下之直鏈狀有機聚矽氧烷(但,m為0以上之整數,n為1以上之整數), (B)一分子中具有2個以上鍵結至矽原子之烯基與1個以上之鍵結至矽原子之CF3 -(CF2 )o -(CH2 )p -基,且具有以SiO4/2 或R3 SiO3/2 表示之矽氧烷單位之至少一者之分支狀有機聚矽氧烷(但,o為0以上之整數,p為1以上之整數,R3 為取代或非取代之一價烴基):相對於(A)、(B)成分之合計100質量份,(B)成分為60~90質量份, (C)一分子中具有2個以上鍵結於矽原子之氫原子之有機矽化合物:相對於前述(A)成分及前述(B)成分中之1個鍵結於矽原子之烯基,前述(C)成分中之鍵結於矽原子之氫原子成為0.5~5.0個之量,以及 (D)鉑族金屬系觸媒。That is, the present invention is a silicone resin composition for wafer bonding, which is characterized by containing (A) one molecule having two or more alkenyl groups bonded to silicon atoms and one or more CF bonded to silicon atoms. 3- (CF 2 ) m -(CH 2 ) n -based linear organopolysiloxane with a viscosity of 1,000 mPa·s or less at 25°C (however, m is an integer above 0, and n is (an integer above 1), (B) having more than 2 alkenyl groups bonded to silicon atoms and more than 1 CF 3 -(CF 2 ) o -(CH 2 ) p - bonded to silicon atoms in one molecule group, and having at least one of the siloxane units represented by SiO 4/2 or R 3 SiO 3/2 (however, o is an integer above 0, and p is an integer above 1 , R 3 is a substituted or unsubstituted monovalent hydrocarbon group): relative to the total of 100 parts by mass of components (A) and (B), component (B) is 60 to 90 parts by mass, and (C) has 2 in one molecule The above organosilicon compound with a hydrogen atom bonded to a silicon atom: with respect to the alkenyl group of one of the aforementioned (A) component and the aforementioned (B) component bonded to a silicon atom, the aforementioned (C) component has an alkenyl group bonded to a silicon atom. The amount of hydrogen atoms in silicon atoms is 0.5 to 5.0, and (D) a platinum group metal catalyst.
以下,針對本發明詳細說明,但本發明並非限定於此。The present invention will be described in detail below, but the present invention is not limited thereto.
[晶片黏合用矽氧樹脂組成物] 本發明之晶片黏合用矽氧樹脂組成物含有後述(A)~(D)成分。 以下針對各成分詳細說明。[Silicon resin composition for chip bonding] The silicone resin composition for chip bonding of the present invention contains components (A) to (D) described below. Each ingredient is explained in detail below.
<(A)成分> (A)成分係一分子中具有2個以上鍵結至矽(Si)原子之烯基及1個以上之鍵結至矽原子之CF3 -(CF2 )m -(CH2 )n -基,且於25℃時之黏度為1,000mPa・s以下之直鏈狀有機聚矽氧烷(但,m為0以上之整數,n為1以上之整數)。<(A) Component> (A) Component has two or more alkenyl groups bonded to silicon (Si) atoms and one or more CF 3 -(CF 2 ) m -( CH 2 ) n -based linear organopolysiloxane with a viscosity of 1,000 mPa·s or less at 25°C (however, m is an integer greater than or equal to 0, and n is an integer greater than or equal to 1).
(A)成分之直鏈狀有機聚矽氧烷於25℃時之黏度為1,000mPa・s以下(通常為1~1,000mPa・s),較佳為700mPa・s以下(例如5~700mPa・s),更佳為150mPa・s以下(例如10~150mPa・s)之範圍者較適當,黏度超過1,000mPa・s時,由於本成分發揮必要以上之作為軟鏈段之作用故而難以獲得成為目標之高硬度。又,以下中只要未特別指明,則黏度係於25℃以旋轉黏度計測定之值。The linear organopolysiloxane of component (A) has a viscosity of 1,000mPa·s or less (usually 1 to 1,000mPa·s) at 25°C, preferably 700mPa·s or less (for example, 5 to 700mPa·s) ), preferably within the range of 150mPa·s or less (for example, 10~150mPa·s). When the viscosity exceeds 1,000mPa·s, it is difficult to obtain the target because this component plays a role as a soft segment more than necessary. High hardness. In addition, unless otherwise specified below, the viscosity is the value measured with a rotational viscometer at 25°C.
作為鍵結至矽原子之烯基較佳為乙烯基、烯丙基、乙炔基等之碳數2~10,尤其是2~6之烯基,特佳為乙烯基。The alkenyl group bonded to the silicon atom is preferably an alkenyl group having 2 to 10 carbon atoms, especially an alkenyl group having 2 to 6 carbon atoms, such as vinyl, allyl, ethynyl, etc., and vinyl is particularly preferred.
鍵結至矽原子之CF3 -(CF2 )m -(CH2 )n -基(但,m為0以上之整數,n為1以上之整數)中,m較佳為滿足0≦m≦9之整數,n較佳為滿足1≦n≦10之整數。基於合成面,較佳為以CF3 -(CH2 )2 -、CF3 -(CF2 )3 -(CH2 )2 -、CF3 -(CF2 )5 -(CH2 )2 -表示之基。In the CF 3 -(CF 2 ) m -(CH 2 ) n -group bonded to the silicon atom (however, m is an integer greater than 0 and n is an integer greater than 1), m preferably satisfies 0≦m≦ As an integer of 9, n is preferably an integer satisfying 1≦n≦10. Based on the synthetic surface, it is preferably represented by CF 3 -(CH 2 ) 2 -, CF 3 -(CF 2 ) 3 -(CH 2 ) 2 -, CF 3 -(CF 2 ) 5 -(CH 2 ) 2 - the foundation.
作為(A)成分之直鏈狀有機聚矽氧烷較佳為例如下述式(1)表示之有機聚矽氧烷。 (式中,R1 可為相同亦可為不同而為烯基,R2 可為相同亦可不同而為烯基以外之碳數1~8之取代或非取代之一價烴基,Rf1 分別可為相同亦可不同,而為以CF3 -(CF2 )m -(CH2 )n -表示之基(但,m為0以上之整數,n為1以上之整數),a為1~3之整數,x、y、z分別為x≧0,y≧1,z≧0之整數,附有x、y、z之括弧內之矽氧烷單位可為任意排列順序)。The linear organopolysiloxane as component (A) is preferably, for example, an organopolysiloxane represented by the following formula (1). (In the formula, R 1 can be the same or different and be an alkenyl group, R 2 can be the same or different and be a substituted or unsubstituted monovalent hydrocarbon group with 1 to 8 carbon atoms other than an alkenyl group, and Rf 1 is respectively They may be the same or different, and are the base represented by CF 3 -(CF 2 ) m -(CH 2 ) n - (However, m is an integer above 0, and n is an integer above 1), and a is 1~ Integers of 3, x, y, and z are respectively x≧0, y≧1, and z≧0 integers. The siloxane units in brackets with x, y, and z can be arranged in any order).
作為R1 表示之烯基較佳為乙烯基、烯丙基、乙炔基等之碳數2~10,尤其是2~6之烯基,特佳為乙烯基。The alkenyl group represented by R 1 is preferably an alkenyl group having 2 to 10 carbon atoms, especially an alkenyl group having 2 to 6 carbon atoms, such as vinyl, allyl, or ethynyl, and particularly preferably vinyl.
作為R2 表示之烯基以外之碳數1~8之取代或非取代之一價烴基只要不具有烯基者則未特別限定,但較佳為碳數1~8之取代或非取代之一價烴基。作為一價烴基可例示甲基、乙基、丙基、丁基等之烷基,環己基、環戊基等之環烷基,苯基、甲苯基、二甲苯基等之芳基,苄基、苯乙基等之芳烷基,氯甲基、氯丙基、氯環己基等之鹵化烴基等。較佳為烷基,特佳為甲基。The substituted or unsubstituted monovalent hydrocarbon group having 1 to 8 carbon atoms other than the alkenyl group represented by R 2 is not particularly limited as long as it does not have an alkenyl group. However, it is preferably a substituted or unsubstituted monovalent hydrocarbon group having 1 to 8 carbon atoms. Valent hydrocarbon group. Examples of the monovalent hydrocarbon group include alkyl groups such as methyl, ethyl, propyl and butyl, cycloalkyl groups such as cyclohexyl and cyclopentyl, aryl groups such as phenyl, tolyl and xylyl, and benzyl groups. , aralkyl groups such as phenethyl, etc., halogenated hydrocarbon groups such as chloromethyl, chloropropyl, chlorocyclohexyl, etc. An alkyl group is preferred, and a methyl group is particularly preferred.
Rf1 為以CF3 -(CF2 )m -(CH2 )n -(但,m為0以上之整數,n為1以上之整數)表示之基,m較佳為滿足0≦m≦9之整數,n較佳為滿足1≦n≦10之整數。基於合成容易之觀點,較佳為以CF3 -(CH2 )2 -、CF3 -(CF2 )3 -(CH2 )2 -、CF3 -(CF2 )5 -(CH2 )2 -表示之基。Rf 1 is a base represented by CF 3 -(CF 2 ) m -(CH 2 ) n - (where m is an integer greater than or equal to 0, and n is an integer greater than or equal to 1), and m preferably satisfies 0≦m≦9 is an integer, n is preferably an integer satisfying 1≦n≦10. From the viewpoint of ease of synthesis, CF 3 -(CH 2 ) 2 -, CF 3 -(CF 2 ) 3 -(CH 2 ) 2 -, and CF 3 -(CF 2 ) 5 -(CH 2 ) 2 are preferred. -The basis of representation.
x為0以上之整數,較佳為0~10之整數,y為1以上之整數,較佳為2~20,更佳為5~10之整數。z為0以上之整數,較佳為0~10,更佳為0~5之整數。x+y+z較佳為1~30,更佳為2~20,特佳為5~12。且y/(x+y+z)之值較佳為1/20~1/1,更佳1/10~1/1,特佳為1/5~1/1之範圍。x is an integer above 0, preferably an integer between 0 and 10, and y is an integer above 1, preferably between 2 and 20, and more preferably between 5 and 10. z is an integer above 0, preferably 0 to 10, more preferably 0 to 5. x+y+z is preferably 1~30, more preferably 2~20, and particularly preferably 5~12. And the value of y/(x+y+z) is preferably in the range of 1/20~1/1, more preferably in the range of 1/10~1/1, and particularly preferably in the range of 1/5~1/1.
(A)成分之直鏈狀有機聚矽氧烷可藉習知方法製造。例如可藉由使下述式(i)表示之環狀矽氧烷、下述式(ii)表示之環狀矽氧烷、下述式(iii)表示之有機矽氧烷及根據需要之下述式(iv)表示之環狀矽氧烷在鹼或酸觸媒存在下水解共聚縮合而獲得。 (式中,R1 、R2 、Rf1 、a如前述)。The linear organopolysiloxane of component (A) can be produced by conventional methods. For example, a cyclic siloxane represented by the following formula (i), a cyclic siloxane represented by the following formula (ii), an organosiloxane represented by the following formula (iii), and if necessary, The cyclic siloxane represented by the formula (iv) is obtained by hydrolysis, copolymerization and condensation in the presence of an alkali or acid catalyst. (In the formula, R 1 , R 2 , Rf 1 and a are as mentioned above).
作為(A)成分之具體例舉例為例如如下者。 Specific examples of component (A) include the following.
(A)成分可單獨使用一種亦可併用兩種以上。(A) Component may be used individually by 1 type, or may use 2 or more types together.
<(B)成分> (B)成分係一分子中具有2個以上鍵結至矽原子之烯基與1個以上之鍵結至矽原子之CF3 -(CF2 )o -(CH2 )p -基,且具有以SiO4/2 或R3 SiO3/2 表示之矽氧烷單位之至少一者之分支狀有機聚矽氧烷(但,o為0以上之整數,p為1以上之整數,R3 為取代或非取代之一價烴基,係上述R1 及R2 所例示)。具有R3 之矽氧烷單位有複數個時,R3 分別可為相同基亦可為不同基。<(B) Component> (B) Component has two or more alkenyl groups bonded to silicon atoms and one or more CF 3 -(CF 2 ) o -(CH 2 ) bonded to silicon atoms in one molecule. p - group, and a branched organopolysiloxane having at least one of the siloxane units represented by SiO 4/2 or R 3 SiO 3/2 (however, o is an integer of 0 or more, and p is 1 or more is an integer, R 3 is a substituted or unsubstituted monovalent hydrocarbon group, which is exemplified by the above-mentioned R 1 and R 2 ). When there are multiple siloxane units having R 3 , R 3 may be the same group or different groups.
作為鍵結至矽原子之烯基,舉例為與(A)成分中例示者相同者,較佳為碳數2~10之烯基,更佳為碳數2~6之烯基,特佳為乙烯基。Examples of the alkenyl group bonded to the silicon atom are the same as those exemplified in component (A), preferably an alkenyl group having 2 to 10 carbon atoms, more preferably an alkenyl group having 2 to 6 carbon atoms, particularly preferably Vinyl.
作為鍵結至矽原子之CF3 -(CF2 )o -(CH2 )p -基,舉例為與(A)成分中例示者相同者,較佳為以CF3 -(CH2 )2 -、CF3 -(CF2 )3 -(CH2 )2 -、CF3 -(CF2 )5 -(CH2 )2 -表示之基。Examples of the CF 3 -(CF 2 ) o -(CH 2 ) p - group bonded to the silicon atom are the same as those exemplified in component (A). Preferably, CF 3 -(CH 2 ) 2 - is used. , CF 3 -(CF 2 ) 3 -(CH 2 ) 2 -, CF 3 -(CF 2 ) 5 -(CH 2 ) 2 - represents the base.
(B)成分之分支狀有機聚矽氧烷必須有由SiO4/2 單位(Q單位)及/或R3 SiO3/2 單位(T單位)所成之分支構造,但亦可進而含有甲基乙烯基矽氧基單位、二甲基矽氧基單位等之R3 2 SiO2/2 單位(D單位)、二甲基乙烯基矽氧基單位、三甲基矽氧基單位等之R3 3 SiO1/2 單位(M單位)(式中,R3 如前述)。SiO4/2 單位及/或R3 SiO3/2 單位之含量,較佳為(B)成分之有機聚矽氧烷樹脂中之全部矽氧烷單位之5莫耳%以上,更佳為10~95莫耳%,又更佳為20~80莫耳%,特佳為20~60莫耳%。且,(B)成分之分支狀有機聚矽氧烷中之SiO4/2 單位(Q單位)相對於SiO4/2 單位(Q單位)與R3 SiO3/2 單位(T單位)之合計量的比例(Q/(Q+T))較佳為0莫耳%以上40莫耳%以下。The branched organopolysiloxane of component (B) must have a branched structure composed of SiO 4/2 units (Q units) and/or R 3 SiO 3/2 units (T units), but it may further contain methane. R 3 2 SiO 2/2 unit (D unit) of vinyl siloxy unit, dimethyl siloxy unit, etc., R of dimethyl vinyl siloxy unit, trimethyl siloxy unit, etc. 3 3 SiO 1/2 unit (M unit) (in the formula, R 3 is as mentioned above). The content of SiO 4/2 units and/or R 3 SiO 3/2 units is preferably 5 mol% or more of the total siloxane units in the organopolysiloxane resin of component (B), more preferably 10 ~95 mol%, preferably 20~80 mol%, particularly preferably 20~60 mol%. Moreover, SiO 4/2 units (Q units) in the branched organopolysiloxane of component (B) is relative to the total of SiO 4/2 units (Q units) and R 3 SiO 3/2 units (T units) The amount ratio (Q/(Q+T)) is preferably 0 mol% or more and 40 mol% or less.
(B)成分中鍵結至矽原子之烯基含量,(B)成分每100g較佳為0.01~1mol之範圍,更佳為0.1~0.6mol之範圍。上述含量若為0.01~1mol之範圍,則交聯反應充分進行,可獲得更高硬度之硬化物。(B) The content of alkenyl groups bonded to silicon atoms in component (B) is preferably in the range of 0.01~1 mol per 100g of component (B), more preferably in the range of 0.1~0.6 mol. If the above content is in the range of 0.01~1 mol, the cross-linking reaction will fully proceed and a hardened product with higher hardness can be obtained.
(B)成分之分支狀有機聚矽氧烷,基於容易單離之觀點,較佳為重量平均分子量為500~100,000之範圍者。From the viewpoint of easy isolation, the branched organopolysiloxane of component (B) preferably has a weight average molecular weight in the range of 500 to 100,000.
此等構造之有機聚矽氧烷藉由使成為各單位源之矽烷化合物以生成單位成為所需比例之方式組合,在例如酸之存在下進行(共)水解而可容易獲得。Organopolysiloxanes having these structures can be easily obtained by combining the silane compounds that are the sources of each unit so that the production units are in a desired ratio, and performing (co)hydrolysis in the presence of, for example, an acid.
(B)成分之調配量,相對於(A)成分與(B)成分之合計100質量份,為60~90質量份,較佳為65~90質量份,更佳為70~85質量份。(B)成分之調配量未達60質量份時,有硬化物硬度不足之虞,超過90質量份時,有組成物之黏度顯著變高,將組成物作為晶片黏合材使用之際的處理變困難。The compounding amount of component (B) is 60 to 90 parts by mass, preferably 65 to 90 parts by mass, and more preferably 70 to 85 parts by mass relative to 100 parts by mass in total of component (A) and component (B). If the blending amount of the component (B) is less than 60 parts by mass, the hardness of the cured product may be insufficient. If it exceeds 90 parts by mass, the viscosity of the composition may become significantly higher, and the handling when using the composition as a wafer bonding material may become worse. difficulty.
作為(B)成分之具體例,舉例為例如以下者。 Specific examples of component (B) include the following.
(B)成分可單獨使用一種亦可併用兩種以上。(B) Component may be used individually by 1 type, or may use 2 or more types together.
<(C)成分> (C)成分係一分子中具有2個以上鍵結於矽原子之氫原子(亦即SiH基)之有機矽化合物。(C)成分係作為與(A)成分及(B)成分中含有之烯基進行氫矽烷化反應而交聯之交聯劑發揮作用。<(C)Component> Component (C) is an organic silicon compound having two or more hydrogen atoms bonded to silicon atoms (ie, SiH groups) in one molecule. Component (C) functions as a cross-linking agent that undergoes a hydrosilylation reaction with the alkenyl group contained in component (A) and (B) to cross-link.
(C)成分只要為一分子具有2個以上之鍵結於矽之氫原子之有機矽化合物,則未特別限定,可舉例為有機氫矽烷類、有機氫聚矽氧烷等,但較佳為有機氫聚矽氧烷。有機氫聚矽氧烷之分子構造並未特別限定,可使用例如直鏈狀、環狀、分支鏈狀者。Component (C) is not particularly limited as long as it is an organosilicon compound having two or more hydrogen atoms bonded to silicon in one molecule. Examples thereof include organohydrogensilanes, organohydrogenpolysiloxanes, etc., but preferred ones are Organohydrogenpolysiloxane. The molecular structure of the organohydrogen polysiloxane is not particularly limited, and for example, linear, cyclic, or branched chain structures can be used.
(C)成分中之與矽鍵結之有機基較佳不具有脂肪族不飽和基,可例示為非取代之一價烴基或經鹵原子(例如氯原子、溴原子)、含環氧基之基(例如環氧基、縮水甘油基、縮水甘油氧基)、烷氧基(例如甲氧基、乙氧基、丙氧基、丁氧基)等取代之一價烴基。作為此等取代或非取代之一價烴基舉例為碳數1~6之烷基、碳數6~10之芳基,更佳為甲基或乙基,或該等基經上述例示之取代基取代之基。且,具有含環氧基之基及/或烷氧基作為前述一價烴基之取代基時,可對本發明之矽氧組成物之硬化物賦予接著性。The organic group bonded to silicon in the component (C) preferably does not have an aliphatic unsaturated group, and can be exemplified by an unsubstituted monovalent hydrocarbon group or a halogen atom (such as a chlorine atom, a bromine atom) or an epoxy group. A monovalent hydrocarbon group substituted by a group (such as epoxy group, glycidyl group, glycidyloxy group), alkoxy group (such as methoxy group, ethoxy group, propoxy group, butoxy group), etc. Examples of these substituted or unsubstituted monovalent hydrocarbon groups are alkyl groups with 1 to 6 carbon atoms, aryl groups with 6 to 10 carbon atoms, more preferably methyl or ethyl groups, or these groups are substituents exemplified above. Substitution base. Furthermore, when the monovalent hydrocarbon group has an epoxy-containing group and/or an alkoxy group as a substituent of the monovalent hydrocarbon group, adhesiveness can be imparted to the cured product of the silicone composition of the present invention.
基於實現進一步之低折射率化之觀點,(C)成分之鍵結於矽之有機基,較佳為具有以CF3 -(CF2 )q -(CH2 )r -(q為0以上之整數,r為1以上之整數)表示之基。 作為鍵結於矽之CF3 -(CF2 )q -(CH2 )r -基,可舉例與(A)成分及(B)成分中例示者相同者,較佳為以CF3 -(CH2 )2 -、CF3 -(CF2 )3 -(CH2 )2 -、CF3 -(CF2 )5 -(CH2 )2 -表示之基。又,以下中,「CF3 -(CF2 )m -(CH2 )n -基」、「CF3 -(CF2 )o -(CH2 )p -基」、「CF3 -(CF2 )q -(CH2 )r -基」亦總稱為「CF3 -(CF2 )m -(CH2 )n -基等」。From the viewpoint of achieving further low refractive index, the organic group bonded to silicon in component (C) is preferably one having CF 3 -(CF 2 ) q -(CH 2 ) r -(q is 0 or more Integer, r is an integer above 1). Examples of the CF 3 -(CF 2 ) q -(CH 2 ) r - group bonded to silicon include the same ones as those exemplified in component (A) and (B). Preferably, CF 3 -(CH 2 ) 2 -, CF 3 -(CF 2 ) 3 -(CH 2 ) 2 -, CF 3 -(CF 2 ) 5 -(CH 2 ) 2 - represents the base. Also, among the following, "CF 3 -(CF 2 ) m -(CH 2 ) n -group", "CF 3 -(CF 2 ) o -(CH 2 ) p -group", "CF 3 -(CF 2 ) q -(CH 2 ) r - group” is also collectively referred to as “CF 3 -(CF 2 ) m -(CH 2 ) n - group, etc.”
(C)成分於一分子中至少具有2個鍵結於矽之氫原子(SiH基),較佳為2~200個,更佳為3~100個,特佳為4~50個。(C)成分之有機矽化合物具有直鏈狀構造或分支鏈狀構造時,該等SiH基可位在分子鏈末端及分子鏈非末端部分中之僅任一者上,亦可位在其兩者上,但較佳位在分子鏈非末端部分之SiH基數多於位在分子鏈末端之SiH基數,更佳僅位於分子鏈非末端部分。The component (C) has at least 2 hydrogen atoms (SiH groups) bonded to silicon in one molecule, preferably 2 to 200, more preferably 3 to 100, and particularly preferably 4 to 50. When the organosilicon compound of component (C) has a linear or branched chain structure, the SiH groups may be located at only one of the end of the molecular chain and the non-terminal part of the molecular chain, or they may be located at both of them. However, it is preferred that the number of SiH groups located at the non-terminal portion of the molecular chain is greater than the number of SiH groups located at the terminal portion of the molecular chain, and more preferably only located at the non-terminal portion of the molecular chain.
(C)成分之有機矽化合物之一分子中之矽原子數(聚合度)較佳為2~1,000,更佳為3~200,又更佳為4~100。進而較佳(C)成分之矽化合物在25℃為液狀,且以旋轉黏度計測定之在25℃之黏度較佳為1~1,000mPa•s,更佳為10~100mPa•s。The number of silicon atoms (degree of polymerization) in one molecule of the organosilicon compound of component (C) is preferably 2 to 1,000, more preferably 3 to 200, and still more preferably 4 to 100. Furthermore, it is preferable that the silicon compound of component (C) is liquid at 25°C, and the viscosity at 25°C measured by a rotational viscometer is preferably 1 to 1,000 mPa·s, more preferably 10 to 100 mPa·s.
作為(C)成分之有機矽化合物可使用例如以下述平均組成式(2)表示之有機氫聚矽氧烷。 (式中,R4 各可相同亦可不同,且為不含烯基之取代或非取代之一價烴基,a’及b為滿足0.7≦a’≦2.1,0.001≦b≦1.0,且0.8≦a’+b ≦3.0,較佳1.0≦a’≦2.0,0.01≦b≦1.0,且滿足1.5≦a’+b≦2.5之數)。As the organosilicon compound as the component (C), for example, organohydrogen polysiloxane represented by the following average composition formula (2) can be used. (In the formula, R 4 can be the same or different, and is a substituted or unsubstituted monovalent hydrocarbon group without an alkenyl group. a' and b satisfy 0.7≦a'≦2.1, 0.001≦b≦1.0, and 0.8 ≦a'+b ≦3.0, preferably 1.0≦a'≦2.0, 0.01≦b≦1.0, and satisfy 1.5≦a'+b≦2.5).
作為R4 之取代或非取代之一價烴基,若為不具有烯基者,則未特別限定,但較佳為碳數1~8之取代或非取代之一價烴基。作為該一價烴基,可例示甲基、乙基、丙基、丁基等之烷基,環己基、環戊基等之環烷基,苯基、甲苯基、二甲苯基等之芳基,苄基、苯基乙基等之芳烷基,氯甲基、氯丙基、氯環己基、以CF3 -(CF2 )q -(CH2 )r -(但,q為0以上,較佳為滿足0≦q≦9之整數,r為1以上,較佳為滿足1≦r≦10之整數)表示之基等之鹵化烷基等。The substituted or unsubstituted monovalent hydrocarbon group of R 4 is not particularly limited as long as it does not have an alkenyl group, but it is preferably a substituted or unsubstituted monovalent hydrocarbon group having 1 to 8 carbon atoms. Examples of the monovalent hydrocarbon group include alkyl groups such as methyl, ethyl, propyl and butyl, cycloalkyl groups such as cyclohexyl and cyclopentyl, and aryl groups such as phenyl, tolyl and xylyl. Aralkyl groups such as benzyl and phenylethyl, chloromethyl, chloropropyl, chlorocyclohexyl, CF 3 -(CF 2 ) q -(CH 2 ) r - (however, q is 0 or more, which is higher than Preferably, it is an integer satisfying 0≦q≦9, r is 1 or more, and preferably it is a halogenated alkyl group represented by a group such as an integer satisfying 1≦r≦10).
該等中,作為R4 較佳為烷基及鹵化烷基,特佳為甲基及以CF3 -(CH2 )2 -、CF3 -(CF2 )3 -(CH2 )2 -、CF3 -(CF2 )5 -(CH2 )2 -表示之基。Among these, R 4 is preferably an alkyl group and a halogenated alkyl group, and particularly preferably a methyl group and CF 3 -(CH 2 ) 2 -, CF 3 -(CF 2 ) 3 -(CH 2 ) 2 -, CF 3 -(CF 2 ) 5 -(CH 2 ) 2 - represents the base.
作為R4 ,基於低折射率化之觀點,較佳為一分子中具有1個以上之鍵結於矽原子之以CF3 -(CF2 )q -(CH2 )r -(但,q為0以上之整數,r為1以上之整數)表示之基。From the viewpoint of lowering the refractive index, R 4 is preferably one having at least one bond to a silicon atom in one molecule, such as CF 3 -(CF 2 ) q -(CH 2 ) r - (however, q is An integer above 0, r is an integer above 1).
作為上述平均組成式(2)表示之有機氫聚矽氧烷可舉例為例如以下述式表示者。 (上述式中,R4 如前述,c~f為1以上之整數)。Examples of the organohydrogen polysiloxane represented by the average composition formula (2) include those represented by the following formula. (In the above formula, R 4 is as mentioned above, and c~f are integers above 1).
以上述平均組成式(2)表示之有機氫矽氧烷中所含之全部有機矽氧烷單位中,較佳30~70莫耳%為甲基氫矽氧烷單位。Among all the organosiloxane units contained in the organohydrogensiloxane represented by the above average composition formula (2), preferably 30 to 70 mol% are methylhydrogensiloxane units.
且,以上述平均組成式(2)表示之有機氫矽氧烷亦可包含以式:H3 SiO1/2 表示之矽氧烷單位、以式:R4 HSiO表示之矽氧烷單位及/或以式:R4 2 HSiO1/2 表示之矽氧烷單位者。上述有機氫矽氧烷亦可為不含SiH基之單有機矽氧烷單位(M單位)、二有機矽氧烷單位(D單位)、三有機矽氧烷單位(T單位)及/或SiO4/2 單位(Q單位)。上述式中之R4 係如前述。Furthermore, the organohydrogensiloxane represented by the above average composition formula (2) may also include siloxane units represented by the formula: H 3 SiO 1/2 , siloxane units represented by the formula: R 4 HSiO, and/ Or the siloxane unit represented by the formula: R 4 2 HSiO 1/2 . The above-mentioned organohydrogensiloxane can also be single organosiloxane unit (M unit), diorganosiloxane unit (D unit), triorganosiloxane unit (T unit) and/or SiO without SiH group 4/2 units (Q units). R 4 in the above formula is as described above.
(C)成分為每一分子至少具有2個SiH基之有機氫聚矽氧烷時,作為其具體例可舉例為1,1,3,3-四甲基二矽氧烷、1,3,5,7-四甲基環四矽氧烷、三(氫二甲基矽氧基)甲基矽烷、三(氫二甲基矽氧基)苯基矽烷、甲基氫環聚矽氧烷、甲基氫矽氧烷•二甲基矽氧烷環狀共聚物、分子鏈兩末端三甲基矽氧基封端之甲基氫聚矽氧烷、分子鏈兩末端三甲基矽氧基封端之二甲基矽氧烷•甲基氫矽氧烷共聚物、分子鏈兩末端三甲基矽氧基封端之二苯基矽氧烷•甲基氫矽氧烷共聚物、分子鏈兩末端三甲基矽氧基封端之甲基苯基矽氧烷•甲基氫矽氧烷共聚物、分子鏈兩末端三甲基矽氧基封端之二甲基矽氧烷•甲基氫矽氧烷•甲基苯基矽氧烷共聚物、分子鏈兩末端三甲基矽氧基封端之二甲基矽氧烷•甲基氫矽氧烷•二苯基矽氧烷共聚物、分子鏈兩末端二甲基氫矽氧基封端之甲基氫聚矽氧烷、分子鏈兩末端二甲基氫矽氧基封端之二甲基聚矽氧烷、分子鏈兩末端二甲基氫矽氧基封端之二甲基矽氧烷•甲基氫矽氧烷共聚物、分子鏈兩末端二甲基氫矽氧基封端之二甲基矽氧烷•甲基苯基矽氧烷共聚物、分子鏈兩末端二甲基氫矽氧基封端之二甲基矽氧烷•二苯基矽氧烷共聚物、分子鏈兩末端二甲基氫矽氧基封端之甲基苯基聚矽氧烷、分子鏈兩末端二甲基氫矽氧基封端之二苯基聚矽氧烷、分子鏈兩末端二甲基氫矽氧基封端之二苯基矽氧烷•甲基氫矽氧烷共聚物、該等各例示之化合物中,甲基之一部分或全部經乙基、丙基等其他烷基取代之有機氫聚矽氧烷、由以式:R4 3 SiO1/2 表示之矽氧烷單位及以式:R4 2 HSiO1/2 表示之矽氧烷單位及以式:SiO4/2 表示之矽氧烷單位所成之有機矽氧烷共聚物、由以式:R4 2 HSiO1/2 表示之矽氧烷單位及以式:SiO4/2 表示之矽氧烷單位所成之有機矽氧烷共聚物、由以式:R4 HSiO2/2 表示之矽氧烷單位及以式:R4 SiO3/2 表示之矽氧烷單位及以式:H3 SiO1/2 表示之矽氧烷單位中之一或二者所成之有機矽氧烷共聚物,以及由該等有機聚矽氧烷之兩種以上所成之混合物。上述式中之R4 具有與前述相同之意義。When the component (C) is an organohydrogen polysiloxane having at least 2 SiH groups per molecule, specific examples thereof include 1,1,3,3-tetramethyldisiloxane, 1,3, 5,7-tetramethylcyclotetrasiloxane, tris(hydrogendimethylsiloxy)methylsiloxane, tris(hydrogendimethylsiloxy)phenylsiloxane, methylhydrogencyclopolysiloxane, Methyl hydrogen siloxane·dimethyl siloxane cyclic copolymer, methyl hydrogen polysiloxane with trimethyl siloxy groups at both ends of the molecular chain, trimethyl siloxy groups at both ends of the molecular chain Dimethylsiloxane•methylhydrogensiloxane copolymer, trimethylsiloxy-terminated diphenylsiloxane•methylhydrogensiloxane copolymer at both ends of the molecular chain, Methylphenylsiloxane·methylhydrogensiloxane copolymer terminated with trimethylsiloxy groups, dimethylsiloxane·methylhydrogen terminated with trimethylsiloxy groups at both ends of the molecular chain Siloxane·methylphenylsiloxane copolymer, dimethylsiloxane·methylhydrogensiloxane·diphenylsiloxane copolymer with trimethylsiloxy groups at both ends of the molecular chain, Methyl hydrogen polysiloxane with dimethyl hydrogen siloxy groups at both ends of the molecular chain, dimethyl polysiloxane with dimethyl hydrogen siloxy groups at both ends of the molecular chain, dimethyl polysiloxane with dimethyl hydrogen siloxy groups at both ends of the molecular chain Dimethylsiloxane·Methylhydrogensiloxane copolymer terminated by hydroxysiloxy group, Dimethylsiloxane·Methylphenylsiloxane terminated by dimethylhydrogensiloxy groups at both ends of the molecular chain Oxane copolymer, dimethylsiloxane·diphenylsiloxane copolymer with dimethylhydrogensiloxy end-capped molecular chain, dimethylhydrogensiloxy end-capped dimethylsiloxane copolymer with molecular chain phenylpolysiloxane, diphenylpolysiloxane with dimethylhydrogensiloxy-terminated terminals of the molecular chain, diphenylsiloxane with dimethylhydrogensiloxy-terminated terminals of the molecular chain •Methylhydrogensiloxane copolymer, an organohydrogenpolysiloxane in which part or all of the methyl group in each of the illustrated compounds is substituted by other alkyl groups such as ethyl, propyl, etc., has the formula: R 4 3 An organosiloxane copolymer composed of siloxane units represented by SiO 1/2 and siloxane units represented by the formula: R 4 2 HSiO 1/2 and siloxane units represented by the formula: SiO 4/2 , an organosiloxane copolymer composed of siloxane units represented by the formula: R 4 2 HSiO 1/2 and siloxane units represented by the formula: SiO 4/2 , composed of the formula: R 4 HSiO 2 An organic compound composed of one or both of the siloxane unit represented by /2 and the siloxane unit represented by the formula: R 4 SiO 3/2 and the siloxane unit represented by the formula: H 3 SiO 1/2 Siloxane copolymers, and mixtures of two or more of these organopolysiloxanes. R 4 in the above formula has the same meaning as mentioned above.
作為(C)成分之較佳具體例舉例為以下述單位式表示者。 (上述式中,括弧內之矽氧烷單位之排列順序為任意)。Preferable specific examples of component (C) are those represented by the following unit formulas. (In the above formula, the order of the siloxane units in brackets is arbitrary).
(C)成分可單獨使用一種亦可併用兩種以上。(C) Component may be used individually by 1 type, or may use 2 or more types together.
(C)成分之調配量,相對於前述(A)成分及前述(B)成分中之1個鍵結於矽原子之烯基,(C)成分中之鍵結於矽原子之氫原子(SiH基)成為0.5~5.0個之量,亦即相對於(A)及(B)成分中之全部鍵結於矽原子之烯基之合計數,(C)成分中之鍵結於矽原子之氫原子(SiH基)成為0.5~5.0倍之量。基於交聯之平衡之觀點,較佳成為0.7~3.0倍之量。若未達0.5倍或超過5.0倍,則交聯不足或過度進行,無法獲得硬度優異之硬化物。The compounding amount of component (C) is based on the amount of an alkenyl group bonded to a silicon atom in component (A) and component (B), and the hydrogen atom (SiH) bonded to a silicon atom in component (C). group) becomes 0.5 to 5.0, that is, relative to the total number of alkenyl groups bonded to silicon atoms in components (A) and (B), the hydrogen bonded to silicon atoms in component (C) Atoms (SiH groups) become 0.5 to 5.0 times the amount. From the viewpoint of cross-linking balance, the amount is preferably 0.7 to 3.0 times. If it is less than 0.5 times or exceeds 5.0 times, cross-linking will be insufficient or excessive, and a hardened product with excellent hardness will not be obtained.
<(D)成分> (D)成分之鉑族金屬系觸媒係用以進行及促進前述(A) ~(C)成分之氫矽烷基化反應之成分。 鉑族金屬系觸媒並未特別限定,可舉例為例如鉑、鈀、銠等鉑族金屬;氯化鉑酸、醇改質之氯化鉑酸、氯化鉑酸與烯烴類、乙烯基矽氧烷或乙炔化合物之配位化合物等之鉑化合物,四(三苯膦)鈀、氯三(三苯膦)銠等之鉑族金屬化合物等,但氯化鉑酸經矽氧改質者,由於與(A)~ (C)成分之相溶性良好,幾乎不含氯雜質,故而較佳。<(D)Component> The platinum group metal catalyst of component (D) is a component used to carry out and promote the hydrosilylation reaction of components (A) to (C). The platinum group metal catalyst is not particularly limited, and examples thereof include platinum group metals such as platinum, palladium, and rhodium; chlorinated platinic acid, alcohol-modified chlorinated platinic acid, chlorinated platinic acid and olefins, and vinyl silicon. Platinum compounds such as coordination compounds of oxalane or acetylene compounds, platinum group metal compounds such as tetrakis (triphenylphosphine) palladium, chlorotris (triphenylphosphine) rhodium, etc., but chlorinated platinic acid has been modified with silicon oxygen, It is preferred because it has good compatibility with components (A) ~ (C) and contains almost no chlorine impurities.
(D)成分可單獨使用一種亦可併用兩種以上。(D) Component may be used individually by 1 type, or may use 2 or more types together.
(D)成分之調配量只要為作為觸媒之有效量即可,但較好相對於(A)~(C)成分之合計,以鉑族金屬元素之質量換算較佳為0.1~1000ppm之範圍,更佳為1~500 ppm之範圍。The compounding amount of component (D) only needs to be an effective amount as a catalyst, but it is preferably in the range of 0.1 to 1000 ppm based on the mass of the platinum group metal element relative to the total of components (A) to (C). , preferably in the range of 1~500 ppm.
<其他成分> 本發明之組成物除了上述(A)~(D)以外,亦可調配以下例示之其他成分。<Other ingredients> In addition to the above-mentioned (A) to (D), the composition of the present invention may also be formulated with other ingredients illustrated below.
有機過氧化物: 本發明中,藉由添加有機過氧化物,可達成樹脂強度之進一步提高。Organic peroxide: In the present invention, by adding organic peroxide, the resin strength can be further improved.
作為有機過氧化物可舉例為例如1,6-雙(第三丁基過氧羰氧基)己烷、苯甲醯基過氧化物、第三丁基過氧苯甲酸酯、鄰-甲基苯甲醯基過氧化物、對-甲基苯甲醯基過氧化物、二異丙苯基過氧化物、1,1-雙(第三丁基過氧基)-3,3,3-三甲基環己烷、二(4-甲基苯甲醯基過氧基)六亞甲基雙碳酸酯等,但較佳為1,6-雙(第三丁基過氧羰氧基)己烷。其添加量為有效量即可,但通常相對於(A)、(B)成分之有機聚矽氧烷合計量100質量份,調配0.01~5質量份,特佳調配0.05~3質量份。該等可單獨使用1種或可組合2種以上使用。Examples of organic peroxides include 1,6-bis(tert-butylperoxycarbonyloxy)hexane, benzyl peroxide, tert-butylperoxybenzoate, o-methyl Toluyl peroxide, p-toluyl peroxide, dicumyl peroxide, 1,1-bis(tert-butylperoxy)-3,3,3 -Trimethylcyclohexane, bis(4-methylbenzoylperoxy)hexamethylene biscarbonate, etc., but preferably 1,6-bis(tert-butylperoxycarbonyloxy) )hexane. The added amount is an effective amount, but usually 0.01 to 5 parts by mass is prepared based on 100 parts by mass of the total organopolysiloxane of components (A) and (B), and 0.05 to 3 parts by mass is particularly preferred. These may be used individually by 1 type or in combination of 2 or more types.
反應抑制劑: 本發明之組成物可根據需要使用對(D)成分之加成反應觸媒具有硬化抑制效果之化合物之以往習知之反應抑制劑(反應控制劑)。作為反應抑制劑可例示三苯膦等之含磷化合物;三丁基胺或四甲基乙二胺、苯并三唑等之含氮化合物;含硫化合物;乙炔醇類(例如,1-乙炔基環己醇、3,5-二甲基-1-己炔-3-醇)等乙炔系化合物;過氧化氫化合物;馬來酸衍生物等。Reaction inhibitors: The composition of the present invention may use a conventionally known reaction inhibitor (reaction control agent), which is a compound having a hardening inhibitory effect on the addition reaction catalyst of component (D), if necessary. Examples of reaction inhibitors include phosphorus-containing compounds such as triphenylphosphine; nitrogen-containing compounds such as tributylamine, tetramethylethylenediamine, and benzotriazole; sulfur-containing compounds; acetylenic alcohols (for example, 1-ethyne Acetylene compounds such as cyclohexanol, 3,5-dimethyl-1-hexyn-3-ol); hydrogen peroxide compounds; maleic acid derivatives, etc.
以反應抑制劑進行之硬化抑制效果程度係依據該反應抑制劑之化學構造而大為不同,因此反應抑制劑的配合量較好針對使用之反應抑制劑之各者,調整為最適量。通常相對於(A)成分、(B)成分、(C)成分及(D)成分之合計100質量份較佳為0.001~5質量份。The degree of the hardening inhibitory effect using a reaction inhibitor greatly differs depending on the chemical structure of the reaction inhibitor. Therefore, the amount of the reaction inhibitor blended is preferably adjusted to an optimal amount for each reaction inhibitor used. Generally, 0.001 to 5 parts by mass is preferably used based on 100 parts by mass of the total of (A) component, (B) component, (C) component and (D) component.
接著性提升劑: 本組成物中為了提高對樹脂之接著性,亦可添加接著性提升劑。作為接著性提升劑,基於對加成反應型的本發明組成物賦予自我接著性之觀點,係使用含有賦予接著性之官能基之矽烷、矽氧烷等之有機矽化合物、非矽氧系有機化合物等。Adhesion enhancer: In order to improve the adhesion to the resin, an adhesion improving agent may also be added to this composition. As the adhesion enhancer, from the viewpoint of imparting self-adhesiveness to the addition reaction type composition of the present invention, organic silicon compounds such as silane and siloxane containing a functional group for imparting adhesiveness, and non-silicone organic compounds are used. Compounds etc.
作為賦予接著性之官能基之具體例,可舉例為鍵結於矽原子之乙烯基、烯丙基等之烯基、氫原子;經由碳原子鍵結於矽原子之環氧基(例如γ-縮水甘油氧基丙基、β-(3,4-環氧基環己基)乙基等)、或丙烯醯氧基(例如γ-丙烯醯氧基丙基等)或甲基丙烯醯氧基(例如γ-甲基丙烯醯氧基丙基等);烷氧基矽烷基(例如經由可含有1~2個酯構造、胺基甲酸酯構造、醚構造之伸烷基鍵結於矽原子之三甲氧基矽烷基、三乙氧基矽烷基、甲基二甲氧基矽烷基等之烷氧基矽烷基等)等。Specific examples of the functional group that imparts adhesiveness include alkenyl groups such as vinyl groups and allyl groups bonded to silicon atoms, and hydrogen atoms; and epoxy groups bonded to silicon atoms via carbon atoms (for example, γ- Glycidyloxypropyl, β-(3,4-epoxycyclohexyl)ethyl, etc.), or acryloyloxy (such as γ-acryloxypropyl, etc.) or methacryloxy ( For example, γ-methacryloxypropyl, etc.); alkoxysilyl group (for example, bonded to the silicon atom via an alkylene group that may contain 1 to 2 ester structures, urethane structures, or ether structures) Trimethoxysilyl, triethoxysilyl, methyldimethoxysilyl, alkoxysilyl, etc.), etc.
含有賦予接著性之官能基之有機矽化合物可例示矽烷偶合劑、具有烷氧基矽烷基與有機官能性基之矽氧烷、於具有反應性有機基之有機化合物中導入烷氧基矽烷基之化合物等。Examples of the organosilicon compound containing a functional group that imparts adhesion include silane coupling agents, siloxanes having an alkoxysilyl group and an organic functional group, and compounds in which an alkoxysilyl group is introduced into an organic compound having a reactive organic group. Compounds etc.
作為非矽氧系有機化合物可舉例為例如有機酸烯丙酯、環氧基開環觸媒、有機鈦化合物、有機鋯化合物、有機鋁化合物等。Examples of the non-silicon organic compound include organic acid allyl ester, epoxy ring-opening catalyst, organic titanium compound, organic zirconium compound, organic aluminum compound, and the like.
填充劑: 本發明之組成物中,可填充有結晶性氧化矽、中空填料、倍半矽氧烷等之無機質填充劑及該等填充劑藉由有機烷氧基矽烷化合物、有機氯矽烷化合物、有機矽氮烷化合物、低分子量矽氧烷化合物等之有機矽化合物進行表面疏水化處理之填充劑等;矽氧橡膠粉末、矽氧樹脂粉末等。作為本成分,尤其較佳使用可賦予觸變性之填充劑,藉由賦予觸變性,可獲得作業性、晶片剪切強度優異之硬化物。Fillers: The composition of the present invention can be filled with inorganic fillers such as crystalline silica, hollow fillers, and sesquioxane, and these fillers can be made of organic alkoxysilane compounds, organochlorosilane compounds, and organic silicon nitrogen. Fillers for surface hydrophobization of organosilicon compounds such as alkane compounds and low molecular weight siloxane compounds; silicone rubber powder, silicone resin powder, etc. As this component, it is particularly preferable to use a filler that can impart thixotropy. By imparting thixotropy, a cured product with excellent workability and wafer shear strength can be obtained.
該等其他成分可單獨使用一種,亦可併用兩種以上。These other components may be used individually by 1 type, or in combination of 2 or more types.
又,為了使晶片黏合(轉印法)之作業性良好,本發明之晶片黏合用矽氧樹脂組成物(加成硬化型矽氧樹脂組成物)之黏度於25℃下較佳為5~100Pa・s,更佳為20~50Pa・s。In addition, in order to achieve good workability of chip bonding (transfer method), the viscosity of the silicone resin composition for chip bonding of the present invention (addition curable silicone resin composition) is preferably 5 to 100 Pa at 25°C.・s, preferably 20~50Pa・s.
[硬化物] 進而本發明提供晶片黏合用矽氧樹脂組成物之硬化物(矽氧硬化物)。 該矽氧硬化物為低折射率且為高硬度且透明性及晶片剪切強度優異,作為LED元件等之晶片黏合所用之晶片黏合材特別有用。尤其,本發明之晶片黏合用矽氧樹脂組成物包含(A)成分、(B)成分及依情況於(C)成分中具有CF3 (CF2 )m (CH2 )n 基等,故可獲得低折射率,且可提高光透過率並且光擷取效率亦優異之硬化物。[Cured Material] Furthermore, the present invention provides a cured material (silicone cured material) of a silicone resin composition for chip bonding. This silicone hardened material has a low refractive index and high hardness, and is excellent in transparency and chip shear strength. It is particularly useful as a chip bonding material for chip bonding of LED components and the like. In particular, the silicone resin composition for chip bonding of the present invention contains (A) component, (B) component and (C) component as appropriate, and has a CF 3 (CF 2 ) m (CH 2 ) n group, etc., so it can A hardened product with low refractive index, improved light transmittance and excellent light capture efficiency is obtained.
又,為了提高本來期望之LED等之光學元件性能例如於25℃之波長400nm之光透過率,較佳硬化物於25℃下之波長589nm之光的折射率為1.40以下,特佳1.35 ~1.38。若如此,可更確實成為於25℃下之可見光,尤其是波長400nm之光透過率者,並且可成為光擷取效率亦優異者。In addition, in order to improve the originally desired performance of optical elements such as LEDs, such as the light transmittance at a wavelength of 400 nm at 25°C, the refractive index of the cured material at a wavelength of 589nm at 25°C is preferably 1.40 or less, particularly preferably 1.35 to 1.38. . If so, the transmittance of visible light at 25° C., especially the light with a wavelength of 400 nm, can be achieved more reliably, and the light capture efficiency can also be excellent.
又,本發明之矽氧硬化物之蕭氏D硬度較佳為40以上,更佳為50以上,特佳為55以上。Furthermore, the Shore D hardness of the silicone hardened material of the present invention is preferably 40 or more, more preferably 50 or more, and particularly preferably 55 or more.
若為此等硬度,則於晶片黏合步驟接著LED元件等之後,於打線接合步驟中之連接性亦穩定。If this hardness is achieved, the connectivity in the wire bonding step will also be stable after the LED components are attached in the chip bonding step.
又,獲得本發明之硬化物的晶片黏合用矽氧樹脂組成物為了滿足折射率、硬度等之特性,而可調整上述記載之任意成分之添加量。In addition, in order to obtain the silicone resin composition for wafer bonding to obtain the cured product of the present invention, in order to satisfy the characteristics such as refractive index, hardness, etc., the added amounts of the optional components described above can be adjusted.
本發明之晶片黏合用矽氧樹脂組成物之硬化只要以習知條件進行即可,作為一例,可在100~180℃下10分鐘~5小時之條件硬化。The silicone resin composition for chip bonding of the present invention can be cured under conventional conditions. For example, it can be cured at 100 to 180° C. for 10 minutes to 5 hours.
本發明之晶片黏合用矽氧樹脂組成物之硬化物對基板、LED晶粒等之接著力高,尤其作為LED元件等之晶片黏合所用之晶片黏合材而有用。如以上,依據本發明之矽氧硬化物,由於可作為對基板、LED晶粒等之接著力高的接著劑(晶片黏合材),故於打線接合步驟中,難以發生晶粒之剝離或無法黏合等之缺陷。The cured product of the silicone resin composition for chip bonding of the present invention has high adhesion to substrates, LED chips, etc., and is particularly useful as a chip bonding material for chip bonding of LED components and the like. As mentioned above, the silicone cured material according to the present invention can be used as an adhesive (chip bonding material) with high adhesion to substrates, LED chips, etc., so it is difficult for the chips to peel off or fail during the wire bonding step. Defects in bonding, etc.
[光半導體裝置] 再者,本發明提供以上述硬化物將光半導體元件進行晶片黏合之光半導體裝置。[Optical semiconductor device] Furthermore, the present invention provides an optical semiconductor device in which optical semiconductor elements are chip-bonded using the above-mentioned cured product.
作為使用本發明之組成物對光半導體元件進行晶片黏合之方法的一例,舉例有將本發明之組成物填充於針筒,使用佈膠器於封裝等之基體上以乾燥狀態成為5~100μm厚之方式塗佈後,於塗佈之組成物上配置光半導體元件(例如發光二極體),使該組成物硬化,藉此於基體上晶片黏合光半導體元件之方法。且亦可為以將組成物載置於橡膠刮盤中,邊進行橡膠刮抹邊沖壓之方法,於基體上以乾燥狀態成為5~100μm厚之方式塗佈後,於塗佈之組成物上配置光半導體元件,使該組成物硬化,藉此於基體上晶片黏合光半導體元件之方法。組成物之硬化條件只要如上述即可。如此可作成信賴性高,以本發明之矽氧硬化物將光半導體元件晶片黏合之光半導體裝置。An example of a method for chip bonding optical semiconductor elements using the composition of the present invention is to fill a syringe with the composition of the present invention, and use a glue spreader to apply the composition of the present invention on a base of a package or the like in a dry state to a thickness of 5 to 100 μm. After coating, an optical semiconductor element (such as a light emitting diode) is arranged on the coated composition, and the composition is hardened, thereby wafer-bonding the optical semiconductor element to the substrate. Alternatively, the composition may be placed on a rubber squeegee and stamped while squeegeeing, and the composition may be coated on the substrate to a thickness of 5 to 100 μm in a dry state. A method of wafer-bonding the optical semiconductor element to a substrate by arranging the optical semiconductor element and hardening the composition. The hardening conditions of the composition only need to be as described above. In this way, a highly reliable optical semiconductor device can be produced in which the optical semiconductor element wafer is bonded with the silicone hardened material of the present invention.
本發明之晶片黏合用矽氧樹脂組成物為低折射率,可賦予高硬度且透明性及晶片剪切強度優異之硬化物。因此,於晶片黏合步驟後進行之打線接合步驟中,難以發生晶粒剝離,或無法黏合之缺陷,以該矽氧硬化物將光半導體元件晶片黏合之光半導體裝置之信賴性高,其生產性亦提高。 [實施例]The silicone resin composition for chip bonding of the present invention has a low refractive index and can provide a cured product with high hardness and excellent transparency and chip shear strength. Therefore, in the wire bonding step performed after the chip bonding step, it is difficult to cause defects such as chip peeling or failure to bond, and the optical semiconductor device using the silicone hardened material to bond the optical semiconductor element wafer has high reliability and productivity. Also improve. [Example]
以下使用實施例具體說明本發明,但該等實施例不對本發明有任何限制。又,分子量係以凝膠滲透層析(GPC)之標準聚苯乙烯換算之重量平均分子量。於25℃之黏度係以旋轉黏度計之測定值。The following examples are used to specifically illustrate the present invention, but these examples do not limit the present invention in any way. In addition, the molecular weight is the weight average molecular weight converted to the standard polystyrene of gel permeation chromatography (GPC). The viscosity at 25°C is measured with a rotational viscometer.
又,各矽氧烷單位之簡稱意義如下述。 In addition, the meaning of the abbreviation of each siloxane unit is as follows.
<(B)成分之合成> [合成例1] 於具備攪拌裝置、冷卻管、滴加漏斗及溫度計之1L4頸燒瓶中,放入3,3,3-三氟丙基-三甲氧基矽烷152.6g、四甲氧基矽烷35.3g、六甲基二矽氧烷10.5g、1,3-二乙烯基四甲基二矽氧烷20.9g、異丙醇32g及甲烷磺酸2.8g,並攪拌混合。於其中滴加水34.8g,添加六氟間二甲苯220g,隨後於70℃進行5小時水解反應。於其中添加50%氫氧化鉀水溶液4.6g,升溫並餾除低沸點成分,於120℃進行5小時縮合反應。添加甲烷磺酸1.5g作為中和劑,於120℃進行2小時中和處理。冷卻後進行過濾,獲得重量平均分子量2,200,以平均單位式M1.8 MVi 3.2 Q4.3 TF1 10.0 表示之有機聚矽氧烷(B-1)。<Synthesis of component (B)> [Synthesis Example 1] Place 3,3,3-trifluoropropyl-trimethoxysilane 152.6 in a 1L 4-neck flask equipped with a stirring device, a cooling tube, a dropping funnel and a thermometer. g, 35.3g of tetramethoxysilane, 10.5g of hexamethyldisiloxane, 20.9g of 1,3-divinyltetramethyldisiloxane, 32g of isopropyl alcohol and 2.8g of methane sulfonic acid, and stir mix. 34.8 g of water was added dropwise thereto, and 220 g of hexafluoro-m-xylene was added, followed by hydrolysis reaction at 70° C. for 5 hours. 4.6 g of a 50% potassium hydroxide aqueous solution was added thereto, the temperature was raised, low boiling point components were distilled off, and a condensation reaction was performed at 120°C for 5 hours. 1.5 g of methanesulfonic acid was added as a neutralizing agent, and neutralization treatment was performed at 120° C. for 2 hours. After cooling, it was filtered to obtain an organopolysiloxane (B-1) with a weight average molecular weight of 2,200 and an average unit formula of M 1.8 M Vi 3.2 Q 4.3 T F1 10.0 .
[合成例2] 於具備攪拌裝置、冷卻管、滴加漏斗及溫度計之1L4頸燒瓶中,放入(3,3,4,4,5,5,6,6,7,7,8,8,8-十三氟辛基)三甲氧基矽烷280.8g、四甲氧基矽烷47.0g、六甲基二矽氧烷10.5g、1,3-二乙烯基四甲基二矽氧烷20.9g、異丙醇32g及甲烷磺酸4.6g,並攪拌混合。於其中滴加水33.6g,添加六氟間二甲苯360g,隨後於70℃進行5小時水解反應。於其中添加50%氫氧化鉀水溶液7.5g,升溫並餾除低沸點成分,於120℃進行5小時縮合反應。添加甲烷磺酸2.4g作為中和劑,於120℃進行2小時中和處理。冷卻後進行過濾,獲得重量平均分子量2,900,以平均單位式M1.3 MVi 2.3 Q3.9 TF3 5.9 表示之有機聚矽氧烷(B-2)。[Synthesis Example 2] In a 1L 4-neck flask equipped with a stirring device, a cooling tube, a dropping funnel and a thermometer, put (3,3,4,4,5,5,6,6,7,7,8,8 ,8-Tridedecafluorooctyl)trimethoxysilane 280.8g, tetramethoxysilane 47.0g, hexamethyldisiloxane 10.5g, 1,3-divinyltetramethyldisiloxane 20.9g , 32g of isopropyl alcohol and 4.6g of methane sulfonic acid, and stir to mix. 33.6 g of water was added dropwise thereto, and 360 g of hexafluoro-m-xylene was added, followed by hydrolysis reaction at 70° C. for 5 hours. 7.5 g of a 50% potassium hydroxide aqueous solution was added thereto, the temperature was raised, low boiling point components were distilled off, and a condensation reaction was performed at 120°C for 5 hours. 2.4 g of methanesulfonic acid was added as a neutralizing agent, and neutralization treatment was performed at 120° C. for 2 hours. After cooling, it was filtered to obtain an organopolysiloxane (B-2) with a weight average molecular weight of 2,900 and an average unit formula of M 1.3 M Vi 2.3 Q 3.9 T F3 5.9 .
[合成例3] 於具備攪拌裝置、冷卻管、滴加漏斗及溫度計之2L4頸燒瓶中,添加六氟間二甲苯262g、水489g、濃鹽酸534g,邊攪拌邊升溫至70℃。升溫後,滴加3,3,3-三氟丙基-三甲氧基矽烷313.7g、乙烯基甲基二甲氧基矽烷38.0g、3,3,4,4,5,5,6,6,6-九氟二氯矽烷38.7g、六氟間二甲苯63.3g。滴加後於75℃熟成2小時。將熟成後位於上層之鹽酸水去除後,有機層以水洗淨,重複直至洗淨的水成為中性。洗淨後於有機層中放入氫氧化鉀0.1g,升溫至120℃進行脫水縮合反應。反應結束後,放入乙酸鉀1g與氯三甲基矽烷0.23g,進行中和反應。中和後進行過濾,以100℃/5mmHg濃縮1小時,獲得重量平均分子量1,900,以平均單位式DVi 2.1 TF1 10.1 DF2 0.7 表示之有機聚矽氧烷(B-3)。[Synthesis Example 3] In a 2L 4-neck flask equipped with a stirring device, a cooling tube, a dropping funnel and a thermometer, 262g of hexafluoro-m-xylene, 489g of water, and 534g of concentrated hydrochloric acid were added, and the temperature was raised to 70°C while stirring. After the temperature rises, 313.7g of 3,3,3-trifluoropropyl-trimethoxysilane, 38.0g of vinylmethyldimethoxysilane, and 3,3,4,4,5,5,6,6 are added dropwise. , 38.7g of 6-nonafluorodichlorosilane and 63.3g of hexafluoro-m-xylene. After the dropwise addition, the mixture was matured at 75°C for 2 hours. After removing the hydrochloric acid water in the upper layer after aging, the organic layer is washed with water, and the process is repeated until the washed water becomes neutral. After washing, 0.1 g of potassium hydroxide was added to the organic layer, and the temperature was raised to 120°C to perform dehydration and condensation reaction. After the reaction is completed, 1 g of potassium acetate and 0.23 g of chlorotrimethylsilane are added to perform a neutralization reaction. After neutralization, filter and concentrate at 100°C/5mmHg for 1 hour to obtain organopolysiloxane (B-3) with a weight average molecular weight of 1,900 and an average unit formula of D Vi 2.1 T F1 10.1 D F2 0.7 .
[實施例1] 將作為成分(A)之以MVi 2 DF1 10 表示之黏度150mPa・s之直鏈狀有機聚矽氧烷30質量份、作為(B)成分之合成例1所得之有機聚矽氧烷(B-1) 70質量份、作為(C)成分之以M2 DF1 14 DH 14 表示之有機氫聚矽氧烷24質量份以及1-乙炔基環己醇0.1質量份混合。進而,混合作為(D)成分之鉑的1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物(以鉑金屬之質量單位計相對於組成物全體成為15ppm之量)獲得組成物。組成物中之Si-H基/烯基之莫耳比為1.0。[Example 1] 30 parts by mass of a linear organopolysiloxane with a viscosity of 150 mPa·s expressed as M Vi 2 D F1 10 as the component (A) and the organic material obtained in Synthesis Example 1 as the component (B) 70 parts by mass of polysiloxane (B-1), 24 parts by mass of organohydrogen polysiloxane represented by M 2 D F1 14 D H 14 as component (C), and 0.1 part by mass of 1-ethynylcyclohexanol mix. Furthermore, a 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex of platinum as component (D) (based on the mass unit of platinum metal relative to the entire composition) is mixed. The amount becomes 15ppm) to obtain the composition. The molar ratio of Si-H group/alkenyl group in the composition is 1.0.
[實施例2] 將作為成分(A)之以MVi 2 DF1 10 表示之黏度150mPa・s之直鏈狀有機聚矽氧烷20質量份、作為(B)成分之合成例2所得之有機聚矽氧烷(B-2) 80質量份、作為(C)成分之以M2 DF1 14 DH 14 表示之有機氫聚矽氧烷15質量份以及1-乙炔基環己醇0.1質量份混合。進而,混合作為(D)成分之鉑的1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物(以鉑金屬之質量單位計相對於組成物全體成為15ppm之量)獲得組成物。組成物中之Si-H基/烯基之莫耳比為1.0。[Example 2] 20 parts by mass of a linear organopolysiloxane with a viscosity of 150 mPa·s expressed as M Vi 2 D F1 10 as the component (A) and the organic material obtained in Synthesis Example 2 as the component (B) 80 parts by mass of polysiloxane (B-2), 15 parts by mass of organohydrogen polysiloxane represented by M 2 D F1 14 D H 14 as component (C), and 0.1 part by mass of 1-ethynylcyclohexanol mix. Furthermore, a 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex of platinum as component (D) (based on the mass unit of platinum metal relative to the entire composition) is mixed. The amount becomes 15ppm) to obtain the composition. The molar ratio of Si-H group/alkenyl group in the composition is 1.0.
[實施例3] 將作為成分(A)之以MVi 2 DF1 10 表示之黏度150mPa・s之直鏈狀有機聚矽氧烷20質量份、作為(B)成分之合成例3所得之有機聚矽氧烷(B-3) 80質量份、作為(C)成分之以M2 DF1 14 DH 14 表示之有機氫聚矽氧烷20質量份以及1-乙炔基環己醇0.1質量份混合。進而,混合作為(D)成分之鉑的1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物(以鉑金屬之質量單位計相對於組成物全體成為15ppm之量)獲得組成物。組成物中之Si-H基/烯基之莫耳比為1.0。[Example 3] 20 parts by mass of a linear organopolysiloxane with a viscosity of 150 mPa·s expressed as M Vi 2 D F1 10 as the component (A) and the organic material obtained in Synthesis Example 3 as the component (B) 80 parts by mass of polysiloxane (B-3), 20 parts by mass of organohydrogen polysiloxane represented by M 2 D F1 14 D H 14 as component (C), and 0.1 part by mass of 1-ethynylcyclohexanol mix. Furthermore, a 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex of platinum as component (D) (based on the mass unit of platinum metal relative to the entire composition) is mixed. The amount becomes 15ppm) to obtain the composition. The molar ratio of Si-H group/alkenyl group in the composition is 1.0.
[比較例1] 將以MVi 2 D40 表示之黏度60mPa・s之直鏈狀有機聚矽氧烷25質量份、以MVi 1.2 M7.4 Q10 表示之有機聚矽氧烷75質量份、以M2 DH 8 表示之有機氫聚矽氧烷5.3質量份以及1-乙炔基環己醇0.1質量份混合。進而,混合鉑的1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物(以鉑金屬之質量單位計相對於組成物全體成為15ppm之量)獲得組成物。組成物中之Si-H基/烯基之莫耳比為1.0。[Comparative Example 1] 25 parts by mass of a linear organopolysiloxane with a viscosity of 60 mPa·s represented by M Vi 2 D 40 , 75 parts by mass of an organopolysiloxane represented by M Vi 1.2 M 7.4 Q 10 , 5.3 parts by mass of organohydrogen polysiloxane represented by M 2 D H 8 and 0.1 part by mass of 1-ethynylcyclohexanol were mixed. Furthermore, a 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex of platinum (an amount of 15 ppm based on the mass unit of platinum metal relative to the entire composition) was mixed to obtain composition. The molar ratio of Si-H group/alkenyl group in the composition is 1.0.
[比較例2] 將以MVi 2 DF1 60 表示之黏度5,000mPa・s之有機聚矽氧烷30質量份、合成例1所得之有機聚矽氧烷(B-1) 70質量份、以M2 DF1 14 DH 14 表示之有機氫聚矽氧烷18質量份以及1-乙炔基環己醇0.1質量份混合。進而,混合鉑的1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物(以鉑金屬之質量單位計相對於組成物全體成為15ppm之量)獲得組成物。組成物中之Si-H基/烯基之莫耳比為1.0。[Comparative Example 2] 30 parts by mass of organopolysiloxane with a viscosity of 5,000 mPa·s represented by M Vi 2 D F1 60 , 70 parts by mass of organopolysiloxane (B-1) obtained in Synthesis Example 1, and 18 parts by mass of organohydrogen polysiloxane represented by M 2 D F1 14 D H 14 and 0.1 part by mass of 1-ethynylcyclohexanol were mixed. Furthermore, a 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex of platinum (an amount of 15 ppm based on the mass unit of platinum metal relative to the entire composition) was mixed to obtain composition. The molar ratio of Si-H group/alkenyl group in the composition is 1.0.
[比較例3] 將以MVi 2 DF1 10 表示之黏度150mPa・s之直鏈狀有機聚矽氧烷50質量份、合成例1所得之有機聚矽氧烷(B-1) 50質量份、以M2 DF1 14 DH 14 表示之有機氫聚矽氧烷21質量份以及1-乙炔基環己醇0.1質量份混合。進而,混合鉑的1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物(以鉑金屬之質量單位計相對於組成物全體成為15ppm之量)獲得組成物。組成物中之Si-H基/烯基之莫耳比為1.0。[Comparative Example 3] 50 parts by mass of linear organopolysiloxane with a viscosity of 150 mPa·s expressed as M Vi 2 D F1 10 , and 50 parts by mass of organopolysiloxane (B-1) obtained in Synthesis Example 1 , 21 parts by mass of organohydrogen polysiloxane represented by M 2 D F1 14 D H 14 and 0.1 part by mass of 1-ethynylcyclohexanol were mixed. Furthermore, a 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex of platinum (an amount of 15 ppm based on the mass unit of platinum metal relative to the entire composition) was mixed to obtain composition. The molar ratio of Si-H group/alkenyl group in the composition is 1.0.
關於實施例1~3、比較例1~3所用之各成分示於表1。 SiH基/烯基:相對於(A)成分及(B)成分中之1個鍵結至矽原子之烯基的(C)成分中之SiH個數 Pt錯合物:1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷鉑錯合物 Pt(ppm):相對於組成物全體的Pt錯合物量(鉑金屬之質量單位) 反應控制劑:1-乙炔基環己醇Table 1 shows each component used in Examples 1 to 3 and Comparative Examples 1 to 3. SiH group/alkenyl group: The number of SiH in the component (C) relative to one alkenyl group of the component (A) and the component (B) bonded to the silicon atom. Pt complex: 1,3-divene Base-1,1,3,3-tetramethyldisiloxane platinum complex Pt (ppm): Amount of Pt complex relative to the entire composition (mass unit of platinum metal) Reaction control agent: 1-acetylene cyclohexanol
<評價> 針對實施例1~3、比較例1~3所得之組成物,進行下述評價,結果示於表2。 [折射率] 使用折射計(ADAGO公司製,RX-5000)於25℃測定波長598nm之光的折射率。 [光透過率] 針對使組成物以成為2mm厚之方式流入模中,於150℃加熱硬化3小時而得之硬化物,使用分光光度計於25℃測定波長400nm之直進光的光透過率。 [硬度] 依據JIS K6253測定上述硬化物之蕭氏D硬度。 [晶片剪切強度] 使用晶片黏合機(ASM公司製,AD-830),將組成物對於SMD5050封裝(I-CHIUN PRECSION INDUSTRY CO.製,樹脂分:聚鄰苯二甲醯胺)之鍍銀電極部,藉由沖壓進行定量轉印,於其上搭載光半導體元件。所製作之封裝於150℃烘箱中加熱2小時,使組成物硬化,將光半導體元件之下部電極與第1導線電性連接。其次使用打線接合機,將搭載有該光半導體元件之LED用封裝基板使用金線(田中電子工業製,FA 25μm)對光半導體元件之上部電極與第2導線電性連接,使用黏合測試機(Dage公司製,4000系列),進行晶片剪切強度測定。<Evaluation> The following evaluation was performed on the compositions obtained in Examples 1 to 3 and Comparative Examples 1 to 3, and the results are shown in Table 2. [Refractive index] The refractive index of light with a wavelength of 598 nm was measured at 25°C using a refractometer (RX-5000 manufactured by ADAGO Corporation). [Light transmittance] The composition was poured into a mold so as to be 2 mm thick, and the cured product was heated and cured at 150° C. for 3 hours. The light transmittance of straight light with a wavelength of 400 nm was measured at 25° C. using a spectrophotometer. [hardness] The Shore D hardness of the above-mentioned hardened material was measured based on JIS K6253. [Wafer shear strength] Using a wafer bonding machine (AD-830 manufactured by ASM Corporation), the composition is applied to the silver-plated electrode portion of the SMD5050 package (manufactured by I-CHIUN PRECSION INDUSTRY CO., resin component: polyphthalamide) by stamping A quantitative transfer is performed and an optical semiconductor element is mounted thereon. The prepared package was heated in a 150° C. oven for 2 hours to harden the composition, and the lower electrode of the optical semiconductor element was electrically connected to the first lead. Next, use a wire bonding machine to electrically connect the upper electrode of the optical semiconductor element to the second lead using gold wire (FA 25μm, manufactured by Tanaka Electronics Co., Ltd.) on the LED package substrate equipped with the optical semiconductor element, and use a bonding tester ( Dage Co., Ltd., 4000 series) to measure wafer shear strength.
如表2所示,使用本發明之晶片黏合用矽氧樹脂組成物之實施例1~3,折射率未達1.40而較低,係光透過率、硬度及晶片剪切強度均優異者。 另一方面,使用不具有CF3 -(CF2 )m -(CH2 )n -基等之組成物的比較例1,硬度及晶片剪切強度雖優異,但折射率高於1.40,光透過率差。使用高黏度之有機聚矽氧烷之比較例2及(B)成分對於(A)成分之比例脫離本發明範圍之比較例3,顯示硬度顯著較低,晶片剪切強度低,作為晶片黏合材之信賴性低。As shown in Table 2, Examples 1 to 3 using the silicone resin composition for chip bonding of the present invention have a refractive index of less than 1.40 and are excellent in light transmittance, hardness and chip shear strength. On the other hand, Comparative Example 1 using a composition that does not have a CF 3 -(CF 2 ) m -(CH 2 ) n - group or the like has excellent hardness and wafer shear strength, but the refractive index is higher than 1.40 and light is transmitted through it. Rate difference. Comparative Example 2 using high-viscosity organopolysiloxane and Comparative Example 3 in which the ratio of component (B) to component (A) deviates from the scope of the present invention. The hardness is significantly lower and the chip shear strength is low. As a chip bonding material The reliability is low.
又,本發明並非限定於上述實施形態。上述實施形態為例示,凡具有與本發明申請專利範圍中記載之技術思想實質上相同構成,可發揮同樣作用效果者,均包含於本發明之技術範圍內。In addition, the present invention is not limited to the above-described embodiment. The above-mentioned embodiments are examples, and any device that has substantially the same configuration as the technical ideas described in the patent application scope of the present invention and can produce the same functions and effects is included in the technical scope of the present invention.
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