JP2002134553A - Connecting structure of semiconductor device - Google Patents
Connecting structure of semiconductor deviceInfo
- Publication number
- JP2002134553A JP2002134553A JP2000330168A JP2000330168A JP2002134553A JP 2002134553 A JP2002134553 A JP 2002134553A JP 2000330168 A JP2000330168 A JP 2000330168A JP 2000330168 A JP2000330168 A JP 2000330168A JP 2002134553 A JP2002134553 A JP 2002134553A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- electrodes
- integrated circuit
- bump
- semiconductor integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 76
- 239000000758 substrate Substances 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 239000011347 resin Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- 229910000679 solder Inorganic materials 0.000 claims description 3
- 230000008878 coupling Effects 0.000 abstract description 22
- 238000010168 coupling process Methods 0.000 abstract description 22
- 238000005859 coupling reaction Methods 0.000 abstract description 22
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000003990 capacitor Substances 0.000 description 7
- 241000981595 Zoysia japonica Species 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
Landscapes
- Wire Bonding (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体集積回路と
これを搭載する配線基板とのバンプによる電極間の接続
構造に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a connection structure between electrodes by bumps between a semiconductor integrated circuit and a wiring board on which the semiconductor integrated circuit is mounted.
【0002】[0002]
【従来の技術】近年の半導体装置形状は小型、高密度化
が進み、その電極ピッチも狭くなってきている。信号電
極ピッチが狭くなるとその電極上に配置したバンプ間の
結合容量が増大しクロストークが無視できなくなってき
ている。図10と図11は従来のバンプ接続構造におい
て、それぞれ先行技術として開示されている特開平6−
104260と特開平3−198358に記載された接
続構造を示したものである。この対策として、図10に
おいては半導体集積回路の信号電極周囲にグランド電極
を配置し、信号バンプ5をグランドバンプ6で囲う構造
とすることにより、信号電極間のクロストークによるノ
イズの低減を図っている。図11においては、信号用バ
ンプの周囲に電源用バンプを設けさらに信号リードをグ
ランドリードで囲う構造とし、クロストークの低減を図
っている。2. Description of the Related Art In recent years, semiconductor devices have been reduced in size and density, and the electrode pitch has also been reduced. When the signal electrode pitch becomes narrow, the coupling capacitance between the bumps arranged on the electrode increases, and crosstalk cannot be ignored. FIGS. 10 and 11 show a conventional bump connection structure disclosed in Japanese Patent Laid-Open Publication No.
104260 and a connection structure described in JP-A-3-198358. As a countermeasure, in FIG. 10, a ground electrode is arranged around the signal electrode of the semiconductor integrated circuit, and the signal bump 5 is surrounded by the ground bump 6, thereby reducing noise due to crosstalk between the signal electrodes. I have. In FIG. 11, a power supply bump is provided around a signal bump, and a signal lead is surrounded by a ground lead to reduce crosstalk.
【0003】[0003]
【発明が解決しようとする課題】上述した従来のバンプ
接続構造においては、図10と図11中の信号用バンプ
とグランド用バンプあるいは電源用バンプは、バンプ間
の空気またはモールド樹脂を介することで、等価的に図
12に示すバンプ間の結合容量の等価回路1206−
1,1206−2に示す様な結合容量を持つこととな
る。この結合容量により、半導体集積回路とこれを搭載
する配線基板間を伝送されるべき高周波域の信号が、グ
ランド用バンプへ流れ込み、信号に損失が生じる。ま
た、グランド用バンプへ信号が漏れ込むことにより、半
導体集積回路内のグランドレベルが振られ、回路動作を
不安定にする。In the conventional bump connection structure described above, the signal bumps and the ground bumps or the power supply bumps shown in FIGS. 10 and 11 are formed by interposing air or a mold resin between the bumps. 12, an equivalent circuit 1206- of the coupling capacitance between the bumps shown in FIG.
1, 1206-2. Due to this coupling capacitance, a signal in a high frequency range to be transmitted between the semiconductor integrated circuit and the wiring board on which the semiconductor integrated circuit is mounted flows into the bump for ground, causing a loss in the signal. In addition, when a signal leaks into the ground bump, the ground level in the semiconductor integrated circuit fluctuates, and the circuit operation becomes unstable.
【0004】したがって本発明の目的は、従来の様な隣
接するバンプの結合容量による高周波域の信号特性の悪
化を軽減した半導体集積回路とこれを搭載する配線基板
とのバンプによる電極間の接続構造を提供することであ
る。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a semiconductor integrated circuit in which deterioration of signal characteristics in a high frequency region due to the coupling capacitance of adjacent bumps is reduced, and a connection structure between electrodes by bumps between a semiconductor integrated circuit and a wiring board on which the same is mounted. It is to provide.
【0005】[0005]
【課題を解決するための手段】上記課題を解決する為に
本発明の半導体装置の接続構造は、半導体集積回路の電
極とこれを搭載する配線基板の電極をバンプで電極間の
一つを接続する構造に関し、半導体集積回路上に複数電
極を等間隔に並べ、前記配線基板上には前記半導体集積
回路上の電極よりも電極間隔が広い複数の電極を並べた
電極配置を有し、前記半導体集積回路上の電極表面に対
して垂直で且つ電極の中心に位置する直線が前記配線基
板上の電極の中心を通過するような位置に配置した前記
半導体集積回路上の電極および前記配線基板上の電極を
信号電極とし、前記半導体集積回路上の電極表面に対し
て垂直で且つ隣接する2つの電極間の中央を通過する直
線が配線基板上の隣接する2つの電極間の中央を通過す
るような位置にあって且つ対向した位置に配置した、前
記半導体集積回路上の2つの電極およびこれらに対応す
る前記配線基板上の2つの電極の一方を電源電極、もう
一方をグランド電極とし、前記半導体集積回路上の信号
電極、電源電極、グランド電極それぞれの中心に配置し
たバンプで、前記配線基板上の信号電極、電源電極、グ
ランド電極とを接続する構造を特徴としている。また、
半導体集積回路上の電極ピッチと電極サイズが配線基板
上の電極ピッチと電極サイズに等しい電極のレイアウト
で、前記半導体集積回路上及び前記配線基板上にそれぞ
れ対応したレイアウトで、電源電極を複数個連続し、ま
た、グランド電極を複数個連続して並べて、前記半導体
集積回路上及び前記配線基板上の信号電極は電源電極ま
たはグランド電極を挟んで配置し、前記信号電極をバン
プで接続し、前記半導体集積回路の電源電極とグランド
電極が隣接する部分は前記半導体集積回路上と前記配線
基板上の電源電極とグランド電極のそれぞれをバンプで
接続して、信号電極に隣接する電源電極とグランド電極
については接続しないことを特徴としている。また、半
導体集積回路上の電極ピッチと電極サイズが配線基板の
電極ピッチと電極サイズに等しい電極のレイアウトで、
半導体集積回路上の電極が2つ以上連なって同一信号の
入力端あるいは、電極が2つ以上連なって同一信号の出
力端となっている場合、この2つ以上連なった電極の内
1つだけを前記配線基板の電極とバンプにより接続する
ことを特徴としている。また、前記バンプは金属球を押
しつぶした楕円球状の金属バンプであり、この楕円球状
の金属バンプで接続する構造を特徴とした請求項1乃至
3記載の半導体装置の接続構造。また、前記バンプを金
属あるいは導電性樹脂を、円柱形状あるいは角柱形状に
形成した導電性ピラーとし、この導電性ピラーで接続す
る構造を特徴としている。また、前記バンプを銅製の球
を芯とした半田ボールによって形成したボールバンプと
し、このボールバンプで接続する構造を特徴としてい
る。According to the present invention, there is provided a connection structure for a semiconductor device, wherein an electrode of a semiconductor integrated circuit is connected to an electrode of a wiring board on which the electrode is mounted by bumps. A plurality of electrodes arranged at equal intervals on a semiconductor integrated circuit, and an electrode arrangement in which a plurality of electrodes having an electrode interval wider than the electrodes on the semiconductor integrated circuit are arranged on the wiring substrate, The electrode on the semiconductor integrated circuit and the electrode on the wiring board are arranged at a position such that a straight line perpendicular to the electrode surface on the integrated circuit and located at the center of the electrode passes through the center of the electrode on the wiring board. The electrode is a signal electrode, and a straight line perpendicular to the electrode surface on the semiconductor integrated circuit and passing through the center between two adjacent electrodes passes through the center between two adjacent electrodes on the wiring board. In position The two electrodes on the semiconductor integrated circuit and the two electrodes on the wiring substrate corresponding to these two electrodes are arranged as power supply electrodes and the other as a ground electrode, A bump is disposed at the center of each of the signal electrode, the power supply electrode, and the ground electrode, and is characterized in that the signal electrode, the power supply electrode, and the ground electrode on the wiring board are connected. Also,
A plurality of power supply electrodes are continuously arranged in an electrode layout in which the electrode pitch and the electrode size on the semiconductor integrated circuit are equal to the electrode pitch and the electrode size on the wiring substrate, and on the semiconductor integrated circuit and the wiring substrate, respectively. A plurality of ground electrodes are continuously arranged, the signal electrodes on the semiconductor integrated circuit and the wiring substrate are arranged with a power supply electrode or a ground electrode interposed therebetween, and the signal electrodes are connected by bumps; The portion where the power electrode and the ground electrode of the integrated circuit are adjacent connects the power electrode and the ground electrode on the semiconductor integrated circuit and the wiring substrate with bumps, respectively. For the power electrode and the ground electrode adjacent to the signal electrode, It is characterized by no connection. Also, in the layout of the electrodes in which the electrode pitch and the electrode size on the semiconductor integrated circuit are equal to the electrode pitch and the electrode size of the wiring board,
When two or more electrodes on a semiconductor integrated circuit are connected to form an input terminal for the same signal or two or more electrodes are connected to an output terminal for the same signal, only one of the two or more connected electrodes is used. It is characterized in that it is connected to the electrode of the wiring board by a bump. 4. The connection structure for a semiconductor device according to claim 1, wherein the bump is an elliptical metal bump formed by crushing a metal ball, and the bump is connected by the elliptical metal bump. In addition, the bumps are formed as conductive pillars formed of metal or conductive resin in a cylindrical or prismatic shape, and are connected by the conductive pillars. Further, the present invention is characterized in that the bump is a ball bump formed by a solder ball having a copper ball as a core, and the bump is connected by the ball bump.
【0006】[0006]
【発明の実施の形態】次に、本発明について図面を参照
しながら説明する。図1は本発明の第1の実施形態を示
す断面図である。これは半導体集積回路101の電極ピ
ッチと電極サイズが、配線基板102の電極ピッチと電
極サイズと異なる場合であり、半導体回路101の電極
の中心113を通る電極表面に対して垂直な直線115
が、配線基板102上の電極の中心114通過する半導
体集積回路102上の電極および、配線基板上の電極を
信号電極103、107−3とし、これらの電極をバン
プによって接続する。Next, the present invention will be described with reference to the drawings. FIG. 1 is a cross-sectional view showing a first embodiment of the present invention. This is a case where the electrode pitch and the electrode size of the semiconductor integrated circuit 101 are different from the electrode pitch and the electrode size of the wiring substrate 102, and a straight line 115 perpendicular to the electrode surface passing through the center 113 of the electrode of the semiconductor circuit 101.
However, the electrodes on the semiconductor integrated circuit 102 passing through the center 114 of the electrodes on the wiring board 102 and the electrodes on the wiring board are signal electrodes 103 and 107-3, and these electrodes are connected by bumps.
【0007】上記の信号電極の接続に加えて、半導体集
積回路102上の隣接する2つの電極間の中点111を
通る電極表面に対して垂直な直線116が、配線基板1
02上の隣接する2つの電極間の中点112を通過する
場合、前記半導体集積回路101上の2つの電極をそれ
ぞれグランド電極105−1、電源電極とし104−
1、この2つの電極105−1、104−1のそれぞれ
と対をなす、配線基板上の電極をグランド電極107−
1、電源電極107−2とし、半導体集積回路101上
と配線基板上102の2つのグランド電極105−1、
107−1をバンプによって接続し、同様に2つの電源
電極104−1、107−2をバンプによって接続す
る。In addition to the connection of the signal electrodes described above, a straight line 116 perpendicular to the electrode surface passing through the midpoint 111 between two adjacent electrodes on the semiconductor integrated circuit 102 is formed on the wiring board 1.
When passing through the midpoint 112 between two adjacent electrodes on the semiconductor integrated circuit 02, the two electrodes on the semiconductor integrated circuit 101 are used as a ground electrode 105-1 and a power supply electrode, respectively.
1. An electrode on the wiring board, which makes a pair with each of the two electrodes 105-1 and 104-1, is a ground electrode 107-
1, two power supply electrodes 107-2, two ground electrodes 105-1, on the semiconductor integrated circuit 101 and on the wiring substrate 102;
107-1 are connected by bumps, and similarly, the two power supply electrodes 104-1 and 107-2 are connected by bumps.
【0008】上記の様なバンプ接続方法をとることによ
り、電源電極を接続するバンプ110−1とグランド電
極を接続するバンプ109−1は近接し、結合容量が大
きくなることでバイパスコンデンサの効果をなし、電源
のノイズを低減できる。また、信号電極を接続するバン
プ103とグランド電極や電源電極を接続するバンプ1
09−1,110−2の間隔が広がり、結合容量が低減
することで信号電極を接続するバンプの電気特性の改善
が図れる。By employing the above-described bump connection method, the bump 110-1 connecting the power supply electrode and the bump 109-1 connecting the ground electrode are close to each other, and the coupling capacitance is increased, thereby reducing the effect of the bypass capacitor. None, power supply noise can be reduced. Also, the bump 103 connecting the signal electrode and the bump 1 connecting the ground electrode and the power electrode are connected.
The electrical characteristics of the bumps connecting the signal electrodes can be improved by widening the interval between 09-1 and 110-2 and reducing the coupling capacitance.
【0009】図2は本発明の第2の実施形態である。こ
れは半導体集積回路201の電極ピッチと電極サイズ
が、配線基板202の電極ピッチと電極サイズとが異な
る場合で、図1の実施形態と異なる点は配線基板側の電
極ピッチと電極サイズである。半導体集積回路201上
の隣接する2つの電極間の中点209を通る電極表面に
対して垂直な直線216が、配線基板202上の隣接す
る2つの電極間の中点210を通過する場合、半導体集
積回路201上の2つの電極をそれぞれグランド電極2
04−1、電源電極203−1とし、この2つの電極2
04−1、203―1のそれぞれと対をなす配線基板上
の電極をグランド電極206−1、電源電極206−2
とし、半導体集積回路上と配線基板上の2つのグランド
電極をバンプ208−1によって接続し、同様に2つの
電源電極をバンプ207−1によって接続する。上記の
様なバンプ接続方法をとることにより、グランド電極を
接続するバンプ208−1と電源電極を接続するバンプ
207−1は近接し結合容量が大きくなり、バイパスコ
ンデンサの効果をなし、電源のノイズを低減できる。FIG. 2 shows a second embodiment of the present invention. This is a case where the electrode pitch and the electrode size of the semiconductor integrated circuit 201 are different from the electrode pitch and the electrode size of the wiring substrate 202. What differs from the embodiment of FIG. 1 is the electrode pitch and the electrode size on the wiring substrate side. When a straight line 216 perpendicular to the electrode surface passing through a midpoint 209 between two adjacent electrodes on the semiconductor integrated circuit 201 passes through a midpoint 210 between two adjacent electrodes on the wiring board 202, the semiconductor The two electrodes on the integrated circuit 201 are connected to the ground electrode 2 respectively.
04-1 and a power supply electrode 203-1.
The electrodes on the wiring board, which make a pair with each of 04-1 and 203-1, are a ground electrode 206-1 and a power supply electrode 206-2.
Then, two ground electrodes on the semiconductor integrated circuit and the wiring substrate are connected by a bump 208-1, and similarly, two power electrodes are connected by a bump 207-1. By adopting the bump connection method as described above, the bump 208-1 connecting the ground electrode and the bump 207-1 connecting the power supply electrode are close to each other to increase the coupling capacitance, thereby achieving the effect of the bypass capacitor and reducing the power supply noise. Can be reduced.
【0010】図3は本発明の第3の実施形態である。こ
れは半導体集積回路301の電極ピッチと電極サイズ
が、配線基板302の電極ピッチと電極サイズとが異な
る場合で、第1、第2と異なる点は配線基板側の電極ピ
ッチと電極サイズである。半導体集積回路301上の隣
接する2つの電極間の中点310を通る電極表面に対し
て垂直な直線316が、配線基板302上の隣接する2
つの電極間の中点311を通過する場合、半導体集積回
路301上の2つの電極をそれぞれグランド電極307
−2、電源電極308−1とし、この2つの電極307
−2、308−1のそれぞれと対をなす配線基板上の電
極をグランド電極309−1、電源電極309−2と
し、半導体集積回路上と配線基板上の2つのグランド電
極307−2、309−1をバンプ304によって接続
し、同様に2つの電源電極308−1、309−2をバ
ンプ305によって接続する。これに加え半導体集積回
路301上の同一信号の入力端または同一信号の出力端
として連なって配置した信号電極303−1、303−
2の内、最も近傍にあるバンプ305から離れた電極3
03−2を信号電極として、配線基板302上の信号電
極309−3に、バンプ306によって接続する。FIG. 3 shows a third embodiment of the present invention. This is a case where the electrode pitch and the electrode size of the semiconductor integrated circuit 301 are different from the electrode pitch and the electrode size of the wiring substrate 302. The difference from the first and second is the electrode pitch and the electrode size on the wiring substrate side. A straight line 316 perpendicular to the electrode surface passing through the midpoint 310 between two adjacent electrodes on the semiconductor integrated circuit 301 is formed on the adjacent two electrodes on the wiring board 302.
When passing through the midpoint 311 between the two electrodes, the two electrodes on the semiconductor integrated circuit 301 are connected to the ground electrode 307, respectively.
-2, a power supply electrode 308-1, and the two electrodes 307
-2 and 308-1 are paired with a ground electrode 309-1 and a power supply electrode 309-2, respectively, on the wiring board, and two ground electrodes 307-2 and 309- on the semiconductor integrated circuit and the wiring board. 1 are connected by a bump 304, and similarly, two power supply electrodes 308-1 and 309-2 are connected by a bump 305. In addition, the signal electrodes 303-1 and 303- arranged continuously as the same signal input terminal or the same signal output terminal on the semiconductor integrated circuit 301.
2, the electrode 3 farthest from the nearest bump 305
03-2 is used as a signal electrode and connected to a signal electrode 309-3 on the wiring board 302 by a bump 306.
【0011】上記の様なバンプ接続方法をとることによ
り、グランド電極を接続するバンプ304と電源電極を
接続するバンプ305は近接し結合容量が大きくなり、
バイパスコンデンサの効果をなし、電源のノイズを低減
できる。また、信号電極を接続するバンプ306と電源
電極を接続するバンプ305の間隔は広がり、結合容量
が低減することにより信号電極を接続するバンプの電気
特性の改善が図れる。By adopting the above-described bump connection method, the bump 304 connecting the ground electrode and the bump 305 connecting the power electrode are close to each other, and the coupling capacitance is increased.
The effect of the bypass capacitor is achieved, and the power supply noise can be reduced. Further, the distance between the bump 306 connecting the signal electrode and the bump 305 connecting the power supply electrode is widened, and the electrical characteristics of the bump connecting the signal electrode can be improved by reducing the coupling capacitance.
【0012】本発明の第4の実施形態を図4に示す。こ
れは半導体集積回路401の電極ピッチと電極サイズが
配線基板402の電極ピッチと電極サイズとが等しい場
合で、半導体集積回路401上の隣接して配置された電
源電極409−1とグランド電極408−2は配線基板
402上の電源電極410−2とグランド電極411−
1に電源バンプ406とグランドバンプ405を介して
接続する。また信号電極404に隣接する電源電極40
9−3やグランド電極408−3は接続しない。FIG. 4 shows a fourth embodiment of the present invention. This is when the electrode pitch and the electrode size of the semiconductor integrated circuit 401 are equal to the electrode pitch and the electrode size of the wiring substrate 402, and the power supply electrode 409-1 and the ground electrode 408- Reference numeral 2 denotes a power supply electrode 410-2 and a ground electrode 411- on the wiring board 402.
1 via a power bump 406 and a ground bump 405. The power supply electrode 40 adjacent to the signal electrode 404
9-3 and the ground electrode 408-3 are not connected.
【0013】上記の様なバンプ接続方法をとることによ
り、電源電極を接続するバンプ406とグランド電極を
接続するバンプ405の結合容量は大きくなり、バイパ
スコンデンサの効果をなし、電源のノイズを低減でき
る。また、信号電極を接続するバンプ407と電源電極
を接続するバンプ406または、グランド電極を接続す
るバンプ405との結合容量が低減することにより、接
合部の電気特性の改善が図れる。By adopting the above-described bump connection method, the coupling capacitance between the bump 406 connecting the power supply electrode and the bump 405 connecting the ground electrode is increased, and the effect of the bypass capacitor can be achieved, thereby reducing the power supply noise. . In addition, by reducing the coupling capacitance between the bump 407 connecting the signal electrode and the bump 406 connecting the power supply electrode or the bump 405 connecting the ground electrode, the electrical characteristics of the joint can be improved.
【0014】本発明の第5の実施形態を図5に示す。半
導体集積回路501上の電極ピッチと電極サイズと配線
基板502上の電極ピッチと電極サイズとが等しい場合
についてであり、半導体集積回路501上の電極につい
て、同一信号の入力端であるかまたは、同一信号の出力
端である信号電極である隣接する電極504−1と電極
504−2について任意のどちらか、図3では504−
2にバンプ505を配置し、配線基板502上の電極5
03−2と接続する。同一信号の入力端または出力端で
ある信号電極503−3、503−4の接続について
は、バンプ505から遠いほうの信号電極503−4と
504−4をバンプ506で接続する。同様にバンプ5
06から遠い方の電極504−6と503−6をバンプ
507で接続する。上記の様なバンプ接続方法をとるこ
とにより、各信号電極を接続するバンプ505,50
6,507の間隔が広がり、結合容量は減少し、電気特
性を改善できる。FIG. 5 shows a fifth embodiment of the present invention. This is the case where the electrode pitch and the electrode size on the semiconductor integrated circuit 501 are equal to the electrode pitch and the electrode size on the wiring substrate 502, and the electrodes on the semiconductor integrated circuit 501 are the same signal input terminals or the same. Either of the adjacent electrodes 504-1 and 504-2, which are signal electrodes serving as signal output terminals, is arbitrary, and in FIG.
2, a bump 505 is arranged on
03-2. Regarding the connection of the signal electrodes 503-3 and 503-4, which are the input terminal or the output terminal of the same signal, the signal electrodes 503-4 and 504-4 farther from the bump 505 are connected by the bump 506. Similarly, bump 5
The electrodes 504-6 and 503-6, which are farther from the reference numeral 06, are connected by bumps 507. By using the bump connection method as described above, the bumps 505 and 50 connecting the respective signal electrodes are formed.
6,507 are widened, the coupling capacity is reduced, and the electrical characteristics can be improved.
【0015】図6は半導体集積回路上の電極ピッチと電
極サイズおよび配線基板の電極ピッチと電極サイズが図
1の実施形態と同じであり、接続部バンプを導電性ピラ
ーに置き換えた本発明の第6の実施形態である。導電性
ピラーは金属または導電性樹脂または絶縁体にメッキし
て導電性を持たせたものであり、円柱形状あるいは角柱
形状とした。前記の様な導電性ピラーによる接続方法を
とることにより、第1の実施形態と同様に、電源電極を
接続する導電性ピラー610−1とグランド電極を接続
する導電性ピラー609−1は近接し、バイパスコンデ
ンサの効果をなし、電源のノイズを低減でき、信号電極
を接続する導電性ピラー608と、グランド電極605
−2や電源電極604−1を接続する導電性ピラー61
0−2,609−1の間隔が広がり、結合容量が低減す
ることにより信号電極を接続する導電性ピラーの電気特
性の改善が図れる。FIG. 6 shows the second embodiment of the present invention in which the electrode pitch and the electrode size on the semiconductor integrated circuit and the electrode pitch and the electrode size of the wiring board are the same as those of the embodiment of FIG. 1, and the connection portion bumps are replaced with conductive pillars. 6 is an embodiment of FIG. The conductive pillar is formed by plating a metal, a conductive resin, or an insulator to have conductivity, and has a columnar shape or a prismatic shape. By adopting the connection method using the conductive pillar as described above, the conductive pillar 610-1 for connecting the power electrode and the conductive pillar 609-1 for connecting the ground electrode are close to each other, as in the first embodiment. A conductive pillar 608 for connecting a signal electrode, and a ground electrode 605.
-2 and conductive pillar 61 for connecting power supply electrode 604-1
Since the interval between 0-2 and 609-1 is widened and the coupling capacitance is reduced, the electrical characteristics of the conductive pillar connecting the signal electrodes can be improved.
【0016】図7と図8は図6の実施形態における導電
性ピラー形状を変形した、それぞれ第7、第8の実施形
態である。図7は電極面よりもピラー710−1を断面
の狭いものとし、半導体集積回路701上の電極705
−1と配線基板702上の電極707−1を接続した構
造である。また、図8は半導体集積回路801上の電極
と配線基板802上の電極の間隔よりも長いピラーを屈
曲させ半導体集積回路上の電極と配線基板上の電極を接
続した構造である前記の様な導電性ピラーによる接続方
法をとることにより、第1の実施形態と同様の理由によ
り、さらに電源のノイズを低減でき、信号電極を接続す
る導電性ピラーの電気特性の改善が図れる。FIGS. 7 and 8 show seventh and eighth embodiments, respectively, in which the shape of the conductive pillar in the embodiment of FIG. 6 is modified. FIG. 7 shows a case where the cross section of the pillar 710-1 is smaller than the electrode surface, and the electrode 705 on the semiconductor integrated circuit 701 is formed.
-1 and the electrode 707-1 on the wiring board 702 are connected. FIG. 8 shows a structure in which a pillar longer than the distance between the electrode on the semiconductor integrated circuit 801 and the electrode on the wiring board 802 is bent to connect the electrode on the semiconductor integrated circuit to the electrode on the wiring board. By adopting the connection method using the conductive pillars, for the same reason as in the first embodiment, the noise of the power supply can be further reduced, and the electrical characteristics of the conductive pillars connecting the signal electrodes can be improved.
【0017】図9は半導体集積回路上の電極ピッチと電
極サイズおよび配線基板の電極ピッチと電極サイズが第
1の実施形態と同じで、接続部バンプをボールバンプに
置き換えたものである。ボールバンプは銅製の球917
を芯としている、半導体回路上の電極905−1と配線
基板上の電極907−1の間に半田ボール910−1を
形成することで行う。上記の様なボールバンプによる接
続方法をとることにより、第1の実施形態と同様に、電
源電極を接続するボールバンプ909−1とグランド電
極を接続する銅製の球910−1は近接し、バイパスコ
ンデンサの効果をなし、電源のノイズを低減できる。ま
た、信号電極を接続するボールバンプ908に対する、
グランド電極905−2を接続するボールバンプ910
−2と電源電極904−1を接続するボールバンプ90
9−1の間隔が広がり、結合容量が低減することにより
信号電極を接続するボールバンプの電気特性の改善が図
れる。FIG. 9 shows a semiconductor integrated circuit in which the electrode pitch and the electrode size and the electrode pitch and the electrode size of the wiring board are the same as those of the first embodiment, and the connection portion bumps are replaced by ball bumps. The ball bump is a copper ball 917
This is performed by forming a solder ball 910-1 between the electrode 905-1 on the semiconductor circuit and the electrode 907-1 on the wiring board, with the core as the core. By adopting the connection method using ball bumps as described above, similarly to the first embodiment, the ball bumps 909-1 for connecting the power supply electrodes and the copper balls 910-1 for connecting the ground electrodes are close to each other and bypassed. The effect of the capacitor is achieved, and the noise of the power supply can be reduced. Further, for the ball bump 908 connecting the signal electrode,
Ball bump 910 connecting ground electrode 905-2
-Bump 90 connecting -2 and power electrode 904-1
By increasing the interval of 9-1 and reducing the coupling capacitance, the electrical characteristics of the ball bumps connecting the signal electrodes can be improved.
【0018】[0018]
【発明の効果】以上説明したように、本発明の第1の効
果は、バンプ接合部の電気的特性が改善されることであ
る。その理由は、信号電極間の隣接バンプとの結合容量
が小さくなるためである。第2の効果は、電源、グラン
ド間のノイズが低減されることである。その理由は、電
源バンプとグランドバンプの間隔を狭く配置することに
より結合容量を増大させる事が出来、バイパスコンデン
サとしての役割を果たすことがためである。本発明の接
続構造では、電源電極とグランド電極のバンプ間隔は狭
くなり、信号電極のバンプ間隔は広がる。従って電源−
グランド電極のバンプ間の結合容量が増大し、バイパス
コンデンサの役割を果たすので電源ノイズを低減でき
る。また、信号電極のバンプ間の結合容量は低減し、ク
ロストークによるノイズが低減し、電気特性を改善でき
るという効果がある。As described above, the first effect of the present invention is that the electrical characteristics of the bump joint are improved. The reason is that the coupling capacitance between the signal electrode and the adjacent bump is reduced. A second effect is that noise between the power supply and the ground is reduced. The reason for this is that the coupling capacitance can be increased by arranging the power supply bumps and the ground bumps with a small distance, and they serve as a bypass capacitor. In the connection structure of the present invention, the bump interval between the power electrode and the ground electrode is reduced, and the bump interval between the signal electrodes is increased. Therefore the power supply
Since the coupling capacitance between the bumps of the ground electrode increases and plays the role of a bypass capacitor, power supply noise can be reduced. Further, there is an effect that the coupling capacitance between the bumps of the signal electrode is reduced, noise due to crosstalk is reduced, and electrical characteristics can be improved.
【図1】本発明の第1の実施形態を示すバンプによる接
続構造断面図である。FIG. 1 is a sectional view of a connection structure using bumps according to a first embodiment of the present invention.
【図2】本発明の第2の実施形態を示すバンプによる接
続構造断面図である。FIG. 2 is a sectional view of a connection structure using bumps according to a second embodiment of the present invention.
【図3】本発明の第3の実施形態を示すバンプによる接
続構造断面図である。FIG. 3 is a sectional view showing a connection structure using bumps according to a third embodiment of the present invention.
【図4】本発明の第4の実施形態を示すバンプによる接
続構造断面図である。FIG. 4 is a sectional view showing a connection structure using bumps according to a fourth embodiment of the present invention.
【図5】本発明の第5の実施形態を示すバンプによる接
続構造断面図である。FIG. 5 is a sectional view showing a connection structure using bumps according to a fifth embodiment of the present invention.
【図6】本発明の第6の実施形態を示すバンプによる接
続構造断面図である。FIG. 6 is a sectional view showing a connection structure using bumps according to a sixth embodiment of the present invention.
【図7】本発明の第7の実施形態を示すバンプによる接
続構造断面図である。FIG. 7 is a sectional view showing a connection structure using bumps according to a seventh embodiment of the present invention.
【図8】本発明の第8の実施形態を示すバンプによる接
続構造断面図である。FIG. 8 is a sectional view showing a connection structure using bumps according to an eighth embodiment of the present invention.
【図9】本発明の第9の実施形態を示すバンプによる接
続構造断面図である。FIG. 9 is a sectional view of a connection structure using bumps according to a ninth embodiment of the present invention.
【図10】従来のバンプによる接続構造におけるバンプ
間の結合容量を示す断面図。FIG. 10 is a cross-sectional view showing a coupling capacitance between bumps in a conventional connection structure using bumps.
【図11】従来のバンプによる接続構造を示す平面図で
ある。FIG. 11 is a plan view showing a conventional connection structure using bumps.
【図12】従来のバンプによる接続構造におけるバンプ
間の結合容量を示す断面図。FIG. 12 is a cross-sectional view showing a coupling capacitance between bumps in a conventional connection structure using bumps.
101,201,301,401,501,601,7
01,801,901,1201 半導体集積回路 102,202,302,402,502,602,7
02,802,902,1202 配線基板 103,107−3,303−1,303−2,309
−3,403,404,504−1〜6,503−1〜
6,603,607−3,903,907−3,120
4−2,1203−2 信号電極 104−1,104−2,107−2,107−5,2
03−1,203−2,206−2,206−4,30
8−1,308−2,309−2,409−1〜3,4
11−1〜3,604−1,604−2,607−2,
707−5,704−1,704−2,707−2,7
07−5,804−1,804−2,807−2,80
7−5,904−1,904−2,907−2,907
−5,1203−3,1204−3 電源電極 105−1,105−2,107−1,107−4,2
04−1,204−2,206−1,206−3,30
7−1,307−2,309−1,408−1〜3,4
10−1〜3,605−1〜2,607−1,607−
4,705−1〜2,707−1,707−4,805
−1〜2,807−1,807−4,905−1〜2,
907−1,907−4,1203−1,1204−1
グランド電極 107−1〜5,206−1〜4,309−1〜3,6
06−1〜3,706−1〜3 806−1〜3,90
6−1〜3 電極 110−1,109−1,108,110−2,109
−2,208−1,207−1,208−2,207−
2,304,305,306,405,406,40
7,505,506,507,1205−1,1205
−2,1204−3 バンプ 111,112,209,210,310,311,6
11,612,711,712,811,812,91
1,912 隣接する2電極間の中央 113,114,613,614,713,714,8
13,814,913,914 電極の中心 115,116,615,616,715,716,8
15,816,915,916 電極表面に対して垂
直な直線 610−1,609−1,608,610−2,609
−2,710−1,709−1,708,710−2,
709−2,810−1,809−1,808,810
−2,809−2 導電性ピラー 910−1,909−1,908,910−2,909
−2 ボールバンプ 1206−1,1206−2 バンプ間の結合容量の
等価回路 917 銅製の球101, 201, 301, 401, 501, 601, 7
01,801,901,1201 Semiconductor integrated circuit 102,202,302,402,502,602,7
02, 802, 902, 1202 Wiring board 103, 107-3, 303-1, 303-2, 309
-3,403,404,504-1 to 6,503-1
6,603,607-3,903,907-3,120
4-2, 1203-2 Signal electrode 104-1, 104-2, 107-2, 107-5, 2
03-1, 203-2, 206-2, 206-4, 30
8-1, 308-2, 309-2, 409-1 to 3, 4
11-1 to 3, 604-1, 604-2, 607-2,
707-5, 704-1, 704-2, 707-2, 7
07-5, 804-1, 804-2, 807-2, 80
7-5, 904-1, 904-2, 907-2, 907
−5, 1203-3, 1204-3 Power supply electrodes 105-1, 105-2, 107-1, 107-4, 2
04-1, 204-2, 206-1, 206-3, 30
7-1, 307-2, 309-1, 408-1 to 3, 4
10-1 to 3, 605-1 to 2, 607-1, 607-
4,705-1 to 2,707-1,707-4,805
-1 to 2,807-1,807-4,905-1 to 2,
907-1, 907-4, 1203-1, 1204-1
Ground electrodes 107-1 to 5, 206-1 to 4,309-1 to 3,6
06-1-3, 706-1-3 806-1-3, 90
6-1-3 electrodes 110-1, 109-1, 108, 110-2, 109
−2, 208-1, 207-1, 208-2, 207−
2,304,305,306,405,406,40
7,505,506,507,1205-1,1205
−2, 1204-3 Bump 111, 112, 209, 210, 310, 311, 6
11,612,711,712,811,812,91
1,912 The center between two adjacent electrodes 113,114,613,614,713,714,8
13,814,913,914 Electrode center 115,116,615,616,715,716,8
15,816,915,916 Straight line 610-1,609-1,608,610-2,609 perpendicular to electrode surface
−2, 710-1, 709-1, 708, 710-2,
709-2, 810-1, 809-1, 808, 810
−2, 809-2 conductive pillars 910-1, 909-1, 908, 910-2, 909
-2 Ball bump 1206-1, 1206-2 Equivalent circuit of coupling capacitance between bumps 917 Copper ball
───────────────────────────────────────────────────── フロントページの続き (72)発明者 藤村 雄己 東京都港区芝五丁目7番1号 日本電気株 式会社内 Fターム(参考) 5F044 KK01 LL01 LL04 LL13 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Yuki Fujimura 5-7-1, Shiba, Minato-ku, Tokyo F-term in NEC Corporation 5F044 KK01 LL01 LL04 LL13
Claims (6)
配線基板の電極をバンプで電極間の一つを接続する構造
に関し、半導体集積回路上に複数電極を等間隔に並べ、
前記配線基板上には前記半導体集積回路上の電極よりも
電極間隔が広い複数の電極を並べた電極配置を有し、前
記半導体集積回路上の電極表面に対して垂直で且つ電極
の中心に位置する直線が前記配線基板上の電極の中心を
通過するような位置に配置した前記半導体集積回路上の
電極および前記配線基板上の電極を信号電極とし、前記
半導体集積回路上の電極表面に対して垂直で且つ隣接す
る2つの電極間の中央を通過する直線が配線基板上の隣
接する2つの電極間の中央を通過するような位置にあっ
て且つ対向した位置に配置した、前記半導体集積回路上
の2つの電極およびこれらに対応する前記配線基板上の
2つの電極の一方を電源電極、もう一方をグランド電極
とし、前記半導体集積回路上の信号電極、電源電極、グ
ランド電極それぞれの中心に配置したバンプで、前記配
線基板上の信号電極、電源電極、グランド電極とを接続
する構造を特徴とした半導体装置の接続構造。The present invention relates to a structure in which an electrode of a semiconductor integrated circuit and an electrode of a wiring board on which the electrode is mounted are connected to each other by bumps, and a plurality of electrodes are arranged at equal intervals on the semiconductor integrated circuit.
On the wiring substrate, there is provided an electrode arrangement in which a plurality of electrodes having a larger electrode interval than the electrodes on the semiconductor integrated circuit are arranged, and the electrode arrangement is perpendicular to the electrode surface on the semiconductor integrated circuit and located at the center of the electrode. An electrode on the semiconductor integrated circuit and an electrode on the wiring substrate arranged at a position where a straight line passing through the center of the electrode on the wiring substrate are signal electrodes, and The above-mentioned semiconductor integrated circuit, wherein the vertical straight line passing through the center between two adjacent electrodes is located at a position where the straight line passes through the center between two adjacent electrodes on the wiring board, and is disposed at an opposed position. One of the two electrodes and the corresponding two electrodes on the wiring board are a power supply electrode, and the other is a ground electrode, and the signal electrode, the power supply electrode, and the ground electrode on the semiconductor integrated circuit, respectively. Connection structure of bump arranged in the center, a semiconductor device which is characterized by structure for connecting the signal electrode on the wiring board, the power supply electrode and a ground electrode.
イズが配線基板上の電極ピッチと電極サイズに等しく、
且つ電極の接続構造に関し、半導体集積回路上の電極と
配線基板上の電極がそれぞれ対向して配置した、電源電
極または、グランド電極が複数個連続して並び、信号電
極が電源電極またはグランド電極を挟んで配置したエリ
アでは、前記信号電極同志をバンプで接続し、前記半導
体集積回路の電源電極とグランド電極が隣接する部分は
前記半導体集積回路上と前記配線基板上の電源電極とグ
ランド電極のそれぞれをバンプで接続し、それ以外の電
源電極とグランド電極については接続しないことを特徴
とした請求項1記載の半導体装置の接続構造。2. An electrode pitch and an electrode size on a semiconductor integrated circuit are equal to an electrode pitch and an electrode size on a wiring board.
And, regarding the electrode connection structure, a plurality of power supply electrodes or ground electrodes, in which electrodes on a semiconductor integrated circuit and electrodes on a wiring board are arranged facing each other, are arranged in series, and a signal electrode serves as a power supply electrode or a ground electrode. In the interposed area, the signal electrodes are connected to each other by bumps, and a portion where the power electrode and the ground electrode of the semiconductor integrated circuit are adjacent to each other is a power electrode and a ground electrode on the semiconductor integrated circuit and the wiring substrate, respectively. 2. The connection structure for a semiconductor device according to claim 1, wherein the power supply electrodes and the ground electrodes are not connected to each other by bumps.
イズが配線基板の電極ピッチと電極サイズに等しい電極
のレイアウトで、半導体集積回路上の電極が2つ以上連
なって同一信号の入力端あるいは、電極が2つ以上連な
って同一信号の出力端となっている場合、この2つ以上
連なった電極の内1つだけを前記配線基板の電極とバン
プにより接続することを特徴とした請求項1記載の半導
体装置の接続構造。3. An electrode layout in which the electrode pitch and the electrode size on the semiconductor integrated circuit are equal to the electrode pitch and the electrode size on the wiring substrate, and two or more electrodes on the semiconductor integrated circuit are connected to each other to input the same signal or 2. The device according to claim 1, wherein when two or more electrodes are connected to serve as an output terminal of the same signal, only one of the two or more connected electrodes is connected to an electrode of the wiring board by a bump. Connection structure of semiconductor device.
球状の金属バンプであり、この楕円球状の金属バンプで
接続する構造を特徴とした請求項1乃至3記載の半導体
装置の接続構造。4. The connection structure for a semiconductor device according to claim 1, wherein the bump is an elliptical metal bump crushed by a metal ball, and the bump is connected by the elliptical metal bump.
を、円柱形状あるいは角柱形状に形成した導電性ピラー
とし、この導電性ピラーで接続する構造を特徴とした請
求項1乃至3記載の半導体装置の接続構造。5. The semiconductor device according to claim 1, wherein said bumps are formed of conductive pillars formed of metal or conductive resin in a columnar or prismatic shape, and are connected by said conductive pillars. Connection structure.
ールによって形成したボールバンプとし、このボールバ
ンプで接続する構造を特徴とした請求項1乃至3記載の
半導体装置の接続構造。6. The connection structure for a semiconductor device according to claim 1, wherein the bump is a ball bump formed by a solder ball having a copper ball as a core, and the bump is connected by the ball bump.
Priority Applications (2)
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JP2000330168A JP4759798B2 (en) | 2000-10-30 | 2000-10-30 | Semiconductor device connection structure |
JP2011085304A JP5447426B2 (en) | 2000-10-30 | 2011-04-07 | Semiconductor device connection structure |
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JP2000330168A JP4759798B2 (en) | 2000-10-30 | 2000-10-30 | Semiconductor device connection structure |
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JP4759798B2 JP4759798B2 (en) | 2011-08-31 |
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ID=18806737
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JP2011085304A Expired - Fee Related JP5447426B2 (en) | 2000-10-30 | 2011-04-07 | Semiconductor device connection structure |
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JP2018142663A (en) * | 2017-02-28 | 2018-09-13 | 富士通株式会社 | Electronic circuit device and manufacturing method of the same |
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JP6524986B2 (en) | 2016-09-16 | 2019-06-05 | 株式会社村田製作所 | High frequency module, substrate with antenna, and high frequency circuit substrate |
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JPH0831982A (en) * | 1994-07-19 | 1996-02-02 | Sony Corp | Semiconductor device and method of mounting semiconductor chip |
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JP2000164765A (en) * | 1998-11-13 | 2000-06-16 | Fujitsu Ltd | Crosstalk noise-reduced high-density signal insert having power and ground wrap, and method of manufacturing insert |
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JPH1056093A (en) * | 1996-08-07 | 1998-02-24 | Hitachi Ltd | Semiconductor device and electronic device incorporating the semiconductor device |
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JPH0582735A (en) * | 1991-09-20 | 1993-04-02 | Fujitsu Ltd | Large scale integrated circuit |
JPH05235102A (en) * | 1992-02-26 | 1993-09-10 | Toshiba Corp | Semiconductor device |
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JPH0831982A (en) * | 1994-07-19 | 1996-02-02 | Sony Corp | Semiconductor device and method of mounting semiconductor chip |
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JP2018142663A (en) * | 2017-02-28 | 2018-09-13 | 富士通株式会社 | Electronic circuit device and manufacturing method of the same |
Also Published As
Publication number | Publication date |
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JP5447426B2 (en) | 2014-03-19 |
JP4759798B2 (en) | 2011-08-31 |
JP2011135112A (en) | 2011-07-07 |
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