KR100781198B1 - Color filter and process for producing the same - Google Patents

Abstract

The present invention provides a transparent substrate, a pixel portion having a plurality of colors arranged in a predetermined pattern by an inkjet method on the transparent substrate, a light shielding portion disposed at a boundary portion of the pixel portion, and a pixel portion or a pixel portion and a light shielding portion. To provide a color filter having a wettability variable layer that can be excreted in order to change the wettability.

Color filter, transparent substrate, pixel portion, light shielding portion, wettability variable layer, photocatalyst, inkjet, ink repellency

Description

Color filter and manufacturing method {COLOR FILTER AND PROCESS FOR PRODUCING THE SAME}

1 is a schematic cross-sectional view showing one example of the first embodiment of a color filter of the present invention.

2 is a schematic cross-sectional view showing another example of the first embodiment of the color filter of the present invention.

3 is a schematic cross-sectional view showing one example of the second embodiment of the color filter of the present invention.

4 is a schematic cross-sectional view showing one example of the third embodiment of the color filter of the present invention.

5 is a schematic cross-sectional view showing one example of the fourth embodiment of the color filter of the present invention.

6 is a schematic cross-sectional view showing one example of the fifth embodiment of the color filter of the present invention.

7 is a flowchart for explaining a sixth embodiment of the manufacturing method of the color filter of the present invention.

8 is a schematic view for explaining another example of the exposure method of the pixel portion in the manufacturing method of the color filter shown in FIG.

FIG. 9 is a process chart for explaining a method for manufacturing an ink repellent convex portion in the method for manufacturing a color filter shown in FIG. 7.

FIG. 10 is a process chart for explaining another example of the manufacturing method of the pixel portion in the manufacturing method of the color filter shown in FIG.

It is process drawing for demonstrating 7th Embodiment of the color filter manufacturing method of this invention.

It is process drawing for demonstrating 8th embodiment of the color filter manufacturing method of this invention.

It is process drawing for demonstrating 10th Embodiment of the color filter manufacturing method of this invention.

[Explanation of symbols on the main parts of the drawings]

One… Color filter, 2... Transparent substrate, 3... Light shielding part; Pixel portion forming portion, 5... Wettability variable layer (photocatalyst-containing layer), 6... Pixel portion 7... Ink repellent convex, 9.. . Shading portion forming portion, 10. energy

The present invention relates to a color filter suitable for a color liquid crystal display obtained by coloring a pixel portion by an inkjet method and a manufacturing method thereof.

Recently, with the development of personal computers, especially with the development of portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, tends to increase. However, since such color liquid crystal displays are expensive, the demand for cost down is high, and the demand for cost down for color filters having a high specific gravity in terms of cost is high.

In such a color filter, a color pattern of three primary colors of red (R), green (G), and blue (B) is usually provided, and the electrodes corresponding to the pixels of R, G, and B are turned ON and OFF. The liquid crystal works as a shutter, and light passes through the pixels of R, G, and B, and color display is performed.

As a manufacturing method of the color filter conventionally performed, the dyeing method is included, for example. This dyeing method first forms a water-soluble polymer material, which is a material for dyeing, on a color substrate, patterning it into a desired shape by a photolithography process, and then immersing the obtained pattern in a dye bath to obtain a colored pattern. . By repeating this three times, the color filter layers R, G, and B are formed.

Another method is a pigment dispersion method. This method first forms a photosensitive resin layer in which pigments are dispersed on a substrate, and then patterns it to obtain a monochromatic pattern. This process is repeated three times again to form color filter layers R, G, and B.

As another method, an electrodeposition method, the method of disperse | distributing a pigment to a thermosetting resin, performing 3 times of printing of R, G, and B, and then thermosetting resin, etc. may be included. However, in either method, the same process needs to be repeated three times in order to color the three colors of R, G, and B, resulting in a problem of high cost, and a problem of lowering the yield in order to repeat the process.

As a manufacturing method of the color filter which solved these problems, the method of spraying a coloring ink by the inkjet method and forming a colored layer (pixel part) is proposed (Japanese Patent Laid-Open No. 84-75205). Here, in the case of using an ink having good wattability with respect to a glass substrate, a method of printing a convex portion previously bounded by a material having poor wettability with respect to the ink, and poor wettability with respect to glass In the case of using the ink, a method is disclosed in which a pattern is formed of a material having good wettability with the ink in advance and assists the ink in fixing. However, specifically, no description is made as to how to distinguish between materials with good wettability and materials with poor wettability.

On the other hand, as another method of forming a colored layer (pixel portion) by spraying the colored ink by an inkjet method and manufacturing a color filter, Japanese Patent Laid-Open Publication No. 97-203803 has a recessed ink portion. A method of treating with an inkphilic treatment agent is disclosed. In this method, convex portions are formed on the substrate in advance, and the convex portions are made ink-repellent, and then the entire substrate is subjected to a surface treatment with an ink repellent treatment agent. However, this method has a problem in that it is necessary to make the convex portions ink repellent in advance when performing the ink repellent treatment, and thus, there is a problem that it is necessary to perform two processes of ink repellent treatment and the ink repellent treatment.

Similarly, as a method of forming a colored layer by an inkjet method and manufacturing a color filter, an absorption layer of ink is formed on a substrate in Japanese Patent Laid-Open Nos. 96-230314 and 96-227012. The method of forming a colored layer (pixel part) by changing the ink absorbency of this absorbing layer into an exposed part and a non-exposed part is described. However, in this method, since the absorbing layer is formed to absorb the ink into the absorbing layer to form a colored layer, there is a problem in coloration at the center and the periphery of the dot of the ink, resulting in color unevenness. Moreover, this absorbing layer also has a problem that a predetermined thickness is necessarily required in view of its function of absorbing ink.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and with regard to the wettability of the substrate, which is a problem for forming the pixel portion by the inkjet method, it is not only possible to form a good wettability part and a bad part in a single layer, but also this wettability is good. The main object of the present invention is to provide a color filter and a manufacturing method thereof, which can easily form a pattern between a portion and a bad portion in a small process, do not require an absorbing layer of ink, and can be manufactured at low cost as well as of good quality. It is done.

In order to achieve the above object, the present invention provides a transparent substrate, a pixel portion in which a plurality of colors are disposed in a predetermined pattern by an inkjet method on the transparent substrate, and the pixel. Having a light blocking portion disposed at a boundary of the negative portion, and a wettability variable layer disposed to form the pixel portion or the pixel portion and the light blocking portion and capable of changing wettability. It provides a color filter characterized by.

As described above, the present invention is characterized by having a wettability variable layer for forming the pixel portion or for forming the pixel portion and the light shielding portion. Therefore, by using the change in the wettability of the wettability variable layer, the pixel portion or the pixel portion and the light shielding portion can be formed with high precision, and a high quality color filter can be provided without problems such as discoloration and color unevenness.

In this case, as described in Claim 2, you may comprise so that at least the said pixel part may be arrange | positioned on the said wettability variable layer. Thus, by forming a pixel part on a wettability variable layer, the wettability variable layer of the site | part in which the pixel part on a wettability variable layer is previously formed can be made into the lip ink area with a small contact angle with a liquid. By inkjet coloring the pixel portion forming portion, which is an ink-friendly region, ink is attached only to the pixel portion forming portion, which is an ink-friendly region having a small contact angle with liquid, and uniformly in the pixel portion forming portion, which is an ink-friendly region. Ink is applied. Therefore, it is possible to provide a color filter without problems such as color unevenness or discoloration.

As described above, if at least the pixel portion is disposed on the wettable variable layer, the light blocking portion is formed on the transparent substrate, and at least the pixel portion is formed on the light blocking portion and the transparent substrate. The wettable variable layer is disposed in the pixel portion forming portion, and even if the pixel portion is formed on the wettable variable layer (the pixel portion is formed on the wettable variable layer, and the wettable variable layer is disposed on the light shielding portion). Filter, hereinafter referred to as the first embodiment), as described in claim 7, a wettability variable layer is formed on the transparent substrate, and the pixel portion and the light shielding portion are disposed on a predetermined portion on the wettability variable layer ( A color filter in which the pixel portion and the light shielding portion are formed on the wettability variable layer, hereinafter referred to as the second embodiment), and further, as described in claim 8 In some cases, a wettability variable layer may be disposed on a pixel portion formation portion, which is a portion where the light shielding portion is disposed on the transparent substrate and a pixel portion is formed on the transparent substrate, and a pixel portion may be formed on the wettability variable layer (pixels). A color filter formed on the additional wettability variable layer and on which the wettability variable layer is not formed on the light shielding portion, hereinafter referred to as the third embodiment).

In the first embodiment, as described in claim 4, the width of the pixel portion formed on the wettability variable layer is preferably wider than the width of the opening formed by the light shielding portion. This is because by forming the width of the pixel portion to be wider than the width of the opening of the light shielding portion, it is possible to prevent problems such as discoloration in which the backlight light passes through a portion where the pixel portion is not formed.

In this invention, as described in Claim 5, it is preferable that the ink repellent iron part is formed in the surface of the wettability variable layer arrange | positioned on the said light shielding part. In this way, the ink repellent convex portions are formed on the surface of the wettable variable layer disposed on the light shielding portion, so that the ink repellent convex portions are formed between the pixel portion forming portions in the case where the pixel portion is formed using the wettable variable layer of the pixel portion forming portion as the inking region. Since is formed, it is preferable because problems such as mixing of ink do not occur during coloring.

In this case, as described in Claim 6, it is preferable that the width | variety of the said ink repellent iron part is formed in the width narrower than the width | variety of the said light shielding part. Thus, by forming the width of the ink repellent convex portion narrower than the width of the light shielding portion, the width of the pixel portion formed between the ink repellent convex portions can be formed wider than the width of the opening formed by the light blocking portion. This is because the effect can be obtained.

On the other hand, in the color filter of this invention, as described in Claim 9, it can also be comprised so that the said wettability variable layer may be arrange | positioned at the boundary part of the said pixel part. In this way, the wettability on the wettability variable layer at the boundary portion of the pixel portion is set to an ink repellent region where the contact angle with the liquid is larger than the portion on the transparent substrate on which the pixel portion is formed, thereby forming the pixel portion (pixel portion forming portion). When it is colored by the ink, it is difficult for the ink to move beyond the boundary portion of the pixel portion having ink repellency, so that a color filter without problems such as mixing of the ink can be provided. After that, by setting the wettability variable layer at the boundary portion of the pixel portion to be an inking region having a small contact angle with the liquid, it is possible to easily provide a light shielding layer at the boundary portion of the pixel portion or to coat the protective layer over the whole. High quality color filters can be obtained.

In this case, as described in claim 10, the light shielding portion is formed on the transparent substrate, the wettability variable layer is formed on the light shielding portion, and the pixel portion is formed between the wettability variable layers (wetability on the light shielding portion). The wettability variable layer is formed in the light shielding portion forming portion, which is a portion in which the light shielding portion is formed on the transparent substrate, as described in claim 12, a color filter having a variable layer disposed therein, hereinafter referred to as a fourth embodiment. A light shielding portion is formed on the wettability variable layer, and a pixel portion may be formed between the light shielding portions (a color filter having a light shielding portion formed on the wettability variable layer, hereinafter referred to as a fifth embodiment).

In the fourth embodiment, as described in claim 11, the width of the wettability variable layer is preferably formed to be narrower than the width of the light shielding portion. As described above, since the width of the wettability variable layer is smaller than the width of the light blocking portion, the width of the pixel portion formed between the wettability variable layers may be larger than the width of the opening of the light blocking portion. This is because problems such as discoloration can be prevented.

In the case of the color filter in which the said wettability variable layer is arrange | positioned at the boundary part of the said pixel part mentioned above with the 3rd Embodiment mentioned above, as described in Claim 13, the wettability on the said transparent substrate is 40 mN / m in surface tension. It is preferable that it is less than 10 degrees as a contact angle with phosphorus liquid. This is because in the third embodiment, the light-shielding portion ink and the like are uniformly spread in the light-shielding portion forming portion, so that the light-shielding portion can be formed uniformly with a high density, and the wettability variable layer is disposed at the boundary portion of the pixel portion. In the case of the color filter, since the pixel portion is uniformly spread in the pixel portion forming portion on the transparent substrate, it is possible to provide a color filter of good quality without color unevenness.

In the present invention, as described in claim 14, it is preferable that the wettability variable layer is not only a photocatalyst-containing layer made of at least a photocatalyst and a binder, but also a layer whose wettability is changed so that the contact angle with a liquid is reduced by irradiation of energy. Thus, when the photocatalyst-containing layer whose wettability changes is formed such that the contact angle with the liquid is lowered by the irradiation of energy, the wettability of the layer is easily changed by performing energy pattern irradiation or the like, and the ink having a small contact angle with the liquid is formed. A sex region can be formed, for example, and it becomes possible to easily set it as a lip ink region only in the part in which a pixel part is formed. Therefore, the color filter can be manufactured efficiently, which is advantageous in terms of cost.

In the color filter according to claim 14, as described in claim 15, the photocatalyst-containing layer contains fluorine, and when the energy is irradiated to the photocatalyst-containing layer, the fluorine content on the surface of the photocatalyst-containing layer is caused by the action of the photocatalyst. It is preferable that the said photocatalyst containing layer is formed so that it may fall in comparison with this energy irradiation.

Thus, since the color filter of this invention is comprised so that the fluorine content of the energy irradiation part on the photocatalyst containing layer formed on the transparent substrate may fall, the pattern which consists of the part from which the fluorine content was reduced by pattern irradiation of energy can be formed. When the fluorine content is lowered, the part is fertilized with other parts to become a high ink-friendly area, so that only the part where the pixel portion or the like is formed can be easily made into the ink-friendly area, thereby easily producing a color filter. .

In the color filter according to claim 15, as described in claim 16, the fluorine in the portion where the fluorine content is not irradiated with energy is irradiated onto the photocatalyst-containing layer and the fluorine content is reduced. When content is 100, it is preferable that it is 10 or less.

As described above, when the fluorine content at the portion of the low fluorine content formed by the energy irradiation onto the photocatalyst-containing layer is 100 or less on the basis of the weight, the energy fluorescence portion and the It can make a big difference in the ink reactivity with the irradiation part. Therefore, by forming the pixel portion or the like on the photocatalyst-containing layer having such a pattern, it is possible to accurately form the pixel portion or the like only in the lipophilic region in which the fluorine content is reduced, and the color filter can be manufactured with high precision.

The photocatalyst-containing layer used in the present invention is composed of at least a photocatalyst and a binder as described above, among which the photocatalyst is titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), as described in claim 17. And one or two or more materials selected from strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and iron oxide (Fe ₂ O ₃ ). That while it is preferable that titanium (TiO ₂₎ oxide, as described in claim 18. This is because titanium oxide is not only effective as a photocatalyst but also chemically stable because of its high band gap energy, which is not toxic and easy to obtain.

In the case of the color filter in which the photocatalyst according to claim 18 is titanium oxide, as described in claim 19, when the fluorine content on the surface of the photocatalyst-containing layer is analyzed and quantified by X-ray photoelectron spectroscopy, when the titanium element is 100, It is preferable to have a photocatalyst containing layer in which a fluorine element is contained in the surface of a photocatalyst containing layer in the ratio which an element becomes 500 or more.

If such an amount of fluorine (F) element is contained, the ink repellency of the unirradiated portion is sufficient, and a pattern of the portion where the fluorine (F) element content is reduced by irradiation with energy is formed, and the pixel portion is This is because the ink and the like are not pushed out to portions other than the portion where the pixel portion is formed when forming the etc., and the color filter can be manufactured more accurately.

On the other hand, in the color filter of any one of Claims 14-19, it is preferable that the binder which is another component which comprises a photocatalyst content is organic polysiloxane which has a fluoroalkyl group as described in Claim 20.

In the color filter of the present invention, various methods can be used for the method of containing the fluorine element in the photocatalyst-containing layer. However, by using an organic polysiloxane having a fluoroalkyl group as the binder, the fluorine element can be easily contained in the photocatalyst-containing layer. Not only that, but the content can be easily reduced by irradiation of energy.

Similarly, in the color filter according to any one of claims 14 to 19, the binder which is another component constituting the photocatalyst-containing layer is Y _n SiX _(4-n) , wherein Y is an alkyl group, as described in claim 21. , A fluoroalkyl group, a vinyl group, an amino group, a phenyl group, or an epoxy group, X represents an alkoxyl group or a halogen, n is an integer of 0 to 3) or one or two or more hydrolytic condensation of the silicon compound represented by It is preferable that it is organic polysiloxane which is water or a co-hydrolysis condensate.

In the color filter of Claim 21, as described in Claim 22, it is preferable that the silicon compound containing a fluoroalkyl group contains 0.01 mol% or more of the said silicon compounds which comprise the said organic polysiloxane.

Thus, when 0.01 mol% or more of silicon compounds containing a fluoroalkyl group are contained, sufficient ink is contained on the surface of a photocatalyst-containing layer, and fluorine element is contained, and energy is irradiated, and the ink-friendly region and energy on the photocatalyst-containing layer on which the content of fluorine element is reduced are Since the difference in wettability with the ink repellent region on the surface of the photocatalyst-containing layer that is not irradiated can be increased, ink or the like adheres accurately without being pushed out to the ink repellent region when forming the pixel portion or the like in the ink-repellent region. This is because a color filter having good quality can be manufactured.

In this invention, it is preferable that the contact angle with the liquid of surface tension 40mN / m on the said photocatalyst containing layer is 10 degree or more in the part to which energy is not irradiated, and is less than 10 degree in the part to which energy is irradiated (claim 23 and 40. Since the portion where energy is not irradiated is required for ink repellency, when the contact angle with a liquid having a surface tension of 40 mN / m is less than 10 degrees, the ink repellency is not sufficient, and ink or light-shielding portion paint may remain. This is undesirable because it occurs. In addition, when the contact angle with a liquid having a surface tension of 40 mN / m is 10 degrees or more, the spread of ink or light-shielding material for this part may be bad, and discoloration may occur in the pixel part. Because of this.

Moreover, in this invention, it is preferable that the pixel part colored by the said inkjet system is a pixel part colored by the inkjet system using UV curable ink (claim 24 and Claim 41). This is because by using the UV curable ink, the pixel portion is formed by coloring by the inkjet method, and then irradiated with UV, the ink can be quickly cured and immediately sent to the next step, which is preferable in terms of efficiency.

The liquid crystal panel obtained by enclosing the liquid crystal compound between the two substrates with the color filter as described above and the substrate opposite thereto has the advantages of the color filter as described above, namely, no discoloration or color unevenness of the pixel portion, Has the advantage of being advantageous (claim 42).

In the present invention, in order to achieve the above object, as described in claim 25 (1) forming a light shielding portion on a transparent substrate; (2) disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion is changed in a direction in which the contact angle of the liquid is lowered on the surface of the side on which the light shielding portion is formed on the transparent substrate; (3) forming an exposure portion for the pixel portion by applying energy to a pixel portion forming portion, which is a portion for forming the pixel portion on the photocatalyst-containing layer; And (4) forming a pixel portion by coloring the ink portion in the exposure portion for the pixel portion by an inkjet method (hereinafter referred to as a sixth embodiment).

As described above, in the present embodiment, the photocatalyst-containing layer is disposed on the transparent substrate on which the light shielding portion is formed in advance, and by irradiating energy to the pixel portion forming portion on the photocatalyst-containing layer, only the portion where the pixel portion is easily formed can be made into an ink-repellent property. . Therefore, by attaching ink to the exposure portion for the pixel portion in which the pixel portion is formed in an inkjet method, a pixel portion to which ink is uniformly obtained can be obtained, and a color filter without discoloration and color unevenness can be formed.

In the sixth embodiment, as described in claim 26, after the step of disposing the photocatalyst-containing layer, energy is irradiated onto the photocatalyst-containing layer on the light shielding portion to form an exposure portion for the ink-repellent iron portion, and ink repellent therein. You may have a process of forming a cast iron part.

Thus, since the exposure for ink repellent iron parts is excreted also by pattern-irradiating energy on the photocatalyst containing layer on a light shielding part, the exposure part for ink repellent iron parts can be formed in a predetermined width | variety. Therefore, by applying the ink repellent iron coating material to this region, an ink repellent iron portion having a predetermined width can be obtained at a uniform height.

Further, in the sixth embodiment of the present invention, as described in claim 27, in the step of forming the exposed portion for the pixel portion, the exposed portion for the pixel portion is formed by exposing the light shielding portion as a mask and exposing it on the transparent substrate side. You may also By exposing to the front side from the transparent substrate side, that is, the side where the light shielding part is not formed, other part can be exposed without exposing only the photocatalyst containing layer of the part formed in the upper surface of the light shielding part. Therefore, since the energy pattern irradiation can be performed without using a photomask or the like, it is advantageous in terms of cost.

In addition, as described in claim 28, the present invention provides a method for disposing a photocatalyst-containing layer in which wettability of an energy irradiated portion is changed in a direction in which a contact angle with a liquid decreases by irradiation of energy on a transparent substrate; (2) forming a light exposing portion for the light shielding portion by patterning energy to a light shielding portion forming portion which is a portion where the light shielding portion is formed on the transparent substrate; (3) arranging the light shielding portion in the exposure portion for the light shielding portion; (4) forming an exposure portion for the pixel portion by irradiating energy to the transparent substrate on which the light shielding portion is disposed; And (5) forming a pixel portion by coloring the pixel portion exposed portion by an inkjet method (hereinafter referred to as a seventh embodiment).

Thus, in the manufacturing method of the color filter of this embodiment, the contact angle with the liquid of an exposure part can be reduced by arrange | positioning a photocatalyst containing layer on a transparent substrate and irradiating an energy to this photocatalyst containing layer. Therefore, when forming the light shielding portion, only the region where the pattern of light shielding is formed by simply irradiating the pattern of energy on the photocatalyst-containing layer can be made into the inking region, and the light shielding portion can then be charted to form the light shielding portion. Therefore, since it is not necessary to perform the developing process or the etching process after pattern exposure which were performed when the conventional light shielding part was arrange | positioned, a light shielding part can be formed efficiently. In addition, the area | region which forms a pixel part easily can be made into an ink-friendly area | region by irradiating an energy to the whole surface after this, for example. Therefore, by coloring by this inkjet method, it can be made into the pixel part which ink adhered uniformly, and can form the color filter without discoloration or color nonuniformity.

In addition, as described in claim 29, the present invention provides a method for disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion is changed in a direction in which the contact angle of the liquid decreases on the transparent substrate; (2) forming an exposure portion for the pixel portion by patterning energy to a pixel portion forming portion, which is a portion where the pixel portion is formed on the transparent substrate; (3) forming a pixel portion by coloring the ink exposure portion for the pixel portion by an inkjet method; (4) irradiating energy to at least a photocatalyst-containing layer at a boundary portion of the pixel portion; And (5) forming a light shielding portion at a boundary portion of the pixel portion irradiated with the energy (hereinafter referred to as an eighth embodiment).

In this case, a photocatalyst-containing layer is formed on the pixel portion forming portion, which is at least the portion where the pixel portion is formed, and the light blocking portion forming portion, which is the portion where the light blocking portion is formed. The pixel portion forming portion of the photocatalyst-containing layer can be made into a lipophilic region by first irradiating energy to the pixel portion forming portion. Therefore, by adhering the ink to the inkjet method, the ink spreads uniformly and no discoloration occurs. In addition, since the light shielding portion forming portion, which is the boundary portion with the pixel portion, is not irradiated with energy, it is in the ink repellent region. Therefore, it can be said that it is difficult for the ink adhering to the pixel portion forming portion, which is the inks area, to move apart from the light shielding portion forming portion, which is the ink repellent region. Therefore, a problem such as ink mixing does not occur. After forming the pixel portion in this way, the energy can be irradiated to the light shielding portion forming portion of the interpolation interpolation, thereby making this portion an lipophilic region. Therefore, a light shielding part can be formed easily by apply | coating the light shielding part ink to this part, for example.

According to the present invention, as described in claim 30, (1) a pixel on which the pixel portion on the transparent substrate is formed is a photocatalyst-containing layer whose wettability of the energy irradiated portion is changed in a direction in which the contact angle with the liquid is decreased. Excretion in the forming portion; (2) providing a light shielding portion at a boundary portion of the pixel portion forming portion in which the photocatalyst-containing layer is disposed; (3) irradiating energy to the photocatalyst-containing layer to form an exposure portion for the pixel portion; And (4) forming a pixel portion by coloring the ink portion in the exposure portion for the pixel portion by an inkjet method (hereinafter referred to as a ninth embodiment).

In this case, the photocatalyst-containing layer is first formed in the pixel portion forming portion, which is a portion where the pixel portion on the transparent substrate is formed. When a material having a contact angle with a liquid higher than that of the substrate surface is used in the state before the photocatalyst-containing layer is irradiated with energy, the light shielding portion forming portion on the substrate between the pixel portion forming portions is more liquid than the pixel portion forming portion on which the photocatalyst-containing layer is formed. The contact angle with the becomes a small ink-friendly region. The light shielding portion can be easily formed first by forming the light shielding portion in the lipophilic region by, for example, the light shielding portion paint. Next, for example, the pixel portion forming portion can be made into an ink-friendly region by irradiating energy to the entire surface on which the light shielding portion is formed. Therefore, by coloring by this inkjet method, the pixel part which ink adhered uniformly is obtained, and it is possible to form the color filter which does not have discoloration and color unevenness.

In the present invention, as described in claim 31, (1) forming a light shielding portion on a transparent substrate; (2) disposing a photocatalyst-containing layer in which the wettability of the energy irradiating portion is changed in a direction in which the contact angle of the liquid is lowered on the light shielding portion; And (3) forming a pixel portion by coloring the pixel portion forming portion, which is a portion in which the pixel portion is formed on the transparent substrate on which the photocatalyst-containing layer is not formed, by an inkjet method (hereinafter, referred to as a color filter). , Referred to as a tenth embodiment).

In this case, first, a light shielding part is formed on a transparent substrate, and a photocatalyst-containing layer is formed on the light shielding part. When a material having a higher contact angle with a liquid than the surface of the transparent substrate is used in the state before the energy is irradiated to the photocatalyst-containing layer. The pixel portion forming portion between the photocatalyst-containing layers becomes an ink-friendly region having a smaller contact angle with the liquid. Therefore, when the ink is attached to the pixel portion forming portion that is the ink-inkable region by the inkjet method, it is difficult for the attached ink to move beyond the light shielding portion forming portion which is the ink repellent region. As a result, problems such as color mixing of the ink are less likely to occur.

In the present invention, as described in claim 32, (1) the photocatalyst-containing layer whose wettability of the energy irradiated portion is changed in a direction in which the contact angle of the liquid decreases on the transparent substrate is a portion where the light shielding portion is formed on the transparent substrate. Excretion in the miner forming portion; (2) forming a pixel portion by coloring by an inkjet method on a portion where the photocatalyst-containing layer on the transparent substrate is not formed; (3) irradiating energy to at least the photocatalyst-containing layer; And (4) forming a light shielding layer on the photocatalyst-containing layer to which the energy is irradiated (hereinafter, referred to as an eleventh embodiment).

In this case, a photocatalyst containing layer is arrange | positioned at the light shielding part formation part in which the light shielding part on a board | substrate is formed. In case of using a material having a higher contact angle with the liquid than the surface of the transparent substrate in the state before the photocatalyst-containing layer is irradiated with energy, the pixel portion forming portion between the photocatalyst-containing layer and the pixel portion forming portion has a contact angle with the liquid. This small ink-free region is formed, and the light shielding portion forming portion, which is a boundary portion with the pixel portion forming portion, becomes an ink repellent region. Therefore, when the ink is attached to the pixel portion forming portion, which is the inking region, by the inkjet method, the attached ink does not move beyond the light shielding portion forming portion, which is the ink repellent region. As a result, problems such as mixing of the ink do not occur. After forming the pixel portion in this way, the portion can be made into an ink-friendly region by irradiating energy to the photocatalyst-containing layer of the light shielding portion forming portion between the pixel portions. Therefore, a light shielding part can be formed easily by apply | coating the ink for light shielding parts to this part, for example.

In the sixth and eighth embodiments of the present invention, as described in claim 33, the step of forming the pixel portion by forming the exposed portion for the pixel portion and then coloring the ink portion by using the inkjet method is performed (a). Forming a light exposure portion for the first pixel portion by pattern-irradiating energy to a portion of the portion forming the pixel portion on the photocatalyst-containing layer; (b) forming a first pixel portion by coloring the first exposure portion for the pixel portion by an inkjet method; (c) forming an exposure portion for the second pixel portion by exposing to a portion forming the remaining pixel portion on the photocatalyst-containing layer; And (d) forming the second pixel portion by coloring the second exposure portion for the second pixel portion by an inkjet method.

That is, in any of the embodiments, the pixel portion is formed by forming an exposure portion for the pixel portion, and the pixel portion is formed by coloring the ink portion by the inkjet method. When the pixel portion is formed, the pixel portion is divided into a first pixel portion and a second pixel portion, respectively, and irradiated with energy. And coloring by the inkjet method.

In the case of forming the pixel portion by coloring the exposure portion for the pixel portion, which has been made into the ink-friendly region by energy irradiation, by an inkjet method, when the interval between the exposure portions for the pixel portion is narrow, the ink repellent region between the pixel portions, etc. at the time of forming the pixel portion, etc. There is a possibility that the ink of the adjacent pixel portion is mixed beyond this. Therefore, it is preferable that the pixel portions are formed in a spaced apart state as much as possible at the time of pixel portion formation. As described above, if the first pixel portion is formed first, and then the second pixel portion is formed, for example, when exposing the first pixel portion, pattern exposure can be performed so that every other pixel portion is formed. At the time of formation of the image portion, adjacent pixel portions can be spaced apart from each other. Thus, the exposure part for a 1st pixel part is formed in the state which has a comparatively large ink repellent area | region between the area | regions to color, and coloring by the inkjet method here, there exists a possibility that the problem which the ink of an adjacent pixel part mixes may not arise. Energy is again irradiated between the first pixel portions thus disposed to form an exposure portion for the second pixel portion, and by coloration by the inkjet method, color filters can be formed without problems such as mixing of the ink.

In the sixth and tenth embodiments of the present invention, it is preferable that the width of the pixel portion is wider than the width of the opening formed by the light shielding portion, as described in claim 34. This is because by taking the width of the pixel portion wider than the opening formed by the light shielding portion, the possibility of the backlight light passing through portions other than the pixel portion can be reduced, and discoloration and the like can be prevented.

Further, in the ninth, tenth, and eleventh embodiments of the present invention, as described in claim 35, the wettability on the transparent substrate is 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m. It is preferable that it is less than. In any of the above embodiments, after the photocatalyst-containing layer having ink repellency is formed as compared with that on the transparent substrate, the pixel portion or the light shielding portion is disposed on the portion where it is not formed, or the wettability on the surface substrate is 40 mN / m. If the contact angle with the liquid is less than 10 degrees, the liquid is easy to spread. For example, if the pixel portion is uniform, the ink for inkjet is spread evenly, so that the pixel portion without color unevenness can be obtained, and a high quality color filter can be obtained.

In the present invention, as the energy for exposing the photocatalyst-containing layer to be exposed in contrast to the photocatalyst-containing layer, as described in claim 36, the light usually contains ultraviolet rays. As described, the exposure portion may be formed by using the photocatalytic reaction starting energy and the reaction rate increasing energy as the energy and irradiating the reaction rate increasing energy to the portion irradiated with the photocatalytic reaction starting energy.

This is to apply a photocatalytic reaction starting energy to the photocatalyst-containing layer and to form a pattern of the exposed portion by applying a reaction rate increasing energy in a pattern form in the region where the photocatalytic reaction starting energy is applied. That is, since the formation of the pattern by light drawing irradiation, which has been proposed by the inventors and the like so far, uses the photocatalytic reaction starting energy such as ultraviolet rays, the apparatus is expensive, difficult to handle, and further, continuous output is impossible. There was a problem. In this method, however, a photocatalytic initiation energy such as ultraviolet light is applied and a pattern is formed by using a reaction rate increasing energy such as infrared rays in the region to which the photocatalytic reaction initiation energy is applied. It is to have the advantage that the reaction rate increase energy that can be easily handled using a relatively low value, such as.

In the present invention, in the case of using two types of energy such as a photocatalytic reaction start energy and a reaction rate increase energy, as described in claim 38, the photocatalytic reaction start energy is light including ultraviolet rays, and the reaction rate increase energy. It is preferable that it is heating energy. This is because titanium dioxide is preferably used as the photocatalyst in the present invention, but ultraviolet light is preferable as the photocatalytic reaction starting energy in relation to the band gap of the titanium dioxide. Moreover, although it is preferable that reaction rate increase energy is heat, it is preferable to apply this heat energy by an infrared laser as described in Claim 39. Infrared lasers are relatively inexpensive and easy to handle.

Embodiment of the Invention

Hereinafter, the present invention will be described in detail. First, the color filter will be described, and then the manufacturing method of the color filter will be described.

A. About color filters

First, the color filter of this invention is demonstrated in detail. The color filter of the present invention includes a transparent substrate, a number of portions in which a plurality of colors are formed in a predetermined pattern by an inkjet method on the transparent substrate, a light shielding portion formed at a boundary portion of the pixel portion, the pixel portion or a pixel. It is characterized in that it has a wettability variable layer which can be excised to form a part and a light shielding part, and can change wettability.

The present invention has a wettability variable layer disposed to form the pixel portion or to form the pixel portion and the light shielding portion in this way. Therefore, the pixel portion or the pixel portion and the light shielding portion can be easily formed by changing the wettability of the wettability variable layer, so that a high quality color filter can be obtained at a low cost. Here, to form the pixel portion, or the pixel portion and the light blocking portion, includes the meaning of positioning the pixel portion, or the pixel portion and the light blocking portion on the transparent substrate.

As the specific positional relationship of each element of such a color filter, for example, at least the pixel portion may include the one disposed on the wettability variable layer.

In this way, at least the pixel portion is disposed on the wettability variable layer, so that the wettability of the portion forming the pixel portion is made into an ink-repellent region having a small contact angle with liquid in advance, and the other portion as an ink repellent region having a large contact angle with liquid. can do. By ink-jet coloring to the part which forms this pixel part, ink adheres only to the lipophilic area | region where liquid contact angle is small, and the ink spreads uniformly throughout the pixel part, and the area | region where there is no ink in a pixel part, color unevenness, etc. It does not occur, and ink does not adhere to other ink repellent regions.

Moreover, as another specific positional relationship of each element in the color filter of this invention, the example in which the wettability variable layer is formed in the boundary part of a pixel part is mentioned, for example. In this case, when the wettability of the boundary portion of the pixel portion is set to an ink repellent region that is worse than the wettability of the portion forming the pixel portion, the boundary portion of the pixel portion having ink repellency is colored when the portion forming the pixel portion is colored by the inkjet method. Since the ink is difficult to move over, it is possible to provide a color filter which is free from problems such as mixing of the ink. Thereafter, by applying a stimulus or the like to make the wettability variable layer at the boundary portion of the pixel portion a lipophilic region having a small contact angle with liquid, forming a light shielding layer on the boundary portion of the pixel portion or covering the protective layer on the whole. It can be done easily, and a high quality color filter can be obtained.

Hereinafter, the color filter of this invention which has such a wettability variable layer is demonstrated in detail using some embodiment.

1. About the first embodiment

In the first embodiment of the present invention, a light shielding portion is formed on a transparent substrate, and at least a wettability variable layer is disposed on the light shielding portion and a pixel portion forming portion which is a portion where the pixel portion is formed on the transparent substrate. It is a color filter which can form a pixel part with good precision by the change of the wettability on a variable layer. This shows an example in which the wettability variable layer is disposed to form the pixel portion, which is one of the specific examples of the color filter in which the at least pixel portion described above is formed on the wettability variable layer.

1 shows an example of the first embodiment. The color filter 1 includes a light blocking portion 3 disposed on the transparent substrate 2 and a pixel portion forming portion 4 which is a portion where the pixel portion on the light blocking portion 3 and the transparent substrate 2 is formed. ), And the wettable variable layer 5 disposed in the ()) and the pixel portion 6 formed in the pixel portion forming portion 4 on the wettable variable layer 5. Here, the pixel portion forming portion 4 indicates a horizontal position on the surface of the transparent substrate 2 on which the pixel portion 6 is formed, and may be on the transparent substrate 2 or on the wettability variable layer 5. have. The light shield 3 is also called a black matrix, and is usually formed at the boundary of the pixel portion 6.

In the color filter of the first embodiment, the energy is irradiated to the portion of the pixel portion forming portion 4 on the wettability variable layer 5 to pattern the pixel portion forming portion 4 on the wettability variable layer 5. It can be set as a lip ink area. Therefore, by coloring the ink in this area by the inkjet method, it is possible to obtain a high quality color filter having a pixel portion without uniform color irregularities.

In the first embodiment of the present invention, it is preferable that the width of the pixel portion 6 is wider than the width of the opening formed by the light shielding portion 3. This is because such a color filter is mounted so that the backlight does not penetrate the portion where the pixel portion is not formed when the backlight is touched, and thus a high quality color filter without discoloration can be obtained.

2 shows another example of the first embodiment. In this example, an ink repellent convex portion 7 is formed on the wettability variable layer 5 on the light shielding portion 3. In this way, since the ink repellent convex portion 7 is formed in the color filter 1 of this example, when the ink is attached to the pixel portion forming portion 4 by the inkjet method, the ink does not flow out of the convex ink convex portion. Therefore, it can be set as the color filter which has a pixel part without mixing color with the ink of a different color. In this case, the width of the ink repellent convex portion 7 is not particularly limited, but is preferably a width narrower than the width of the light shielding portion 3, as shown in FIG. In such a configuration, when the pixel portion 6 is formed, the width of the pixel portion 6 can be made wider than the width of the opening portion of the light shielding portion 3, and the effects as described above can be obtained. This is because a high quality color filter without discoloration can be obtained.

Hereinafter, each part which comprises such a color filter is demonstrated, respectively.

(Wetting variable layer)

The wettability variable layer 5 is not particularly limited as long as it is a layer which can change the wettability of the surface thereof by an external stimulus, for example, a physical stimulus, a chemical stimulus, or the like. For example, it may be a layer whose surface roughness is changed due to an acid or an alkali, and the wettability is changed, or the material in the wettability variable layer is changed by irradiation of energy such as ultraviolet rays, visible light, or heat, and the wettability is changed. It may be a layer.

As for the change in wettability, the wettability variable layer may be changed so that the contact angle with the liquid is large before the stimulus is applied and the contact angle with the liquid is reduced after the stimulus is applied. It may be a small, wettable variable layer in which the contact angle with the liquid changes significantly after the stimulus is applied.

(Photocatalyst-containing layer)

In this invention, it is preferable that this wettability variable layer is a photocatalyst containing layer in which wettability changes so that the contact angle with a liquid may fall by irradiation of energy. Thus, by irradiating the photocatalyst-containing layer whose wettability is changed so that the contact angle with the liquid is reduced by exposure (not only light is irradiated but also energy is irradiated in the present invention), pattern irradiation of energy, etc. The wettability can be easily changed by forming a lip ink region having a small contact angle with the liquid, and for example, only the portion where the pixel portion is formed can be easily set as the lip ink region. This is because the color filter can be manufactured efficiently, which is advantageous in terms of cost. As energy in this case, light containing ultraviolet rays is usually used.

Here, the inking region refers to a region where the contact angle with the liquid is small, and the wettability of the inkjet ink, the light shielding portion paint, and the like is good. The ink repellent region is a region having a large contact angle with the liquid, and refers to a region having poor wettability with respect to inkjet ink and light shielding portion paint.

The photocatalyst-containing layer has a contact angle with a liquid having a surface tension of 40 mN / m of 10 degrees or more, and preferably a contact angle with a liquid having a surface tension of 30 mN / m of 10 degrees or more, in particular a surface tension of 20 mN / m in an unexposed portion. It is preferable that the contact angle with a liquid is 10 degrees or more. This is not preferable because the portion that is not exposed is a portion where ink repellency is required in the present invention, and when the contact angle with the liquid is small, the ink repellency is not sufficient, and there is a possibility that ink or light-shielding portion paint may remain. Because it does not.

When the photocatalyst-containing layer is exposed, the contact angle with the liquid is lowered, and the contact angle with the liquid having the surface tension of 40 mN / m is less than 10 degrees, preferably the contact angle with the liquid having the surface tension of 50 mN / m is 10 degrees or less, in particular, the surface. It is preferable that it is a layer whose contact angle with the liquid of 60 mN / m of tension becomes 10 degrees or less. This is because if the contact angle with the liquid in the exposed portion is high, diffusion of ink or light-shielding portion paint in this portion may be poor, and discoloration in the pixel portion may occur.

In addition, the contact angle with the liquid here is measured by using a contact angle measuring device (type CA-Z, a product manufactured by Kawasaki Chemical Co., Ltd.) having various surface tensions (after 30 seconds by dropping the droplets with a micro syringe). From the result or by graphing the result. As the liquid having various surface tensions in this measurement, a wettability index standard liquid manufactured by Seiga Gaku Co., Ltd. was used.

It is preferable that the photocatalyst containing layer of this invention consists of at least a photocatalyst and a binder. By setting it as such a layer, the critical surface tension can be raised by the action of a photocatalyst by light irradiation, and the contact angle with a liquid can be made low.

In such a photocatalyst-containing layer, the mechanism of action of the photocatalyst represented by titanium oxide as described below is not necessarily clear, but active oxygens generated by the carrier generated by irradiation of light in the direct reaction with a compound nearby or in the presence of oxygen and water It is thought to change according to the chemical structure of organic matter.

By using the action of such a photocatalyst, oily contamination is decomposed by light irradiation to make it hydrophilic and washable with water, or a hydrophilic film is formed on the surface of glass or the like to impart anti-fogging properties, or tiles So-called antimicrobial tiles and the like have been proposed which form a photocatalyst-containing layer on the surface of the back to reduce the number of suspended bacteria in the air.

In the present invention, when the photocatalyst-containing layer is used as the wettability variable layer, the wettability of the exposed part is changed to make it ink-friendly by the action of oxidation or decomposition of organic functional groups or additives which are part of the binder by the photocatalyst, and the wettability with the non-exposed part. It can make a big difference. Therefore, by improving the water solubility (ink-resistance) and the repellency (ink repellency) with the light-shielding portion paint or the inkjet ink, it is possible to obtain a color filter that is not only satisfactory in quality but also in cost.

In the present invention, when such a photocatalyst-containing layer is used, the photocatalyst-containing layer contains at least a photocatalyst and fluorine, and when the fluorine content on the surface of the photocatalyst-containing layer irradiates energy to the photocatalyst-containing layer, energy is irradiated by the action of the photocatalyst. The photocatalyst-containing layer may be formed so as to decrease as compared with the former.

In the color filter which has such a characteristic, the pattern which consists of a part with little fluorine content can be formed easily by pattern irradiation of energy. Here, fluorine has a very low surface energy, which means that the surface of the fluorine-containing material has a smaller critical surface tension. Therefore, compared with the critical surface tension of the surface of the part with a high fluorine content, the critical surface tension of the part with a low fluorine content becomes large. This means that the portion having a small amount of fluorine is a lipophilic region as compared with the portion having a large amount of fluorine. Therefore, forming the pattern which consists of the part with less fluorine content compared with the surrounding surface forms the pattern of an ink repellent area | region in an ink repellent area | region.

Therefore, in the case where such a photocatalyst-containing layer is used, the pattern of the ink-repellent region can be easily formed in the ink-repellent region by irradiating the pattern with energy, so that it is possible to easily form a pixel portion or the like only in the ink-repellent region. The color filter can be made with good quality.

The content of fluorine contained in the photocatalyst-containing layer containing fluorine as described above is fluorine content in the low fluorine ink region formed by the irradiation of energy when the fluorine content of the non-energy irradiated portion is 100. Hereinafter, it is preferable that it is five or less, Especially preferably, it is one or less.

By setting it as such a range, a big difference can be made in the ink ink of the energy irradiation part and the unirradiated part. Therefore, by forming the pixel portion or the like on such a photocatalyst-containing layer, it is possible to form the pixel portion or the like precisely only in the lipophilic region in which the fluorine content is reduced, and a color filter can be obtained with high precision. In addition, a fall rate is based on weight.

The measurement of the fluorine content in the photocatalyst-containing layer can be carried out by various methods that are generally performed. For example, X-ray photoelectron spectroscopy (also referred to as ESCA (Electron Spectroscopy for Chemical Analysis)), It will not specifically limit, if it is a method which can measure the amount of fluorine on a surface quantitatively, such as a fluorescent X-ray spectroscopy and a mass spectrometry.

Examples of the photocatalyst used in the present invention include titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), and oxidation known as optical semiconductors. And bismuth (Bi ₂ O ₃ ) and iron oxide (Fe ₂ O ₃ ). One or two or more thereof may be selected from these.

In the present invention, titanium oxide is particularly suitably used because of its high bandgap energy, chemical stability, no toxicity and easy availability. There are anatase type and rutile type in titanium oxide, but any of them can be used in the present invention, but anatase type titanium oxide is preferable. The anatase titanium oxide has an excitation wavelength of 380 nm.

As such anatase type titanium oxide, for example, hydrochloric acid-linked anatase type titania sol (STS-20 (average particle size 7 nm)) and TA-15 (average particle size) 12 nm)) and the like.

The smaller the particle size of the photocatalyst, the more effectively the catalytic reaction occurs. The average particle diameter is preferably 50 nm or less, and particularly preferably a photocatalyst of 20 nm or less. The smaller the particle size of the photocatalyst is, the smaller the surface roughness of the formed photocatalyst-containing layer is, and the lower the surface roughness of the photocatalyst-containing layer is. Moreover, since the expression of the ink ink of an exposure part becomes insufficient, it is unpreferable.

As described above, the color filter of the present invention contains fluorine on the surface of the photocatalyst-containing layer, and pattern-irradiates energy on the surface of the photocatalyst-containing layer to lower the fluorine content on the surface of the photocatalyst-containing layer, thereby reducing the fluorine content in the ink repellent region. The color filter obtained by forming a pattern and forming a pixel part etc. here may be sufficient. Also in this case, it is preferable to use the above-mentioned titanium dioxide as a photocatalyst. However, if the content of fluorine contained in the photocatalyst-containing layer in the case of using titanium dioxide is analyzed and quantified by X-ray photoelectron spectroscopy, titanium (Ti) In the case where the element is 100, the fluorine (F) element is preferably contained on the surface of the photocatalyst-containing layer at a ratio such that the fluorine (F) element is 500 or more, preferably 800 or more, and particularly preferably 1200 or more.

Since fluorine (F) is included in the photocatalyst-containing layer to this extent, the critical surface tension on the photocatalyst-containing layer can be sufficiently lowered, thereby securing ink repellency on the surface, thereby patterning energy to reduce the fluorine content by pattern irradiation. It is because the difference in wettability with the lip ink area | region of the surface in a part can be enlarged, and the quality of the color filter finally obtained can be improved.

Further, in such a color filter, when the fluorine content in the ink-friendly region formed by pattern irradiation of energy is titanium (Ti) element 100, the fluorine (F) element is 50 or less, preferably 20 or less, Especially preferably, it is contained in the ratio which becomes 10 or less.

If the fluorine content in the photocatalyst-containing layer can be reduced to this extent, sufficient affinity for ink can be obtained in order to form the pixel portion and the like. It becomes possible to form with precision, and the color filter of favorable quality can be obtained.

In the present invention, the binder used for the photocatalyst-containing layer preferably has a high binding energy such that the main skeleton is not decomposed by the photoexcitation of the photocatalyst, for example, (1) sol-gel ) An organic polysiloxane that exhibits high strength by hydrolyzing and polycondensing chlorosilanes or alkoxysilanes by reaction or the like, (2) organic polysiloxanes which are crosslinked with reactive silicones having excellent water and oil repellency. Can be enumerated.

In the case of (1) above, the general formula:

Y _n SiX _(4-n)

Of the silicon compound represented by (wherein Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, and X represents an alkoxyl group, an acetyl group or a halogen. N is an integer of 0 to 3). It is preferable that it is an organic polysiloxane which is 1 type, or 2 or more types of hydrolysis-condensation products or co-hydrolysis condensation products. The carbon number of the group represented by Y is preferably in the range of 1 to 20, and the alkoxyl group represented by X is preferably a methoxy group, an ethoxy group, a propoxy group or a butoxy group.

Specifically, methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane;

Ethyltrichlorosilane, ethyltribromosilane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltri-t-butoxysilane;

n-propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltriisopropoxysilane, n-propyltri-t-butoxysilane;

n-hexyl trichlorosilane, n-hexyl tribromosilane, n-hexyl trimethoxysilane, n-hexyl triethoxysilane, n-hexyl triisopropoxysilane, n-hexyl tri-t-butoxysilane ;

n-decyltrichlorosilane, n-decyltribromosilane, n-decyltrimethoxysilane, n-decyltriethoxysilane, n-decyltriisopropoxysilane, n-decyltri-t-butoxysilane;

n-octadecyltrichlorosilane, n-octadecyltribromosilane, n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n-octadecyltri- t-butoxysilane;

Phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltri-t-butoxysilane;

Tetrachlorosilane, tetrabromosilane, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane;

Dimethyldichlorosilane, dimethyldibromosilane, dimethyldimethoxysilane, dimethyldiethoxysilane;

Diphenyldichlorosilane, diphenyldibromosilane, diphenyldimethoxysilane, diphenyldiethoxysilane;

Phenylmethyldichlorosilane, phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane;

Trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane, triethoxyhydrosilane, triisopropoxyhydrosilane, tri-t-butoxyhydrosilane;

Vinyl trichlorosilane, vinyl tribromosilane, vinyl trimethoxysilane, vinyl triethoxysilane, vinyl triisopropoxy silane, vinyl tri-t-butoxy silane;

Trifluoropropyltrichlorosilane, trifluoropropyltrichlorosilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane, trifluoropropyltri- t-butoxysilane;

γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyl Triisopropoxysilane, γ-glycidoxypropyltri-t-butoxysilane;

γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-methacryloxypropyl Triisopropoxysilane, γ-methacryloxypropyltri-t-butoxysilane;

γ-aminopropylmethyldimethoxysilane, γ-aminopropylmethyldiethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltriisopropoxysilane, γ-aminopropyl Tri-t-butoxysilane;

γ-mercaptopropylmethyldimethoxysilane, γ-mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, γ-mercaptopropyltriisopropoxysilane , γ-mercaptopropyltri-t-butoxysilane;

β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane; And

Partial hydrolyzate thereof; And

Mixtures of these can be used.

Moreover, as a binder, polysiloxane especially containing a fluoroalkyl group can be used preferably, Specifically, 1 type (s) or 2 or more types of hydrolysis condensates, cohydrolysis condensates of the following fluoroalkylsilanes are included, In addition, what is known as a fluorine-type silane coupling agent can be used.

CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;

CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;

CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;

CF ₃ (CF ₃ ) ₉ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;

(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;

(CF ₃ ) ₂ CF (CF ₂ ) ₆ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;

(CF ₃ ) ₂ CF (CF ₂ ) ₈ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;

CF ₃ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;

CF ₃ (CF ₂ ) ₃ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;

CF ₃ (CF ₂ ) ₅ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;

CF ₃ (CF ₂ ) ₇ (C ₆ H ₄ ) C ₂ H ₄ Si (OCH ₃ ) ₃ ;

CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;

CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;

CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;

CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;

(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;

(CF ₃ ) ₂ CF (CF ₂ ) ₆ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;

(CF ₃ ) ₂ CF (CF ₂ ) ₈ CH ₂ CH ₂ SiCH ₃ (OCH ₃ ) ₂ ;

CF ₃ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;

CF ₃ (CF ₂ ) ₃ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;

CF ₃ (CF ₂ ) ₅ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;

CF ₃ (CF ₂ ) ₇ (C ₆ H ₄ ) C ₂ H ₄ SiCH ₃ (OCH ₃ ) ₂ ;

CF ₃ (CF ₂ ) ₃ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;

CF ₃ (CF ₂ ) ₅ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;

CF ₃ (CF ₂ ) ₇ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;

CF ₃ (CF ₂ ) ₉ CH ₂ CH ₂ Si (OCH ₂ CH ₃ ) ₃ ;

CF ₃ (CF ₂ ) ₇ SO ₂ N (C ₂ H ₅ ) C ₂ H ₄ CH ₂ Si (OCH ₃ ) ₃

By using the above-mentioned polysiloxane containing a fluoroalkyl group as a binder, the ink repellency of the non-exposed part of a photocatalyst containing layer improves significantly, and the function which prevents adhesion of the light-shielding part coating material and inkjet type ink is expressed.

Moreover, as reactive silicone of said (2), the compound which has a skeleton represented by the following general formula can be mentioned.

Wherein n is an integer of 2 or more, and R ¹ and R ² each represent a substituted or unsubstituted alkyl, alkenyl, allyl or aminoalkyl group having 1 to 10 carbon atoms, and 40% or less of the total in molar ratio is vinyl, phenyl or halogenated phenyl. to be. It is preferable that R ¹ and R ² be a methyl group because the surface energy is the smallest, and the molar ratio is preferably 60% or more. Moreover, at the chain terminal or side chain, it has reactive groups, such as at least 1 or more hydroxyl group, in a molecular chain.

A stable organosilicon compound that does not undergo crosslinking reaction such as dimethylpolysiloxane may be mixed with the organic polysiloxane in the binder.

In the color filter of this invention, various binders, such as an organic polysiloxane, can be used for a photocatalyst containing layer in this way. In the present invention, as described above, fluorine is included in the photocatalyst-containing layer including the binder and the photocatalyst, and the pattern is irradiated with energy to reduce the fluorine on the surface of the photocatalyst-containing layer. It may be formed. In this case, a method of incorporating fluorine in the photocatalyst-containing layer is a method of bonding a fluorine compound with a relatively weak binding energy to a binder having a high binding energy, and a method of incorporating a fluorine compound bonded with a relatively weak binding energy into the photocatalyst-containing layer. Etc. are included. This is because, when energy is irradiated by introducing fluorine in such a manner, first, a fluorine binding site having a relatively small binding energy is decomposed, and fluorine can be removed from the photocatalyst-containing layer.

As said 1st method, ie, the method of combining a fluorine compound with a comparatively weak binding energy with respect to the binder which has a high binding energy, the method of introduce | transducing a fluoroalkyl group into the said organic polysiloxane as a substituent, etc. are mentioned.

For example, as a method for obtaining an organic polysiloxane, as described in the above (1), an organic polysiloxane that exhibits great strength can be obtained by hydrolyzing and polycondensing chloro or alkoxysilane or the like by a sol-gel reaction or the like. In this method, as described above, the general formula

Y _n SiX _(4-n)

(Where Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen, n is an integer of 0 to 3)

An organic polysiloxane can be obtained by hydrolyzing condensation product or cohydrolytic condensation of one or two or more kinds of the silicon compounds represented by the formula, and in the above general formula, synthesized using a silicon compound having a fluoroalkyl group as substituent Y By this, an organic polysiloxane having a fluoroalkyl group as a substituent can be obtained. In the case where an organic polysiloxane having such a fluoroalkyl group as a substituent is used as the binder, when the energy is irradiated, the energy is irradiated on the surface of the photocatalyst-containing layer because the portion of the carbon bond of the fluoroalkyl group is decomposed by the action of the photocatalyst in the photocatalyst-containing layer. The fluorine content of the part can be reduced.

The silicon compound having a fluoroalkyl group used at this time is not particularly limited as long as it has a fluoroalkyl group, and has at least one fluoroalkyl group, and the carbon number of the fluoroalkyl group is 4 to 30, preferably 6 to 20, particularly Preferably a silicon compound of 6 to 16 is suitably used. Although the specific example of such a silicon compound is as above-mentioned, The said silicon compound which has a fluoroalkyl group of 6-8 carbon atoms, ie, a fluoroalkylsilane, is especially preferable.

In the present invention, a silicon compound having such a fluoroalkyl group may be mixed with a silicon compound having no fluoroalkyl group as described above, and these cohydrolytic condensates may be used as the organic polysiloxane. You may use 1 type (s) or 2 or more types of silicon compounds which have an alkyl group, and these hydrolysis condensates and cohydrolysis condensates may be used as said organic polysiloxane.

As the organic polysiloxane having the fluoroalkyl group thus obtained, it is preferable that the silicon compound having the fluoroalkyl group is contained 0.01 mol% or more, preferably 0.1 mol% or more among the silicon compounds constituting the organic polysiloxane.

This is because the ink repellency on the photocatalyst-containing layer can be enhanced by the inclusion of such a fluoroalkyl group, and the difference in wettability with the portion made into the lip ink region can be increased.

In the method shown in the above (2), an organic polysiloxane is obtained by crosslinking reactive silicones having excellent water and oil repellency, and in this case, any one or both of R ¹ and R ² in the aforementioned general formula is fluoro. By using fluorine-containing substituents such as alkyl groups, fluorine may be contained in the photocatalyst-containing layer, and when energy is irradiated, a portion of the fluoroalkyl group having a smaller binding energy than that of the siloxane bond is decomposed, thereby fluorine on the surface of the photocatalyst-containing layer by energy irradiation. The content can be reduced.

On the other hand, the latter example, that is, a method of introducing a fluorine compound bonded with a weaker energy than the binding energy of the binder, for example, when a low molecular weight fluorine compound is introduced, for example, a method of incorporating a fluorine-based surfactant, etc. may be mentioned. Moreover, as a method of introducing a high molecular weight fluorine compound, the method of mixing a fluorine resin with high compatibility with binder resin, etc. is mentioned.

In the present invention, the photocatalyst-containing layer may contain a surfactant in addition to the photocatalyst and the binder. Specifically, hydrocarbons such as NIKKOL BL, BC, BO and BB series manufactured by Nikko Chemical Co., Ltd., ZONYL FSN and FSO manufactured by DuPont, Surfron S-141 and 145 manufactured by Asahi Glass, Dinipon Ink Megafack F-141 and 144 manufactured by Kagaku Kogyo Co., Ltd. Ftagent F-200 and F251 manufactured by Neos Co., Ltd. Unidyne DS-401 and 402 manufactured by Daikin Kogyo Co., Ltd. and Florad FC-170 manufactured by 3M Co., Ltd. And fluorine- or silicon-based nonionic surfactants such as 176, and cationic surfactants, anionic surfactants, and amphoteric surfactants can be used.

In addition to the surfactants, the photocatalyst-containing layer includes polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, polyvinyl chloride, and polyamide. , Polyimide, styrenebutadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene Oligomers, polymers, etc. can be contained.

The content of the photocatalyst in the photocatalyst-containing layer may be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight. In addition, the thickness of the photocatalyst-containing layer is preferably within the range of 0.05 to 10 µm.

The photocatalyst-containing layer may be formed by dispersing the photocatalyst and the binder in a solvent together with other additives as necessary to prepare a coating liquid, and coating the coating liquid. As the solvent used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. Application can be carried out by known coating methods such as spin coating, spray coating, dip coating, roll coating, bead coating and the like. When the ultraviolet curable component is contained as the binder, the photocatalyst-containing layer can be formed by irradiating ultraviolet light and performing curing treatment.

(Pixel part)

In the first embodiment, as illustrated in FIGS. 1 and 2, the pixel portion 6 is disposed on the above-described photocatalyst-containing layer among the wettable variable layers 5. In the first embodiment, the pixel portion is formed in a predetermined pattern by a plurality of inks by the inkjet method in an ink-jet method, which is exposed to the photocatalyst-containing layer and has a low contact angle with a liquid. Normally, the pixel portion is formed of three colors of red (R), green (G), and blue (B). The coloring pattern and colored area in this pixel part can be arbitrarily set.

As inkjet ink which forms such a pixel portion, it is largely classified into aqueous and oily, and although any ink can be used in this invention, water-based ink based on water tension is preferable.

The aqueous ink used in the present invention may be water alone or a mixed solvent of water and a water-soluble organic solvent. On the other hand, the oil-based ink is preferably used based on a high boiling point solvent in order to prevent clogging of the head. As a coloring agent used for such an inkjet ink, well-known pigments and dyes are widely used. Moreover, soluble resin and insoluble resin can be contained in a solvent for the improvement of dispersibility and fixability. In addition, surfactant, such as a nonionic surfactant, a cationic surfactant, and an amphoteric surfactant; Preservatives and antifungal agents; pH adjusters; Antifoaming agents; UV absorbers; Viscosity modifiers; Surface tension regulators and the like may be added as necessary.

Conventional inkjet inks cannot contain a lot of binder resin because of low viscosity, but can be fixed to the colorant itself by granulating the colorant particles in the ink with a resin. . Such an ink can also be used in the present invention. In addition, so-called hot melt inks or UV curable inks may also be used.

In this invention, it is preferable to use UV curable ink especially. By using the UV-curable ink, the ink portion can be colored to form a pixel portion, and then, by irradiating UV, the ink can be cured quickly and can be immediately sent to the next step. Therefore, the color filter can be manufactured with good efficiency.

Such UV curable inks are based on prepolymers, monomers, photoinitiators and colorants. The prepolymer may be any one of prepolymers such as polyester acrylate, polyurethane acrylate, epoxy acrylate, polyether acrylate, oligo acrylate, alkyd acrylate, polyol acrylate, silicone acrylate, etc. without particular limitation. Can be.

As a monomer, Vinyl monomers, such as styrene and vinyl acetate; monofunctional acryl monomers such as n-hexyl acrylate and phenoxyethyl acrylate; Multifunctional acryl monomers such as diethylene glycol diacrylate, 1,6-hexanediol diacrylate, hydroxy piperine acid ester neopentyl glycol diacrylate, trimethylolpropane triacrylate, dipentaerythrol hexaacrylate Can be used. The said prepolymer and a monomer may be used independently and may mix 2 or more types.

Photoinitiator, isobutyl benzoin ether, isopropyl benzoin ether, benzoin ethyl ether, benzoin methyl ether, 1-phenyl-1,2-propyldione-2-oxime, 2,2-dimethoxy-2- Phenylacetophenone, benzyl, hydroxycyclohexylphenyl ketone, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzophenone, chlorothiokisanthone, 2-chlorothiokisanthone , Isopropyl thioxysanthone, 2-methylthio chixanthone, chlorine-substituted benzophenone, halogen-substituted alkyl-aryl ketone and the like can be selected and used. In addition, if necessary, photoinitiation aids such as aliphatic amines and aromatic amines; Photosensitizers, such as thioxanthone, etc. can also be added.

(Shading part)

In the first embodiment of the present invention, as shown in FIGS. 1 and 2, the light shielding portion 3 is formed on the transparent substrate 2 at the boundary portion of the pixel portion forming portion 4.

The light shielding portion in the first embodiment is preferably formed by forming a metal thin film such as chromium having a thickness of about 1000 to 2000 Pa by a sputtering method, a vacuum deposition method, or the like, and patterning the thin film. As a method of this patterning, normal patterning methods, such as sputtering, can be used.

The light blocking portion may be a layer containing light blocking particles such as carbon fine particles, metal oxides, inorganic pigments, and organic pigments in the resin binder. As the resin binder used, one or two or more kinds of resins such as polyimide resin, acrylic resin, epoxy resin, polyacrylamide, polyvinyl alcohol, gelatin, casein and cellulose, or a photosensitive resin or O / A resin composition of W emulsion type, for example, emulsified reactive silicone can be used. The thickness of the light shielding part made of such a resin can be set in the range of 0.5-10 micrometers. The patterning method of such a resin light shielding part can use the method generally used, such as the photolithographic method and the printing method.

Transparent board

In the first embodiment of the present invention, as shown in Figs. 1 and 2, the light shielding portion 3 and the wettability variable layer 5, and the above-described photocatalyst-containing layer, are disposed on the transparent substrate 2, among others.

The transparent substrate is not particularly limited as long as it has been conventionally used in color filters, and for example, transparent hard materials without transparency such as quartz glass, pyrex glass, synthetic quartz plates, transparent resin films, optical resin plates, etc. The transparent flexible material which has the durability of can be used. Among them, Corning's 7059 glass is a material with a low thermal expansion and excellent in dimensional stability and high temperature heat treatment, and an alkali-free glass containing no alkali component in the glass. Therefore, the color liquid crystal display device using the active matrix method is used. It is suitable for color filter. In the present invention, a transparent substrate is generally used, but a transparent substrate or a substrate colored in white may be used. In addition, the transparent substrate may be one that has been subjected to alkali elution prevention, imparting gas barrier properties, or other surface treatment if necessary.

(Ink repellent iron part)

In the first embodiment of the present invention, as shown in FIG. 2, the ink repellent convex portion 7 may be formed on the wettable variable layer 5 covering the upper portion of the light shielding portion 3. The composition of the ink repellent convex portion is not particularly limited as long as it is a resin composition having ink repellency. It does not need to be especially transparent, It may be colored. For example, as a material used for a black matrix (light shielding part), the material etc. which do not mix black material can be used. Specifically, a composition obtained by mixing one or two or more aqueous resins such as polyacrylamide, polyvinyl alcohol, gelatin, casein, cellulose, or an emulsion of O / W emulsion type, for example, reactive silicone It can be mentioned. In the present invention, a photocurable resin is suitably used for reasons such as ease of handling and curing. In addition, since the ink repellent iron portion is so preferable that the ink repellency is strong, the surface thereof may be treated with a repellent agent such as a silicon compound or a fluorine-containing compound.

Since the height of the ink-repellent convex portion in the first embodiment is provided to prevent the ink from being mixed when colored by the inkjet method as described above, it is preferably somewhat high, and the overall flatness of the color filter is preferable. In consideration of this, the thickness is preferably close to the thickness of the pixel portion. Although it changes also depending on the deposition amount of the ink sprayed specifically, it is preferable to exist in 0.1-2 micrometers normally.

(Protective layer)

Although not shown in FIG. 1 or 2, in the first embodiment, a protective layer may be further formed on the pixel portion 6. This protective layer is provided to planarize the color filter and to prevent elution of the component contained in the pixel portion or the pixel portion and the photocatalyst-containing layer into the liquid crystal layer.

The thickness of the protective layer can be set in consideration of the light transmittance of the material used, the surface state of the color filter, and the like, and can be set in the range of 0.1 to 2.0 mu m, for example. A protective layer can be formed using what has a light transmittance etc. which are calculated | required as a transparent protective layer among well-known transparent photosensitive resin and two-component hardening type transparent resin, for example.

2. About 2nd Embodiment

A second embodiment of the present invention is a color filter in which a wettability variable layer is formed over the entire surface on a transparent substrate, and a pixel portion and a light shielding portion are formed at predetermined portions on the wettability variable layer. This shows an example in which the wettability variable layer is disposed to form the pixel portion and the light shielding portion, which is one specific example of the color filter in which at least the pixel portion described above is disposed on the wettability variable layer.

3 shows an example of the second embodiment. The color filter 1 includes the wettability variable layer 5 disposed on the transparent substrate 2, the light shielding portion 3 and the pixel portion 6 formed on the wettability variable layer 5, and the pixel portion 6. ) And a protective layer 8 formed on the light shielding portion 3.

In the color filter of the second embodiment, the pixel portion 6 and the light shielding portion 3 are formed on the wettability variable layer 5, but this is described in detail in the manufacturing method described later. The wettability of the wettability variable layer 5 of the light-shielding portion forming portion of the light-shielding portion 3 is reduced after the pixel portion forming portion of 6) is first subjected to energy irradiation or the like to reduce the wettability. What is necessary is just to form the light-shielding part 3 here, and conversely, the wettability of the light-shielding part formation part is first reduced, and after forming a light-shielding part, the wettability of the wettability variable layer of a pixel part formation part is reduced, and the pixel part 6 ) May be formed.

In any case, when the pixel portion 6 is formed, the pixel portion 6 is formed into a lip ink region in which the wettability-variable layer is in a wet state. Therefore, when ink is deposited by an inkjet method, ink is formed in the pixel portion forming portion. Spread evenly and can be made into a color filter without color unevenness. In the case where the pixel portion is colored by the inkjet method, the light shielding portion 3 is formed around the pixel portion, or the wettability of the wettability variable layer is not changed, that is, the ink repellent region. Therefore, the ink is not mixed beyond this portion, and the color filter can be made free of problems such as mixed color.

The materials of the transparent substrate 2, the light shielding portion 3, the wettability variable layer 5, the pixel portion 6, the protective layer 8, and the like used in this embodiment are the same as those of the first embodiment. The description here is omitted. In addition, in this embodiment, since a light shielding part is formed on a wettability variable layer, a light-wetting part is formed in advance in a wettability variable layer, and a light shielding part is formed easily by apply | coating the paint for light-shielding parts to that part. Therefore, it can be said that it is preferable to form the light shielding part with the light shielding part paint which melt | dissolved the said light-shielding microparticles | fine-particles and resin in a solvent etc.

3. Regarding Third Embodiment

In a third embodiment of the present invention, a wettability variable layer is disposed in a pixel portion forming portion, which is a portion where the light shielding portion is disposed on a transparent substrate, and a pixel portion is formed on the transparent substrate, and a pixel portion is formed on the wettability variable layer. It is a color filter. This shows an example in which the wettability variable layer is disposed to form the pixel portion and the light shielding portion, which is one specific example of the color filter in which at least the pixel portion described above is disposed on the wettability variable layer.

4 shows an example of the third embodiment. The color filter 1 is patterned on the light blocking portion 3 disposed on the transparent substrate 2 and the pixel portion forming portion 4 which is an area between the light blocking portion 3 on the transparent substrate 2. And the wettable variable layer 5 formed in this manner, the pixel portion 6 formed on the wettable variable layer 5, and the protective layer 8 formed on the pixel portion 6 and the light shielding portion 3.

The characteristic of this embodiment is that the wettability variable layer is formed on the pixel part formation part 4 on the transparent substrate 2, and the wettability variable layer 5 is formed in the light shielding part formation part in which the light shielding part 3 is formed. There is no point. Thus, in the third embodiment, since the wettability variable layer 5 is formed only in the pixel portion forming portion 4, when the wettability variable layer is applied to change the wettability, the wettability variable layer is spread over the entire surface. It has the effect of being able to simplify the process after formation.

In this embodiment, since the light shielding part 3 is formed directly on the transparent substrate 2, it is preferable that the transparent substrate 2 is ink-friendly. In particular, in the case where the wettability variable layer 5 is formed in a pattern shape, and then the light shielding portion 3 is formed in the light shielding portion forming portion therebetween, the transparent substrate with respect to the wettability variable layer, which is an ink repellent region before wettability is changed, is formed. It is preferable to set phase (2) as an ink-friendly region from the light-shielding part 3 formation surface. Therefore, in the third embodiment, the wettability on the transparent substrate 2 is preferably less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m, more preferably 5 degrees or less, particularly preferably 1 degree or less. to be.

As such, the transparent substrate having the surface of the ink-inkable region may be formed of an ink-philic material, the surface of the material may be surface-treated to become ink-friendly, or a layer of an ink-like layer may be formed on the transparent substrate. In this embodiment, it does not specifically limit.

Examples of the surface treatment of the surface of the material to be incompatible with the ink include lipophilic surface treatment by plasma treatment using argon, water and the like, and tetraethoxysilane as the lipophilic layer disposed on the transparent substrate, for example. Silica film and the like by the sol-gel method may be included.

Materials other than the transparent substrate 2 used in this embodiment, that is, the materials of the light blocking portion 3, the wettability variable layer 5, the pixel portion 6, the protective layer 8, and the like, are described in the first embodiment. Since it is the same as that of, description is omitted here.

4. Regarding the fourth embodiment

A fourth embodiment of the present invention is a color filter in which a light shielding portion is formed on a transparent substrate, a wettability variable layer is formed on the light shielding portion, and a pixel portion is formed between the wettability variable layers. This shows an example in which the wettability variable layer is disposed to form the pixel portion, which is one specific example of the color filter in which the wettability variable layer is disposed at the boundary portion of the pixel portion described above.

5 shows an example of the fourth embodiment of the present invention. In this color filter 1, the light shielding part 3 is formed on the transparent substrate 2, and the wettability variable layer 5 is formed on this light shielding part 3. As shown in FIG. In addition, the pixel portion 6 is formed in the portion between the wettability variable layers 5. The protective layer 8 is formed so that the upper part of this pixel part 6 and the wettability variable layer 5 may be covered. In this embodiment, since the wettability variable layer is formed in a pattern form, the change in the wettability of the wettability variable layer may be stimulated over the entire surface. Thus, for example, when the pixel portion 6 is formed, energy using a mask or the like is used. It is not necessary to perform pattern irradiation or the like, and the process can be simplified. Moreover, since the wettability variable layer 5 is formed only in the boundary part of the pixel part 6, the usage amount is very small. Therefore, for example, it is effective when there is a problem in applying a large amount of an expensive wettability changing layer on a color filter.

Here, it is preferable that the width of the wettability variable layer 5 is formed to be larger than the width of the light shielding portion 3. Since the width of the wettability variable layer 5 is narrower than the width of the light blocking portion 3, the width of the pixel portion 6 formed between the wettability variable layer 5 is larger than the width of the opening of the light blocking portion 3. It can be formed large. This is because problems such as discoloration can be prevented.

In this embodiment, since the light shielding part 3 and the pixel part 6 are formed directly on the transparent substrate 2, it is preferable that the transparent substrate 2 is ink-friendly. In particular, in the case where the pixel portion 6 is formed by attaching the wettability variable layer 5 by an inkjet method, the wettability on the transparent substrate 2 is more prone to ink, and thus the ink is more easily spread evenly and the color is uneven. This is difficult to occur. Therefore, also in the fourth embodiment, like the third embodiment, the wettability on the transparent substrate 2 is preferably less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m.

The material used in this embodiment is the same as that of the third embodiment for the transparent substrate, and the same as that of the first embodiment described above for the other materials, and thus the description thereof is omitted.

5. Regarding the fifth embodiment

In the fifth embodiment of the present invention, a wettability variable layer is formed on a light shielding portion forming portion, which is a portion where a light shielding portion is formed on a transparent substrate, and a light shielding portion is formed on the wettable variable layer, and a pixel portion is formed between the light shielding portions. Filter. This shows an example in which the wettability variable layer is disposed to form the pixel portion and the light shielding portion, which is one specific example of the color filter in which the wettability variable layer is disposed at the boundary portion of the pixel portion described above.

6 shows an example of the fifth embodiment of the present invention. In this color filter 1, the wettability variable layer 5 is formed in a pattern shape in the light shielding part formation part 9 which is a site | part in which the light shielding part is formed on the transparent substrate 2, and the wettability variable layer formed in this pattern shape ( The pixel portion 6 is formed on the transparent substrate 2 between 5. In addition, a light shielding portion 3 is formed on the wettability variable layer 5.

In this embodiment, since the wettability variable layer is formed in a pattern form, in order to change the wettability of the wettability variable layer, a stimulus may be applied over the entire surface. For example, a mask or the like may be used when the pixel portion 6 is formed. It is not necessary to perform pattern irradiation or the like of the used energy, and the process can be simplified. In addition, since the wettability variable layer 5 is formed only at the boundary portion of the pixel portion 6 and the light shielding portion forming portion 9 in this embodiment as in the fourth embodiment, the amount of use thereof is small. Therefore, it is effective when there is a problem in forming a large amount of the wettability variable layer on the color filter.

In this embodiment, since the pixel portion 6 is formed directly on the transparent substrate 2 in the same manner as in the fourth embodiment, it is preferable that the transparent substrate 2 has an ink-like property. Therefore, in the fifth embodiment as well as the third and fourth embodiments, the wettability on the transparent substrate 2 is preferably less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m.

The material used in this embodiment is the same as that of the third embodiment for the transparent substrate, and the same as that of the first embodiment described above for the other materials, and thus the description thereof is omitted.

B. Manufacturing Method of Color Filter

Next, the manufacturing method of the color filter of this invention is demonstrated using some embodiment.

1. About 6th Embodiment

6th Embodiment of this invention is a manufacturing method for manufacturing the color filter which is 1st Embodiment in the said this invention.

(1) forming a light shielding portion on the transparent substrate;

(2) disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion is changed in a direction in which the contact angle of the liquid is lowered on a surface on which the light shielding portion is formed on the transparent substrate;

(3) forming an exposure portion for the pixel portion by applying energy to a pixel portion forming portion, which is a portion for forming the pixel portion on the photocatalyst-containing layer; And

(4) forming a pixel portion by coloring the ink exposure portion for the pixel portion by an inkjet method;

It will include.

(Explanation of each process)

7 is for explaining each step of the sixth embodiment of the present invention. In this example, first, the light shielding portion 3 is formed on the transparent substrate 2 by a conventional method (Fig. 7 (A)). The manufacturing method of this light shielding part 3 is not specifically limited, For example, the method of forming by forming a metal thin film, such as chromium of about 1000-2000 micrometers in thickness, by the sputtering method or the vacuum deposition method, and patterning this thin film is included. Can be.

Next, the photocatalyst-containing layer 5 is formed on the transparent substrate 2 on which the light shielding portion 3 is formed (FIG. 7B). The photocatalyst-containing layer 5 is formed by dispersing the photocatalyst and the binder as described above in a solvent together with other additives as necessary to prepare a coating solution, applying the coating solution, and then performing hydrolysis and polycondensation reactions. And the photocatalyst is firmly fixed in the binder. As the solvent to be used, an alcohol-based organic solvent such as ethanol or isopropanol is preferable, and the coating may be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating or bead coating.

In this way, the energy 10, such as an ultraviolet-ray, is pattern-irradiated with the photomask 11 with respect to the transparent substrate 2 in which the photocatalyst containing layer 5 was formed. Thereby, the pixel part exposure part 12 which made the pixel part formation part which is the site | part in which the pixel part on the photocatalyst containing layer 5 is formed by the photocatalyst in the photocatalyst-containing layer 5 to form the lipophilic area | region is formed (FIG. 7C). ).

When exposure is performed using the photomask 11 for forming the exposure portion 12 for the pixel portion as described above, the width of the exposure portion 12 for the pixel portion formed by irradiation of energy, that is, the width of the formed pixel portion is It is preferable to make it wider than the width of the opening part formed by the light shielding part 3. This is because after the completion of the liquid crystal panel, the backlight is not likely to pass through the portion where the pixel portion is not formed when the backlight is irradiated, and there is no problem of discoloration or the like.

The energy can be irradiated by exposing the entire surface from the transparent substrate 2 side as shown in FIG. 8. When energy is irradiated to the entire surface from the transparent substrate 2 side, as shown in FIG. 8, the light shielding part 3 acts as a mask, and exposure is performed only to the part without the light shielding part 3. According to this method, since energy can be irradiated without using the photomask etc. of a pixel part formation part, it is advantageous in terms of cost.

When energy is irradiated from the transparent substrate 2 side, it is preferable to use a material that transmits energy to the transparent substrate 2, for example, quartz is used when light containing ultraviolet rays is used as energy. It is preferable to use a material that transmits ultraviolet light.

The ink 14 is sprayed into the pixel portion exposure portion 12 which becomes an ink-friendly region by energy irradiation using the inkjet device 13 in the exposure portion 12 for pixel portion formed as described above, respectively. And blue (Fig. 7 (D)). In this case, since the inside of the exposure portion 12 for the pixel portion is an ink-like region having a small contact angle with the liquid by irradiation of energy as described above, the ink 14 ejected from the inkjet apparatus 13 is used for the pixel portion furnace. It is uniformly diffused in the light portion 12. In addition, since the area of the photocatalyst-containing layer which has not been exposed is an ink-repellent area, ink can be removed from this area.

The inkjet device used in the present invention is not particularly limited, but a method of controlling by magnetic field by continuously spraying charged ink, intermittently injecting ink using a piezoelectric element, and heating the ink to foam the ink Ink jet device using a variety of methods, such as the method of intermittently jetting using a).

Thus, the pixel part 6 is formed by solidifying the ink adhered in the exposure part 12 for pixel parts (FIG. 7 (E)). In the present invention, the solidification of the ink is performed by various methods depending on the kind of ink used. For example, in the case of a water-soluble ink, it is heated to remove water to solidify.

Considering the solidification step of the ink, UV-curable ink is preferable as the type of ink used in the present invention. This is because in the case of UV-curable ink, the ink can be solidified quickly by irradiating UV, thereby reducing the manufacturing time of the kali filter.

As described above, since the ink in the exposure portion 12 for the pixel portion is uniformly spread, when the ink is solidified in this way, the pixel portion 6 without color unevenness or discoloration can be formed. If necessary, a protective layer may be disposed thereon.

By performing such each process, the color filter of 1st Embodiment of this invention as shown in FIG. 1 can be manufactured.

(About ink repellent iron)

In the sixth embodiment of the present invention, after the step of disposing the photocatalyst-containing layer, energy is irradiated to the photocatalyst-containing layer on the light shielding portion to form an exposure portion for ink repellent iron portion, and the ink repellency portion for the ink repellent iron portion exposed portion. You may have a process of forming an iron part.

The process of forming this ink-repellent iron part is demonstrated using FIG. In the same manner as in the sixth embodiment shown in FIG. 7 described above, the light shielding portion 3 is formed on the transparent substrate 2, and the mask for ink repellent iron portion is formed on the member on which the photocatalyst-containing layer 5 is formed so as to cover them. The energy is irradiated through 15) (Fig. 9 (A)). In this way, the pattern is irradiated with energy through the mask for ink repellent convex portions to form the exposure portion 16 for ink repellent convex portions in the photocatalyst-containing layer 5 on the light shielding portion.

The ink repellent convex ink 17, such as a UV-curable resin monomer, is attached to the exposure portion 16 for ink repellent convex portions by the ink jet apparatus 13 (Fig. 9 (B)). In addition, the coating method of the ink for ink repellent iron parts is not limited to the method by the inkjet apparatus, but other methods, such as dip coating, can be used.

By curing the ink repellent convex ink 17 by UV irradiation or the like, an ink repellent convex portion 7 is formed on the surface of the photocatalyst-containing layer 5 on the light shielding portion 3 (Fig. 9 (C)). It is preferable that the width of the ink repellent convex portion 7 is formed to be larger than the width of the light shielding portion 3 as shown in the figure. This is because such a formation does not cause problems such as color unevenness as described above.

The ink repellent convex portion 7 is formed by irradiating the entire surface of the photocatalyst-containing layer 5 on the photocatalyst-containing layer 5 with the energy 10 on the photocatalyst-containing layer 5 side or by pattern irradiation. The pixel portion 6 is formed by attaching and curing the ink 14 to this portion by using the inkjet apparatus 13 in this manner in the same manner as described above, after which the member other than the member is exposed to become an exposure portion for the pixel portion. A color filter in which the ink repellent convex portions 7 are disposed can be manufactured (Figs. 9 (D), (E) and (F)).

In the above method, the photocatalyst-containing layer on the light shielding portion is irradiated with energy to provide exposure for ink repellent iron portions, so that the ink repellent iron portions can be formed in any width. Therefore, the ink repellent convex portions of any width can be formed by applying the ink for ink repellent convex portions thereto. Thus, by adjusting the width of the mask 15 for ink repellent convex portions, the ink repellent convex portions 7 narrower than the light shielding portion 3 described above can be formed. By forming the ink repellent convex portion 7 that is narrower than the light shielding portion 3 as described above, the width of the pixel portion 6 formed between the ink repellent convex portions 7 is the width of the opening portion of the light shielding portion 3. Since it can be made wider, it is as above-mentioned that color filter which has no problem, such as a color nonuniformity, is obtained.

In addition, in this embodiment, although the ink repellent iron part is formed by the change of the wettability of a photocatalyst containing layer, it is not limited to this in this invention, For example, an ink repellent iron part can also be formed by the photolithographic method. .

(How to form pixel part)

In the present invention, as in the sixth embodiment described above, the pixel portion 6 can be formed by one-time energy irradiation and ink attachment to the exposure portion. However, in the sixth embodiment, energy is irradiated when the ink is attached. The distance between the exposure parts for pixel parts which are the prepared ink-like areas is short. Therefore, a problem may occur in which ink is mixed when the pixel portion is formed. As a method of avoiding such a problem, the method of dividing an energy irradiation and formation of a pixel part by at least 2 times is mentioned as shown below.

Fig. 10 shows an etch performed by dividing the energy irradiation and the pixel portion in two times. In the same manner as the example shown in FIG. 7 described above, the light shielding portion 3 is formed on the transparent substrate 2, and the photocatalyst-containing layer 5 is formed on the transparent substrate 2 so as to cover the light blocking portion 3. The energy 10 is irradiated so that the pixel portion is formed in every other pixel portion forming portion by using the mask 11 'on one member to form the pixel portion forming exposure portion 12 (Fig. 10 (A)). By attaching the ink 14 to the exposure portion 12 for the pixel portion using the inkjet device 13 (Fig. 10 (B)), the pixel portion 6 is formed in every other portion of the pixel portion forming portion ( 10 (C)). In addition, the pixel portion formed here is preferably the pixel portion itself is ink-repellent, in order to prevent coloring of the ink by the second inkjet device on the pixel portion, and the surface thereof is formed of a repellent agent such as a silicon compound or a fluorine-containing compound. It can also be processed.

By irradiating the energy 10 again from the photocatalyst-containing layer 5 on which the pixel portion 6 is formed, the pixel portion forming portion between the pixel portions 6 is exposed to make the pixel portion forming exposure portion 12, The color filter can be obtained by adhering the ink 14 using the inkjet apparatus 15 (FIG. 10 (D)).

According to this method, it is possible to reduce or eliminate the distance between each pixel portion, and to form a colored layer (assembly of pixel portions) excellent in smoothness. In addition, since the pixel portion formed when forming the first pixel portion is wide, ink does not mix beyond this portion. Therefore, a high quality color filter can be obtained without mixing of ink or the like.

In the above-described method, every other pixel portion 6 is formed. However, the present invention is not limited thereto, and color filters such as a zigzag type may be used as long as the first pixel portion is not adjacent. Can be changed according to the shape of the pixel portion. In the above description, the pixel portion is formed in two times, but the pixel portion may be formed three or more times as necessary.

(About the energy investigated)

In this invention, the light containing an ultraviolet-ray can be used as energy irradiated to a photocatalyst containing layer. Light sources including such ultraviolet rays may include, for example, mercury lamps, metal halide lamps, xenon lamps, and the like. The wavelength of the light used for such exposure can be set in the range of 400 nm or less, preferably in the range of 380 nm or less, and the irradiation amount of light at the time of exposure is the irradiation amount required for the exposed portion to express the ink ink by the action of the photocatalyst. You can do

When pattern irradiation is required when irradiating energy, the light source as described above may be used, and the pattern irradiation may be performed by pattern irradiation through a photomask. As another method, a pattern type may be used by using an excimer, a YAG laser, or the like. The drawing irradiation method can also be used. However, such a method may be problematic in that the apparatus is expensive, difficult to handle, and continuous output is impossible.

Therefore, in the present invention, a photocatalytic starting energy may be applied to the photocatalyst-containing layer, and the reaction rate increasing energy may be applied in a pattern form in the region where the photocatalytic reaction starting energy is applied to form a pattern of the ink-like region. This is because by forming a pattern using such an energy irradiation method, it is possible to use a reaction rate increasing energy which is relatively inexpensive and easy to handle, such as an infrared laser, at the time of pattern formation, and thus, the aforementioned problem does not occur.

It is for the following reason that a pattern of the lip ink region with changed wettability can be formed by applying such energy. That is, first, photocatalytic reaction energy is started to the photocatalyst-containing layer by applying a photocatalytic reaction starting energy to a region forming the pattern. Then, the reaction rate increase energy is added in the region where the photocatalytic reaction start energy is applied. By adding the reaction rate increasing energy in this manner, the photocatalytic reaction starting energy is already applied, and the reaction in the photocatalyst-containing layer in which the reaction is initiated by the catalysis of the photocatalyst is rapidly promoted. Thus, by applying the energy for increasing the reaction rate for a predetermined time, the change of the properties in the property change layer can be changed to a desired range, and the pattern to which the reaction rate increase energy is applied can be made into the pattern of the inking region having changed wettability.

a. On photocatalytic initiation energy

The photocatalytic initiation energy used in this energy irradiation method refers to the energy at which the photocatalyst initiates a catalytic reaction for changing the properties of the compound in the photocatalyst-containing layer.

The amount of the photocatalytic initiation energy added here is such that it does not cause a sudden change in the wettability in the photocatalyst-containing layer. If the amount of the photocatalytic initiation energy to be applied is small, the sensitivity at the time of forming the pattern by applying the reaction rate increase energy is deteriorated, and if the amount is too large, the change of the characteristics of the photocatalyst-containing layer to which the photocatalytic initiation energy is applied is too large. It is not preferable because the degree of becomes so large that the difference from the region to which the reaction rate increase energy is applied becomes unclear. Regarding the amount of energy to be applied, the amount of energy applied in advance and the amount of change in the wettability in the photocatalyst-containing layer are determined by performing a preliminary experiment or the like.

The photocatalytic reaction initiation energy in this method is not particularly limited as long as it is an energy capable of initiating the photocatalytic reaction. Among them, light is preferable.

The photocatalyst used in the present invention differs in the wavelength of light initiating the catalysis depending on the band gap. For example, cadmium sulfide is 496 nm, iron oxide is 539 nm visible light, and titanium dioxide is 388 nm ultraviolet light. Therefore, light may be used in the present invention whether visible or ultraviolet light. However, as described above, titanium dioxide is suitably used as a photocatalyst because of its high bandgap energy, which is not only effective as a photocatalyst, but also chemically stable, non-toxic, and easy to obtain, thus initiating the catalytic reaction of titanium dioxide. It is preferable that it is light containing the ultraviolet-ray to make. Specifically, ultraviolet rays in the range of 400 nm or less, preferably 380 nm or less, are preferably contained.

As the light source including the ultraviolet light, various ultraviolet light sources such as a mercury lamp, a metal halide lamp, a xenon lamp, and an excimer lamp may be included.

In the present invention, the range to which the photocatalytic reaction start energy is applied may be a part of the photocatalyst-containing layer. For example, the photocatalytic reaction start energy may be added in a pattern form, and the reaction rate increase energy, which will be described later, may also be added in a pattern form. It is also possible to form the pattern of the changed lipophilic region, but for reasons such as simplification and simplification, it is preferable to apply the photocatalytic initiation energy over the entire area where the pattern is formed, and thus initiate the photocatalytic reaction over the entire surface. It is preferable to apply the reaction rate increasing energy in the pattern form to the region where the energy is applied to form a pattern of the lipophilic region on the photocatalyst-containing layer.

b. Reaction speed increase energy

Next, the reaction rate increasing energy used in this method will be described. The reaction rate increase energy used in this method refers to energy for increasing the reaction rate of the reaction that changes the wettability of the photocatalyst-containing layer initiated by the photocatalytic reaction initiation energy. In the present invention, any energy can be used as long as it has such a function, and among them, it is preferable to use thermal energy.

The method of applying such thermal energy to the photocatalyst-containing layer in a pattern form is not particularly limited as long as it can form a pattern by heat on the photocatalyst-containing layer, and may include an infrared laser method or a thermal head method. have. Such an infrared laser is, for example, an infrared YAG laser (1064 nm) having an advantage of having a high directivity and a long irradiation distance, or a diode laser (LED; 830 nm, 1064 nm, 1100 nm) having an advantage of being relatively inexpensive. And the like, semiconductor lasers, He-Ne lasers, carbon dioxide lasers, and the like.

In this method, the photocatalytic reaction starting energy is added to activate the photocatalyst to initiate the change of wettability due to the catalytic reaction in the photocatalyst-containing layer, and the reaction rate increase energy is added to the portion where the change of the wettability has occurred, thereby catalyzing the reaction of the portion. By promoting the pattern, the pattern of the inking region can be formed by the difference in the reaction rate between the region where the reaction rate increase energy is applied and the region where the reaction rate is not applied.

2. About the seventh embodiment

7th Embodiment of this invention is one of the manufacturing methods for manufacturing the color filter which is 2nd Embodiment in the said invention,

(1) disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion is changed in a direction in which the contact angle with the liquid is lowered on the transparent substrate;

(2) forming a light exposing portion for the light shielding portion by patterning energy to a light shielding portion forming portion which is a portion where the light shielding portion is formed on the transparent substrate;

(3) disposing the light shielding portion in the exposure portion for the light shielding portion,

(4) forming an exposure portion for the pixel portion by irradiating energy on the transparent substrate on which the light shielding portion is disposed; and

(5) forming a pixel portion by coloring in the exposure portion for the pixel portion by an inkjet method;

It includes.

11 is for explaining each step of the seventh embodiment of the present invention. As shown in FIG. 1A, first, the photocatalyst-containing layer 5 is formed on the transparent substrate 2. The photocatalyst-containing layer 5 can be formed in the same manner as in the sixth embodiment described above.

Next, the light shielding portion forming portion of the photocatalyst-containing layer 5 is pattern-irradiated with the energy 10 using the photomask 19 for the light shielding portion to form the light shielding portion exposure portion 20. The light-shielding portion exposed portion 20 is a portion where the contact angle with the liquid is lowered by the action of the photocatalyst in the photocatalyst-containing layer 5 to form a lipophilic region (Fig. 11 (B)).

The energy 10 is the same as that of the sixth embodiment and includes not only ultraviolet light but also other energy.

The light shielding portion paint 21 is attached to the light shielding portion exposed portion 20 by the inkjet device 13, and then cured to form the light shielding portion 3 (FIG. 11C). Application of the light-shielding portion coating material 21 onto the light-shielding portion exposure portion 20 can be performed by a known coating method such as spray coating, dip coating, roll coating, bead coating, etc., in addition to the method using the ink jet apparatus. In this case, the coated light shielding portion 10 is removed from the ink repellent region of the photocatalyst-containing layer 5 other than the light shielding portion exposed portion 20 having a high contact angle with the liquid, and the contact angle with the liquid is removed. It selectively attaches only to the light-shielding portion exposed portion 20, which is a low ink-friendly region.

In addition, the light shielding portion 3 can be formed by a vacuum thin film forming method. That is, a metal thin film is formed on the photocatalyst-containing layer 5 after exposure by a vapor deposition method or the like, and the difference in adhesion between the photocatalyst-containing layer 5 other than the light-shielding portion exposed portion 20 and the light-shielding portion exposed portion 20 is used. To be patterned by peeling using a pressure-sensitive adhesive tape, a solvent treatment or the like to form the light shielding portion 3.

Next, the energy 10 is irradiated on the photocatalyst-containing layer 5 on which the light shielding portion 3 is formed on the entire surface or in a pattern form. As a result, the portion where the light shielding portion 3 is not formed becomes an exposure portion for the pixel portion of the inking region by the action of the photocatalyst in the photocatalyst-containing layer 5 (FIG. 11D).

Next, the inkjet device 13 sprays the ink 14 into the exposure portion for the pixel portion, which becomes the ink-friendly region by exposure, and colors it in red, green, and blue (Fig. 11 (E)). In this case, since the exposure portion for the pixel portion is an ink-like region having a small contact angle with the liquid by irradiation of energy as described above, the ink 14 ejected from the inkjet device 13 is uniform in the exposure portion for the pixel portion. Spreads.

Thus, the pixel part 6 is formed between the light shielding parts 3 by solidifying the ink adhering in the exposure part 11 for pixel parts (FIG. 11F). If necessary, a protective layer may also be formed thereon.

When the color filter is manufactured in this manner, the ink in the exposure portion 11 for the pixel portion is uniformly diffused as described above, so that when the ink 14 is solidified, the pixel portion 5 without color unevenness or discoloration is formed. It is possible to obtain a high quality color filter.

3. Regarding the eighth embodiment

An eighth embodiment of the present invention is another method of the manufacturing method for producing the color filter which is the second embodiment of the present invention.

(1) disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion is changed in a direction in which the contact angle with the liquid is lowered on the transparent substrate;

(2) forming an exposure portion for the pixel portion by patterning energy to a pixel portion forming portion, which is a portion where the pixel portion is formed on the transparent substrate;

(3) forming a pixel portion by coloring the ink exposure portion for the pixel portion by an inkjet method;

(4) irradiating energy to at least a photocatalyst-containing layer at a boundary portion of the pixel portion, and

(5) forming a light shielding portion at a boundary portion of the pixel portion irradiated with the energy

It includes.

FIG. 12 is for explaining the eighth embodiment, and similarly to the seventh embodiment, first, the transparent substrate 2 having the photocatalyst-containing layer 5 formed on one side is formed (FIG. 12A). On the side where the photocatalyst-containing layer 50 of the transparent substrate 2 is formed, the pattern 10 is irradiated with energy 10 via a mask 11 (Fig. 12 (B)). The ink portion 14 is attached to the light portion using the ink jet apparatus 13 to form the pixel portion 6 (Fig. 12C).

When forming the said pixel part 6, you may use the method of dividing the energy irradiation and formation of a pixel part which were demonstrated in the said 6th embodiment into two or more times. This is because the ink repellent region between the pixel portions 6 is narrow when the pixel portion 6 is formed, so that ink may be mixed.

In this way, the surface on which the pixel portion 6 is formed is irradiated with energy 10 on the entire surface or in a pattern to change the ink repellent region between the pixel portions 6 into a parent ink region (Fig. 12 (D)). The light-shielding portion 3 can be formed by attaching the light-shielding portion coating material 21 to the boundary portion of the pixel portion 6 by, for example, the inkjet device 13 (FIG. 12E) and curing ( 12 (F)). And a color filter can be obtained by forming a protective layer on the surface as needed.

The energy, the inkjet device, and also the various inks used here are the same as in the sixth embodiment described above, and thus description thereof is omitted here.

4. About 9th Embodiment

A ninth embodiment of the present invention is a manufacturing method for manufacturing a color filter which is the third embodiment of the present invention.

(1) disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion is changed in a direction in which the contact angle with the liquid is lowered on the transparent substrate, in the pixel portion forming portion, which is a portion where the pixel portion on the transparent substrate is formed;

(2) disposing a light shielding portion at a boundary portion of the pixel portion forming portion in which the photocatalyst-containing layer is disposed;

(3) forming an exposure portion for the pixel portion by irradiating energy to the photocatalyst-containing layer; and

(4) forming a pixel portion by coloring the ink exposure portion for the pixel portion by an inkjet method;

It includes.

This method will be described with reference to FIG. 4. First, the photocatalyst-containing layer 5 is formed at the portion where the pixel portion on the transparent substrate 2 is formed. That is, in this method, the photocatalyst-containing layer 5 is first formed in a pattern on a transparent substrate. Thus, as a method of forming a photocatalyst containing layer in a pattern form, the method of forming by the photolithographic method using the photosensitive sol-gel solution, the printing method, etc. can be mentioned, for example.

In the transparent substrate 2 on which the photocatalyst-containing layer 5 formed in this way is formed, the light-shielding portion is formed by a paint for a light-shielding portion, for example, using an inkjet device or the like on a portion (light-shielding portion forming portion) where the photocatalyst-containing layer 5 is not formed. (3) is formed. At this time, the wettability of the surface of the transparent substrate 2 becomes lip ink in comparison with the wettability of the surface of the photocatalyst-containing layer 5. Therefore, when the light shielding portion 3 is formed, the coating material for the light shielding portion is not adhered to the photocatalyst-containing layer exhibiting ink repellency, but is attached only to the light shielding portion forming portion on the transparent substrate 2 to form the light shielding portion.

In this embodiment, it is preferable that the wettability on the transparent substrate 2 is an inks, specifically, it is preferable that it is less than 10 degree | times as a contact angle with the liquid whose surface tension is 40 mN / m, More preferably, the surface tension is 40 mN As a contact angle with the liquid which is / m, it is 5 degrees or less, Especially preferably, it is 1 degree or less.

After the light shielding portion 3 is formed in this manner, energy is irradiated to the photocatalyst-containing layer 5 to make this portion an ink-friendly region. Then, the color filter can be formed by forming the pixel portion 6 on the photocatalyst-containing layer serving as the inking region by using an inkjet device or the like, and forming a protective layer if necessary.

Also in this embodiment, since the irradiated energy, the inkjet apparatus, and the various inks are the same as in the above-described embodiment, the description is omitted here.

5. About the tenth embodiment

10th Embodiment of this invention is a manufacturing method for manufacturing the color filter which is 4th Embodiment of the said invention,

(1) forming a light shielding portion on a transparent substrate;

(2) disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion is changed in a direction in which the contact angle of the liquid is lowered on the transparent substrate;

(3) forming a pixel portion by coloring the pixel portion forming portion, which is a portion where the pixel portion is formed, on the transparent substrate on which the photocatalyst-containing layer is not formed by an inkjet method;

It includes.

This method will be described with reference to FIG. First, the light shielding portion 3 is formed on the transparent substrate 2 (FIG. 13A). Next, the photocatalyst-containing layer 5 is formed on the light shielding portion 3 in a pattern form (Fig. 13 (B)). Here, the method of forming the light shielding portion 3 and the photocatalyst-containing layer 5 in a pattern form is the same as in the above-described embodiment, and a description thereof is omitted here.

Here, in this embodiment, it is preferable that the width of the photocatalyst-containing layer 5 is formed to be larger than the width of the light shielding layer 3. By making the width of the photocatalyst-containing layer 5 narrower than the width of the light-shielding layer 3, the width of the pixel portion formed between the photocatalyst-containing layer 5 in a subsequent step is wider than the width of the opening formed by the light-shielding portion 3. This is because it is difficult to cause problems such as color unevenness as described above.

The pixel portion 6 is formed by adhering the ink 14 between the photocatalyst-containing layers using the inkjet device 13 (Fig. 13C). At this time, since the ink 14 is directly adhered on the transparent substrate 2, the transparent substrate 2 is preferably an ink-friendly region, specifically 10 as a contact angle with a liquid having a surface tension of 40 mN / m. It is preferably less than degrees, more preferably 5 degrees or less, particularly preferably 1 degrees or less as a contact angle with a liquid having a surface tension of 40 mN / m. This is because the ink 14 is uniformly spread on the transparent substrate by using the transparent substrate 2 on the transparent ink region, so that problems such as color unevenness do not occur.

Thus, after the pixel part 6 is formed, energy 10 is irradiated to the side in which the pixel part 6 was formed (FIG. 13 (D)), and the formation of the protective layer 8 to be removed as needed is easy. (FIG. 13 (E)).

Also in this embodiment, since the energy to be irradiated, the inkjet apparatus, and the various inks are the same as in the above-described embodiment, the description is omitted here.

6. About Eleventh Embodiment

11th Embodiment of this invention is a manufacturing method for manufacturing the color filter which is 5th Embodiment in the said invention,

(1) disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion on the transparent substrate is changed in a direction in which the contact angle of the liquid is lowered to a light shielding portion forming portion, which is a portion where a light shielding portion is formed on the transparent substrate;

(2) forming a pixel portion by coloring by an inkjet method on a portion where the photocatalyst-containing layer on the transparent substrate is not formed;

(3) irradiating energy to at least the photocatalyst-containing layer; And

(4) forming a light shielding layer on the photocatalyst-containing layer to which the energy is irradiated

It will include.

This method will be described with reference to FIG. 6. First, the photocatalyst-containing layer 5 is formed on the transparent substrate 2 in a pattern form. The method for forming the photocatalyst-containing layer 5 in a pattern form can be performed by the method used in the ninth embodiment. The position at which the photocatalyst-containing layer 5 is formed is the light shielding portion forming portion 9 which is a portion where the light shielding portion 3 is formed. Next, ink is attached to a portion where the photocatalyst-containing layer 5 is not formed, that is, a pixel portion forming portion where the pixel portion is formed, using an inkjet device or the like to form the pixel portion 6. At this time, for the same reason as in the tenth embodiment, the wettability on the transparent substrate is preferably an affinity ink region, and specifically, the contact angle with a liquid having a surface tension of 40 mN / m is preferably less than 10 degrees, more preferably. Is a contact angle with a liquid having a surface tension of 40 mN / m of 5 degrees or less, particularly preferably 1 degree or less.

After the photocatalyst-containing layer 5 is made ink-friendly by energy irradiation, the light shielding portion 3 is formed on the photocatalyst-containing layer 5. Finally, the protective layer 8 is formed as necessary.

In this embodiment, about the energy to be irradiated, the inkjet apparatus used, various inks, etc. can refer to what was demonstrated in other embodiment mentioned above.

C. Color LCD Panel

A color liquid crystal panel is formed by combining the color filter obtained in this way and the opposing substrate which opposes this color filter, and sealing a liquid crystal compound therebetween. The color liquid crystal panel obtained as described above has the advantage that the color filter of the present invention has no advantages, namely, no color unevenness or discoloration, and is advantageous in terms of cost.

In addition, this invention is not limited to the said embodiment. The said embodiment is an illustration, Any thing which has the structure substantially the same as the technical idea described in the claim of this invention, and shows the same effect is contained in the technical scope of this invention.

EXAMPLE

Hereinafter, the present invention will be described in more detail with reference to Examples.

Example 1

1. Formation of Photocatalyst-Containing Layer

30 g of isopropyl alcohol, 0.4 g of MF-160E (manufactured by Tokem Products), the main component of which is fluoroalkylsilane, 3 g of trimethoxymethylsilane (manufactured by Toshiba Silicone Co., Ltd., TSL8113), and ST, a titanium oxide aqueous dispersion which is a photocatalyst 20 g of K01 (manufactured by 石 原 産業) was mixed and stirred at 100 ° C for 20 minutes. This was diluted three times with isopropyl alcohol to prepare a composition for the photocatalyst-containing layer.

The composition was applied by spin coating onto a transparent substrate made of soda glass, and dried at 150 ° C. for 10 minutes to form a transparent photocatalyst-containing layer (thickness 0.2 μm).

2. Confirmation of Formation of Ink-Focus Area by Exposure

The photocatalyst-containing layer was subjected to pattern exposure for 50 seconds with a mercury lymph (wavelength 365nm) through a mask at a light intensity of 70 mW / cm 2 to form an exposed portion, and the contact angles between the non-exposed portion and the liquid of the exposed portion were measured. In the non-exposed part, the contact angle with a liquid having a surface tension of 30 mN / m (ethylene glycol monoethyl ether, manufactured by Seiko Chemical Co., Ltd.) was measured using a contact angle measuring instrument (CA-Z). Dropwise to 30 seconds), and the result was 30 degrees. In the exposed portion, the contact angle with a liquid having a surface tension of 50 mN / m (manufactured by Suzuki Chemical Co., Ltd., wettability index standard solution No. 50) was measured to be 7 degrees. Thus, it was confirmed that an exposure part turns into a lip ink area and pattern formation by the difference of wettability of an exposure part and a non-exposure part is possible.

3. Shading

Next, a photocatalyst-containing layer was formed on the same transparent substrate as described above. The photocatalyst-containing layer was exposed to light by a mercury lamp (wavelength: 365 nm) (for 50 seconds at an illuminance of 70 mW / cm 2) through a mask for a light shielding portion having a matrix-type opening pattern (opening line width of 30 µm), and the ink for the light shielding portion was inked. It was set as the formation region (7 degrees or less in terms of the contact angle with the liquid having a surface tension of 50 mN / m).

On the other hand, the mixture of the following composition was heated to 90 ° C. to dissolve, centrifuged at 12000 rpm, and then filtered through a 1 μm glass filter. 1 weight% of ammonium dichromate was added to the obtained aqueous coloring resin solution as a crosslinking agent, and the light-shielding part coating material was prepared.

Carbon black (Product # 950): 4 parts by weight

Polyvinyl alcohol (Gosenol AH-26): 0.7 parts by weight

Ion-exchanged water: 95.3 parts by weight

Next, the light-shielding portion coating material was completely coated on the photocatalyst-containing layer by a blade coater. The coating material for light shielding part coated in this way was repulsed at the non-exposed part of a photocatalyst containing layer, and was selectively attached only to the light exposure part for light shielding part. Thereafter, drying was performed at 60 ° C. for 3 minutes, and the coating material for light shielding part was cured by exposing with a mercury lamp, followed by heat treatment at 150 ° C. for 30 minutes to form a light shielding part.

4. Formation of pixel part

Next, the whole surface was exposed on the photocatalyst containing layer in which the light shielding part was formed, and the exposure part for pixel parts was made into an ink repellency. Next, using an inkjet device, the UV curable multifunctional acrylate monomer ink of each color including RGB 5 parts by weight, 20 parts by weight of a solvent, 5 parts by weight of a polymerization initiator, and 70 parts by weight of a UV curable resin was converted into an ink-repellent ink. It adhere | attached and colored it to the exposure part for pixel parts, and hardened | cured by performing this UV process. Regarding the red, green and blue inks, polyethylene glycol monomethylethyl acetate as a solvent, Ingacular 369 (trade name: manufactured by Chiba Specialty Chemicals) as a polymerization initiator, and DPHA (dipentaerythritol hexaacrylate) as a UV curing resin (日本 火藥) (VIII) CI Pigment Red 177 for red ink, CI Pigment Green 36 for green ink and CI Pigment Blue 15 + CI Pigment Violet 23 for blue ink It was.

5. Formation of protective layer

As the protective layer, a two-liquid mixed thermosetting agent (SS7265 manufactured by Nippon Synthetic Rubber) was applied by a spin coater, and cured at 200 ° C. for 30 minutes to form a protective layer to obtain a color filter. The obtained color filter was of high quality without color unevenness or discoloration of the pixel portion.

Example 2

1. Formation of Photocatalyst-Containing Layer

The same photocatalyst-containing layer as in Example 1 was formed on the transparent substrate on which the light shielding layer was formed of chromium by the sputtering method.

2. Formation of the pixel portion

Next, on the photocatalyst-containing layer side, a pattern exposure is performed for 50 seconds by means of a mercury lamp (wavelength 365 nm, 70 mW / cm 2) through the mask for the pixel portion, and the exposed portion for the pixel portion is a contact angle with a liquid having a lip ink region (surface tension of 50 mN / m). Converted to 7 degrees or less).

Using the inkjet device on the exposed portion for the pixel portion, the ink is ink-filled with UV curable multifunctional acrylate monomer ink of each color including 5 parts by weight of pigment, 20 parts by weight of solvent, 5 parts by weight of polymerization initiator, and 70 parts by weight of UV curing resin. It adhere | attached and colored it to the exposure part for pixel parts made into the castle, and UV-hardened to this and hardened | cured. Regarding the red, green and blue inks, polyethylene glycol monomethylethyl acetate as a solvent, Ingacular 369 (trade name: manufactured by Chiba Specialty Chemicals) as a polymerization initiator, and DPHA (dipentaerythritol hexaacrylate) as a UV curing resin (日本 火藥) (VIII) CI Pigment Red 177 for red ink, CI Pigment Green 36 for green ink and CI Pigment Blue 15 + CI Pigment Violet 23 for blue ink It was.

3. Formation of protective layer

As the protective layer, a two-liquid mixed thermosetting agent (SS7265 manufactured by Nippon Synthetic Rubber) was applied by a spin coater, and cured at 200 ° C. for 30 minutes to form a protective layer to obtain a color filter. The obtained color filter was of high quality without color unevenness or discoloration of the pixel portion as in Example 1.

Example 3

1. Formation of Photocatalyst-Containing Layer

3 g isopropyl alcohol, fluoroalkylsilane (manufactured by Toke Products; MF-160E (trade name), isopropyl ether 50 of N- [3- (trimethoxysilyl) propyl] -N-ethylperfluorooctanesulfonamide) % By weight solution) 0.014 g, titanium oxide sol (STS-01 (trade name)) 2 g, silica sol (Japan rubber product; Glaska HPC7002 (trade name)) 0.6 g, and alkyl 0.2 g of alkoxysilanes (HP rubber 402II (brand name)) were mixed, and it stirred at 100 degreeC for 20 minutes. This solution was coated on an alkali free glass substrate having a thickness of 0.7 mm by spin coating to obtain a photocatalyst-containing layer having a thickness of 0.15 탆.

2. Confirmation of formation of lipophilic region by exposure and reduction of fluorine amount

The photocatalyst-containing layer was irradiated with ultraviolet light at 70 mW / cm 2 (365 nm) for 2 minutes with a high pressure mercury lamp through a lattice-shaped photomask, and the contact angle of n-octane (surface tension of 21 mN / m) was measured using a contact angle measuring instrument. As a result of the measurement by a chemistry CA-Z type, the unexposed part was 52 degrees and the exposed part was 0 degrees.

The unexposed part and the exposed part were subjected to elemental analysis by an X-ray photoelectron spectrometer (ESCALAB220-I-XL manufactured by V.G. Scientific). The results obtained by performing quantitative calculations based on Sherry's background correction and Scofield's relative sensitivity coefficient correction are expressed in terms of the relative values by weight when titanium (Ti) is 100. In contrast, the exposed portion was fluorine (F) 6 with respect to titanium (Ti) 100 in contrast to the fluorine (F) 1279.

From these results, it was found that by exposing the photocatalyst-containing layer, the proportion of fluorine on the surface of the photocatalyst-containing layer is reduced, thereby changing the surface from ink repellency to lip ink.

The present invention provides a transparent substrate, a pixel portion having a plurality of colors arranged in a predetermined pattern by an inkjet method on the transparent substrate, a light shielding portion disposed at a boundary portion of the pixel portion, and the pixel portion or the pixel portion and the light shielding portion. It is a color filter characterized by having a wettability variable layer which can change the wettability excreted for. Therefore, by using the change in the wettability of the wettability variable layer, the pixel portion or the pixel portion and the light shielding portion can be formed with high precision, and a high quality color filter without problems such as color unevenness or discoloration can be provided at a low cost.

Claims (46)

delete Transparent Board, A pixel portion in which a plurality of colors are disposed in a predetermined pattern by an inkjet method on the transparent substrate, A light shielding portion disposed at a boundary portion of the pixel portion, and Having a wettability variable layer disposed to form the pixel portion or the pixel portion and the light shielding portion and capable of changing wettability, At least the pixel portion is disposed on the wettability variable layer. The method of claim 2, The light blocking portion is formed on the transparent substrate, and the wettability variable layer is disposed on a pixel portion forming portion that is at least a portion on the light blocking portion and the pixel portion on the transparent substrate, and the pixel is formed on the wettability variable layer. Color filter, characterized in that the additional excretion. The method of claim 3, The width of the pixel portion formed on the wettability variable layer is wider than the width of the opening formed by the light shielding portion. The method of claim 3, An ink-repellent convex portion is formed on a surface of the wettable variable layer disposed on the light blocking portion. The method of claim 5, The width of the ink-repellent convex portion is formed in a width narrower than the width of the light shielding portion. The method of claim 2, And a wettable variable layer is formed on the transparent substrate, and a pixel portion and a light shielding portion are disposed at a predetermined portion on the wettable variable layer. The method of claim 2, The light blocking part is disposed on the transparent substrate, a wettability variable layer is disposed on a pixel part forming portion, which is a portion where the pixel part is formed on the transparent substrate, and a pixel part is formed on the wettability variable layer. delete delete delete Transparent Board, A pixel portion in which a plurality of colors are disposed in a predetermined pattern by an inkjet method on the transparent substrate, A light shielding portion disposed at a boundary portion of the pixel portion, and Having a wettability variable layer disposed to form the pixel portion or the pixel portion and the light shielding portion and capable of changing wettability, The wettability variable layer is disposed at a boundary portion of the pixel portion, The wettability variable layer is formed on a light shielding portion forming portion, which is a portion where the light shielding portion is formed on the transparent substrate, the light shielding portion is formed on the wettability variable layer, and the pixel portion is formed between the light blocking portions. Color filter. The method of claim 8, And a wettability on the transparent substrate is less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m. The method according to any one of claims 2 to 8, 12 or 13, The wettability variable layer is a photocatalyst-containing layer composed of at least a photocatalyst and a binder, and is a layer in which the wettability is changed so that the contact angle with the liquid is reduced by irradiation of energy. The method of claim 14, The photocatalyst-containing layer includes fluorine, and when the energy is irradiated to the photocatalyst-containing layer, the photocatalyst-containing layer is formed such that the fluorine content on the surface of the photocatalyst-containing layer is lower than before the energy is irradiated by the action of the photocatalyst. Color filter. The method of claim 15, The fluorine content in the site | part which reduced the fluorine content by performing energy irradiation on the said photocatalyst containing layer is 10 or less, when fluorine content of the part in which the energy was not irradiated was 100. The method of claim 14, The photocatalyst is titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and iron oxide (Fe ₂ O ₃ ) color filter, characterized in that one or two or more materials selected from. The method of claim 17, Color filter, characterized in that the photocatalyst is titanium oxide (TiO ₂ ). delete The method of claim 14, And said binder is an organic polysiloxane having a fluoroalkyl group. The method of claim 14, The binder is Y _n SiX _(4-n) , wherein Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group, or an epoxy group, X represents an alkoxyl group or a halogen, n is an integer from 0 to 3 A color filter comprising an organic polysiloxane which is one or two or more hydrolytic condensates or cohydrolytic condensates of a silicon compound represented by < RTI ID = 0.0 > delete delete The method of claim 14, And the pixel portion colored by the inkjet method is a pixel portion colored by an inkjet method using UV curable ink. (1) forming a light shielding portion on the transparent substrate; (2) disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion is changed in a direction in which the contact angle of the liquid is lowered on the surface on the side where the light shielding portion is formed on the transparent substrate; (3) forming an exposure portion for the pixel portion by applying energy to a pixel portion forming portion, which is a portion for forming the pixel portion on the photocatalyst-containing layer; And (4) forming a pixel portion by coloring the ink exposure portion for the pixel portion by an inkjet method; Method for producing a color filter comprising a. The method of claim 25, After the step of disposing the photocatalyst-containing layer, energy is irradiated onto the photocatalyst-containing layer on the light shielding portion to form an ink repellent iron portion exposed portion, and the ink repellent iron portion exposed portion is formed. The manufacturing method of the color filter made into. The method of claim 25, And in the step of forming the exposure portion for the pixel portion, the exposure portion for the pixel portion is formed by exposing the light shield portion as a mask and exposing the portion on the transparent substrate. (1) disposing a photocatalyst-containing layer whose wettability of the energy irradiated portion changes in a direction in which a contact angle with a liquid is lowered by irradiation of energy on a transparent substrate; (2) forming a light exposing portion for the light shielding portion by patterning energy to a light shielding portion forming portion, which is a portion where the light shielding portion is formed on the transparent substrate; (3) arranging the light shielding portion in the exposure portion for the light shielding portion; (4) forming an exposure portion for the pixel portion by irradiating energy to the transparent substrate on which the light shielding portion is disposed; And (5) forming a pixel portion by coloring in the exposure portion for the pixel portion by an inkjet method; Method for producing a color filter comprising a. (1) disposing a photocatalyst-containing layer whose wettability of the energy irradiated portion is changed in a direction in which the contact angle of the liquid is lowered on the transparent substrate; (2) forming an exposure portion for the pixel portion by patterning energy to a pixel portion forming portion, which is a portion where the pixel portion is formed on the transparent substrate; (3) forming a pixel portion by coloring the ink exposure portion for the pixel portion by an inkjet method; (4) irradiating energy to at least a photocatalyst-containing layer at a boundary portion of the pixel portion; And (5) forming a light shielding portion at a boundary portion of the pixel portion irradiated with the energy Method for producing a color filter comprising a. (1) disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion on the transparent substrate is changed in a direction in which the contact angle with the liquid is lowered on the pixel portion forming portion, which is a portion where the pixel portion on the transparent substrate is formed; (2) providing a light shielding portion at a boundary portion of the pixel portion forming portion in which the photocatalyst-containing layer is disposed; (3) irradiating energy to the photocatalyst-containing layer to form an exposure portion for the pixel portion; And (4) forming a pixel portion by coloring the ink exposure portion for the pixel portion by an inkjet method; Method for producing a color filter comprising a. (1) forming a light shielding portion on the transparent substrate; (2) disposing a photocatalyst-containing layer on the upper surface of the light shielding portion, the photocatalyst-containing layer having a wettability of the energy-irradiating portion at least in a direction in which the contact angle of the liquid is reduced; And (3) forming a pixel portion by coloring the pixel portion forming portion, which is a portion where the pixel portion is formed on the transparent substrate on which the photocatalyst-containing layer is not formed, by an inkjet method; Method for producing a color filter comprising a. (1) disposing a photocatalyst-containing layer in which the wettability of the energy irradiated portion on the transparent substrate is changed in a direction in which the contact angle of the liquid is lowered to a light shielding portion forming portion, which is a portion where the light shielding portion is formed on the transparent substrate; (2) forming a pixel portion by coloring by an inkjet method on a portion where the photocatalyst-containing layer on the transparent substrate is not formed; (3) irradiating energy to at least the photocatalyst-containing layer; And (4) forming a light shielding layer on the photocatalyst-containing layer to which the energy is irradiated Method for producing a color filter comprising a. The method of claim 25 or 29, After forming the exposure portion for the pixel portion, the step of forming the pixel portion by coloring the exposed portion of the pixel portion by an inkjet method (a) forming a light exposure portion for the first pixel portion by pattern-irradiating energy to a portion of the portion forming the pixel portion on the photocatalyst-containing layer; (b) forming a first pixel portion by coloring the first exposure portion for the pixel portion by an inkjet method; (c) exposing to the portion forming the remaining pixel portion on the photocatalyst-containing layer to form an exposure portion for the second pixel portion; And (d) forming a second pixel portion by coloring in the exposure portion for the second pixel portion by an inkjet method; Method for producing a color filter comprising a. 32. The method of any of claims 25, 26, and 31, wherein The width of the pixel portion is formed to be wider than the width of the opening formed by the light shielding portion. 33. The method according to any one of claims 30 to 32, And a wettability on the transparent substrate is less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m. 33. The method according to any one of claims 25 to 32, And the energy irradiated to the photocatalyst-containing layer is light including ultraviolet rays. 33. The method according to any one of claims 25 to 32, The energy irradiated to the photocatalyst-containing layer is a photocatalytic reaction starting energy and a reaction rate increasing energy, and the exposure portion is formed by irradiating the reaction rate increasing energy to a portion to which the photocatalytic reaction starting energy is irradiated. Way. The method of claim 37, The photocatalytic reaction starting energy is light including ultraviolet rays, and the reaction rate increasing energy is thermal energy. The method of claim 38, And the thermal energy is applied by an infrared laser. delete 33. The method according to any one of claims 25 to 32, The method of manufacturing a color filter, wherein the inkjet coloring to the exposure portion for the pixel portion is coloring by an inkjet printing method using UV curable ink. A liquid crystal panel comprising the color filter according to claim 2 and a substrate facing the liquid crystal, wherein a liquid crystal compound is enclosed between both substrates. Transparent Board, A pixel portion in which a plurality of colors are disposed in a predetermined pattern by an inkjet method on the transparent substrate, A light shielding portion disposed at a boundary portion of the pixel portion, and A photocatalyst-containing layer disposed to form the pixel portion or the pixel portion and the light shielding portion, and containing at least a photocatalyst and a binder resin and capable of changing wettability Color filter, characterized in that it has a. The method of claim 43, And the photocatalyst-containing layer is disposed at a boundary portion of the pixel portion. The method of claim 44, The light shielding portion is formed on the transparent substrate, the photocatalyst-containing layer is formed on the light shielding portion, and the pixel portion is formed between the photocatalyst-containing layer. The method of claim 45, The width of the photocatalyst-containing layer is formed in a width narrower than the width of the light shielding portion.

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