JP2003024775A - Method for simultaneous optical processing of liquid and gas and device therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for simultaneous phototreatment of liquid and gas by which the device cost and the installation area can be saved, and a device therefor. SOLUTION: In the method for simultaneously treating the liquid and the gas by light, the gas to be treated is inserted into a space between the liquid to be treated and the light source. In this method, a liquid layer through which the liquid to be treated flows is formed and the light source spaced from the liquid layer and covered with a protecting pipe, is arranged and the space between the liquid layer and the light source is served as a passage part for the gas to be treated.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a leachate from a final disposal site, industrial wastewater, sewage, human waste, livestock excrement, irrigation water, tap water, drinking water, pure water, ultrapure water, etc., and sludge treatment. The present invention relates to a method and an apparatus for simultaneously treating liquids and gases with light such as ultraviolet rays, visible rays, and infrared rays in facilities or fresh water facilities, hazardous substance treatment facilities, waste treatment facilities, and the like.

[0002]

2. Description of the Related Art In phototreatment of liquids, especially UV treatment is widely used for the purpose of (1) decomposition of organic substances, (2) excitation / dissociation of molecular bonds of organic substances or oxidants, and (3) sterilization / disinfection. ing. As a method of irradiating the liquid with ultraviolet rays, a method of irradiating ultraviolet rays in a state where the protection tube for protecting the ultraviolet lamp and the ultraviolet lamp in the liquid tank is immersed in the liquid, or on a vertically standing cylindrical or flat wall A method has been performed in which water is made to flow down in a thin film along with irradiation of ultraviolet rays from an ultraviolet lamp arranged at a position facing the water. In the case of light treatment for gas as well as for liquid, UV treatment is used for the purpose of detoxification and deodorization. In this case, there should be a gas to be treated around the UV lamp or it should be distributed. I have to.

Water treatment facilities, sludge treatment facilities, hazardous substance treatment facilities, waste treatment facilities, etc. have the following purposes.
Both liquid and gas that require UV treatment may be generated, but these are treated by separate UV treatment devices, and a plurality of UV treatment devices are required, which has a drawback that the cost of the device becomes high.

[0004]

SUMMARY OF THE INVENTION The problem to be solved by the present invention is to provide means for simultaneously photoprocessing liquids and gases to be processed in one device.
That is, an object of the present invention is to provide a simultaneous liquid and gas optical processing method and apparatus capable of reducing apparatus cost and apparatus area.

[0005]

The present invention can solve the above-mentioned problems by using the following means. (1) In a method of treating a liquid and a gas with light,
A method for simultaneous light treatment of liquid and gas, which comprises introducing a gas to be treated between a liquid to be treated and a light source. (2) A liquid layer through which the liquid to be processed flows is formed, a light source covered with a protective tube is arranged at a distance from the liquid layer, and a gas to be processed passes through a space between the liquid layer and the light source. A simultaneous optical processing device for liquid and gas, characterized in that

According to the present invention, the liquid and gas can be simultaneously photoprocessed by one device by the following actions. Light such as ultraviolet rays is emitted toward the support, for example, the inner wall, at the portion irradiated with ultraviolet rays by a light source such as an ultraviolet lamp. At this time, the liquid to be treated is supplied along the inner wall and is made to flow so as to form a thin liquid layer on the surface of the inner wall, and the gas to be treated is supplied between the light source and the liquid to be treated. With such a configuration, the light emitted from the light source is first applied to the gas layer, and the light passing through the gas layer is applied to the liquid layer. Therefore, the gas and the liquid can be simultaneously photoprocessed by the same light source. As a result, it is possible to prevent the substance in the liquid to be treated from adhering to the surface of the light source, so that there is an advantage that the labor of cleaning and maintenance of the surface of the light source can be significantly reduced.

When supplying ultraviolet light, the light source may be a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an excimer laser, a black light, or the like, which can irradiate ultraviolet light in the range of 170 to 380 nm. .
When using a protective tube to prevent damage to the ultraviolet lamp, it is preferable to use ordinary quartz (natural quartz) or synthetic quartz as the material. The UV-irradiated part of the light processing device is
Various shapes such as a flat shape and a cylindrical shape can be adopted. Also, a plurality may be provided.

The longitudinal direction of the light source, the flow direction of the liquid to be treated,
The flow direction of the gas to be treated is perpendicular to the ground,
It can be arbitrarily selected such as horizontal or diagonal. When the flow direction of the liquid to be treated and the flow direction of the gas to be treated are perpendicular to the ground, either upward flow or downward flow may be used. Further, the mutual flows may be any of a parallel flow, a counter flow, and a twist relationship. The thickness and flow velocity of the liquid layer and the gas layer can be arbitrarily selected depending on the types of liquid and gas, the amount of treatment, the desired treatment performance, and the like.

The liquid to be treated in the treatment method according to the present invention includes (1) leachate from the final disposal site, industrial wastewater, water, sewage, sewage generated in hazardous substance treatment facilities, waste treatment facilities, etc. (2) Examples include liquids such as tap water, purified water, drinking water, pure water, and ultrapure water, organic substances, or liquids containing organisms such as bacteria and protozoa, but are not limited thereto. Substances to be treated in the liquid include (1) biodegradable organic substances such as humic acid, (2) dioxins, coplanar PC
B, environmental hormones such as bisphenol A, nonylphenol and diethylhexyl phthalate, or carcinogens, (3) trichlorethylene, chlorophenol, pesticides, organic chlorine compounds such as TOX, 4) Escherichia coli, general bacteria, cryptospordium Examples thereof include bacteria / protozoa, (5) chromaticity, and odorous components, but are not limited thereto.

Examples of the gas to be treated in the treatment method according to the present invention include leachate at the final disposal site, industrial wastewater, water, sewage, a hazardous substance treatment facility, a gas generated in a waste treatment facility and the like. It is not limited to. The gas generated from biological treatment such as activated sludge treatment can also be mentioned. Substances to be treated in the gas include (1) odorous components (2) harmful substances such as trichlorethylene and TOX,
(3) Bacteria such as Escherichia coli and general bacteria, viruses and the like can be mentioned, but the invention is not limited thereto.

For example, when sewage treated water that has not been sterilized is used as the liquid to be treated and gas generated by the aeration treatment of activated sludge is used as the gas to be treated, the liquid is sterilized, and the gas is a gas accompanied by aeration. E. coli present in the
It is possible to sterilize and inactivate viruses at the same time. The treatment conditions in the present invention are the amount of the liquid to be treated,
Aeration amount of gas to be treated, strength and size of UV lamp,
It can be arbitrarily selected depending on the shape of the inner wall and the like.

[0012]

BEST MODE FOR CARRYING OUT THE INVENTION An example of a specific configuration of the present invention is shown in FIG.
It will be described based on. FIG. 1 shows that the longitudinal direction of the ultraviolet lamp 6, the flow direction of the gas to be treated 2 and the flow direction of the liquid to be treated 1 are all perpendicular to the ground, and the flow directions of the gas to be treated 2 and the liquid to be treated 1 descend. This is an example of the case of the flow / parallel flow. The liquid 1 to be treated flows down along the inner wall 3 of the portion to be irradiated with ultraviolet rays. Further, the gas to be treated 2 is aerated between the ultraviolet lamp 6 serving as a light source and the liquid to be treated 1 to form a gas layer 8. The processing liquid 9 and the processing gas 10 are simultaneously obtained from below.

In the simultaneous liquid and gas optical processing apparatus having the above-mentioned structure, the liquid to be processed 1 flows down as a downward flow by forming a thin liquid layer 5 on the inner surface of the inner wall 3 of the portion to be irradiated with ultraviolet rays. Since the ultraviolet lamp 6 is covered with the protective tube 7 and the gas 2 to be treated flows between the liquid 1 to be treated and the light source 6, it is configured so as not to come into direct contact with the liquid 1 to be treated. Since the contaminants in the liquid 1 to be treated are prevented from adhering to the surface of the lamp 6, it is possible to significantly reduce costs in terms of cleaning and maintenance of the surface of the ultraviolet lamp 6. It is not always necessary to provide the inner wall 3 or the like in order to form the thin liquid layer 5 of the liquid to be treated 1, and a thin liquid film in a waterfall shape may be formed to flow down.

FIG. 2 shows an example in which the longitudinal direction of the ultraviolet lamp 6, the flow direction of the gas 2 to be treated, and the flow direction of the liquid 1 to be treated are horizontal to the ground. The liquid 1 to be treated is passed on the inner surface of the lower inner wall 3. On the inner surface of the upper inner wall 3 (the surface facing the light source), a reflection plate 4 having a particularly high reflection efficiency is installed to improve the photo-oxidative decomposition efficiency of the gas 2 to be treated and the liquid 1 to be treated flowing on the lower inner wall 3. I try to raise it. Unlike FIG. 1, FIG. 3 is a schematic explanatory diagram in the case of a counter flow system of a downward flow of the liquid to be treated 1 and an upward flow of the gas to be treated 2. Other configurations and functions are the same as those in FIG.

[0015]

EXAMPLES The present invention will now be described in detail with reference to examples, but the present invention is not limited thereto.

Example 1 The apparatus shown in FIG. 1 was used to treat the liquid and gas generated in the treatment process of the agricultural settlement wastewater treatment facility. The types and properties of liquids and gases and processing conditions are shown in Tables 1 to 3 below.

[0017]

[Table 1]

[0018]

[Table 2]

[0019]

[Table 3]

The results of treatment under the conditions shown in Table 3 above are shown in Tables 4 and 5 below.

[0021]

[Table 4]

[0022]

[Table 5]

From the above results, the liquid removal rate of general bacteria is 99.7%, the removal rate of coliforms is 99.5% or more, and the removal rate of hydrogen sulfide, which is a malodorous substance, is 95% or more, and the removal rate of methylmercaptan is 98%. Above, methyl sulfide removal rate 67%
As described above, it was confirmed that a methyl disulfide removal rate of 67% or more was obtained. Therefore, it was confirmed that the method according to the present invention can simultaneously photoprocess liquid and gas in the same processing apparatus.

Example 2 The method of the present invention was carried out using the apparatus shown in FIG. In addition,
In this apparatus, the reflector 8 is made of stainless steel with aluminum vapor-deposited. In the present embodiment, the longitudinal direction of the ultraviolet lamp, the flow direction of the gas to be treated, the flow direction of the liquid to be treated are all horizontal to the ground, and the flow directions of the gas to be treated and the liquid to be treated are cocurrent. Here is an example. Even with such a configuration, the same effects as in Example 1 were obtained, and the effects of the present invention were unchanged.

Example 3 Another example according to the present invention was carried out using the apparatus shown in FIG. In this embodiment, the flow direction of the gas to be treated and the flow direction of the liquid to be treated are countercurrent. Even in such a configuration, the effect of the present invention remains unchanged.

[0026]

According to the present invention, the liquid and gas can be optically processed by the same apparatus by using the simultaneous optical processing method for liquid and gas. That is, light such as ultraviolet rays is irradiated toward the inner wall of the ultraviolet irradiation portion by a light source such as an ultraviolet lamp. At this time, the liquid to be processed is supplied so as to form a thin liquid layer along the inner wall, and the gas to be processed is supplied between the light source and the liquid to be processed. With such a configuration, the light emitted from the light source is first applied to the gas layer, and the light passing through the gas layer is applied to the liquid layer. Thereby, the gas and the liquid are simultaneously photoprocessed by the same light source. By being able to process with the same light source and device, it is possible to use the same processing device which has been required separately for liquid and gas, and to reduce the cost of the device.
The installation area can be reduced.

[Brief description of drawings]

FIG. 1 is a schematic view showing a simultaneous light and gas treatment method according to the present invention.

FIG. 2 is a schematic diagram showing another embodiment of the present invention.

FIG. 3 is a schematic view showing another embodiment of the present invention.

[Explanation of symbols]

1 Liquid to be treated 2 gas to be treated 3 inner wall 4 reflector 5 liquid layer 6 UV lamp 7 protection tube 8 gas layer 9 Treatment liquid 10 Processing gas

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Toshihiro Tanaka             11-1 Haneda Asahi-cho, Ota-ku, Tokyo Co., Ltd.             Inside the EBARA CORPORATION F-term (reference) 4D037 AA01 AA02 AA03 AA11 AB02                       AB03 AB04 AB05 AB11 AB13                       AB14 AB16 BA16 BA18 CA12                 4D050 AA01 AA04 AA05 AA12 AB03                       AB04 AB06 AB15 AB18 AB19                       BB01 BC09 BD02                 4D059 AA03 BK01 BK23 CB30                 4G075 AA03 AA13 BA01 BA04 BD03                       BD05 BD13 BD22 BD26 CA32                       CA33 CA34 EB33

Claims (2)

[Claims] 1. A method for simultaneously treating liquid and gas with light, comprising introducing a gas to be treated between the liquid to be treated and a light source. 2. A light source which forms a liquid layer in which a liquid to be processed flows and which is spaced from the liquid layer and which is covered with a protective tube is disposed, and a space between the liquid layer and the light source is a gas to be processed. A simultaneous optical processing device for liquid and gas, which is characterized in that