JP2000254605A - Cleaning device for flexible substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To stabilize the conveyance of a flexible substrate when the flexible substrate is introduced into and immersed in the cleaning liquid and conveyed under the cleaning liquid and to improve the cleaning effect on the substrate, in a cleaning device for continuously conveying a single wafer type flexible substrate, then immersing the flexible substrate in the cleaning liquid within a cleaning vessel and applying supersonic vibration to the flexible substrate, to clean the substrate. SOLUTION: This cleaning device is provided with means for immersing a flexible substrate 1 in a cleaning liquid 2a within a cleaning vessel 2 and conveying the flexible substrate 1 in a specified direction, namely, plural conveyor wheels 3 for placing the substrate 1 on them and conveying the substrate 1 under the cleaning liquid 2a, and plural jet nozzles 4 each placed opposite to the corresponding one of the conveyor wheels 3. In the cleaning device, the cleaning liquid 2a is sprayed in jet streams from the jet nozzles 4 onto the substrate 1 placed on the conveyor wheels 3, to apply a dynamic pressure to the substrate and to convey the substrate 1 while pressing the substrate 1 against the conveyor wheels 3. Thus, floating-up of the front end of the flexible substrate 1 on the surface of the cleaning liquid 2a and entrainment of air bubbles into the cleaning liquid 2a, can be prevented from being caused when the substrate 1 is introduced into and immersed in the cleaning liquid 2a, and also floating-up of the flexible substrate 1 under the cleaning liquid 2a can be prevented from being caused during the conveyance, to stabilize the conveyance of the substrate 1 and to improve the cleaning effect on the substrate 1.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus used in a step of continuously cleaning a single flexible substrate in a manufacturing process of a liquid crystal display device using a flexible substrate. The present invention relates to an apparatus for cleaning a flexible substrate, in which a single flexible substrate is continuously conveyed in a predetermined direction, immersed in a cleaning liquid in a cleaning tank, and subjected to ultrasonic vibration to perform cleaning.

[0002]

2. Description of the Related Art An alignment interface, a transparent electrode, and the like are formed on each of two flexible transparent substrates, and the two substrates are opposed to each other with a predetermined gap therebetween. A liquid crystal display device having a liquid crystal panel formed by injecting liquid crystal into a gap between two substrates after sealing a portion is known. When manufacturing a liquid crystal panel using such a single-wafer flexible substrate, it is necessary to reliably remove dirt such as oils and fats and fine dust adhered to the substrate in various manufacturing steps.
As a method for cleaning the flexible substrate for the liquid crystal panel, a single-wafer method is generally used, a plurality of cleaning steps using various cleaning agents are provided, and a cleaning method using ultrasonic waves is used.

FIGS. 7 and 8 show an example of a cleaning apparatus of a cleaning system using ultrasonic waves. FIG. 7 is a longitudinal sectional view of the cleaning apparatus parallel to the substrate transfer direction, and FIG. 8 is a transverse sectional view of the center of the ultrasonic cleaning tank of the cleaning apparatus. 7 and 8, a plurality of transfer wheel shafts 105 are disposed at substantially equal intervals in the substrate transfer direction (the direction of the arrow in FIG. 7) in the cleaning device. Are fixed. Each transport wheel shaft 105 is rotationally driven by a drive device (not shown) such as an electric motor via a drive gear 113, whereby the transport wheel 103 is rotationally driven in one direction. The single-wafer flexible substrate 101 conveyed from a pre-processing unit (not shown) is placed on a plurality of conveyance wheels 103 that are driven to rotate in one direction, and is sequentially conveyed into the ultrasonic cleaning tank 102. . Ultrasonic cleaning tank 102
A constant gradient is formed in the introduction part and the discharge part of the cleaning tank 102, so that the cleaning tank 102 can continuously enter and discharge the cleaning liquid 102a. Here, as a flexible substrate material for a liquid crystal panel, a high molecular weight polymer is generally used, and the specific gravity is very light, about 1.0, so that it is mounted on the transport wheel 103. It is difficult to infiltrate and immerse the cleaning tank 102 into the cleaning liquid 102a only with the above. For this reason, as shown in FIGS. 7 and 8, the pinch rollers 112 are arranged at positions corresponding to both end portions on the upper surface side of the substrate 101, and between the guide roller 109 fixed to both end sides of the transport wheel shaft 105. And flexible substrate 10
The substrate 1 is gripped and transported, and is immersed in the cleaning liquid 102a in a state where the substrate is prevented from floating in the cleaning liquid. Then, by applying ultrasonic waves by the ultrasonic vibrator 110, it becomes possible to perform cleaning while continuously transporting the single-wafer flexible substrate 101 in the cleaning liquid 102a.

[0004]

However, in the cleaning device having the structure shown in FIGS. 7 and 8, the flexible substrate 101 is moved into the cleaning liquid 102a in the cleaning tank 102 in the cleaning liquid 102a and is transported in the cleaning liquid. The following problems have occurred: Primarily,
As shown in FIG. 7, the flexible substrate 101 is formed along a predetermined gradient.
Is transported over the transport wheel 103 into the cleaning liquid 102a and enters the liquid from the level of the cleaning liquid 102a. When the pinch roller 12 and the guide roller 109 sandwich the flexible substrate 101, Is pushed up to the liquid surface by the buoyancy of the cleaning liquid 102a. In this case, the substrate portion pushed up to the liquid surface by the buoyancy is separated from the transfer wheel 103 and loses the transfer force. In an extreme case, only the two guide rollers 109 which oppose the pinch roller 12 and hold both ends of the substrate , Which causes a conveyance failure. In addition, when the lift due to the buoyancy is strong, both ends of the substrate may come off the guide roller 109 and the transfer may not be possible. Secondly, when the conveyance is continued in a state where the center of the front end of the substrate is pushed up to the liquid surface by buoyancy, the flexible substrate 101 pushed up to the liquid surface is in contact with the back surface side when entering the cleaning liquid. Entrain air (bubbles). The bubbles entrained on the back surface of the substrate not only hinder the cleaning effect in the ultrasonic cleaning, but also give more buoyancy to the flexible substrate 101 in the cleaning liquid, and the transport force from the transport wheel 103 is reduced. The transport is interrupted, causing transport failure such as transport slip, meandering, and lifting. Third, regarding the transport of the flexible substrate 101 in the cleaning apparatus, the flexible substrate 101 is lightweight, but is in contact with the surface of the transport wheel 103 due to its own weight when transported in a liquid other than the cleaning liquid (in air). However, a transfer force is exerted by the frictional force with the substrate 101, so that transfer in one direction is possible. However, the cleaning liquid 1 in the cleaning tank 102
In 02a, the buoyancy of the cleaning liquid almost cancels the weight of the substrate. As a result, the frictional force between the transfer wheel 103 and the substrate 101 becomes extremely small, and only the frictional driving force of the guide roller 9 generated by the weight of the pinch rollers 12 placed on both side edges of the substrate is transferred. . That is, the uniform transport force of the transport wheel 103 over the entire surface of the flexible substrate is impaired, and transport failure such as transport slip, meandering, and jam occurs.

The present invention has been made in view of the above problems, and an object of the present invention is to continuously connect a single sheet of flexible substrate (for example, a flexible substrate for a liquid crystal panel) in a predetermined direction. In a flexible substrate cleaning apparatus that transports, immerses in a cleaning solution in a cleaning tank, and applies ultrasonic vibrations to clean the substrate, when the flexible substrate enters the cleaning solution, the tip of the substrate rises to the liquid level. Prevention of air bubbles from being trapped in the back surface of the substrate and prevention of floating of the substrate even in the cleaning liquid, thereby stabilizing the transport of the flexible substrate in the liquid and improving the cleaning effect. It is in.

[0006]

According to a first aspect of the present invention, there is provided an apparatus for cleaning a flexible substrate, comprising the steps of:
As means for immersing the flexible substrate (1) in the cleaning liquid (2a) in the cleaning tank (2) and transporting the flexible substrate in a certain direction, a plurality of transports for mounting and transporting the flexible substrate in the cleaning liquid are provided. A wheel (3), and a plurality of ejection nozzles (4) arranged opposite to the transfer wheel (3), and the washing liquid is directed toward the flexible substrate (1) on the transfer wheel (3) by the ejection nozzles. Is jetted to apply a dynamic pressure to the flexible substrate (1), and the flexible substrate (1) is transported while being pressed against the transport wheel (3).

In the apparatus for cleaning a flexible substrate according to a second aspect, in addition to the structure of the first aspect, the cleaning liquid (2a) is provided.
The position at which the cleaning liquid (2a) is sprayed from the ejection nozzle (4) disposed opposite to the transfer wheel (3) toward the flexible substrate (1) on the transfer wheel is defined by the flexibility. It is characterized in that a plurality of portions are provided immediately above and in parallel with a plurality of transfer wheel shafts (5) arranged in the transfer direction of the substrate (1).

According to a third aspect of the present invention, in addition to the structure of the first or second aspect, in addition to the structure of the first or second aspect, the jet nozzle (4) disposed in the cleaning liquid (2a) so as to face the transport wheel (3). ), The position at which the cleaning liquid (2a) is sprayed toward the flexible substrate (1) on the transfer wheel in a jet manner is a plurality of transfer wheels (3 (3a to 3e) arranged on the transfer wheel shaft (5). )).

According to a fourth aspect of the present invention, in addition to the structure of the first, second or third aspect, the flexible substrate (1) is mounted on a plurality of transport wheels (3). The cleaning liquid (2a) is jetted from a jet nozzle (4) disposed opposite to the transfer wheel toward the flexible substrate (1) on the transfer wheel, and a dynamic pressure is applied to the flexible substrate. Means for transporting the flexible substrate while pressing the flexible substrate against the transport wheel is provided from an introduction portion of the cleaning tank (2) into the cleaning liquid. Things.

According to a fifth aspect of the present invention, in addition to the structure of the first, second, third or fourth aspect, the jet nozzle (4) disposed opposite to the transport wheel (3).
An ultrasonic cleaning liquid (2a) in the cleaning tank (2) is sprayed in a jet flow toward the flexible substrate (1) on the transfer wheel, and a fluid for applying dynamic pressure to the flexible substrate is applied to the cleaning tank (2). The cleaning liquid circulates in a circulation circuit from the cleaning tank (2) to the ejection nozzle (4).

According to a sixth aspect of the present invention, in addition to the configuration of the fifth aspect, the circulating circuit further includes a circulating pump (6) and a filter (7) for filtering the rinsing liquid (2a). ) Is provided.

According to a seventh aspect of the present invention, in addition to the structure of any one of the first to sixth aspects, the jet nozzle (4) blows the flexible substrate toward the flexible substrate (1). The flow rate or pressure of the jet can be adjusted by means such as a throttle valve (8).

According to an eighth aspect of the present invention, in the apparatus for cleaning a flexible substrate according to any one of the first to seventh aspects, a plurality of the flexible substrates (1) are provided in the cleaning liquid (2a). The cleaning liquid is placed on the transfer wheel (3), and the cleaning liquid is sprayed from the ejection nozzle (4) arranged opposite to the transfer wheel toward the flexible substrate (1) on the transfer wheel in the form of a jet. In applying a dynamic pressure to the flexible substrate and transporting the flexible substrate while pressing the flexible substrate against the transport wheel, the flexible substrate (1) is coaxial with the transport wheel axis (5). ), A guide roller (9) for regulating both side surfaces in the traveling direction is provided.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The configuration and operation of the present invention will be described below in detail with reference to the illustrated embodiment. FIG. 1 is a view showing one embodiment of the present invention, and is a longitudinal sectional view parallel to a substrate transport direction of a cleaning apparatus, and FIG. 2 is a transverse sectional view of a center portion of an ultrasonic cleaning tank of the cleaning apparatus. 1 and 2, a plurality of transfer wheel shafts 5 are arranged at substantially equal intervals in the substrate transfer direction (the direction of the arrow in FIG. 1) in the cleaning device. (In FIG. 2, five transport wheels 3a are attached to the transport wheel shaft 5 in FIG. 2).
Although an example in which the transport wheels 3 to 3e are fixed is shown, the present invention is not limited to this, and the transport wheels 3 on the adjacent transport wheel shafts are alternately fixed in position to avoid contact.) . Each transport wheel shaft 5 is rotationally driven by a drive device (not shown) such as an electric motor via a drive gear 13, whereby the transport wheel 3 is rotationally driven in one direction. The single-wafer flexible substrate 1 transported from a not-shown pre-processing unit is placed on a plurality of transport wheels 3 that are driven to rotate in one direction, and is sequentially placed in an ultrasonic cleaning tank 2.
Conveyed inside. A constant gradient is formed in the introduction part and the discharge part to the ultrasonic cleaning tank 2, and the cleaning liquid 2 in the cleaning tank 2 is formed.
It has a structure that allows continuous intrusion and discharge into a.

Here, in the cleaning apparatus of the present embodiment, the pinch rollers 12 are arranged at positions corresponding to both side ends on the upper surface side of the substrate 1 up to the vicinity of the introduction portion to the ultrasonic cleaning tank 2. The flexible substrate 1 is gripped and transported between guide rollers 9 fixed to both ends of the transport wheel shaft 5. The flexible substrate 1 is transported from the introduction portion to the ultrasonic cleaning tank 2 to the discharge portion. A plurality of ejection nozzles 4 arranged opposite to the plurality of transfer wheels 3 are provided in the transfer path. The plurality of ejection nozzles 4 are arranged above a plurality of conveyance wheel shafts 5 arranged in parallel in the substrate conveyance direction, and are provided with a predetermined pressure from the ejection nozzles 4 toward the flexible substrate 1 on the conveyance wheel 3. Is jetted continuously to apply dynamic pressure to the flexible substrate 1, and the flexible substrate 1 is transported by the dynamic pressure generated by the jet from the jet nozzle 4. The sheet 3 is conveyed while being constantly pressed against the sheet 3 (claim 1). Therefore, the flexible substrate 1 is always transported while being pressed against the transport wheel 3 by the jet flow on the path from the introduction part to the cleaning tank 2 to the discharge part, and receives a uniform transport force from the transport wheel 3. In other words, the floating of the front end of the flexible substrate 1 when the flexible substrate 1 is immersed in the cleaning liquid 2a and the lifting of the flexible substrate 1 during the transport in the cleaning liquid 2a are prevented, and the entrapment of air bubbles on the back side of the substrate and the transport It is possible to prevent the occurrence of conveyance failure such as slip, meandering, and jam.

Next, FIG. 3 is an enlarged view showing a main part configuration in the cleaning liquid of the cleaning apparatus shown in FIG. The plurality of ejection nozzles 4 arranged in parallel in the flexible substrate transport direction in the cleaning liquid 2a are:
The jet flow blown out from the jet nozzle 4 is installed above the transfer wheel shafts 5 arranged in the substrate transfer direction in parallel with each other and jets toward the rotation center of the transfer wheel shaft 5 (claim 2). Therefore, on the flexible substrate 1 placed on the transport wheel 3 and continuously transported, the dynamic pressure due to the jet flow from above is immediately below the jet nozzles 4 installed in the traveling direction. 5 is applied linearly in the axial direction. As a result, the flexible substrate 1 on the transfer wheel 3 receives the action of the pressure due to the jet only on the axes of the transfer wheel shafts 5 arranged in the transfer direction, and the jet between the plurality of transfer wheel axes is generated by the jet. Downward bending deformation of the flexible substrate caused when pressure is applied can be prevented, and uniform and efficient pressing can be obtained. As a result, even in the cleaning liquid 2a, the flexible substrate 1
The substrate 1 can be transported in a uniformly pressed state, and the occurrence of transport failures such as transport slip, meandering, and jam due to the lifting of the substrate 1 can be prevented.

Next, FIG. 4 is an enlarged view showing a main configuration of the cleaning apparatus shown in FIG. As shown in FIG. 3, the plurality of ejection nozzles 4 arranged in parallel in the flexible substrate transport direction are installed above and in parallel with the transport wheel shafts 5 arranged in the substrate transport direction. As shown in FIG. 4, the jets spouted from the spout nozzles 4
Transport wheels 3a, 3b, 3c,.
Are installed so as to jet toward the vertices of the transport wheels 3a, 3b, 3c,... From the jet ports 4b, 4c, 4d,. That is, each transport wheel shaft 5
Are located at positions facing the plurality of transport wheels 3a, 3b, 3c,... At the ejection ports 4b, 4c, 4d,.
Are provided, and the application of dynamic pressure to the flexible substrate 1 by the jets from the jet ports 4b, 4c, 4d,... Acts only on the vertices of the transport wheels 3a, 3b, 3c,. (Claim 3). Therefore, the flexible substrate 1 on the transport wheel 3 is provided with the transport wheels 3a,
3b, 3c,... Only under the pressure of the jet flow, so that the flexible substrate can be prevented from being bent downward when the pressure by the jet flow acts between the plurality of transport wheels. Uniform and efficient pressing is obtained. As a result, it is possible to prevent the occurrence of transport failure such as transport slip, meandering, and jam in the cleaning liquid for the flexible substrate 1.

Next, FIG. 5 is an enlarged view showing a main part configuration of an introduction part into the cleaning liquid of the cleaning apparatus shown in FIG. As shown in FIG. 1, in the introduction portion of the cleaning tank 2, a predetermined gradient is formed on the transfer wheel 3 arranged in the substrate transfer direction toward the cleaning liquid 2 a in the cleaning tank 2, and the cleaning liquid 2 a
It has a structure that allows continuous intrusion. The plurality of cleaning liquid jet nozzles 4 arranged in the substrate transfer direction are provided from the introduction portion into the cleaning liquid 2a having the gradient formed, and are provided with the plurality of transfer wheel shafts 5 located before the liquid surface of the cleaning tank 2 and The jets blown from the jet nozzles 4 are installed in parallel and opposed to each other, and are directed toward the rotation center of the transport wheel shaft 5, and the jet outlets of the jets are provided on the transport wheel shaft 5 as in FIG. Wheel 3 (3a, 3
(b, 3d,...), and is installed toward the vertex of the transfer wheel (claim 4). Therefore, the jet flow from the jet nozzle 4 acts uniformly on the leading portion of the flexible substrate 1 in the transport direction, and can enter the cleaning liquid 2a while applying pressure to the transport wheel 3. As a result, the problem of conveyance caused by the top portion of the flexible substrate 1 being pushed up to the liquid surface by the buoyancy of the cleaning liquid 2a is eliminated, and the uniform pressure is applied to the top of the flexible substrate 1 by the jet flow. It is possible to enter the liquid in the state as it is, and it is possible to prevent air (bubbles) from being trapped on the back surface of the substrate. As a result, the substrate can be transported in a stable liquid, and the cleaning effect can be improved.

Next, FIG. 6 is a diagram showing an example of a circuit for circulating a cleaning liquid provided in the cleaning apparatus having the structure shown in FIG. FIG.
, The jet nozzle 4 disposed opposite to the transport wheel 3
The fluid for spraying the flexible substrate 1 on the transfer wheel in a jet flow to apply dynamic pressure to the flexible substrate 1 is:
The cleaning liquid 2a is the same as the ultrasonic cleaning liquid 2a in the cleaning tank 2, and the cleaning liquid 2a is circulated in a circulation circuit from the cleaning tank 2 to the ejection nozzle 4. More specifically, a cleaning liquid sub-tank 11 is provided below the cleaning tank 2 of the cleaning apparatus, and the bottom of the cleaning tank 2 and the cleaning liquid sub-tank 11 are connected by a return pipe 15 via a valve 15a, and The cleaning liquid 2 a in the tank 2 can be collected in the cleaning liquid subtank 11. The path from the cleaning liquid sub-tank 11 to the jet nozzle 4 is connected by a cleaning liquid supply pipe 14, and a cleaning liquid circulation pump 6 and a filter 7 are provided in the pipe 14. Further, a throttle valve 8 is provided in each of the plurality of liquid supply paths 14a branched from the pipe 14 to the plurality of ejection nozzles 4. And cleaning solution 2
a is the cleaning liquid sub-tank 11
After being sucked and supplied toward the ejection nozzle 4 and filtered through the filter 7, the plurality of liquid supply paths 14 a
And, it is distributed to the plurality of ejection nozzles 4 via the throttle valve 8. The flow rate or pressure of the jets blown out from the plurality of jet nozzles 4 is controlled by a throttle valve 8 installed in front of the jet nozzles 4, so that a constant jet pressure can be set in each of the jet nozzles 4. . The cleaning liquid 2a discharged from the plurality of ejection nozzles 4 to the cleaning tank 2 is returned to the cleaning liquid sub-tank 11 via a return pipe 15 to form a circulation circuit of the cleaning liquid (claims 5, 6, and 7). ).

In the cleaning apparatus having the structure shown in FIG.
Since a is circulated in the circulation circuit from the cleaning tank 2 to the ejection nozzle 4, deterioration of the cleaning liquid 2a such as concentration change and deterioration can be prevented, and it is economical. Cleaning solution 2
Since the circulating pump 6 and the filter 7 are provided in the circulating circuit a, foreign matters such as fine dusts which are washed from the flexible substrate 1 and mixed into the cleaning liquid 2a can be removed by the filter 7, and the cleaning liquid 2a Quality can be maintained. Further, a throttle valve 8 is provided in a supply path 14 a to each ejection nozzle 4, and the flow rate or the pressure of the jet blown from the ejection nozzle 4 onto the flexible substrate 1 can be adjusted by the throttle valve 8. Optimum jet pressure can be set without depending on the discharge pressure and the discharge amount.

Next, in the apparatus for cleaning a flexible substrate of this embodiment, as shown in FIGS. 2 and 4, a flexible substrate 1 is transported in a cleaning liquid 2a by a plurality of transport wheels 3 (3a to 3a).
e) The cleaning liquid is jetted toward the flexible substrate 1 on the transfer wheel 3 from the ejection nozzle 4 placed on the transfer wheel and opposed to the transfer wheel 3 to apply dynamic pressure to the flexible substrate 1. When transporting the flexible substrate 1 while pressing the flexible substrate 1 against the transport wheel 3, the transport wheel shaft 5
A guide roller 9 for regulating both sides of the flexible substrate 1 in the traveling direction is provided coaxially with the guide roller 9 (claim 8). More specifically, the guide rollers 9 are provided, for example, every other one of a plurality of transport wheel shafts 5 arranged in the substrate transport direction (as shown in FIG. If the distance between the axes is short,
In order to avoid interference between adjacent guide rollers, the guide rollers 9 are provided alternately with respect to the plurality of transport wheel shafts 5). In the transport wheel shaft 5 provided with the guide rollers 9, the guide rollers 9 are provided. Is coaxial with the plurality of transport wheels 3a to 3e, the surface 9a in contact with the flexible substrate 1 is equal to the outer diameter of the transport wheels 3a to 3e, and the transport wheels 3a to 3e and the guide roller 9 rotate synchronously. Things. Further, the guide roller 9 is provided with a flange-shaped protrusion for regulating both side surfaces of the flexible substrate 1 at a position having a slight gap from the width of the flexible substrate 1 in a direction perpendicular to the conveying direction. 9b is formed, and a predetermined gradient (inclined surface) is formed on the brim-shaped projection 9b toward both side surfaces of the flexible substrate 1 to be conveyed. Therefore, even if the flexible substrate 1 is about to be transported obliquely, the transport position of the substrate 1 can be returned to an appropriate position by the inclined surface of the projection 9 b of the guide roller 9. In this embodiment, FIG.
As shown in FIG.
The ejection ports 4b, 4c, 4d,... of the ejection nozzle 4 are provided at positions facing the vertices of a, 3b, 3c,. An ejection port 4a of the ejection nozzle 4 is provided, and the both sides of the substrate are pressed against the guide roller 9 by the dynamic pressure of the ejection flow, thereby enhancing the effect of regulating the substrate transfer position.

As described above, in the cleaning apparatus according to the present embodiment, the guide rollers 9 for regulating both side surfaces of the flexible substrate 1 in the traveling direction are provided coaxially with the transfer wheel shaft 5, so that the transfer wheels 3 (3a) are provided. 3e), the oblique conveyance of the flexible substrate 1 caused by the variation of the outer diameter dimension can be regulated by the projection 9b of the guide roller 9, and the stable substrate conveyance even in the cleaning liquid 2a. realizable.

[0023]

As described above, in the apparatus for cleaning a flexible substrate according to the first aspect, the flexible substrate (1) is immersed in the cleaning liquid (2a) in the cleaning tank (2). As means for carrying in a certain direction, a plurality of carrying wheels (3) for placing and carrying the flexible substrate in the cleaning liquid, and a plurality of ejection nozzles (4) arranged opposite to the carrying wheel (3). The cleaning nozzle jets the cleaning liquid toward the flexible substrate (1) on the transport wheel (3) to apply dynamic pressure to the flexible substrate (1), By transporting the substrate (1) while pressing the substrate (1) against the transport wheel (3), the flexible substrate 1 receives a uniform transport force from the transport wheel (3). When transporting the reactive substrate (1) in the cleaning solution, Slip, meander, it is possible to prevent the occurrence of conveyance failure such as paper jam.

In the apparatus for cleaning a flexible substrate according to a second aspect, in addition to the configuration of the first aspect, the cleaning liquid (2a)
A position (jet port) for jetting the cleaning liquid (2a) from the jet nozzle (4) opposed to the conveying wheel (3) toward the flexible substrate (1) on the conveying wheel. Since the flexible substrate (1) is provided at a plurality of positions directly above and in parallel with the transport wheel shaft (5) arranged in the transport direction of the flexible substrate (1), the flexible substrate ( The position of the pressure acting on 1) can be matched with the position where the transfer substrate (3) supports the flexible substrate (1). That is, the flexible substrate (1) on the transport wheel (3) receives the action of the pressure by the jet only on the axis of the transport wheel shaft (5) arranged in the transport direction. The downward bending deformation of the flexible substrate that occurs when the pressure caused by the jet acts between the transport wheel shafts can be prevented,
Since uniform and efficient pressing can be obtained, as a result, when the flexible substrate (1) is transported in the cleaning liquid, it is possible to prevent occurrence of transport failure such as transport slip, meandering, and jam.

According to a third aspect of the present invention, in addition to the structure of the first or second aspect, in addition to the structure of the first or second aspect, the jet nozzle (4) disposed in the cleaning liquid (2a) so as to face the transport wheel (3). ), A plurality of transport wheels (3 (3a to 3a to 3) to which the cleaning liquid (2a) is jetted toward the flexible substrate (1) on the transport wheel on the same axis as the transport wheel axis (5). 3e)), the flexible substrate (1) on the transport wheel is subjected to the pressure of the jet just above the plurality of transport wheels coaxially arranged. ,
The flexible substrate can be prevented from being bent downward when the pressure caused by the jet flows between the plurality of transport wheels, and uniform and efficient pressing can be obtained. As a result, the flexible substrate ( When transporting 1) in the cleaning solution,
It is possible to prevent occurrence of conveyance failure such as conveyance slip, meandering, and jam.

According to a fourth aspect of the present invention, in addition to the structure of the first, second or third aspect, the flexible substrate (1) is mounted on a plurality of transport wheels (3). The cleaning liquid (2a) is jetted from a jet nozzle (4) disposed opposite to the transfer wheel toward the flexible substrate (1) on the transfer wheel, and a dynamic pressure is applied to the flexible substrate. Means for transporting the flexible substrate while pressing the flexible substrate against the transport wheel is provided from an introduction portion of the cleaning tank (2) into the cleaning liquid, so that a predetermined portion is provided. At the introduction part to the cleaning tank (2) where the gradient is formed, the transport wheel (3) faces the cleaning liquid in the cleaning tank and has a structure capable of continuously invading the flexible substrate into the cleaning liquid. And a plurality of cleaning liquid jet nozzles (4) In the introduction into the distribution is formed cleaning solution, it is disposed above the parallel opposite from the front than the cleaning liquid surface in the cleaning tank with a plurality of conveyor wheel shaft (5),
The jet blown out from the jet nozzle (4) is directed toward the rotation center of the transfer wheel shaft (5), faces a plurality of transfer wheels disposed on the transfer wheel shaft (5), and is directed toward the top of the transfer wheel. By being installed, the jet by the jet nozzle (4) uniformly acts on the leading portion of the flexible substrate (1) in the transport direction, and enters the cleaning liquid while applying pressure to the transport wheel. be able to.
As a result, the problem of conveyance caused by the top portion of the flexible substrate (1) being pushed up to the liquid surface by the buoyancy of the cleaning liquid (2a) is eliminated, and the jet flow at the top of the flexible substrate (1) is eliminated. Can be penetrated into the liquid while applying a uniform pressing force, and air (bubbles) can be prevented from being trapped on the back surface of the substrate. As a result, the substrate can be transported more stably in the cleaning liquid, The cleaning effect can be improved.

In the apparatus for cleaning a flexible substrate according to a fifth aspect, in addition to the configuration according to the first, second, third or fourth aspect, a jet nozzle (4) disposed opposite to the transport wheel (3).
An ultrasonic cleaning liquid (2a) in the cleaning tank (2) is sprayed in a jet flow toward the flexible substrate (1) on the transfer wheel, and a fluid for applying dynamic pressure to the flexible substrate is applied to the cleaning tank (2). The cleaning liquid is circulated through a circulation circuit from the cleaning tank (2) to the ejection nozzle (4), whereby the cleaning liquid (2a) can be prevented from being deteriorated in concentration change, deterioration, and the like, and is economical. .

According to a sixth aspect of the present invention, in addition to the configuration of the fifth aspect, the circulating circuit further includes a circulating pump (6) and a filter (7) for filtering the rinsing liquid (2a). ), Foreign matter such as fine dust mixed from the flexible substrate (1) and mixed into the cleaning liquid (2a) can be removed by the filter (7), and the quality of the cleaning liquid (2a) can be improved. Maintenance becomes possible.

In the apparatus for cleaning a flexible substrate according to a seventh aspect, in addition to the configuration according to any one of the first to sixth aspects, the jet nozzle (4) blows the flexible substrate toward the flexible substrate (1). Since the flow rate or pressure of the jet can be adjusted by means such as a throttle valve (8), the optimum jet pressure can be set without depending on the discharge pressure and discharge amount of the circulation pump (6). Becomes

According to an eighth aspect of the present invention, in addition to the structure of any one of the first to seventh aspects, the flexible substrate (1) is provided in the cleaning liquid (2a). The cleaning liquid is placed on the transfer wheel (3), and the cleaning liquid is sprayed from the ejection nozzle (4) arranged opposite to the transfer wheel toward the flexible substrate (1) on the transfer wheel in the form of a jet. In applying a dynamic pressure to the flexible substrate and transporting the flexible substrate while pressing the flexible substrate against the transport wheel, the flexible substrate (1) is coaxial with the transport wheel axis (5). ), The guide rollers (9) for regulating both side surfaces in the advancing direction allow the flexible substrate 1 to be obliquely transported due to variations in the outer diameter of the transport wheels 3 (3a to 3e). It is regulated by the projection 9b of the guide roller 9. It becomes possible, can be realized also stable substrate transfer during washing liquid 2a.

[Brief description of the drawings]

FIG. 1 is a view showing one embodiment of the present invention, and is a longitudinal sectional view parallel to a substrate transport direction of a flexible substrate cleaning apparatus.

FIG. 2 is a cross-sectional view of the center of the ultrasonic cleaning tank of the cleaning apparatus shown in FIG.

FIG. 3 is an enlarged view showing a configuration of a main part in a cleaning liquid of the cleaning apparatus shown in FIG. 1;

FIG. 4 is an enlarged view showing a configuration of a main part in a cleaning tank of the cleaning apparatus shown in FIG. 2;

FIG. 5 is an enlarged view showing a configuration of an introduction part into a cleaning liquid of the cleaning apparatus shown in FIG. 1;

FIG. 6 is a diagram showing an example of a cleaning liquid circulation circuit provided in the cleaning apparatus having the configuration shown in FIG.

FIG. 7 is a view showing an example of the prior art, and is a longitudinal sectional view parallel to a substrate transport direction of a flexible substrate cleaning apparatus.

8 is a cross-sectional view of the center of the ultrasonic cleaning tank of the cleaning apparatus shown in FIG.

[Explanation of symbols]

 1: Flexible substrate 2: Ultrasonic cleaning tank 2a: Cleaning liquid 3 (3a, 3b, 3c, 3d, 3e): Conveying wheel 4: Cleaning liquid jet nozzle 4a, 4b, 4c, 4d: Spout port 5: Conveying wheel shaft 6: Cleaning liquid circulation pump 7: Filter 8: Throttle valve 9: Guide roller 10: Ultrasonic vibrator 11: Cleaning liquid sub-tank 12: Pinch roller 13: Drive gear 14: Cleaning liquid supply pipe 14a: Liquid supply path 15: Return pipe

Claims (8)

[Claims] An apparatus for cleaning a flexible substrate, wherein a flexible single-wafer substrate is continuously conveyed in a predetermined direction, immersed in a cleaning liquid in a cleaning tank, and subjected to ultrasonic vibration to perform cleaning. A plurality of transport wheels for immersing the flexible substrate in a cleaning liquid in the cleaning tank and for transporting the flexible substrate in the cleaning liquid as a means for transporting the flexible substrate in a certain direction,
A plurality of ejection nozzles are provided facing the transfer wheel, and the cleaning liquid is jetted toward the flexible substrate on the transfer wheel by the ejection nozzle to apply dynamic pressure to the flexible substrate. An apparatus for cleaning a flexible substrate, wherein the flexible substrate is transported while being pressed against the transport wheel. 2. A position in which the cleaning liquid is jetted from an ejection nozzle disposed opposite to the transfer wheel toward a flexible substrate on the transfer wheel in the cleaning liquid in a transfer direction of the flexible substrate. 2. The flexible substrate cleaning apparatus according to claim 1, wherein a plurality of transfer wheel shafts are disposed immediately above and in parallel with the plurality of transfer wheel shafts. 3. The cleaning liquid according to claim 2, wherein a plurality of positions on the transfer wheel shaft where the cleaning liquid is sprayed in a jet-type manner from a jet nozzle disposed opposite to the transfer wheel toward the flexible substrate on the transfer wheel. 3. The method according to claim 1, wherein each of the transport wheels is a vertex.
An apparatus for cleaning a flexible substrate according to claim 1. 4. The flexible substrate is mounted on a plurality of transport wheels, and the cleaning liquid is sprayed toward the flexible substrate on the transport wheel by a jet nozzle from an ejection nozzle arranged opposite to the transport wheel. Means for applying dynamic pressure to the flexible substrate and transporting the flexible substrate while pressing the flexible substrate against the transport wheel is provided from an introduction portion of the cleaning tank into the cleaning liquid. Claim 1, characterized in that
4. The apparatus for cleaning a flexible substrate according to 2 or 3. 5. A cleaning tank in which a fluid for applying a dynamic pressure to the flexible substrate is sprayed from an ejection nozzle disposed opposite to the transport wheel toward a flexible substrate on the transport wheel. 5. The flexible substrate cleaning apparatus according to claim 1, wherein the cleaning liquid is the same as the ultrasonic cleaning liquid therein, and the cleaning liquid circulates in a circulation circuit from the cleaning tank to the ejection nozzle. 6. The apparatus for cleaning a flexible substrate according to claim 5, wherein a circulation pump and a filter for filtering the cleaning liquid are provided in the circulation circuit. 7. The jet flow blown from the jet nozzle toward the flexible substrate can be adjusted in flow rate or pressure by means such as a throttle valve.
The cleaning device for a flexible substrate according to any one of the above. 8. The cleaning liquid in the cleaning liquid, wherein the flexible substrate is placed on a plurality of transport wheels, and the cleaning liquid is directed toward a flexible substrate on the transport wheel from an ejection nozzle arranged opposite to the transport wheel. In the form of a jet, applying dynamic pressure to the flexible substrate, and transporting the flexible substrate while pressing the flexible substrate against the transport wheel. The apparatus for cleaning a flexible substrate according to any one of claims 1 to 7, further comprising a guide roller for regulating both side surfaces of the flexible substrate in the traveling direction.