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JP2005175435A5 - - Google Patents

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Publication number
JP2005175435A5
JP2005175435A5 JP2004287734A JP2004287734A JP2005175435A5 JP 2005175435 A5 JP2005175435 A5 JP 2005175435A5 JP 2004287734 A JP2004287734 A JP 2004287734A JP 2004287734 A JP2004287734 A JP 2004287734A JP 2005175435 A5 JP2005175435 A5 JP 2005175435A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004287734A
Other languages
Japanese (ja)
Other versions
JP2005175435A (en
JP4379878B2 (en
Filing date
Publication date
Priority claimed from EP03447239A external-priority patent/EP1521301A1/en
Application filed filed Critical
Publication of JP2005175435A publication Critical patent/JP2005175435A/en
Publication of JP2005175435A5 publication Critical patent/JP2005175435A5/ja
Application granted granted Critical
Publication of JP4379878B2 publication Critical patent/JP4379878B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004287734A 2003-09-30 2004-09-30 Method for selectively forming an air gap and apparatus produced by the method Expired - Fee Related JP4379878B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US50758403P 2003-09-30 2003-09-30
EP03447239A EP1521301A1 (en) 2003-09-30 2003-09-30 Method of formation of airgaps around interconnecting line

Publications (3)

Publication Number Publication Date
JP2005175435A JP2005175435A (en) 2005-06-30
JP2005175435A5 true JP2005175435A5 (en) 2005-11-04
JP4379878B2 JP4379878B2 (en) 2009-12-09

Family

ID=34740672

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004287734A Expired - Fee Related JP4379878B2 (en) 2003-09-30 2004-09-30 Method for selectively forming an air gap and apparatus produced by the method

Country Status (1)

Country Link
JP (1) JP4379878B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100712517B1 (en) * 2005-07-14 2007-04-30 삼성전자주식회사 Interposer of Semiconductor Device with Air Gap Structure
JP4735314B2 (en) * 2006-02-14 2011-07-27 ソニー株式会社 Semiconductor device and manufacturing method thereof
FR2916303B1 (en) * 2007-05-15 2009-07-31 Commissariat Energie Atomique PROCESS FOR PRODUCING AIR CAVITIES USING NANOTUBES
JP2010258215A (en) 2009-04-24 2010-11-11 Renesas Electronics Corp Semiconductor device and manufacturing method of semiconductor device
KR102190654B1 (en) * 2014-04-07 2020-12-15 삼성전자주식회사 Semiconductor device and method of fabricating the same

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