JP1737502S - Hub with gas flow deflection - Google Patents
Hub with gas flow deflectionInfo
- Publication number
- JP1737502S JP1737502S JP2022008426F JP2022008426F JP1737502S JP 1737502 S JP1737502 S JP 1737502S JP 2022008426 F JP2022008426 F JP 2022008426F JP 2022008426 F JP2022008426 F JP 2022008426F JP 1737502 S JP1737502 S JP 1737502S
- Authority
- JP
- Japan
- Prior art keywords
- article
- processing
- gas flow
- supplied
- hub
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
本願に係る物品(以下、「本物品」という。)は、例えば、半導体の製造に用いられる半導体処理装置の処理チャンバ内に供給される処理ガス流れを偏向するための偏向部を備えるハブである。より具体的には、本物品は、例えば、本物品の上方から本物品の中央部に向けて供給される処理ガスの流れの向きを偏向部によって変更し、処理チャンバ内において本物品の周囲に配置されている4つの基板処理ステーションに向けて供給する。An article according to the present application (hereinafter referred to as "the article") is, for example, a hub provided with a deflector for deflecting a process gas flow supplied into a processing chamber of a semiconductor processing apparatus used for semiconductor manufacturing. . More specifically, the article changes the flow direction of the processing gas supplied from above the article toward the central portion of the article, for example, by the deflecting section, so that the processing gas flows around the article in the processing chamber. It is supplied to four substrate processing stations arranged.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US202129811957 | 2021-10-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP1737502S true JP1737502S (en) | 2023-02-22 |
Family
ID=84027252
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022008426F Active JP1737502S (en) | 2021-10-18 | 2022-04-18 | Hub with gas flow deflection |
JP2022008430F Active JP1737453S (en) | 2021-10-18 | 2022-04-18 | Hub with gas flow deflection |
JP2022008428F Active JP1729731S (en) | 2021-10-18 | 2022-04-18 | Hub with gas flow deflection |
JP2022008429F Active JP1737452S (en) | 2021-10-18 | 2022-04-18 | Hub with gas flow deflection |
Family Applications After (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022008430F Active JP1737453S (en) | 2021-10-18 | 2022-04-18 | Hub with gas flow deflection |
JP2022008428F Active JP1729731S (en) | 2021-10-18 | 2022-04-18 | Hub with gas flow deflection |
JP2022008429F Active JP1737452S (en) | 2021-10-18 | 2022-04-18 | Hub with gas flow deflection |
Country Status (2)
Country | Link |
---|---|
JP (4) | JP1737502S (en) |
TW (4) | TWD230453S (en) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD904640S1 (en) | 2019-01-21 | 2020-12-08 | Applied Materials, Inc. | Substrate carrier |
-
2022
- 2022-04-18 JP JP2022008426F patent/JP1737502S/en active Active
- 2022-04-18 TW TW111301839D01F patent/TWD230453S/en unknown
- 2022-04-18 TW TW111301838F patent/TWD226540S/en unknown
- 2022-04-18 JP JP2022008430F patent/JP1737453S/en active Active
- 2022-04-18 JP JP2022008428F patent/JP1729731S/en active Active
- 2022-04-18 TW TW111301840F patent/TWD230583S/en unknown
- 2022-04-18 TW TW111301839F patent/TWD226380S/en unknown
- 2022-04-18 JP JP2022008429F patent/JP1737452S/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP1729731S (en) | 2022-11-14 |
TWD226540S (en) | 2023-07-21 |
TWD226380S (en) | 2023-07-11 |
TWD230583S (en) | 2024-04-01 |
TWD230453S (en) | 2024-03-21 |
JP1737452S (en) | 2023-02-22 |
JP1737453S (en) | 2023-02-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20140041588A1 (en) | Method for Supplying Gas With Flow Rate Gradient Over Substrate | |
JP2016111343A5 (en) | ||
WO2017031821A1 (en) | Ceramic ring capable of changing shape and appearance of surface thin film of wafer | |
JP2016036018A (en) | Plasma processing device and gas supply member | |
TWI354712B (en) | Film coating system and isolating device | |
CN206432235U (en) | A kind of gas tip and apparatus for processing plasma | |
US12014922B2 (en) | Apparatus for manufacturing a thin film and a method therefor | |
JP2020061549A (en) | Substrate processing apparatus | |
SG11201811727WA (en) | Method and device for producing coated semiconductor wafers | |
JP1737453S (en) | Hub with gas flow deflection | |
CN108342713B (en) | Atmospheric pressure plasma coating device | |
CN106816359B (en) | Wafer processing method | |
JP2008284671A (en) | Non-contact carrying pad | |
JP2017530160A5 (en) | ||
JP1729106S (en) | Shower head for semiconductor processing equipment | |
CN209065998U (en) | Equipment for producing thin film and its reaction chamber | |
CN110249073A (en) | Diffuser design for flowable CVD | |
JP2023046391A (en) | System and apparatus for gas distribution | |
JP1767336S (en) | Showerhead for semiconductor processing equipment | |
JP1737181S (en) | Shower head for semiconductor processing equipment | |
CN105070644A (en) | Growth method of low-stress silicon nitride film | |
CN107641796A (en) | Processing equipment and chemical vapor deposition process | |
JP1728712S (en) | inlet adapter | |
CN104762606B (en) | The graphene chemical gas-phase method for being easy to gas phase kinetics balance prepares body of heater device | |
JP1767346S (en) | Threaded Nozzle Insert |