JP2002234105A - Hydrophilic member and method for manufacturing the same - Google Patents
Hydrophilic member and method for manufacturing the sameInfo
- Publication number
- JP2002234105A JP2002234105A JP2001067178A JP2001067178A JP2002234105A JP 2002234105 A JP2002234105 A JP 2002234105A JP 2001067178 A JP2001067178 A JP 2001067178A JP 2001067178 A JP2001067178 A JP 2001067178A JP 2002234105 A JP2002234105 A JP 2002234105A
- Authority
- JP
- Japan
- Prior art keywords
- titanium oxide
- photocatalytic
- hydrophilic member
- member according
- photocatalytic material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 178
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 171
- 230000001699 photocatalysis Effects 0.000 claims abstract description 94
- 239000000463 material Substances 0.000 claims abstract description 64
- 239000002245 particle Substances 0.000 claims abstract description 37
- 239000000243 solution Substances 0.000 claims abstract description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 7
- 239000001257 hydrogen Substances 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 78
- 239000011941 photocatalyst Substances 0.000 claims description 57
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 33
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 33
- 239000007858 starting material Substances 0.000 claims description 29
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 27
- 239000010410 layer Substances 0.000 claims description 26
- 229910044991 metal oxide Inorganic materials 0.000 claims description 26
- 150000004706 metal oxides Chemical class 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 19
- 239000011248 coating agent Substances 0.000 claims description 15
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 claims description 12
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 11
- 229910001887 tin oxide Inorganic materials 0.000 claims description 11
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 7
- 230000001443 photoexcitation Effects 0.000 claims description 4
- 229910000323 aluminium silicate Inorganic materials 0.000 claims description 2
- 239000002344 surface layer Substances 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims 2
- 239000006104 solid solution Substances 0.000 abstract description 5
- 238000005286 illumination Methods 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 description 38
- 239000010408 film Substances 0.000 description 29
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 23
- 238000004528 spin coating Methods 0.000 description 17
- 238000010586 diagram Methods 0.000 description 13
- 238000001035 drying Methods 0.000 description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 11
- 239000000377 silicon dioxide Substances 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- 239000013078 crystal Substances 0.000 description 9
- 238000003618 dip coating Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 7
- 238000002441 X-ray diffraction Methods 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000000926 separation method Methods 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 239000010419 fine particle Substances 0.000 description 5
- 238000010304 firing Methods 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- DVQHRBFGRZHMSR-UHFFFAOYSA-N sodium methyl 2,2-dimethyl-4,6-dioxo-5-(N-prop-2-enoxy-C-propylcarbonimidoyl)cyclohexane-1-carboxylate Chemical compound [Na+].C=CCON=C(CCC)[C-]1C(=O)CC(C)(C)C(C(=O)OC)C1=O DVQHRBFGRZHMSR-UHFFFAOYSA-N 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- 150000003658 tungsten compounds Chemical group 0.000 description 5
- 239000013522 chelant Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 230000006798 recombination Effects 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 238000010351 charge transfer process Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000003981 vehicle Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 150000001242 acetic acid derivatives Chemical class 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 239000000084 colloidal system Chemical class 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- -1 for example Substances 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 1
- UKUVVAMSXXBMRX-UHFFFAOYSA-N 2,4,5-trithia-1,3-diarsabicyclo[1.1.1]pentane Chemical compound S1[As]2S[As]1S2 UKUVVAMSXXBMRX-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- PXXRROSTRSLPET-UHFFFAOYSA-J C(C)(=O)[O-].[W+4].C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-] Chemical compound C(C)(=O)[O-].[W+4].C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-] PXXRROSTRSLPET-UHFFFAOYSA-J 0.000 description 1
- VRLNLJUZAHOYIT-UHFFFAOYSA-N CCCO[W](OCCC)(OCCC)(OCCC)OCCC Chemical compound CCCO[W](OCCC)(OCCC)(OCCC)OCCC VRLNLJUZAHOYIT-UHFFFAOYSA-N 0.000 description 1
- 206010021143 Hypoxia Diseases 0.000 description 1
- 102000003729 Neprilysin Human genes 0.000 description 1
- 108090000028 Neprilysin Proteins 0.000 description 1
- 241001074085 Scophthalmus aquosus Species 0.000 description 1
- OUUQCZGPVNCOIJ-UHFFFAOYSA-M Superoxide Chemical compound [O-][O] OUUQCZGPVNCOIJ-UHFFFAOYSA-M 0.000 description 1
- GJAROXYKDRBDBI-UHFFFAOYSA-J [W+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O Chemical compound [W+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GJAROXYKDRBDBI-UHFFFAOYSA-J 0.000 description 1
- KFFHETPLVQABEL-UHFFFAOYSA-N [W+5].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] Chemical compound [W+5].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] KFFHETPLVQABEL-UHFFFAOYSA-N 0.000 description 1
- XRCRLLCHKROABH-UHFFFAOYSA-N [W+5].C[O-].C[O-].C[O-].C[O-].C[O-] Chemical compound [W+5].C[O-].C[O-].C[O-].C[O-].C[O-] XRCRLLCHKROABH-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- AWXKYODXCCJWNF-UHFFFAOYSA-N ethanol tungsten Chemical compound [W].CCO.CCO.CCO.CCO.CCO AWXKYODXCCJWNF-UHFFFAOYSA-N 0.000 description 1
- XGZNHFPFJRZBBT-UHFFFAOYSA-N ethanol;titanium Chemical compound [Ti].CCO.CCO.CCO.CCO XGZNHFPFJRZBBT-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- ZEIWWVGGEOHESL-UHFFFAOYSA-N methanol;titanium Chemical compound [Ti].OC.OC.OC.OC ZEIWWVGGEOHESL-UHFFFAOYSA-N 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- GYUPBLLGIHQRGT-UHFFFAOYSA-N pentane-2,4-dione;titanium Chemical compound [Ti].CC(=O)CC(C)=O GYUPBLLGIHQRGT-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- YOUIDGQAIILFBW-UHFFFAOYSA-J tetrachlorotungsten Chemical compound Cl[W](Cl)(Cl)Cl YOUIDGQAIILFBW-UHFFFAOYSA-J 0.000 description 1
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- BDPNSNXYBGIFIE-UHFFFAOYSA-J tungsten;tetrahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[W] BDPNSNXYBGIFIE-UHFFFAOYSA-J 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Catalysts (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、親水性部材に関す
る。[0001] The present invention relates to a hydrophilic member.
【0002】[0002]
【従来の技術】光触媒の親水化能力を利用した様々な用
途が提案されおり、例えば、部材表面が水との接触角に
換算して10°以下の状態であれば、空気中の湿分や湯
気が結露しても、凝縮水が個々の水滴を形成せずに一様
な水膜になる傾向が顕著になる。従って、表面に光散乱
性の曇りを生じない傾向が顕著になる。同様に、窓ガラ
ス、車両用バックミラー、車両用風防ガラス、眼鏡レン
ズ、ヘルメットのシールド等が降雨や水しぶきを浴びた
場合に、離散した目障りな水滴が形成されずに、高度の
視界と可視性を確保し、車両や交通の安全性を保証し、
種々の作業や活動の能率を向上させる効果が飛躍的に向
上する。さらに、部材表面が水との接触角に換算して2
0°以下の状態であれば、都市煤塵、自動車等の排気ガ
スに含有されるカーボンブラック等の燃焼生成物、油
脂、シーラント溶出成分等の疎水性汚染物質、及び無機
粘土質汚染物質双方が付着しにくく、付着しても降雨や
水洗により簡単に落とせる状態になる。光触媒における
光誘起親水化現象は、1)光励起による電子、正孔の生
成、2)生成した正孔が格子の酸素原子と反応し、表面
に酸素欠陥を生成する。3)酸素欠陥部分に雰囲気中の
水分が吸着し安定化するといったメカニズムが考えられ
ている。2. Description of the Related Art Various applications utilizing the hydrophilizing ability of a photocatalyst have been proposed. For example, if the surface of a member is in a state of not more than 10 ° in terms of a contact angle with water, moisture in the air, Even if the steam condenses, the tendency of condensed water to form a uniform water film without forming individual water droplets becomes remarkable. Therefore, the tendency that light scattering fogging does not occur on the surface becomes remarkable. Similarly, when windowpanes, vehicle rearview mirrors, vehicle windshields, eyeglass lenses, helmet shields, etc. are exposed to rain or splashes, high visibility and visibility can be achieved without forming discrete and unsightly water droplets. Ensuring vehicle and traffic safety,
The effect of improving the efficiency of various tasks and activities is dramatically improved. Further, the surface of the member is converted into a contact angle with water,
If the temperature is 0 ° or less, both the urban dust, combustion products such as carbon black contained in exhaust gas of automobiles, hydrophobic contaminants such as oils and fats, sealant eluting components, and inorganic clay contaminants adhere. It is difficult to remove, and even if it adheres, it can be easily dropped by rainfall or washing with water. The photoinduced hydrophilization phenomenon in the photocatalyst is 1) generation of electrons and holes by photoexcitation, and 2) generated holes react with oxygen atoms of the lattice to generate oxygen defects on the surface. 3) A mechanism has been considered in which moisture in the atmosphere is adsorbed on the oxygen-deficient portion and stabilized.
【0003】[0003]
【発明が解決しようとする課題】光触媒を表面に形成し
た部材を屋内の日常的な用途で利用しようとした場合、
通常期待できる光源は、蛍光灯や白熱電球等の室内照明
であり、その紫外線照度も10μW/cm2以下と、非常に
小さい。光触媒として最も安定で光触媒活性が高いとさ
れる酸化チタンを用いた場合でも、屋内の微弱な光照射
の環境においては親水化が不充分である。When a member having a photocatalyst formed on its surface is used for daily indoor use,
The light source that can usually be expected is indoor lighting such as a fluorescent lamp or an incandescent light bulb, and the ultraviolet illuminance thereof is very small, 10 μW / cm 2 or less. Even when titanium oxide, which is considered to be the most stable and has high photocatalytic activity, is used as a photocatalyst, it is insufficiently hydrophilized in a weak indoor light irradiation environment.
【0004】一方、酸化チタンにおいて大きな親水化能
力を得るためには、酸化チタンの膜厚を厚くするのがよ
いが、酸化チタンに代表される光触媒の多くは高屈折率
物質であり、そのため、通常の被覆方法で光触媒層をμ
mオーダー以上の厚い膜厚で形成しようとすると、白
濁、虹彩色等を呈しやすく、部材の透明性や外観を損ね
てしまうという問題があった。On the other hand, in order to obtain a large hydrophilizing ability of titanium oxide, it is preferable to increase the thickness of titanium oxide. However, most photocatalysts represented by titanium oxide are high refractive index substances. Photocatalyst layer μ
If it is attempted to form a film having a thickness of m order or more, there is a problem that cloudiness, iris color, and the like are likely to be exhibited, and the transparency and appearance of the member are impaired.
【0005】本発明は上記課題を解決するためになされ
たもので、少量の酸化チタンでも、室内照明レベルの微
弱な光に応じて表面の親水化反応を実用レベルで生じ得
る部材を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a member capable of causing a surface hydrophilic reaction at a practical level in response to weak light of an indoor lighting level even with a small amount of titanium oxide. With the goal.
【0006】[0006]
【課題を解決するための手段】本発明は、基材と、基材
の表面に形成された被膜からなり、該被膜は前記基材の
表面に形成された光触媒性酸化チタン粒子を含む層と、
更にその上に酸化チタン以外の第二の光触媒性材料から
なる島状部ないしドメイン状部からなり、前記光触媒性
酸化チタン粒子の少なくとも一部と、前記第二の光触媒
の少なくとも一部が接合されてあって、前記光触媒性酸
化チタンを含む層のうち少なくとも一部が外気中の水分
と接触可能な状態で存在し、前記第二の光触媒性材料の
伝導帯の下端のポテンシャルが、pH=7のときの対標
準水素電極電位に換算して0Vよりも正であり、前記第
二の光触媒性材料の価電子帯の上端のポテンシャルが、
pH=7のときの対標準水素電極電位に換算して+2.
7Vよりも正であって、前記光触媒性酸化チタン及び第
二の光触媒性材料の少なくとも一方には、その光触媒性
材料を光励起できる波長の光が到達し得ることを特徴と
する親水性部材を提供する。The present invention comprises a substrate and a film formed on the surface of the substrate, wherein the film comprises a layer containing photocatalytic titanium oxide particles formed on the surface of the substrate. ,
Further, an island-shaped portion or a domain-shaped portion made of a second photocatalytic material other than titanium oxide is further formed thereon, and at least a portion of the photocatalytic titanium oxide particles and at least a portion of the second photocatalyst are joined. And at least a part of the layer containing the photocatalytic titanium oxide exists in a state where it can come into contact with moisture in the outside air, and the potential at the lower end of the conduction band of the second photocatalytic material is pH = 7. Is more positive than 0 V in terms of the standard hydrogen electrode potential at the time of, the potential at the upper end of the valence band of the second photocatalytic material,
+2 in terms of standard hydrogen electrode potential when pH = 7.
A hydrophilic member which is more positive than 7V and is capable of reaching at least one of the photocatalytic titanium oxide and the second photocatalytic material with light having a wavelength capable of photoexciting the photocatalytic material. I do.
【0007】本発明の親水性部材においては、第二の光
触媒材料が粒径50nm以下の島状ないしドメイン状で形成
されているため、着色や光の散乱が見られず透明性が高
い。また、本発明の光触媒部材においては、少量でも室
内照明レベルの微弱な光に応じて表面の親水化反応を実
用レベルで生じ得ることが可能となる。これは、光触媒
性酸化チタンと上記第二の光触媒を接合させることによ
り、電荷分離が非常に良好に促進され、また、酸化チタ
ンの少なくとも一部が外気中の水分と接触可能な状態で
存在することにより、酸素欠陥生成部への水の吸着反応
が促進されるからである。In the hydrophilic member of the present invention, since the second photocatalyst material is formed in the form of islands or domains having a particle size of 50 nm or less, coloring and light scattering are not observed, and the transparency is high. Further, in the photocatalyst member of the present invention, even in a small amount, a hydrophilic reaction on the surface can be caused at a practical level in response to weak light at an indoor lighting level. This is because, by joining the photocatalytic titanium oxide and the second photocatalyst, charge separation is promoted very well, and at least a part of the titanium oxide exists in a state where it can come into contact with moisture in the outside air. This is because the water adsorption reaction to the oxygen deficiency generating section is promoted.
【0008】電荷分離の促進のメカニズムは以下の様に
考えられる。本発明の親水性部材において、光触媒の一
方が酸化チタンで、他方が伝導帯の下端及び価電子帯の
上端が酸化チタンよりも正側にある酸化チタン以外の第
二の光触媒で、光触媒性酸化チタンと第二の光触媒を接
合させた場合、光励起によって伝導帯に生じた電子、お
よび価電子帯に生じた正孔はギブスの自由エネルギーが
減少する方向であれば、異種の光触媒間を移動すること
が可能である。The mechanism for promoting the charge separation is considered as follows. In the hydrophilic member of the present invention, one of the photocatalysts is titanium oxide, and the other is a second photocatalyst other than titanium oxide in which the lower end of the conduction band and the upper end of the valence band are more positive than titanium oxide, When titanium and the second photocatalyst are joined, electrons generated in the conduction band by photoexcitation and holes generated in the valence band move between different photocatalysts if the Gibbs free energy decreases. It is possible.
【0009】例えば、本発明に係る図1に示す様なエネ
ルギー構造の親水性部材に関して、酸化チタンと第二の
光触媒の双方を光励起した場合、酸化チタンの伝導帯に
生じた電子は第二の光触媒性材料の伝導帯に移行し、第
二の光触媒の価電子帯に生じた正孔は酸化チタンの価電
子帯に移動することができる。酸化チタン側に移動した
正孔は酸化チタン自身の格子酸素と反応して水との親和
性の高い酸素欠陥を生成し、親水化する一方、第二の光
触媒に移動した電子は空気中の酸素と反応してスーパー
オキサイドアニオンを生成して外界に放出される。本発
明の部材においては、第二の光触媒において生成した正
孔が酸化チタン粒子の表面における親水化に有効に作
用、アシストするため、少量の材料でも室内照明レベル
の微弱な光に応じて表面の親水化反応を実用レベルで生
じ得る。For example, with respect to the hydrophilic member having the energy structure as shown in FIG. 1 according to the present invention, when both the titanium oxide and the second photocatalyst are photoexcited, the electrons generated in the conduction band of the titanium oxide become the second. The holes that move to the conduction band of the photocatalytic material and are generated in the valence band of the second photocatalyst can move to the valence band of titanium oxide. The holes that have moved to the titanium oxide side react with the lattice oxygen of the titanium oxide itself to generate oxygen vacancies having a high affinity for water and become hydrophilic, while the electrons that have moved to the second photocatalyst are oxygen in the air. Reacts with to generate superoxide anion and is released to the outside world. In the member of the present invention, the holes generated in the second photocatalyst effectively act on the hydrophilicity of the surface of the titanium oxide particles, and assist, so that even a small amount of material can be used on the surface according to the weak light of the indoor lighting level. The hydrophilization reaction can occur at a practical level.
【0010】また、光触媒の一方が酸化チタン粒子で、
もう一方が、波長が400nm以上の可視光によって励起可
能な第二の光触媒を使用したものに対して可視光を照射
した場合を図2に示す。この複合部材に可視光を照射す
ると、酸化チタン粒子では波長400nm以上の可視光では
励起できず、第二の光触媒のみを励起することができ、
第二の光触媒で光励起した正孔が酸化チタン側に移行す
る。電子−正孔対が分離することで再結合する確立が非
常に低くなり、酸化チタン粒子表面における親水化反応
が促進される。また、図3に示すように、酸化チタンの
みを励起させた場合でも生成した正孔が電子と再結合す
ること無く効率的に酸化チタン粒子表面に集まって、酸
化チタン粒子表面における親水化反応が促進される。One of the photocatalysts is titanium oxide particles,
FIG. 2 shows a case where the other one using a second photocatalyst which can be excited by visible light having a wavelength of 400 nm or more is irradiated with visible light. When this composite member is irradiated with visible light, titanium oxide particles cannot be excited by visible light having a wavelength of 400 nm or more, and can only excite the second photocatalyst,
The holes photoexcited by the second photocatalyst move to the titanium oxide side. The probability of recombination due to the separation of the electron-hole pairs is extremely low, and the hydrophilization reaction on the surface of the titanium oxide particles is promoted. Further, as shown in FIG. 3, even when only titanium oxide is excited, the generated holes are efficiently collected on the surface of the titanium oxide particles without recombination with the electrons, and the hydrophilization reaction on the surface of the titanium oxide particles occurs. Promoted.
【0011】本発明の好ましい態様においては、基材表
面に光触媒性酸化チタン粒子を含む層が形成され、更に
その上に粒径10nm以下の酸化チタン以外の第二の光触
媒性材料からなる島状部ないしドメイン状部が前記酸化
チタンを含む層上に形成され、かつ光触媒性酸化チタン
粒子と酸化チタン以外の第二の光触媒性材料とが接合さ
れている。前記酸化チタンと第二の光触媒が接合されて
電荷分離効率が向上するため、少量の酸化チタンでも紫
外線照度に換算して1μW/cm2の微弱な白色蛍光灯の照射
によって表面が高度に親水化することが可能である。ま
た、前記好ましい態様における親水性部材においては、
第二の光触媒の粒子が微細で、且つ酸化チタンの使用量
を少なくすることができるため透明性が高い。In a preferred embodiment of the present invention, a layer containing photocatalytic titanium oxide particles is formed on the surface of the substrate, and an island-like layer made of a second photocatalytic material other than titanium oxide having a particle size of 10 nm or less is further formed thereon. A portion or a domain-like portion is formed on the layer containing the titanium oxide, and the photocatalytic titanium oxide particles are bonded to a second photocatalytic material other than the titanium oxide. The order titanium oxide and the second photocatalyst is improved charge separation efficiency is bonded, highly hydrophilic surface by irradiation with a small amount of weak white fluorescent lamp 1 .mu.W / cm 2 in terms of UV illumination in the titanium oxide It is possible to Further, in the hydrophilic member in the preferred embodiment,
Since the particles of the second photocatalyst are fine and the amount of titanium oxide used can be reduced, the transparency is high.
【0012】[0012]
【発明の実施の形態】本発明に係る親水性部材の酸化チ
タンの結晶構造はアナターゼ型、ルチル型、ブルッカイ
ト型が好適に使用することができる。また、光照射に伴
う表面水酸基の増加は酸化チタン粒子の表面でおこるた
め、酸化チタン粒子の少なくとも一部は外気中の水分と
接触可能な状態で存在していることが望ましい。より好
適には、酸化チタン粒子の少なくとも一部は外気に露出
しているようにする。BEST MODE FOR CARRYING OUT THE INVENTION As the crystal structure of titanium oxide of a hydrophilic member according to the present invention, anatase type, rutile type and brookite type can be suitably used. In addition, since the increase in surface hydroxyl groups due to light irradiation occurs on the surface of the titanium oxide particles, it is desirable that at least a part of the titanium oxide particles exist in a state where the titanium oxide particles can come into contact with moisture in the outside air. More preferably, at least a part of the titanium oxide particles is exposed to the outside air.
【0013】前記酸化チタン以外の第二の光触媒性材料
の粒径が大きくなると、これらの粒子に起因する光学的
散乱により表面層の透明性が損なわれるため、実質的な
透明性を保つためには第二の光触媒性材料の粒径が50
nm以下であることが望ましい。If the particle size of the second photocatalytic material other than the titanium oxide increases, the transparency of the surface layer is impaired by optical scattering caused by these particles. Means that the particle size of the second photocatalytic material is 50
Desirably, it is not more than nm.
【0014】本発明の親水性部材において、酸化チタン
粒子と第二の光触媒の接合部分で電荷移動が生じ、電荷
分離効率が向上する。したがって、前記光触媒材料の光
誘起親水化特性を向上させるためには、酸化チタンと第
二の光触媒性材料の接触点を増加させることが望まし
い。つまり、第二の光触媒は微細粒子であることが望ま
しく、本発明の好ましい態様においては、光触媒性酸化
チタンを含む層の上に、第二の光触媒性材料が粒径10
nm以下の微細な島状またはドメイン状で分布してい
る。In the hydrophilic member of the present invention, charge transfer occurs at the junction between the titanium oxide particles and the second photocatalyst, and the charge separation efficiency is improved. Therefore, in order to improve the photo-induced hydrophilicity of the photocatalytic material, it is desirable to increase the contact point between titanium oxide and the second photocatalytic material. That is, the second photocatalyst is preferably fine particles, and in a preferred embodiment of the present invention, the second photocatalytic material has a particle size of 10 nm on the layer containing the photocatalytic titanium oxide.
It is distributed in the form of fine islands or domains of nm or less.
【0015】本発明の親水性部材において、酸化チタン
粒子の表面の親水化は大きく促進され、第二の光触媒性
材料表面の濡れ性の変化は小さいため、酸化チタンと第
二の光触媒性材料には好適な配合比が存在する。つま
り、濡れ性の変化に寄与する酸化チタン部分の露出面積
が大きく保てるような構造が望ましい。前記親水性部材
の表面において、酸化チタンに対して第二の光触媒性材
料が占める割合がX線光電子分光法で計測した面積比で
0.5%より小さい場合は、第二の光触媒性材料による
親水化特性の向上効果は認められない。逆に、第二の光
触媒性材料が占める割合がX線光電子分光法で計測した
面積比で50%より大きくなると、酸化チタン自体の占
める露出面積が小さくなるために、第二の光触媒材料に
よる親水化特性の向上効果よりも酸化チタンの露出面積
が小さくなることで親水化が阻害されるために、結果と
して表面の親水化特性は悪くなる。すなわち、本発明の
好ましい態様においては、前記第二の光触媒性材料が表
面を占める割合は、X線光電子分光法で計測した面積比
に換算して、0.5〜50%の範囲であるものが好適に
使用できる。In the hydrophilic member of the present invention, the hydrophilicity of the surface of the titanium oxide particles is greatly promoted and the change in the wettability of the surface of the second photocatalytic material is small. Has a suitable compounding ratio. That is, a structure that can keep the exposed area of the titanium oxide portion contributing to the change in wettability is desirable. When the ratio of the second photocatalytic material to titanium oxide on the surface of the hydrophilic member is smaller than 0.5% in the area ratio measured by X-ray photoelectron spectroscopy, the second photocatalytic material is used. No effect of improving the hydrophilicity is observed. Conversely, if the proportion occupied by the second photocatalytic material is greater than 50% in the area ratio measured by X-ray photoelectron spectroscopy, the exposed area occupied by the titanium oxide itself becomes smaller, so that the hydrophilicity due to the second photocatalytic material becomes smaller. Since the exposed area of the titanium oxide is smaller than the effect of improving the hydrophilization property, the hydrophilization is inhibited, and as a result, the hydrophilization property of the surface deteriorates. That is, in a preferred embodiment of the present invention, the proportion of the surface occupied by the second photocatalytic material is in the range of 0.5 to 50% in terms of the area ratio measured by X-ray photoelectron spectroscopy. Can be preferably used.
【0016】本発明において、第二の光触媒としては、
伝導帯の下端のポテンシャルがpH=7のときの対標準水
素電極電位に換算して0Vよりも正であり、また、価電
子帯の上端のポテンシャルがpH=7のときの対標準水素
電極電位に換算して+2.7Vよりも正である材料とし
て、酸化タングステン、タングステン酸塩、酸化スズ等
が好適に使用できる。In the present invention, as the second photocatalyst,
The potential at the lower end of the conduction band is more positive than 0 V when converted to the standard hydrogen electrode potential when pH = 7, and the standard hydrogen electrode potential when the upper potential of the valence band is pH = 7. Tungsten oxide, tungstate, tin oxide, and the like can be suitably used as a material that is more positive than +2.7 V in terms of.
【0017】前記第二の光触媒性材料は結晶化に伴って
凝集した組織のものよりも、均一に分散可能で、且つ電
子、正孔の移動を阻害してしまう粒界の少ないアモルフ
ァス状の構造の方が光誘起親水化特性の高感度化には好
適である。また、前記第二の光触媒性材料がアモルファ
ス状の場合、酸化チタン表面に固化させるための熱処理
は低温であるため、酸化チタンと第二の光触媒の間で固
溶体を生成し得ない。固溶体においては、酸化チタンな
いし第二の光触媒において不純物準位を形成してしま
い、この準位が電子−正孔対の再結合センターになって
電荷分離効率を著しく低下させてしまうため、第二の光
触媒性材料としては固溶体生成の無いアモルファス状の
方が好ましい。The second photocatalytic material has an amorphous structure which can be dispersed more uniformly and has less grain boundaries which hinder the transfer of electrons and holes, as compared to a material having a structure agglomerated with crystallization. Is more suitable for increasing the sensitivity of the photo-induced hydrophilicity. When the second photocatalytic material is amorphous, the heat treatment for solidifying the titanium oxide surface is at a low temperature, so that a solid solution cannot be generated between the titanium oxide and the second photocatalyst. In a solid solution, an impurity level is formed in the titanium oxide or the second photocatalyst, and this level becomes a recombination center of an electron-hole pair, which significantly lowers the charge separation efficiency. The photocatalytic material is preferably in an amorphous state without formation of a solid solution.
【0018】第二の光触媒として、とりわけ、アモルフ
ァス状の酸化タングステンないしタングステン酸塩が好
ましい。アモルファス状の酸化タングステン、およびタ
ングステン酸アンモニウムのバンドギャップはいずれも
3.1eVで、酸化チタンのバンドギャップ3.2eVより
も狭いため、酸化チタンで吸収できなかった可視光を吸
収して電子正孔対を励起することが可能である。。As the second photocatalyst, amorphous tungsten oxide or tungstate is particularly preferable. The band gaps of amorphous tungsten oxide and ammonium tungstate are both 3.1 eV, which is narrower than the band gap of titanium oxide of 3.2 eV. It is possible to excite the pair. .
【0019】暗所における親水性を維持させたり強めた
りするため、前記酸化チタンと第二の光触媒を含む被膜
に、更に酸化チタンよりも化学吸着水を多く吸着し得る
金属酸化物が含有されていてもよい。こうすることで、
室内において、夜間の光照射が無い状態があっても高度
に親水化した状態が維持され、昼夜を問わず防曇特性が
発揮される。In order to maintain or enhance hydrophilicity in a dark place, the film containing the titanium oxide and the second photocatalyst further contains a metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide. You may. By doing this,
In a room, even when there is no light irradiation at night, a highly hydrophilic state is maintained, and antifogging properties are exhibited both day and night.
【0020】また、前記、酸化チタンよりも化学吸着水
を多く吸着し得る金属酸化物は、前記酸化チタンと第二
の光触媒を含む被膜の上に、更に1nm〜100nmの厚みの範
囲で層状に形成されていてもよい。このような形態にお
いても、室内において、夜間の光照射が無い状態があっ
ても高度に親水化した状態が維持され、昼夜を問わず防
曇特性が発揮される。Further, the metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide is further layered on the film containing titanium oxide and the second photocatalyst in a thickness of 1 nm to 100 nm. It may be formed. Even in such a form, even when there is no light irradiation in the room at night, the highly hydrophilic state is maintained, and the antifogging property is exhibited regardless of day and night.
【0021】前記化学吸着水を多く吸着し得る金属酸化
物の厚みが1nm〜100nmの範囲であれば、酸化チタンは前
記金属酸化物の開気孔を通じて外気中の水分と接触が可
能な状態をつくることができ、光励起に伴う親水化反応
を進行させることができる。If the thickness of the metal oxide capable of adsorbing a large amount of the chemically adsorbed water is in the range of 1 nm to 100 nm, the titanium oxide is in a state where it can be brought into contact with moisture in the outside air through the open pores of the metal oxide. And a hydrophilization reaction accompanying photoexcitation can be advanced.
【0022】前記、酸化チタンよりも化学吸着水を多く
吸着し得る金属酸化物として、シロキサン結合、ボロシ
ロキサン結合、アルミノシリケート結合からなる群より
選択する少なくとも一つの結合を有する金属化合物が好
適に使用できる。As the metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide, a metal compound having at least one bond selected from the group consisting of a siloxane bond, a borosiloxane bond, and an aluminosilicate bond is preferably used. it can.
【0023】以下に、本発明の好ましい具体的な構成に
ついて図に基づき説明する。本発明の一実施態様におい
ては、図4に示すように、基材の上に酸化チタンを含む
層が形成され、その上に第二の光触媒からなる島状部な
いしドメイン状部が、前記酸化チタンを含む層に接合さ
れている。酸化チタンの少なくとも一部は外気に露出し
ていて、外気中の水分と接触することが可能である。酸
化チタン及び第二の光触媒を励起した場合、酸化チタン
に生成した電子は第二の光触媒に流れる一方、正孔は酸
化チタンの表面に到達する。光励起した正孔が電子と再
結合すること無く、酸化チタン表面に集まるため、酸化
チタンにおける親水化反応が著しく促進される。A preferred specific configuration of the present invention will be described below with reference to the drawings. In one embodiment of the present invention, as shown in FIG. 4, a layer containing titanium oxide is formed on a substrate, on which islands or domains formed of a second photocatalyst are formed by the oxidation. It is bonded to a layer containing titanium. At least a part of the titanium oxide is exposed to the outside air and can come into contact with moisture in the outside air. When the titanium oxide and the second photocatalyst are excited, electrons generated in the titanium oxide flow to the second photocatalyst, while holes reach the surface of the titanium oxide. Since the photoexcited holes are collected on the surface of the titanium oxide without recombination with the electrons, the hydrophilization reaction in the titanium oxide is remarkably promoted.
【0024】本発明の他の実施態様においては、図5に
示すように、暗所における親水性を維持したり強めたり
するため、図4における親水性部材の表面に、更に酸化
チタンよりも化学吸着水を多く吸着し得る金属酸化物か
らなる島状部ないしドメイン状部を形成させても良い。In another embodiment of the present invention, as shown in FIG. 5, in order to maintain or enhance the hydrophilicity in a dark place, the surface of the hydrophilic member in FIG. An island portion or a domain portion made of a metal oxide capable of adsorbing a large amount of adsorbed water may be formed.
【0025】本発明の他の実施態様においては、図6に
示すように、基材の上に酸化チタンを含む層が形成さ
れ、その上に第二の光触媒からなる島状部ないしドメイ
ン状部が接合され、更にその上に酸化チタンよりも化学
吸着水を多く吸着し得る金属酸化物からなる層が形成さ
れているようにする。この場合、金属酸化物の厚みが1n
m〜100nmの範囲であれば、前述した様に、水分子が金属
酸化物の開気孔を通して通過することができるので、酸
化チタンは常に外気中の水分と接触可能な状態にあり、
光照射によって酸化チタンの部分を容易に親水化するこ
ともできる。In another embodiment of the present invention, as shown in FIG. 6, a layer containing titanium oxide is formed on a base material, and an island portion or domain portion made of a second photocatalyst is formed thereon. And a layer made of a metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide is formed thereon. In this case, the thickness of the metal oxide is 1n
In the range of m to 100 nm, as described above, since water molecules can pass through the open pores of the metal oxide, the titanium oxide is always in a state capable of contacting moisture in the outside air,
The part of titanium oxide can be easily made hydrophilic by light irradiation.
【0026】本発明の他の実施態様においては、図7に
示すように、基材の上に酸化チタンと酸化チタンよりも
化学吸着水を多く吸着し得る金属酸化物を含む混合層が
形成され、更にその上に第二の光触媒からなる島状部な
いしドメイン状部が、前記混合層に接合されている。こ
の態様においても、暗所における親水性を維持させたり
強めたりすることができる。In another embodiment of the present invention, as shown in FIG. 7, a mixed layer containing titanium oxide and a metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide is formed on a substrate. Further, an island portion or a domain portion made of a second photocatalyst is bonded to the mixed layer. Also in this embodiment, the hydrophilicity in a dark place can be maintained or enhanced.
【0027】以下に、本発明の好ましい具体的な構成の
親水性部材の製造方法を以下に示す。酸化チタンの出発
原料としては、例えば、無定型チタニアゾル、結晶質の
チタニアゾル、テトラメトキシチタン、テトラエトキシ
チタン、テトライソプロポキシチタン、テトラn−プロ
ポキシチタン、テトラブトキシチタン、チタンキレー
ト、アセチルアセトンチタン、四塩化チタン、硫酸チタ
ン、水酸化チタンからなる群から選択される少なくとも
1種類を含む原料を使用することができる。Hereinafter, a method for producing a hydrophilic member having a preferred specific structure according to the present invention will be described. Starting materials for titanium oxide include, for example, amorphous titania sol, crystalline titania sol, tetramethoxytitanium, tetraethoxytitanium, tetraisopropoxytitanium, tetra-n-propoxytitanium, tetrabutoxytitanium, titanium chelate, acetylacetone titanium, tetrachloride A raw material containing at least one selected from the group consisting of titanium, titanium sulfate, and titanium hydroxide can be used.
【0028】第二の光触媒の出発原料としては、例え
ば、酸化チタン以外の光触媒を構成する金属元素を含有
する金属塩、コロイド、アルコキシド、キレート化合
物、アセテート化合物からなる群より選択される少なく
とも1種類を含む原料を使用することができる。特に、
第2の光触媒が酸化タングステンないしタングステン酸
塩の場合、出発原料としては、タングステン酸をアンモ
ニア水に溶解した液を容易に製造することが可能であ
る。また、第二の光触媒が酸化スズの場合、出発原料と
して非晶質状の酸化物のコロイド水溶液が一般に市販さ
れており、島状部ないしドメイン状部を形成させるため
の原料として好適に使用することが出来る。As a starting material of the second photocatalyst, for example, at least one selected from the group consisting of metal salts, colloids, alkoxides, chelate compounds and acetate compounds containing metal elements constituting the photocatalyst other than titanium oxide The raw material containing can be used. In particular,
When the second photocatalyst is a tungsten oxide or a tungstate, a liquid in which tungstic acid is dissolved in aqueous ammonia can be easily produced as a starting material. When the second photocatalyst is tin oxide, an aqueous colloidal solution of an amorphous oxide is generally commercially available as a starting material, and is preferably used as a raw material for forming an island-like portion or a domain-like portion. I can do it.
【0029】酸化チタンよりも化学吸着水を多く吸着し
得る金属酸化物の出発原料としては、例えば、この金属
を含有する金属塩、コロイド、アルコキシド、キレート
化合物、アセテート化合物からなる群より選択される少
なくとも1種類を含む原料を使用することができる。例
えば、酸化チタンよりも化学吸着水を多く吸着し得る金
属酸化物がシロキサン結合を有する化合物の場合、出発
原料としては、例えば、シリカ、シリコーン、アルキル
シリケート、アルカリシリケート、アクリルシリコーン
等が好適に使用できる。The starting material of a metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide is selected, for example, from the group consisting of metal salts, colloids, alkoxides, chelate compounds and acetate compounds containing this metal. Raw materials containing at least one type can be used. For example, when the metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide is a compound having a siloxane bond, as a starting material, for example, silica, silicone, alkyl silicate, alkali silicate, acrylic silicone, etc. are preferably used. it can.
【0030】図4に示す様な、基材の上に、酸化チタン
の層が形成され、更にその上に第二の光触媒からなる島
状部ないしドメイン状部が接合されている部材を製造す
る方法として、例えば以下の様な方法がある。酸化チタ
ンの出発原料を基材に塗布後、乾燥または加熱焼き付け
により、酸化チタンの薄膜を成膜し、更にその上に、第
二の光触媒の出発原料を塗布後、乾燥または加熱焼き付
けをおこなう。As shown in FIG. 4, a member is produced in which a layer of titanium oxide is formed on a base material, and an island or domain made of a second photocatalyst is joined thereon. As a method, for example, there is the following method. After the starting material of titanium oxide is applied to the substrate, a thin film of titanium oxide is formed by drying or baking, and then the starting material of the second photocatalyst is applied thereon, followed by drying or baking.
【0031】図5に示す様な、基材の上に酸化チタンが
形成され、更にその上に第二の光触媒からなる島状部な
いしドメイン状部と、酸化チタンよりも化学吸着水を多
く吸着し得る金属酸化物からなる島状部ないしドメイン
状部が接合されている部材を製造する方法として、例え
ば以下の様な方法がある。酸化チタンの出発原料を基材
に塗布後、乾燥または加熱焼き付けにより、酸化チタン
の薄膜を成膜する。更にその上に第二の光触媒の出発原
料と金属酸化物の出発原料を含むコーティング剤を塗布
後、乾燥または加熱焼き付けにより図5に示す様な部材
を製造することができる。また、酸化チタン薄膜を成膜
した後に、第二の光触媒の出発原料を塗布後、乾燥また
は加熱焼き付けし、更にその後に金属酸化物の出発原料
を塗布後、乾燥または加熱焼き付けをおこなってもよ
い。また、酸化チタン薄膜を成膜した後に、金属酸化物
の出発原料を塗布後、乾燥または加熱焼き付けし、更に
その後に第二の光触媒の出発原料を塗布後、乾燥または
加熱焼き付けをおこなってもよい。As shown in FIG. 5, titanium oxide is formed on a substrate, and furthermore, island-like or domain-like portions composed of a second photocatalyst, and more chemically adsorbed water than titanium oxide are adsorbed thereon. As a method of manufacturing a member to which an island-shaped portion or a domain-shaped portion made of a metal oxide that can be bonded is manufactured, for example, the following method is available. After the starting material of titanium oxide is applied to the substrate, a thin film of titanium oxide is formed by drying or baking. Further, a coating agent containing a starting material for the second photocatalyst and a starting material for the metal oxide is applied thereon, followed by drying or baking to produce a member as shown in FIG. Further, after forming the titanium oxide thin film, the starting material of the second photocatalyst may be applied, followed by drying or baking, and thereafter, the starting material of the metal oxide may be applied, followed by drying or baking. . Further, after forming the titanium oxide thin film, the starting material of the metal oxide may be applied and then dried or baked, and then the starting material of the second photocatalyst may be applied and then dried or baked. .
【0032】図6に示す様な、基材の上に酸化チタンの
層が形成され、その上に第二の光触媒からなる島状部な
いしドメイン状部が前記酸化チタンの層に接合され、更
にその上に酸化チタンよりも化学吸着水を多く吸着し得
る金属酸化物が形成されている部材を製造する方法とし
て、例えば以下の様な方法がある。酸化チタンの出発原
料を基材に塗布後、乾燥または加熱焼き付けにより、酸
化チタンの薄膜を成膜する。更に酸化チタンの上に第二
の光触媒の出発原料を塗布後、乾燥または加熱焼き付け
をおこない、更にその上に、金属酸化物を含む出発原料
を塗布後、乾燥または加熱焼き付けをおこなって、図6
に示す様な部材を製造することができる。As shown in FIG. 6, a titanium oxide layer is formed on a base material, and an island or domain formed of a second photocatalyst is bonded to the titanium oxide layer. As a method of manufacturing a member on which a metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide is formed, for example, the following method is available. After the starting material of titanium oxide is applied to the substrate, a thin film of titanium oxide is formed by drying or baking. Further, after the starting material of the second photocatalyst is applied onto the titanium oxide, drying or baking is performed. After that, the starting material containing the metal oxide is further applied thereon, and then drying or baking is performed.
Can be manufactured.
【0033】図7に示す様な、基材の上に酸化チタンと
酸化チタンよりも化学吸着水を多く吸着し得る金属酸化
物を含む混合層が形成され、その上に第二の光触媒から
なる島状部ないしドメイン状部が前記混合層に接合され
ている部材を製造する方法として、例えば以下の様な方
法がある。酸化チタンの出発原料と金属酸化物の出発原
料を含むコーティング剤を基材に塗布後、乾燥または加
熱焼き付けにより、酸化チタンと金属酸化物を含む混合
層を成膜する。更にこの上に、第二の光触媒の出発原料
を塗布後、乾燥または加熱焼き付けをおこない、図7に
示す様な部材を製造することができる。As shown in FIG. 7, a mixed layer containing titanium oxide and a metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide is formed on a base material, and a mixed layer comprising a second photocatalyst is formed thereon. As a method of manufacturing a member in which an island portion or a domain portion is joined to the mixed layer, for example, there is the following method. After a coating agent containing a starting material of titanium oxide and a starting material of metal oxide is applied to a substrate, a mixed layer containing titanium oxide and metal oxide is formed by drying or baking. Further, a starting material for the second photocatalyst is applied thereon, followed by drying or baking, whereby a member as shown in FIG. 7 can be manufactured.
【0034】上記いずれの態様においてもコーティング
液の塗布方法として、スピンコーティング、フローコー
ティング、ディップコーティング、スプレーコーティン
グ、ロールコーティング等が好適に使用できる。例え
ば、コーティング液の塗布方法としてスピンコーティン
グ法を選択した場合、基材の回転速度や原料溶液の濃度
によって、第二の光触媒性材料が表面に占める割合を制
御することができる。また、前記の湿式合成法以外に
も、スパッタリング法、CVD法、プラズマCVD法、
イオンプレーティング法、MBE法等を用いても良い。In any of the above embodiments, as a method of applying the coating liquid, spin coating, flow coating, dip coating, spray coating, roll coating, or the like can be suitably used. For example, when the spin coating method is selected as the coating method of the coating liquid, the ratio of the second photocatalytic material to the surface can be controlled by the rotation speed of the substrate and the concentration of the raw material solution. In addition to the above-mentioned wet synthesis method, a sputtering method, a CVD method, a plasma CVD method,
An ion plating method, an MBE method, or the like may be used.
【0035】本発明の好ましい態様においては、基材の
上に酸化チタン薄膜が形成されており、更にその上に酸
化タングステンないしタングステン酸塩からなる島状部
ないしドメイン状部が、前記酸化チタンに接合されてい
る。酸化タングステンないしタングステン酸塩の出発原
料としては、タングステン酸アンモニウム、タングステ
ン酸、酸化タングステン粒子を懸濁したゾル、ペンタエ
トキシタングステン、ペンタメトキシタングステン、ペ
ンタプロポキシタングステン、ペンタブトキシタングス
テン、タングステンキレート、アセテートタングステ
ン、硫酸タングステン、塩化タングステン、水酸化タン
グステンからなる群より選択される少なくとも1種類の
タングステン化合物を含むコーティング液を使用でき
る。酸化タングステンないしタングステン酸塩の出発原
料を酸化チタンに加熱焼き付けする場合、高温の処理を
おこなうと、酸化チタン、酸化タングステンの各成分が
固相拡散し、固溶体を生成してしまうため、光誘起親水
化反応を進行させるためには好ましくない。このため、
酸化タングステンないしタングステン酸塩の出発原料を
焼き付ける温度は、出発原料をタングステン酸アンモニ
ウムとした場合、20℃〜500℃の範囲であることが好ま
しい。In a preferred embodiment of the present invention, a titanium oxide thin film is formed on a base material, and further, an island portion or a domain portion made of tungsten oxide or tungstate is formed on the titanium oxide film. Are joined. Starting materials for tungsten oxide or tungstate include ammonium tungstate, tungstic acid, a sol in which tungsten oxide particles are suspended, pentaethoxytungsten, pentamethoxytungsten, pentapropoxytungsten, pentabutoxytungsten, tungsten chelate, acetate tungsten, A coating solution containing at least one tungsten compound selected from the group consisting of tungsten sulfate, tungsten chloride, and tungsten hydroxide can be used. When the starting material of tungsten oxide or tungstate is heated and baked on titanium oxide, if high-temperature treatment is performed, each component of titanium oxide and tungsten oxide diffuses in a solid phase to form a solid solution. It is not preferable for the reaction to proceed. For this reason,
The temperature at which the starting material of tungsten oxide or tungstate is baked is preferably in the range of 20 ° C. to 500 ° C. when the starting material is ammonium tungstate.
【0036】本発明の更に好ましい態様においては、基
材に酸化チタン薄膜が形成され、更にその上にタングス
テン酸塩ないしアモルファス状の酸化タングステンから
なる島状部ないしドメイン状部が、前記酸化チタンに接
合されている構造を有している。前述したように、低温
の熱処理で製造可能なタングステン酸塩やアモルファス
状の酸化チタンの方が、結晶化した酸化タングステンに
比較して均一に分散可能で、且つ電子、正孔の移動を阻
害してしまう粒界が少ないため、電子−正孔対の電荷分
離効率が高い。出発原料をタングステン酸アンモニウム
とした場合、好適な熱処理は20℃〜350℃の範囲であ
る。In a further preferred aspect of the present invention, a titanium oxide thin film is formed on a base material, and an island portion or a domain portion made of tungstate or amorphous tungsten oxide is further formed on the titanium oxide thin film. It has a joined structure. As described above, tungstate or amorphous titanium oxide that can be produced by low-temperature heat treatment is more uniformly dispersible than crystallized tungsten oxide, and inhibits the movement of electrons and holes. Since there are few grain boundaries, the charge separation efficiency of electron-hole pairs is high. If the starting material is ammonium tungstate, a suitable heat treatment is in the range of 20C to 350C.
【0037】本発明に係る、酸化チタンと第二の光触媒
を励起させるためには、波長が300nm〜450nm
の範囲の光が好適に使用できる。一般に、屋外からの太
陽光が遮断されている場合、蛍光灯や白熱電球等から室
内壁に設置されている物品に対して照射される光は、波
長300nm〜450nmの領域の積算照度が0.1〜
10μW/cm2と見積もられる。In order to excite the titanium oxide and the second photocatalyst according to the present invention, the wavelength is from 300 nm to 450 nm.
The light in the range described above can be suitably used. In general, when sunlight from the outdoors is blocked, light emitted from a fluorescent lamp, an incandescent lamp, or the like to an article installed on an indoor wall has an integrated illuminance of 0.3 to 450 nm in a wavelength range of 300 nm to 450 nm. 1 to
It is estimated to be 10 μW / cm 2 .
【0038】本発明の親水性部材は蛍光灯や白熱電球か
らの光照射により、好適には表面の水との接触角が5°
以下まで高度に親水化し、防曇、防汚、セルフクリーニ
ング効果を発揮する。The hydrophilic member of the present invention preferably has a surface contact angle of 5 ° with light from a fluorescent lamp or an incandescent lamp.
It is highly hydrophilic up to the following and exhibits antifogging, antifouling and self-cleaning effects.
【0039】また、本発明の親水性部材に対して光強度
の強い水銀ランプ、キセノンランプ、水銀−キセノンラ
ンプ、ハロゲンランプ、メタルハライドランプ等からの
光照射や、窓から入射する太陽光および太陽光の散乱光
によって光励起させた場合、前記の様な防曇、防汚、セ
ルフクリーニング効果を発揮することは言うまでもな
い。The hydrophilic member of the present invention is irradiated with light from a mercury lamp, a xenon lamp, a mercury-xenon lamp, a halogen lamp, a metal halide lamp, etc., which has a high light intensity, and sunlight and sunlight entering through a window. It is needless to say that when the light is excited by the scattered light, the above-described anti-fogging, anti-fouling and self-cleaning effects are exhibited.
【0040】本発明における、基材に酸化チタン薄膜が
形成され、更にその上にアモルファス状の酸化タングス
テンないしタングステン酸塩からなる島状部ないしドメ
イン状部が前記酸化チタンに接合された構造の部材は、
驚くべきことに、紫外線照度に換算して1μW/cm2の微
弱な蛍光灯を照射した場合でも、表面が水接触角に換算
して5度以下まで高度に親水化することが可能である。
本発明における親水性部材は、酸化チタンの使用量が少
量でも紫外線量の少ない室内において防曇、防滴、セル
フクリーニング効果が発揮できる。また、前記親水性部
材は実質的に透明で干渉色が無いため、建築外装材や内
装材その他の屋内用部材のいかなる物品にコーティング
してもその意匠性を損ねることはない。In the present invention, a member having a structure in which a titanium oxide thin film is formed on a base material, and an island-shaped or domain-shaped portion made of amorphous tungsten oxide or tungstate is bonded to the titanium oxide. Is
Surprisingly, even when irradiated with a weak fluorescent lamp of 1 μW / cm 2 in terms of ultraviolet illuminance, the surface can be highly hydrophilized to 5 degrees or less in terms of water contact angle.
The hydrophilic member in the present invention can exhibit anti-fogging, drip-proof, and self-cleaning effects in a room with a small amount of ultraviolet light even if the amount of titanium oxide used is small. In addition, since the hydrophilic member is substantially transparent and has no interference color, its design is not impaired even if it is coated on any building exterior material, interior material or other indoor member.
【0041】[0041]
【実施例】実施例1 固形分濃度が10%の酸化チタンコート剤(日本曹達、N
DH510C)をシリカコートしたガラスにディップコ
ート法で成膜した。ディップコートは15cm/分の引
き上げ速度でおこない、コーティングした膜は電気炉中
で500℃、30分間の焼成をおこなった。この工程を
2回繰返して約200nmの膜厚の光触媒性酸化チタン
薄膜を作製した。この薄膜の上に更に、タングステン酸
を25%のアンモニア水に溶解した液をスピンコート法
によってコーティングした。このとき使用したタングス
テン酸の濃度を変化させることによって酸化チタン上の
光触媒性酸化タングステンの担持量が異なる複数の薄膜
を得た。#1試料はタングステン酸をコーティングしな
い光触媒性酸化チタン単体の膜、#2試料はタングステ
ン酸の濃度が溶液総重量に対して固形分比で0.5%、#3
試料はタングステン酸の濃度が1.0%、#4試料はタング
ステン酸の濃度が2.0%となるように成膜した。スピンコ
ートは毎分1500回転の回転速度で10秒間おこな
い、コーティングした膜は電気炉中で300℃、30分
間の焼成をおこなった。X線光電子分光法によって表面
のタングステン原子のチタン原子に対する割合を測定し
た結果、#1試料が0%、#2試料が10%、#3試料が
20%、#4試料が40%であった。X線回折で表面の酸化
タングステンの結晶系を評価した結果、アモルファス状
の光触媒性酸化タングステンであることがわかった。ま
た、原子間力顕微鏡によって表面の組織を観察したとこ
ろ、#2、#3、#4試料において、酸化チタン単体の
#1試料とほとんど相異が無いため、粒径10nm以下の
微粒子状の酸化タングステンが島状ないしドメイン状で
酸化チタン薄膜の上に分布している構造が示唆された。EXAMPLES Example 1 A titanium oxide coating agent having a solid content of 10% (Nippon Soda, N
DH510C) was formed on a silica-coated glass by dip coating. Dip coating was performed at a pulling rate of 15 cm / min, and the coated film was baked in an electric furnace at 500 ° C. for 30 minutes. This process was repeated twice to produce a photocatalytic titanium oxide thin film having a thickness of about 200 nm. A liquid in which tungstic acid was dissolved in 25% aqueous ammonia was coated on the thin film by spin coating. By changing the concentration of tungstic acid used at this time, a plurality of thin films having different loading amounts of the photocatalytic tungsten oxide on the titanium oxide were obtained. The # 1 sample was a film of photocatalytic titanium oxide alone not coated with tungstic acid, and the # 2 sample was 0.5% solid content ratio of tungstic acid to the total weight of the solution, and # 3
The sample was formed such that the concentration of tungstic acid was 1.0%, and the # 4 sample was formed such that the concentration of tungstic acid was 2.0%. The spin coating was performed at a rotation speed of 1500 revolutions per minute for 10 seconds, and the coated film was baked in an electric furnace at 300 ° C. for 30 minutes. As a result of measuring the ratio of tungsten atoms to titanium atoms on the surface by X-ray photoelectron spectroscopy, # 1 sample was 0%, # 2 sample was 10%, and # 3 sample was
20% and # 4 samples were 40%. As a result of evaluating the crystal system of tungsten oxide on the surface by X-ray diffraction, it was found that the tungsten oxide was amorphous photocatalytic tungsten oxide. When the surface structure was observed with an atomic force microscope, the samples # 2, # 3, and # 4 showed almost no difference from the sample # 1 of titanium oxide alone. This suggests a structure in which tungsten is distributed in the form of islands or domains on the titanium oxide thin film.
【0042】作製した薄膜の表面の水との接触角が安定
するまで暗所に保管した後、白色蛍光灯の照射をおこな
い、表面の水との接触角の変化を測定した。白色蛍光灯
は、10W(東芝ライテック、FL10N)を用いて、
紫外線照度は薄膜表面部分において、紫外線照度計(ウ
シオ電機、UVR−2)で10μW/cm2および3μW/cm
2となるように設定した。水との接触角は接触角測定器
(協和界面科学、CA−X150)により、マイクロシ
リンジから水滴を滴下して求めた。The contact angle of water on the surface of the prepared thin film is stable
After storage in a dark place, irradiate with white fluorescent light.
The change in the contact angle of the surface with water was measured. White fluorescent light
Uses 10W (Toshiba Lighting Tech, FL10N)
The UV illuminance is measured at the UV illuminometer (C)
10μW / cm with Shio Electric, UVR-2)TwoAnd 3μW / cm
TwoIt was set to be. The contact angle with water is a contact angle measuring instrument
(Kyowa Interface Science, CA-X150)
It was determined by dropping a water drop from a syringe.
【0043】紫外線照度が10μW/cm2の場合の水との接
触角の変化を図8に示す。光触媒性酸化チタン単体の#
1試料は水との接触角に換算して12度までしか親水化し
なかったが、光触媒性材料酸化チタン薄膜の上に光触媒
性酸化タングステンからなる島状部ないしドメイン状部
を接合させた#2〜#4試料において、酸化チタン単体
の#1試料よりも親水化感度が向上し、水との接触角に
換算して0°まで高度に親水化した。また、紫外線照度
が3μW/cm2の場合の結果を図9に示したが、酸化チタ
ン単体の#1試料ではほとんど親水化しないのに対し、
表面におけるタングステン原子のチタン原子に対する割
合が10%の#2試料、および20%の#3試料では水との
接触角が5°以下まで高度に親水化した。表面のタング
ステン原子の割合が40%の#4試料では親水化が認めら
れたものの、#2、#3試料よりも親水化速度が遅くな
り、水との接触角に換算して8度以下には減少しなかっ
た。FIG. 8 shows the change in the contact angle with water when the UV illuminance is 10 μW / cm 2 . Photocatalytic titanium oxide simple substance #
One sample was hydrophilized only up to 12 degrees in terms of the contact angle with water, but an island or domain made of photocatalytic tungsten oxide was joined to a photocatalytic material titanium oxide thin film. Samples # 4 to # 4 had higher sensitivity to hydrophilization than # 1 sample of titanium oxide alone, and were highly hydrophilized to 0 ° in terms of the contact angle with water. FIG. 9 shows the results when the UV illuminance was 3 μW / cm 2 , whereas the titanium oxide alone # 1 sample hardly hydrophilized.
The # 2 sample in which the ratio of tungsten atoms to titanium atoms on the surface was 10% and the # 3 sample in which the ratio was 20% were highly hydrophilized to a contact angle with water of 5 ° or less. Although the hydrophilicity was observed in the # 4 sample in which the ratio of tungsten atoms on the surface was 40%, the rate of hydrophilization was slower than in the # 2 and # 3 samples, and the contact angle with water was reduced to 8 degrees or less. Did not decrease.
【0044】実施例2 固形分濃度が10%の酸化チタンコート剤(日本曹達、N
DH510C)をシリカコートしたガラスにディップコ
ート法で成膜した。作製方法は実施例1と同様である。
この薄膜の上に更に、タングステン酸を25%のアンモ
ニア水に溶解した液をスピンコート法によってコーティ
ングした。このとき使用したタングステン酸の濃度につ
いて、#5試料はタングステン酸をコーティングしない
光触媒性酸化チタン単体の膜、#6試料はタングステン
酸の濃度が溶液総重量に対して固形分比で1.0%、#7試
料はタングステン酸の濃度が2.0%、#8試料はタングス
テン酸の濃度が5.0%となるように成膜した。スピンコー
トは毎分1500回転の回転速度で10秒間おこない、
コーティングした膜は電気炉中で100℃、30分間の
焼成をおこなった。X線光電子分光法によって表面のタ
ングステン原子のチタン原子に対する割合を測定した結
果、#5試料が0%、#6試料が20%、#7試料が40
%、#8試料が100%であった。X線回折で表面の光触
媒性酸化タングステンの結晶系を評価した結果、タング
ステン酸アンモニウムであることがわかった。また、原
子間力顕微鏡によって表面の組織を観察したところ、#
6、#7試料において、酸化チタン単体の#5試料とほ
とんど相異が無いため、粒径10nm以下の微粒子状のタ
ングステン酸アンモニウムからなる島状部ないしドメイ
ン状部が分布している構造が示唆されたが、#8試料に
おいてはタングステン酸アンモニウムが酸化チタンを完
全に覆っている様な構造が観測された。Example 2 A titanium oxide coating agent having a solid content of 10% (Nippon Soda, N
DH510C) was formed on a silica-coated glass by dip coating. The manufacturing method is the same as that of the first embodiment.
A liquid in which tungstic acid was dissolved in 25% aqueous ammonia was coated on the thin film by spin coating. Regarding the concentration of tungstic acid used at this time, the # 5 sample was a film of a photocatalytic titanium oxide alone not coated with tungstic acid, and the # 6 sample was a sample in which the concentration of tungstic acid was 1.0% as a solid content relative to the total weight of the solution. Seven samples were formed such that the concentration of tungstic acid was 2.0%, and the # 8 sample was formed such that the concentration of tungstic acid was 5.0%. Spin coating is performed at 1500 rpm for 10 seconds.
The coated film was fired in an electric furnace at 100 ° C. for 30 minutes. As a result of measuring the ratio of tungsten atoms to titanium atoms on the surface by X-ray photoelectron spectroscopy, the sample # 5 was 0%, the sample # 6 was 20%, and the sample # 7 was 40%.
%, # 8 sample was 100%. As a result of evaluating the crystal system of the photocatalytic tungsten oxide on the surface by X-ray diffraction, it was found to be ammonium tungstate. When the surface structure was observed with an atomic force microscope,
6, # 7 sample has almost no difference from # 5 sample of titanium oxide alone, suggesting a structure in which islands or domains consisting of fine particles of ammonium tungstate having a particle size of 10 nm or less are distributed. However, in sample # 8, a structure was observed in which ammonium tungstate completely covered titanium oxide.
【0045】作製した薄膜の表面の水との接触角が安定
するまで暗所に保管した後、白色蛍光灯の照射をおこな
い、表面の水との接触角の変化を測定した。白色蛍光灯
は、10W(東芝ライテック、FL10N)を用いて、
紫外線照度は薄膜表面部分において、紫外線照度計(ウ
シオ電機、UVR−2)で10μW/cm2となるように設
定した。水との接触角は接触角測定器(協和界面科学、
CA−X150)により、マイクロシリンジから水滴を
滴下して求めた。The thin film was stored in a dark place until the contact angle with water on the surface of the thin film became stable, and then irradiated with a white fluorescent lamp to measure the change in the contact angle with water on the surface. The white fluorescent lamp uses 10W (Toshiba Lighting & Technology, FL10N),
The ultraviolet illuminance was set to 10 μW / cm 2 with an ultraviolet illuminometer (Ushio, UVR-2) on the surface of the thin film. The contact angle with water is measured using a contact angle measuring device (Kyowa Interface Science,
CA-X150) to determine a water drop from a microsyringe.
【0046】その結果、図10に示すように、#5の光
触媒性酸化チタン単体の膜は水との接触角に換算して約
10度までしか親水化しなかったが、タングステン酸アン
モニウムが酸化チタン上に島状に分布した構造の#6、
#7試料では酸化チタン単体の#6試料よりも親水化感
度が向上し、水との接触角に換算して0°まで高度に親
水化した。しかし、タングステン酸アンモニウムによっ
て酸化チタンが完全に覆われている#8試料では全く親
水化しなかった。As a result, as shown in FIG. 10, the film of the photocatalytic titanium oxide alone of # 5 was converted to a contact angle with water of about 5%.
Although it was only hydrophilized up to 10 degrees, the structure where ammonium tungstate was distributed in an island shape on titanium oxide,
The # 7 sample had a higher hydrophilicity sensitivity than the # 6 sample of titanium oxide alone, and was highly hydrophilized to 0 ° in terms of the contact angle with water. However, the sample # 8 in which the titanium oxide was completely covered with ammonium tungstate did not become hydrophilic at all.
【0047】実施例3 固形分濃度が10%の酸化チタンコート剤(日本曹達、N
DH510C)をシリカコートしたガラスにディップコ
ート法で成膜した。作製方法は実施例1と同様である。
この薄膜の上に更に、タングステン酸を25%のアンモ
ニア水に溶解した液をスピンコート法(毎分1500回
転の回転速度で10秒間)によってコーティングした。
このとき使用したタングステン酸の濃度を1.0%として、
焼成温度を変化させて複数の試料を作製した。#9試料
はタングステン酸をコーティングしない光触媒性酸化チ
タン単体の膜、#10試料はタングステン酸をコーティ
ング後の焼成温度が100℃、#11試料は300℃、#12
試料は350℃、#13試料は500℃となるように成膜し
た。X線回折で表面の光触媒性酸化タングステンの結晶
系を評価した結果、#10試料がタングステン酸アンモ
ニウム、#11試料がアモルファス状の酸化タングステ
ン、#12試料がアモルファス状の酸化タングステンと
結晶化した光触媒性酸化タングステンの複合相、#13
試料が結晶化した光触媒性酸化タングステンであること
がわかった。X線光電子分光法によって表面のタングス
テン原子のチタン原子に対する割合を測定した結果、#
9試料は0%で、#10〜#13試料は20%であった。
また、原子間力顕微鏡によって表面の組織を観察したと
ころ、#10〜#13試料において、酸化チタン単体の
#9試料とほとんど相異が無いため、粒径10nm以下の
微粒子状のタングステン化合物が酸化チタン上に島状な
いしドメイン状で分布している構造が示唆された。Example 3 A titanium oxide coating agent having a solid content of 10% (Nippon Soda, N
DH510C) was formed on a silica-coated glass by dip coating. The manufacturing method is the same as that of the first embodiment.
A liquid in which tungstic acid was dissolved in 25% aqueous ammonia was further coated on the thin film by spin coating (at a rotation speed of 1500 rotations per minute for 10 seconds).
Assuming that the concentration of tungstic acid used at this time is 1.0%,
A plurality of samples were prepared by changing the firing temperature. The # 9 sample was a film of a photocatalytic titanium oxide alone not coated with tungstic acid, the # 10 sample was a firing temperature of 100 ° C. after coating with tungstic acid, the # 11 sample was 300 ° C., and the # 12 sample was # 12.
The sample was formed at 350 ° C., and the # 13 sample was formed at 500 ° C. The crystal system of the photocatalytic tungsten oxide on the surface was evaluated by X-ray diffraction. Tungsten oxide composite phase, # 13
The sample was found to be crystallized photocatalytic tungsten oxide. As a result of measuring the ratio of tungsten atoms to titanium atoms on the surface by X-ray photoelectron spectroscopy, #
Nine samples were 0% and # 10 to # 13 samples were 20%.
When the surface structure was observed with an atomic force microscope, the samples # 10 to # 13 showed almost no difference from the sample # 9 of titanium oxide alone, so the fine particle tungsten compound having a particle size of 10 nm or less was oxidized. This suggests a structure distributed in islands or domains on titanium.
【0048】作製した薄膜の表面の水との接触角が安定
するまで暗所に保管した後、白色蛍光灯の照射をおこな
い、表面の水との接触角の変化を測定した。白色蛍光灯
は、10W(東芝ライテック、FL10N)を用いて、
紫外線照度は薄膜表面部分において、紫外線照度計(ウ
シオ電機、UVR−2)で3μW/cm2となるように設定
した。水との接触角は接触角測定器(協和界面科学、C
A−X150)により、マイクロシリンジから水滴を滴
下して求めた。The thin film thus prepared was stored in a dark place until the contact angle with water on the surface became stable, and then irradiated with a white fluorescent lamp to measure the change in the contact angle with water on the surface. The white fluorescent lamp uses 10W (Toshiba Lighting & Technology, FL10N),
The ultraviolet illuminance was set to 3 μW / cm 2 with an ultraviolet illuminometer (Ushio, UVR-2) on the surface of the thin film. The contact angle with water can be measured with a contact angle measuring instrument (Kyowa Interface Science, C
AX150) to determine the drop of water from a microsyringe.
【0049】照度3μW/cm2の場合の結果を図11に示
す。この結果、酸化チタンにタングステン化合物を接合
させた#10〜#13試料において、酸化チタン単体の
#9試料よりも親水化速度が速くなったが、特に、熱処
理温度が100℃の場合のタングステン酸アンモニウム
を複合させた#10試料および熱処理温度が300℃の
場合のアモルファス状の酸化タングステンを複合させた
#11試料の親水化速度が最も速かった。350℃以上の
熱処理による酸化タングステンの結晶化にともない、酸
化タングステン粒子内に粒界が生成したと考えられる#
12および#13試料は、酸化チタン単体の#9試料よ
りは親水化が速いが、#10および#11試料よりも親
水化が遅かった。FIG. 11 shows the results when the illuminance is 3 μW / cm 2 . As a result, in the samples # 10 to # 13 in which the tungsten compound was bonded to the titanium oxide, the hydrophilization rate was faster than in the sample # 9 of titanium oxide alone. The # 10 sample combined with ammonium and the # 11 sample combined with amorphous tungsten oxide when the heat treatment temperature was 300 ° C. had the highest hydrophilization rate. It is considered that grain boundaries were formed in the tungsten oxide particles due to the crystallization of tungsten oxide by heat treatment at 350 ° C or higher.
The 12 and # 13 samples had a faster hydrophilicity than the # 9 sample of titanium oxide alone, but were slower than the # 10 and # 11 samples.
【0050】実施例4 水系の酸化チタンゾル(石原産業、STS21)を固形分濃
度が8%になるまで純水で希釈しシリカコートしたガラ
スにスピンコート法で成膜後、マッフル炉によって500
度、30分の焼成をおこなった。スピンコートは毎分1500
回転で10秒間おこなった。この薄膜の上に更に、タング
ステン酸を25%のアンモニア水に溶解した液をスピン
コート法(毎分1500回転の回転速度で10秒間)に
よってコーティングした。このとき使用したタングステ
ン酸の濃度を1.0%として、焼成温度を変化させて複数の
試料を作製した。#14試料はタングステン酸をコーテ
ィングしない光触媒性酸化チタン単体の膜、#15試料
はタングステン酸をコーティング後の焼成温度が100
℃、#16試料は300℃となるように成膜した。X線回
折で表面の光触媒性酸化タングステンの結晶系を評価し
た結果、#15試料はタングステン酸アンモニウム、#
16試料はアモルファス状の酸化タングステンであるこ
とがわかった。X線光電子分光法によって表面のタング
ステン原子のチタン原子に対する割合を測定した結果、
#14試料は0%で、#15、#16試料は20%であっ
た。また、原子間力顕微鏡によって表面の組織を観察し
たところ、#15、#16試料において、酸化チタン単
体の#14試料とほとんど相異が無いため、粒径10nm
以下の微粒子状のタングステン化合物が酸化チタン上に
島状ないしドメイン状で分布している構造が示唆され
た。Example 4 A water-based titanium oxide sol (STS21, Ishihara Sangyo) was diluted with pure water until the solid content concentration became 8%, formed into a film on a silica-coated glass by a spin coating method, and then subjected to a 500 muffle furnace.
Firing was performed for 30 minutes. Spin coating at 1500 per minute
The rotation was performed for 10 seconds. A liquid in which tungstic acid was dissolved in 25% aqueous ammonia was further coated on the thin film by spin coating (at a rotation speed of 1500 rotations per minute for 10 seconds). At this time, the concentration of the tungstic acid used was set to 1.0%, and the firing temperature was changed to prepare a plurality of samples. The # 14 sample was a film of a photocatalytic titanium oxide alone not coated with tungstic acid, and the # 15 sample had a firing temperature of 100 after coating with tungstic acid.
Sample # 16 was formed to a temperature of 300 ° C. As a result of evaluating the crystal system of the photocatalytic tungsten oxide on the surface by X-ray diffraction, the # 15 sample was ammonium tungstate,
16 samples were found to be amorphous tungsten oxide. As a result of measuring the ratio of tungsten atoms to titanium atoms on the surface by X-ray photoelectron spectroscopy,
The # 14 sample was 0%, and the # 15 and # 16 samples were 20%. When the surface structure was observed with an atomic force microscope, it was found that the # 15 and # 16 samples had almost no difference from the # 14 sample of titanium oxide alone.
It was suggested that the following fine particles of the tungsten compound were distributed in the form of islands or domains on titanium oxide.
【0051】作製した薄膜の表面の水との接触角が安定
するまで暗所に保管した後、白色蛍光灯の照射をおこな
い、表面の水との接触角の変化を測定した。白色蛍光灯
は、10W(東芝ライテック、FL10N)を用いて、
紫外線照度は薄膜表面部分において、紫外線照度計(ウ
シオ電機、UVR−2)で1μW/cm2となるように設定
した。水との接触角は接触角測定器(協和界面科学、C
A−X150)により、マイクロシリンジから水滴を滴
下して求めた。The thin film thus prepared was stored in a dark place until the contact angle with water on the surface became stable, and then irradiated with a white fluorescent lamp, and the change in the contact angle with water on the surface was measured. The white fluorescent lamp uses 10W (Toshiba Lighting & Technology, FL10N),
The ultraviolet illuminance was set to 1 μW / cm 2 with an ultraviolet illuminometer (Ushio, UVR-2) on the surface of the thin film. The contact angle with water can be measured with a contact angle measuring instrument (Kyowa Interface Science, C
AX150) to determine the drop of water from a microsyringe.
【0052】この結果、図12に示すように、#14の
光触媒性酸化チタン単体の膜では水接触角に換算して10
度以下には親水化しなかったが、タングステン化合物が
酸化チタン上に島状で分布している#15、#16試料
は紫外線照度1μW/cm2の微弱な光照射によって水接触
角に換算して1度まで高度に親水化した。As a result, as shown in FIG. 12, the film of the photocatalytic titanium oxide alone of # 14 had a water contact angle of 10%.
Although the sample was not hydrophilized below the temperature, the tungsten compounds were distributed in the form of islands on the titanium oxide. The samples # 15 and # 16 were converted to water contact angles by irradiating weak light with an ultraviolet illuminance of 1 μW / cm 2. Highly hydrophilic up to 1 degree.
【0053】実施例5 光触媒性酸化チタンとシリカが含有されている光触媒防
曇性フィルム(東陶機器、ハイドロテクトミラーフィル
ム)をガラス上に貼付し、この上に、タングステン酸を
25%のアンモニア水に溶解した液をスピンコート法
(毎分1500回転の回転速度で10秒間)によってコ
ーティングし、100℃で30分間乾燥した。このとき
使用したタングステン酸の濃度を1.0%とした。X線
回折で表面の光触媒性酸化タングステンの結晶系を評価
した結果、タングステン酸アンモニウムであることがわ
かった。X線光電子分光法によって測定した表面のタン
グステン原子の占める割合は20%であった。また、原子
間力顕微鏡によって表面の組織を観察したところ、タン
グステン酸アンモニウムをコーティングしない膜と同様
の組織を示したため、粒径10nm以下のタングステン
酸アンモニウムの微粒子が酸化チタンおよびシリカ上に
島状ないしドメイン状で分布している構造が示唆され
た。Example 5 A photocatalytic anti-fogging film containing photocatalytic titanium oxide and silica (Totoku Kikai Co., Ltd., Hydrotectomirror film) was stuck on glass, and tungstic acid was added with 25% aqueous ammonia. Was coated by a spin coating method (rotation speed of 1500 rpm for 10 seconds) and dried at 100 ° C. for 30 minutes. The concentration of tungstic acid used at this time was 1.0%. As a result of evaluating the crystal system of the photocatalytic tungsten oxide on the surface by X-ray diffraction, it was found to be ammonium tungstate. The proportion of tungsten atoms on the surface measured by X-ray photoelectron spectroscopy was 20%. When the surface structure was observed with an atomic force microscope, the structure was similar to that of the film not coated with ammonium tungstate. Therefore, fine particles of ammonium tungstate having a particle size of 10 nm or less were not formed on the titanium oxide and silica in an island form. This suggests a domain-like structure.
【0054】作製した薄膜の表面の水との接触角が安定
するまで暗所に保管した後、白色蛍光灯の照射をおこな
い、表面の水との接触角の変化を測定した。白色蛍光灯
は、10W(東芝ライテック、FL10N)を用いて、
紫外線照度は薄膜表面部分において、紫外線照度計(ウ
シオ電機、UVR−2)で10μW/cm2となるように設
定した。水との接触角は接触角測定器(協和界面科学、
CA−X150)により、マイクロシリンジから水滴を
滴下して求めた。The prepared thin film was stored in a dark place until the contact angle with water on the surface became stable, and then irradiated with a white fluorescent lamp to measure the change in the contact angle with water on the surface. The white fluorescent lamp uses 10W (Toshiba Lighting & Technology, FL10N),
The ultraviolet illuminance was set to 10 μW / cm 2 with an ultraviolet illuminometer (Ushio, UVR-2) on the surface of the thin film. The contact angle with water is measured using a contact angle measuring device (Kyowa Interface Science,
CA-X150) to determine a water drop from a microsyringe.
【0055】この結果、図13に示すように、光触媒性
酸化チタンとシリカが複合された防曇性フィルムに更に
光触媒性タングステン酸塩からなる島状部ないしドメイ
ン状部を接合させた場合において、紫外線照度10μW/cm
2の光照射によって、表面が水接触角に換算して5度以
下まで高度に親水化した。As a result, as shown in FIG. 13, when an island portion or a domain portion made of a photocatalytic tungstate is further joined to an antifogging film in which a photocatalytic titanium oxide and silica are combined, UV illumination 10μW / cm
By the light irradiation of 2 , the surface was highly hydrophilized to a water contact angle of 5 degrees or less.
【0056】実施例6 固形分濃度が10%の酸化チタンコート剤(日本曹達、N
DH510C)をシリカコートしたガラスにディップコ
ート法で成膜した。ディップコートは15cm/分の引
き上げ速度でおこない、コーティングした膜は電気炉中
で500℃、30分間の焼成をおこなった。この工程を
2回繰返して約200nmの膜厚の光触媒性酸化チタン
薄膜を作製した。この薄膜の上に更に、タングステン酸
を25%のアンモニア水に溶解した液をスピンコート法
によってコーティングした。このとき使用したタングス
テン酸の濃度を1.0%とし、スピンコートは毎分1500
回転の回転速度で10秒間おこない、コーティングした
膜は電気炉中で300℃、30分間の焼成をおこなっ
た。更にこの上に、コロイダルシリカ(日産化学、ST-O
S)を固形分濃度0.05%になるように純水で希釈した液を
スピンコート法によって成膜後、乾燥して固化させた。
スピンコートは毎分1500回転の回転速度で10秒間
おこない、コーティングした膜は電気炉中で150℃、
30分の乾燥をおこなった。X線光電子分光法によって
表面のタングステン原子およびケイ素原子のチタン原子
に対する割合を測定した結果、タングステン原子が20
%、ケイ素原子が40%であった。X線回折で酸化タン
グステンの結晶系を評価した結果、アモルファス状の光
触媒性酸化タングステンであることがわかった。Example 6 A titanium oxide coating agent having a solid content of 10% (Nippon Soda, N
DH510C) was formed on a silica-coated glass by dip coating. Dip coating was performed at a pulling rate of 15 cm / min, and the coated film was baked in an electric furnace at 500 ° C. for 30 minutes. This process was repeated twice to produce a photocatalytic titanium oxide thin film having a thickness of about 200 nm. A liquid in which tungstic acid was dissolved in 25% aqueous ammonia was coated on the thin film by spin coating. The concentration of tungstic acid used at this time was set to 1.0%, and spin coating was performed at 1500 per minute.
The rotation was performed for 10 seconds at a rotation speed, and the coated film was fired in an electric furnace at 300 ° C. for 30 minutes. On top of this, colloidal silica (Nissan Chemical, ST-O
A liquid obtained by diluting S) with pure water so as to have a solid concentration of 0.05% was formed into a film by a spin coating method, and then dried and solidified.
Spin coating is performed at a rotation speed of 1500 rpm for 10 seconds, and the coated film is heated at 150 ° C. in an electric furnace.
Drying was performed for 30 minutes. The ratio of tungsten atoms and silicon atoms to titanium atoms on the surface was measured by X-ray photoelectron spectroscopy.
% And silicon atoms were 40%. As a result of evaluating the crystal system of tungsten oxide by X-ray diffraction, it was found that the tungsten oxide was amorphous photocatalytic tungsten oxide.
【0057】作製した薄膜を清浄な暗所に保管した場合
の表面の水との接触角変化を測定した。水との接触角は
接触角測定器(協和界面科学、CA−X150)によ
り、マイクロシリンジから水滴を滴下して求めた。The change in contact angle with water on the surface when the prepared thin film was stored in a clean dark place was measured. The contact angle with water was determined by dropping a water drop from a micro syringe using a contact angle measuring device (Kyowa Interface Science, CA-X150).
【0058】清浄な暗所における水との接触角の変化を
図14に示す。光触媒性酸化チタンの上にアモルファス
状の酸化タングステンからなる島状部ないしドメイン状
部が接合された部材の表面に、更にシリカを形成させた
試料において、1000時間もの長期間の間、水との接
触角が5度以下を維持していた。FIG. 14 shows the change in the contact angle with water in a clean dark place. A sample formed by further forming silica on the surface of a member in which an amorphous tungsten oxide island-like or domain-like portion is bonded on photocatalytic titanium oxide is used for a long period of 1000 hours. The contact angle was maintained at 5 degrees or less.
【0059】実施例7 固形分濃度が10%の酸化チタンコート剤(日本曹達、N
DH510C)をシリカコートしたガラスにディップコ
ート法で成膜した。ディップコートは15cm/分の引
き上げ速度でおこない、コーティングした膜は電気炉中
で500℃、30分間の焼成をおこなった。この工程を
2回繰返して約200nmの膜厚の光触媒性酸化チタン
薄膜を作製した。この薄膜の上に更に、酸化スズゾル
(多木化学、S-8)を純水で希釈した液をスピンコート
法によってコーティングした。このとき、酸化スズゾル
の濃度を変化させることによって酸化チタン上の光触媒
性酸化スズの担持量が異なる複数の薄膜を得た。#17
試料は酸化スズゾルをコーティングしない光触媒性酸化
チタン単体の膜、#18試料は酸化スズの濃度が溶液総
重量に対して固形分比で0.1%、#19試料はタングステ
ン酸の濃度が0.2%となるように成膜した。スピンコート
は毎分1500回転の回転速度で10秒間おこない、コ
ーティングした膜は電気炉中で500℃、30分間の焼
成をおこなった。X線回折で表面の酸化スズの結晶系を
評価した結果、ルチル型の結晶構造であった。また、該
薄膜における光触媒性酸化スズは、酸化チタン薄膜の上
に島状部ないしドメイン状部として存在していると考え
られる。Example 7 Titanium oxide coating agent having a solid content of 10% (Nippon Soda, N
DH510C) was formed on a silica-coated glass by dip coating. Dip coating was performed at a pulling rate of 15 cm / min, and the coated film was baked in an electric furnace at 500 ° C. for 30 minutes. This process was repeated twice to produce a photocatalytic titanium oxide thin film having a thickness of about 200 nm. A solution obtained by diluting tin oxide sol (Taki Kagaku, S-8) with pure water was further coated on the thin film by spin coating. At this time, by changing the concentration of the tin oxide sol, a plurality of thin films having different loading amounts of the photocatalytic tin oxide on the titanium oxide were obtained. # 17
The sample is a film of a photocatalytic titanium oxide alone not coated with a tin oxide sol, the # 18 sample has a tin oxide concentration of 0.1% by solid content ratio based on the total weight of the solution, and the # 19 sample has a tungstic acid concentration of 0.2%. The film was formed as follows. The spin coating was performed at a rotation speed of 1500 revolutions per minute for 10 seconds, and the coated film was baked at 500 ° C. for 30 minutes in an electric furnace. As a result of evaluating the crystal system of tin oxide on the surface by X-ray diffraction, a rutile-type crystal structure was obtained. Further, it is considered that the photocatalytic tin oxide in the thin film exists as an island or a domain on the titanium oxide thin film.
【0060】作製した薄膜の表面の水との接触角が安定
するまで暗所に保管した後、白色蛍光灯の照射をおこな
い、表面の水との接触角の変化を測定した。白色蛍光灯
は、10W(東芝ライテック、FL10N)を用いて、
紫外線照度は薄膜表面部分において、紫外線照度計(ウ
シオ電機、UVR−2)で10μW/cm2となるように設
定した。水との接触角は接触角測定器(協和界面科学、
CA−X150)により、マイクロシリンジから水滴を
滴下して求めた。The thin film thus prepared was stored in a dark place until the contact angle with water on the surface became stable, and then irradiated with a white fluorescent lamp to measure the change in the contact angle with water on the surface. The white fluorescent lamp uses 10W (Toshiba Lighting & Technology, FL10N),
The ultraviolet illuminance was set to 10 μW / cm 2 with an ultraviolet illuminometer (Ushio, UVR-2) on the surface of the thin film. The contact angle with water is measured using a contact angle measuring device (Kyowa Interface Science,
CA-X150) to determine a water drop from a microsyringe.
【0061】紫外線照度が10μW/cm2の場合の水との接
触角の変化を図15に示す。光触媒性酸化チタン単体の
#17試料は水との接触角に換算して12度までしか親水
化しなかったが、光触媒性材料酸化チタン薄膜の上に光
触媒性酸化スズからなる島状部ないしドメイン状部を接
合させた#18、#19試料において、酸化チタン単体
の#17試料よりも親水化感度が向上した。FIG. 15 shows the change in the contact angle with water when the UV illuminance is 10 μW / cm 2 . The # 17 sample of the photocatalytic titanium oxide alone was hydrophilized only up to 12 degrees in terms of the contact angle with water, but an island or domain composed of photocatalytic tin oxide was placed on the photocatalytic material titanium oxide thin film. In the # 18 and # 19 samples in which the portions were joined, the hydrophilicity-improving sensitivity was improved as compared with the # 17 sample of titanium oxide alone.
【0062】[0062]
【発明の効果】本発明によれば、少量の酸化チタンで
も、室内照明レベルの微弱な光に応じて表面の親水化反
応を実用レベルで生じ得る部材を提供することが可能と
なる。According to the present invention, it is possible to provide a member capable of causing a surface-hydrophilizing reaction at a practical level in response to weak light at an indoor lighting level even with a small amount of titanium oxide.
【図1】 本発明の酸化チタンと第二の光触媒の双方を
光励起した場合の電荷移動プロセスを説明する図。FIG. 1 is a diagram illustrating a charge transfer process when both titanium oxide and a second photocatalyst of the present invention are photoexcited.
【図2】 本発明の第二の光触媒を光励起した場合の電
荷移動プロセスを説明する図。FIG. 2 is a view for explaining a charge transfer process when a second photocatalyst of the present invention is photoexcited.
【図3】 本発明の光触媒性酸化チタンを光励起した場
合の電荷移動プロセスを説明する図。FIG. 3 is a diagram illustrating a charge transfer process when the photocatalytic titanium oxide of the present invention is photoexcited.
【図4】 本発明の一実施態様を示す図。FIG. 4 is a diagram showing one embodiment of the present invention.
【図5】 本発明の他の実施態様を示す図。FIG. 5 is a diagram showing another embodiment of the present invention.
【図6】 本発明の他の実施態様を示す図。FIG. 6 is a diagram showing another embodiment of the present invention.
【図7】 本発明の他の実施態様を示す図。FIG. 7 is a diagram showing another embodiment of the present invention.
【図8】 本発明の実施例1に係る、紫外線照度が10
μW/cm2の場合の試料表面の水との接触角と光照射時
間の関係を示す図。FIG. 8 shows an ultraviolet illuminance of 10 according to the first embodiment of the present invention.
diagram showing the relationship between contact angle and the light irradiation time with water of the specimen surface in the case of μW / cm 2.
【図9】 本発明の実施例1に係る、紫外線照度が3μ
W/cm2の場合の試料表面の水との接触角と光照射時間
の関係を示す図。FIG. 9 shows that the ultraviolet illuminance is 3 μm according to the first embodiment of the present invention.
FIG. 9 is a graph showing the relationship between the contact angle of the sample surface with water and the light irradiation time at W / cm 2 .
【図10】 本発明の実施例2に係る試料表面の水との
接触角と光照射時間の関係を示す図。FIG. 10 is a diagram showing a relationship between a contact angle of a sample surface with water and a light irradiation time according to a second embodiment of the present invention.
【図11】 本発明の実施例3に係る試料表面の水との
接触角と光照射時間の関係を示す図。FIG. 11 is a diagram showing a relationship between a contact angle of a sample surface with water and a light irradiation time according to a third embodiment of the present invention.
【図12】 本発明の実施例4に係る試料表面の水との
接触角と光照射時間の関係を示す図。FIG. 12 is a diagram illustrating a relationship between a contact angle of a sample surface with water and a light irradiation time according to a fourth embodiment of the present invention.
【図13】 本発明の実施例5に係る試料表面の水との
接触角と光照射時間の関係を示す図。FIG. 13 is a diagram showing a relationship between a contact angle of a sample surface with water and a light irradiation time according to a fifth embodiment of the present invention.
【図14】 本発明の実施例6に係る試料表面の水との
接触角と暗所での保管時間の関係を示す図。FIG. 14 is a diagram showing a relationship between a contact angle of a sample surface with water and a storage time in a dark place according to Example 6 of the present invention.
【図15】 本発明の実施例7に係る試料表面の水との
接触角と光照射時間の関係を示す図。FIG. 15 is a diagram illustrating a relationship between a contact angle of a sample surface with water and a light irradiation time according to a seventh embodiment of the present invention.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // C03C 17/34 C03C 17/34 Z (72)発明者 渡部 俊也 神奈川県藤沢市鵠沼海岸6丁目15番7号 Fターム(参考) 4F100 AA17B AA17C AA21B AA28C AA33C AG00 AH03 AT00A BA03 BA07 BA10A BA10C DE01B EH46 EJ42 EJ48 GB07 GB08 GB32 GB76 JA12C JB05 JG10C JL06 JL08B JL08C JN01C YY00B YY00C 4G059 AA01 AC21 GA01 GA05 GA12 4G069 AA03 AA08 BA02B BA04A BA04B BA48A BB04A BB04B BB20A BB20C BC22A BC22B BC60A BC60B BC60C BE17B CD10 DA05 EA08 EB15X EB15Y EB18X EB18Y EC22Y EC26 EC27 EC30 ED02 ED04 EE01 EE06 FA01 FA03 FB02 FB23 FC02 FC07 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) // C03C 17/34 C03C 17/34 Z (72) Inventor Toshiya Watanabe 6-15 Kugenuma Coast, Fujisawa City, Kanagawa Prefecture No. 7 F-term (reference) 4F100 AA17B AA17C AA21B AA28C AA33C AG00 AH03 AT00A BA03 BA07 BA10A BA10C DE01B EH46 EJ42 EJ48 GB07 GB08 GB32 GB76 JA12C JB05 JG10C JL06 JL08B JL08CJ0A01A01A BA48A BB04A BB04B BB20A BB20C BC22A BC22B BC60A BC60B BC60C BE17B CD10 DA05 EA08 EB15X EB15Y EB18X EB18Y EC22Y EC26 EC27 EC30 ED02 ED04 EE01 EE06 FA01 FA03 FB02 FB23 FC02 FC07
Claims (17)
らなり、該被膜は前記基材の表面に形成された光触媒性
酸化チタン粒子を含む層と、更にその上に酸化チタン以
外の第二の光触媒性材料からなる島状部ないしドメイン
状部からなり、前記光触媒性酸化チタン粒子の少なくと
も一部と、前記第二の光触媒の少なくとも一部が接合さ
れてあって、前記光触媒性酸化チタンを含む層のうち少
なくとも一部が外気中の水分と接触可能な状態で存在
し、前記第二の光触媒性材料の伝導帯の下端のポテンシ
ャルが、pH=7のときの対標準水素電極電位に換算し
て0Vよりも正であり、前記第二の光触媒性材料の価電
子帯の上端のポテンシャルが、pH=7のときの対標準
水素電極電位に換算して+2.7Vよりも正であって、
前記光触媒性酸化チタン及び第二の光触媒性材料の少な
くとも一方には、その光触媒性材料を光励起できる波長
の光が到達し得ることを特徴とする親水性部材。1. A substrate comprising a substrate and a film formed on the surface of the substrate, wherein the film comprises a layer containing photocatalytic titanium oxide particles formed on the surface of the substrate, and a layer other than titanium oxide on the layer. Consisting of island-shaped or domain-shaped portions made of the second photocatalytic material, wherein at least a portion of the photocatalytic titanium oxide particles and at least a portion of the second photocatalyst are joined, and the photocatalytic At least a part of the layer containing titanium oxide is present in a state where it can come into contact with moisture in the outside air, and the potential at the lower end of the conduction band of the second photocatalytic material is pH = 7. It is more positive than 0 V in terms of potential, and the potential at the upper end of the valence band of the second photocatalytic material is more positive than +2.7 V in terms of the standard hydrogen electrode potential when pH = 7. And
A hydrophilic member, wherein light having a wavelength capable of photoexciting the photocatalytic material can reach at least one of the photocatalytic titanium oxide and the second photocatalytic material.
光触媒性材料の双方を光励起できる波長の光が到達しう
ることを特徴とする請求項1に記載の親水性部材。2. The hydrophilic member according to claim 1, wherein light having a wavelength capable of photoexciting both the photocatalytic titanium oxide and the second photocatalytic material can reach.
下であることを特徴とする請求項1ないし2に記載の親
水性部材。3. The hydrophilic member according to claim 1, wherein the particle size of the second photocatalytic material is 50 nm or less.
下であることを特徴とする請求項1ないし2に記載の親
水性部材。4. The hydrophilic member according to claim 1, wherein the particle size of the second photocatalytic material is 10 nm or less.
ける被覆率が、X線光電子分光法で計測した値に換算し
て、0.5%〜50%の範囲であることを特徴とする請求項
1〜4に記載の親水性部材。5. The method according to claim 1, wherein a coverage of the second photocatalytic material on the substrate surface is in a range of 0.5% to 50% in terms of a value measured by X-ray photoelectron spectroscopy. Item 5. The hydrophilic member according to any one of Items 1 to 4.
あることを特徴とする請求項1〜5のいずれか一項に記
載の親水性部材。6. The hydrophilic member according to claim 1, wherein the second photocatalytic material is tin oxide.
状の酸化タングステンないしタングステン酸塩であるこ
とを特徴とする1〜5に記載の親水性部材。7. The hydrophilic member according to claim 1, wherein the second photocatalytic material is amorphous tungsten oxide or tungstate.
膜に、更に酸化チタンよりも化学吸着水を多く吸着し得
る金属酸化物が含有されており、かつその一部が外気に
露出していることを特徴とする請求項1〜7のいずれか
一項に記載の親水性部材。8. A film containing the titanium oxide and the second photocatalyst further contains a metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide, and a part of the metal oxide is exposed to the outside air. The hydrophilic member according to any one of claims 1 to 7, wherein:
も化学吸着水を多く吸着し得る金属酸化物の層が形成さ
れ、この金属酸化物の厚みが1nm〜100nmの範囲であるこ
とを特徴とする請求項1〜8に記載の親水性部材。9. A metal oxide layer capable of adsorbing more chemically adsorbed water than titanium oxide is formed on the surface of the coating, and the thickness of the metal oxide is in the range of 1 nm to 100 nm. The hydrophilic member according to claim 1, wherein
く吸着し得る金属酸化物が、シロキサン結合、ボロシロ
キサン結合、アルミノシリケート結合からなる群より選
択する少なくとも一つの結合を有することを特徴とする
請求項8ないし9に記載の親水性部材。10. The metal oxide capable of adsorbing more chemically adsorbed water than titanium oxide has at least one bond selected from the group consisting of a siloxane bond, a borosiloxane bond, and an aluminosilicate bond. The hydrophilic member according to claim 8.
を特徴とする請求項1〜10のいずれか一項に記載の親
水性部材。11. The hydrophilic member according to claim 1, wherein the surface layer is substantially transparent.
徴とする請求項1〜11のいずれか一項に記載の親水性
部材。12. The hydrophilic member according to claim 1, wherein the substrate is a building exterior material.
徴とする請求項1〜11のいずれか一項に記載の親水性
部材。13. The hydrophilic member according to claim 1, wherein the base material is a building interior material.
白熱電球等の室内の照明装置からの光照射であることを
特徴とする請求項13に記載の親水性部材。14. The method of claim 1, wherein the photoexcitation of the photocatalytic material is a fluorescent light,
14. The hydrophilic member according to claim 13, wherein the light is emitted from an indoor lighting device such as an incandescent lamp.
する方法であって、基材表面に光触媒性結晶性酸化チタ
ンを含有する層を形成する工程と、次いでその上に第二
の光触媒性材料の出発原料を含有する溶液を塗布する工
程と、固化させる工程を含む親水性部材の製造方法。15. A method for producing a hydrophilic member according to claim 1, wherein a step of forming a layer containing photocatalytic crystalline titanium oxide on the surface of the substrate, and then a second photocatalyst thereon. A method for producing a hydrophilic member, comprising a step of applying a solution containing a starting material of a hydrophilic material, and a step of solidifying.
タングステン酸アンモニウム水溶液であり、タングステ
ン酸アンモニウムを固化させるための熱処理が20℃〜
500℃の範囲であることを特徴とする請求項15に記
載の親水性部材の製造方法。16. The starting material of the second photocatalytic material is an aqueous solution of ammonium tungstate, and the heat treatment for solidifying the ammonium tungstate is performed at a temperature of 20 ° C.
The method for producing a hydrophilic member according to claim 15, wherein the temperature is in a range of 500 ° C.
タングステン酸アンモニウム水溶液であり、タングステ
ン酸アンモニウムを固化させるための熱処理が20℃〜
350℃の範囲であることを特徴とする請求項15に記
載の親水性部材の製造方法。17. The starting material of the second photocatalytic material is an aqueous solution of ammonium tungstate, and the heat treatment for solidifying the ammonium tungstate is performed at 20 ° C.
The method for producing a hydrophilic member according to claim 15, wherein the temperature is in a range of 350 ° C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001067178A JP2002234105A (en) | 2000-03-13 | 2001-03-09 | Hydrophilic member and method for manufacturing the same |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000-68840 | 2000-03-13 | ||
| JP2000068840 | 2000-03-13 | ||
| JP2000372824 | 2000-12-07 | ||
| JP2000-372824 | 2000-12-07 | ||
| JP2001067178A JP2002234105A (en) | 2000-03-13 | 2001-03-09 | Hydrophilic member and method for manufacturing the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002234105A true JP2002234105A (en) | 2002-08-20 |
Family
ID=27342645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001067178A Pending JP2002234105A (en) | 2000-03-13 | 2001-03-09 | Hydrophilic member and method for manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002234105A (en) |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003013727A1 (en) * | 2001-08-08 | 2003-02-20 | Sumitomo Metal Mining Co., Ltd. | Photocatalyst exhibiting catalytic activity even in visible light region |
| WO2003013726A1 (en) * | 2001-08-08 | 2003-02-20 | Sumitomo Metal Mining Co.,Ltd. | Photocatalyst exhibiting catalytic activity even in visible light region |
| WO2009110236A1 (en) * | 2008-03-04 | 2009-09-11 | 株式会社 東芝 | Hydrophilic member and hydrophilic articles made by using the same |
| JP2010094571A (en) * | 2008-10-14 | 2010-04-30 | Kinki Univ | Photocatalytic film produced by making good use of tin-plating technique and method for producing photocatalytic material |
| WO2010050226A1 (en) | 2008-10-30 | 2010-05-06 | パナソニック株式会社 | Photoelectrochemical cell and energy system using same |
| JP2010180303A (en) * | 2009-02-04 | 2010-08-19 | Sumitomo Chemical Co Ltd | Hydrophilizing agent, method of producing the same, and use of the same |
| WO2011058723A1 (en) | 2009-11-10 | 2011-05-19 | パナソニック株式会社 | Photoelectrochemical cell and energy system using same |
| JP2011158456A (en) * | 2010-02-03 | 2011-08-18 | Kohei Kosaka | Device for surface tension measurement of capillary tube rising system |
| WO2011121932A1 (en) | 2010-03-31 | 2011-10-06 | パナソニック株式会社 | Photoelectrochemical cell and energy system using same |
| JP2012206907A (en) * | 2011-03-30 | 2012-10-25 | Toto Ltd | Sanitary ware |
| US8758578B2 (en) | 2009-08-05 | 2014-06-24 | Panasonic Corporation | Photoelectrochemical cell and energy system using the same |
| CN104576068A (en) * | 2014-03-06 | 2015-04-29 | 华东理工大学 | Solar cell based on water-air system |
| JP2018192466A (en) * | 2017-05-19 | 2018-12-06 | 株式会社希少金属材料研究所 | Tungsten compound of visible light-responsive photocatalyst, and coating |
| JP2021159811A (en) * | 2020-03-30 | 2021-10-11 | 大分県 | Method for manufacturing visible light responsive composite thin film photocatalyst material and visible light responsive composite thin film photocatalyst material |
| JP2022079542A (en) * | 2017-05-19 | 2022-05-26 | 株式会社希少金属材料研究所 | Tungsten compound of visible light-responsive photocatalyst and coating |
-
2001
- 2001-03-09 JP JP2001067178A patent/JP2002234105A/en active Pending
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003013726A1 (en) * | 2001-08-08 | 2003-02-20 | Sumitomo Metal Mining Co.,Ltd. | Photocatalyst exhibiting catalytic activity even in visible light region |
| WO2003013727A1 (en) * | 2001-08-08 | 2003-02-20 | Sumitomo Metal Mining Co., Ltd. | Photocatalyst exhibiting catalytic activity even in visible light region |
| US9457377B2 (en) | 2008-03-04 | 2016-10-04 | Kabushiki Kaisha Toshiba | Hydrophilic member and hydrophilic product using the same |
| WO2009110236A1 (en) * | 2008-03-04 | 2009-09-11 | 株式会社 東芝 | Hydrophilic member and hydrophilic articles made by using the same |
| JP5597532B2 (en) * | 2008-03-04 | 2014-10-01 | 株式会社東芝 | Hydrophilic member and hydrophilic product using the same |
| JP2010094571A (en) * | 2008-10-14 | 2010-04-30 | Kinki Univ | Photocatalytic film produced by making good use of tin-plating technique and method for producing photocatalytic material |
| US8236146B2 (en) | 2008-10-30 | 2012-08-07 | Panasonic Corporation | Photoelectrochemical cell and energy system using the same |
| WO2010050226A1 (en) | 2008-10-30 | 2010-05-06 | パナソニック株式会社 | Photoelectrochemical cell and energy system using same |
| JP2010180303A (en) * | 2009-02-04 | 2010-08-19 | Sumitomo Chemical Co Ltd | Hydrophilizing agent, method of producing the same, and use of the same |
| US8758578B2 (en) | 2009-08-05 | 2014-06-24 | Panasonic Corporation | Photoelectrochemical cell and energy system using the same |
| WO2011058723A1 (en) | 2009-11-10 | 2011-05-19 | パナソニック株式会社 | Photoelectrochemical cell and energy system using same |
| US8821700B2 (en) | 2009-11-10 | 2014-09-02 | Panasonic Corporation | Photoelectrochemical cell and energy system using same |
| JP2011158456A (en) * | 2010-02-03 | 2011-08-18 | Kohei Kosaka | Device for surface tension measurement of capillary tube rising system |
| US9157155B2 (en) | 2010-03-31 | 2015-10-13 | Panasonic Intellectual Property Management Co., Ltd. | Photoelectrochemical cell and energy system using same |
| WO2011121932A1 (en) | 2010-03-31 | 2011-10-06 | パナソニック株式会社 | Photoelectrochemical cell and energy system using same |
| JP2012206907A (en) * | 2011-03-30 | 2012-10-25 | Toto Ltd | Sanitary ware |
| CN104576068A (en) * | 2014-03-06 | 2015-04-29 | 华东理工大学 | Solar cell based on water-air system |
| JP2018192466A (en) * | 2017-05-19 | 2018-12-06 | 株式会社希少金属材料研究所 | Tungsten compound of visible light-responsive photocatalyst, and coating |
| JP2022079542A (en) * | 2017-05-19 | 2022-05-26 | 株式会社希少金属材料研究所 | Tungsten compound of visible light-responsive photocatalyst and coating |
| JP7288709B2 (en) | 2017-05-19 | 2023-06-08 | 株式会社希少金属材料研究所 | Visible light responsive photocatalyst tungsten compound and paint |
| JP2021159811A (en) * | 2020-03-30 | 2021-10-11 | 大分県 | Method for manufacturing visible light responsive composite thin film photocatalyst material and visible light responsive composite thin film photocatalyst material |
| JP7260117B2 (en) | 2020-03-30 | 2023-04-18 | 大分県 | Visible-light-responsive composite thin-film photocatalyst material and visible-light-responsive composite thin-film photocatalyst material production method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6090489A (en) | Method for photocatalytically hydrophilifying surface and composite material with photocatalytically hydrophilifiable surface | |
| EP0869156B1 (en) | Photocatalytic process for making surface hydrophilic and composite material having photocatalytically hydrophilic surface | |
| JP2002234105A (en) | Hydrophilic member and method for manufacturing the same | |
| JP5130603B2 (en) | Hydrophilic member and method for producing the same | |
| JP2001026070A (en) | Production of composite material having hydrophilic surface and produced composite material | |
| JPWO2001068786A1 (en) | Hydrophilic member and method of manufacturing the same | |
| JP4665221B2 (en) | Titanium dioxide photocatalyst carrier and production method thereof | |
| JP4919141B2 (en) | Photocatalytic member and method for producing the same | |
| CA2241059C (en) | Photocatalyst process for making surface hydrophillic | |
| JP2004188314A (en) | Composite substrate with hydrophilic surface | |
| JP5182883B2 (en) | Photocatalyst and method for producing the same | |
| JP3003593B2 (en) | Photocatalytic hydrophilic member | |
| JPWO1997023572A1 (en) | Method for rendering a surface photocatalytically hydrophilic and composite material with a photocatalytically hydrophilic surface | |
| JP4112691B2 (en) | Surface hydrophilic substrate | |
| JP2010101918A (en) | Spectacles | |
| JP2001079978A (en) | Hydrophilic member | |
| JPH09241038A (en) | Photocatalytic hydrophilic member and its production | |
| JP3613085B2 (en) | Photocatalytic hydrophilic member | |
| JP2010096359A (en) | Refrigerating showcase | |
| JP3063968B2 (en) | Anti-fog vehicle mirror, automobile equipped with the same, anti-fog film for vehicle mirror and anti-fog method for vehicle mirror | |
| JPH09227159A (en) | Front and rear window glass of vehicle | |
| JP7416427B2 (en) | self-cleaning coating | |
| JP2010101920A (en) | Camera | |
| JP3024748B2 (en) | Hydrophilic member | |
| JP2010100070A (en) | Rear-view mirror for automobile |