JP2001007187A - Substrate transportation device - Google Patents
Substrate transportation deviceInfo
- Publication number
- JP2001007187A JP2001007187A JP18012499A JP18012499A JP2001007187A JP 2001007187 A JP2001007187 A JP 2001007187A JP 18012499 A JP18012499 A JP 18012499A JP 18012499 A JP18012499 A JP 18012499A JP 2001007187 A JP2001007187 A JP 2001007187A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- gas
- stage
- hole
- transfer device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 108
- 239000007789 gas Substances 0.000 claims abstract description 64
- 239000011521 glass Substances 0.000 claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 239000011261 inert gas Substances 0.000 claims abstract description 6
- 238000007599 discharging Methods 0.000 claims description 5
- 238000007667 floating Methods 0.000 claims description 5
- 239000000428 dust Substances 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 5
- 241001481828 Glyptocephalus cynoglossus Species 0.000 abstract 1
- 231100000241 scar Toxicity 0.000 abstract 1
- 230000003068 static effect Effects 0.000 description 13
- 230000008030 elimination Effects 0.000 description 12
- 238000003379 elimination reaction Methods 0.000 description 12
- 230000005611 electricity Effects 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005339 levitation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ガラス又はプラス
チックからなる基板を土台にした平面型表示パネルの製
造工程中で、基板の搬送若しくは位置決めに用いる基板
搬送装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transfer apparatus used for transferring or positioning a substrate in a manufacturing process of a flat display panel based on a substrate made of glass or plastic.
【0002】[0002]
【従来の技術】本発明の背景を明らかにするため、まず
図3を参照して平面型表示パネルの一例を簡潔に説明す
る。図示するように、平面型表示パネルは土台となる基
板101とこれに対向する基板102と、両者の間に保
持された電気光学物質103とを備えている。基板10
1,102はガラスやプラスチックからなる。電気光学
物質103としては例えば液晶材料がよく用いられてい
る。土台となる下側の基板101には半導体技術を用い
て画素アレイ部104と駆動回路部とが集積形成されて
いる。駆動回路部は垂直駆動回路105と水平駆動回路
106とに分かれている。また、基板101の周辺部上
段には外部接続用の端子部107が形成されている。端
子部107は配線108を介して垂直駆動回路105及
び水平駆動回路106に接続している。画素アレイ部1
04には行状のゲート配線109と列状の信号配線11
0が形成されている。両配線の交差部には画素電極11
1とこれを駆動する薄膜トランジスタ112が形成され
ている。2. Description of the Related Art To clarify the background of the present invention, an example of a flat display panel will be briefly described with reference to FIG. As shown, the flat display panel includes a substrate 101 serving as a base, a substrate 102 facing the substrate 101, and an electro-optical material 103 held between the two. Substrate 10
Reference numerals 1 and 102 are made of glass or plastic. As the electro-optical material 103, for example, a liquid crystal material is often used. On the lower substrate 101 serving as a base, a pixel array unit 104 and a drive circuit unit are formed integrally by using a semiconductor technology. The drive circuit section is divided into a vertical drive circuit 105 and a horizontal drive circuit 106. In addition, a terminal portion 107 for external connection is formed in an upper part of a peripheral portion of the substrate 101. The terminal portion 107 is connected to a vertical drive circuit 105 and a horizontal drive circuit 106 via a wiring 108. Pixel array unit 1
04 has a row-shaped gate wiring 109 and a column-shaped signal wiring 11.
0 is formed. The pixel electrode 11 is located at the intersection of both wirings.
1 and a thin film transistor 112 for driving the same.
【0003】上述した平面型表示パネルを作製するため
に、基板101を製造工程中で随時搬送若しくは位置決
めする必要がある。図4は、従来の基板搬送装置の一例
を示す模式的な平面図及び断面図である。図示するよう
に、基板搬送装置は、処理対象となる基板101を載置
する平面部を有するステージ1と、基板101をステー
ジ1の平面部に吸着するための吸着パッド8と、ステー
ジ1に対して基板101を位置決めするためのシリンダ
9とを備えている。ガラス若しくはプラスチックからな
る基板101をシリンダ9の動力によりステージ1上を
滑らせて移動したあと、ステージ1の平面部に分散した
複数の吸着パッド8により固定していた。In order to manufacture the above-mentioned flat display panel, it is necessary to convey or position the substrate 101 at any time during the manufacturing process. FIG. 4 is a schematic plan view and a cross-sectional view illustrating an example of a conventional substrate transfer device. As shown in the figure, the substrate transfer apparatus includes a stage 1 having a flat portion on which a substrate 101 to be processed is placed, a suction pad 8 for sucking the substrate 101 onto the flat portion of the stage 1, And a cylinder 9 for positioning the substrate 101. After the substrate 101 made of glass or plastic is slid and moved on the stage 1 by the power of the cylinder 9, the substrate 101 is fixed by a plurality of suction pads 8 dispersed on the flat surface of the stage 1.
【0004】[0004]
【発明が解決しようとする課題】近年、平面型表示パネ
ルは大型化が急速に進んでおり、基板としては例えば6
00mm×700mmのサイズで厚みが0.7mmのガ
ラス板が用いられている。大面積の基板を、上述した従
来の基板搬送装置で取り扱うと、ガラス基板そのものの
重量から、搬送や位置決めの際の摩擦による傷やゴミ付
着の問題が発生し、品質を管理する上で解決すべき課題
となっている。又、位置決めをする際、ガラス基板を移
動させると、ステージとの間で起きる摩擦により帯電が
生じる。加えて、ガラス基板101を吸着パッド8で真
空吸引すると、ステージ1とガラス基板101の間が密
着状態になる。これら帯電や真空吸引により密着状態に
なったガラス基板をステージから取り出すためには、ス
テージ1を下から上に貫通するリフターピン(図示省
略)等でガラス基板を突き上げる必要がある。この時、
所謂剥離帯電が生じ、平面型表示パネルの品質に悪影響
を与える。剥離帯電により生じる静電気はガラス基板上
に集積形成された薄膜トランジスタの損傷若しくは破壊
を引き起こす恐れがある。In recent years, the size of flat-panel display panels has been rapidly increasing.
A glass plate having a size of 00 mm × 700 mm and a thickness of 0.7 mm is used. When handling large-area substrates with the above-mentioned conventional substrate transport device, the weight of the glass substrate itself causes problems such as scratches and dust adhesion due to friction during transport and positioning, which can be solved in managing quality. Is an issue to be addressed. When the glass substrate is moved at the time of positioning, charging occurs due to friction generated between the glass substrate and the stage. In addition, when vacuum suction is performed on the glass substrate 101 with the suction pad 8, the stage 1 and the glass substrate 101 are brought into close contact with each other. In order to take out the glass substrate brought into close contact by the charging or vacuum suction from the stage, it is necessary to push up the glass substrate with a lifter pin (not shown) penetrating the stage 1 from below to above. At this time,
So-called peeling charging occurs, which adversely affects the quality of the flat display panel. Static electricity generated by peeling charging may cause damage or destruction of a thin film transistor integrated on a glass substrate.
【0005】[0005]
【課題を解決する為の手段】上述した従来の技術の課題
に鑑み、本発明はガラス基板の傷やゴミ付着を防止し更
に剥離帯電を抑制可能な基板搬送装置を提供することを
目的とする。かかる目的を達成するために以下の手段を
講じた。即ち、本発明にかかる基板搬送装置は、ガラス
又はプラスチックからなる基板を土台にした平面型表示
パネルの製造工程中で、該基板の搬送若しくは位置決め
に用いるものであり、該基板を載置する平面部を有する
ステージと、該平面部に分散して開口した複数の通孔
と、該通孔に空気からなる気体又は不活性な気体を適宜
供給する気体供給源とからなり、少なくとも該ステージ
の平面部に対して該基板を着脱する際には、該気体供給
源から該通孔に該気体を供給して該基板と該平面部との
間に該気体を導入し、以て該基板を該平面部から浮上せ
しめることを特徴とする。好ましくは、該ステージの平
面部には、該通孔の周囲に溝が形成されており、該通孔
から流れ出た該気体を該溝に受け入れて該基板の浮上を
促進する。又好ましくは、除電ガスを発生する除電ガス
発生器を備えており、該気体に除電ガスを添加して該通
孔に供給することにより、該基板の帯電を防止する。更
に好ましくは、該気体供給源から該複数の通孔に該気体
を供給する配管は二系統以上に分かれており、各系統毎
に該気体の流量を調節できる。SUMMARY OF THE INVENTION In view of the above-mentioned problems of the prior art, an object of the present invention is to provide a substrate transfer apparatus capable of preventing a glass substrate from being scratched or adhering dust and further suppressing peeling charging. . The following measures were taken in order to achieve this purpose. That is, the substrate transfer device according to the present invention is used for transferring or positioning the substrate in a manufacturing process of a flat display panel based on a substrate made of glass or plastic, and the flat surface on which the substrate is placed. A stage having a portion, a plurality of through-holes dispersed and opened in the plane portion, and a gas supply source for appropriately supplying a gas composed of air or an inert gas to the through-hole, at least the plane of the stage When the substrate is attached to and detached from the portion, the gas is supplied from the gas supply source to the through hole to introduce the gas between the substrate and the flat portion, thereby removing the substrate. It is characterized in that it floats from a flat surface. Preferably, a groove is formed in the plane portion of the stage around the through hole, and the gas flowing out of the through hole is received in the groove to promote the floating of the substrate. Also preferably, a charge elimination gas generator for generating charge elimination gas is provided, and the charge of the substrate is prevented by adding the charge elimination gas to the gas and supplying the gas to the through hole. More preferably, a pipe for supplying the gas from the gas supply source to the plurality of through holes is divided into two or more systems, and the flow rate of the gas can be adjusted for each system.
【0006】本発明によれば、表示パネル用の基板を搬
送若しくは位置決めするステージに、基板を微小量浮上
させるためのエアー吐出用通孔を設けることにより、ガ
ラス基板とステージの摩擦抵抗を抑制することができ
る。これにより、ガラス基板の傷やゴミ付着を防止する
ことが可能である。又、エアー吐出用の通孔を等間隔に
配置した上で、各通孔の周囲に例えばリング状の溝を設
けることにより、エアー溜まりを作り、ステージから基
板を離す際の抵抗を軽減する。又、かかるリング状の溝
を形成することにより、ステージから基板を引き離す際
の剥離帯電を防止することも可能である。加えて、除電
ガス発生器(イオナイザー)を用いて基板浮上用の気体
(エアー)内に除電ガス(イオン化された気体)を合わ
せて流すことにより、ステージに対してガラス基板を着
脱する際に発生する静電気を中和して、結果的に帯電を
防止することができる。According to the present invention, the stage for transporting or positioning the substrate for the display panel is provided with an air discharge through-hole for floating the substrate by a very small amount, thereby suppressing the frictional resistance between the glass substrate and the stage. be able to. Thereby, it is possible to prevent the glass substrate from being scratched or adhered to dust. In addition, the air discharge holes are arranged at equal intervals, and for example, a ring-shaped groove is provided around each of the holes, thereby forming an air reservoir and reducing the resistance when the substrate is separated from the stage. Further, by forming such a ring-shaped groove, it is possible to prevent peeling charging when the substrate is separated from the stage. In addition, it is generated when the glass substrate is attached to or detached from the stage by using the static elimination gas generator (ionizer) to flow the static elimination gas (ionized gas) together with the substrate levitation gas (air) into the air. Neutralized static electricity, and as a result, charging can be prevented.
【0007】[0007]
【発明の実施の形態】以下図面を参照して本発明の実施
の形態を詳細に説明する。図1は本発明に係る基板搬送
装置の第一実施形態の一例を示す模式的な平面図及び断
面図である。理解を容易にするため、図4に示した従来
の基板搬送装置と対応する部分には対応する参照番号を
付してある。図示するように、本基板搬送装置は、ガラ
ス又はプラスチックからなる基板101を土台にした平
面型表示パネルの製造工程中で、基板101の搬送若し
くは位置決めに用いる。例えば、基板搬送装置はガラス
板等からなる基板の洗浄工程や、薄膜トランジスタ等を
集積形成した基板の検査工程等に用いられる。更には、
工程間でガラス基板を移送する際に用いられる。本基板
搬送装置は基本的に、基板101を載置する平面部を有
するステージ1と、平面部に分散して開口した複数の通
孔2と、各通孔2に空気(エアー)からなる気体又は不
活性な気体を適宜供給する気体供給源3とを備えてい
る。ステージ1は例えばステンレス鋼からなり、その平
面部は鏡面状に研磨されている。通孔2はステージ1に
形成されており、ステージ1の平面部に格子状に分散し
た開口を有する。本実施形態では、縦に3列横に5行で
計15個の通孔2が等間隔に配列しており、例えば60
0mm×700mmのサイズを有する大型のガラス基板
を搭載可能である。尚、通孔2の各行は連通管4により
互いに接続されており、外部の配管を介して気体供給源
3に共通接続されている。気体供給源3は例えばエアー
コンプレッサからなり、上述した配管及び連通管4を介
して気体Gを各通孔2に供給する。気体Gとしては空気
(エアー)の他、窒素ガス等の不活性な気体を用いるこ
ともできる。特に高い清浄度が求められる場合には、エ
アーに代えて窒素ガス等不活性な気体を用いることが好
ましい。尚、図示しないが、場合によっては図4に示し
たシリンダがステージ1に装着されており、基板101
の操作を行う。かかる構成により、ステージ1の平面部
に対して基板101を着脱する際には、気体供給源3か
ら各通孔2に気体Gを供給して基板101とステージ平
面部との間に気体Gを導入し、以て基板101を平面部
から浮上せしめる。Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 is a schematic plan view and a cross-sectional view illustrating an example of a first embodiment of a substrate transfer device according to the present invention. For easy understanding, parts corresponding to those of the conventional substrate transfer apparatus shown in FIG. 4 are denoted by corresponding reference numerals. As shown in the drawing, the present substrate transfer apparatus is used for transferring or positioning the substrate 101 in a manufacturing process of a flat display panel based on a substrate 101 made of glass or plastic. For example, the substrate transfer device is used in a process of cleaning a substrate made of a glass plate or the like, a process of inspecting a substrate on which thin film transistors and the like are integrally formed, and the like. Furthermore,
It is used when transferring a glass substrate between processes. The present substrate transfer apparatus basically includes a stage 1 having a flat surface on which a substrate 101 is placed, a plurality of through holes 2 dispersed and opened in the flat surface, and a gas comprising air in each through hole 2. Or a gas supply source 3 for appropriately supplying an inert gas. The stage 1 is made of, for example, stainless steel, and its plane portion is mirror-polished. The through-holes 2 are formed in the stage 1 and have openings distributed in a lattice pattern on a plane portion of the stage 1. In the present embodiment, a total of 15 through holes 2 are arranged at equal intervals in three columns and five rows and five rows.
A large glass substrate having a size of 0 mm × 700 mm can be mounted. Each row of the through holes 2 is connected to each other by a communication pipe 4 and is commonly connected to a gas supply source 3 via an external pipe. The gas supply source 3 includes, for example, an air compressor, and supplies the gas G to each of the through holes 2 via the above-described pipe and the communication pipe 4. As the gas G, an inert gas such as nitrogen gas can be used in addition to air (air). When particularly high cleanliness is required, it is preferable to use an inert gas such as nitrogen gas instead of air. Although not shown, in some cases, the cylinder shown in FIG.
Perform the above operations. With this configuration, when the substrate 101 is attached to and detached from the plane portion of the stage 1, the gas G is supplied from the gas supply source 3 to each through hole 2, and the gas G is supplied between the substrate 101 and the stage plane portion. Then, the substrate 101 is lifted from the plane portion.
【0008】本実施形態では、ステージ1の平面部に
は、各通孔2の周囲にリング状の溝6が形成されてい
る。リング状溝6は、各通孔2から流れ出た気体Gを受
け入れて、基板101の浮上を促進する。又、本実施形
態は除電ガス7を発生する除電ガス発生器5を備えてお
り、気体Gに除電ガス7を添加して各通孔2に供給する
ことにより、基板101の剥離帯電を防止する。除電ガ
ス発生器5はイオナイザーを含んでおり、イオンを含む
除電ガス7を供給する。イオンは、剥離帯電により生じ
たガラス基板101の静電気を直ちに中和する作用があ
る。In this embodiment, a ring-shaped groove 6 is formed around each through hole 2 in the plane portion of the stage 1. The ring-shaped groove 6 receives the gas G flowing out from each through-hole 2 and promotes the floating of the substrate 101. Further, the present embodiment is provided with the static elimination gas generator 5 for generating the static elimination gas 7, and by adding the static elimination gas 7 to the gas G and supplying the gas G to each through-hole 2, the separation charge of the substrate 101 is prevented. . The static elimination gas generator 5 includes an ionizer and supplies a static elimination gas 7 containing ions. The ions have a function of immediately neutralizing the static electricity of the glass substrate 101 generated by the separation charging.
【0009】以上説明したように、本発明では、ステー
ジ1に対してエアーの供給を行うために、エアー吐出用
の通孔2を設ける。又、ステージ1よりガラス基板10
1を浮上させやすくするために、エアー溜まりとなるリ
ング状溝6を設けてある。これらにより、ガラス基板1
01をステージ1に対して着脱する際に、エアー吐出を
行ない、ガラス基板101を微小量浮上させることを可
能にする。この結果、ガラス基板101の傷発生やゴミ
付着を防止することができる。又、除電ガス発生器5よ
り発生させた除電ガス7をエアーと一緒にしてガラス基
板101側に吐出することにより、ガラス基板101の
帯電を防止している。As described above, in the present invention, in order to supply air to the stage 1, the through holes 2 for discharging air are provided. In addition, the glass substrate 10
A ring-shaped groove 6 serving as an air reservoir is provided in order to make it easier to float. Thus, the glass substrate 1
When attaching and detaching the stage 01 to and from the stage 1, air is discharged, and the glass substrate 101 can be floated by a minute amount. As a result, it is possible to prevent the glass substrate 101 from being scratched or adhering dust. In addition, the charge of the glass substrate 101 is prevented by discharging the charge removing gas 7 generated by the charge removing gas generator 5 to the glass substrate 101 side together with air.
【0010】図2は、本発明にかかる基板搬送装置の第
二実施形態の一例を示す模式的な平面図及び断面図であ
る。理解を容易にするため、図1に示した第一実施形態
と対応する部分には対応する参照番号を付してある。本
実施形態では、気体供給源3から複数の通孔2にエアー
を供給する配管が二系統以上に分かれており、各系統毎
に気体Gの流量を調節可能なバルブVを取りつけてあ
る。本例では、5行に分かれて配された通孔2に対応し
て配管が五系統に分かれている。但し、本発明はこれに
限られるものではない。本実施形態では、ガラス基板1
の反りの状態等に合わせて、各系統でエアーと除電ガス
の流量若しくは吐出圧を調節できる利点がある。これに
より、ステージ1の全面に渡って、ガラス基板101の
浮上量を均一化できる。一般に、ガラス基板の反り分布
はプロセス等に依存して一定の傾向がある。この反り分
布を予め測定しておき、測定結果に合わせて各配管系統
の流量を調節する。これにより、基板に反り変形が含ま
れていても、全体に対してほぼ均一な浮上力を加えるこ
とが可能となり、ガラス基板の安定した着脱操作が行え
る。FIG. 2 is a schematic plan view and a sectional view showing an example of a second embodiment of the substrate transfer apparatus according to the present invention. To facilitate understanding, parts corresponding to those in the first embodiment shown in FIG. 1 are denoted by corresponding reference numerals. In this embodiment, a pipe for supplying air from the gas supply source 3 to the plurality of through holes 2 is divided into two or more systems, and a valve V capable of adjusting the flow rate of the gas G is attached to each system. In this example, the pipes are divided into five systems corresponding to the through holes 2 arranged in five rows. However, the present invention is not limited to this. In the present embodiment, the glass substrate 1
There is an advantage that the flow rate or the discharge pressure of the air and the static elimination gas can be adjusted in each system according to the state of warpage or the like. Thereby, the floating amount of the glass substrate 101 can be made uniform over the entire surface of the stage 1. Generally, the distribution of warpage of a glass substrate has a certain tendency depending on a process or the like. This warpage distribution is measured in advance, and the flow rate of each piping system is adjusted according to the measurement result. Thereby, even if the substrate includes warpage deformation, it is possible to apply a substantially uniform levitation force to the whole, so that the glass substrate can be stably attached and detached.
【0011】[0011]
【発明の効果】以上説明したように、本発明によれば、
搬送や位置決めを行うステージにエアー吐出用の通孔と
リング状の溝等を設けることにより、基板の傷やゴミ付
着を防止できるという効果がある。又、エアー中に除電
ガスを合わせて流すことにより、基板の帯電を防止でき
るという効果がある。更に、基板の反りの状態に合わせ
てエアー吐出量を調整することで、基板の全体に均一な
浮上力を加えることができるという効果がある。As described above, according to the present invention,
By providing a through hole for air discharge, a ring-shaped groove, and the like on a stage for carrying and positioning, there is an effect that scratches and dust adhesion of the substrate can be prevented. In addition, there is an effect that the charge of the substrate can be prevented by flowing the charge removing gas together with the air. Further, by adjusting the air discharge amount in accordance with the warp state of the substrate, there is an effect that a uniform levitation force can be applied to the entire substrate.
【図面の簡単な説明】[Brief description of the drawings]
【図1】本発明にかかる基板搬送装置の第一実施形態を
示す平面図及び断面図である。FIG. 1 is a plan view and a cross-sectional view illustrating a first embodiment of a substrate transfer device according to the present invention.
【図2】本発明にかかる基板搬送装置の第二実施形態を
示す平面図及び断面図である。FIG. 2 is a plan view and a cross-sectional view illustrating a second embodiment of the substrate transfer device according to the present invention.
【図3】基板搬送装置によって扱われる平面型表示パネ
ルの一例を示す模式的な斜視図である。FIG. 3 is a schematic perspective view illustrating an example of a flat display panel handled by the substrate transfer device.
【図4】従来の基板搬送装置の一例を示す平面図及び断
面図である。FIG. 4 is a plan view and a cross-sectional view illustrating an example of a conventional substrate transfer device.
1・・・ステージ、2・・・通孔、3・・・気体供給
源、4・・・連通管、5・・・除電ガス発生器、6・・
・リング状溝、7・・・除電ガス、101・・・基板、
G・・・気体。DESCRIPTION OF SYMBOLS 1 ... Stage, 2 ... Through-hole, 3 ... Gas supply source, 4 ... Communication pipe, 5 ... Static electricity removal gas generator, 6 ...
・ Ring-shaped groove, 7: static elimination gas, 101: substrate,
G: gas.
Claims (4)
土台にした平面型表示パネルの製造工程中で、該基板の
搬送若しくは位置決めに用いる基板搬送装置であって、 該基板を載置する平面部を有するステージと、該平面部
に分散して開口した複数の通孔と、該通孔に空気からな
る気体又は不活性な気体を適宜供給する気体供給源とか
らなり、 少なくとも該ステージの平面部に対して該基板を着脱す
る際には、該気体供給源から該通孔に該気体を供給して
該基板と該平面部との間に該気体を導入し、以って該基
板を該平面部から浮上せしめることを特徴とする基板搬
送装置。1. A substrate transfer device used for transferring or positioning a substrate in a manufacturing process of a flat display panel based on a substrate made of glass or plastic, the device having a flat portion on which the substrate is placed. A stage, a plurality of through-holes dispersed and opened in the plane portion, and a gas supply source for appropriately supplying a gas made of air or an inert gas to the through-hole, and at least with respect to the plane portion of the stage. When the substrate is attached or detached, the gas is supplied from the gas supply source to the through-hole to introduce the gas between the substrate and the flat portion, thereby causing the substrate to be removed from the flat portion. A substrate transfer device characterized by being lifted from a surface.
に溝が形成されており、該通孔から流れ出た該気体を該
溝に受け入れて該基板の浮上を促進することを特徴とす
る請求項1記載の基板搬送装置。2. The flat portion of the stage has a groove formed around the through hole, and receives the gas flowing out of the through hole into the groove to promote the floating of the substrate. 2. The substrate transfer device according to claim 1, wherein:
えており、該気体に除電ガスを添加して該通孔に供給す
ることにより、該基板の帯電を防止することを特徴とす
る請求項1記載の基板搬送装置。3. A discharging gas generator for generating a discharging gas, wherein the charging of the substrate is prevented by adding the discharging gas to the gas and supplying the gas to the through hole. Item 2. The substrate transfer device according to Item 1.
を供給する配管は二系統以上に分かれており、各系統毎
に該気体の流量を調節できることを特徴とする請求項1
記載の基板搬送装置。4. A pipe for supplying the gas from the gas supply source to the plurality of through holes is divided into two or more systems, and a flow rate of the gas can be adjusted for each system.
The substrate transfer device according to any one of the preceding claims.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18012499A JP2001007187A (en) | 1999-06-25 | 1999-06-25 | Substrate transportation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18012499A JP2001007187A (en) | 1999-06-25 | 1999-06-25 | Substrate transportation device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2001007187A true JP2001007187A (en) | 2001-01-12 |
Family
ID=16077848
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18012499A Abandoned JP2001007187A (en) | 1999-06-25 | 1999-06-25 | Substrate transportation device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2001007187A (en) |
Cited By (16)
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US6386425B2 (en) * | 1999-09-30 | 2002-05-14 | Hitachi, Ltd. | Method of friction stir welding structural body, structural body, and extruded material |
JP2002280321A (en) * | 2001-03-21 | 2002-09-27 | Ishikawajima Harima Heavy Ind Co Ltd | Laser annealing equipment |
JP2005119838A (en) * | 2003-10-17 | 2005-05-12 | Iguchi Kiko Seisakusho:Kk | Free ball bearing and support table |
JP2005191553A (en) * | 2003-12-01 | 2005-07-14 | Smc Corp | Work levitation device |
KR100525926B1 (en) * | 2002-04-18 | 2005-11-02 | 주식회사 디엠에스 | Floating apparatus of substrate |
KR100711158B1 (en) * | 2004-11-13 | 2007-04-24 | 유원테크 주식회사 | Adsorption Transfer Supply Device of Optical Film for LCD |
JP2007194453A (en) * | 2006-01-20 | 2007-08-02 | Techno Ryowa Ltd | Electricity removing system in non-contact sheet-conveyance |
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JP2012121642A (en) * | 2010-12-06 | 2012-06-28 | Daifuku Co Ltd | Plate-like body conveying device |
JP2012195362A (en) * | 2011-03-15 | 2012-10-11 | Tokyo Electron Ltd | Substrate transfer device |
US8361233B2 (en) * | 2004-06-28 | 2013-01-29 | Lg Display Co., Ltd. | Glass support system, method of supporting glass, and etching equipment using the same |
CN103373606A (en) * | 2012-04-24 | 2013-10-30 | 李在成 | Conveying plate for large area panel |
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1999
- 1999-06-25 JP JP18012499A patent/JP2001007187A/en not_active Abandoned
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6386425B2 (en) * | 1999-09-30 | 2002-05-14 | Hitachi, Ltd. | Method of friction stir welding structural body, structural body, and extruded material |
JP2002280321A (en) * | 2001-03-21 | 2002-09-27 | Ishikawajima Harima Heavy Ind Co Ltd | Laser annealing equipment |
KR100525926B1 (en) * | 2002-04-18 | 2005-11-02 | 주식회사 디엠에스 | Floating apparatus of substrate |
JP2005119838A (en) * | 2003-10-17 | 2005-05-12 | Iguchi Kiko Seisakusho:Kk | Free ball bearing and support table |
JP2005191553A (en) * | 2003-12-01 | 2005-07-14 | Smc Corp | Work levitation device |
US8361233B2 (en) * | 2004-06-28 | 2013-01-29 | Lg Display Co., Ltd. | Glass support system, method of supporting glass, and etching equipment using the same |
KR100711158B1 (en) * | 2004-11-13 | 2007-04-24 | 유원테크 주식회사 | Adsorption Transfer Supply Device of Optical Film for LCD |
JP2007194453A (en) * | 2006-01-20 | 2007-08-02 | Techno Ryowa Ltd | Electricity removing system in non-contact sheet-conveyance |
KR100888550B1 (en) | 2007-08-27 | 2009-03-11 | 호서대학교 산학협력단 | Non-contact Wafer Chuck Assembly |
KR101550361B1 (en) | 2009-02-17 | 2015-09-04 | 주식회사 탑 엔지니어링 | DISPENSER CONTROL METHOD WITH STAGE |
JP2012121642A (en) * | 2010-12-06 | 2012-06-28 | Daifuku Co Ltd | Plate-like body conveying device |
JP2012195362A (en) * | 2011-03-15 | 2012-10-11 | Tokyo Electron Ltd | Substrate transfer device |
CN103373606A (en) * | 2012-04-24 | 2013-10-30 | 李在成 | Conveying plate for large area panel |
JP2013227151A (en) * | 2012-04-24 | 2013-11-07 | Jae-Sung Lee | Carrying plate for large area panel |
CN103771144A (en) * | 2014-01-23 | 2014-05-07 | 南通剑桥输送设备有限公司 | Precisely adjusted pneumatic transmission device |
CN103771138A (en) * | 2014-01-23 | 2014-05-07 | 南通剑桥输送设备有限公司 | Pneumatic transmission device |
CN103771133A (en) * | 2014-01-23 | 2014-05-07 | 南通剑桥输送设备有限公司 | Height adjustable pneumatic transmission device |
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