JP2004163964A - Color filter and method for manufacturing the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter such that, in the wettability of a substrate causing problems in forming a pixel part by an ink jet system, a good and a bad part in wettability can be formed in a single layer, while the pattern of these parts of the wettability in ESCA can be easily formed by less processes, that an ink absorbing layer is dispensed with, and that the manufacturing is possible at a low cost for a superior quality, and also to provide a manufacturing method of this color filter. <P>SOLUTION: The color filter. as a means for solving the problems, is characterized in that it has a transparent substrate, a pixel part installed on the transparent substrate in a prescribed pattern in a plurality of colors by the ink jet system, a shading part installed in the boundary of this pixel part, and a variable wettability layer which is installed for the purpose of forming the pixel part or the pixel part and the shading part and which is capable of varying the wettability. <P>COPYRIGHT: (C)2004,JPO

Description

  The present invention relates to a color filter suitable for a color liquid crystal display, which is obtained by coloring a pixel portion by an ink jet method, and a method for manufacturing the same.

  In recent years, with the development of personal computers, especially portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, tends to increase. However, since the color liquid crystal display is expensive, there is an increasing demand for cost reduction, and in particular, there is a high demand for cost reduction for color filters having a high specific gravity.

  Such a color filter usually includes three primary color patterns of red (R), green (G), and blue (B), and turns on electrodes corresponding to R, G, and B pixels. When the switch is turned off, the liquid crystal operates as a shutter, and light passes through each pixel of R, G, and B to perform color display.

  As a conventional method for manufacturing a color filter, a dyeing method is exemplified. In this dyeing method, first, a water-soluble polymer material, which is a material for dyeing, is formed on a glass substrate, and this is patterned into a desired shape by a photolithography process, and the obtained pattern is immersed in a dyeing bath. To obtain a colored pattern. This is repeated three times to form R, G, and B color filter layers.

  Another method is a pigment dispersion method. In this method, first, a photosensitive resin layer in which a pigment is dispersed is formed on a substrate, and a monochromatic pattern is obtained by patterning the photosensitive resin layer. This process is further repeated three times to form R, G, and B color filter layers.

  Further examples of the method include an electrodeposition method and a method in which a pigment is dispersed in a thermosetting resin, R, G, and B are printed three times, and then the resin is thermoset. However, in any of the methods, the same process must be repeated three times in order to color the three colors of R, G, and B, resulting in an increase in cost and a decrease in yield due to the repeated processes. There's a problem.

  As a method of manufacturing a color filter that solves these problems, a method of forming a colored layer (pixel portion) by spraying colored ink by an inkjet method has been proposed (Patent Document 1). Here, when using an ink having good wettability with respect to a glass substrate, a method of printing a convex portion serving as a boundary in advance with a substance having poor wettability with respect to the ink or a method having poor wettability with respect to glass is used. When ink is used, a method is disclosed in which a pattern is formed in advance with a material having good wettability with the ink, and the ink is fixed. However, there is no description as to how to separately apply a material having good wettability and a material having poor wettability.

  On the other hand, as another method of manufacturing a color filter by forming a colored layer (pixel portion) by spraying a colored ink by an inkjet method, Patent Document 2 discloses a method of treating a concave portion with an ink-friendly treating agent. . In this method, a convex portion is formed on a substrate in advance, the convex portion is made ink-repellent, and then the entire substrate is subjected to a surface treatment with an ink-philic treatment agent. However, this method has a problem that it is necessary to perform two processes of the ink-repellent process and the parent-ink process because the convex portion needs to be made ink-repellent in advance when performing the parent-ink process.

  Similarly, as a method of manufacturing a color filter by forming a colored layer by an ink jet method, Patent Documents 3 and 4 disclose providing an ink absorbing layer on a substrate and exposing the ink absorbing property of the absorbing layer to light. A method of forming a colored layer (pixel portion) by changing between a portion and a non-exposed portion is described. However, in this method, since a colored layer is formed by forming an absorption layer and absorbing the ink into the absorption layer, there is a difference in coloring between the central portion and the peripheral portion of the ink dot, resulting in uneven color. There is a problem that it occurs. In addition, there is also a problem that the absorption layer must have a predetermined thickness for its function of absorbing ink.

JP-A-59-75205 JP-A-9-203803 JP-A-8-230314 JP-A-8-227012

  The present invention has been made in view of the above problems, and has a single layer with good wettability and bad wettability with respect to wettability of a substrate which is a problem in forming a pixel portion by an inkjet method. It is possible to easily form the pattern of the portion having good wettability and the portion having bad wettability in a small number of steps. It is an object of the present invention to provide a color filter and a method of manufacturing the same.

  In order to achieve the above object, according to the present invention, in the first aspect, a transparent substrate, a pixel portion in which a plurality of colors are provided in a predetermined pattern by an inkjet method on the transparent substrate, and a pixel portion provided at a boundary portion of the pixel portion are provided. A color filter comprising: a light-shielding portion; and the pixel portion, or a variable wettability layer provided for forming the pixel portion and the light-shielding portion, the wettability variable layer being provided. I do.

  As described above, the present invention is characterized by having a wettability variable layer for forming a pixel portion or for forming a pixel portion and a light shielding portion. Therefore, the pixel portion, or the pixel portion and the light-shielding portion can be accurately formed by utilizing the change in wettability of the wettability variable layer, and a high-quality color filter free from problems such as color omission and color unevenness can be obtained. Can be provided.

  In this case, a configuration may be such that at least the pixel portion is provided on the wettability variable layer. By forming the pixel portion on the wettability variable layer in this manner, the wettability variable layer at the portion where the pixel portion is formed on the wettability variable layer is made an ink-philic region having a small contact angle with the liquid. be able to. By coloring the pixel portion forming portion, which is the lipophilic region, by an ink jet method, ink adheres only to the pixel portion forming portion, which is a lipophilic region having a small contact angle with a liquid, Is uniformly applied to the pixel portion forming portion. Therefore, it is possible to provide a color filter free from inconveniences such as uneven color and missing colors.

  In this way, if at least the pixel portion is provided on the wettability variable layer, the light shielding portion is formed on the transparent substrate, and at least the light shielding portion and the transparent portion are formed on the transparent substrate. The variable wettability layer is provided on a pixel portion forming portion where the pixel portion is formed on the substrate, and even when the pixel portion is formed on the variable wettability layer (the pixel portion may be wetted). A color filter formed on the variable property layer and provided with a variable wettability layer on the light-shielding portion (hereinafter, referred to as a first embodiment), on the transparent substrate as described in claim 7. A wettability variable layer is formed on the variable wettability layer, and even if a pixel portion and a light-shielding portion are provided at predetermined portions on the wettability variable layer (the pixel portion and the light-shielding portion are formed on the wettability variable layer). A color filter, hereinafter referred to as a second embodiment), Further, as described in claim 8, the light-shielding portion is provided on the transparent substrate, and the wettability variable layer is provided in a pixel portion forming portion, which is a portion where the pixel portion is formed on the transparent substrate. Provided, a pixel portion may be formed on the wettability variable layer (a color filter in which the pixel portion is formed on the wettability variable layer and the wettability variable layer is not formed on the light shielding portion, Hereinafter, a third embodiment will be described.)

  In the first embodiment, it is preferable that the width of the pixel portion formed on the variable wettability layer is wider than the width of the opening formed by the light shielding portion. As described above, by forming the width of the pixel portion so as to be wider than the width of the opening portion of the light shielding portion, it is possible to prevent a problem such as color omission such that backlight light passes through a portion where the pixel portion is not formed. This is because it can be prevented.

  In the present invention, it is preferable that an ink-repellent convex portion is formed on the surface of the variable wettability layer provided on the light shielding portion. Thus, by forming the ink-repellent convex portion on the surface of the wettability variable layer provided on the light-shielding portion, the pixel portion is formed with the wettability variable layer of the pixel portion formation portion as the ink-philic region. In addition, since the ink-repellent convex portions are formed between the pixel portion forming portions, it is preferable that problems such as mixing of the ink during coloring do not occur.

  In this case, as described in claim 6, it is preferable that the width of the ink-repellent convex portion is formed to be smaller than the width of the light shielding portion. By forming the width of the ink-repellent convex portion narrower than the width of the light-shielding portion, the width of the pixel portion formed between the ink-repellent convex portions is larger than the width of the opening formed by the light-shielding portion. This is because it can be formed widely, and the above-described effects can be obtained.

  On the other hand, the color filter of the present invention may have a configuration in which the wettability variable layer is provided at a boundary portion of the pixel portion, as described in claim 9. As described above, by setting the wettability on the wettability variable layer at the boundary portion of the pixel portion as an ink-repellent region having a larger contact angle with the liquid than the portion on the transparent substrate on which the pixel portion is formed, When the portion where the portion is provided (the pixel portion forming portion) is colored by the ink jet method, it is difficult for the ink to move beyond the boundary portion of the pixel portion having ink repellency, so that the problem such as color mixing of the ink is caused. No color filter can be provided. Further, thereafter, by making the wettability variable layer at the boundary of the pixel portion an ink-philic region having a small contact angle with the liquid, a light-shielding layer is provided at the boundary portion of the pixel portion, or the protective layer is entirely covered. Can be easily performed, and a high-quality color filter can be obtained.

  In this case, the light shielding portion is formed on the transparent substrate, a variable wettability layer is formed on the light shielding portion, and a pixel portion is formed between the variable wettability layers. (A color filter provided with a variable wettability layer on a light-shielding portion, hereinafter referred to as a fourth embodiment), a light-shielding portion is formed on the transparent substrate as described in claim 12. The variable wettability layer is formed in the light-shielding portion forming portion, which is a portion, and a light-shielding portion is formed on the variable wettability layer, and a pixel portion may be formed between the light-shielding portions (the variable wettability layer). A color filter having a light shielding portion formed thereon, hereinafter referred to as a fifth embodiment).

  In the fourth embodiment, as described in claim 11, it is preferable that the variable wettability layer is formed to have a width smaller than the width of the light shielding portion. Since the width of the variable wettability layer is smaller than the width of the light shielding portion, the width of the pixel portion formed between the variable wettability layers can be larger than the width of the opening of the light shielding portion. Thereby, problems such as missing colors can be prevented.

  In the case of the above-described third embodiment and a color filter in which the wettability variable layer is provided at a boundary portion of the pixel portion as described above, as described in claim 13, on the transparent substrate Is preferably less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m. This is because, in the third embodiment, the light-shielding portion ink and the like spread evenly in the light-shielding portion forming portion, and a uniform light-shielding portion can be formed with high accuracy. In the case of a color filter provided with a variable layer, the pixel portion uniformly spreads in the pixel portion forming portion on the transparent substrate, so that a high-quality color filter without color unevenness can be provided. It is.

  In the present invention, as described in claim 14, the variable wettability layer is a photocatalyst-containing layer composed of at least a photocatalyst and a binder, and is wetted so that a contact angle with a liquid is reduced by energy irradiation. Preferably, the layer has a property that changes. In this way, if the photocatalyst-containing layer whose wettability changes so that the contact angle with the liquid is reduced by energy irradiation is formed, the wettability of this layer can be easily changed by performing energy pattern irradiation or the like. Thus, an ink-philic region having a small contact angle with the liquid can be formed. For example, only a portion where a pixel portion is formed can be easily formed as an ink-philic region. Therefore, a color filter can be manufactured efficiently, which is advantageous in cost.

  In the color filter according to the fourteenth aspect, as described in the fifteenth aspect, when the photocatalyst-containing layer contains fluorine and the photocatalyst-containing layer is irradiated with energy, the action of the photocatalyst is effected. It is preferable that the photocatalyst-containing layer is formed such that the fluorine content on the surface of the photocatalyst-containing layer decreases as compared to before the irradiation with energy.

  As described above, the color filter of the present invention is configured so that the fluorine content of the energy irradiated portion on the photocatalyst containing layer formed on the transparent substrate is reduced. It is possible to form a pattern composed of a portion having a reduced content. When the fluorine content is reduced, the portion becomes a region having higher ink affinity compared with other portions, so that only the portion where the pixel portion or the like is formed can be easily set as the ink affinity region. A color filter can be manufactured.

  Further, in the color filter according to the fifteenth aspect, as described in the sixteenth aspect, energy irradiation is performed on the photocatalyst-containing layer, and the fluorine content at the portion where the fluorine content is reduced is reduced by the energy irradiation. When the fluorine content of the untreated portion is 100, it is preferably 10 or less.

  As described above, the fluorine content in the portion having a low fluorine content formed by the energy irradiation on the photocatalyst-containing layer is 10 or less on a weight basis when the fluorine content in the portion not irradiated with the energy is 100. In this case, it is possible to cause a large difference in ink affinity between the energy-irradiated portion and the non-irradiated portion. Therefore, by forming the pixel portions and the like in the photocatalyst containing layer on which such a pattern is formed, it becomes possible to accurately form the pixel portions and the like only in the ink-philic region having a reduced fluorine content, and with high accuracy A color filter can be manufactured.

The photocatalyst-containing layer used in the present invention comprises at least a photocatalyst and a binder as described above. Among these, the photocatalyst is titanium oxide (TiO ₂ ) or zinc oxide (ZnO ₂ ). ), Tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and iron oxide (Fe ₂ O ₃ ). Preferably, the substance is at least one kind. In particular, as described in claim 18, titanium oxide (TiO ₂ ) is preferable. This is because titanium oxide has a high band gap energy and is effective as a photocatalyst, and is chemically stable, has no toxicity, and is easily available.

  When the photocatalyst described in claim 18 is a color filter in which titanium oxide is used, as described in claim 19, the content of fluorine on the surface of the photocatalyst containing layer is analyzed by X-ray photoelectron spectroscopy. When quantified, it is preferable to have a photocatalyst-containing layer in which the fluorine element is contained on the surface of the photocatalyst-containing layer at a ratio of 500 or more of the fluorine element when the titanium element is set to 100.

  When the fluorine (F) element of this amount is contained, the ink repellency of the unirradiated portion is sufficient, and the pattern of the portion where the fluorine (F) element content is reduced by irradiating the energy is formed. However, when the pixel portion and the like are formed here, the ink and the like do not protrude into portions other than the portion where the pixel portion is formed, and the color filter can be manufactured more accurately.

  On the other hand, in the color filter according to any one of claims 14 to 19, the binder as another component constituting the photocatalyst-containing layer has a fluoroalkyl group as described in claim 20. It is preferable that the organopolysiloxane has an organopolysiloxane.

  In the color filter of the present invention, various methods can be cited as a method of including a fluorine element in the photocatalyst-containing layer, and the photocatalyst-containing layer can be easily formed by using an organopolysiloxane having a fluoroalkyl group as a binder. This is because the elemental fluorine can be contained therein, and the content can be easily reduced by energy irradiation.

Similarly, in the color filter according to any one of the fourteenth to nineteenth aspects, the binder as another component constituting the photocatalyst-containing layer may have a Y-color. _n SiX _(4-n) (where Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group or a halogen, and n represents 0 to 3) It is preferably an organopolysiloxane which is one or more hydrolytic condensates or co-hydrolytic condensates of the silicon compound represented by the following formula:

  In the color filter according to the twenty-first aspect, as described in the twenty-second aspect, among the silicon compounds constituting the organopolysiloxane, 0.01% by mole or more of a silicon compound containing a fluoroalkyl group is contained. Preferably, it is included.

  As described above, when the silicon compound containing a fluoroalkyl group is contained in an amount of 0.01 mol% or more, the surface of the photocatalyst containing layer contains the fluorine element sufficiently. Since the difference in wettability between the reduced amount of the ink-philic region on the photocatalyst-containing layer and the ink-repellent region on the surface of the photocatalyst-containing layer whose energy has not been irradiated can be increased, the pixel portion is added to the ink-philic region. This is because, when forming a color filter or the like, the ink or the like can be accurately adhered without protruding into the ink-repellent region, and a color filter with good quality can be manufactured.

  In the present invention, the contact angle with a liquid having a surface tension of 40 mN / m on the photocatalyst-containing layer is 10 degrees or more in a part where energy is not irradiated, and is less than 10 degrees in a part where energy is irradiated. It is preferable (claims 23 and 40). Since the portion not irradiated with the energy is a portion requiring ink repellency, if the contact angle with a liquid having a surface tension of 40 mN / m is less than 10 degrees, the ink repellency is not sufficient. It is not preferable because the ink and the paint for the light shielding portion may remain. If the contact angle with the liquid having a surface tension of 40 mN / m is 10 degrees or more, the spread of the ink and the light-shielding portion paint in this portion may be inferior. This is because there is a possibility that color dropout or the like may occur.

  Further, in the present invention, it is preferable that the pixel portion colored by the inkjet method is a pixel portion colored by an inkjet method using a UV curable ink (claims 24 and 41). By using a UV curable ink, after forming a pixel portion by coloring with an ink jet method, by irradiating UV, the ink can be quickly cured, and can be immediately sent to the next step, and efficiency is improved. Is preferred.

  A liquid crystal panel having the above-described color filter and a substrate opposed thereto and obtained by enclosing a liquid crystal compound between the two substrates has an advantage of the above-described color filter, that is, a color loss of a pixel portion. There is an advantage that there is no color unevenness and the cost is advantageous (claim 42).

  In the present invention, in order to achieve the above object, as described in claim 25, (1) a step of forming a light shielding portion on a transparent substrate, and (2) a light shielding portion on the transparent substrate is formed. Providing a photocatalyst-containing layer in which the wettability of the energy-irradiated portion changes in the direction in which the contact angle of the liquid decreases on the surface on the side of the photocatalyst; and (3) a portion for forming a pixel portion on the photocatalyst-containing layer. Forming a pixel portion by irradiating the pixel portion formation portion with energy to form a pixel portion exposure portion; and (4) forming a pixel portion by coloring the pixel portion exposure portion by an inkjet method. (Hereinafter referred to as a sixth embodiment).

  As described above, in the present embodiment, the photocatalyst-containing layer is provided on the transparent substrate on which the light-shielding portion is formed in advance, and the pixel portion-forming portion on the photocatalyst-containing layer is irradiated with energy in a pattern, so that the pixel portion can be easily formed. Can be made ink-philic only. Therefore, by applying the ink to the exposed portion for the pixel portion where the pixel portion is formed by the ink jet method, the pixel portion to which the ink is uniformly attached can be obtained, and the color filter without color omission and without color unevenness can be obtained. Can be formed.

  In the case of the sixth embodiment, as described in claim 26, after the step of providing the photocatalyst-containing layer, the photocatalyst-containing layer on the light-shielding portion is irradiated with energy in a pattern to form an exposed portion for the ink-repellent convex portion. And a step of forming an ink-repellent convex portion here.

  As described above, since the pattern is also irradiated with the energy on the photocatalyst-containing layer on the light-shielding portion to provide the exposure for the ink-repellent convex portion, it is necessary to form the exposed portion for the ink-repellent convex portion with a predetermined width. Can be. Therefore, by applying an ink-repellent convex paint to this region, it is possible to obtain an ink-repellent convex portion having a predetermined width at a uniform height.

  Further, in a sixth embodiment of the present invention, in the step of forming the exposure section for the pixel section, the step of forming the exposure section for the pixel section is performed by exposing from the transparent substrate side using the light shielding section as a mask. An exposed portion may be formed. By exposing the entire surface from the transparent substrate side, that is, the side where the light-shielding portion is not formed, only the portion of the photocatalyst-containing layer formed on the upper surface of the light-shielding portion is not exposed, and other portions can be exposed. Therefore, energy pattern irradiation can be performed without using a photomask or the like, which is advantageous in cost.

  Further, according to the present invention, as set forth in claim 28, (1) a step of providing a photocatalyst-containing layer in which the wettability of an energy-irradiated portion changes in a direction in which the contact angle with a liquid decreases on a transparent substrate; 2) a step of irradiating energy on the light-shielding portion forming portion, which is a portion where the light-shielding portion is formed on the transparent substrate, to form an exposure portion for the light-shielding portion; Providing a portion, (4) irradiating energy to the transparent substrate provided with the light-shielding portion to form an exposure portion for a pixel portion, and (5) applying an inkjet method to the exposure portion for the pixel portion. A method of producing a color filter (hereinafter, referred to as a seventh embodiment).

  As described above, in the method for manufacturing a color filter according to the present embodiment, the photocatalyst-containing layer is provided on the transparent substrate, and the photocatalyst-containing layer is irradiated with energy to reduce the contact angle of the exposed portion with the liquid. Can be. Therefore, first, when forming the light-shielding portion, simply irradiating the pattern of energy to the photocatalyst-containing layer to make only the region where the light-shielding portion is formed an ink-philic region, and then apply a light-shielding portion paint to this portion. A light-shielding portion can be formed. Therefore, since there is no need to perform a developing step or an etching step after pattern exposure, which has been performed when the conventional light shielding portion is provided, the light shielding portion can be efficiently formed. Thereafter, by irradiating the entire surface with energy, for example, a region where the pixel portion is easily formed can be made an ink-philic region. Therefore, if this portion is colored by an ink jet method, a pixel portion to which ink is uniformly attached can be formed, and a color filter without color omission or color unevenness can be formed.

  Further, according to the present invention, as described in claim 29, (1) a step of providing a photocatalyst-containing layer in which the wettability of an energy-irradiated portion changes in a direction in which the contact angle of a liquid decreases on a transparent substrate; And (3) a step of irradiating a pattern with energy to a pixel portion forming portion, which is a portion where the pixel portion on the transparent substrate is formed, to form a pixel portion exposing portion. (4) irradiating energy to at least the photocatalyst-containing layer at the boundary portion of the pixel portion, and (5) shielding the boundary portion of the pixel portion irradiated with the energy. Forming a part (hereinafter referred to as an eighth embodiment).

  In this case, the photocatalyst containing layer is formed on at least the pixel portion forming portion on the transparent substrate where the pixel portion is formed and the light shielding portion forming portion on which the light shielding portion is formed. Then, first, by irradiating the above-mentioned pixel portion forming portion with a pattern of energy, the pixel portion forming portion of the photocatalyst containing layer can be made an ink-philic region. Therefore, by applying the ink here by the ink jet method, the ink spreads evenly and color unevenness does not occur. Further, the light-shielding portion forming portion, which is a boundary portion with the pixel portion, remains in the ink-repellent region since energy is not irradiated. Therefore, it can be said that it is difficult for the ink attached to the pixel portion forming portion, which is the ink-philic region, to move beyond the light-shielding portion forming portion, which is the ink-repellent region. Therefore, a problem such as mixing of ink does not occur. After forming the pixel portion in this manner, by irradiating energy to the light shielding portion forming portion between the pixel portions, this portion can be made an ink-philic region. Therefore, the light-shielding portion can be easily formed by applying, for example, ink for the light-shielding portion to this portion.

  Further, according to the present invention, as described in claim 30, (1) a photocatalyst-containing layer in which the wettability of an energy-irradiated portion changes in the direction in which the contact angle with a liquid decreases on a transparent substrate is provided on the transparent substrate. (2) providing a light-shielding portion at a boundary between the pixel-forming portion where the photocatalyst-containing layer is provided, and (3) providing the photocatalyst. A step of irradiating the containing layer with energy to form an exposed portion for a pixel portion, and (4) a step of coloring the exposed portion for a pixel portion by an inkjet method to form a pixel portion. A method of manufacturing a filter (hereinafter, referred to as a ninth embodiment) is provided.

  In this case, first, a photocatalyst-containing layer is formed on a pixel portion forming portion, which is a portion where the pixel portion is formed on the transparent substrate. When a material having a higher contact angle with the liquid than the substrate surface before the irradiation of energy is used for the photocatalyst-containing layer, the photocatalyst-containing layer has a higher contact angle with the liquid than the pixel portion where the photocatalyst-containing layer is formed. The light-shielding portion forming portion on the substrate is an ink-philic region having a smaller contact angle with the liquid. By forming the light-shielding portion in this ink-philic region using, for example, a light-shielding portion paint, the light-shielding portion can be easily formed first. Next, for example, by irradiating energy to the entire surface on which the light shielding portion is formed, the pixel portion forming portion can be made an ink-philic region. Therefore, by coloring this area by the ink jet method, a pixel portion to which ink is uniformly attached can be obtained, and a color filter without color loss and color unevenness can be formed.

  Further, in the present invention, as described in claim 31, (1) a step of forming a light-shielding portion on a transparent substrate, and (2) a wettability of an energy-irradiated portion is in contact with a liquid on the upper surface of the light-shielding portion. Providing a photocatalyst-containing layer that changes in the direction in which the angle decreases, and (3) using an inkjet method in a pixel-portion-forming portion where a pixel portion is formed on a transparent substrate on which the photocatalyst-containing layer is not provided. A method of manufacturing a color filter (hereinafter, referred to as a tenth embodiment), which comprises a step of coloring and forming a pixel portion.

  In this case, first, a light-shielding portion is formed on the transparent substrate, and a photocatalyst-containing layer is formed on the light-shielding portion. When a material having a high contact angle is used, the pixel portion forming portion between the photocatalyst containing layer becomes an ink-philic region having a smaller contact angle with the liquid than the photocatalyst containing layer, and the photocatalyst containing portion which is a boundary portion of the pixel portion forming portion is used. The layer becomes an ink-repellent area. Therefore, when the ink is applied to the pixel portion forming portion which is the ink-philic region by the inkjet method, it is difficult for the attached ink to move beyond the light-shielding portion forming portion which is the ink-repellent region. Therefore, problems such as color mixing of inks are unlikely to occur.

  Further, in the present invention, as described in claim 32, (1) a photocatalyst-containing layer in which the wettability of an energy-irradiated portion changes in a direction in which the contact angle of a liquid decreases on a transparent substrate is provided on the transparent substrate. A step of providing a light-shielding portion forming portion, which is a portion where the light-shielding portion is formed, and (2) a step of coloring a portion of the transparent substrate on which the photocatalyst-containing layer is not formed by an inkjet method to form a pixel portion; (3) a method of manufacturing a color filter, comprising: at least a step of irradiating the photocatalyst-containing layer with energy; and (4) a step of forming a light-shielding layer on the photocatalyst-containing layer irradiated with the energy. Hereinafter, an eleventh embodiment will be provided.

  In this case, the photocatalyst-containing layer is provided on the light-shielding portion forming portion where the light-shielding portion is formed on the substrate. When a material having a higher contact angle with the liquid than the surface of the transparent substrate before the energy irradiation is used for the photocatalyst-containing layer, a pixel portion is formed between the light-shielding portion formation portion where the photocatalyst-containing layer is formed. The portion becomes an ink-philic region having a smaller contact angle with the liquid, and the light-shielding portion forming portion, which is a boundary portion with the pixel portion forming portion, becomes an ink-repellent region. Therefore, when the ink is applied to the pixel portion forming portion, which is the ink-philic region, by the inkjet method, the attached ink does not move beyond the light-shielding portion forming portion, which is the ink-repellent region. Therefore, problems such as color mixing of ink do not occur. After the pixel portion is formed in this way, by irradiating the photocatalyst containing layer of the light shielding portion forming portion between the pixel portions with energy, this portion can be made an ink-philic region. Therefore, the light-shielding portion can be easily formed by applying, for example, ink for the light-shielding portion to this portion.

  Furthermore, in the sixth embodiment and the eighth embodiment of the present invention, as described in claim 33, after forming the exposure section for the pixel section, the pixel section is colored by an ink jet method. And (b) forming a first pixel portion exposure portion by irradiating a part of a portion on the photocatalyst containing layer where a pixel portion is to be formed with energy by pattern irradiation, and (b) forming the first pixel portion exposure portion. A step of forming the first pixel portion by coloring the exposed portion for the pixel portion by an ink-jet method; and (c) exposing a portion of the photocatalyst-containing layer on which the remaining pixel portion is to be formed to expose the second pixel portion. And (d) forming a second pixel portion by coloring the exposed portion for the second pixel portion by an inkjet method.

  That is, in any of the embodiments, a pixel portion is formed by exposing an exposed portion for a pixel portion, and coloring the portion by an ink jet method to form a pixel portion. And the second pixel portion, in which energy irradiation and ink-jet coloring are performed, respectively.

  When the pixel portion is formed by coloring the exposed portion for the pixel portion, which has been made to be the ink-philic region by the energy irradiation, by an inkjet method, and the interval between the exposed portions for the pixel portion is small, There is a possibility that the inks of the pixel portions adjacent to each other beyond the ink-repellent region or the like may be mixed. Therefore, when forming the pixel portion, it is desirable to form the pixel portions as far apart as possible. As described above, if the method of forming the first pixel portion and then forming the second pixel portion is adopted, for example, when forming the first pixel portion, every other pixel portion is formed. Pattern exposure can be performed at a time, and adjacent pixel portions can be separated from each other at the time of forming the first image portion. In this manner, the first pixel portion exposure portion is formed in a state having a relatively wide ink-repellent region between the coloring regions, and coloring is performed by the inkjet method here, so that the ink of the adjacent pixel portion is removed. The possibility of the inconvenience of mixing is eliminated. By irradiating energy again between the first pixel portions provided in this manner, an exposure portion for the second pixel portion is formed, and the portion is colored by an ink jet method, so that a color free from troubles such as mixing of ink is obtained. A filter can be formed.

  In the sixth and tenth embodiments of the present invention, the width of the pixel portion is formed wider than the width of the opening formed by the light-shielding portion. Is preferred. By thus making the width of the pixel portion wider than the opening formed by the light-shielding portion, it is possible to reduce the possibility that backlight light passes through portions other than the pixel portion, and to prevent color omission and the like. Because it can be.

  Further, in the ninth, tenth, and eleventh embodiments of the present invention, as described in claim 35, the wettability on the transparent substrate is determined by the liquid having a surface tension of 40 mN / m. The contact angle is preferably less than 10 degrees. In any of the embodiments, after a photocatalyst-containing layer having ink repellency is formed as compared with a transparent substrate, a pixel portion or a light shielding portion is provided in a portion where the photocatalyst-containing layer is not formed. If the wettability is less than 10 degrees as the contact angle with a liquid having a surface tension of 40 mN / m, the liquid is easy to spread. For example, in the case of the pixel part, the ink for inkjet is spread uniformly, so that a pixel part without color unevenness is obtained. Thus, a high quality color filter can be obtained.

  In the present invention, the energy for irradiating and exposing the photocatalyst-containing layer to light is usually light including ultraviolet light as described in claim 36. In this case, as described in claim 37, the photocatalytic reaction initiation energy and the reaction rate increasing energy are used as the energy, and the reaction rate increasing energy is applied to the portion irradiated with the photocatalytic reaction initiation energy, whereby the exposed portion is exposed. May be formed.

  In this method, a photocatalytic reaction start energy is applied to a photocatalyst-containing layer, and a reaction rate increasing energy is applied in a pattern in a region where the photocatalytic reaction start energy is applied, thereby forming a pattern of an exposed portion. That is, since the formation of a pattern by photolithography irradiation proposed by the inventors and the like has been based on the photocatalytic reaction initiation energy such as the ultraviolet light, the apparatus is expensive, difficult to handle, and cannot perform continuous output. In some cases. However, in this method, a photocatalytic reaction start energy such as ultraviolet light is added, and a pattern is formed by using a reaction speed increasing energy such as infrared light in a region where the photocatalytic reaction start energy is added. In forming a pattern, there is an advantage that a reaction speed increasing energy such as an infrared laser which is relatively inexpensive and easy to handle can be used.

  In the present invention, when the two energies of the photocatalytic reaction initiation energy and the reaction rate increase energy are used as described above, the photocatalytic reaction initiation energy is light including ultraviolet light, Preferably, the reaction rate increasing energy is heat energy. This is because, in the present invention, titanium dioxide is suitably used as a photocatalyst, but ultraviolet light is preferred as the photocatalytic reaction initiation energy in view of the band gap of the titanium dioxide. Further, it is preferable that the reaction rate increasing energy is heat, and it is preferable that the heat energy be applied by an infrared laser as described in claim 39. This is because the method using an infrared laser is relatively inexpensive and easy to handle.

  The present invention is directed to a transparent substrate, a pixel portion in which a plurality of colors are provided in a predetermined pattern by an inkjet method on the transparent substrate, a light-shielding portion provided at a boundary portion of the pixel portion, the pixel portion or the pixel portion and A color filter comprising: a wettability variable layer provided to form a light-shielding portion and capable of changing wettability. Therefore, the pixel portion or the pixel portion and the light-shielding portion can be accurately formed by utilizing the change in the wettability of the wettability variable layer, and a high-quality color filter free from problems such as color omission and color unevenness can be reduced. Can be provided at cost.

  Hereinafter, the present invention will be described in detail. First, a color filter will be described, and then a method of manufacturing the color filter will be described.

A. First, the color filter of the present invention will be described in detail. The color filter of the present invention is a transparent substrate, a pixel portion in which a plurality of colors are provided in a predetermined pattern by an inkjet method on the transparent substrate, a light-shielding portion provided at a boundary portion of the pixel portion, the pixel portion, Alternatively, it has a wettability variable layer provided for forming a pixel portion and a light-shielding portion and capable of changing wettability.

  The present invention has a variable wettability layer provided for forming a pixel portion or for forming a pixel portion and a light shielding portion as described above. Therefore, the pixel portion or the pixel portion and the light-shielding portion can be easily formed by changing the wettability of the wettability variable layer, so that a high-quality color filter can be obtained at low cost. Here, to form a pixel portion, or a pixel portion and a light-shielding portion, means to position the pixel portion or the pixel portion and the light-shielding portion on a transparent substrate.

  As a specific positional relationship of each element of such a color filter, for example, there can be cited one in which at least the pixel portion is provided on the variable wettability layer.

  As described above, since at least the pixel portion is provided on the wettability variable layer, the wettability of the portion where the pixel portion is provided is set in advance as an ink-philic region having a small contact angle with the liquid, and the other portion is formed with the liquid. An ink-repellent region having a large contact angle can be obtained. By coloring the portion where the pixel portion is provided by the ink jet method, the ink adheres only to the ink-philic region having a small contact angle of the liquid, so that the ink uniformly spreads over the entire pixel portion, and the ink-free region in the pixel portion. No color unevenness occurs, and ink does not adhere to other ink-repellent areas.

  Further, as another specific positional relationship of each element in the color filter of the present invention, for example, an example in which a wettability variable layer is formed at a boundary portion of a pixel portion can be cited. In this case, by setting the wettability of the boundary portion of the pixel portion as an ink-repellent region that is worse than the wettability of the portion where the pixel portion is provided, the ink-repellent property is obtained when the portion where the pixel portion is provided is colored by an inkjet method. Since it is difficult for the ink to move beyond the boundary portion of the pixel portion having the color filter, it is possible to provide a color filter free from problems such as mixing of the ink. After that, by applying a stimulus or the like to make the wettability variable layer at the boundary of the pixel portion an ink-philic region having a small contact angle with the liquid, a light-shielding layer is provided at the boundary portion of the pixel portion, or The protection layer can be easily covered, and a high-quality color filter can be obtained.

  Hereinafter, the color filter of the present invention having such a wettability variable layer will be described in detail using some embodiments.

1. The first embodiment of the present invention is directed to a first embodiment of the present invention, wherein a light-shielding portion is formed on a transparent substrate, and at least the light-shielding portion and a pixel portion forming portion which is a portion on the transparent substrate where the pixel portion is formed. Is a color filter provided with a variable wettability layer, and a pixel portion can be formed with high precision by changing the wettability on the variable wettability layer. This shows an example in which a wettability variable layer is provided to form a pixel portion, and at least the pixel portion described above is one of specific examples of a color filter provided on the wettability variable layer. is there.

  FIG. 1 shows an example of the first embodiment. The color filter 1 is provided on a light-shielding portion 3 provided on a transparent substrate 2, further on the light-shielding portion 3, and on a pixel portion forming portion 4 where a pixel portion on the transparent substrate 2 is formed. And a pixel section 6 formed in the pixel section forming section 4 on the wettability variable layer 5. Here, the pixel portion forming portion 4 indicates a horizontal position on the surface of the transparent substrate 2 where the pixel portion 6 is formed, and may be on the transparent substrate 2 or on the wettability variable layer 5. . The light-shielding portion 3 is also called a black matrix, and is usually formed at a boundary portion of the pixel portion 6.

  In the color filter of the first embodiment, the pixel portion forming portion 4 on the wettability variable layer 5 is irradiated with energy in a pattern to irradiate the pixel portion forming portion 4 on the variable wettability layer 5 with ink. It can be an area. Therefore, by coloring the ink with the ink-jet method in this region, a high-quality color filter having a uniform pixel portion without color unevenness can be obtained.

  In the first embodiment of the present invention, it is preferable that the width of the pixel portion 6 is formed wider than the width of the opening formed by the light shielding portion 3. By adopting such a configuration, when the color filter is mounted and the backlight is applied, the backlight does not pass through the portion where the pixel portion is not formed, and high quality without color omission is provided. This is because it can be a color filter.

  FIG. 2 shows another example of the first embodiment. In this example, an ink-repellent convex portion 7 is formed on the variable wettability layer 5 on the light shielding portion 3. As described above, since the ink-repellent convex portions 7 are formed on the color filter 1 of this example, when the ink is applied to the pixel portion forming portion 4 by the ink jet method, the ink-repellent convex portions 7 are formed. Since ink does not flow out, a color filter having a pixel portion that does not mix with other color inks can be obtained. In this case, the width of the ink-repellent convex portion 7 is not particularly limited, but is preferably smaller than the width of the light shielding portion 3 as shown in FIG. With this configuration, when the pixel section 6 is formed, the width of the pixel section 6 can be made wider than the width of the opening of the light shielding section 3, and the above-described effects can be obtained. . Therefore, a high-quality color filter without color omission can be obtained.

  Hereinafter, each component constituting such a color filter will be described.

(Wetting variable layer)
The wettability variable layer 5 is not particularly limited as long as its wettability on the surface can be changed by an external stimulus such as a physical stimulus or a chemical stimulus. For example, a layer whose surface roughness changes due to an acid or alkali or the like and the wettability changes may be used, or a wettability variable layer may be irradiated with ultraviolet light, visible light, or even energy such as heat. It may be a layer or the like in which the wettability changes due to a change in the substance inside.

  Regarding the change in wettability, even if the wettability variable layer changes such that the contact angle with the liquid is large before the stimulus is applied, and the contact angle with the liquid is reduced after the stimulus is applied. Alternatively, the wettability variable layer may have a small contact angle with the liquid before the stimulus is applied, and a large change in the contact angle with the liquid after the stimulus is applied.

(Photocatalyst containing layer)
In the present invention, it is preferable that the variable wettability layer is a photocatalyst-containing layer whose wettability changes so that the contact angle with a liquid is reduced by energy irradiation. In this way, the wettability is reduced so that the contact angle with the liquid is reduced by the exposure (in the present invention, it means not only the irradiation of light but also the irradiation of energy). By providing a photocatalyst-containing layer that changes, wettability can be easily changed by performing energy pattern irradiation or the like, and a small ink-philic region having a small contact angle with a liquid can be formed, for example, a pixel portion is formed. It is possible to easily set the ink-philic region only at the portion where the ink is present. Therefore, a color filter can be manufactured efficiently, which is advantageous in cost. In this case, light including ultraviolet light is usually used as energy.

  Here, the ink-philic region is a region where the contact angle with the liquid is small, and is a region having good wettability with the ink for inkjet or the paint for the light shielding portion. The ink-repellent region is a region having a large contact angle with the liquid, and is a region having poor wettability with the ink for ink jet or the light-shielding portion paint.

  The photocatalyst-containing layer has a contact angle with a liquid having a surface tension of 40 mN / m of at least 10 degrees, preferably a contact angle with a liquid having a surface tension of 30 mN / m of at least 10 degrees, particularly at the surface not exposed. The contact angle with a liquid having a tension of 20 mN / m is preferably 10 degrees or more. This is because the non-exposed portion is a portion requiring ink repellency in the present invention, so that when the contact angle with the liquid is small, the ink repellency is not sufficient, and the ink or light shielding portion This is because there is a possibility that the paint remains, which is not preferable.

  When the photocatalyst-containing layer is exposed to light, the contact angle with the liquid decreases, and the contact angle with the liquid having a surface tension of 40 mN / m is less than 10 degrees, preferably the contact angle with the liquid having a surface tension of 50 mN / m. It is preferable that the layer has a contact angle of 10 degrees or less, particularly 10 degrees or less with a liquid having a surface tension of 60 mN / m. If the contact angle with the liquid in the exposed portion is high, the spread of the ink and the light-shielding portion paint in this portion may be inferior, and color missing or the like may occur in the pixel portion.

  In addition, the contact angle with the liquid referred to here is a contact angle with a liquid having various surface tensions measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) (from the micro syringe to the liquid). 30 seconds after dropping) and obtained from the results or as a graph. In this measurement, wetting index standard solutions manufactured by Junsei Chemical Co., Ltd. were used as liquids having various surface tensions.

  The photocatalyst containing layer of the present invention is preferably composed of at least a photocatalyst and a binder. With such a layer, the critical surface tension can be increased by the action of a photocatalyst by light irradiation, and the contact angle with the liquid can be reduced.

  In such a photocatalyst containing layer, the action mechanism of the photocatalyst represented by titanium oxide as described later is not necessarily clear, but the carrier generated by light irradiation is a direct reaction with a nearby compound, or It is considered that the reactive oxygen species generated in the presence of oxygen, water and water change the chemical structure of organic matter.

  By using the action of such a photocatalyst, oily dirt is decomposed by light irradiation and made hydrophilic so that it can be washed with water, or a hydrophilic film is formed on the surface of glass or the like to impart anti-fog properties, Alternatively, a so-called antibacterial tile or the like has been proposed in which a layer containing a photocatalyst is formed on the surface of a tile or the like to reduce the number of airborne bacteria.

  When a photocatalyst-containing layer is used as the wettability variable layer in the present invention, the photocatalyst changes the wettability of an exposed portion by using an action such as oxidation or decomposition of an organic group or an additive that is a part of a binder. It can be made to be ink-philic, and can cause a large difference in wettability with a non-exposed portion. Therefore, by improving the receptivity (ink-affinity) and repellency (ink-repellency) with the light-shielding portion paint or ink-jet ink, it is possible to obtain a color filter of good quality and advantageous in cost. it can.

  When such a photocatalyst-containing layer is used in the present invention, the photocatalyst-containing layer contains at least a photocatalyst and fluorine, and the fluorine content on the surface of the photocatalyst-containing layer irradiates the photocatalyst-containing layer with energy. At this time, the photocatalyst-containing layer may be formed such that the photocatalyst-containing layer is reduced by the action of the photocatalyst as compared with before the energy irradiation.

  In a color filter having such characteristics, by irradiating a pattern with energy, it is possible to easily form a pattern including a portion having a low fluorine content. Here, fluorine has an extremely low surface energy, so that the surface of a substance containing a large amount of fluorine has a smaller critical surface tension. Therefore, the critical surface tension of the portion having a small content of fluorine is higher than the critical surface tension of the surface of the portion having a large content of fluorine. This means that a portion having a low fluorine content is an ink-philic region compared to a portion having a high fluorine content. Therefore, forming a pattern including a portion having a smaller fluorine content than the surrounding surface forms a pattern of the ink-philic region in the ink-repellent region.

  Therefore, when such a photocatalyst-containing layer is used, the pattern of the ink-philic region can be easily formed in the ink-repellent region by pattern irradiation with energy. Thus, it is possible to easily form a pixel portion and the like, and a high quality color filter can be obtained.

  As described above, the content of fluorine contained in the photocatalyst containing layer containing fluorine is lower than the fluorine content in the ink-philic region having a low fluorine content formed by irradiation with energy. When the fluorine content is 100, it is preferably 10 or less, more preferably 5 or less, and particularly preferably 1 or less.

  By setting it within such a range, it is possible to cause a large difference in ink affinity between the energy irradiated portion and the unirradiated portion. Therefore, by forming a pixel portion or the like in such a photocatalyst containing layer, it becomes possible to accurately form a pixel portion or the like only in the ink-philic region having a reduced fluorine content, and to obtain a color filter with high accuracy. Because it can be. In addition, this reduction rate is based on weight.

  For the measurement of the fluorine content in the photocatalyst-containing layer, it is possible to use various commonly-used methods, for example, X-ray photoelectron spectroscopy (X-ray Photoelectron Spectroscopy, ESCA (Electron Spectroscopy). The method is not particularly limited as long as it is a method capable of quantitatively measuring the amount of fluorine on the surface, such as X-ray fluorescence analysis and mass spectrometry.

The photocatalyst used in the present invention includes, for example, titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), which are known as optical semiconductors. Bismuth oxide (Bi ₂ O ₃ ) and iron oxide (Fe ₂ O ₃ ) can be given, and one or a mixture of two or more thereof can be used.

  In the present invention, titanium oxide is particularly preferably used because it has a high band gap energy, is chemically stable, has no toxicity, and is easily available. Titanium oxide includes anatase type and rutile type, and any of them can be used in the present invention. Anatase type titanium oxide is preferable. Anatase type titanium oxide has an excitation wavelength of 380 nm or less.

  Examples of such anatase-type titanium oxide include anatase-type titania sol of peptic hydrochloride type (STS-02 (average particle size: 7 nm) manufactured by Ishihara Sangyo Co., Ltd .; ST-K01 manufactured by Ishihara Sangyo Co., Ltd.); Glue-type anatase titania sol (TA-15 (average particle diameter: 12 nm) manufactured by Nissan Chemical Industries, Ltd.) and the like can be mentioned.

  The smaller the particle size of the photocatalyst is, the more effective the photocatalytic reaction takes place. The average particle size is preferably 50 nm or less, more preferably 20 nm or less. Further, the smaller the particle size of the photocatalyst, the smaller the surface roughness of the formed photocatalyst-containing layer is preferable. If the particle size of the photocatalyst exceeds 100 nm, the center line average surface roughness of the photocatalyst-containing layer becomes coarse, It is not preferable because the ink repellency of the non-exposed portion of the containing layer is reduced, and the expression of ink affinity in the exposed portion is insufficient.

  As described above, the color filter of the present invention contains fluorine on the surface of the photocatalyst-containing layer, and pattern irradiation of energy on the surface of the photocatalyst-containing layer reduces the fluorine content on the surface of the photocatalyst-containing layer. A color filter obtained by forming a pattern of an ink-philic region in a hydrophilic region and forming a pixel portion or the like on the pattern may be used. Even in this case, it is preferable to use the titanium dioxide as described above as the photocatalyst. However, when titanium dioxide is used in this way, the content of fluorine contained in the photocatalyst containing layer is determined by X-ray photoelectron. When analyzed by spectroscopy and quantified, when the titanium (Ti) element is taken as 100, the fluorine (F) element has a ratio of 500 or more, preferably 800 or more, particularly preferably 1200 or more. ) The element is preferably contained on the surface of the photocatalyst-containing layer.

  When fluorine (F) is contained in the photocatalyst-containing layer to this extent, the critical surface tension on the photocatalyst-containing layer can be sufficiently reduced, so that the ink repellency on the surface can be ensured. This is because the difference in wettability between the surface and the ink-philic region in the pattern portion in which the fluorine content is reduced can be increased, and the quality of the finally obtained color filter can be improved.

  Further, in such a color filter, the fluorine content in the parent ink region formed by irradiating the energy with a pattern is such that the fluorine (F) element is 50 or less when the titanium (Ti) element is 100, and preferably 50 or less. It is preferably contained in a ratio of 20 or less, particularly preferably 10 or less.

  If the content of fluorine in the photocatalyst-containing layer can be reduced to this extent, sufficient ink-affinity can be obtained for forming a pixel portion and the like, and the ink repellency of a portion where the energy has not been irradiated can be obtained. Due to the difference in wettability, the pixel portion and the like can be formed with high accuracy, and a high-quality color filter can be obtained.

  In the present invention, the binder used for the photocatalyst-containing layer preferably has a high binding energy such that the main skeleton is not decomposed by the photoexcitation of the photocatalyst. For example, (1) chloro or alkoxysilane is used by a sol-gel reaction or the like. Examples thereof include organopolysiloxanes that exhibit great strength by hydrolysis and polycondensation, and (2) organopolysiloxanes obtained by crosslinking reactive silicones having excellent water repellency and oil repellency.

In the case of the above (1), the general formula:
Y _n SiX _(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen. N is an integer of 0 to 3. )
Is preferably an organopolysiloxane which is one or more hydrolytic condensates or cohydrolytic condensates of the silicon compound represented by Here, the carbon number of the group represented by Y is preferably in the range of 1 to 20, and the alkoxy group represented by X is preferably a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. preferable.

Specifically, methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane; ethyltrichlorosilane, ethyltribromosilane, ethyltrimethoxysilane, Ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltri-t-butoxysilane; n-propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltriisopropoxy Silane, n-propyltri-t-butoxysilane; n-hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane, n-hexyltriethoxysilane, n-hexyl Rutriisopropoxysilane, n-hexyltri-t-butoxysilane; n-decyltrichlorosilane, n-decyltribromosilane, n-decyltrimethoxysilane, n-decyltriethoxysilane, n-decyltriisopropoxysilane, n -Decyltri-t-butoxysilane; n-octadecyltrichlorosilane, n-octadecyltribromosilane, n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n-octadecyltrit-butoxysilane Phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltri-t-butoxysilane; tetrachlorosilane Tetrabromosilane, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane; dimethyldichlorosilane, dimethyldibromosilane, dimethyldimethoxysilane, dimethyldiethoxysilane; diphenyldichlorosilane, diphenyldibromosilane, Diphenyldimethoxysilane, diphenyldiethoxysilane;
Phenylmethyldichlorosilane, phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane; trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane, triethoxyhydrosilane, triisopropoxyhydrosilane, tri-t-butoxyhydrosilane; vinyl Trichlorosilane, vinyltribromosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltri-t-butoxysilane; trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, trifluoropropyltrimethoxysilane, Trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane, trifluoroprop L-t-butoxysilane; γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-gly Sidoxypropyltriisopropoxysilane, γ-glycidoxypropyltri-t-butoxysilane; γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-methacryloxypropyltrimethoxysilane Γ-methacryloxypropyltriethoxysilane, γ-methacryloxypropyltriisopropoxysilane, γ-methacryloxypropyltri-t-butoxysilane; γ-aminopropylmethyldimethoxysilane, γ-aminopropyl Tildiethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltriisopropoxysilane, γ-aminopropyltri-t-butoxysilane; γ-mercaptopropylmethyldimethoxysilane, γ- Mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, γ-mercaptopropyltriisopropoxysilane, γ-mercaptopropyltri-t-butoxysilane; β- (3,4-epoxy Cyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane; and partial hydrolysates thereof; and mixtures thereof can be used.

Further, as the binder, a polysiloxane containing a fluoroalkyl group can be particularly preferably used. Specifically, one or more hydrolyzed condensates and co-hydrolyzed condensates of the following fluoroalkylsilanes are preferably used. For example, those generally known as a fluorine-based silane coupling agent can be used.
CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
(CF ₃ ) ₂ CF (CF ₂ ) ₆ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
(CF ₃ ) ₂ CF (CF ₂ ) ₈ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
CF ₃ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₃ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₅ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₇ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
(CF ₃ ) ₂ CF (CF ₂ ) ₆ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si CH 3 (OCH 3) 2;
CF ₃ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₃ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₅ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₇ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;
CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;
CF ₃ (CF ₂ ) ₇ SO ₂ N (C ₂ H ₅ ) C ₂ H ₄ CH ₂ Si (OCH ₃ ) ₃
By using a polysiloxane containing a fluoroalkyl group as described above as a binder, the ink repellency of the non-exposed portion of the photocatalyst-containing layer is greatly improved, and the function of preventing the adhesion of the light-shielding portion paint or the ink for the inkjet method is improved. Express.

  Examples of the reactive silicone of the above (2) include compounds having a skeleton represented by the following general formula.

ただし、ｎは２以上の整数であり、Ｒ^１，Ｒ^２はそれぞれ炭素数１〜１０の置換もしくは非置換のアルキル、アルケニル、アリールあるいはシアノアルキル基であり、モル比で全体の４０％以下がビニル、フェニル、ハロゲン化フェニルである。また、Ｒ^１、Ｒ^２がメチル基のものが表面エネルギーが最も小さくなるので好ましく、モル比でメチル基が６０％以上であることが好ましい。また、鎖末端もしくは側鎖には、分子鎖中に少なくとも１個以上の水酸基等の反応性基を有する。

However, n is an integer of 2 or more, and R ¹ and R ² are a substituted or unsubstituted alkyl, alkenyl, aryl or cyanoalkyl group having 1 to 10 carbon atoms, respectively. Vinyl, phenyl and halogenated phenyl. Further, those in which R ¹ and R ² are methyl groups are preferred because the surface energy is minimized, and the molar ratio of the methyl groups is preferably 60% or more. Further, the chain terminal or the side chain has at least one or more reactive group such as a hydroxyl group in the molecular chain.

  In addition, a stable organosilicon compound that does not undergo a cross-linking reaction such as dimethylpolysiloxane may be mixed with the binder together with the above-mentioned organopolysiloxane.

  In the color filter of the present invention, various binders such as organopolysiloxane can be used for the photocatalyst-containing layer. In the present invention, as described above, fluorine is contained in the photocatalyst containing layer containing such a binder and a photocatalyst, and fluorine is reduced on the surface of the photocatalyst containing layer by pattern irradiation with energy, whereby the ink repellent region The ink-philic region may be formed in the inside. At this time, it is necessary to contain fluorine in the photocatalyst-containing layer, and as a method of containing fluorine in the photocatalyst-containing layer containing such a binder, a fluorine compound is usually added relatively to a binder having a high binding energy. Examples thereof include a method of bonding with a weak binding energy, and a method of mixing a fluorine compound bonded with a relatively weak binding energy into the photocatalyst-containing layer. By introducing fluorine by such a method, when energy is irradiated, first, a fluorine bonding site having a relatively small binding energy is decomposed, and thereby fluorine can be removed from the photocatalyst containing layer. is there.

  The first method, that is, a method of binding a fluorine compound with a binder having a high binding energy with relatively weak binding energy, includes a method of introducing a fluoroalkyl group as a substituent into the organopolysiloxane. be able to.

For example, as a method for obtaining an organopolysiloxane, as described in (1) above, an organopolysiloxane exhibiting great strength can be obtained by hydrolyzing or polycondensing chloro or alkoxysilane by a sol-gel reaction or the like. . Here, in this method, as described above, the general formula:
Y _n SiX _(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen. N is an integer of 0 to 3. )
An organopolysiloxane is obtained by hydrolyzing or condensing one or more of the silicon compounds represented by the following formula. In this general formula, silicon having a fluoroalkyl group as a substituent Y By synthesizing using a compound, an organopolysiloxane having a fluoroalkyl group as a substituent can be obtained. When such an organopolysiloxane having a fluoroalkyl group as a substituent is used as a binder, when energy is irradiated, a portion of the carbon bond of the fluoroalkyl group is decomposed by the action of the photocatalyst in the photocatalyst-containing layer. Therefore, it is possible to reduce the fluorine content of the portion where the surface of the photocatalyst-containing layer is irradiated with energy.

  The silicon compound having a fluoroalkyl group used at this time is not particularly limited as long as it has a fluoroalkyl group, but has at least one fluoroalkyl group and the carbon number of the fluoroalkyl group Is preferably 4 to 30, preferably 6 to 20, particularly preferably 6 to 16. Specific examples of such a silicon compound are as described above, and among them, the silicon compound having a fluoroalkyl group having 6 to 8 carbon atoms, that is, fluoroalkylsilane is preferable.

  In the present invention, such a silicon compound having a fluoroalkyl group may be used as a mixture with the above-described silicon compound having no fluoroalkyl group, and a co-hydrolyzed condensate thereof may be used as the organopolysiloxane. One or more silicon compounds having such a fluoroalkyl group may be used, and a hydrolyzed condensate or a co-hydrolyzed condensate thereof may be used as the organopolysiloxane.

  In the organopolysiloxane having a fluoroalkyl group thus obtained, the silicon compound having the fluoroalkyl group is 0.01 mol% or more, preferably 0.1 mol%, of the silicon compounds constituting the organopolysiloxane. Preferably, it is contained in an amount of at least mol%.

  When the fluoroalkyl group is contained to this extent, the ink repellency on the photocatalyst-containing layer can be increased, and the difference in wettability between the portion that has been irradiated with energy and the ink-philic region can be increased. Because.

In the method shown in the above (2), an organopolysiloxane is obtained by crosslinking a reactive silicone having excellent water repellency and oil repellency. ^1, by either or both of R ² and a substituent containing fluorine such as fluoroalkyl group, it is possible to include fluorine photocatalyst-containing layer, and when the energy is irradiated, Since the portion of the fluoroalkyl group having smaller binding energy than the siloxane bond is decomposed, the content of fluorine on the surface of the photocatalyst-containing layer can be reduced by energy irradiation.

  On the other hand, in the latter example, that is, as a method for introducing a fluorine compound bonded with energy weaker than the binding energy of the binder, for example, when introducing a low molecular weight fluorine compound, for example, a fluorine-based surfactant is mixed. Examples of the method for introducing a high molecular weight fluorine compound include a method of mixing a fluorine resin having high compatibility with a binder resin.

  In the present invention, the photocatalyst-containing layer may contain a surfactant in addition to the above-mentioned photocatalyst and binder. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, and BB series manufactured by Nikko Chemicals Co., Ltd .; ZONYL FSN and FSO manufactured by DuPont; Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd .; Megafac F-141 and 144 manufactured by Ink Chemical Industry Co., Ltd., Futagent F-200 and F251 manufactured by Neos Co., Ltd., Unidyne DS-401 and 402 manufactured by Daikin Industries, Ltd., and Florad FC-170 manufactured by 3M Corporation. 176 and the like, and a fluorine-based or silicone-based nonionic surfactant can be mentioned, and a cationic surfactant, an anionic surfactant, and an amphoteric surfactant can also be used.

  Further, in addition to the above surfactant, the photocatalyst containing layer, polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, Oligomers, polymers such as polyvinyl chloride, polyamide, polyimide, styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, etc. It can be contained.

  The content of the photocatalyst in the photocatalyst containing layer can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight. Further, the thickness of the photocatalyst containing layer is preferably in the range of 0.05 to 10 μm.

  The photocatalyst-containing layer can be formed by dispersing a photocatalyst and a binder together with other additives as necessary in a solvent to prepare a coating solution, and applying the coating solution. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating, and bead coating. When an ultraviolet-curable component is contained as a binder, the photocatalyst-containing layer can be formed by performing a curing treatment by irradiating ultraviolet rays.

(Pixel part)
In the first embodiment, as shown in FIGS. 1 and 2, the pixel portion 6 is provided on the variable wettability layer 5, especially the above-described photocatalyst containing layer. In the first embodiment, the photocatalyst-containing layer is exposed to light, and a pixel portion is formed in a predetermined pattern using ink of a plurality of colors in an ink-philic region having a low contact angle with a liquid by an ink jet method. The normal pixel portion is formed with three colors of red (R), green (G), and blue (B). The coloring pattern and the coloring area in this pixel portion can be set arbitrarily.

  Ink-jet inks for forming such pixel portions are largely classified into water-based and oil-based inks. In the present invention, any of the inks can be used. Aqueous inks are preferred.

  In the aqueous ink used in the present invention, water alone or a mixed solvent of water and a water-soluble organic solvent can be used as a solvent. On the other hand, oil-based inks based on high-boiling solvents are preferably used to prevent clogging of the heads. Known pigments and dyes are widely used as the colorant used in such an ink-jet ink. Further, a resin soluble or insoluble in a solvent may be contained for improving dispersibility and fixing property. Other surfactants such as nonionic surfactants, cationic surfactants and amphoteric surfactants; preservatives; fungicides; pH adjusters; defoamers; ultraviolet absorbers; viscosity adjusters: surface tension adjusters, and the like. May be added as necessary.

  Also, ordinary inkjet inks cannot contain a large amount of binder resin due to low suitable viscosity.However, by coloring the colorant particles in the ink with the resin and granulating it, the colorant itself can have fixing ability. it can. Such an ink can also be used in the present invention. Further, a so-called hot melt ink or UV curable ink can be used.

  In the present invention, it is particularly preferable to use a UV curable ink. By using a UV curable ink, after forming a pixel portion by coloring with an ink jet method, the ink can be quickly cured by irradiating UV, and can be immediately sent to the next step. Therefore, a color filter can be efficiently manufactured.

  Such UV curable inks are based on prepolymers, monomers, photoinitiators and colorants. As the prepolymer, any of prepolymers such as polyester acrylate, polyurethane acrylate, epoxy acrylate, polyether acrylate, oligoacrylate, alkyd acrylate, polyol acrylate, and silicon acrylate can be used without particular limitation.

  Monomers include vinyl monomers such as styrene and vinyl acetate; monofunctional acrylic monomers such as n-hexyl acrylate and phenoxyethyl acrylate; diethylene glycol diacrylate, 1,6-hexanediol diacrylate, hydroxypiperate ester neopentyl glycol diacrylate And polyfunctional acrylic monomers such as trimethylolpropane triacrylate and dipentaerythritol hexaacrylate. The above prepolymer and monomer may be used alone or in combination of two or more.

  Photopolymerization initiators include isobutyl benzoin ether, isopropyl benzoin ether, benzoin ethyl ether, benzoin methyl ether, 1-phenyl-1,2-propadione-2-oxime, 2,2-dimethoxy-2-phenylacetophenone, benzyl, and hydroxy. Cyclohexyl phenyl ketone, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzophenone, chlorothioxanthone, 2-chlorothioxanthone, isopropylthioxanthone, 2-methylthioxanthone, chlorine-substituted benzophenone, halogen-substituted alkyl -Those which can obtain desired curing characteristics and recording characteristics from allyl ketone and the like can be selected and used. In addition, if necessary, a photoinitiating auxiliary such as an aliphatic amine or an aromatic amine; a photosensitizer such as thioxanthone may be added.

(Light shield)
In the first embodiment of the present invention, as shown in FIGS. 1 and 2, a light-shielding portion 3 is formed on a transparent substrate 2 at a boundary portion of the pixel portion forming portion 4.

  The light-shielding portion in the first embodiment is formed by forming a metal thin film of chromium or the like having a thickness of about 1000 to 2000 ° by a sputtering method, a vacuum evaporation method, or the like, and patterning the thin film. As the patterning method, a normal patterning method such as sputtering can be used.

  The light-shielding portion may be a layer in which light-shielding particles such as carbon fine particles, metal oxides, inorganic pigments, and organic pigments are contained in a resin binder. As the resin binder to be used, one or a mixture of two or more resins such as polyimide resin, acrylic resin, epoxy resin, polyacrylamide, polyvinyl alcohol, gelatin, casein, and cellulose, photosensitive resin, and O / O A W emulsion type resin composition, for example, an emulsion of reactive silicone can be used. The thickness of such a resin light-shielding portion can be set within a range of 0.5 to 10 μm. A commonly used method such as a photolithography method and a printing method can be used as a method for patterning the resin light-shielding portion.

(Transparent substrate)
In the first embodiment of the present invention, as shown in FIGS. 1 and 2, the light-shielding portion 3 and the variable wettability layer 5, especially the above-mentioned photocatalyst-containing layer, are provided on a transparent substrate 2.

  The transparent substrate is not particularly limited as long as it has been conventionally used for a color filter. For example, a transparent substrate having no flexibility such as quartz glass, Pyrex (registered trademark) glass, or a synthetic quartz plate is used. A flexible material such as a rigid material or a flexible resin material such as a transparent resin film or an optical resin plate can be used. Among them, Corning 7059 glass is a material having a low coefficient of thermal expansion, excellent in dimensional stability and workability in high-temperature heat treatment, and is an alkali-free glass containing no alkali component in the glass. It is suitable for a color filter for a color liquid crystal display device according to the method. In the present invention, a transparent substrate is generally used as a transparent substrate, but a reflective substrate or a substrate colored white can also be used. Further, as the transparent substrate, a substrate which has been subjected to surface treatment for preventing alkali elution, imparting a gas barrier property or other purposes as necessary may be used.

(Ink-repellent convex part)
In the first embodiment of the present invention, as shown in FIG. 2, an ink-repellent convex portion 7 may be formed on the variable wettability layer 5 covering the upper portion of the light shielding portion 3. The composition of such ink-repellent convex portions is not particularly limited as long as it is a resin composition having ink-repellency. It is not necessary to be particularly transparent, and it may be colored. For example, a material that is used for a black matrix (light shielding portion) and does not contain a black material can be used. Specifically, a composition in which one or more aqueous resins such as polyacrylamide, polyvinyl alcohol, gelatin, casein, and cellulose are mixed, or a resin composition of an O / W emulsion type, for example, a reactive silicone is used as an emulsion. And the like. In the present invention, a photocurable resin is preferably used for reasons such as easy handling and easy curing. In addition, since the ink repellent convex portion is more preferable as the ink repellency is stronger, the surface of the convex portion may be treated with an ink repellent such as a silicone compound or a fluorine-containing compound.

  It is preferable that the height of the ink-repellent convex portion in the first embodiment is somewhat higher because it is provided to prevent color mixing of ink when colored by the inkjet method as described above. However, in consideration of the overall flatness when a color filter is used, the thickness is preferably close to the thickness of the pixel portion. Specifically, it is preferably within the range of 0.1 to 2 μm, though it varies depending on the amount of ink to be sprayed.

(Protective layer)
Although not shown in FIG. 1 or FIG. 2, a protective layer may be further formed on the pixel portion 6 in the first embodiment. This protective layer is provided to flatten the color filter and prevent the components contained in the pixel portion or the pixel portion and the photocatalyst containing layer from being eluted into the liquid crystal layer.

  The thickness of the protective layer can be set in consideration of the light transmittance of the material used, the surface condition of the color filter, and the like, and can be set, for example, in the range of 0.1 to 2.0 μm. The protective layer can be formed by using, for example, a known transparent photosensitive resin, a two-part curable transparent resin, or the like having a light transmittance required for the transparent protective layer.

2. Second Embodiment According to a second embodiment of the present invention, a variable wettability layer is formed on the entire surface of a transparent substrate, and a pixel portion and a light-shielding portion are provided at predetermined portions on the variable wettability layer. Color filter. This shows an example in which the wettability variable layer is provided for forming the pixel portion and the light shielding portion, and at least the pixel portion described above is a specific example of the color filter provided on the wettability variable layer. One.

  FIG. 3 shows an example of the second embodiment. The color filter 1 includes a variable wettability layer 5 provided on a transparent substrate 2, a light shielding portion 3 and a pixel portion 6 formed on the variable wettability layer 5, and a color filter 1 formed on the pixel portion 6 and the light shielding portion 3. And the protective layer 8 formed.

  In the color filter according to the second embodiment, the pixel portion 6 and the light shielding portion 3 are formed on the wettability variable layer 5, and as described in detail in a manufacturing method described later, First, the wettability is reduced by irradiating the portion forming portion with energy or the like, and after forming the pixel portion 6 in this portion, the wettability of the variable wettability layer 5 in the light shielding portion forming portion of the light shielding portion 3 is reduced. The light-shielding portion 3 may be formed on the light-shielding portion. On the contrary, the wettability of the light-shielding portion-forming portion is reduced first, and after forming the light-shielding portion, the wettability of the wettability variable layer of the pixel portion-forming portion is reduced. Alternatively, the pixel portion 6 may be formed.

  Whichever method is used, when the pixel portion 6 is formed, the wettability variable layer is an ink-philic region in a state where the wettability is reduced. Ink is uniformly spread in the pixel portion forming portion, and a color filter without color unevenness can be obtained. Further, when the pixel portion is colored by the ink jet method, the light-shielding portion 3 is formed around the pixel portion or the wettability of the variable wettability layer is not changed, that is, the ink-repellent region. Therefore, it is possible to obtain a color filter having no troubles such as color mixing, because the ink does not mix beyond this portion.

  The materials and the like of the transparent substrate 2, the light-shielding portion 3, the variable wettability layer 5, the pixel portion 6, and the protective layer 8 used in this embodiment are the same as those in the first embodiment. Description is omitted. In this embodiment, since the light-shielding portion is formed on the variable wettability layer, a portion having good wettability is formed in advance on the variable wettability layer, and the light-shielding portion paint is applied to the portion. The light-shielding portion is easily formed. Therefore, it can be said that the light-shielding portion is preferably formed of a light-shielding portion paint in which the light-shielding fine particles and the resin are dissolved in a solvent or the like.

3. Third Embodiment According to a third embodiment of the present invention, the light shielding portion is provided on a transparent substrate, and the variable wettability layer is provided on a pixel portion forming portion, which is a portion where the pixel portion is formed on the transparent substrate. A color filter in which a pixel portion is formed on the variable wettability layer. This shows an example in which the wettability variable layer is provided for forming the pixel portion and the light shielding portion, and at least the pixel portion described above is a specific example of the color filter provided on the wettability variable layer. One.

  FIG. 4 shows an example of the third embodiment. The color filter 1 includes a light-shielding portion 3 provided on a transparent substrate 2 and a variable wettability layer 5 formed in a pattern on a pixel portion forming portion 4 which is an area between the light-shielding portions 3 on the transparent substrate 2. The pixel portion 6 is formed on the variable wettability layer 5, and the protective layer 8 is formed on the pixel portion 6 and the light shielding portion 3.

  The feature of this embodiment is that the variable wettability layer is formed only on the pixel portion forming portion 4 on the transparent substrate 2, and the variable wettability layer 5 is formed on the light shielding portion forming portion where the light shielding portion 3 is formed. The point is not. As described above, in the third embodiment, since the variable wettability layer 5 is formed only in the pixel portion forming section 4, when the wettability is changed by applying a stimulus to the variable wettability layer, the stimulus is not applied. It only needs to be applied over the entire surface, and there is no need to apply stimulation in a pattern. Therefore, there is an effect that the process after the formation of the variable wettability layer can be simplified.

  In this embodiment, since the light shielding portion 3 is formed directly on the transparent substrate 2, it is preferable that the transparent substrate 2 has ink affinity. In particular, when the wettability variable layer 5 is formed in a pattern and then the light-shielding portion 3 is formed in the light-shielding portion forming portion therebetween, the wettability variable layer, which is the ink-repellent region before the wettability changes, is formed. It is preferable that the light-shielding portion 3 is formed on the transparent substrate 2 as an ink-philic region. Therefore, in the third embodiment, the wettability on the transparent substrate 2 is preferably less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m, more preferably 5 degrees or less, particularly preferably 1 degree or less. Degrees or less.

  As described above, the transparent substrate whose surface is the ink-philic region includes a substrate formed of an ink-philic material, a substrate whose surface is treated to be ink-philic, and a transparent substrate having an ink-philic region. Are formed, but are not particularly limited in the present embodiment.

  Examples of surface treatment of the surface of the material so as to be ink-philic include ink-philic surface treatment by plasma treatment using argon or water, as an ink-philic layer provided on a transparent substrate, For example, a silica film formed by a sol-gel method of tetraethoxysilane can be used.

  The materials other than the transparent substrate 2 used in this embodiment, that is, the materials of the light-shielding portion 3, the variable wettability layer 5, the pixel portion 6, and the protective layer 8 are the same as those in the first embodiment. Here, the description is omitted.

4. Fourth Embodiment In a fourth embodiment of the present invention, a light shielding portion is formed on a transparent substrate, a variable wettability layer is formed on the light shielding portion, and a pixel portion is formed between the variable wettability layers. Color filter. This shows an example in which a wettability variable layer is provided to form a pixel portion, and is a specific example of a color filter in which a wettability variable layer is provided at a boundary portion of the pixel portion described above. is there.

  FIG. 5 shows an example of the fourth embodiment of the present invention. In this color filter 1, a light-shielding portion 3 is formed on a transparent substrate 2, and a variable wettability layer 5 is formed on the light-shielding portion 3. Further, a pixel portion 6 is formed in a portion between the wettability variable layers 5. Then, a protective layer 8 is formed so as to cover the upper side of the pixel section 6 and the variable wettability layer 5. In this embodiment, since the variable wettability layer is formed in a pattern, the wettability of the variable wettability layer can be changed by applying a stimulus to the entire surface. There is no need to perform energy pattern irradiation or the like utilizing such factors, and the process can be simplified. Further, since the variable wettability layer 5 is formed only at the boundary between the pixel portions 6, the amount of use thereof is extremely small. Therefore, it is effective when there is a problem in applying a large amount of the wettability changing layer on the color filter such as being expensive.

  Here, the width of the wettability variable layer 5 is preferably formed to be smaller than the width of the light shielding portion 3. Since the width of the variable wettability layer 5 is smaller than the width of the light shielding portion 3, the width of the pixel portion 6 formed between the variable wettability layers 5 is larger than the width of the opening of the light shielding portion 3. Can be. Thereby, problems such as missing colors can be prevented.

  Further, in this embodiment, since the light shielding portion 3 and the pixel portion 6 are formed directly on the transparent substrate 2, it is preferable that the transparent substrate 2 has ink affinity. In particular, when the pixel portion 6 is formed by attaching the pixel portion 6 between the variable wettability layers 5 by an ink-jet method, as the wettability on the transparent substrate 2 increases, the more easily the ink spreads, the more easily the ink spreads. Problems such as unevenness are unlikely to occur. Therefore, also in the fourth embodiment, similarly to the third embodiment, it is preferable that the wettability on the transparent substrate 2 be less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m.

  The material used in this embodiment is the same as that of the third embodiment with respect to the transparent substrate, and the other materials are the same as those of the first embodiment described above.

5. Fifth Embodiment In a fifth embodiment of the present invention, a variable wettability layer is formed on a light-shielding portion forming portion, which is a portion where a light-shielding portion is formed on a transparent substrate, and a light-shielding portion is formed on the variable wettability layer. The color filter is formed, and a pixel portion is formed between the light shielding portions. This shows an example in which a wettability variable layer is provided for forming a pixel portion and a light-shielding portion, and is a specific example of a color filter in which a wettability variable layer is provided at a boundary portion between the pixel portions described above. One.

  FIG. 6 shows an example of the fifth embodiment of the present invention. In the color filter 1, a variable wettability layer 5 is formed in a pattern on a light shielding portion forming portion 9 where a light shielding portion is formed on the transparent substrate 2, and the variable wettability layer formed in the pattern is formed. The pixel portion 6 is formed on the transparent substrate 2 between 5. On the variable wettability layer 5, a light shielding portion 3 is formed.

  In this embodiment, since the variable wettability layer is formed in a pattern, a stimulus may be applied over the entire surface to change the wettability of the variable wettability layer. In this case, there is no need to perform energy pattern irradiation or the like using a mask or the like, and the process can be simplified. Further, similarly to the fourth embodiment, since the wettability variable layer 5 is formed only at the boundary between the pixel portions 6, and in the present embodiment, only at the light shielding portion forming portion 9, the amount of use is small. Therefore, it is effective when there is a problem in forming a large amount of the wettability variable layer on the color filter.

  Further, in this embodiment, as in the fourth embodiment, since the pixel portion 6 is formed directly on the transparent substrate 2, it is preferable that the transparent substrate 2 has ink affinity. Therefore, also in the fifth embodiment, similarly to the third and fourth embodiments, it is preferable that the wettability on the transparent substrate 2 be less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m.

  The material used in this embodiment is the same as that of the third embodiment with respect to the transparent substrate, and the other materials are the same as those of the first embodiment described above.

B. Next, a method for manufacturing a color filter of the present invention will be described with reference to some embodiments.

1. Sixth Embodiment A sixth embodiment of the present invention is a manufacturing method for manufacturing the color filter according to the first embodiment of the present invention,
(1) forming a light shielding portion on a transparent substrate;
(2) providing a photocatalyst-containing layer in which the wettability of the energy-irradiated portion changes in the direction of decreasing the contact angle of the liquid on the surface of the transparent substrate on which the light-shielding portion is formed;
(3) a step of irradiating energy to a pixel portion forming portion, which is a portion for forming a pixel portion on the photocatalyst containing layer, to form a pixel portion exposure portion;
(4) coloring the exposed portion for the pixel portion by an ink-jet method to form a pixel portion.

(Description of each process)
FIG. 7 is for explaining each step of the sixth embodiment of the present invention. In this example, first, the light-shielding portion 3 is formed on the transparent substrate 2 by a conventional method (FIG. 7A). The method for manufacturing the light-shielding portion 3 is not particularly limited. For example, a metal thin film of chromium or the like having a thickness of about 1000 to 2000 ° is formed by a sputtering method, a vacuum evaporation method, or the like, and the thin film is patterned. Methods and the like can be mentioned.

  Next, a photocatalyst-containing layer 5 is formed on the transparent substrate 2 on which the light-shielding portion 3 is formed (FIG. 7B). The photocatalyst-containing layer 5 is formed by dispersing the photocatalyst and the binder as described above in a solvent together with other additives as necessary to prepare a coating solution, applying the coating solution, and then subjecting the coating solution to hydrolysis, It is formed by advancing the polycondensation reaction to firmly fix the photocatalyst in the binder. The solvent used is preferably an alcoholic organic solvent such as ethanol or isopropyl alcohol, and the coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating, or bead coating.

  The transparent substrate 2 on which the photocatalyst containing layer 5 is formed is irradiated with energy 10 such as ultraviolet light by a photomask 11 in a pattern. As a result, the exposure portion 12 for the pixel portion is formed in which the pixel portion forming portion, on which the pixel portion on the photocatalyst containing layer 5 is formed, is an ink-philic region by the action of the photocatalyst in the photocatalyst containing layer 5. (FIG. 7C).

  When the exposure is performed using the photomask 11 for forming the pixel portion exposure section 12 as described above, the width of the pixel section exposure section 12 formed by irradiation of energy, that is, the width of the formed pixel section However, it is preferable that the width be larger than the width of the opening formed by the light shielding portion 3. By doing so, when the backlight is irradiated after the liquid crystal panel is completed, there is no possibility that the backlight transmits through a portion where the pixel portion is not formed, and no inconvenience such as color omission occurs. That's why.

  This energy irradiation can also be performed by exposing the entire surface from the transparent substrate 2 side as shown in FIG. When irradiating energy to the entire surface from the transparent substrate 2 side, as is clear from FIG. 8, the light-shielding portion 3 acts as a mask, and exposure is performed only on a portion where the light-shielding portion 3 is not provided. According to this method, energy irradiation can be performed without using a photomask or the like for forming a pixel portion, which is advantageous in terms of cost.

  In the case where energy is irradiated from the transparent substrate 2 side as described above, it is preferable to use a material that transmits energy to the transparent substrate 2. For example, when light including ultraviolet light is used as the energy, an ultraviolet light such as quartz is used. It is preferable to use a material that transmits light.

  Using the ink jet device 13, the ink 14 is ejected into the pixel unit exposure unit 12, which has become the ink-philic region, by using the ink jet device 13 in the pixel unit exposure unit 12 formed in this manner. , Green, and blue (FIG. 7D). In this case, since the inside of the exposure unit 12 for the pixel portion is an ink-philic region having a small contact angle with the liquid due to the irradiation of energy as described above, the ink 14 ejected from the inkjet device 13 It spreads uniformly in the exposure unit 12. Further, since the region of the photocatalyst containing layer that has not been exposed is an ink-repellent region, the ink is repelled and removed in this region.

  The inkjet device used in the present invention is not particularly limited, but a method in which charged ink is continuously ejected and controlled by a magnetic field, a method in which ink is ejected intermittently by using a piezoelectric element, and a method in which ink is ejected intermittently. An inkjet apparatus using various methods such as a method of intermittently jetting by heating and utilizing the foaming can be used.

  Thus, the pixel portion 6 is formed by solidifying the ink adhered in the pixel portion exposure portion 12 (FIG. 7E). In the present invention, the solidification of the ink is performed by various methods depending on the type of the ink used. For example, in the case of a water-soluble ink, the water is removed by heating or the like to be solidified.

  Considering this ink solidification process, it is preferable that the ink used in the present invention is a UV curable ink. This is because the UV curable ink can quickly solidify the ink by irradiating UV, so that the manufacturing time of the color filter can be reduced.

  As described above, since the ink in the pixel unit exposure unit 12 is uniformly spread, when the ink is solidified in this manner, the pixel unit 6 without color omission or color unevenness can be formed. Then, if necessary, a protective layer may be provided thereon.

  By performing such steps, a color filter according to the first embodiment of the present invention as shown in FIG. 1 can be manufactured.

(About the ink-repellent convex part)
In the sixth embodiment of the present invention, after the step of providing the photocatalyst-containing layer, the photocatalyst-containing layer on the light-shielding portion is irradiated with energy in a pattern to form an exposed portion for the ink-repellent convex portion. The method may include a step of forming an ink-repellent convex portion on the exposure section.

  The process of forming the ink-repellent convex portion will be described with reference to FIG. In the same manner as in the sixth embodiment shown in FIG. 7 described above, the light-shielding portions 3 are formed on the transparent substrate 2 and the photocatalyst-containing layer 5 is formed so as to cover them. Irradiation is performed via the laser 15 (FIG. 9A). In this manner, by irradiating the pattern with energy through the mask for the ink-repellent convex portions, the exposed portions 16 for the ink-repellent convex portions are formed on the photocatalyst-containing layer 5 on the light shielding portion.

  The ink-repellent convex portion ink 17 such as a UV-curable resin monomer is adhered to the ink-repellent convex portion exposure section 16 by the inkjet device 13 (FIG. 9B). Note that the method of applying the ink for the ink-repellent convex portions is not limited to a method using an ink jet device, and other methods such as dip coating can be used.

  Then, by curing the ink-repellent convex ink 17 by UV irradiation or the like, the ink-repellent convex portions 7 are formed on the surface of the photocatalyst containing layer 5 on the light shielding portion 3 (FIG. 9C). It is preferable that the width of the ink-repellent convex portion 7 is formed to be smaller than the width of the light shielding portion 3 as shown in the drawing. This is because such a problem does not cause a problem such as color omission as described above.

  By irradiating the entire surface with the energy 10 from the photocatalyst containing layer 5 side or by pattern irradiation, the member having the ink repellent protrusions 7 formed on the photocatalyst containing layer 5 in this manner allows the ink repellent protrusions 7 to be formed. The portion other than the formed portion is exposed to become a pixel portion exposure portion, and thereafter, in the same manner as described above, the ink 14 is attached to this portion by using the ink jet device 13 and cured to form the pixel portion 6. A color filter formed and provided with the ink-repellent convex portions 7 can be manufactured (FIGS. 9D, 9E, and 9F).

  In this method, since the photocatalyst-containing layer on the light-shielding portion is irradiated with energy in a pattern to provide the exposure for the ink-repellent convex portions, the ink-repellent convex portions can be formed with an arbitrary width. Therefore, an ink-repellent convex portion having an arbitrary width can be formed by applying the ink for the ink-repellent convex portion here. Therefore, by adjusting the width of the mask 15 for the ink-repellent convex portions, the ink-repellent convex portions 7 having a smaller width than the light-shielding portion 3 can be formed. By forming the ink-repellent convex portions 7 having a width smaller than that of the light-shielding portion 3, the width of the pixel portion 6 formed between the ink-repellent convex portions 7 is wider than the width of the opening of the light-shielding portion 3. As described above, a color filter free from defects such as color omission can be obtained.

  In this embodiment, the ink-repellent convex portions are formed by changing the wettability of the photocatalyst-containing layer. However, the present invention is not limited to this. For example, the ink-repellent convex portions are formed by a photolithography method or the like. It may have a unit.

(About the method of forming the pixel portion)
In the present invention, as in the above-described sixth embodiment, the pixel unit 6 may be formed by one-time irradiation of energy and attachment of ink to the exposure unit. The distance between the exposed portions for the pixel portions, which are the ink-philic regions irradiated with energy during the attachment, is short. Therefore, there is a possibility that a problem such as mixing of ink may occur when forming the pixel portion. As a method of avoiding such a problem, a method of performing the energy irradiation and the formation of the pixel portion at least twice as described below can be given.

  FIG. 10 shows an example in which the energy irradiation and the formation of the pixel portion are performed twice. A light-shielding portion 3 is formed on a transparent substrate 2 in the same manner as in the example shown in FIG. 7 described above, and a mask 11 ′ is formed on a member having a photocatalyst containing layer 5 formed on the transparent substrate 2 so as to cover the light-shielding portion 3. Is used to irradiate energy 10 so as to form a pixel portion in every other pixel portion forming portion to form a pixel portion forming exposure portion 12 (FIG. 10A). By applying the ink 14 to the pixel unit exposure unit 12 using the ink jet device 13 (FIG. 10B), the pixel unit 6 is formed at every other portion of the pixel unit formation unit (FIG. 10 (B)). C)). In addition, in order to prevent coloring of the ink by the second inkjet device on the pixel portion, it is preferable that the pixel portion itself is ink-repellent, and the surface of the pixel portion is formed of a silicone compound or the like. The ink may be treated with an ink repellent such as a fluorine-containing compound.

  Then, by irradiating the energy 10 again from the photocatalyst containing layer 5 side where every other pixel part 6 is formed, the pixel part formation part between the pixel parts 6 is exposed to be the pixel part formation exposure part 12. A color filter can be obtained by depositing the ink 14 using the ink jet device 15 here (FIG. 10D).

  According to this method, the distance between the pixel portions can be reduced or eliminated, so that a colored layer (an aggregate of pixel portions) having excellent smoothness can be formed. In addition, when the first pixel portion is formed, the space between the formed pixel portions is wide, so that the ink does not mix over this portion. Therefore, it is possible to obtain a high-quality color filter without color mixing of ink.

  In the above-described method, the first pixel portion 6 is formed every other pixel. However, the present invention is not limited to this, and the first pixel portion may be formed so as not to be adjacent. For example, it may be changed depending on the shape of the pixel portion of the color filter, such as a staggered shape. In the above description, the pixel portion is formed twice. However, if necessary, the pixel portion may be formed three or more times.

(About irradiation energy)
In the present invention, as the energy for irradiating the photocatalyst-containing layer, light including ultraviolet light can be used. As a light source including such ultraviolet light, for example, a mercury lamp, a metal halide lamp, a xenon lamp, and the like can be given. The wavelength of light used for this exposure can be set within a range of 400 nm or less, preferably 380 nm or less, and the irradiation amount of light at the time of exposure is such that the exposed portion becomes less ink-friendly due to the action of a photocatalyst. The irradiation dose required for expression can be set.

  When pattern irradiation is necessary when irradiating energy, it can be performed by pattern irradiation through a photomask using a light source as described above, but as another method, using a laser such as excimer or YAG. It is also possible to use a method of drawing and irradiating in a pattern. However, such a method may have a problem that the apparatus is expensive, difficult to handle, and that continuous output cannot be performed.

  Therefore, in the present invention, the photocatalytic reaction initiation energy is applied to the photocatalyst-containing layer, and the reaction rate increasing energy is applied in a pattern in the region where the photocatalytic reaction initiation energy is applied, thereby forming the pattern of the ink-philic region. It may be formed. By forming a pattern using such an energy irradiation method, it is possible to use a relatively inexpensive and easy-to-handle reaction rate increasing energy such as an infrared laser when forming a pattern, and thereby, as described above. This is because no problem occurs.

  The reason why the pattern of the ink-philic region having changed wettability can be formed by applying such energy is as follows. That is, the photocatalytic reaction of the photocatalyst with the photocatalyst-containing layer is started by applying photocatalytic reaction start energy to the region where the pattern is to be formed. Then, the reaction rate increasing energy is added to the region where the photocatalytic reaction start energy is added. By adding the reaction rate increasing energy in this manner, the photocatalytic reaction start energy is already added, and the reaction in the photocatalyst-containing layer in which the reaction is started by the catalytic action of the photocatalyst is rapidly promoted. Then, by applying the reaction speed increasing energy for a predetermined time, the characteristic change in the characteristic change layer is changed to a desired range, and the pattern to which the reaction speed increasing energy is applied is changed to the wettability-changed ink-philic region. It can be a pattern.

a. Regarding photocatalytic reaction initiation energy The photocatalytic reaction initiation energy used in this energy irradiation method refers to the energy at which a photocatalyst initiates a catalytic reaction for changing the characteristics of a compound in a photocatalyst-containing layer.

  The amount of the photocatalytic reaction initiation energy added here is an amount that does not cause a sudden change in wettability in the photocatalyst-containing layer. If the amount of the photocatalytic reaction initiation energy added is small, it is not preferable because the sensitivity at the time of forming a pattern by adding the reaction rate increasing energy is not preferable, and if the amount is too large, the photocatalyst added with the photocatalytic reaction initiation energy is added. Since the degree of change in the properties of the containing layer becomes too large, the difference from the region to which the reaction rate increasing energy is added becomes unclear, which is not preferable. The amount of energy to be added is determined in advance by performing preliminary experiments and the like on the amount of energy to be added and the amount of change in wettability in the photocatalyst-containing layer.

  The photocatalytic reaction initiation energy in this method is not particularly limited as long as it is an energy capable of initiating a photocatalytic reaction, but light is particularly preferred.

  The photocatalyst used in the present invention has different wavelengths of light for initiating a catalytic reaction depending on the band gap. For example, cadmium sulfide is visible light of 496 nm, iron oxide is 539 nm, and titanium dioxide is 388 nm of ultraviolet light. Therefore, any light, whether visible light or ultraviolet light, can be used in the present invention. However, as described above, since the bandgap energy is high, it is effective as a photocatalyst, and titanium dioxide is preferably used as a photocatalyst because it is chemically stable, has no toxicity, and is easily available. It is preferable that the light is ultraviolet light that initiates a catalytic reaction of titanium. Specifically, it is preferable that ultraviolet light in a range of 400 nm or less, preferably 380 nm or less is included.

  Various ultraviolet light sources such as a mercury lamp, a metal halide lamp, a xenon lamp, and an excimer lamp can be given as a light source of light including such ultraviolet light.

  In the present invention, the range to which the photocatalytic reaction initiation energy is added may be a part of the photocatalyst containing layer.For example, the photocatalytic reaction initiation energy is added in a pattern, and the reaction rate increasing energy described later is also in a pattern. By adding, it is also possible to form a pattern of the ink-philic region in which the wettability has changed, but for reasons such as simplification and simplification of the process, this photocatalytic reaction initiation energy is applied over the entire region where the pattern is formed. It is preferable to add the reaction speed increasing energy in a pattern to the region where the photocatalytic reaction initiation energy is applied over the entire surface in this manner, thereby forming a pattern of the ink-philic region on the photocatalyst containing layer. Is preferred.

b. Next, the reaction rate increasing energy used in this method will be described. The reaction rate increasing energy used in this method refers to energy for increasing the reaction rate of the reaction that changes the wettability of the photocatalyst-containing layer initiated by the photocatalytic reaction initiation energy. In the present invention, any energy can be used as long as it has such an action, but it is particularly preferable to use thermal energy.

  The method of applying such thermal energy to the photocatalyst-containing layer in a pattern is not particularly limited as long as it can form a pattern by heat on the photocatalyst-containing layer. Methods and the like can be mentioned. As such an infrared laser, for example, an infrared YAG laser (1064 nm) having an advantage of strong directivity and a long irradiation distance, or a diode laser (LED; 830 nm, 1064 nm, and 1100 nm) having an advantage of being relatively inexpensive. And the like, a semiconductor laser, a He—Ne laser, a carbon dioxide laser, and the like.

  In this method, by applying the above-described photocatalytic reaction initiation energy, the photocatalyst is activated to start a change in wettability due to a catalytic reaction in the photocatalyst-containing layer, and a reaction speed is applied to a portion where the change in wettability occurs. By increasing the reaction rate by adding the increased energy, the difference in the reaction rate between the region where the increased energy is added and the region where the increased energy is not added is used to form a pattern of the ink-philic region. Can be.

2. Regarding the seventh embodiment The seventh embodiment of the present invention is one of the manufacturing methods for manufacturing the color filter according to the second embodiment of the present invention,
(1) providing, on a transparent substrate, a photocatalyst-containing layer in which the wettability of an energy-irradiated portion changes in a direction in which the contact angle with a liquid decreases;
(2) forming a light-shielding portion exposure portion by irradiating energy to the light-shielding portion forming portion, which is a portion where the light-shielding portion is formed on the transparent substrate;
(3) providing a light-shielding portion in the light-shielding portion exposure portion;
(4) a step of irradiating energy to the transparent substrate provided with the light shielding portion to form an exposure portion for a pixel portion;
(5) forming a pixel portion by coloring the exposed portion for the pixel portion by an inkjet method.

  FIG. 11 is for explaining each step of the seventh embodiment of the present invention. As shown in FIG. 11A, first, a photocatalyst containing layer 5 is formed on a transparent substrate 2. The formation of the photocatalyst containing layer 5 can be performed in the same manner as in the sixth embodiment.

  Next, the light-shielding portion forming portion of the photocatalyst containing layer 5 is pattern-irradiated with energy 10 using the light-shielding portion photomask 19 to form the light-shielding portion exposure portion 20. The light-shielding portion exposure portion 20 is a portion where the contact angle with the liquid is reduced by the action of the photocatalyst in the photocatalyst containing layer 5, and forms an ink-philic region. (FIG. 11B).

  The energy 10 is the same as in the sixth embodiment, and includes not only ultraviolet light but also other energies.

  Then, the light-shielding portion paint 21 is adhered to the light-shielding portion exposure portion 20 by the ink jet device 13 and then cured to form the light-shielding portion 3 (FIG. 11C). The application of the light-shielding portion paint 21 on the light-shielding portion exposure portion 20 can be performed by a known coating method such as spray coating, dip coating, roll coating, or bead coating, in addition to the method using the above-described ink jet device. In this case, the applied light-shielding-part paint 10 is repelled and removed in the ink-repellent area of the photocatalyst-containing layer 5 other than the light-shielding-part exposure part 20 having a high contact angle with the liquid. It selectively adheres only to the light-shielding portion exposure portion 20 which is an ink-philic region having a low corner.

  Further, the light shielding portion 3 may be formed by a vacuum thin film forming method. That is, a metal thin film is formed on the exposed photocatalyst-containing layer 5 by an evaporation method or the like, and the difference in adhesive strength between the photocatalyst-containing layer 5 other than the light-shielding portion exposure portion 20 and the light-shielding portion exposure portion 20 is used. Thus, the light shielding portion 3 can be formed by patterning by peeling using an adhesive tape, solvent treatment, or the like.

  Next, energy 10 is irradiated on the entire surface or in a pattern of the photocatalyst-containing layer 5 on which the light shielding portion 3 is formed. Thus, the portion where the light-shielding portion 3 is not formed becomes the exposure portion for the pixel portion of the ink-philic region due to the action of the photocatalyst in the photocatalyst containing layer 5 (FIG. 11D).

  Next, the ink jet device 13 ejects the ink 14 into the exposed portion for the pixel portion which has become the lyophilic region by the exposure, and colors the red, green, and blue, respectively (FIG. 11E. As described above, since the inside of the exposure unit is an ink-philic region having a small contact angle with the liquid due to the irradiation of energy, the ink 14 ejected from the inkjet device 13 spreads uniformly in the exposure unit for the pixel unit. .

  By solidifying the ink adhered to the inside of the exposure unit 11 for the pixel unit in this manner, the pixel unit 6 is formed between the light shielding units 3 (FIG. 11F). If necessary, a protective layer may be formed thereon.

  When a color filter is manufactured by such a method, as described above, since the ink in the exposure unit 11 for the pixel unit is uniformly spread, when the ink 14 is solidified, the pixel unit 5 without color omission and color unevenness is removed. Thus, a high-quality color filter can be obtained.

3. Eighth Embodiment The eighth embodiment of the present invention is another method for manufacturing the color filter according to the second embodiment of the present invention, and
(1) providing, on a transparent substrate, a photocatalyst-containing layer in which the wettability of the energy-irradiated portion changes in the direction in which the contact angle of the liquid decreases;
(2) forming a pixel portion exposure portion by pattern-irradiating energy onto a pixel portion formation portion, which is a portion where the pixel portion on the transparent substrate is formed,
(3) forming a pixel portion by coloring the exposed portion for the pixel portion by an inkjet method;
(4) a step of irradiating energy to at least the photocatalyst-containing layer at the boundary of the pixel portion;
(5) forming a light-shielding portion at a boundary portion of the pixel portion irradiated with the energy.

  FIG. 12 is for explaining the eighth embodiment. As in the seventh embodiment, first, the transparent substrate 2 having the photocatalyst containing layer 5 formed on one surface is formed (FIG. 12A). . From the side of the transparent substrate 2 where the photocatalyst containing layer 5 is formed, energy 10 is pattern-irradiated via a mask 11 (FIG. 12B). The ink 14 is applied to the exposed portion for the pixel portion, which has been irradiated with the energy and has become the ink-philic region, using the ink jet device 13 to form the pixel portion 6 (FIG. 12C).

  In the formation of the pixel portion 6, the method of dividing the irradiation of energy and the formation of the pixel portion into two or more times as described in the sixth embodiment may be used. This is because when the pixel portions 6 are formed, the ink may be mixed because the ink-repellent regions between the pixel portions 6 are narrow.

  The surface on which the pixel portions 6 are formed is irradiated with the energy 10 over the entire surface or in a pattern to change the ink-repellent region between the pixel portions 6 to an ink-philic region (FIG. 12D). Then, the light-shielding portion paint 21 is adhered to the boundary portion of the pixel portion 6 by, for example, the ink-jet device 13 (FIG. 12E) and cured to form the light-shielding portion 3 (FIG. F)). Then, a color filter can be obtained by forming a protective layer on the surface as needed.

  The energy used here, the ink jet device, and various inks are the same as those in the above-described sixth embodiment, and thus description thereof is omitted here.

4. Ninth Embodiment The ninth embodiment of the present invention is a manufacturing method for manufacturing the color filter according to the third embodiment of the present invention,
(1) A photocatalyst-containing layer in which the wettability of an energy-irradiated portion changes in a direction in which the contact angle with a liquid decreases on a transparent substrate is formed in a pixel portion forming portion on the transparent substrate where a pixel portion is formed. Providing,
(2) providing a light-shielding portion at a boundary between the pixel portion forming portion provided with the photocatalyst-containing layer;
(3) irradiating the photocatalyst-containing layer with energy to form an exposed portion for a pixel portion;
(4) forming a pixel portion by coloring the exposed portion for the pixel portion by an ink-jet method.

  This method will be described with reference to FIG. First, a photocatalyst containing layer 5 is formed on a portion of the transparent substrate 2 where a pixel portion is formed. That is, in this method, first, the photocatalyst containing layer 5 is formed in a pattern on the transparent substrate. As a method for forming the photocatalyst-containing layer in a pattern as described above, for example, a method of forming by photolithography using a photosensitive sol-gel solution, a method of printing, and the like can be mentioned.

  In the transparent substrate 2 on which the photocatalyst containing layer 5 formed in this way is formed, on the portion where the photocatalyst containing layer 5 is not formed (light shielding portion forming portion), for example, an ink jet device or the like is used to paint a light shielding portion paint or the like. Thereby, the light shielding portion 3 is formed. At this time, the wettability of the surface of the transparent substrate 2 is considered to be ink-philic compared to the wettability of the surface of the photocatalyst containing layer 5. Therefore, when forming the light-shielding portion 3, the light-shielding portion paint does not adhere to the photocatalyst-containing layer exhibiting ink repellency, but adheres only to the light-shielding portion formation portion on the transparent substrate 2 to form the light-shielding portion. Is done.

  In this embodiment, the wettability on the transparent substrate 2 is preferably ink-philic, and specifically, the contact angle with a liquid having a surface tension of 40 mN / m is preferably less than 10 degrees. Preferably, the contact angle with a liquid having a surface tension of 40 mN / m is 5 degrees or less, particularly preferably 1 degree or less.

  After the light-shielding portion 3 is formed in this manner, the photocatalyst-containing layer 5 is irradiated with energy to make this portion an ink-philic region. Then, the pixel portion 6 is formed on the photocatalyst-containing layer as the ink-philic region using an ink-jet device or the like, and a protective layer is formed as necessary, whereby a color filter can be formed.

  In this embodiment, the irradiation energy, the ink jet device, and the various inks are the same as those in the above-described embodiment, and the description thereof is omitted.

5. Tenth Embodiment The tenth embodiment of the present invention is a manufacturing method for manufacturing the color filter according to the fourth embodiment of the present invention,
(1) forming a light shielding portion on a transparent substrate;
(2) providing a photocatalyst-containing layer on the upper surface of the light-shielding portion, in which the wettability of the energy-irradiated portion changes in the direction in which the contact angle of the liquid decreases;
(3) a step of coloring the pixel portion forming portion, which is a portion where the pixel portion is formed on the transparent substrate on which the photocatalyst containing layer is not provided, with an ink jet method to form a pixel portion.

  This method will be described with reference to FIG. First, the light shielding portion 3 is formed on the transparent substrate 2 (FIG. 13A). Next, the photocatalyst containing layer 5 is formed on the light shielding portion 3 in a pattern (FIG. 13B). Here, the method of forming the light-shielding portion 3 and the photocatalyst-containing layer 5 in a pattern is the same as that of the above-described embodiment, and thus the description is omitted here.

  Here, in the present embodiment, it is preferable that the width of the photocatalyst containing layer 5 is formed smaller than the width of the light shielding layer 3. By forming the width of the photocatalyst containing layer 5 smaller than the width of the light shielding layer 3, the width of the pixel portion formed between the photocatalyst containing layers 5 in the subsequent step is reduced by the opening formed by the light shielding portion 3. This is because, as described above, a problem such as color omission does not easily occur as described above.

  Then, the pixel portion 6 is formed by causing the ink 14 to adhere between the photocatalyst-containing layers using the ink jet device 13 (FIG. 13C). At this time, since the ink 14 is directly attached to the transparent substrate 2, it is preferable that the transparent substrate 2 is an ink-philic region. Specifically, the ink 14 is in contact with a liquid having a surface tension of 40 mN / m. The angle is preferably less than 10 degrees, more preferably 5 degrees or less, particularly preferably 1 degree or less, as the contact angle with a liquid having a surface tension of 40 mN / m. The reason for this is that by making the transparent substrate 2 an ink-philic region as described above, the ink 14 spreads uniformly on the transparent substrate, and problems such as color unevenness do not occur.

  As described above, after the pixel portion 6 is formed, by irradiating the energy 10 to the side where the pixel portion 6 is formed (FIG. 13D), the formation of the protective layer 8 provided as needed is easy. (FIG. 13E).

  In this embodiment, the irradiation energy, the ink jet device, and the various inks are the same as those in the above-described embodiment, and the description thereof is omitted.

6. Regarding the eleventh embodiment The eleventh embodiment of the present invention is a manufacturing method for manufacturing the color filter according to the fifth embodiment of the present invention,
(1) A step of providing, on a transparent substrate, a photocatalyst-containing layer in which the wettability of an energy-irradiated portion changes in a direction in which the contact angle of a liquid decreases, in a light-shielding portion forming portion on the transparent substrate where the light-shielding portion is formed. When,
(2) a step of coloring a portion of the transparent substrate on which the photocatalyst-containing layer is not formed by an inkjet method to form a pixel portion;
(3) irradiating at least the photocatalyst-containing layer with energy;
(4) forming a light-shielding layer on the photocatalyst-containing layer irradiated with the energy.

  This method will be described with reference to FIG. 6. First, the photocatalyst-containing layer 5 is formed on the transparent substrate 2 in a pattern. The method of forming the photocatalyst containing layer 5 in a pattern can be performed by the method used in the ninth embodiment. The position where the photocatalyst containing layer 5 is formed is a light shielding portion forming portion 9 where the light shielding portion 3 is formed. Next, ink is applied to a portion where the photocatalyst containing layer 5 is not formed, that is, a pixel portion forming portion where a pixel portion is formed, using an ink jet device or the like to form a pixel portion 6. At this time, for the same reason as in the tenth embodiment, the wettability on the transparent substrate is preferably in the ink-philic region. Specifically, the contact angle with a liquid having a surface tension of 40 mN / m is preferably 10 m. The contact angle with a liquid having a surface tension of 40 mN / m is preferably 5 degrees or less, more preferably 1 degree or less.

  Then, after the photocatalyst containing layer 5 is made ink-philic by irradiating energy, the light shielding portion 3 is formed on the photocatalyst containing layer 5. Finally, a protective layer 8 is formed as required.

  In this embodiment, the irradiation energy, the ink jet device, various inks, and the like to be used may be the same as those described in the other embodiments described above.

C. A color liquid crystal panel is formed by combining a color filter obtained in this way for a color liquid crystal panel and a counter substrate facing the color filter and sealing a liquid crystal compound therebetween. The color liquid crystal panel obtained in this way has the advantage of the color filter of the present invention, that is, the advantage that there is no color omission or color fading and the cost is advantageous.

  Note that the present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and has substantially the same configuration as the technical idea described in the claims of the present invention, and any device having the same operation and effect can be realized by the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be described in more detail through examples.

[Example 1]
1. Formation of Photocatalyst-Containing Layer 30 g of isopropyl alcohol and 0.4 g of MF-160E (manufactured by Tochem Products Inc.) whose main components are fluoroalkylsilane and 3 g of trimethoxymethylsilane (TSL8113 manufactured by Toshiba Silicone Co., Ltd.) 20 g of ST-K01 (manufactured by Ishihara Sangyo Co., Ltd.), which is an aqueous dispersion of titanium oxide as a photocatalyst, was mixed and stirred at 100 ° C. for 20 minutes. This was diluted three times with isopropyl alcohol to obtain a photocatalyst-containing layer composition.

  The above composition was applied on a transparent substrate made of soda glass by a spin coater, and dried at 150 ° C. for 10 minutes to form a transparent photocatalyst-containing layer (0.2 μm in thickness).

2. Confirmation of formation of ink-philic region by exposure Pattern exposure was performed on this photocatalyst-containing layer with a mercury lamp (wavelength 365 nm) at an illuminance of 70 mW / cm ² for 50 seconds through a mask to form an exposed portion, and a non-exposed portion and light exposure The contact angle between the part and the liquid was measured. In the non-exposed area, a contact angle with a liquid having a surface tension of 30 mN / m (manufactured by Junsei Chemical Co., Ltd., ethylene glycol monoethyl ether) was measured using a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.). As a result of the measurement (30 seconds after the droplet was dropped from the micro syringe), it was 30 °. In the exposed portion, the contact angle with a liquid having a surface tension of 50 mN / m (wetting index standard liquid No. 50, manufactured by Junsei Chemical Co., Ltd.) was measured in the same manner. Thus, it was confirmed that the exposed portion became the ink-philic region, and that pattern formation was possible due to the difference in wettability between the exposed portion and the non-exposed portion.

3. Next, a photocatalyst-containing layer was formed on the same transparent substrate as described above. The photocatalyst-containing layer was exposed (for 50 seconds at an illuminance of 70 mW / cm ² ) with a mercury lamp (wavelength 365 nm) through a light-shielding portion mask provided with a matrix-shaped open pattern (opening line width 30 μm), The exposed portion for the light-shielding portion was defined as an ink-philic region (converted to a contact angle of 7 degrees or less with a liquid having a surface tension of 50 mN / m).

On the other hand, a mixture having the following composition was heated and dissolved at 90 ° C., centrifuged at 12,000 rpm, and then filtered through a 1 μm glass filter. To the obtained aqueous colored resin solution, 1% by weight of ammonium bichromate was added as a cross-linking agent to prepare a light-shielding portion paint.
・ Carbon black (# 950, manufactured by Mitsubishi Chemical Corporation): 4 parts by weight ・ Polyvinyl alcohol: 0.7 parts by weight (Gohsenol AH-26, manufactured by Nippon Synthetic Chemical Co., Ltd.)
Ion-exchanged water: 95.3 parts by weight Next, the coating material for a light-shielding portion was applied to the entire surface of the photocatalyst-containing layer using a blade coater. The coating material for the light-shielding portion applied in this manner was repelled at the non-exposed portion of the photocatalyst-containing layer, and selectively adhered only to the exposed portion for the light-shielding portion. Thereafter, the coating was dried at 60 ° C. for 3 minutes, and exposed to light with a mercury lamp to cure the light-shielding portion paint, and further subjected to a heat treatment at 150 ° C. for 30 minutes to form a light-shielding portion.

4. Next, the entire surface of the photocatalyst-containing layer on which the light-shielding portion was formed was exposed to light, and the exposed portion for the pixel portion was made ink-philic. Next, using an ink jet device, a UV-curable polyfunctional acrylate monomer ink of each color of RGB including 5 parts by weight of a pigment, 20 parts by weight of a solvent, 5 parts by weight of a polymerization initiator, and 70 parts by weight of a UV-curable resin was prepared. It was attached to the exposed portion for the pixel portion, which was colored, and was subjected to UV treatment and cured. Here, for each of the red, green, and blue inks, polyethylene glycol monomethyl ethyl acetate was used as a solvent, Irgacure 369 (trade name, manufactured by Ciba Specialty Chemicals Co., Ltd.) as a polymerization initiator, and UV curable resin. Used was DPHA (dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd.). As pigments, CI Pigment Red 177 for red ink, CI Pigment Green 36 for green ink, and CI Pigment Green 36 for blue ink. Pigment Blue 15 + CI Pigment Violet 23 was used.

5. Formation of Protective Layer As the protective layer, a two-component mixed type thermosetting agent (SS7265 manufactured by Nippon Synthetic Rubber Co., Ltd.) is applied by a spin coater and cured at 200 ° C. for 30 minutes to form a protective layer. Got. The obtained color filter was of high quality without color loss or color unevenness in the pixel portion.

[Example 2]
1. Formation of Photocatalyst-Containing Layer A photocatalyst-containing layer similar to that of Example 1 was formed on a transparent substrate having a light-shielding layer formed of chromium by a sputtering method.

2. Next, pattern exposure was performed for 50 seconds by a mercury lamp (wavelength: 365 nm, 70 mW / cm ² ) from the photocatalyst containing layer side through the pixel portion mask, and the exposed portion for the pixel portion was changed to the ink-philic region (surface). (Converted to a contact angle with a liquid having a tension of 50 mN / m, 7 degrees or less).

  In the exposed portion for the pixel portion, a UV-curable polyfunctional acrylate monomer ink of each color including 5 parts by weight of a pigment, 20 parts by weight of a solvent, 5 parts by weight of a polymerization initiator, and 70 parts by weight of a UV-curable resin, using an inkjet apparatus. Was attached to the exposed portion for the pixel portion, which was made to be ink-philic, and was colored. This was subjected to UV treatment and cured. Here, for each of the red, green, and blue inks, polyethylene glycol monomethyl ethyl acetate was used as a solvent, Irgacure 369 (trade name, manufactured by Ciba Specialty Chemicals Co., Ltd.) as a polymerization initiator, and UV curable resin. Used was DPHA (dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd.). As pigments, CI Pigment Red 177 for red ink, CI Pigment Green 36 for green ink, and CI Pigment Green 36 for blue ink. Pigment Blue 15 + CI Pigment Violet 23 was used.

3. Formation of Protective Layer As the protective layer, a two-component mixed type thermosetting agent (SS7265 manufactured by Nippon Synthetic Rubber Co., Ltd.) is applied by a spin coater and cured at 200 ° C. for 30 minutes to form a protective layer. Got. The obtained color filter was of high quality with no color loss or uneven color in the pixel portion as in the case of Example 1.

[Example 3]
1. Formation of Photocatalyst-Containing Layer 3 g of isopropyl alcohol, fluoroalkylsilane (manufactured by Tochem Products Inc .; MF-160E (trade name), N- [3- (trimethoxysilyl) propyl] -N-ethylperfluorooctanesulfonamide Of isopropyl ether (50% by weight), 2 g of titanium oxide sol (manufactured by Ishihara Sangyo Co., Ltd .; STS-01 (trade name)), and 0 g of silica sol (manufactured by Nippon Synthetic Rubber Co., Ltd .; Glasca HPC7002 (trade name)) 0.6 g and 0.2 g of alkylalkoxysilane (manufactured by Nippon Synthetic Rubber Co., Ltd .; HPC402II (trade name)) were mixed and stirred at 100 ° C. for 20 minutes. This solution was coated on a 0.7 mm-thick non-alkali glass substrate by spin coating to obtain a 0.15 μm-thick photocatalyst-containing layer.

2. Formation of ink-philic region by exposure and confirmation of reduction of fluorine amount The surface of this photocatalyst-containing layer was irradiated with ultraviolet light for 2 minutes at an illuminance of 70 mW / cm ² (365 nm) by a super-high pressure mercury lamp through a grid-shaped photomask. , N-octane (surface tension 21 mN / m) was measured by a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.). It was 0 degrees.

  The unexposed and exposed portions were subjected to elemental analysis using an X-ray photoelectron spectrometer (ESCALAB220-I-XL, manufactured by V.G. Sientific). Quantitative calculation by Shary's back-round correction and Scofield's relative sensitivity coefficient correction shows the results obtained as relative values by weight when titanium (Ti) is 100, and the unexposed portion is titanium (Ti). Fluorine (F) 1279 with respect to 100, whereas fluorine (F) 6 with respect to titanium (Ti) 100 in the exposed portion.

  From these results, it was found that by exposing the photocatalyst-containing layer, the proportion of fluorine on the surface of the photocatalyst-containing layer was reduced, and the surface was changed from ink-repellent to ink-philic.

FIG. 1 is a schematic sectional view illustrating an example of a first embodiment of a color filter of the present invention. FIG. 4 is a schematic sectional view showing another example of the first embodiment of the color filter of the present invention. FIG. 6 is a schematic sectional view illustrating an example of a second embodiment of the color filter of the present invention. It is a schematic sectional view showing an example of a 3rd embodiment of a color filter of the present invention. FIG. 9 is a schematic sectional view illustrating an example of a fourth embodiment of the color filter of the present invention. It is a schematic sectional view showing an example of a 5th embodiment of a color filter of the present invention. It is a flowchart for explaining a 6th embodiment of the manufacturing method of the color filter of the present invention. FIG. 8 is a schematic diagram for explaining another example of a method of exposing a pixel portion in the method of manufacturing the color filter shown in FIG. 7. FIG. 8 is a process chart for describing a method of manufacturing the ink-repellent convex portions in the method of manufacturing the color filter illustrated in FIG. 7. FIG. 8 is a process chart for describing another example of a method for manufacturing a pixel portion in the method for manufacturing a color filter illustrated in FIG. 7. It is a flowchart for explaining the 7th embodiment of the manufacturing method of the color filter of the present invention. It is a flowchart for explaining the 8th embodiment of the manufacturing method of the color filter of the present invention. It is a flowchart for explaining the 10th embodiment of the manufacturing method of the color filter of the present invention.

Explanation of reference numerals

1 ... Color filter,
2 ... Transparent substrate,
3 ... light shielding part 4 ... pixel part forming part,
5 ... variable wettability layer (photocatalyst containing layer),
6 ... pixel part,
7. Ink-repellent convex portion,
9 ... light shielding part forming part,
10 ... energy.

Claims (42)

  A transparent substrate, a pixel portion in which a plurality of colors are provided in a predetermined pattern by an inkjet method on the transparent substrate, a light shielding portion provided at a boundary portion of the pixel portion, and the pixel portion or the pixel portion and the light shielding portion And a wettability variable layer capable of changing the wettability provided for forming a color filter.   The color filter according to claim 1, wherein at least the pixel unit is provided on the variable wettability layer.   The light-shielding portion is formed on the transparent substrate, and the wettability variable layer is provided on at least the light-shielding portion and a pixel portion forming portion that is a portion on which the pixel portion is formed on the transparent substrate. The color filter according to claim 2, wherein the pixel portion is provided on the variable wettability layer.   4. The color filter according to claim 3, wherein the width of the pixel portion formed on the variable wettability layer is wider than the width of an opening formed by the light shielding portion.   The color filter according to claim 3, wherein an ink-repellent convex portion is formed on a surface of the variable wettability layer provided on the light shielding portion.   The color filter according to claim 5, wherein the width of the ink-repellent convex portion is formed to be smaller than the width of the light shielding portion.   3. The color filter according to claim 2, wherein a variable wettability layer is formed on the transparent substrate, and a pixel portion and a light shielding portion are provided at predetermined portions on the variable wettability layer.   The light shielding portion is provided on the transparent substrate, and a variable wettability layer is provided in a pixel portion forming portion, which is a portion where the pixel portion on the transparent substrate is formed, and the pixel portion is provided on the variable wettability layer. The color filter according to claim 2, wherein the color filter is formed.   The color filter according to claim 1, wherein the variable wettability layer is provided at a boundary portion of the pixel portion.   10. The light shielding portion is formed on the transparent substrate, the variable wettability layer is formed on the light shielding portion, and the pixel portion is formed between the variable wettability layers. The described color filter.   The color filter according to claim 10, wherein the width of the variable wettability layer is formed to be smaller than the width of the light blocking part.   The variable wettability layer is formed in a light-shielding portion forming portion, which is a portion where the light-shielding portion is formed on the transparent substrate, the light-shielding portion is formed on the variable wettability layer, and the pixel is provided between the light-shielding portions. The color filter according to claim 9, wherein a portion is formed.   The color filter according to any one of claims 8 to 12, wherein the wettability on the transparent substrate is less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m. .   The said wettability variable layer is a photocatalyst containing layer which consists at least of a photocatalyst and a binder, and is a layer which changes wettability so that the contact angle with a liquid may fall by irradiation of energy, The layer characterized by the above-mentioned. A color filter according to any one of claims 1 to 13.   The photocatalyst containing layer contains fluorine, and when the photocatalyst containing layer is irradiated with energy, the photocatalyst acts such that the fluorine content on the surface of the photocatalyst containing layer is reduced by the action of the photocatalyst as compared to before the energy irradiation. 15. The color filter according to claim 14, wherein a content layer is formed.   The energy irradiation on the photocatalyst containing layer is performed, and the fluorine content in the portion where the fluorine content is reduced is 10 or less when the fluorine content in the portion where the energy is not irradiated is 100. The color filter according to claim 15, wherein The photocatalyst includes titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and oxidized the color filter according to any one of claims of claims 14 to 16, characterized in that one or more substances selected from iron (Fe 2 _{O 3).} The color filter of claim 17 wherein the photocatalyst is titanium oxide (TiO _2).   When the content of fluorine on the surface of the photocatalyst containing layer is analyzed and quantified by X-ray photoelectron spectroscopy, when the element of Ti is taken as 100, the amount of fluorine is 500 or more at the surface of the photocatalyst containing layer. The color filter according to claim 18, further comprising a photocatalyst-containing layer contained in the color filter.   The color filter according to any one of claims 14 to 19, wherein the binder is an organopolysiloxane having a fluoroalkyl group. The binder is Y _n SiX _(4-n) (where Y represents an alkyl group, fluoroalkyl group, vinyl group, amino group, phenyl group or epoxy group, X represents an alkoxyl group or halogen. 15. An organopolysiloxane which is one or more hydrolyzed condensates or co-hydrolyzed condensates of a silicon compound represented by the following formula: 20. The color filter according to claim 19.   22. The color filter according to claim 21, wherein, among the silicon compounds constituting the organopolysiloxane, a silicon compound containing a fluoroalkyl group is contained in an amount of 0.01 mol% or more.   A contact angle with a liquid having a surface tension of 40 mN / m on the photocatalyst-containing layer is 10 degrees or more in a portion where energy is not applied and less than 10 degrees in a portion where energy is applied. A color filter according to any one of claims 14 to 22.   24. The pixel unit according to claim 1, wherein the pixel unit colored by the inkjet method is a pixel unit colored by an inkjet method using a UV curable ink. Color filters. (1) forming a light shielding portion on a transparent substrate;
(2) providing a photocatalyst-containing layer in which the wettability of the energy-irradiated portion changes in the direction of decreasing the contact angle of the liquid on the surface of the transparent substrate on which the light-shielding portion is formed;
(3) a step of irradiating energy to a pixel portion forming portion, which is a portion for forming a pixel portion on the photocatalyst containing layer, to form a pixel portion exposure portion;
And (4) forming a pixel portion by coloring the exposed portion for the pixel portion by an ink jet method.   After the step of providing the photocatalyst-containing layer, the photocatalyst-containing layer on the light-shielding portion is pattern-irradiated with energy to form an exposed portion for the ink-repellent convex portion. The method for manufacturing a color filter according to claim 25, further comprising a step of forming a portion.   26. The method for manufacturing a color filter according to claim 25, wherein in the step of forming the exposure portion for the pixel portion, the exposure portion for the pixel portion is formed by exposing from the transparent substrate side using the light shielding portion as a mask. (1) providing, on a transparent substrate, a photocatalyst-containing layer in which the wettability of an energy-irradiated portion changes in a direction in which the contact angle with a liquid decreases by energy irradiation;
(2) forming a light-shielding portion exposure portion by pattern-irradiating energy to a light-shielding portion forming portion, which is a portion where the light-shielding portion is formed on the transparent substrate;
(3) providing a light-shielding portion in the light-shielding portion exposure portion;
(4) a step of irradiating energy to the transparent substrate provided with the light shielding portion to form an exposure portion for a pixel portion;
(5) forming a pixel portion by coloring the exposed portion for the pixel portion by an ink-jet method. (1) providing, on a transparent substrate, a photocatalyst-containing layer in which the wettability of the energy-irradiated portion changes in the direction in which the contact angle of the liquid decreases;
(2) forming a pixel portion exposure portion by pattern-irradiating energy onto a pixel portion formation portion, which is a portion where the pixel portion on the transparent substrate is formed,
(3) forming a pixel portion by coloring the exposed portion for the pixel portion by an inkjet method;
(4) irradiating at least a photocatalyst-containing layer at a boundary portion of the pixel portion with energy;
(5) forming a light-shielding portion at a boundary portion of the pixel portion irradiated with the energy. (1) A photocatalyst-containing layer in which the wettability of an energy-irradiated portion changes in a direction in which the contact angle with a liquid decreases on a transparent substrate is formed in a pixel portion forming portion, which is a portion where a pixel portion is formed on the transparent substrate. Providing,
(2) providing a light-shielding portion at a boundary portion of the pixel portion forming portion provided with the photocatalyst-containing layer;
(3) irradiating the photocatalyst-containing layer with energy to form an exposed portion for a pixel portion;
And (4) forming a pixel portion by coloring the exposed portion for the pixel portion by an ink jet method. (1) forming a light shielding portion on a transparent substrate;
(2) providing a photocatalyst-containing layer on the upper surface of the light-shielding portion, in which the wettability of the energy-irradiated portion changes in the direction in which the contact angle of the liquid decreases;
(3) coloring a pixel portion forming portion, which is a portion where the pixel portion is formed on the transparent substrate on which the photocatalyst-containing layer is not provided, by an ink jet method to form a pixel portion. Manufacturing method of a color filter. (1) A step of providing, on a transparent substrate, a photocatalyst-containing layer in which the wettability of an energy-irradiated portion changes in a direction in which the contact angle of a liquid decreases, in a light-shielding portion forming portion on the transparent substrate where the light-shielding portion is formed. When,
(2) a step of coloring a portion of the transparent substrate where the photocatalyst-containing layer is not formed by an inkjet method to form a pixel portion;
(3) irradiating at least the photocatalyst-containing layer with energy;
(4) forming a light-shielding layer on the photocatalyst-containing layer irradiated with the energy. After forming the exposure portion for the pixel portion, the step of forming a pixel portion by coloring there by an inkjet method,
(A) forming a first pixel portion exposure portion by pattern-irradiating energy to a part of a portion on the photocatalyst containing layer where a pixel portion is to be formed;
(B) forming a first pixel portion by coloring the exposed portion for the first pixel portion by an inkjet method;
(C) exposing a portion on the photocatalyst-containing layer where a remaining pixel portion is to be formed to form an exposed portion for a second pixel portion;
30. The method of claim 25, further comprising the step of: (d) coloring the exposed portion for the second pixel portion by an inkjet method to form a second pixel portion.   The color according to any one of claims 25, 26, and 31, wherein the width of the pixel portion is formed wider than the width of the opening formed by the light shielding portion. Manufacturing method of filter.   33. The method according to claim 30, wherein the wettability on the transparent substrate is less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m. A method for manufacturing a color filter.   The method for producing a color filter according to any one of claims 25 to 35, wherein the energy applied to the photocatalyst-containing layer is light including ultraviolet light.   The energy applied to the photocatalyst-containing layer is a photocatalytic reaction start energy and a reaction speed increasing energy, and the exposed portion is irradiated with the reaction speed increasing energy to irradiate the photocatalytic reaction start energy to form an exposed portion. The method for producing a color filter according to any one of claims 25 to 35, characterized in that:   The method according to claim 37, wherein the photocatalytic reaction initiation energy is light including ultraviolet light, and the reaction rate increasing energy is heat energy.   39. The method according to claim 38, wherein the heat energy is applied by an infrared laser.   A contact angle with a liquid having a surface tension of 40 mN / m on the photocatalyst-containing layer is 10 degrees or more in a part where energy is not irradiated and less than 10 degrees in a part where energy is irradiated. The method for manufacturing a color filter according to any one of claims 25 to 39.   The method according to any one of claims 25 to 40, wherein the coloring of the exposure unit for the pixel unit by an inkjet method is coloring by an inkjet method using a UV curable ink. A method for manufacturing a color filter. 25. A liquid crystal panel comprising: the color filter according to claim 1; and a substrate facing the color filter, wherein a liquid crystal compound is sealed between the two substrates.

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